CN113019381B - Three-dimensional porous self-supporting NiO/ZnO heterojunction material and preparation method thereof - Google Patents
Three-dimensional porous self-supporting NiO/ZnO heterojunction material and preparation method thereof Download PDFInfo
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- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 claims description 3
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- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
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Abstract
本发明涉及多孔材料技术领域,提供了一种三维多孔自支撑NiO/ZnO异质结材料及其制备方法。本发明通过将含有高分子聚合物、镍源、锌源和水的前驱体溶液进行冷冻处理使溶液中的水冷冻成冰晶,再通过去冰处理除去冰晶形成大孔孔道,最后经过煅烧去除高分子聚合物形成微孔和介孔,同时通过煅烧使镍源分解为NiO,锌源分解为ZnO,而NiO颗粒和ZnO颗粒的堆积也会形成大孔,进而得到了三维多孔自支撑NiO/ZnO异质结材料。实施例表明,本发明提供的制备方法操作简单,无需去模板,也不需要严格控制实验条件。
The invention relates to the technical field of porous materials, and provides a three-dimensional porous self-supporting NiO/ZnO heterojunction material and a preparation method thereof. In the present invention, the precursor solution containing high molecular polymer, nickel source, zinc source and water is subjected to freezing treatment to freeze the water in the solution into ice crystals, and then the ice crystals are removed by de-icing treatment to form macroporous channels, and finally the high pore size is removed by calcination. The molecular polymer forms micropores and mesopores, and at the same time, the nickel source is decomposed into NiO and the zinc source is decomposed into ZnO through calcination, and the accumulation of NiO particles and ZnO particles will also form macropores, thereby obtaining three-dimensional porous self-supporting NiO/ZnO Heterojunction materials. The examples show that the preparation method provided by the present invention is simple to operate, does not require template removal, and does not require strict control of experimental conditions.
Description
技术领域technical field
本发明涉及多孔材料技术领域,尤其涉及一种三维多孔自支撑NiO/ZnO异质结材料及其制备方法。The invention relates to the technical field of porous materials, in particular to a three-dimensional porous self-supporting NiO/ZnO heterojunction material and a preparation method thereof.
背景技术Background technique
未经处理的城市生活用水、农业污水、工业污水等排入河中,可导致水体富营养化或重金属超标,进而造成水中细菌大量繁殖和水生生物死亡,严重影响生态系统。半导体光催化技术作为一种安全、高效、低成本的水污染处理方法,在解决水污染问题上具有广阔的应用前景。半导体光催化技术处理水污染的原理主要是利用光生载流子的还原和氧化能力,在催化剂和水相界面与氧气或者水分子反应,生成具有强氧化性和还原性的活性基团,进而对水中的污染物或者重金属离子进行降解或还原。在诸多半导体催化剂材料中,氧化镍(NiO)和氧化锌(ZnO)因成本低,且具有较高的化学稳定性,被广泛用作光催化剂。但是由于ZnO和NiO均是宽禁带的直接带隙半导体,其电子和空穴的复合效率高,光吸收范围较窄,严重影响其光催化效率。Untreated urban domestic water, agricultural sewage, industrial sewage, etc. are discharged into rivers, which can lead to eutrophication of water bodies or excessive heavy metals, which will lead to the proliferation of bacteria in the water and the death of aquatic organisms, seriously affecting the ecosystem. As a safe, efficient and low-cost water pollution treatment method, semiconductor photocatalysis technology has broad application prospects in solving water pollution problems. The principle of semiconductor photocatalysis technology to treat water pollution is mainly to use the reduction and oxidation capabilities of photogenerated carriers to react with oxygen or water molecules at the interface between the catalyst and the water phase to generate active groups with strong oxidizing and reducing properties, which in turn react with oxygen or water molecules. Degradation or reduction of pollutants or heavy metal ions in water. Among many semiconductor catalyst materials, nickel oxide (NiO) and zinc oxide (ZnO) are widely used as photocatalysts due to their low cost and high chemical stability. However, since both ZnO and NiO are direct bandgap semiconductors with wide band gaps, the recombination efficiency of electrons and holes is high, and the light absorption range is narrow, which seriously affects their photocatalytic efficiency.
