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CN113308682A - Metal coating structure and preparation method - Google Patents

Metal coating structure and preparation method Download PDF

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Publication number
CN113308682A
CN113308682A CN202110580682.8A CN202110580682A CN113308682A CN 113308682 A CN113308682 A CN 113308682A CN 202110580682 A CN202110580682 A CN 202110580682A CN 113308682 A CN113308682 A CN 113308682A
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China
Prior art keywords
metal
coating
transition layer
metal substrate
preparation
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CN202110580682.8A
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Chinese (zh)
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CN113308682B (en
Inventor
袁战伟
臧顺来
刘欢
何光宇
柴艳
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Xian Jiaotong University
Changan University
Air Force Engineering University of PLA
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Xian Jiaotong University
Changan University
Air Force Engineering University of PLA
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

The invention discloses a metal coating structure and a preparation method thereof, wherein the structure comprises a metal substrate, a metal transition layer and a coating; the metal matrix is sequentially covered with the metal transition layer and the coating from inside to outside, the coating is provided with a reticular structure seam, the upper surface and the lower surface of the coating are penetrated through by the reticular structure seam, and the reticular structure seam is filled with resin materials. The preparation process comprises the steps of firstly, forming a metal transition layer on the surface of a metal matrix by adopting a plasma deposition technology; paving a coating on the metal transition layer; and processing reticular structure seams on the surface of the coating, wherein the upper surface and the lower surface of the coating are penetrated through by the reticular structure seams, and the reticular structure seams are filled with resin materials. The fatigue resistance of the material is improved.

Description

Metal coating structure and preparation method
Technical Field
The invention belongs to the field of coating and modification of metal material surfaces, and relates to a metal coating structure and a preparation method thereof.
Background
The titanium alloy, the nickel-based alloy and other metal materials are widely applied in the aerospace direction due to the excellent comprehensive performance, however, the erosion and abrasion effect causes the surface of the metal structural parts to be damaged in the service process, thereby causing premature failure. The coating with the characteristics of wear resistance and erosion resistance is formed on the metal surface by other preparation processes such as chemical (physical) vapor deposition, electroplating, thermal spraying and the like, so that the erosion resistance of the metal material is improved. Because the metal base material and the coating material are used as two materials, the bonding strength is limited, so that the fatigue resistance of the metal material with the coating is reduced.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a metal coating structure and a preparation method thereof, so that the fatigue resistance of a material is improved.
In order to achieve the purpose, the invention adopts the following technical scheme to realize the purpose:
a metal coating structure comprises a metal substrate, a metal transition layer and a coating;
the metal matrix is sequentially covered with the metal transition layer and the coating from inside to outside, the coating is provided with a reticular structure seam, the upper surface and the lower surface of the coating are penetrated through by the reticular structure seam, and the reticular structure seam is filled with resin materials.
Preferably, the metal matrix is an alloy of one or more of Al, Mg, Cu, Ti, Ni, Fe, Au, and Ag.
Preferably, the hardness and strength of the coating are both higher than the hardness and strength of the metal substrate.
Preferably, the resin material is epoxy resin.
A method for preparing a metal coating based on the structure of any one of the above items, comprising the steps of;
step one, forming a metal transition layer on the surface of a metal matrix by adopting a deposition technology;
secondly, paving a coating on the metal transition layer;
and step three, processing the surface of the coating into a reticular structure seam, wherein the reticular structure seam penetrates through the upper surface and the lower surface of the coating, and the reticular structure seam is filled with a resin material.
Preferably, prior to step one, the metal substrate is surface treated.
Further, the surface treatment process comprises the following steps: firstly, cleaning oil stain on the surface of a metal matrix by using acetone; soaking the surface of the metal matrix cleaned by acetone in a 2% NaOH solution for 30 minutes, then washing with deionized water and drying; and cleaning the surface of the metal matrix by using a steel wire brush to expose fresh metal on the surface.
Preferably, in the step one, the formation process of the metal transition layer is as follows: putting the metal matrix subjected to surface treatment into a vacuum chamber of plasma deposition equipment, introducing argon gas to ensure that the pressure of the vacuum chamber is 1-1.3 Pa, adopting a plasma deposition technology, wherein the voltage of the metal matrix is-100 to-300V, the Ti cathode current is 35-55A, and the preparation time is 3-8 min, so as to form a metal transition layer on the surface of the metal matrix.
