CN113426227B - Anti-static protection device of photoetching machine - Google Patents
Anti-static protection device of photoetching machine Download PDFInfo
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- CN113426227B CN113426227B CN202110757118.9A CN202110757118A CN113426227B CN 113426227 B CN113426227 B CN 113426227B CN 202110757118 A CN202110757118 A CN 202110757118A CN 113426227 B CN113426227 B CN 113426227B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/06—Spray cleaning
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/16—Anti-static materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/20009—Modifications to facilitate cooling, ventilating, or heating using a gaseous coolant in electronic enclosures
- H05K7/20136—Forced ventilation, e.g. by fans
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/18—Nature of the water, waste water, sewage or sludge to be treated from the purification of gaseous effluents
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Elimination Of Static Electricity (AREA)
Abstract
The invention discloses an anti-static protection device of a photoetching machine, which comprises a shell, wherein a first PVC plate is arranged at the top of the shell, a second PVC plate is arranged on the rear surface of the shell, a bottom plate is arranged on one side of the bottom of the shell, and a detection spraying mechanism is arranged on one side of the shell; the utility model provides a static protection device is prevented to lithography machine, through the starter motor, the motor drive lead screw rotates in the shell is inside, make fly leaf on the lead screw at the inside lateral shifting of spout under the rotation of lead screw, when the fly leaf removes, drive the fixed plate of bottom and install the particulate matter sensor on the fixed plate, static detection sensor and atomizer remove, can detect particulate matter and static in the air of shell inside and on the lithography machine through particulate matter sensor and static detection sensor, spray through the static elimination agent in the start-up water pump suction water tank, thereby clear away particulate matter and static.
Description
Technical Field
The invention belongs to the technical field of photoetching machine protection devices, and particularly relates to an anti-static protection device for a photoetching machine.
Background
Lithography machines are also known as mask alignment exposure machines, exposure systems, lithography systems, etc. The common photoetching machine is mask aligning photoetching, and the general photoetching process is carried out by cleaning and drying the surface of a silicon wafer, coating a bottom, coating a photoresist in a spinning way, soft-baking, aligning exposure, post-baking, developing, hard-baking, etching and the like. Photolithography means a process of temporarily "copying" a device or circuit structure onto a silicon wafer by a process of forming a pattern with light, leveling the resist on the surface of the silicon wafer, and then transferring the pattern on a mask to the resist.
However, the prior art has certain problems:
1. the static protection device is prevented to current lithography machine adopts usually to prevent that the static shell protects the lithography machine surface, and its protective properties is comparatively single, and the inside air particulate matter of shell or outside article get into the shell still can produce static after inside, and can't carry out the rapid elimination to inside floating dust particulate matter and static.
The existing anti-static protection device for the photoetching machine does not carry out static electricity and particle detection on the space where the photoetching machine is located by detection means, so that the service environment of the photoetching machine cannot be known by operators, and static electricity or air particles cannot be removed according to the environment state
Disclosure of Invention
The invention provides an anti-static protection device for a photoetching machine, aiming at the problems that in the prior art, the protection performance of the photoetching machine is single, static electricity can still be generated after air particles in a shell or external articles enter the shell, and the internal floating dust particles and the static electricity can not be quickly eliminated, and particularly, the use environment of the current photoetching machine can not be known by operators, so that the static electricity or the air particles can not be eliminated according to the environment state.