半导体理论指出,当两种不同类型的半导体相互接触后,会在界面处形成异质结,载流子的扩散和漂移运动会使材料在界面处建立一个稳定的内建电场。当异质结被能量高于其带隙能量的光激发时,非平衡载流子会在内建电场的调制下迅速转移。NiO/ZnO异质结具有典型的Ⅱ型异质结能带结构,因此NiO/ZnO异质结可以有效地阻碍光生电子和空穴的无效复合,使其获得很高的光催化效率。此外,半导体催化剂的微观结构也会很大程度地影响光催化活性。多孔结构的半导体光催化剂具有较高的比表面积和通透性,使其具有更多的反应活性位点和快速的传质通道,有助于半导体光催化剂性能的提升。目前,制备多孔半导体光催化剂的方法主要有模板法和自组装法。然而,模板法通常需要复杂的去模板过程,自组装法需要严格控制实验条件,均不适宜大规模的推广使用。因此,开发一种操作简单的制备多孔NiO/ZnO异质结材料的方法十分必要。Semiconductor theory states that when two different types of semiconductors come into contact with each other, a heterojunction will be formed at the interface, and the diffusion and drift motion of carriers will cause the material to establish a stable built-in electric field at the interface. When the heterojunction is excited by light with energy higher than its bandgap energy, the nonequilibrium carriers are rapidly transferred under the modulation of the built-in electric field. The NiO/ZnO heterojunction has a typical type II heterojunction energy band structure, so the NiO/ZnO heterojunction can effectively hinder the ineffective recombination of photogenerated electrons and holes, resulting in a high photocatalytic efficiency. In addition, the microstructure of semiconductor catalysts also greatly affects the photocatalytic activity. The porous structure of semiconductor photocatalysts has high specific surface area and permeability, which makes it have more reactive sites and fast mass transfer channels, which contribute to the improvement of the performance of semiconductor photocatalysts. At present, the methods for preparing porous semiconductor photocatalysts mainly include template method and self-assembly method. However, the template method usually requires a complex de-template process, and the self-assembly method requires strict control of experimental conditions, which are not suitable for large-scale promotion. Therefore, it is necessary to develop a simple method for preparing porous NiO/ZnO heterojunction materials.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于提供一种三维多孔自支撑NiO/ZnO异质结材料及其制备方法,本发明提供的制备方法操作简单,无需去模板,也不需要严格控制实验条件,并且本发明制备的三维多孔自支撑NiO/ZnO异质结材料具有优异的光催化性能。The purpose of the present invention is to provide a three-dimensional porous self-supporting NiO/ZnO heterojunction material and a preparation method thereof. The preparation method provided by the present invention is simple to operate, does not require template removal, and does not require strict control of experimental conditions. The three-dimensional porous self-supporting NiO/ZnO heterojunction material exhibits excellent photocatalytic performance.
为了实现上述发明目的,本发明提供了以下技术方案:In order to achieve the above-mentioned purpose of the invention, the present invention provides the following technical solutions:
本发明提供了一种三维多孔自支撑NiO/ZnO异质结材料的制备方法,包括以下步骤:The invention provides a preparation method of a three-dimensional porous self-supporting NiO/ZnO heterojunction material, comprising the following steps:
(1)将高分子聚合物、镍源、锌源和水混合,得到前驱体溶液;(1) mixing high molecular polymer, nickel source, zinc source and water to obtain a precursor solution;
(2)将所述步骤(1)得到的前驱体溶液依次进行冷冻处理和去冰处理,得到三维多孔自支撑NiO/ZnO异质结材料前驱体;(2) subjecting the precursor solution obtained in the step (1) to freezing treatment and deicing treatment in sequence to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor;
(3)将所述步骤(2)得到的三维多孔自支撑NiO/ZnO异质结材料前驱体进行煅烧,得到三维多孔自支撑NiO/ZnO异质结材料。(3) calcining the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor obtained in the step (2) to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material.
优选地,所述步骤(1)前驱体溶液中高分子聚合物的质量浓度为2~8%,镍源的质量浓度为0.7~1.0%,锌源的质量浓度为0.4~0.7%。Preferably, the mass concentration of the high molecular polymer in the precursor solution of the step (1) is 2-8%, the mass concentration of the nickel source is 0.7-1.0%, and the mass concentration of the zinc source is 0.4-0.7%.
