CN113394648A - Gas laser electrode and gas laser - Google Patents
Gas laser electrode and gas laser Download PDFInfo
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- CN113394648A CN113394648A CN202010173428.1A CN202010173428A CN113394648A CN 113394648 A CN113394648 A CN 113394648A CN 202010173428 A CN202010173428 A CN 202010173428A CN 113394648 A CN113394648 A CN 113394648A
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- gas laser
- shock wave
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- grooves
- groove
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- 230000035939 shock Effects 0.000 claims abstract description 59
- 230000001629 suppression Effects 0.000 claims abstract description 30
- 230000007704 transition Effects 0.000 claims description 18
- 230000001154 acute effect Effects 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 3
- 238000000605 extraction Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000002401 inhibitory effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0381—Anodes or particular adaptations thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0382—Cathodes or particular adaptations thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
本申请涉及激光技术领域，公开了一种气体激光器电极和使用该电极的气体激光器。其中，气体激光器电极包括相对设置的阳极和阴极；阳极和/或阴极的表面设置有放电表面和设置于放电表面一侧或两侧的冲击波抑制表面，冲击波抑制表面上设置有多个凹槽，凹槽用以使冲击波发生散射。本申请的气体激光器电极，在其非放电区域，具有能够打散冲击波和防止冲击波反射的表面结构，使得电极在能够进行稳定辉光放电的基础上，有效的抑制电极间的反射冲击波，减小其对放电和出光性能的影响。
The present application relates to the field of laser technology, and discloses a gas laser electrode and a gas laser using the electrode. Wherein, the gas laser electrode includes an anode and a cathode arranged oppositely; the surface of the anode and/or the cathode is provided with a discharge surface and a shock wave suppression surface arranged on one or both sides of the discharge surface, and a plurality of grooves are arranged on the shock wave suppression surface, The grooves are used to scatter shock waves. The gas laser electrode of the present application, in its non-discharge area, has a surface structure that can disperse the shock wave and prevent the reflection of the shock wave, so that the electrode can effectively suppress the reflected shock wave between the electrodes on the basis of stable glow discharge, and reduce the Its effect on discharge and light extraction performance.
Description
Technical Field
The application relates to the technical field of laser, in particular to a gas laser electrode and a gas laser using the same.
Background
In pulsed gas lasers of discharge pumping, in particular high repetition frequency excimer lasers, there is a perturbation similar to a micro-explosion, i.e. a discharge shock wave phenomenon. This is because when the high-voltage pulse power supply of the gas laser pumps the discharge medium gas, 2-4J of energy is injected into the discharge medium gas in about 100 ns. It was found that a significant fraction of the energy is instantaneously deposited on the cathode and anode surfaces, and its rapid expansion generates a cylindrical shock wave originating from the electrode surface. The cathodic and anodic shock waves are reflected back and forth between the electrodes and their associated structures until they are substantially flat for 200 mus. The repeatedly reflected shock wave can cause local gas density oscillation, thereby affecting the quality of discharge and the propagation of light beams, and finally affecting the energy stability, the line width and the light beam quality of the laser.
In order to reduce the influence of shock waves on a laser, the laser needs to be inhibited, in the inhibiting method adopted in the prior art, sound absorption materials are arranged on two sides of an electrode and used for absorbing shock wave energy, the sound absorption materials are usually high-purity alumina ceramics, the cost is high, and the preparation and processing difficulty is high.
Disclosure of Invention
The application aims to provide a gas laser electrode and a gas laser applying the electrode, and aims to solve the technical problems of high cost and high processing difficulty in the process of inhibiting shock wave energy in the prior art.
The embodiment of the application provides a gas laser electrode, which comprises an anode and a cathode which are oppositely arranged; the surface of the anode and/or the cathode is provided with a discharge surface and shock wave suppression surfaces arranged on one side or two sides of the discharge surface, the shock wave suppression surfaces are provided with a plurality of grooves, and the grooves are used for scattering shock waves.
Further, the included angle between the discharge surface and the shock wave suppression surface is 20-30 degrees.
Embodiments of the present application also include a smooth transition surface disposed between the discharge surface and the shockwave suppression surface.