Preferably, the forming process of the coating is as follows: on the basis of forming the metal transition layer, introducing nitrogen into the vacuum chamber, adopting a plasma deposition technology, controlling the voltage of a metal matrix to be-30 to-120V, controlling the Ti cathode current to be 35 to 55A, and controlling the preparation time to be 30 to 40min, thereby forming a TiN coating on the metal transition layer.
Preferably, the surface of the coating is cut by a metal cutter or a femtosecond laser technology to form the mesh-structured seam.
Compared with the prior art, the invention has the following beneficial effects:
according to the invention, the coating is divided into the structural seams, then the structural seams are filled with the resin material with stronger deformability, when the material generates cracks, the resin material in the structural seams is encountered, as the resin material has better plasticity, when the metal material generates cracks in service, the cracks encounter the structural seams, and the resin material in the seams hinders the cracks from expanding because of the larger deformability, so that the fatigue resistance of the material is improved, and the fatigue resistance of the material is better than that of the material without division of the structural seams.
Furthermore, the erosion resistance of the metal material is improved due to the existence of the surface hard coating layer of the metal material by pretreating the surface of the metal material and then depositing the hard coating layer with a certain thickness on the surface of the metal material.
Drawings
FIG. 1 is a schematic view of the structure of a metal coating according to the present invention;
FIG. 2 is a flow chart of the preparation of the present invention.
Wherein: 1-a metal matrix; 2-a metal transition layer; 3-coating; 4-resin material.
Detailed Description
The invention is described in further detail below with reference to the accompanying drawings:
as shown in fig. 1, the metal coating structure according to the present invention includes a metal substrate 1, a metal transition layer 2 and a coating layer 3.
The metal matrix 1 is sequentially covered with the metal transition layer 2 and the coating 3 from inside to outside, the coating 3 is provided with a reticular structure seam, the upper surface and the lower surface of the coating 3 are penetrated through by the reticular structure seam, and the reticular structure seam is filled with the resin material 4.
The metal matrix 1 is an alloy composed of one or more of Al, Mg, Cu, Ti, Ni, Fe, Au and Ag. The coating 3 is a TiN coating or other hard coatings, and the hardness and the strength of the coating 3 are higher than those of the metal matrix 1. The resin material 4 is a resin material such as epoxy resin.
As shown in fig. 2, in order to prepare the metal coating according to the present invention, a surface-treated metal sheet is taken, and a plasma deposition technique is employed to form a metal transition layer 2 on the surface of the metal sheet, and then a coating layer 3 is formed on the metal transition layer 2, so as to obtain the metal sheet with erosion resistance. And then, dividing the structural gap of the coating 3 region on the metal sheet, and filling a resin material 4 into the gap in the structural gap, so that the metal sheet has the characteristics of erosion resistance and fatigue resistance.
The surface treatment comprises the following steps: 1. firstly, cleaning oil stains on the surface of a metal sheet by using acetone; 2. soaking the surface of the material cleaned by acetone in alkali liquor (soaking in 2% NaOH solution for 30 minutes), then washing with deionized water and drying; 3. and cleaning the surface by a steel wire brush to expose fresh metal on the surface.
The metal sheet can be an alloy formed by one or more of Al, Mg, Cu, Ti, Ni, Fe, Au and Ag according to the requirements of material performance and characteristics.
The forming steps of the metal transition layer 2 are as follows: placing the surface-treated metal sheet into a vacuum chamber of plasma deposition equipment, introducing argon gas to ensure that the pressure of the vacuum chamber is 1-1.3 Pa, adopting a plasma deposition technology, wherein the voltage of the metal sheet is-100 to-300V, the Ti cathode current is 35-55A, and the preparation time is 3-8 min, so as to form a metal transition layer 2 on the surface of the metal sheet.
The forming steps of the coating 3 are as follows: on the basis of forming the metal transition layer 2, introducing nitrogen into the vacuum chamber, continuously adopting a plasma deposition technology, controlling the voltage of the metal sheet to be-30 to-120V, controlling the Ti cathode current to be 35 to 55A, and controlling the preparation time to be 30 to 40min, thereby forming a thicker TiN coating on the metal transition layer 2.
