[go: up one dir, main page]

CN113213523A - Nano cerium oxide powder with high cutting efficiency and preparation method thereof - Google Patents

Nano cerium oxide powder with high cutting efficiency and preparation method thereof Download PDF

Info

Publication number
CN113213523A
CN113213523A CN202110726937.7A CN202110726937A CN113213523A CN 113213523 A CN113213523 A CN 113213523A CN 202110726937 A CN202110726937 A CN 202110726937A CN 113213523 A CN113213523 A CN 113213523A
Authority
CN
China
Prior art keywords
cerium oxide
oxide powder
cutting efficiency
powder
high cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110726937.7A
Other languages
Chinese (zh)
Inventor
张海涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangxi Lizhiyi New Material Co ltd
Original Assignee
Guangxi Lizhiyi New Material Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangxi Lizhiyi New Material Co ltd filed Critical Guangxi Lizhiyi New Material Co ltd
Priority to CN202110726937.7A priority Critical patent/CN113213523A/en
Publication of CN113213523A publication Critical patent/CN113213523A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00Compounds of rare earth metals
    • C01F17/20Compounds containing only rare earth metals as the metal element
    • C01F17/206Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224Oxides or hydroxides of lanthanides
    • C01F17/235Cerium oxides or hydroxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00Compounds of rare earth metals
    • C01F17/10Preparation or treatment, e.g. separation or purification
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/03Particle morphology depicted by an image obtained by SEM
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Analytical Chemistry (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Abstract

The invention discloses a nano cerium oxide powder with high cutting efficiency and a preparation method thereof, which is characterized by comprising the following steps: a. adding a certain amount of organic acid into water for dissolving, adding insoluble cerium salt into a solution of the organic acid and the water, and performing ball milling or sand milling to obtain uniformly dispersed slurry; b. drying the slurry obtained in the step a in a flash evaporation mode to obtain dry, uniform and fine powder; c. b, calcining the powder obtained in the step b to obtain the powder; the organic acid in the step a is citric acid. Compared with the prior art, the nano cerium oxide powder prepared by the method has the advantages of about 100nm of particle size, narrow particle size distribution, edge angle appearance and higher cutting efficiency, and further can effectively improve the polishing rate.