优选地,所述步骤(1)中的高分子聚合物包括聚乙烯吡络烷酮或聚乙烯醇;镍源包括乙酸镍或硝酸镍;锌源包括乙酸锌或硝酸锌。Preferably, the high molecular polymer in the step (1) includes polyvinylpyrrolidone or polyvinyl alcohol; the nickel source includes nickel acetate or nickel nitrate; the zinc source includes zinc acetate or zinc nitrate.
优选地,所述步骤(2)中冷冻处理的温度为-196℃以下,冷冻处理的时间为10~15min。Preferably, the temperature of the freezing treatment in the step (2) is below -196°C, and the freezing treatment time is 10-15 min.
优选地,所述步骤(2)中去冰处理的温度为-70~-50℃,去冰处理的时间为24~48h。Preferably, the temperature of the deicing treatment in the step (2) is -70 to -50° C., and the time of the deicing treatment is 24 to 48 h.
优选地,所述步骤(2)中去冰处理的真空度为10~30Pa。Preferably, the vacuum degree of the deicing treatment in the step (2) is 10-30 Pa.
优选地,所述步骤(3)中煅烧的温度为500~550℃。Preferably, the calcination temperature in the step (3) is 500-550°C.
优选地,升温至所述煅烧温度的升温速率为1~2.5℃/min。Preferably, the heating rate to the calcination temperature is 1-2.5°C/min.
本发明还提供了上述技术方案所述制备方法制备得到的三维多孔自支撑NiO/ZnO异质结材料,所述三维多孔NiO/ZnO异质结材料具有多级孔结构,所述多级孔包括大孔、介孔和微孔。The present invention also provides a three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared by the preparation method described in the above technical solution, wherein the three-dimensional porous NiO/ZnO heterojunction material has a hierarchical pore structure, and the hierarchical pores include Macroporous, mesoporous and microporous.
优选地,所述微孔的孔径为0.5~2nm,所述介孔的孔径为2~50nm,所述大孔的孔径为50nm~10μm。Preferably, the pore diameter of the micropores is 0.5-2 nm, the pore diameter of the mesopores is 2-50 nm, and the pore diameter of the macropores is 50 nm-10 μm.
本发明提供了一种三维多孔自支撑NiO/ZnO异质结材料的制备方法,包括以下步骤:将高分子聚合物、镍源、锌源和水混合,得到前驱体溶液;将所述前驱体溶液依次进行冷冻处理和去冰处理,得到三维多孔自支撑NiO/ZnO异质结材料前驱体;将所述三维多孔自支撑NiO/ZnO异质结材料前驱体进行煅烧,得到三维多孔自支撑NiO/ZnO异质结材料。本发明通过将含有高分子聚合物、镍源、锌源和水的前驱体溶液进行冷冻处理使溶液中的水冷冻成冰晶,再通过去冰处理除去冰晶形成大孔孔道,最后经过煅烧去除高分子聚合物形成微孔和介孔,同时通过煅烧使镍源分解为NiO,锌源分解为ZnO,而NiO颗粒和ZnO颗粒的堆积也会形成大孔,进而得到了三维多孔自支撑NiO/ZnO异质结材料。实施例表明,本发明提供的制备方法操作简单,无需去模板,也不需要严格控制实验条件。The invention provides a preparation method of a three-dimensional porous self-supporting NiO/ZnO heterojunction material, comprising the following steps: mixing a high molecular polymer, a nickel source, a zinc source and water to obtain a precursor solution; The solution is sequentially subjected to freezing treatment and deicing treatment to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor; the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor is calcined to obtain a three-dimensional porous self-supporting NiO /ZnO heterojunction material. The present invention freezes the water in the solution into ice crystals by freezing the precursor solution containing the macromolecular polymer, nickel source, zinc source and water, then removes the ice crystals through de-icing treatment to form macroporous channels, and finally removes high pore size through calcination. The molecular polymer forms micropores and mesopores, and at the same time, the nickel source is decomposed into NiO and the zinc source is decomposed into ZnO through calcination, and the accumulation of NiO particles and ZnO particles will also form macropores, thereby obtaining three-dimensional porous self-supporting NiO/ZnO Heterojunction materials. The examples show that the preparation method provided by the present invention is simple to operate, does not require template removal, and does not require strict control of experimental conditions.
并且,本发明制备的三维多孔自支撑NiO/ZnO异质结材料具有优异的光催化性能。In addition, the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared by the present invention has excellent photocatalytic performance.
