CN113088935A - Fixed base, LPCVD boiler tube and LPCVD equipment - Google Patents
Fixed base, LPCVD boiler tube and LPCVD equipment Download PDFInfo
- Publication number
- CN113088935A CN113088935A CN202110343044.4A CN202110343044A CN113088935A CN 113088935 A CN113088935 A CN 113088935A CN 202110343044 A CN202110343044 A CN 202110343044A CN 113088935 A CN113088935 A CN 113088935A
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- base
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- outer tube
- tube
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- 238000004518 low pressure chemical vapour deposition Methods 0.000 title claims abstract description 58
- 238000003825 pressing Methods 0.000 claims abstract description 40
- 238000007789 sealing Methods 0.000 claims description 9
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims 1
- 238000009434 installation Methods 0.000 abstract description 10
- 238000000034 method Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention provides a fixed base, an LPCVD furnace tube and LPCVD equipment, wherein the fixed base comprises a base, a plurality of pressing pieces and a plurality of supporting pieces, wherein the plurality of pressing pieces and the plurality of supporting pieces are arranged on the base in a one-to-one correspondence mode; the plurality of pressing pieces are used for fixing the inner side wall of the bottom of the outer pipe body of the LPCVD furnace pipe and are arranged at intervals along the circumferential direction of the base; the plurality of supporting pieces are used for abutting against the outer side wall of the bottom of the outer pipe body and are arranged at intervals along the circumferential direction of the base. The fixing base provided by the invention can effectively enable the outer tube body and the fixing base to be concentrically arranged, so that the uniform installation gap between the outer tube body and the fixing base is ensured, the outer tube body does not deviate when equipment is vacuumized, and the situation that the outer tube body is cracked due to collision between the outer tube body and the fixing base can be effectively avoided.
Description
Technical Field
The invention relates to the technical field of semiconductor equipment, in particular to a fixed base, an LPCVD furnace tube and LPCVD equipment.
Background
The existing LPCVD furnace tube equipment of the SPT ONO type is used as a bottleneck machine table, the pressure requirement is extremely high, and once the pressure problem occurs, the equipment is shut down for a long time, so that the yield of the equipment is reduced rapidly. The main reason for the pressure problem is the displacement of the furnace tube relative to the fixed base; when the furnace tube is vacuumized, the furnace tube is easy to break due to the collision with the fixed base, so that the equipment is out of work. According to the statistics of the fact, the SPT ONO device has four furnace tube cracks in one year, including the ADONOS02 new installed device.
When the furnace tube is disassembled after the furnace tube is broken, the uneven clearance between the furnace tube and the fixed base can be found, wherein the clearance on one side is smaller, so that the furnace tube is broken due to stress generated by the contact between the quartz furnace tube and the fixed base made of metal; meanwhile, the phenomenon that the indentation of the furnace tube on the sealing ring is uneven and has offset can be checked, because the furnace tube is not concentrically installed with the fixed base, partial quartz is contacted with metal to cause the cracking of the furnace tube, although the installation gap between the furnace tube and the fixed base can be ensured to be uniform when the furnace tube is installed, the furnace tube and the fixed base are concentrically installed, when the furnace tube is lifted or vacuumized, the furnace tube can be displaced relative to the fixed base, so that the furnace tube is collided with the fixed base, and when the times of vacuumizing are increased, the furnace tube can be cracked due to multiple impacts.
Therefore, there is a need for a fixing base that can overcome the problem of collision between the furnace tube and the fixing base.
Disclosure of Invention
The invention aims to provide a fixed base, an LPCVD furnace tube and LPCVD equipment, which aim to solve the problem that the fixed base in the prior art can ensure that the furnace tube is concentric with the fixed base even when the furnace tube is installed, but the furnace tube still generates a deflection phenomenon when the furnace tube is lifted or in a vacuum state, so that the furnace tube is collided with the furnace tube.
In order to solve the technical problem, the invention provides a fixed base for installing an outer tube body of an LPCVD furnace tube, wherein the fixed base comprises a base, and a plurality of pressing pieces and a plurality of supporting pieces which are arranged on the base, and the plurality of pressing pieces and the plurality of supporting pieces are arranged in a one-to-one correspondence manner;
the plurality of pressing pieces are used for fixing the inner side wall of the bottom of the outer pipe body of the LPCVD furnace pipe and are arranged at intervals along the circumferential direction of the base;
the plurality of supporting pieces are used for abutting against the outer side wall of the bottom of the outer pipe body and are arranged at intervals along the circumferential direction of the base.