Description

Nano cerium oxide powder with high cutting efficiency and preparation method thereof
Technical Field
The invention relates to the technical field of surface polishing treatment, in particular to 100 nm-grade cerium oxide powder and a preparation method thereof.
Background
Chemical Mechanical Polishing (CMP) is a technique for achieving planarization by chemical and mechanical action of a polishing liquid, and is used for planarization of surfaces including glass, spectacles, or semiconductor lenses. Polishing solutions for planarizing or polishing the surface of a substrate are well known in the art and typically include an abrasive in an aqueous solution. Abrasives known in the art include cerium oxide, silicon oxide, aluminum oxide, zirconium oxide, tin oxide, and the like. The polishing solution containing the rare earth polishing powder has the advantages of high polishing speed and high precision. Since the rare earth polishing powder was invented in the last 40 th century, the production capacity and the amount of the rare earth polishing powder were gradually increased. In recent years, with rapid development of optical and information industries, liquid crystal displays, light emitting devices, optical elements, and the like have been increasingly demanded for polishing powders, and the requirements for polishing precision and polishing rate have been increasingly high.
At present, in practical polishing applications, traditional inorganic abrasives such as alumina and silica are mainly used, and the polishing rate of the traditional inorganic abrasives cannot well meet industrial requirements. In the existing technology of grafting an organic core-shell structure on the surface of part of traditional inorganic abrasive materials, the dispersibility is improved by reducing the hardness of the inorganic abrasive materials, but the organic materials are inert systems and cannot react with the surface of a substrate well, so that the polishing efficiency cannot be effectively improved.
Among rare earth polishing materials, cerium oxide (CeO)2) The abrasive particles have controllable heterogeneous material selective removal characteristics, and are widely applied to the chemical mechanical polishing process of integrated circuit dielectric materials. Compared with the traditional abrasive grains such as silicon oxide, aluminum oxide and the like, the cerium oxide abrasive grain has the greatest characteristic of having both mechanical grinding effect and chemical reaction activity. CeO (CeO)2Having fluorite type atomic arrangement and surface with Ce3+And may be reacted with Ce4+And (4) mutual transformation. CeO (CeO)2Ce of the surface3+The interaction between the CeO2 and the hydration layer on the surface of the medium material can be improved, thereby improving the polishing rate.
A Chinese patent application with publication number CN109734121A discloses a preparation method of nano cerium oxide for polishing silicon wafers, which comprises the following steps: a. adding a certain amount of silicate into water, stirring and dissolving, adding insoluble cerium salt into a solution of the silicate and the water, and performing ball milling to obtain uniformly dispersed slurry; b. drying the slurry obtained in the step a in a flash evaporation mode to obtain dry, uniform and fine powder; c. and c, calcining the powder obtained in the step b to obtain the catalyst. The invention has the advantages of simple process, low requirement on equipment, easy absorption and treatment of tail gas, low production cost, particle size of 100-120nm, narrow particle size distribution, easy dispersion and the like. However, the cerium oxide prepared in this patent has a spherical or spheroidal surface morphology and is still not high enough in cutting efficiency for polishing the surface of a substrate.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide a method for preparing nano-scale cerium oxide powder with edge angle appearance and higher cutting efficiency.
In order to achieve the purpose, the invention adopts the following technical scheme.
A method for preparing nano-scale cerium oxide powder with high cutting efficiency is characterized by comprising the following steps: a. adding a certain amount of organic acid into water for dissolving, adding insoluble cerium salt into a solution of the organic acid and the water, and performing ball milling or sand milling to obtain uniformly dispersed slurry; b. drying the slurry obtained in the step a in a flash evaporation mode to obtain dry, uniform and fine powder; c. b, calcining the powder obtained in the step b to obtain the powder; the organic acid in the step a is citric acid.
In some embodiments, the cerium salt in step a is cerium carbonate or cerium oxalate;
in some embodiments, the mass ratio of the organic acid to the cerium salt in step a is 0.03-0.2: 1.
in some embodiments, the ball milling and sand milling method used in step a is planetary ball milling or vertical sand milling.
In some embodiments, in step c, the equipment used for calcination is a muffle furnace, a tube furnace, a shuttle kiln, a pusher kiln, a rotary kiln, a suspension calciner, or the like.
In some embodiments, in step c, the temperature of calcination is 600 to 1000 ℃, and the time of calcination is 30 to 60 min.
The present invention also provides a nano-sized cerium oxide powder having high cutting efficiency, which is characterized by being prepared by the above-mentioned preparation method, and having a particle size of 100nm level.
The invention has the beneficial effects that: compared with the prior art, the nano cerium oxide powder prepared by the method has the advantages of about 100nm of particle size, narrow particle size distribution, edge angle appearance and higher cutting efficiency, and further can effectively improve the polishing rate. The practical production proves that compared with the existing spherical or sphere-like cerium oxide powder, the nano-scale cerium oxide powder provided by the invention can improve the polishing rate by more than 40% under the condition of keeping other experimental conditions unchanged.
Drawings
FIG. 1 is a scanning electron microscope image of nano-sized cerium oxide powder prepared in example 1 of the present invention.
FIG. 2 is a scanning electron microscope image of the nano-sized cerium oxide powder prepared in example 2 of the present invention.