附图说明Description of drawings
图1为本发明实施例1制备三维多孔自支撑NiO/ZnO异质结材料的工艺流程图;FIG. 1 is a process flow diagram of preparing a three-dimensional porous self-supporting NiO/ZnO heterojunction material in Example 1 of the present invention;
图2为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料前驱体和三维多孔自支撑NiO/ZnO异质结材料的SEM图,插图为三维多孔自支撑NiO/ZnO异质结材料的SEM图;2 is a SEM image of the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor and the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention, the inset is the three-dimensional porous self-supporting NiO/ZnO heterojunction SEM image of the junction material;
图3为本发明实施例2制备的三维多孔自支撑NiO/ZnO异质结材料侧面的SEM图,插图为三维多孔自支撑NiO/ZnO异质结材料截面的SEM图;Fig. 3 is the SEM image of the side surface of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2 of the present invention, and the inset is the SEM image of the cross-section of the three-dimensional porous self-supporting NiO/ZnO heterojunction material;
图4为本发明实施例3制备的三维多孔自支撑NiO/ZnO异质结材料侧面的SEM图,插图为三维多孔自支撑NiO/ZnO异质结材料截面的SEM图;Fig. 4 is the SEM image of the side surface of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 3 of the present invention, and the inset is the SEM image of the cross-section of the three-dimensional porous self-supporting NiO/ZnO heterojunction material;
图5为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO的X射线衍射分析图谱;5 is an X-ray diffraction analysis pattern of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2;
图6为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO的X射线电子能谱图;6 is an X-ray electron spectrogram of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2;
图7为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例2制备的ZnO的Zn 2p的X射线电子能谱图;7 is an X-ray electron spectrogram of
图8为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO的Ni 2p的X射线电子能谱图;8 is an X-ray electron spectrogram of
图9为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料的氮气吸附脱附曲线;9 is the nitrogen adsorption and desorption curve of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention;
图10为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料的BET孔径分布图;10 is a BET pore size distribution diagram of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention;
图11为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料进行压汞测试得到的孔径分布图;11 is a pore size distribution diagram obtained by mercury intrusion testing of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention;
图12为本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO的光催化性能曲线;12 is the photocatalytic performance curve of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2;
图13本发明实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO降解甲基橙的一阶动力学线性拟合图;13 is a linear fitting diagram of the first-order kinetics of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 of the present invention, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2 to degrade methyl orange;
图14为本发明实施例2制备的三维多孔自支撑NiO/ZnO异质结材料和对比例3制备的粉体NiO/ZnO材料的光催化性能曲线;14 is the photocatalytic performance curve of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2 of the present invention and the powder NiO/ZnO material prepared in Comparative Example 3;
图15为本发明实施例2制备的三维多孔自支撑NiO/ZnO异质结材料和对比例3制备的粉体NiO/ZnO材料降解罗丹明B的一阶动力学线性拟合图。15 is a first-order kinetic linear fitting diagram of the degradation of Rhodamine B by the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2 of the present invention and the powder NiO/ZnO material prepared in Comparative Example 3.
具体实施方式Detailed ways
本发明提供了一种三维多孔自支撑NiO/ZnO异质结材料的制备方法,包括以下步骤:The invention provides a preparation method of a three-dimensional porous self-supporting NiO/ZnO heterojunction material, comprising the following steps:
(1)将高分子聚合物、镍源、锌源和水混合,得到前驱体溶液;(1) mixing high molecular polymer, nickel source, zinc source and water to obtain a precursor solution;
(2)将所述步骤(1)得到的前驱体溶液依次进行冷冻处理和去冰处理,得到三维多孔自支撑NiO/ZnO异质结材料前驱体;(2) subjecting the precursor solution obtained in the step (1) to freezing treatment and deicing treatment in sequence to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor;
(3)将所述步骤(2)得到的三维多孔自支撑NiO/ZnO异质结材料前驱体进行煅烧,得到三维多孔自支撑NiO/ZnO异质结材料。(3) calcining the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor obtained in the step (2) to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material.
