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CN113186589B - Electrochemical surface treatment method for selectively laser melting AlSi10Mg alloy heat treatment product - Google Patents

Electrochemical surface treatment method for selectively laser melting AlSi10Mg alloy heat treatment product Download PDF

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CN113186589B
CN113186589B CN202110506497.4A CN202110506497A CN113186589B CN 113186589 B CN113186589 B CN 113186589B CN 202110506497 A CN202110506497 A CN 202110506497A CN 113186589 B CN113186589 B CN 113186589B
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CN113186589A (en
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徐平
付言飞
张彬
杜耘辰
韩喜江
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Harbin Institute of Technology Shenzhen
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
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    • B33ADDITIVE MANUFACTURING TECHNOLOGY
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Abstract

一种选择性激光熔化AlSi10Mg合金热处理制品的电化学表面处理方法,本发明涉及金属材料的电化学表面精整领域。本发明要解决现有选择性激光熔化AlSi10Mg合金热处理制品表面粗糙度大,精密度低的技术问题。方法:采用NaOH和EDTA配制电解液;将AlSi10Mg合金进行打磨,酸洗;采用三电极体系进行电化学抛光。本发明通过电化学表面处理技术将选择性激光熔化AlSi10Mg合金热处理制品的粗糙度12±2μm降到3±2μm,获得了表面光滑、显现金属光泽的AlSi10Mg合金热处理样品。本发明用于AlSi10Mg合金热处理制品表面处理。

Figure 202110506497

An electrochemical surface treatment method for selective laser melting AlSi10Mg alloy heat treatment products, the invention relates to the field of electrochemical surface finishing of metal materials. The invention aims to solve the technical problems of large surface roughness and low precision of existing selective laser melting AlSi10Mg alloy heat treatment products. Methods: The electrolyte was prepared with NaOH and EDTA; the AlSi10Mg alloy was polished and pickled; the three-electrode system was used for electrochemical polishing. The invention reduces the roughness of selective laser melting AlSi10Mg alloy heat-treated products from 12±2 μm to 3±2 μm by electrochemical surface treatment technology, and obtains AlSi10Mg alloy heat-treated samples with smooth surface and metallic luster. The invention is used for surface treatment of AlSi10Mg alloy heat treatment products.

Figure 202110506497

Description

一种选择性激光熔化AlSi10Mg合金热处理制品的电化学表面 处理方法Electrochemical surface of a selective laser melting AlSi10Mg alloy heat-treated product Approach

技术领域technical field

本发明涉及金属材料的电化学表面精整领域。The invention relates to the field of electrochemical surface finishing of metal materials.

背景技术Background technique

金属材料增材制造技术,又称3D打印技术、激光快速成型技术,3D打印技术为新兴的、迅速发展的快速成型制造技术,广泛用于制造军工、航空航天、生物医学等领域的现代模型、模具和零部件等,其突出优点在于无需或少需机械加工或模具,能够直接从计算机图形数据中生成复杂结构和形状的零件,显著缩短产品的研制周期,提高原料的利用效率与生产效率,降低生产成本。Metal material additive manufacturing technology, also known as 3D printing technology, laser rapid prototyping technology, 3D printing technology is an emerging and rapidly developing rapid prototyping manufacturing technology, widely used in the manufacture of modern models, The outstanding advantages of molds and parts are that no or less machining or molds are required, and parts with complex structures and shapes can be directly generated from computer graphics data, which can significantly shorten the product development cycle and improve the utilization efficiency and production efficiency of raw materials. reduce manufacturing cost.

选择性激光熔化技术作为一种新的铝合金成形技术,其除了适合制备各种结构复杂的零件外,在成形工艺还有其独特特点。激光选取熔化过程中由于激光形成的熔池小,试样冷却速率非常快,这有利于获得细小的凝固组织,也会使一些溶质元素固溶到铝基体中。但是由增材制造出的AlSil0Mg合金由于自身技术特点(粉末、熔池等),导致激光增材制造的结构表面粗糙度较大,难以满足较高精度的使用需求。需要配合后续表面精整措施:去毛刺、机械抛光、化学/电化学抛光等来加以改进。因此,由增材制造出来的材料的后处理至关重要。As a new aluminum alloy forming technology, selective laser melting technology is not only suitable for preparing various parts with complex structures, but also has its unique characteristics in the forming process. Due to the small molten pool formed by the laser during the laser melting process, the cooling rate of the sample is very fast, which is conducive to obtaining a fine solidified structure, and will also cause some solute elements to dissolve into the aluminum matrix. However, due to the technical characteristics (powder, molten pool, etc.) of the AlSi l0 Mg alloy manufactured by additives, the surface roughness of the laser additive manufacturing structure is relatively large, which is difficult to meet the use requirements of higher precision. Need to cooperate with subsequent surface finishing measures: deburring, mechanical polishing, chemical/electrochemical polishing, etc. to improve. Therefore, the post-processing of materials produced by additive manufacturing is crucial.