FIG. 3 is a scanning electron microscope image of the nano-sized cerium oxide powder prepared in example 3 of the present invention.
FIG. 4 is a scanning electron microscope image of the nano-sized cerium oxide powder prepared in example 4 of the present invention.
FIG. 5 is a scanning electron microscope image of the nano-sized cerium oxide powder prepared in example 5 of the present invention.
FIG. 6 is a scanning electron microscope image of the nano-sized cerium oxide powder prepared in example 6 of the present invention.
Detailed Description
The following further describes embodiments of the present invention in conjunction with the drawings of the specification. The embodiments described below are exemplary and are intended to be illustrative of the invention, but are not to be construed as limiting the invention.
Example 1
A method for preparing nano-scale cerium oxide powder with high cutting efficiency is characterized by comprising the following steps:
(1) 1g of citric acid was dissolved with ultrapure water under stirring.
(2) And mixing 10g of cerium carbonate with the solution obtained in the previous step, performing ball milling to obtain dispersed slurry, and further performing flash evaporation to obtain dried and uniform mixture powder. Preferably, the ball milling mode is planetary ball milling.
(3) Placing the mixture powder into a ceramic crucible, placing into a muffle furnace, calcining at 800 ℃, and keeping the temperature for 60 min; cooling to room temperature along with the furnace.
(4) Calcining and sintering to obtain cerium oxide powder with particle size of about 100nm and angular appearance, and scanning electron microscope image thereof is shown in figure 1.
Example 2
A method for preparing nano-scale cerium oxide powder with high cutting efficiency is characterized by comprising the following steps:
(1) 0.3g of citric acid was dissolved with ultrapure water under stirring.
(2) 10g of cerium carbonate was mixed with the solution obtained in the previous step, and a dispersed slurry was obtained by sand milling, and further by flash evaporation, a dried and uniform mixture powder was obtained. Preferably, the sanding mode is vertical sanding.
(3) Placing the mixture powder into a ceramic crucible, placing into a tube furnace, calcining at 600 deg.C, and maintaining for 60 min; cooling to room temperature along with the furnace.
(4) Calcining and sintering to obtain cerium oxide powder with particle size of about 100nm and angular appearance, and scanning electron microscope image of the cerium oxide powder is shown in FIG. 2.
Example 3
(1) 2g of citric acid was dissolved by stirring with ultrapure water.
(2) And mixing 10g of cerium carbonate with the solution obtained in the previous step, performing ball milling to obtain dispersed slurry, and further performing flash evaporation to obtain dried and uniform mixture powder. Preferably, the ball milling mode is planetary ball milling.
(3) Placing the mixture powder in a ceramic crucible, placing the ceramic crucible in a shuttle kiln, calcining at 1000 ℃, and keeping the temperature for 30 min; cooling to room temperature along with the furnace.
(4) Calcining and sintering to obtain cerium oxide powder with particle size of about 100nm and angular appearance, and scanning electron microscope image thereof is shown in FIG. 3.
Example 4
A method for preparing nano-scale cerium oxide powder with high cutting efficiency is characterized by comprising the following steps:
(1) 0.8g of citric acid was dissolved with ultrapure water under stirring.
(2) 10g of cerium oxalate was mixed with the solution obtained in the previous step, and a well dispersed slurry was obtained by sand milling, and further dried and uniform mixture powder was obtained by flash evaporation. Preferably, the sanding mode is vertical sanding.
(3) Placing the mixture powder in a ceramic crucible, placing the ceramic crucible in a pushed slab kiln, calcining at 800 ℃, and keeping the temperature for 50 min; cooling to room temperature along with the furnace.
(4) Calcining and sintering to obtain cerium oxide powder with particle size of about 100nm and angular appearance, and scanning electron microscope image thereof is shown in FIG. 4.
Example 5
A method for preparing nano-scale cerium oxide powder with high cutting efficiency is characterized by comprising the following steps:
(1) 1.5g of citric acid was dissolved with ultrapure water under stirring.
(2) And mixing 10g of cerium oxalate with the solution obtained in the previous step, performing ball milling to obtain dispersed slurry, and further performing flash evaporation to obtain dried and uniform mixture powder. Preferably, the ball milling mode is planetary ball milling.
(3) Placing the mixture powder in a ceramic crucible, placing in a rotary kiln, calcining at 600 deg.C, and maintaining for 45 min; cooling to room temperature along with the furnace.
(4) The cerium oxide powder with the particle size of about 100nm and angular appearance can be obtained after calcination, and a scanning electron microscope image of the cerium oxide powder is shown in fig. 5.
Example 6
A method for preparing nano-scale cerium oxide powder with high cutting efficiency is characterized by comprising the following steps:
(1) 2g of citric acid was dissolved by stirring with ultrapure water.
(2) 10g of cerium oxalate was mixed with the solution obtained in the previous step, and a well dispersed slurry was obtained by sand milling, and further dried and uniform mixture powder was obtained by flash evaporation. Preferably, the sanding mode is vertical sanding.
(3) Placing the mixture powder into a ceramic crucible, and placing the ceramic crucible into a suspension calciner, wherein the calcination temperature is 1000 ℃, and the heat preservation time is 30 min; cooling to room temperature along with the furnace.
(4) The cerium oxide powder with the particle size of about 100nm and angular appearance can be obtained after calcination, and a scanning electron microscope image of the cerium oxide powder is shown in fig. 6.
It will be appreciated by those skilled in the art from the foregoing description of construction and principles that the invention is not limited to the specific embodiments described above, and that modifications and substitutions based on the teachings of the art may be made without departing from the scope of the invention as defined by the appended claims and their equivalents. The details not described in the detailed description are prior art or common general knowledge.