The structure seam is divided, the surface of the coating 3 is cut through a metal cutting machine or a femtosecond laser technology to form regular structure seams, the length, the width and the depth of each single structure seam are adjustable, the upper surface and the lower surface of the coating 3 can be penetrated through the net-shaped structure seams, and the resin material 4 is filled in the net-shaped structure seams.
And the gaps in the structural seams are filled with resin materials 4, after the structural seams on the surface of the coating 3 are divided, certain gaps are formed in the seams, and epoxy resin materials or other materials with strong deformability are filled in the gaps.
The metal sheet can also be selected from other shapes such as a blade and other metal materials according to actual requirements, and other preparation processes can still be generated for the preparation of the coating 3 except the plasma deposition technology. The division of the structural joint in the coating 3 region, the shape, size, thickness and the like of the structural joint can be regulated and controlled according to service requirements. The resin material 4 filled in the structural joint may be selected from other materials having a strong deformability.
Example 1
Ti6Al4V alloy is used as raw material to prepare titanium alloy material with erosion resistance and fatigue resistance.
Firstly, taking a Ti6Al4V alloy plate with the length, width and thickness of 60 multiplied by 20 multiplied by 4mm, treating the surface of the alloy plate, cleaning oil stains on the surface of the alloy plate by adopting acetone, soaking the surface of the material cleaned by the acetone in alkali liquor for 30 minutes, washing and drying by using deionized water, and finally cleaning the surface by using a steel wire brush to expose fresh metal on the surface. Then, the metal sheet after surface treatment is placed into a vacuum chamber of plasma deposition equipment, argon is introduced to ensure that the pressure in the vacuum chamber is 1Pa, the plasma deposition technology is adopted, the voltage of the metal sheet is-100V, the Ti cathode current is 35A, the preparation time is 3min, and a metal transition layer 2 is formed on the surface of the metal sheet. On the basis of forming the metal transition layer 2, introducing nitrogen into the vacuum chamber, continuously adopting a plasma deposition technology, controlling the voltage of the metal sheet to be-30V, controlling the Ti cathode current to be 35A, controlling the preparation time to be 30min, and forming a thicker TiN coating on the metal transition layer 2. Adopt gravel to strike the metal sheet, impact angle is 90, and the time is 15min, the erosion resistance performance of test material adopts high frequency fatigue testing machine, and the biggest tensile stress is 400MPa, and stress ratio r is 0.1, and the frequency is 100 HZ's sinusoidal stress and draws-draw fatigue test, the fatigue resistance performance of test material. The weight loss of the Ti6Al4V alloy plate is 16.3g, and the fatigue life is 7 x 105Next, the weight loss of the Ti6Al4V alloy sheet on which TiN was formed was measured to be 10.1g, and the fatigue life was measured to be 5X 105Next, formation of TiN and erosion resistance of the material can be seenThe performance is improved by 38 percent, the fatigue resistance is reduced by 28.5 percent, and the erosion resistance of the metal material is improved at the moment, but the fatigue resistance is reduced relative to that of the Ti6Al4V alloy.
Dividing a structural seam in a coating 3 area of Ti6Al4V alloy material deposited by plasma by using a metal cutting machine to obtain the structural seam with certain length, width and thickness, filling an epoxy resin material in the seam of the structural seam, and measuring the weight loss of 12.3g and the fatigue life of 6.5 x 105And secondly, compared with a Ti6Al4V alloy material, the erosion resistance is improved by 24.5%, the fatigue resistance is reduced by 7.1%, the influence is small, and compared with the structure seam division of the coating 3 region, the fatigue resistance is improved.
Example 2
Ti6Al4V alloy is used as raw material to prepare titanium alloy material with erosion resistance and fatigue resistance.