In order to achieve the technical purpose, the technical scheme adopted by the invention is as follows:
an anti-static protection device of a lithography machine comprises:
the device comprises a shell, a first PVC plate is arranged at the top of the shell, a second PVC plate is arranged on the rear surface of the shell, a bottom plate is arranged on one side of the bottom of the shell, and a detection spraying mechanism is arranged on one side of the shell;
wherein, it includes motor and baffle to detect spraying mechanism, the motor install in one side of shell, baffle fixed connection in the inside of shell, the spout has been seted up on the baffle, the lead screw is installed through the shaft coupling to the output shaft of motor, install the bearing frame through the bolt on the inner wall of shell, the one end of lead screw inserts the inner ring inner wall of bearing frame, one side of shell is provided with the box, threaded connection has the fly leaf on the lead screw, fly leaf sliding connection in the inside of spout, just the bottom fixedly connected with fixed plate of fly leaf, particulate matter sensor, electrostatic detection sensor and atomizer are installed respectively to the bottom of fixed plate, the internally mounted of box has the water pump, the water inlet intercommunication of water pump has the inlet tube, the delivery port intercommunication of water pump has the outlet pipe, the one end of outlet pipe runs through the shell with the fixed plate, just the one end of outlet pipe with the atomizer is linked together.
When the anti-static protection device for the photoetching machine is used, the photoetching machine is installed inside the shell, wherein the first PVC plate and the second PVC plate can shield external static electricity to enter the shell, when the motor is started, the motor drives the screw rod to rotate inside the shell, the movable plate on the screw rod moves transversely inside the sliding groove under the rotation of the screw rod, when the movable plate moves, the fixed plate at the bottom and the particulate matter sensor installed on the fixed plate are driven, the static detection sensor and the atomizing nozzle move, and the static eliminating agent in the water taking box is pumped by starting the water pump to be sprayed.
Further, filtering mechanism is installed at the top of bottom plate, filtering mechanism includes the water tank, water tank fixed connection in the top of bottom plate, the internally mounted of water tank has high efficiency filter net and active carbon filter screen, just the active carbon filter screen is located high efficiency filter net's bottom, the one end of inlet tube runs through the box the water tank high efficiency filter net with the active carbon filter screen, box fixed connection in the top of water tank.
Further, the internally mounted of shell has dust removal mechanism, dust removal mechanism includes fan unit and ventilation net, fan unit includes motor and flabellum, the ventilation net inlay and adorn in the inside of shell, fan unit install in one side of ventilation net, one side of shell inlays and adorns the dust bonding plate, one side fixedly connected with plate body of dust bonding plate, one side of plate body pass through screwed connection in one side of shell.
Further, the internally mounted of box has singlechip and touch-control screen, particulate matter sensor with the output of electrostatic detection sensor with the input electric connection of singlechip, the motor the water pump with the automatically controlled end of fan assembly motor all with singlechip electric connection, the singlechip with touch-control screen electric connection.
Furthermore, a shade is welded on one side of the shell, and the motor is located inside the shade.
Further, the top intercommunication of water tank has the body, the top threaded connection of body has the thread cover, the primary filter screen is installed to the top inner wall of water tank, just the one end of body is located the inside of primary filter screen.
Further, a pipe sleeve is installed inside the shell, and the water outlet pipe penetrates through the pipe sleeve.
The invention also provides an antistatic protection method of the photoetching machine, which comprises the following steps:
s1, installing a photoetching machine in a shell, wherein a first PVC plate and a second PVC plate are respectively installed at the top and one side of the shell, the first PVC plate and the second PVC plate can shield external static electricity from entering the shell, and meanwhile, a motor is started and drives a lead screw to rotate in the shell, so that a movable plate on the lead screw transversely moves in a sliding groove under the rotation of the lead screw;
s2, when the movable plate moves, the fixed plate at the bottom, the particle sensor, the electrostatic detection sensor and the atomizing nozzle which are arranged on the fixed plate are driven to move, particles and static electricity in air inside the shell and on the photoetching machine can be detected through the particle sensor and the electrostatic detection sensor, and a static electricity eliminating agent in a water pump suction box is started to spray, so that the particles and the static electricity are eliminated;
s3, before spraying, the fan assembly is started, the circulation of air inside the shell and air on the surface of the photoetching machine is accelerated by the operation of the fan assembly, and floating dust particles are driven to flow into the dust adhering plate, so that the dust adhering plate adsorbs the floating dust particles in the circulating air;
s4, observing detection data of the particle sensor and the electrostatic detection sensor through a touch screen in the box body, automatically controlling the operation of the water pump, the motor and the fan assembly by the single chip microcomputer after the particle sensor and the electrostatic detection sensor detect that the data reach the preset values through presetting the detection values, and simultaneously manually opening and closing the water pump, the motor and the fan assembly through the touch screen.