发明内容Contents of the invention

本发明要解决现有选择性激光熔化AlSi10Mg合金热处理制品表面粗糙度大,精密度低的技术问题,而提供一种选择性激光熔化AlSi10Mg合金热处理制品的电化学表面处理方法。The invention aims to solve the technical problems of large surface roughness and low precision of existing selective laser melting AlSi10Mg alloy heat treatment products, and provides an electrochemical surface treatment method for selective laser melting AlSi10Mg alloy heat treatment products.

一种选择性激光熔化AlSi10Mg合金热处理制品的电化学表面处理方法,具体按以下步骤进行:A kind of electrochemical surface treatment method of selective laser melting AlSi10Mg alloy heat treatment product, specifically carry out according to the following steps:

一、采用NaOH、EDTA和去离子水配制电解液,控制NaOH用量为60~70g/L,EDTA用量为15~20g/L;1. Use NaOH, EDTA and deionized water to prepare electrolyte, control the dosage of NaOH to 60-70g/L, and the dosage of EDTA to 15-20g/L;

二、将AlSi10Mg合金进行打磨,然后采用酸洗液进行酸洗,酸洗后立即流水冲洗,干燥;2. Grind AlSi10Mg alloy, then pickle with pickling solution, rinse with running water immediately after pickling, and dry;

三、采用三电极体系将步骤二处理的AlSi10Mg合金进行电化学抛光,铂片为阴极,AlSi10Mg合金为阳极,Ag/AgCl电极为参比电极,电解液为步骤一配制;抛光后立即流水冲洗;3. The AlSi10Mg alloy treated in step 2 is electrochemically polished using a three-electrode system, the platinum sheet is used as the cathode, the AlSi10Mg alloy is used as the anode, the Ag/AgCl electrode is used as the reference electrode, and the electrolyte is prepared in step 1; rinse with running water immediately after polishing;

四、将步骤三处理的AlSi10Mg合金进行超声清洗,完成所述电化学表面处理方法。4. Ultrasonic cleaning the AlSi10Mg alloy treated in step 3 to complete the electrochemical surface treatment method.

进一步的,步骤一控制NaOH用量为60g/L,EDTA用量为16.7g/L。Further, step 1 controls the amount of NaOH to be 60g/L, and the amount of EDTA to be 16.7g/L.

进一步的,步骤二所述AlSi10Mg合金中元素质量百分含量为:Si:10~11%、Mg:0.2~0.3%、Fe:<0.05%、Cu:≤0.01%、Ni:≤0.01%、Zn:≤0.01%、Ti:≤0.02%和余量为铝。AlSi10Mg合金采用选择性激光熔化技术制备。Further, the mass percent content of elements in the AlSi10Mg alloy described in Step 2 is: Si: 10-11%, Mg: 0.2-0.3%, Fe: <0.05%, Cu: ≤0.01%, Ni: ≤0.01%, Zn : ≤0.01%, Ti: ≤0.02%, and the balance is aluminum. AlSi10Mg alloy was prepared by selective laser melting technology.

进一步的,步骤二采用600目砂纸打磨。除去激光熔化形成的氧化层。Further, step 2 is polished with 600-grit sandpaper. The oxide layer formed by laser melting is removed.

进一步的,步骤二所述酸洗液中HNO3、HF与H2O的体积比为10∶3∶7。Further, the volume ratio of HNO 3 , HF and H 2 O in the pickling solution in step 2 is 10:3:7.

进一步的,步骤二酸洗时间为1~2min,温度为室温。洗至样品表面泛白。Further, the pickling time in the second step is 1-2 minutes, and the temperature is room temperature. Wash until the surface of the sample turns white.

进一步的,步骤三在磁力搅拌条件下进行电化学抛光,控制磁力恒温搅拌器转速为3~4r/s,温度为38~43℃。Further, in the third step, the electrochemical polishing is performed under the condition of magnetic stirring, and the rotational speed of the magnetic constant temperature stirrer is controlled to be 3-4 r/s, and the temperature is 38-43°C.

