CN113426718A - Conductive roller wiping device and using method thereof - Google Patents
Conductive roller wiping device and using method thereof Download PDFInfo
- Publication number
- CN113426718A CN113426718A CN202110719804.7A CN202110719804A CN113426718A CN 113426718 A CN113426718 A CN 113426718A CN 202110719804 A CN202110719804 A CN 202110719804A CN 113426718 A CN113426718 A CN 113426718A
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- wiping
- bracket
- arc
- conductive roller
- shaped
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
The invention provides a conductive roller wiping device and a using method thereof, wherein the device comprises a bracket, the bracket comprises a first bracket 1 and a second bracket 8, a sliding rail 2 is fixedly arranged between the first bracket 1 and the second bracket 8, a sliding block mechanism is sleeved and arranged on the outer side of the sliding rail 2 and can slide along the sliding rail 2, an operating rod 5 is connected on the sliding block mechanism, and a wiping mechanism is arranged at the lower end of the operating rod 5; the sliding block mechanism comprises a lifting ring and a linear bearing, the linear bearing is arranged on the sliding rail, the rear end of the lifting ring is rotatably arranged in the middle of the front side wall of the linear bearing, and the front end of the lifting ring is sleeved and fixed on the outer side of the operating rod. The invention can facilitate the operator to clean impurities or copper on the roller, reduce the danger of the operator and improve the quality of the film.
Description
Technical Field
The invention belongs to the field of electroplating, and particularly relates to a conductive roller wiping device and a using method thereof.
Background
Electroplating is a process of plating a thin layer of other metals or alloys on the surface of some metals by using the principle of electrolysis, and is a process of attaching a layer of metal film on the surface of a metal or other material product by using the action of electrolysis, thereby having the effects of preventing metal oxidation (such as corrosion), improving wear resistance, conductivity, light reflection, corrosion resistance (such as copper sulfate and the like), enhancing the appearance and the like. The outer layer of many coins is also plated.
In the existing electroplating production process of copper foil or composite copper foil, the foil is conducted through the conductive roller, and the foil passes through the plating solution, so that a layer of plating solution is attached to the surface of the foil and contacts with the conductive roller, thereby causing surface crystallization and copper plating of the conductive roller and causing damage to the surface of the foil, and thus the copper plated on the surface of the conductive roller or the crystallization needs to be removed.
At present, the method for removing the plated copper or foreign matters is that an operator climbs onto a device of a plating bath, but on one hand, the operator can easily fall and be injured, and on the other hand, new impurities are likely to be introduced when the operator climbs onto the device, which is unacceptable for a production line with high film quality requirements.
Disclosure of Invention
In view of the above, the present invention is directed to a conductive roller wiping apparatus and a method for using the same to solve the above problems.
In order to achieve the purpose, the invention provides the following technical scheme:
the first aspect provides a conducting roller wiping device which comprises a support, wherein the support comprises a first support and a second support, a sliding rail is fixedly arranged between the first support and the second support, a sliding block mechanism is sleeved on the outer side of the sliding rail and can slide along the sliding rail, an operating rod is connected to the sliding block mechanism, and a wiping mechanism is arranged at the lower end of the operating rod;
the sliding block mechanism comprises a lifting ring and a linear bearing, the linear bearing is arranged on the sliding rail, the rear end of the lifting ring is rotatably installed in the middle of the front side wall of the linear bearing, and the front end of the lifting ring is sleeved and fixed on the outer side of the operating rod.
Further, the wiping mechanism is an arc wiping mechanism, the arc wiping mechanism comprises a connecting rod and an arc wiping part, the bottom end of the connecting rod is fixedly connected with the top end of the arc wiping part, and the top end of the connecting rod is fixedly connected with the lower end of the operating rod.
Further, the arc-shaped wiping part is made of rubber, and the radian of the arc-shaped wiping part is 60-180 degrees.
Further, the distance between the first support and the second support is 500cm-1500 cm; the operating rod is a telescopic rod.
Furthermore, a concave thread groove is arranged on the wiping surface of the arc-shaped wiping part.