Further, in S2, when the static electricity eliminating agent in the water tank is insufficient, the pipe body is opened by rotating the screw cap, and the static electricity eliminating agent is replenished into the water tank through the pipe body.
Further, in S3, the dust-sticking plate is mounted in the housing by plate body fitting screws.
Compared with the prior art, the invention has the following beneficial effects:
1. when the anti-static protection device for the photoetching machine is used, a user starts the motor, the motor drives the screw rod to rotate in the shell, the movable plate on the screw rod moves transversely in the chute under the rotation of the screw rod, the atomization spray head is driven to move when the movable plate moves, and the static eliminating agent in the water tank is sprayed by starting the water pump to quickly eliminate particles and static;
2. a user observes the detection data of the particle sensor and the electrostatic detection sensor through a touch screen in the box body, the single chip microcomputer automatically controls the operation of the water pump, the motor and the fan assembly through a preset detection value after the particle sensor and the electrostatic detection sensor detect that the data reach the preset value, and the operation of spraying and dust removing is carried out, and meanwhile, the user can manually turn on and off the water pump, the motor and the fan assembly through the touch screen;
3. the photoetching machine anti-static protection device provided by the scheme can start the fan assembly when in use, accelerates the circulation of air inside the shell and air on the surface of the photoetching machine by the operation of the fan assembly, and drives floating dust particles to flow into the dust sticking plate, so that the dust sticking plate adsorbs the floating dust particles in the circulating air.
Drawings
FIG. 1 is a schematic structural diagram of an anti-electrostatic protection device of a lithography machine according to the present invention;
FIG. 2 is a schematic view of the anti-electrostatic protection device of the lithography machine according to another aspect of the present invention;
FIG. 3 is a schematic cross-sectional view of a housing of the electrostatic protection apparatus for a lithography machine according to the present invention;
FIG. 4 is a schematic cross-sectional view of a box of the electrostatic protection apparatus for lithography machine according to the present invention;
FIG. 5 is a schematic cross-sectional view of a water tank of the anti-electrostatic protection apparatus for a lithography machine according to the present invention;
FIG. 6 is an enlarged view of portion A of FIG. 3 according to the present invention.
The symbols in the figure illustrate: 1. a housing; 11. a first PVC sheet; 12. a second PVC sheet; 2. detecting a spraying mechanism; 21. a motor; 22. a box body; 23. a water outlet pipe; 24. pipe sleeve; 25. a water inlet pipe; 26. a screw rod; 27. a chute; 28. a partition plate; 29. a water pump; 211. a fixing plate; 212. a particulate matter sensor; 213. a static electricity detection sensor; 214. an atomizing spray head; 215. a movable plate; 3. a filtering mechanism; 31. a water tank; 32. a threaded cap; 33. a pipe body; 34. a high-efficiency filter screen; 35. an active carbon filter screen; 36. a primary filter screen; 4. a dust removal mechanism; 41. a plate body; 42. a fan assembly; 43. a dust-sticking board; 44. a ventilation net; 5. a single chip microcomputer; 6. a base plate; 7. masking; 8. a touch screen; 9. and a bearing seat.
Detailed Description
In order to facilitate understanding of those skilled in the art, the present invention will be further described with reference to the following examples and drawings, which are not intended to limit the present invention.
Example 1:
as shown in FIGS. 1-6, an anti-static protection device for a lithography machine comprises a housing 1 and a spray detection mechanism.