进一步的,步骤三先将AlSi10Mg合金浸泡2~5s,再进行电化学抛光。Further, step 3 first soaks the AlSi10Mg alloy for 2-5 seconds, and then performs electrochemical polishing.

进一步的,步骤三所述电化学抛光,电化学工作站采用LSV模式,控制电压为0~10V,扫速为0.05V/s,灵敏度为1×10-1Further, for the electrochemical polishing described in Step 3, the electrochemical workstation adopts LSV mode, the control voltage is 0-10V, the scan rate is 0.05V/s, and the sensitivity is 1×10 -1 .

进一步的,步骤四所述超声清洗,频率40KHz,时间为5min。Further, ultrasonic cleaning as described in Step 4, the frequency is 40KHz, and the time is 5min.

本发明的有益效果是:The beneficial effects of the present invention are:

本发明SLM成形AlSi10Mg铝合金经过热处理后,共晶硅尺寸增大,在铝基体中分布更加均匀。在热处理过程中,SLM成形AlSi10M合金中的共晶硅由纤维状依次经历断裂为块状、圆整化以及长大过程,最终呈现近球形形貌。与热处理前相比,合金抗拉强度和屈服强度均有所降低,但伸长率提高,力学性能达到Rm≥380MPa,A≥8%。通过对选择性激光熔化技术制备的AlSi10Mg合金热处理样品进行一定的电化学表面处理,能够得到高的表面光洁度;能够得到高的抛光精度;而且操作环境好,金属损耗小,能量消耗少;抛光速度与金属的物理-机械性能无关,能大幅度提高生产效率;能改善金属零件表面的物理-机械性质、物理化学性质和使用性能;掌握操作技术较为容易。After the heat treatment of the AlSi10Mg aluminum alloy formed by SLM in the present invention, the size of the eutectic silicon increases and the distribution in the aluminum matrix is more uniform. During the heat treatment process, the eutectic silicon in the SLM-formed AlSi10M alloy undergoes a process of fracture from fibrous to massive, rounded, and grown in sequence, and finally presents a near-spherical morphology. Compared with before heat treatment, the tensile strength and yield strength of the alloy decreased, but the elongation increased, and the mechanical properties reached Rm≥380MPa, A≥8%. By performing certain electrochemical surface treatment on AlSi10Mg alloy heat treatment samples prepared by selective laser melting technology, high surface finish can be obtained; high polishing precision can be obtained; and the operating environment is good, metal loss is small, energy consumption is small; polishing speed It has nothing to do with the physical-mechanical properties of the metal, and can greatly improve production efficiency; it can improve the physical-mechanical properties, physicochemical properties and performance of the surface of metal parts; it is easier to master the operation technology.

本发明用于AlSi10Mg合金热处理制品表面处理。The invention is used for surface treatment of AlSi10Mg alloy heat treatment products.

附图说明Description of drawings

图1为实施例一AlSi10Mg合金电化学表面处理前后的Tafel耐腐蚀性能测试图,其中1代表处理前,2代表处理后;Fig. 1 is the Tafel corrosion resistance test figure before and after the electrochemical surface treatment of AlSi10Mg alloy of embodiment one, wherein 1 represents before processing, and 2 represents after processing;

图2为实施例一AlSi10Mg合金电化学表面处理前后的XRD掠入射表征图谱,其中1代表处理前,2代表处理后,Fig. 2 is the XRD grazing incidence characterization pattern before and after the electrochemical surface treatment of AlSi10Mg alloy of embodiment one, wherein 1 represents before processing, and 2 represents after processing,

图3为实施例一AlSi10Mg合金电化学表面处理前的电镜照片,Fig. 3 is the electron micrograph before the electrochemical surface treatment of AlSi10Mg alloy of embodiment one,

图4为实施例一AlSi10Mg合金电化学表面处理后的电镜照片(1μm),Fig. 4 is the electron micrograph (1 μm) after the electrochemical surface treatment of AlSi10Mg alloy of embodiment one,

图5为实施例一AlSi10Mg合金电化学表面处理后的的电镜照片(10μm),Fig. 5 is the electron micrograph (10 μm) after the electrochemical surface treatment of AlSi10Mg alloy of embodiment one,

图6为实施例一AlSi10Mg合金电化学表面处理后粗糙度曲线图,Fig. 6 is the roughness curve figure after the electrochemical surface treatment of AlSi10Mg alloy of embodiment one,

图7为实施例一AlSi10Mg合金电化学表面处理前EDS测试图,Fig. 7 is the EDS test figure before the electrochemical surface treatment of AlSi10Mg alloy of embodiment one,

图8为实施例一AlSi10Mg合金电化学表面处理后EDS测试图。Fig. 8 is an EDS test chart of AlSi10Mg alloy after electrochemical surface treatment in Example 1.