Claims (7)

1. A method for preparing nano-scale cerium oxide powder with high cutting efficiency is characterized by comprising the following steps:
a. adding a certain amount of organic acid into water for dissolving, adding insoluble cerium salt into a solution of the organic acid and the water, and performing ball milling or sand milling to obtain uniformly dispersed slurry;
b. drying the slurry obtained in the step a in a flash evaporation mode to obtain dry, uniform and fine powder;
c. b, calcining the powder obtained in the step b to obtain the powder;
the organic acid is citric acid.
2. The method for preparing nano-sized cerium oxide powder with high cutting efficiency according to claim 1, wherein the cerium salt in the step a is cerium carbonate or cerium oxalate.
3. The method for preparing nano-sized cerium oxide powder with high cutting efficiency according to claim 1, wherein the mass ratio of the organic acid to the cerium salt in the step a is 0.03 to 0.2: 1.
4. the method for preparing nano-sized cerium oxide powder with high cutting efficiency according to claim 1, wherein the ball milling or sand milling used in the step a is planetary ball milling or vertical sand milling.
5. The method for preparing nano-sized cerium oxide powder with high cutting efficiency according to claim 1, wherein the calcination is performed in step c using a muffle furnace, a tube furnace, a shuttle kiln, a pusher kiln, a rotary kiln or a suspension calciner.
6. The method for preparing nano-sized cerium oxide powder with high cutting efficiency according to claim 1, wherein the calcination temperature is 600 to 1000 ℃ and the calcination time is 30 to 60min in step c.
7. A nano-sized cerium oxide powder having high cutting efficiency, which is obtained by using any one of claims 1 to 6, and has a particle size of 100nm order.
CN202110726937.7A 2021-06-29 2021-06-29 Nano cerium oxide powder with high cutting efficiency and preparation method thereof Pending CN113213523A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110726937.7A CN113213523A (en) 2021-06-29 2021-06-29 Nano cerium oxide powder with high cutting efficiency and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110726937.7A CN113213523A (en) 2021-06-29 2021-06-29 Nano cerium oxide powder with high cutting efficiency and preparation method thereof

Publications (1)

Publication Number Publication Date
CN113213523A true CN113213523A (en) 2021-08-06

Family

ID=77081098

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110726937.7A Pending CN113213523A (en) 2021-06-29 2021-06-29 Nano cerium oxide powder with high cutting efficiency and preparation method thereof

Country Status (1)

Country Link
CN (1) CN113213523A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115140756A (en) * 2022-08-05 2022-10-04 湖南省产商品质量检验研究院 Preparation method of sphere-like nano cerium oxide

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101362605A (en) * 2008-08-11 2009-02-11 中国科学院长春应用化学研究所 A kind of preparation method of rare earth nano oxide
CN101426730A (en) * 2006-04-21 2009-05-06 日立化成工业株式会社 Method for producing oxide particle, slurry, polishing agent and method for polishing substrate
CN101608097A (en) * 2009-07-14 2009-12-23 上海华明高纳稀土新材料有限公司 Nano cerium oxide seriflux for chemical mechanical polishing and preparation method thereof
EP2194025A1 (en) * 2008-12-05 2010-06-09 Koninklijke Philips Electronics N.V. Monodisperse nanoparticles and their application
CN107739044A (en) * 2017-11-01 2018-02-27 海城海美抛光材料制造有限公司 A kind of preparation method of extra specific surface area ceria
CN108249468A (en) * 2016-12-28 2018-07-06 安集微电子科技(上海)股份有限公司 A kind of preparation method of cerium oxide crystalline and its application in chemical mechanical polishing liquid
CN109734121A (en) * 2019-03-22 2019-05-10 韦家谋 A kind of preparation method of nano-cerium oxide used for silicon wafer polishing