Optionally, a clamping block is arranged on the inner side wall of the bottom of the outer pipe body, a clamping groove matched with the clamping block is formed in one side, close to the outer pipe body, of the pressing piece, and a gap is formed between the pressing piece and the inner side wall of the outer pipe body.
Optionally, the gap is 0.18 mm.
Optionally, the length of the support member is 9.45 mm.
Optionally, a sealing ring is further disposed on the base, and the sealing ring is located between the plurality of pressing members and the plurality of supporting members.
Optionally, the fixed base further comprises an air exhaust pipeline arranged on the base.
Optionally, the plurality of pressing pieces are arranged at equal intervals along the circumferential direction of the base, and the plurality of supporting pieces are arranged at equal intervals along the circumferential direction of the base.
The invention also provides an LPCVD furnace tube, which comprises an inner tube body, an outer tube body and the fixed base, wherein the outer tube body is sleeved on the periphery of the inner tube body.
Optionally, the outer tube is made of quartz or SiC material.
The invention also provides LPCVD equipment, which comprises the LPCVD furnace tube.
Compared with the prior art, the fixed base, the LPCVD furnace tube and the LPCVD equipment provided by the invention have the following advantages:
the fixing base provided by the invention comprises a base, a plurality of pressing pieces and a plurality of supporting pieces, wherein the plurality of pressing pieces and the plurality of supporting pieces are arranged on the base in a one-to-one correspondence manner; the plurality of pressing pieces and the plurality of supporting pieces are arranged at intervals along the circumferential direction of the base, so that the outer pipe body can be effectively borne by the base; the inner side wall of the bottom of the outer tube body of the LPCVD furnace tube can be fixed through the plurality of pressing pieces; the plurality of supporting pieces can be abutted against the outer side wall of the bottom of the outer pipe body, so that the outer pipe body is prevented from being displaced; the outer pipe body and the fixed base are concentrically arranged through the matching of the pressing piece and the supporting pieces, so that the outer pipe body is guaranteed not to shift in a vacuumizing state, and the situation that the outer pipe body is cracked due to collision between the outer pipe body and the fixed base is effectively avoided. The LPCVD furnace tube comprises an inner tube body, an outer tube body and the fixing base, wherein the outer tube body is sleeved on the periphery of the inner tube body, so that the LPCVD furnace tube provided by the invention can effectively enable the outer tube body and the fixing base to be concentrically arranged, the uniform installation gap between the outer tube body and the fixing base is ensured, the outer tube body cannot deviate when equipment is vacuumized, and the situation that the outer tube body is cracked due to collision between the outer tube body and the fixing base can be effectively avoided. Since the LPCVD apparatus provided by the present invention includes the LPCVD furnace tube as described above, all advantages of the LPCVD apparatus provided by the present invention including the LPCVD furnace tube will not be described herein again.
Drawings
FIG. 1 is a schematic structural view of an outer tube body and a fixing base according to an embodiment of the present invention;
FIG. 2 is a schematic plan view of a fixing base and an outer tube concentrically mounted according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of an LPCVD furnace according to an embodiment of the present invention.
Wherein the reference numbers are as follows:
100-outer tube, 110-fixture block, 200-fixing base, 210-base, 220-pressing piece, 221-clamping groove, 230-sealing ring, 240-supporting piece, 250-air suction pipeline and 300-inner tube.
Detailed Description
To make the objects, advantages and features of the present invention more clear, the mounting base, the LPCVD furnace and the LPCVD apparatus according to the present invention are further described in detail with reference to fig. 1 to 3. It should be noted that the drawings are simplified in form and not to precise scale, are only used for convenience and clarity to aid in describing the embodiments of the present invention, and are not used for limiting the implementation of the present invention, so that the present invention has no technical significance, and any structural modification, change of proportion relation or adjustment of size should still fall within the scope of the technical content disclosed by the present invention without affecting the function and the achievable purpose of the present invention.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
In the description of the present invention, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral part; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood as appropriate by those of ordinary skill in the art.
The core idea of the invention is to provide a fixed base, an LPCVD furnace tube and an LPCVD apparatus, so as to realize concentric installation between the fixed base and an outer tube body of the LPCVD furnace tube, so that an installation gap between the fixed base and the outer tube body is uniform, and simultaneously, the occurrence of the situation that the outer tube body is cracked due to collision between the outer tube body and the fixed base when the furnace tube is lifted or in a vacuum pumping state can be avoided.