本发明将高分子聚合物、镍源、锌源和水混合,得到前驱体溶液。本发明对所述高分子聚合物、镍源、锌源和水的混合的操作没有特殊的限定,采用本领域技术人员熟知的固液混合的技术方案即可。在本发明中,所述高分子聚合物、镍源、锌源和水的混合优选在搅拌的条件下进行。在本发明中,所述搅拌的速率优选为500~600r/min,更优选为550~600r/min;所述搅拌的时间优选为10~15h,更优选为12~14h;所述搅拌的温度优选为室温;所述搅拌的方式优选为磁力搅拌。In the present invention, high molecular polymer, nickel source, zinc source and water are mixed to obtain a precursor solution. The present invention has no special limitation on the mixing operation of the high molecular polymer, the nickel source, the zinc source and the water, and the technical solution of solid-liquid mixing well known to those skilled in the art can be adopted. In the present invention, the mixing of the high molecular polymer, the nickel source, the zinc source and the water is preferably carried out under stirring conditions. In the present invention, the stirring rate is preferably 500-600 r/min, more preferably 550-600 r/min; the stirring time is preferably 10-15 h, more preferably 12-14 h; the stirring temperature is Preferably it is room temperature; the stirring mode is preferably magnetic stirring.
在本发明中,所述高分子聚合物优选包括聚乙烯吡络烷酮或聚乙烯醇,更优选为聚乙烯吡络烷酮。本发明对所述高分子聚合物的来源没有特殊的限定,采用本领域技术人员熟知的市售产品即可。在本发明中,所述高分子聚合物可以阻碍镍源、锌源自身的团聚,促进异质结的形成,还可以阻碍冰晶的横向生长,并作为构成孔道结构的骨架。In the present invention, the high molecular polymer preferably comprises polyvinylpyrrolidone or polyvinyl alcohol, more preferably polyvinylpyrrolidone. The source of the high molecular polymer is not particularly limited in the present invention, and commercially available products well known to those skilled in the art can be used. In the present invention, the high molecular polymer can hinder the agglomeration of the nickel source and the zinc source itself, promote the formation of heterojunction, and can also hinder the lateral growth of ice crystals, and serve as the skeleton constituting the pore structure.
在本发明中,所述前驱体溶液中高分子聚合物的质量浓度优选为2~8%,更优选为4~8%。本发明优选将所述前驱体溶液中高分子聚合物的质量浓度控制在上述范围,高分子聚合物的质量浓度过高,会造成孔道的坍塌,进而无法保持多孔形貌,而浓度过低,又无法形成孔道结构,制成的材料呈现颗粒堆积的形貌。In the present invention, the mass concentration of the high molecular polymer in the precursor solution is preferably 2-8%, more preferably 4-8%. In the present invention, the mass concentration of the high molecular polymer in the precursor solution is preferably controlled within the above range. If the mass concentration of the high molecular polymer is too high, the pores will collapse and the porous morphology cannot be maintained. The pore structure cannot be formed, and the resulting material exhibits the morphology of particle accumulation.
在本发明中,所述镍源优选包括乙酸镍或硝酸镍,更优选为乙酸镍。本发明对所述镍源的来源没有特殊的限定,采用本领域技术人员熟知的市售产品即可。In the present invention, the nickel source preferably includes nickel acetate or nickel nitrate, more preferably nickel acetate. The source of the nickel source is not particularly limited in the present invention, and commercially available products well known to those skilled in the art can be used.
在本发明中,所述前驱体溶液中镍源的质量浓度优选为0.7~1.0%,更优选为0.74~0.99%。本发明优选将所述前驱体溶液中镍源的质量浓度控制在上述范围,镍源的浓度影响材料的机械强度,浓度越高,硬度越高,但是浓度过高,又会影响材料的光催化性能。In the present invention, the mass concentration of the nickel source in the precursor solution is preferably 0.7-1.0%, more preferably 0.74-0.99%. In the present invention, the mass concentration of the nickel source in the precursor solution is preferably controlled within the above range. The concentration of the nickel source affects the mechanical strength of the material. The higher the concentration, the higher the hardness. However, if the concentration is too high, it will affect the photocatalysis of the material. performance.
在本发明中,所述锌源优选包括乙酸锌或硝酸锌,更优选为乙酸锌。本发明对所述锌源的来源没有特殊的限定,采用本领域技术人员熟知的市售产品即可。In the present invention, the zinc source preferably includes zinc acetate or zinc nitrate, more preferably zinc acetate. The source of the zinc source is not particularly limited in the present invention, and commercially available products well known to those skilled in the art can be used.