Further, the width of the transition surface is 1-2 times of the width of the discharge surface.
Further, the included angle between the discharge surface and the transition surface is 20-30 degrees.
Further, the anode and the cathode are both strip-shaped electrodes; the extending direction of the grooves is the same as or perpendicular to the extending direction of the strip-shaped electrodes.
Further, a plurality of the grooves may be parallel or non-parallel to each other.
Further, the depth of each groove is any value between 0.5mm and 3mm, and the width of each groove is any value between 0.1mm and 1 mm.
Furthermore, the shape of the groove is one or more of a rectangular groove, a wedge-shaped groove, a dovetail groove and a T-shaped groove; when the groove is a wedge-shaped groove, the section bottom angle of the wedge-shaped groove is an acute angle or an obtuse angle.
Embodiments of the present application also provide a gas laser, and an electrode used in the gas laser is the gas laser electrode disclosed in the above embodiments.
Based on the technical scheme, compared with the prior art, the electrode of the gas laser provided by the embodiment of the application has the function of inhibiting shock waves, and the inhibition efficiency is superior to that of the prior art. The reason for this is that the electrode is the source of the shock wave generation, and the surface of the electrode is the first to encounter the shock wave, and the intensity of the encountered shock wave is also the strongest, and the shock wave is attenuated at this point, and the suppression efficiency is undoubtedly the highest. The application discloses gas laser electrode, it is regional not discharging, have the surface structure that can break up the shock wave and prevent the shock wave reflection for the electrode is on the basis that can stabilize glow discharge, and the effectual reflection shock wave that restraines between the electrode reduces its influence to discharging and light-emitting performance. Meanwhile, the electrode is simple in structure and can be manufactured through conventional machining, complex and expensive intracavity sound absorption materials do not need to be produced like the prior art, and the cavity cost is reduced.
Drawings
FIG. 1 is a schematic diagram of a gas laser electrode according to an embodiment of the present disclosure;
FIG. 2 is a schematic structural diagram of a cathode in an electrode of a gas laser according to a second embodiment of the present application;
FIG. 3 is a schematic structural diagram of a cathode in an electrode of a gas laser according to a third embodiment of the present application;
FIG. 4 is a schematic structural diagram of a cathode in an electrode of a gas laser in accordance with an embodiment of the present invention;
fig. 5 is a schematic structural diagram of a cathode in an electrode of a gas laser in an embodiment of the present application.
In the figure, 201 is a cathode; 202 is an anode; 203 is a discharge surface; 204 is a shock wave suppression surface; 204-1 is a groove; 205 is a transition surface.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present.
In addition, it should be noted that the terms of orientation such as left, right, up and down in the embodiments of the present application are only relative concepts or are referred to a normal use state of a product, and should not be considered as limiting. The following detailed description of implementations of the present application is provided in conjunction with specific embodiments.
As shown in fig. 1 to 5, an embodiment of the present application provides a gas laser electrode, including an anode and a cathode disposed opposite to each other; the surface of the anode and/or the cathode is provided with a discharge surface and shock wave suppression surfaces arranged on one side or two sides of the discharge surface, a plurality of grooves are formed in the shock wave suppression surfaces, and the grooves are used for scattering shock waves to achieve the purpose of suppressing the shock waves.
In order to avoid the occurrence of the bypass discharge, the examples of the present application set the angle between the discharge surface and the shock wave suppression surface to an arbitrary value between 20 ° and 30 °.
To ensure that the discharge occurs only at the discharge surface, embodiments of the present application also include providing a smooth transition surface disposed between the discharge surface and the shock wave suppression surface. Further, the width of the transition surface is 1-2 times of the width of the discharge surface, and the included angle between the discharge surface and the transition surface is 20-30 degrees.
The application also discloses a gas laser using the electrode.
The first embodiment is as follows:
fig. 1 is a schematic structural diagram of an embodiment of the present application.