Further, the lifting ring divides the operating rod into a first part and a second part, and the length of the first part is 2 times of the length of the second part.
Furthermore, the upper part of the second support is provided with a U-shaped clamping structure with a downward opening, and the U-shaped clamping structure is vertically and fixedly connected with the second support.
Further, the first support and the second support are parallel to each other, and the slide rail is perpendicular to the first support or the second support.
In a second aspect, there is also provided a method of using a conductive roller wiping apparatus, comprising:
installing the conductive roller wiping device on a conductive roller to be wiped on a production line through the first bracket and the second bracket;
placing the arc-shaped wiping mechanism connected with the operating rod on a conductive roller to be wiped;
the operating rod is pushed forwards, so that the sliding block mechanism moves forwards on the sliding rail, and the arc-shaped wiping part is driven to wipe the foreign matters on the conductive roller.
Compared with the prior art, the invention has the beneficial effects that:
the invention has simple and reasonable structural design, convenient and quick use and high practicability, can be conveniently cleaned manually, does not need an operator to climb an electroplating table, thereby bringing foreign matters into an electroplating bath, being convenient for the operator to clean impurities or copper and the like on rollers, reducing the danger of the operator and improving the quality of films.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic structural view of a conductive roller wiping apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a specific structure of a slider mechanism according to an embodiment of the present invention;
fig. 3 is a flow chart of a method of using a conductive roller wiping apparatus according to an embodiment of the present invention.
In the figure: the device comprises a first support 1, a sliding rail 2, a linear bearing 3, a hanging ring 4, an operating rod 5, an arc-shaped wiping part 6, a conductive roller 7, a second support 8, a connecting rod 9 and a U-shaped clamping structure 10.
Detailed Description
Features and exemplary embodiments of various aspects of the present invention will be described in detail below. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present invention by illustrating examples of the present invention. In the drawings and the following description, at least some well-known structures and techniques have not been shown in detail in order to avoid unnecessarily obscuring the present invention; also, the dimensions of some of the structures may be exaggerated for clarity. Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
Referring to fig. 1 and 2, an embodiment of the present invention provides a conductive roller wiping apparatus, which includes a bracket, where the bracket includes a first bracket 1 and a second bracket 8, a sliding rail 2 is fixedly installed between the first bracket 1 and the second bracket 8, a sliding block mechanism is installed on an outer side of the sliding rail 2 in a sleeved manner, the sliding block mechanism can slide along the sliding rail 2, the sliding block mechanism is connected with an operating rod 5, a wiping mechanism is installed at a lower end of the operating rod 5, the sliding block mechanism includes a hanging ring 4 and a linear bearing 3, the linear bearing 3 is installed on the sliding rail 2, a rear end of the hanging ring 4 is rotatably installed in a middle portion of a front side wall of the linear bearing 3, and a front end of the hanging ring 4 is fixedly installed on an outer side of the operating rod 5 in a sleeved manner.
Further, the lower end of the operating rod 5 is provided with an arc-shaped wiping mechanism, the arc-shaped wiping mechanism can comprise a connecting rod 9 and an arc-shaped wiping part 6, the bottom end of the connecting rod 9 is fixedly connected with the top end of the arc-shaped wiping part 6, and the top end of the connecting rod 9 is fixedly connected with the lower end of the operating rod 5.
Further, the first bracket 1 and the second bracket 8 are parallel to each other, and the slide rail 2 is perpendicular to the first bracket 1 or the second bracket 8. To meet the requirement of transportation portability, the operation rod 5 may be a telescopic rod.
Further, the arc of the arc-shaped wiping part 6 is 60 to 180 degrees, and the arc is mainly set to be suitable for the roller diameters of different conductive rollers.
Furthermore, the arc-shaped wiping part 6 is made of rubber, and the thickness of the arc-shaped wiping part can be 2cm-5cm, so that the wiping effect is better. In other embodiments, the wiping surface of the arc-shaped wiping part 6 is additionally provided with a concave thread groove structure, so that the wiping effect is better than that of a plane structure. In other embodiments, the material of the arc-shaped wiping part 6 can be ethylene propylene diene monomer or other corrosion-resistant materials, so that the conductive roller is prevented from being damaged by hardness.