具体实施方式detailed description

本发明技术方案不局限于以下所列举的具体实施方式,还包括各具体实施方式之间的任意组合。The technical solution of the present invention is not limited to the specific embodiments listed below, but also includes any combination of the specific embodiments.

具体实施方式一:本实施方式一种选择性激光熔化AlSi10Mg合金热处理制品的电化学表面处理方法,其特征在于该方法具体按以下步骤进行:Specific embodiment one: This embodiment is an electrochemical surface treatment method for selective laser melting AlSi10Mg alloy heat treatment products, which is characterized in that the method is specifically carried out according to the following steps:

一、采用NaOH、EDTA和去离子水配制电解液,控制NaOH用量为60~70g/L,EDTA用量为15~20g/L;1. Use NaOH, EDTA and deionized water to prepare electrolyte, control the dosage of NaOH to 60-70g/L, and the dosage of EDTA to 15-20g/L;

二、将AlSi10Mg合金进行打磨,然后采用酸洗液进行酸洗,酸洗后立即流水冲洗,干燥;2. Grind AlSi10Mg alloy, then pickle with pickling solution, rinse with running water immediately after pickling, and dry;

三、采用三电极体系将步骤二处理的AlSi10Mg合金进行电化学抛光,铂片为阴极,AlSi10Mg合金为阳极,Ag/AgCl电极为参比电极,电解液为步骤一配制;抛光后立即流水冲洗;3. The AlSi10Mg alloy treated in step 2 is electrochemically polished using a three-electrode system, the platinum sheet is used as the cathode, the AlSi10Mg alloy is used as the anode, the Ag/AgCl electrode is used as the reference electrode, and the electrolyte is prepared in step 1; rinse with running water immediately after polishing;

四、将步骤三处理的AlSi10Mg合金进行超声清洗,完成所述电化学表面处理方法。4. Ultrasonic cleaning the AlSi10Mg alloy treated in step 3 to complete the electrochemical surface treatment method.

具体实施方式二:本实施方式与具体实施方式一不同的是:步骤一控制NaOH用量为60g/L,EDTA用量为16.7g/L。其它与具体实施方式一相同。Embodiment 2: This embodiment is different from Embodiment 1 in that: Step 1 controls the amount of NaOH to be 60 g/L, and the amount of EDTA to be 16.7 g/L. Others are the same as in the first embodiment.

具体实施方式三:本实施方式与具体实施方式一或二不同的是:步骤二所述AlSi10Mg合金中元素质量百分含量为:Si:10~11%、Mg:0.2~0.3%、Fe:<0.05%、Cu:≤0.01%、Ni:≤0.01%、Zn:≤0.01%、Ti:≤0.02%和余量为铝。其它与具体实施方式一或二相同。Specific embodiment 3: The difference between this embodiment and specific embodiment 1 or 2 is that the mass percent content of elements in the AlSi10Mg alloy described in step 2 is: Si: 10-11%, Mg: 0.2-0.3%, Fe: < 0.05%, Cu: ≤0.01%, Ni: ≤0.01%, Zn: ≤0.01%, Ti: ≤0.02%, and the balance is aluminum. Others are the same as in the first or second embodiment.

具体实施方式四:本实施方式与具体实施方式一至三之一不同的是:步骤二采用600目砂纸打磨。其它与具体实施方式一至三之一相同。Embodiment 4: This embodiment is different from Embodiment 1 to Embodiment 3 in that: Step 2 uses 600-grit sandpaper to polish. Others are the same as those in the first to third specific embodiments.

具体实施方式五:本实施方式与具体实施方式一至四之一不同的是:步骤二所述酸洗液中HNO3、HF与H2O的体积比为10∶3∶7。其它与具体实施方式一至四之一相同。Embodiment 5: This embodiment differs from Embodiments 1 to 4 in that the volume ratio of HNO 3 , HF and H 2 O in the pickling solution in Step 2 is 10:3:7. Others are the same as one of the specific embodiments 1 to 4.