The device comprises a shell 1, a first PVC plate 11, a second PVC plate 12, a bottom plate 6, a detection spraying mechanism 2, a first PVC plate, a second PVC plate, a first PVC plate and a second PVC plate, wherein the first PVC plate 11 is installed at the top of the shell 1, the second PVC plate 12 is installed on the rear surface of the shell 1, the bottom plate 6 is installed on one side of the bottom of the shell 1, and the detection spraying mechanism 2 is installed on one side of the shell 1;
the detection spraying mechanism 2 comprises a motor 21 and a partition plate 28, the motor 21 is installed on one side of the shell 1, the partition plate 28 is fixedly connected inside the shell 1, a sliding groove 27 is formed in the partition plate 28, a screw rod 26 is installed on an output shaft of the motor 21 through a coupler, the other end of the screw rod 26 is inserted into the inner wall of an inner ring of a bearing seat 9, the bearing seat 9 is installed on the inner wall of the shell 1 through a bolt, a box body 22 is arranged on one side of the shell 1, a movable plate 215 is connected to the screw rod 26 through a thread, the movable plate 215 is connected inside the sliding groove 27 in a sliding mode, a fixed plate 211 is fixedly connected to the bottom of the movable plate 215, a particulate matter sensor 212, an electrostatic detection sensor 213 and an atomizing nozzle 214 are installed at the bottom of the fixed plate 211 respectively, a water pump 29 is installed inside the box body 22, a water inlet of the water pump 29 is communicated with a water inlet pipe 25, a water outlet of the water pump 29 is communicated with a water outlet pipe 23, one end of the water outlet pipe 23 is communicated with the shell 1 and the fixed plate 211, and one end of the water outlet pipe 23 is communicated with the atomizing nozzle 214.
Specifically, filtering mechanism 3 is installed at bottom plate 6's top, filtering mechanism 3 includes water tank 31, 31 fixed connection in bottom plate 6's top of water tank, 31 internally mounted has high efficiency filter 34 and active carbon filter screen 35, and active carbon filter screen 35 is located high efficiency filter 34's bottom, box 22 is run through to the one end of inlet tube 25, water tank 31, high efficiency filter 34 and active carbon filter screen 35, box 22 fixed connection is in water tank 31's top, when using through above-mentioned technical scheme, 31 inside being located high efficiency filter 34 through installation active carbon filter screen 35 can the inside liquid of effectual filtration water tank 31, impurity and pollutant in the liquid are intercepted, attach to on the photoetching machine equipment when avoiding spraying.
Specifically, the dust removing mechanism 4 is installed inside the housing 1, the dust removing mechanism 4 includes a fan assembly 42 and a ventilation net 44, the ventilation net 44 is embedded inside the housing 1, the fan assembly 42 is installed on one side of the ventilation net 44, wherein, the fan assembly 42 includes a motor and fan blades, a dust adhering plate 43 is embedded on one side of the housing 1, a plate body 41 is fixedly connected to one side of the dust adhering plate 43, one side of the plate body 41 is connected to one side of the housing 1 through screws, when the technical scheme is used, when floating dust is attached to the air inside the housing 1 or the photoetching machine, the fan assembly 42 is started, and the circulation of the air inside the housing 1 and the air on the surface of the photoetching machine is accelerated by the operation of the fan assembly 42, and the floating dust particles are driven to flow into the dust adhering plate 43, so that the dust adhering plate 43 adsorbs the floating dust particles in the circulating air.
Concretely, the internally mounted of box 22 has singlechip 5 and touch screen 8, particulate matter sensor 212 and electrostatic detection sensor 213's output all is connected with singlechip 5's input, motor 21, the automatically controlled end of water pump 29 and fan unit 42 motor all is connected with singlechip 5, singlechip 5 and touch screen 8 electric connection, when using through above-mentioned technical scheme, the data of transmission when particulate matter sensor 212 and electrostatic detection sensor 213 detect can be observed through the inside touch screen 8 of box 22, predetermine detection value among its singlechip 5, reach singlechip 5 automatic control water pump 29 after predetermineeing the numerical value when detecting data, motor 21 and fan unit 42's operation, simultaneously the user of service can carry out manual control through touch screen 8.