Firstly, taking a Ti6Al4V alloy plate with the length, width and thickness of 60 multiplied by 20 multiplied by 4mm, treating the surface of the alloy plate, cleaning oil stains on the surface of the alloy plate by adopting acetone, soaking the surface of the material cleaned by the acetone in alkali liquor for 30 minutes, washing and drying by using deionized water, and finally cleaning the surface by using a steel wire brush to expose fresh metal on the surface. Then, the metal sheet after surface treatment is placed into a vacuum chamber of plasma deposition equipment, argon is introduced to ensure that the pressure in the vacuum chamber is 1.2Pa, the plasma deposition technology is adopted, the voltage of the metal sheet is-200V, the Ti cathode current is 45A, the preparation time is 5min, and a metal transition layer 2 is formed on the surface of the metal sheet. On the basis of forming the metal transition layer 2, introducing nitrogen into the vacuum chamber, continuously adopting a plasma deposition technology, controlling the voltage of the metal sheet to be-80V, controlling the Ti cathode current to be 45A, controlling the preparation time to be 35min, and forming a thicker TiN coating on the metal transition layer 2. And (3) processing the surface of the coating 3 into a net-shaped structure seam by adopting a femtosecond laser technology, wherein the net-shaped structure seam penetrates through the upper surface and the lower surface of the coating 3, and a resin material 4 is filled in the net-shaped structure seam.
Example 3
Ti6Al4V alloy is used as raw material to prepare titanium alloy material with erosion resistance and fatigue resistance.
Firstly, taking a Ti6Al4V alloy plate with the length, width and thickness of 60 multiplied by 20 multiplied by 4mm, treating the surface of the alloy plate, cleaning oil stains on the surface of the alloy plate by adopting acetone, soaking the surface of the material cleaned by the acetone in alkali liquor for 30 minutes, washing and drying by using deionized water, and finally cleaning the surface by using a steel wire brush to expose fresh metal on the surface. Then, the metal sheet after surface treatment is placed into a vacuum chamber of plasma deposition equipment, argon is introduced to ensure that the pressure in the vacuum chamber is 1.3Pa, the plasma deposition technology is adopted, the voltage of the metal sheet is-300V, the Ti cathode current is 55A, the preparation time is 8min, and a metal transition layer 2 is formed on the surface of the metal sheet. On the basis of forming the metal transition layer 2, introducing nitrogen into the vacuum chamber, continuously adopting a plasma deposition technology, controlling the voltage of the metal sheet to be-120V, controlling the Ti cathode current to be 55A, controlling the preparation time to be 40min, and forming a thicker TiN coating on the metal transition layer 2. And (3) processing the surface of the coating 3 into a reticular structure seam by adopting a femtosecond laser technology, wherein the upper surface and the lower surface of the coating 3 are not penetrated through by the reticular structure seam, and a resin material 4 is filled in the reticular structure seam.
The above-mentioned contents are only for illustrating the technical idea of the present invention, and the protection scope of the present invention is not limited thereby, and any modification made on the basis of the technical idea of the present invention falls within the protection scope of the claims of the present invention.

Claims (10)