具体实施方式六:本实施方式与具体实施方式一至五之一不同的是:步骤二酸洗时间为1~2min,温度为室温。其它与具体实施方式一至五之一相同。Embodiment 6: This embodiment differs from Embodiments 1 to 5 in that: Step 2 pickling time is 1-2 minutes, and the temperature is room temperature. Others are the same as one of the specific embodiments 1 to 5.

具体实施方式七:本实施方式与具体实施方式一至六之一不同的是:步骤三在磁力搅拌条件下进行电化学抛光,控制磁力恒温搅拌器转速为3~4r/s,温度为38~43℃。其它与具体实施方式一至六之一相同。Embodiment 7: The difference between this embodiment and one of Embodiments 1 to 6 is that step 3 performs electrochemical polishing under the condition of magnetic stirring, and the rotational speed of the magnetic constant temperature stirrer is controlled to be 3 to 4 r/s, and the temperature is 38 to 43 ℃. Others are the same as one of the specific embodiments 1 to 6.

具体实施方式八:本实施方式与具体实施方式一至七之一不同的是:步骤三先将AlSi10Mg合金浸泡2~5s,再进行电化学抛光。其它与具体实施方式一至七之一相同。Embodiment 8: This embodiment differs from Embodiments 1 to 7 in that: step 3 first soaks the AlSi10Mg alloy for 2-5 seconds, and then performs electrochemical polishing. Others are the same as one of the specific embodiments 1 to 7.

具体实施方式九:本实施方式与具体实施方式一至八之一不同的是:步骤三所述电化学抛光,电化学工作站采用LSV模式,控制电压为0~10V,扫速为0.05V/s,灵敏度为1×10-1。其它与具体实施方式一至八之一相同。Embodiment 9: This embodiment is different from Embodiment 1 to Embodiment 8 in that: the electrochemical polishing described in step 3, the electrochemical workstation adopts LSV mode, the control voltage is 0-10V, and the scanning speed is 0.05V/s. The sensitivity is 1×10 -1 . Others are the same as one of the specific embodiments 1 to 8.

具体实施方式十:本实施方式与具体实施方式一至九之一不同的是:步骤四所述超声清洗,频率40KHz,时间为5min。其它与具体实施方式一至九之一相同。Embodiment 10: This embodiment is different from Embodiment 1 to Embodiment 9 in that: the ultrasonic cleaning described in Step 4 has a frequency of 40 KHz and a time of 5 minutes. Others are the same as one of the specific embodiments 1 to 9.

采用以下实施例验证本发明的有益效果:Adopt the following examples to verify the beneficial effects of the present invention:

实施例一:Embodiment one:

本实施例一种选择性激光熔化AlSi10Mg合金热处理制品的电化学表面处理方法,具体按以下步骤进行:In this embodiment, an electrochemical surface treatment method for selective laser melting AlSi10Mg alloy heat treatment products is carried out according to the following steps:

一、采用NaOH、EDTA和去离子水配制电解液,控制NaOH用量为60g/L,EDTA用量为16.7g/L;1. Use NaOH, EDTA and deionized water to prepare electrolyte, control the dosage of NaOH to 60g/L, and the dosage of EDTA to 16.7g/L;

二、将AlSi10Mg合金进行打磨,然后采用酸洗液进行酸洗,酸洗后立即流水冲洗,吹干;2. Grind the AlSi10Mg alloy, then pickle it with pickling solution, rinse it with running water immediately after pickling, and dry it;

三、采用三电极体系将步骤二处理的AlSi10Mg合金进行电化学抛光,铂片为阴极,AlSi10Mg合金为阳极,Ag/AgCl电极为参比电极,电解液为步骤一配制;抛光后立即流水冲洗;3. The AlSi10Mg alloy treated in step 2 is electrochemically polished using a three-electrode system, the platinum sheet is used as the cathode, the AlSi10Mg alloy is used as the anode, the Ag/AgCl electrode is used as the reference electrode, and the electrolyte is prepared in step 1; rinse with running water immediately after polishing;

四、将步骤三处理的AlSi10Mg合金进行超声清洗,完成所述电化学表面处理方法。4. Ultrasonic cleaning the AlSi10Mg alloy treated in step 3 to complete the electrochemical surface treatment method.