In order to achieve the above-mentioned idea, the present invention provides a fixing base for installing an outer tube of an LPCVD furnace tube, please refer to fig. 1 and fig. 2, wherein fig. 1 schematically shows a structural schematic diagram of the outer tube and the fixing base provided by the present invention when they are matched; fig. 2 schematically shows a schematic plan view of the concentric mounting of the fixing base and the outer tube provided by the present invention. As shown in fig. 1 and 2, the fixing base 200 includes a base 210, and a plurality of pressing members 220 and a plurality of supporting members 240 that are disposed on the base 210, wherein the plurality of pressing members 220 and the plurality of supporting members 240 are disposed in a one-to-one correspondence; the plurality of pressing members 220 are used for fixing the inner side wall of the bottom of the outer tube 100 of the LPCVD furnace tube, and are arranged at intervals along the circumferential direction of the susceptor 210; the plurality of supporting members 240 are used for abutting against the outer sidewall of the bottom of the outer pipe body 100 and are arranged at intervals along the circumferential direction of the base 210. Thereby, the outer tube 100 can be effectively carried by the base 210; the inner side wall of the bottom of the outer tube 100 of the LPCVD furnace tube can be fixed by the plurality of pressing members 220; the plurality of supporting pieces 240 can be abutted against the outer side wall of the bottom of the outer pipe body 100, so that the outer pipe body 100 is prevented from being displaced; the outer tube body 100 and the fixing base 200 can be concentrically mounted by matching the pressing piece 220 with the supporting pieces 240, so that the outer tube body 100 is ensured not to shift in a vacuum state, and the situation that the outer tube body 100 is cracked due to collision between the outer tube body 100 and the fixing base 200 is effectively avoided.
Preferably, as shown in fig. 1, a clamping block 110 is disposed on an inner side wall of the bottom of the outer tube body 100, a clamping groove 221 matched with the clamping block 110 is disposed on one side of the pressing member 220 close to the outer tube body 100, and a gap a is disposed between the pressing member 220 and the inner side wall of the outer tube body 100. Therefore, the outer tube 100 can be effectively fixed on the base 210 by the cooperation of the latch 110 and the latch groove 221, and the gap a can effectively ensure that the pressing member 220 and the outer tube 100 do not collide with each other.
Preferably, the gap a is 0.18 mm. Therefore, the gap a is set to be 0.18mm, so that the gap between the outer tube 100 and the fixing base 200 can be effectively ensured to be uniform, and the outer tube 100 is prevented from deviating.
Preferably, the length of the supporting member 240 is 9.45 mm. Because the length of the supporting member 240 provided by the invention is increased by 0.03mm compared with the length of the supporting member 240 in the prior art, the stability of installation of the outer tube body 100 can be enhanced, even if the supporting member 240 is influenced to incline in the vacuum pumping state of the device, under the action of increasing the length of the supporting member 240, the concentric installation between the outer tube body 100 and the fixed base 200 can be ensured without deviation, so that the collision between the outer tube body 100 and the fixed base 200 is avoided, the risk of breakdown of LPCVD equipment due to the fracture of the outer tube body 100 is prevented, and the production efficiency of the LPCVD equipment is effectively improved.
Preferably, as shown in fig. 1, a sealing ring 230 is further disposed on the base 210, and the sealing ring 230 is located between the plurality of pressing members 220 and the plurality of supporting members 240. Therefore, the sealing ring 230 can effectively ensure the air tightness between the outer tube 100 and the fixing base 200, which is beneficial to vacuum pumping.
Preferably, as shown in fig. 1, the fixing base 200 further includes an air exhaust duct 250 provided on the base 210. Thus, the vacuum can be applied to the apparatus through the evacuation line 250.
Preferably, as shown in fig. 2, the plurality of pressing members 220 are disposed at equal intervals in the circumferential direction of the base 210, and the plurality of supporting members 240 are disposed at equal intervals in the circumferential direction of the base 210. Therefore, the supporting members 240 and the pressing members 220 in this arrangement can effectively ensure that the gap between the fixing base 200 and the outer tube 100 is uniform, so that the fixing base 200 and the outer tube 100 are concentrically mounted.
It should be noted that the number of the supporting members 240 is preferably three, the number of the pressing members 220 corresponds to the number of the supporting members 240, the pressing members 220 are located on the same circumference, and in some other embodiments, the pressing members 220 can be connected to each other to form a complete circumference.