The cathode 201 and the anode 202 are oppositely arranged, are both strip-shaped electrodes, and are made of one of metal materials such as brass, aluminum, nickel and the like. The section shape of the strip-shaped electrode is a structure combining a trapezoid and a rectangle, and the long edge of the rectangle is attached to the lower bottom surface of the trapezoid. The cathode 201 is provided with high voltage by a high-voltage pulse power supply; the anode 202 is grounded. At the cathode 201 and anode 202 surfaces, a discharge surface 203, a shock wave suppression surface 204 and a transition surface 205 are included. Where the discharge surface 203 is the upper base of the trapezoid, the shock wave suppression surface 204 and the transition surface 205 are located on the waist of the trapezoid. The discharge surface 203 is a glow discharge region, and an included angle between the discharge surface 203 and the shock wave suppression surface 204 is 20-30 degrees. The test result shows that the bypass discharge is easily caused by the undersize angle between the discharge surface and the shock wave suppression surface, so that the actual discharge width is widened; whereas an excessive angle reduces the area of the shock wave-suppressing surface, thereby reducing the shock wave-attenuating effect.
The width of the transition surface 205 is preferably 1-2 times of the width of the discharge surface 203, and the excessively small width of the transition surface can affect the removal of discharge residual products by a flow field, so that abnormal discharge is generated; whereas an excessive width of the transition surface may cause the shock wave suppression surface to be further from the discharge region and reduce the shock wave suppression efficiency.
In this embodiment, the shock wave suppression surface 204 is provided with a plurality of grooves 204-1 extending along the extension direction of the strip electrode, and the grooves 204-1 are rectangular grooves. The depth of the rectangular grooves is 0.5mm, and the width of each rectangular groove is 0.1 mm. There is a transition surface 205 between the discharge surface and the shock wave suppression surface, the function of the transition surface 205 being to ensure that discharge does not occur at the shock wave suppression surface. The included angle between the transition surface 205 and the discharge surface 203 is 20-30 degrees. The test result shows that the bypass discharge is easily caused when the angle is too small, so that the actual discharge width is widened; whereas an excessive angle reduces the area of the shock wave-suppressing surface, thereby reducing the shock wave-attenuating effect.
The shock wave suppression surface 204 on the cathode 201 and/or the anode 202 in the embodiments of the present application may take a variety of configurations, and the shock wave suppression surface 204 on the cathode 201 in one embodiment will be described in detail below with reference to fig. 2-5.
Example two:
as shown in fig. 2, in this embodiment, a plurality of grooves 204-1 are formed on the shock wave suppression surface 204 disposed on the cathode 201, the grooves 204-1 are rectangular grooves, the extending direction of the rectangular grooves is the same as the extending direction of the cathode 201, the plurality of rectangular grooves are parallel to each other, the depth of each rectangular groove is 1mm, and the width of each rectangular groove is 0.5 mm.
Example three:
as shown in fig. 3, in the present embodiment, a plurality of grooves 204-1 are formed on the shock wave suppression surface 204 disposed on the cathode 201, the grooves 204-1 are rectangular grooves, the extending direction of the rectangular grooves is the same as the extending direction of the cathode 201, the plurality of rectangular grooves are not parallel to each other, the depth of each rectangular groove is 3mm, and the width of each rectangular groove is 1 mm.
Example four:
as shown in fig. 4, in this embodiment, a plurality of grooves 204-1 are formed on the shock wave suppression surface 204 disposed on the cathode 201, the grooves 204-1 are rectangular grooves, the extending direction of the rectangular grooves is perpendicular to the extending direction of the cathode 201, the plurality of rectangular grooves are parallel to each other, the depth of each rectangular groove is 2mm, and the width of each rectangular groove is 0.8 mm.
Example five:
as shown in fig. 5, in this embodiment, a plurality of grooves 204-1 are formed in the shock wave suppression surface 204 disposed on the cathode 201, the grooves 204-1 are wedge-shaped grooves, the wedge-shaped grooves are formed by irregular wedge splitting, the extending direction of the wedge-shaped grooves is the same as the extending direction of the cathode 201, the plurality of wedge-shaped grooves are parallel to each other, the depth of the wedge-shaped grooves is 1.5mm, and the bottom angle of the cross section of the wedge-shaped groove is an acute angle or an obtuse angle, which cannot be a right angle. Because when the angle is a right angle, the shock wave is returned in the original direction.