步骤二所述AlSi10Mg合金中元素质量百分含量为:Si:10~11%、Mg:0.2~0.3%、Fe:<0.05%、Cu:≤0.01%、Ni:≤0.01%、Zn:≤0.01%、Ti:≤0.02%和余量为铝。The mass percent content of elements in the AlSi10Mg alloy described in step 2 is: Si: 10-11%, Mg: 0.2-0.3%, Fe: <0.05%, Cu: ≤0.01%, Ni: ≤0.01%, Zn: ≤0.01 %, Ti: ≤0.02% and the balance is aluminum.

步骤二采用600目砂纸打磨。除去激光熔化形成的氧化层。Step 2 Sand with 600-grit sandpaper. The oxide layer formed by laser melting is removed.

步骤二所述酸洗液中HNO3、HF与H2O的体积比为10∶3∶7。The volume ratio of HNO 3 , HF and H 2 O in the pickling solution in step 2 is 10:3:7.

步骤二酸洗时间为1~2min,温度为室温。洗至样品表面泛白。The pickling time in step 2 is 1-2 minutes, and the temperature is room temperature. Wash until the surface of the sample turns white.

步骤三在磁力搅拌条件下进行电化学抛光,控制磁力恒温搅拌器转速为3r/s,温度为40℃Step 3 Electrochemical polishing is carried out under the condition of magnetic stirring, and the rotational speed of the magnetic constant temperature stirrer is controlled to 3r/s, and the temperature is 40°C

步骤三先将AlSi10Mg合金浸泡2~5s,再进行电化学抛光。Step 3: Soak the AlSi10Mg alloy for 2-5 seconds, and then perform electrochemical polishing.

步骤三所述电化学抛光,电化学工作站采用LSV模式,控制电压为0~10V,扫速为0.05V/s,灵敏度为1×10-1For the electrochemical polishing described in Step 3, the electrochemical workstation adopts LSV mode, the control voltage is 0-10V, the scan rate is 0.05V/s, and the sensitivity is 1×10 -1 .

步骤四所述超声清洗,频率40KHz,时间为5min。Ultrasonic cleaning as described in Step 4, the frequency is 40KHz, and the time is 5min.

图1为实施例一AlSi10Mg合金电化学表面处理前后的Tafel耐腐蚀性能测试图,其中1代表处理前,2代表处理后;对比可知,抛光后样品腐蚀电位升高,耐腐蚀性能增强。Figure 1 is the Tafel corrosion resistance test diagram of the AlSi10Mg alloy before and after electrochemical surface treatment in Example 1, where 1 represents before treatment and 2 represents after treatment; the comparison shows that the corrosion potential of the polished sample increases and the corrosion resistance performance increases.

图2为实施例一AlSi10Mg合金电化学表面处理前后的XRD掠入射表征图谱,其中1代表处理前,2代表处理后,样品抛光前后表面并没有生成新的膜层,均为Al3.21Si0.47混合物。Figure 2 is the XRD grazing incidence characterization pattern of AlSi10Mg alloy before and after electrochemical surface treatment in Example 1, where 1 represents before treatment, 2 represents after treatment, no new film layer is formed on the surface of the sample before and after polishing, all are Al 3.21 Si 0.47 mixture .

图3为实施例一AlSi10Mg合金电化学表面处理前的电镜照片,表面杂乱粗糙。FIG. 3 is an electron micrograph of an AlSi10Mg alloy before electrochemical surface treatment in Example 1, and the surface is chaotic and rough.

图4为实施例一AlSi10Mg合金电化学表面处理后的电镜照片(1μm),图5为实施例一AlSi10Mg合金电化学表面处理后的的电镜照片(10μm),可以看出处理后的表面出现熔池现象,突起分布均匀,粗糙度降低。Fig. 4 is the electron micrograph (1 μm) after the electrochemical surface treatment of the AlSi10Mg alloy of embodiment one, and Fig. 5 is the electron micrograph (10 μm) after the electrochemical surface treatment of the AlSi10Mg alloy of the embodiment one, it can be seen that melting appears on the surface after the treatment The pool phenomenon, the protrusions are evenly distributed, and the roughness is reduced.

图6为实施例一AlSi10Mg合金电化学表面处理后粗糙度曲线图,粗糙度Ra=1.462μm,表面为基体金属光泽的样品。Fig. 6 is a graph of the roughness after electrochemical surface treatment of AlSi10Mg alloy in Example 1, the roughness Ra=1.462 μm, and the surface is a sample with metallic luster of the matrix.