Further, the distance between the first bracket 1 and the second bracket 8 is 500cm-1500 cm.
Further, the suspension ring 4 divides the operating rod 5 into a first portion and a second portion, and the length of the first portion is 2 times the length of the second portion. In this embodiment, the distance from the hanging ring 4 to the left end point of the operating rod 5 is 2 times the distance from the hanging ring 4 to the right end point of the operating rod 5, so that the operation of an operator is facilitated.
Furthermore, the upper part of the second bracket 8 is provided with a U-shaped clamping structure 10 with a downward opening, and the U-shaped clamping structure 10 is vertically and fixedly connected with the second bracket 8. Thus, when the operation rod 5 is not needed to be used in the middle, the operation rod 5 can be pressed downwards, so that the operation rod 5 is clamped in the downward opening of the U-shaped clamping structure 10.
The working principle of the embodiment of the invention is as follows:
the embodiment of the invention provides a conductive roller wiping device which comprises a mounting bracket, wherein the mounting bracket can be simply fixed on an equipment frame, so that the wiping device can not be fixed on a conductive roller and is convenient to use, the mounting bracket comprises a first bracket 1 and a second bracket 8, and the distance between the first bracket 1 and the second bracket 8 is 500cm-2000cm, so that the wiping device is suitable for different roller lengths. The top of the first bracket 1 and the second bracket 8 is provided with a slide rail 2, the slide rail 2 is provided with a slide block mechanism, the slide block mechanism can slide left and right relative to the slide rail 2, the slide block mechanism can comprise a hanging ring 4 and a linear bearing 3, the hanging ring 4 is fixedly connected on the linear bearing 3, the other side of the hanging ring 4 is fixedly connected with an operating rod 5, the operating rod 5 can slide on the slide rail 2 by applying an acting force to the operating rod 5, the set hanging ring point divides the operating rod 5 into a first part (a longer part on the left side of the operating rod 5 in figure 1) and a second part (a shorter part on the right side of the operating rod 5 in figure 1), the distance from the hanging ring 4 to the end point on the left side of the operating rod 5 is 2 times of the distance from the hanging ring 4 to the part on the right side of the operating rod 5, and the operation of an operator is facilitated by the arrangement, one end of the operating rod 5 on the right side of the hanging ring point is provided with an arc-shaped wiping mechanism, the arc wiping mechanism comprises a connecting rod 9 and an arc wiping part 6, the arc wiping part 6 is arc-shaped, the arc radian can be 60-180 degrees, the radian is set to be mainly suitable for different roll diameters, the arc wiping part 6 can be made of ethylene propylene diene monomer rubber, the thickness can be 2-5 cm, and the wiping effect can be better due to the arrangement. On the second bracket 8, a downward-opening U-shaped clamping structure 10 is further arranged, and the downward-opening U-shaped clamping structure 10 is arranged on the second bracket 8 through a connecting plate, so that when the operation rod 5 is not needed to be used in the midway, the operation rod 5 can be pressed downwards, and the operation rod 5 is clamped in the downward opening of the U-shaped clamping structure 10.
Referring to fig. 3, a method of operating the conductive roller wiping apparatus according to the embodiment of the present invention will be described as follows:
step S1: the operator can install the conductive roller wiping device of the invention on the equipment frame needing wiping on the production line, such as the conductive roller 7 needing wiping, through the first bracket 1 and the second bracket 8.
Step S2: the arc-shaped wiping mechanism of the operating lever 5 is then placed over the conductive roller 7 to be wiped.
Step S3: by pushing the operating rod 5 forward, the slider mechanism moves forward on the slide rail 2, so as to drive the arc-shaped wiping part 6 at the end part of the arc-shaped wiping mechanism to wipe foreign matters on the conductive roller 7.