在本发明中,所述前驱体溶液中锌源的质量浓度优选为0.4~0.7%,更优选为0.44~0.65%。本发明优选将所述前驱体溶液中锌源的质量浓度控制在上述范围,锌源的浓度影响材料的机械强度,浓度越高,硬度越高,但是浓度过高,又会影响材料的光催化性能。In the present invention, the mass concentration of the zinc source in the precursor solution is preferably 0.4-0.7%, more preferably 0.44-0.65%. In the present invention, the mass concentration of the zinc source in the precursor solution is preferably controlled within the above-mentioned range. The concentration of the zinc source affects the mechanical strength of the material. The higher the concentration, the higher the hardness. However, if the concentration is too high, it will affect the photocatalysis of the material. performance.
在本发明中,所述水优选为去离子水。In the present invention, the water is preferably deionized water.
得到前驱体溶液后,本发明将所述前驱体溶液依次进行冷冻处理和去冰处理,得到三维多孔自支撑NiO/ZnO异质结材料前驱体。本发明将含有高分子聚合物、镍源、锌源和水的前驱体溶液进行冷冻处理使溶液中的水冷冻成冰晶,再通过去冰处理除去冰晶形成大孔。After the precursor solution is obtained, the present invention sequentially performs freezing treatment and deicing treatment on the precursor solution to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor. In the present invention, the precursor solution containing the high molecular polymer, the nickel source, the zinc source and the water is subjected to freezing treatment to freeze the water in the solution into ice crystals, and then the ice crystals are removed by de-icing treatment to form macropores.
在本发明中,所述冷冻处理的温度优选为-196℃以下。在本发明中,所述冷冻处理优选在液氮中进行。在本发明中,所述冷冻处理的时间优选为10~15min,更优选为10~12min。本发明优选将前驱体溶液置于上述温度下进行冷冻处理,可使前驱体溶液中的水瞬间冷冻成冰晶,再经去冰处理除去冰晶形成大孔。In the present invention, the temperature of the freezing treatment is preferably -196°C or lower. In the present invention, the freezing treatment is preferably performed in liquid nitrogen. In the present invention, the freezing treatment time is preferably 10-15 min, more preferably 10-12 min. In the present invention, the precursor solution is preferably placed at the above temperature for freezing treatment, so that the water in the precursor solution can be instantly frozen into ice crystals, and then the ice crystals are removed by de-icing treatment to form macropores.
冷冻处理完成后,本发明将所述冷冻处理后的产物进行去冰处理,得到三维多孔自支撑NiO/ZnO异质结材料前驱体。本发明对所述去冰处理的操作没有特殊的限定,能够去除产物中的冰晶即可。在本发明中,所述去冰处理的方式优选为冷冻干燥。在本发明中,所述冷冻干燥的温度优选为-70~-50℃,更优选为-70℃;所述冷冻干燥的时间优选为24~48h,更优选为48h。本发明优选将所述冷冻干燥的温度控制在上述范围,可使冰晶直接升华而不会融化成水,有利于保持材料的多孔结构。在本发明中,所述冷冻干燥的装置优选为真空冷冻干燥机。After the freezing treatment is completed, in the present invention, the freezing treatment product is subjected to deicing treatment to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor. The present invention has no special limitation on the operation of the deicing treatment, as long as the ice crystals in the product can be removed. In the present invention, the method of the deicing treatment is preferably freeze-drying. In the present invention, the freeze-drying temperature is preferably -70--50°C, more preferably -70°C; the freeze-drying time is preferably 24-48h, more preferably 48h. In the present invention, the temperature of the freeze-drying is preferably controlled within the above range, so that the ice crystals can be directly sublimated without melting into water, which is beneficial to maintain the porous structure of the material. In the present invention, the freeze-drying device is preferably a vacuum freeze-drying machine.
在本发明中,所述去冰处理的真空度优选为10~30Pa,更优选为20~30Pa。本发明优选将所述去冰处理的真空度控制在上述范围,真空度过低,冰晶的升华速率慢,此时材料本身可能会因为吸收热量而融化,不利于材料多孔结构的保持;而真空度过高影响传热,也会使冰晶的升华速率减慢,影响材料多孔结构的保持。In the present invention, the degree of vacuum in the deicing treatment is preferably 10 to 30 Pa, more preferably 20 to 30 Pa. The present invention preferably controls the vacuum degree of the de-icing treatment within the above-mentioned range. If the vacuum is too low, the sublimation rate of ice crystals is slow. At this time, the material itself may melt due to absorbing heat, which is not conducive to maintaining the porous structure of the material. Too high will affect the heat transfer, and will also slow down the sublimation rate of ice crystals and affect the maintenance of the porous structure of the material.