The plurality of grooves of the present application may also be arranged in different extending directions, such as staggered horizontally and vertically.
The anode and cathode in the above embodiments of the present application are preferably strip-shaped electrodes; the extending direction of the plurality of grooves is the same as or perpendicular to the extending direction of the strip-shaped electrodes. Wherein the plurality of grooves are parallel or non-parallel to each other; the depth of each groove is any value between 0.5mm and 3mm, and the width of each groove is any value between 0.1mm and 1 mm; the shape of the groove is one or more of a rectangular groove, a wedge-shaped groove, a dovetail groove and a T-shaped groove, and when the groove is the wedge-shaped groove, the section bottom angle of the wedge-shaped groove is an acute angle or an obtuse angle and cannot be a right angle. When the angle is a right angle, the shock wave is returned in the original direction.
Preferably, the depth of the groove may be set to be deeper as the groove is closer to the discharge region; this provides a better shock wave absorption.
Preferably, the grooves have the same depth or width, so that the processing is convenient.
The above-mentioned embodiments are only specific embodiments of the present application, but the scope of the present application is not limited thereto, and any person skilled in the art can easily conceive various equivalent modifications, substitutions and improvements within the technical scope of the present application, and these modifications, substitutions and improvements should be covered by the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010173428.1A CN113394648A (en) | 2020-03-13 | 2020-03-13 | Gas laser electrode and gas laser |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010173428.1A CN113394648A (en) | 2020-03-13 | 2020-03-13 | Gas laser electrode and gas laser |
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| CN113394648A true CN113394648A (en) | 2021-09-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010173428.1A Pending CN113394648A (en) | 2020-03-13 | 2020-03-13 | Gas laser electrode and gas laser |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0883945A (en) * | 1994-09-12 | 1996-03-26 | Toshiba Corp | Excimer laser oscillator |
| EP1020887A2 (en) * | 1995-03-14 | 2000-07-19 | Osram Sylvania Inc. | Discharge device |
| US20020051478A1 (en) * | 2000-06-09 | 2002-05-02 | Morton Richard G. | Discharge laser with porous insulating layer covering anode discharge surface |
| US20040066827A1 (en) * | 2001-09-13 | 2004-04-08 | Steiger Thomas D. | Cathodes for fluorine gas discharge lasers |
| EP2259390A1 (en) * | 2003-07-29 | 2010-12-08 | Cymer, Inc. | Gas discharge laser electrode |
| TW201112304A (en) * | 2003-07-29 | 2011-04-01 | Cymer Inc | Halogen gas discharge laser electrodes |
| CN105655855A (en) * | 2016-02-26 | 2016-06-08 | 中国科学院光电研究院 | Sound wave and shock wave control device |
| CN211579184U (en) * | 2020-03-13 | 2020-09-25 | 北京科益虹源光电技术有限公司 | Gas laser electrode and gas laser |
-
2020
- 2020-03-13 CN CN202010173428.1A patent/CN113394648A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0883945A (en) * | 1994-09-12 | 1996-03-26 | Toshiba Corp | Excimer laser oscillator |
| EP1020887A2 (en) * | 1995-03-14 | 2000-07-19 | Osram Sylvania Inc. | Discharge device |
| US20020051478A1 (en) * | 2000-06-09 | 2002-05-02 | Morton Richard G. | Discharge laser with porous insulating layer covering anode discharge surface |
| US20040066827A1 (en) * | 2001-09-13 | 2004-04-08 | Steiger Thomas D. | Cathodes for fluorine gas discharge lasers |
| EP2259390A1 (en) * | 2003-07-29 | 2010-12-08 | Cymer, Inc. | Gas discharge laser electrode |
| TW201112304A (en) * | 2003-07-29 | 2011-04-01 | Cymer Inc | Halogen gas discharge laser electrodes |
| CN105655855A (en) * | 2016-02-26 | 2016-06-08 | 中国科学院光电研究院 | Sound wave and shock wave control device |
| CN211579184U (en) * | 2020-03-13 | 2020-09-25 | 北京科益虹源光电技术有限公司 | Gas laser electrode and gas laser |
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