Based on the same inventive concept, the present invention further provides an LPCVD furnace tube, please refer to fig. 3, which schematically shows a structural schematic diagram of the furnace tube according to an embodiment of the present invention. As shown in fig. 3, the furnace tube includes an inner tube 300, an outer tube 100 and the fixing base 200, wherein the outer tube 100 is sleeved on the outer periphery of the inner tube 300. Therefore, the LPCVD furnace tube provided by the invention can effectively enable the outer tube 100 and the fixed base 200 to be concentrically installed, ensure that the installation gap between the outer tube 100 and the fixed base 200 is uniform, prevent the outer tube 100 from deviating when equipment is vacuumized, and effectively avoid the situation that the outer tube 100 is cracked due to collision between the outer tube 100 and the fixed base 200.
Preferably, the outer tube 100 is made of quartz or SiC material.
Based on the same inventive concept, the invention also provides LPCVD equipment, which comprises the LPCVD furnace tube. Therefore, the LPCVD equipment provided by the invention can effectively enable the outer pipe body of the LPCVD furnace tube and the fixed base to be concentrically arranged, so that the uniform installation gap between the outer pipe body and the fixed base is ensured, the outer pipe body does not deviate when the equipment is vacuumized, and the situation that the outer pipe body is cracked due to collision between the outer pipe body and the fixed base can be effectively avoided.
In summary, compared with the prior art, the fixed base, the LPCVD furnace tube and the LPCVD apparatus provided by the invention have the following advantages:
the fixing base provided by the invention comprises a base, a plurality of pressing pieces and a plurality of supporting pieces, wherein the plurality of pressing pieces and the plurality of supporting pieces are arranged on the base in a one-to-one correspondence manner; the plurality of pressing pieces and the plurality of supporting pieces are arranged at intervals along the circumferential direction of the base, so that the outer pipe body can be effectively borne by the base; the inner side wall of the bottom of the outer tube body of the LPCVD furnace tube can be fixed through the plurality of pressing pieces; the plurality of supporting pieces can be abutted against the outer side wall of the bottom of the outer pipe body, so that the outer pipe body is prevented from being displaced; the outer pipe body and the fixed base are concentrically arranged through the matching of the pressing piece and the supporting pieces, so that the outer pipe body is guaranteed not to shift in a vacuumizing state, and the situation that the outer pipe body is cracked due to collision between the outer pipe body and the fixed base is effectively avoided. The LPCVD furnace tube comprises an inner tube body, an outer tube body and the fixing base, wherein the outer tube body is sleeved on the periphery of the inner tube body, so that the LPCVD furnace tube provided by the invention can effectively enable the outer tube body and the fixing base to be concentrically arranged, the uniform installation gap between the outer tube body and the fixing base is ensured, the outer tube body cannot deviate when equipment is vacuumized, and the situation that the outer tube body is cracked due to collision between the outer tube body and the fixing base can be effectively avoided. Since the LPCVD apparatus provided by the present invention includes the LPCVD furnace tube as described above, all advantages of the LPCVD apparatus provided by the present invention including the LPCVD furnace tube will not be described herein again.
Finally, it should be noted that the above embodiments are only for illustrating the technical solutions of the present invention and not for limiting, and although the present invention is described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions may be made on the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention.
Claims (10)
1. A fixed base is used for installing an outer pipe body of an LPCVD furnace tube and is characterized by comprising a base, a plurality of pressing pieces and a plurality of supporting pieces, wherein the pressing pieces and the supporting pieces are arranged on the base in a one-to-one correspondence mode;
the plurality of pressing pieces are used for fixing the inner side wall of the bottom of the outer pipe body of the LPCVD furnace pipe and are arranged at intervals along the circumferential direction of the base;
the plurality of supporting pieces are used for abutting against the outer side wall of the bottom of the outer pipe body and are arranged at intervals along the circumferential direction of the base.
2. The fixing base as claimed in claim 1, wherein a clamping block is disposed on an inner side wall of the bottom of the outer tube, a clamping groove matched with the clamping block is disposed on one side of the compressing member close to the outer tube, and a gap is disposed between the compressing member and the inner side wall of the outer tube.
3. The fixture base of claim 2, wherein the gap is 0.18 mm.
4. The fixation base of claim 1, wherein the support member is 9.45mm in length.
5. The fixture base of claim 1, wherein a sealing ring is further disposed on the base, and the sealing ring is located between the plurality of pressing members and the plurality of supporting members.