1.一种金属涂层结构，其特征在于，包括金属基体(1)、金属过渡层(2)和涂层(3)；1. A metal coating structure, characterized in that it comprises a metal substrate (1), a metal transition layer (2) and a coating (3); 金属基体(1)上由内向外依次覆盖金属过渡层(2)和涂层(3)，涂层(3)上设置有网状结构缝，网状结构缝将涂层(3)上下表面贯穿，网状结构缝内填充树脂材料(4)。The metal substrate (1) is sequentially covered with a metal transition layer (2) and a coating layer (3) from the inside to the outside, the coating layer (3) is provided with a mesh structure slot, and the mesh structure slot penetrates the upper and lower surfaces of the coating layer (3) , and the mesh structure is filled with resin material (4). 2.根据权利要求1所述的金属涂层结构，其特征在于，金属基体(1)采用Al、Mg、Cu、Ti、Ni、Fe、Au、Ag中的一种或多种构成的合金。2 . The metal coating structure according to claim 1 , wherein the metal matrix ( 1 ) adopts an alloy composed of one or more of Al, Mg, Cu, Ti, Ni, Fe, Au, and Ag. 3 . 3.根据权利要求1所述的金属涂层结构，其特征在于，涂层(3)的硬度和强度均高于金属基体(1)的硬度和强度。3 . The metal coating structure according to claim 1 , wherein the hardness and strength of the coating ( 3 ) are higher than those of the metal substrate ( 1 ). 4 . 4.根据权利要求1所述的金属涂层结构，其特征在于，树脂材料(4)采用环氧树脂。4. The metal coating structure according to claim 1, wherein the resin material (4) is epoxy resin. 5.一种基于权利要求1-4任意一项所述结构的金属涂层制备方法，其特征在于，包括以下步骤；5. A method for preparing a metal coating based on the structure of any one of claims 1-4, characterized in that, comprising the following steps; 步骤一，采用沉积技术在金属基体(1)表面形成金属过渡层(2)；Step 1, using deposition technology to form a metal transition layer (2) on the surface of the metal substrate (1); 步骤二，在金属过渡层(2)上铺覆涂层(3)；Step 2, spread coating (3) on the metal transition layer (2); 步骤三，将涂层(3)表面加工出网状结构缝，网状结构缝将涂层(3)上下表面贯穿，在网状结构缝内填充有树脂材料(4)。In step 3, the surface of the coating (3) is processed into a mesh structure slot, the mesh structure slot penetrates the upper and lower surfaces of the coating layer (3), and the mesh structure slot is filled with a resin material (4). 6.根据权利要求5所述的金属涂层制备方法，其特征在于，在步骤一之前，对金属基体(1)进行表面处理。6. The method for preparing a metal coating according to claim 5, characterized in that, before step 1, the metal substrate (1) is subjected to surface treatment. 7.根据权利要求6所述的金属涂层制备方法，其特征在于，表面处理的过程为：首先使用丙酮清洗金属基体(1)表面油污；将丙酮清洗后的金属基体(1)表面在浓度为2％的NaOH溶液中浸泡30分钟，然后用去离子水冲洗并烘干；再用钢丝刷清洗金属基体(1)表面，露出表面新鲜金属。7. metal coating preparation method according to claim 6, is characterized in that, the process of surface treatment is: at first use acetone to clean the oil stain on the metal substrate (1) surface; the metal substrate (1) surface after acetone cleaning is at the concentration Soak in 2% NaOH solution for 30 minutes, then rinse with deionized water and dry; then use a wire brush to clean the surface of the metal substrate (1) to expose fresh metal on the surface. 8.根据权利要求5所述的金属涂层制备方法，其特征在于，步骤一中，金属过渡层(2)的形成过程为：将经过表面处理的金属基体(1)放入等离子体沉积设备的真空室中，通入氩气，使得真空室压力为1～1.3Pa，采用等离子体沉积技术，金属基体(1)电压为-100～-300V，Ti阴极电流为35～55A，制备时间为3～8min，在金属基体(1)表面形成金属过渡层(2)。8. The metal coating preparation method according to claim 5, wherein in step 1, the formation process of the metal transition layer (2) is: placing the surface-treated metal substrate (1) into a plasma deposition device In the vacuum chamber, argon gas was introduced to make the vacuum chamber pressure 1-1.3Pa, the plasma deposition technology was used, the voltage of the metal substrate (1) was -100--300V, the Ti cathode current was 35-55A, and the preparation time was For 3 to 8 minutes, a metal transition layer (2) is formed on the surface of the metal substrate (1). 9.根据权利要求5所述的金属涂层制备方法，其特征在于，涂层(3)的形成过程为：在形成金属过渡层(2)的基础上，向真空室通入氮气，采用等离子体沉积技术，金属基体(1)电压为-30～-120V，Ti阴极电流为35～55A，制备时间为30～40min，在金属过渡层(2)上面形成TiN涂层。9. The metal coating preparation method according to claim 5, wherein the formation process of the coating (3) is: on the basis of forming the metal transition layer (2), feeding nitrogen into the vacuum chamber, using plasma The bulk deposition technology, the metal substrate (1) voltage is -30--120V, the Ti cathode current is 35-55A, the preparation time is 30-40min, and a TiN coating is formed on the metal transition layer (2). 10.根据权利要求5所述的金属涂层制备方法，其特征在于，采用金属切割机或飞秒激光技术对涂层(3)表面进行切割，形成网状结构缝。10 . The method for preparing a metal coating according to claim 5 , wherein a metal cutting machine or a femtosecond laser technology is used to cut the surface of the coating ( 3 ) to form a mesh structure seam. 11 .
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CN86101055A (en) * 1986-02-05 1987-10-14 青岛化工学院 Ceramic lined retort and basin
JPH05106016A (en) * 1991-10-09 1993-04-27 Ishikawajima Harima Heavy Ind Co Ltd Ceramic coat powder and method for coating base material using the ceramic coat powder
CN1134988A (en) * 1995-05-04 1996-11-06 机械工业部武汉材料保护研究所 Method for reparing coating enamel
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