图7为实施例一AlSi10Mg合金电化学表面处理前EDS测试图,样品表面主要由Al、Si、Mg三种元素构成,在AlSi10Mg工件中,α-Al相被适量的共熔单晶硅所包裹,所以表面Al、Si和O三种元素分布基本一致;由于后续制作工艺问题,该批样品表面引入了较多的杂质Fe元素。Figure 7 is the EDS test image of the AlSi10Mg alloy before electrochemical surface treatment in Example 1. The surface of the sample is mainly composed of three elements: Al, Si, and Mg. In the AlSi10Mg workpiece, the α-Al phase is wrapped by an appropriate amount of eutectic single crystal silicon , so the three elements distribution of Al, Si and O on the surface are basically the same; due to subsequent manufacturing process problems, more impurity Fe elements were introduced on the surface of this batch of samples.

图8为实施例一AlSi10Mg合金电化学表面处理后EDS测试图,样品表面的氧化铝相电解反应为铝硅合金,并且表面杂质Fe元素得到去除。Fig. 8 is an EDS test chart after the electrochemical surface treatment of the AlSi10Mg alloy in Example 1. The aluminum oxide phase on the surface of the sample is electrolytically reacted into an aluminum-silicon alloy, and the surface impurity Fe element is removed.

Claims (9)

1. An electrochemical surface treatment method for selectively melting AlSi10Mg alloy heat treatment products by laser is characterized by comprising the following steps:
1. preparing electrolyte by adopting NaOH, EDTA and deionized water, and controlling the dosage of the NaOH to be 60-70 g/L and the dosage of the EDTA to be 15-20 g/L;
2. polishing the AlSi10Mg alloy, then carrying out acid pickling by adopting a pickling solution, immediately washing with running water after acid pickling, and drying;
3. performing electrochemical polishing on the AlSi10Mg alloy treated in the step two by adopting a three-electrode system, wherein a platinum sheet is used as a cathode, the AlSi10Mg alloy is used as an anode, an Ag/AgCl electrode is used as a reference electrode, and an electrolyte is prepared in the step one; immediately flushing with running water after polishing;
4. carrying out ultrasonic cleaning on the AlSi10Mg alloy treated in the step three to finish the electrochemical surface treatment method;
step three, performing electrochemical polishing, wherein an electrochemical workstation adopts an LSV mode, and the control voltage is0-10V, sweep speed of 0.05V/s, and sensitivity of 1 × 10 -1
2. The method for electrochemically treating a surface of a selectively laser-melted AlSi10Mg alloy heat-treated article according to claim 1, wherein in the first step, the amount of NaOH is controlled to be 60g/L and the amount of EDTA is controlled to be 16.7g/L.
3. The electrochemical surface treatment method for selectively laser melting AlSi10Mg alloy heat-treated products according to claim 1, wherein the AlSi10Mg alloy in the second step comprises the following elements in percentage by mass: si:10 to 11%, mg:0.2 to 0.3%, fe: < 0.05%, cu: less than or equal to 0.01 percent, ni: less than or equal to 0.01 percent, zn: less than or equal to 0.01 percent, ti: less than or equal to 0.02 percent and the balance of aluminum.
4. The method for electrochemically treating a surface of a heat-treated product of a selective laser melting AlSi10Mg alloy according to claim 1, wherein in the second step, 600-mesh sanding is adopted.
5. The method as claimed in claim 1, wherein step two is carried out by using HNO in pickling solution 3 HF and H 2 The volume ratio of O is 10: 3: 7.
6. The electrochemical surface treatment method for the selective laser melting AlSi10Mg alloy heat treatment product according to claim 1, characterized in that the acid washing time of the step is 1-2 min, and the temperature is room temperature.
7. The electrochemical surface treatment method for the selective laser melting AlSi10Mg alloy heat treatment product according to claim 1, characterized in that step three is electrochemical polishing under the condition of magnetic stirring, the rotating speed of the magnetic constant temperature stirrer is controlled to be 3-4 r/s, and the temperature is controlled to be 38-43 ℃.
8. The electrochemical surface treatment method for the selective laser melting AlSi10Mg alloy heat treatment product according to claim 1, characterized in that in the third step, the AlSi10Mg alloy is soaked for 2-5 s and then is electrochemically polished.
9. The method as claimed in claim 1, wherein said ultrasonic cleaning is carried out at 40KHz for 5min.
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