Of course, the present invention is primarily used to wipe copper plating on conductive rollers, but is not so limited. The method may further include step S4: if a pause is desired for a while, the operating lever 5 can also be pressed so that the first part of the operating lever 5 snaps into the downward opening of the U-shaped groove, i.e. the U-shaped snap-in structure 10.
By using the conductive roller wiping device provided by the embodiment of the invention, the cleaning can be conveniently carried out manually, and an operator does not need to climb onto an electroplating table, so that foreign matters are prevented from being brought into an electroplating bath. The conductive roller wiping device provided by the embodiment of the invention is simple and reasonable in structural design, convenient and quick to use, high in practicability, convenient for operators to efficiently clean impurity substances such as copper on the conductive roller and improve the film quality.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (10)
1. A conductive roller wiping apparatus comprising a support, characterized in that:
the bracket comprises a first bracket (1) and a second bracket (8), a sliding rail (2) is fixedly installed between the first bracket (1) and the second bracket (8), a sliding block mechanism is sleeved on the outer side of the sliding rail (2) and can slide along the sliding rail (2), an operating rod (5) is connected to the sliding block mechanism, and a wiping mechanism is arranged at the lower end of the operating rod (5);
the slider mechanism comprises a lifting ring (4) and a linear bearing (3), the linear bearing (3) is arranged on the sliding rail (2), the rear end of the lifting ring (4) is rotatably installed in the middle of the front side wall of the linear bearing (3), and the front end of the lifting ring (4) is sleeved and fixed on the outer side of the operating rod (5).
2. The conductive roller wiping apparatus as recited in claim 1, characterized in that the wiping mechanism is an arc-shaped wiping mechanism, the arc-shaped wiping mechanism comprises a connecting rod (9) and an arc-shaped wiping portion (6), the bottom end of the connecting rod (9) is fixedly connected with the top end of the arc-shaped wiping portion (6), and the top end of the connecting rod (9) is fixedly connected with the lower end of the operating rod (5).
3. A conductive roller wiping device according to claim 2, characterized in that the material of the arc-shaped wiping part (6) is rubber and the arc of the arc-shaped wiping part (6) is 60 ° -180 °.
4. A conductive roller wiping device according to claim 2, characterized in that the thickness of the arc-shaped wiping part (6) is 2cm-5 cm.
5. A conductive roller wiping device according to claim 2, characterized in that the wiping surface of the arc-shaped wiping part (6) is provided with a recessed thread groove.
6. A conductive roller wiping device according to claim 2, characterized in that the distance between the first holder (1) and the second holder (8) is 500-1500 cm; the operating rod (5) is a telescopic rod.
7. A conducting roller wiping device according to claim 2, characterized in that the suspension ring (4) divides the operating lever (5) into a first part and a second part, the length of the first part being 2 times the length of the second part.
8. A conducting roller wiping device according to claim 2, characterized in that the second bracket (8) is provided with a downwardly open U-shaped snap-in structure (10) at the upper part, and the U-shaped snap-in structure (10) is vertically and fixedly connected with the second bracket (8).
9. A conducting roller wiping device according to claim 2, characterized in that the first (1) and the second (8) bracket are parallel to each other, and the sliding track (2) is perpendicular to the first (1) or the second bracket (8).
10. The method of using the conductive roller wiping apparatus according to any one of claims 2 to 9, characterized by comprising:
installing the conductive roller wiping device on a conductive roller (7) to be wiped on a production line through the first bracket (1) and the second bracket (8);
placing the arc-shaped wiping mechanism connected with the operating rod (5) on a conductive roller (7) to be wiped;
the operating rod (5) is pushed forwards, so that the sliding block mechanism moves forwards on the sliding rail (2), and the arc-shaped wiping part (6) is driven to wipe foreign matters on the conductive roller (7).
Priority Applications (1)
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CN202110719804.7A CN113426718A (en) | 2021-06-28 | 2021-06-28 | Conductive roller wiping device and using method thereof |
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CN202110719804.7A CN113426718A (en) | 2021-06-28 | 2021-06-28 | Conductive roller wiping device and using method thereof |
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