Specifically, the welding of one side of shell 1 has shade 7, and motor 21 is located the inside of shade 7, and when using through above-mentioned technical scheme, shade 7 can play the guard action to motor 21's surface to avoid motor 21 directly to expose in the external environment.
Specifically, the top intercommunication of water tank 31 has body 33, and the top threaded connection of body 33 has threaded cap 32, and primary filter screen 36 is installed to the top inner wall of water tank 31, and the one end of body 33 is located primary filter screen 36's inside, and when using through above-mentioned technical scheme, the user opens body 33 through rotating threaded cap 32 to through body 33 to the inside supplementary liquid and the static elimination agent of water tank 31.
Specifically, the pipe sleeve 24 is installed inside the housing 1, and the water outlet pipe 23 penetrates through the pipe sleeve 24, so that when the water outlet pipe is used through the technical scheme, the pipe sleeve 24 can play a stable role in the outside of the water outlet pipe 23, and the water outlet pipe 23 is prevented from scattering downwards.
Example 2:
with reference to fig. 1 to 6, the present application further provides a method for using the electrostatic protection apparatus for lithography machine in embodiment 1, including the following steps:
s1, a user installs the photoetching machine in a shell 1, a first PVC plate 11 and a second PVC plate 12 are respectively installed at the top and one side of the shell 1, the first PVC plate 11 and the second PVC plate 12 can shield external static electricity from entering the shell 1, a motor 21 is started at the same time, the motor 21 drives a screw rod 26 to rotate in the shell 1, and a movable plate 215 on the screw rod 26 moves transversely in a sliding groove 27 under the rotation of the screw rod 26;
s2, when the movable plate 215 moves, the fixed plate 211 at the bottom, the particle sensor 212, the static detection sensor 213 and the atomizing spray head 214 mounted on the fixed plate 211 are driven to move, particles and static electricity in the air inside the shell 1 and on the photoetching machine can be detected through the particle sensor 212 and the static detection sensor 213, and the static electricity eliminating agent in the water tank 31 is pumped by starting the water pump 29 to be sprayed, so that the particles and the static electricity are eliminated;
s3, before spraying, the fan assembly 42 is started, the circulation of air inside the shell 1 and air on the surface of the photoetching machine is accelerated by the operation of the fan assembly 42, and floating dust particles are driven to flow into the dust adhering plate 43, so that the dust adhering plate 43 adsorbs the floating dust particles in the circulating air;
s4, a user observes detection data of the particulate matter sensor 212 and the static electricity detection sensor 213 through the touch screen 8 in the box body 22, the single chip microcomputer 5 automatically controls the water pump 29, the motor 21 and the fan assembly 42 to operate through preset detection values, and the single chip microcomputer 5 automatically controls the water pump 29, the motor 21 and the fan assembly 42 after the particulate matter sensor 212 and the static electricity detection sensor 213 detect that the data reach the preset values, and meanwhile, the user can manually start and stop the water pump 29, the motor 21 and the fan assembly 42 through the touch screen 8.
Specifically, in S2, when the amount of the static eliminator in the water tank 31 is insufficient, the pipe 33 is opened by rotating the screw cap 32, and the static eliminator is replenished into the water tank 31 through the pipe 33.
Specifically, in S3, the dust-sticking plate 43 is mounted in the housing 1 by the plate body 41 with screws.