6. The fixture base of claim 1, further comprising an air extraction duct disposed on the base.
7. The fixing base according to claim 1, wherein the plurality of pressing members are arranged at equal intervals in a circumferential direction of the base, and the plurality of supporting members are arranged at equal intervals in a circumferential direction of the base.
8. An LPCVD furnace tube, characterized in that it comprises an inner tube, an outer tube and the fixed base as claimed in any one of claims 1 to 7, the outer tube is sleeved on the periphery of the inner tube.
9. The LPCVD furnace tube of claim 8, wherein the outer tube is fabricated from quartz or SiC materials.
10. An LPCVD apparatus comprising the LPCVD furnace tube of claim 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110343044.4A CN113088935A (en) | 2021-03-30 | 2021-03-30 | Fixed base, LPCVD boiler tube and LPCVD equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110343044.4A CN113088935A (en) | 2021-03-30 | 2021-03-30 | Fixed base, LPCVD boiler tube and LPCVD equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113088935A true CN113088935A (en) | 2021-07-09 |
Family
ID=76671406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110343044.4A Pending CN113088935A (en) | 2021-03-30 | 2021-03-30 | Fixed base, LPCVD boiler tube and LPCVD equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113088935A (en) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000243747A (en) * | 1999-02-18 | 2000-09-08 | Kokusai Electric Co Ltd | Substrate processing equipment |
| US6334404B1 (en) * | 1999-05-19 | 2002-01-01 | United Microelectronics Corp. | Method and apparatus for reducing particle contamination on wafers |
| TW562236U (en) * | 2003-02-18 | 2003-11-11 | Nanya Technology Corp | Vertical furnace tube with an anti-vibration design |
| EP1760170A2 (en) * | 2005-09-05 | 2007-03-07 | Japan Pionics Co., Ltd. | Chemical vapor deposition apparatus |
| US20100050945A1 (en) * | 2008-08-28 | 2010-03-04 | Hitachi-Kokusai Electric Inc. | Substrate processing apparatus |
| WO2011108640A1 (en) * | 2010-03-04 | 2011-09-09 | Jx日鉱日石金属株式会社 | Crystal growing apparatus, method for manufacturing nitride compound semiconductor crystal, and nitride compound semiconductor crystal |
| CN105543955A (en) * | 2016-02-26 | 2016-05-04 | 上海华力微电子有限公司 | Vertical furnace pipe prepared from polysilicon and preparation method thereof |
| CN109554685A (en) * | 2018-11-30 | 2019-04-02 | 上海华力微电子有限公司 | Gas injection apparatus and high temperature furnace pipe |
| CN112382553A (en) * | 2020-11-16 | 2021-02-19 | 拉普拉斯(无锡)半导体科技有限公司 | Double-layer reaction cavity structure |
-
2021
- 2021-03-30 CN CN202110343044.4A patent/CN113088935A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000243747A (en) * | 1999-02-18 | 2000-09-08 | Kokusai Electric Co Ltd | Substrate processing equipment |
| US6334404B1 (en) * | 1999-05-19 | 2002-01-01 | United Microelectronics Corp. | Method and apparatus for reducing particle contamination on wafers |
| TW562236U (en) * | 2003-02-18 | 2003-11-11 | Nanya Technology Corp | Vertical furnace tube with an anti-vibration design |
| EP1760170A2 (en) * | 2005-09-05 | 2007-03-07 | Japan Pionics Co., Ltd. | Chemical vapor deposition apparatus |
| US20100050945A1 (en) * | 2008-08-28 | 2010-03-04 | Hitachi-Kokusai Electric Inc. | Substrate processing apparatus |
| WO2011108640A1 (en) * | 2010-03-04 | 2011-09-09 | Jx日鉱日石金属株式会社 | Crystal growing apparatus, method for manufacturing nitride compound semiconductor crystal, and nitride compound semiconductor crystal |
| CN105543955A (en) * | 2016-02-26 | 2016-05-04 | 上海华力微电子有限公司 | Vertical furnace pipe prepared from polysilicon and preparation method thereof |
| CN109554685A (en) * | 2018-11-30 | 2019-04-02 | 上海华力微电子有限公司 | Gas injection apparatus and high temperature furnace pipe |
| CN112382553A (en) * | 2020-11-16 | 2021-02-19 | 拉普拉斯(无锡)半导体科技有限公司 | Double-layer reaction cavity structure |
Non-Patent Citations (1)
| Title |
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| 柏德元等, 上海科学技术出版社 * |
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Application publication date: 20210709 |