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101426730A (en) * 2006-04-21 2009-05-06 日立化成工业株式会社 Method for producing oxide particle, slurry, polishing agent and method for polishing substrate
CN101362605A (en) * 2008-08-11 2009-02-11 中国科学院长春应用化学研究所 A kind of preparation method of rare earth nano oxide
EP2194025A1 (en) * 2008-12-05 2010-06-09 Koninklijke Philips Electronics N.V. Monodisperse nanoparticles and their application
CN101608097A (en) * 2009-07-14 2009-12-23 上海华明高纳稀土新材料有限公司 Nano cerium oxide seriflux for chemical mechanical polishing and preparation method thereof
CN108249468A (en) * 2016-12-28 2018-07-06 安集微电子科技(上海)股份有限公司 A kind of preparation method of cerium oxide crystalline and its application in chemical mechanical polishing liquid
CN107739044A (en) * 2017-11-01 2018-02-27 海城海美抛光材料制造有限公司 A kind of preparation method of extra specific surface area ceria
CN109734121A (en) * 2019-03-22 2019-05-10 韦家谋 A kind of preparation method of nano-cerium oxide used for silicon wafer polishing

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
中国科学技术协会主编: "《2016-2017稀土科学技术学科发展报告》", 31 March 2018 *
吴婷: "氧化铈颗粒大小和形貌控制合成及其抛光性能", 《中国优秀博硕士学位论文全文数据库(硕士)工程科技Ⅰ辑》 *
周新木: "柠檬酸络盐沉淀法制备超细氧化铈", 《中国稀土学报》 *
周新木: "络合沉淀法制备超细氧化稀土粉体", 《南昌大学学报(理科版)》 *
李静等: "以大颗粒碱式碳酸铈球团为前驱体制备单分散纳米氧化铈抛光粉", 《稀土》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115140756A (en) * 2022-08-05 2022-10-04 湖南省产商品质量检验研究院 Preparation method of sphere-like nano cerium oxide

Similar Documents

Publication Publication Date Title
CN1296454C (en) Method for producing particles for use in chemical-mechanical polishing slurries and and particles produced by the method
US5697992A (en) Abrasive particle, method for producing the same, and method of use of the same
JP5090920B2 (en) Method for producing cerium oxide powder for CMP slurry and method for producing slurry composition for CMP using the same
KR100786961B1 (en) Cerium carbonate powder and manufacturing method, cerium oxide powder and method prepared therefrom, CPM slurry comprising the same
CN115058199B (en) High-dispersion ball-like nano cerium oxide polishing solution and application thereof
CN1176283A (en) Abrasive composition and use of the same
CN111566179A (en) Composition for performing material removal operations and method of forming the same
JP3602670B2 (en) Manufacturing method of cerium-based abrasive
CN113897177A (en) Composite oxide abrasive particle and preparation method thereof
CN115368826B (en) Polishing solution based on spheroidal cerium oxide abrasive particles, and preparation method and application thereof
CN113213523A (en) Nano cerium oxide powder with high cutting efficiency and preparation method thereof
CN111087235B (en) Method for preparing YAG transparent ceramic by adopting yttrium/auxiliary agent/aluminum triple core-shell structure powder
JP6694653B2 (en) Polishing agent for synthetic quartz glass substrate, manufacturing method thereof, and polishing method for synthetic quartz glass substrate
CN106675519A (en) Inorganic compound abrasive and preparation method thereof
KR20170077492A (en) Method of manufacturing cerium based complex polishing particle, the cerium based complex polishing particle thereby and slurry composition comprising the cerium based complex polishing particle
KR102660018B1 (en) Abrasive for synthetic quartz glass substrate, manufacturing method thereof, and polishing method for synthetic quartz glass substrate
CN113044873A (en) CeO for chemical mechanical polishing2Nanoparticles and method for preparing same
CN108821324B (en) Nano cerium oxide and preparation method and application thereof
WO2018223632A1 (en) Fluorescent powder particle with monodispersed core-shell structure, and manufacturing method therefor
CN116042098A (en) Nano alumina polishing solution and application thereof in polishing of infrared chalcogenide glass
CN1379803A (en) Improved CMP products
Zhang et al. A novel strategy for the synthesis of CeO 2/CeF 3 composite powders with improved suspension stability and chemical mechanical polishing (CMP) performance
CN109734121A (en) A kind of preparation method of nano-cerium oxide used for silicon wafer polishing
TWI523943B (en) A method for producing abrasive material, abrasive material and grinding method
CN116042180A (en) Preparation process of nano silicon cerium powder for polishing semiconductor monocrystalline silicon wafer

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20210806

RJ01 Rejection of invention patent application after publication