The structure principle is as follows: when the anti-static protection device for the photoetching machine is used, a user installs the photoetching machine in the shell 1, the top and one side of the shell 1 are respectively provided with the first PVC plate 11 and the second PVC plate 12, the first PVC plate 11 and the second PVC plate 12 can shield external static electricity to enter the shell 1, the motor 21 is started, the motor 21 drives the screw rod 26 to rotate in the shell 1, the movable plate 215 on the screw rod 26 transversely moves in the chute 27 under the rotation of the screw rod 26, when the movable plate 215 moves, the fixed plate 211 at the bottom and the particulate matter sensor 212 installed on the fixed plate 211 are driven, the static electricity detection sensor 213 and the atomizing nozzle 214 move, particulate matters and static electricity in air in the shell 1 and on the photoetching machine can be detected through the particulate matter sensor 212 and the static electricity detection sensor 213, the static electricity eliminating agent in the water tank 31 is pumped by starting the water pump 29 to be sprayed, thereby removing the particulate matters and the static electricity, meanwhile, the user can observe the detection data of the particulate matter sensor 212 and the static electricity detection sensor 213 through the touch screen 8 in the box 22, the singlechip 5 can detect the data of the particulate matter detection sensor 213, and the operation of the singlechip 42 can be controlled by the automatic spraying fan, and the automatic spraying control of the singlechip 21.
The above describes a detailed description of the anti-static protection device for a lithography machine provided by the present application. The description of the specific embodiments is only intended to facilitate an understanding of the methods of the present application and their core concepts. It should be noted that, for those skilled in the art, without departing from the principle of the present application, the present application can also make several improvements and modifications, and those improvements and modifications also fall into the protection scope of the claims of the present application.
Claims (6)
1. An anti-static protection device of a lithography machine is characterized by comprising:
the device comprises a shell (1), wherein a first PVC plate (11) is installed at the top of the shell (1), a second PVC plate (12) is installed on the rear surface of the shell (1), a bottom plate (6) is installed on one side of the bottom of the shell (1), and a detection spraying mechanism (2) is installed on one side of the shell (1);
wherein, detect spraying mechanism (2) including motor (21) and baffle (28), motor (21) install in one side of shell (1), baffle (28) fixed connection in the inside of shell (1), spout (27) have been seted up on baffle (28), lead screw (26) are installed through the shaft coupling to the output shaft of motor (21), install bearing frame (9) through the bolt on the inner wall of shell (1), the one end of lead screw (26) is inserted the inner ring inner wall of bearing frame (9), one side of shell (1) is provided with box (22), threaded connection has fly leaf (215) on lead screw (26), fly leaf (215) sliding connection in the inside of spout (27), just the bottom fixedly connected with fixed plate (211) of fly leaf (215), particulate matter sensor (212), electrostatic detection sensor (213) and atomizer (214) are installed respectively to the bottom of fixed plate (211), the internally mounted of box (22) has water pump (29), the water inlet intercommunication of water pump (29) has inlet tube (25), the intercommunication of water pump (29) has the one end of shell (23), outlet pipe (23) and outlet pipe (1), one end of the water outlet pipe (23) is communicated with the atomizing nozzle (214);
the water purifier is characterized in that a filtering mechanism (3) is installed at the top of the bottom plate (6), the filtering mechanism (3) comprises a water tank (31), the water tank (31) is fixedly connected to the top of the bottom plate (6), a high-efficiency filter screen (34) and an active carbon filter screen (35) are installed inside the water tank (31), the active carbon filter screen (35) is located at the bottom of the high-efficiency filter screen (34), one end of the water inlet pipe (25) penetrates through the box body (22), the water tank (31), the high-efficiency filter screen (34) and the active carbon filter screen (35), and the box body (22) is fixedly connected to the top of the water tank (31);
the dust removal device is characterized in that a dust removal mechanism (4) is mounted inside the shell (1), the dust removal mechanism (4) comprises a fan assembly (42) and a ventilation net (44), the fan assembly (42) comprises a motor and fan blades, the ventilation net (44) is embedded in the shell (1), the fan assembly (42) is mounted on one side of the ventilation net (44), a dust adhering plate (43) is embedded on one side of the shell (1), a plate body (41) is fixedly connected to one side of the dust adhering plate (43), and one side of the plate body (41) is connected to one side of the shell (1) through screws;
a single chip microcomputer (5) and a touch screen (8) are installed inside the box body (22), the output ends of the particulate matter sensor (212) and the electrostatic detection sensor (213) are electrically connected with the input end of the single chip microcomputer (5), the electric control ends of the motor (21), the water pump (29) and the fan assembly (42) motor are electrically connected with the single chip microcomputer (5), and the single chip microcomputer (5) is electrically connected with the touch screen (8);
the use method of the anti-static protection device of the photoetching machine comprises the following steps:
s1, a photoetching machine is installed inside a shell (1), a first PVC plate (11) and a second PVC plate (12) are respectively installed on the top and one side of the shell (1), the first PVC plate (11) and the second PVC plate (12) can shield external static electricity to enter the shell (1), a motor (21) is started simultaneously, the motor (21) drives a screw rod (26) to rotate inside the shell (1), and a movable plate (215) on the screw rod (26) moves transversely inside a sliding groove (27) under the rotation of the screw rod (26);
s2, when the movable plate (215) moves, the fixed plate (211) at the bottom, the particle sensor (212) installed on the fixed plate (211), the static detection sensor (213) and the atomization nozzle (214) are driven to move, particles and static electricity in air inside the shell (1) and on the photoetching machine can be detected through the particle sensor (212) and the static detection sensor (213), and a water pump (29) is started to pump static electricity eliminating agents in the water tank (31) to spray, so that the particles and the static electricity are eliminated;
s3, before spraying, the fan assembly (42) is started, the circulation of air inside the shell (1) and air on the surface of the photoetching machine is accelerated by the operation of the fan assembly (42), and floating dust particles are driven to flow into the dust adhering plate (43), so that the dust adhering plate (43) adsorbs the floating dust particles in the circulating air;
s4, the detection data of the particulate matter sensor (212) and the static detection sensor (213) are observed through the touch screen (8) inside the box body (22), the single chip microcomputer (5) detects a value through presetting, the single chip microcomputer (5) automatically controls the water pump (29), the motor (21) and the fan assembly (42) to operate after the particulate matter sensor (212) and the static detection sensor (213) detect that the data reach the preset value, and meanwhile, the water pump (29), the motor (21) and the fan assembly (42) are turned on and off manually through the touch screen (8).
2. The electrostatic protection device of claim 1, wherein: a shade (7) is welded on one side of the shell (1), and the motor (21) is located inside the shade (7).
3. The electrostatic protection device of claim 1, wherein: the top intercommunication of water tank (31) has body (33), the top threaded connection of body (33) has screw cap (32), primary filter screen (36) are installed to the top inner wall of water tank (31), just the one end of body (33) is located the inside of primary filter screen (36).
4. The electrostatic protection device of claim 1, wherein: a pipe sleeve (24) is installed inside the shell (1), and the water outlet pipe (23) penetrates through the pipe sleeve (24).
5. The electrostatic protection device of claim 1, wherein: in S2, when the static electricity eliminating agent in the water tank (31) is insufficient, the pipe body (33) is opened by rotating the screw cap (32), and the static electricity eliminating agent is replenished into the water tank (31) through the pipe body (33).
6. The electrostatic protection device of claim 1, wherein: in S3, the dust adhering plate (43) is installed in the shell (1) through the plate body (41) and screws.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202110757118.9A CN113426227B (en) | 2021-07-05 | 2021-07-05 | Anti-static protection device of photoetching machine |
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CN202110757118.9A CN113426227B (en) | 2021-07-05 | 2021-07-05 | Anti-static protection device of photoetching machine |
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CN113426227A CN113426227A (en) | 2021-09-24 |
CN113426227B true CN113426227B (en) | 2022-10-04 |
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