得到三维多孔自支撑NiO/ZnO异质结材料前驱体后,本发明将所述三维多孔自支撑NiO/ZnO异质结材料前驱体进行煅烧,得到三维多孔自支撑NiO/ZnO异质结材料。本发明通过煅烧去除高分子聚合物,进而形成微孔和介孔,同时通过煅烧使镍源分解为NiO,锌源分解为ZnO,而NiO颗粒和ZnO颗粒的堆积也会形成大孔。After obtaining the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor, the present invention calcines the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor to obtain the three-dimensional porous self-supporting NiO/ZnO heterojunction material. The invention removes the macromolecular polymer by calcination, and then forms micropores and mesopores. Meanwhile, the nickel source is decomposed into NiO and the zinc source is decomposed into ZnO through calcination, and the accumulation of NiO particles and ZnO particles also forms macropores.
在本发明中,所述煅烧的温度优选为500~550℃,更优选为550℃。在本发明中,升温至所述煅烧温度的升温速率优选为1~2.5℃/min,更优选为2.5℃/min。本发明优选将所述煅烧的温度控制在上述范围,以便于彻底去除高分子聚合物;而煅烧温度过高,会使组成孔壁的颗粒变大,使材料的比表面积下降,最终影响材料的光催化性能。在本发明中,所述煅烧的装置优选为马弗炉。In the present invention, the calcination temperature is preferably 500 to 550°C, more preferably 550°C. In the present invention, the heating rate to the calcination temperature is preferably 1 to 2.5°C/min, more preferably 2.5°C/min. In the present invention, the calcination temperature is preferably controlled within the above-mentioned range, so as to facilitate the complete removal of the high molecular polymer; however, if the calcination temperature is too high, the particles constituting the pore wall will become larger, the specific surface area of the material will decrease, and the final effect of the material will be affected. photocatalytic properties. In the present invention, the calcining device is preferably a muffle furnace.
升温至所述煅烧温度后,本发明优选在所述煅烧温度下保温,得到三维多孔自支撑NiO/ZnO异质结材料。在本发明中,所述保温的时间优选为1~5h,更优选为2~3h。本发明优选通过保温一段时间以便彻底去除高分子聚合物,同时提高材料的结晶性。After the temperature is raised to the calcination temperature, the present invention preferably maintains the temperature at the calcination temperature to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material. In the present invention, the holding time is preferably 1 to 5 hours, more preferably 2 to 3 hours. In the present invention, it is preferable to keep the temperature for a period of time in order to completely remove the high molecular polymer, while improving the crystallinity of the material.
本发明通过将含有高分子聚合物、镍源、锌源和水的前驱体溶液进行冷冻处理使溶液中的水冷冻成冰晶,再通过去冰处理除去冰晶形成大孔,最后经过煅烧去除高分子聚合物形成微孔和介孔,同时通过煅烧使镍源分解为NiO,锌源分解为ZnO,而NiO颗粒和ZnO颗粒的堆积也会形成大孔,进而得到了一种具有大孔、介孔和微孔的三维多孔自支撑NiO/ZnO异质结材料。In the present invention, the precursor solution containing the macromolecular polymer, the nickel source, the zinc source and the water is subjected to freezing treatment to freeze the water in the solution into ice crystals, and then the ice crystals are removed by de-icing treatment to form macropores, and finally the macromolecules are removed by calcination. The polymer forms micropores and mesopores, and at the same time, the nickel source is decomposed into NiO and the zinc source is decomposed into ZnO through calcination, and the accumulation of NiO particles and ZnO particles will also form macropores, thereby obtaining a macropore, mesopores. and microporous three-dimensional porous self-supporting NiO/ZnO heterojunction materials.
本发明还提供了上述技术方案所述制备方法制备得到的三维多孔自支撑NiO/ZnO异质结材料,所述三维多孔NiO/ZnO异质结材料具有多级孔结构,所述多级孔包括大孔、介孔和微孔。在本发明中,所述微孔和介孔是煅烧去除高分子聚合物留下的,可以大幅提升材料的比表面积,为光催化反应提供大量的反应位点,大孔是除冰后留下的孔道结构和颗粒堆积形成的孔结构,可以显著提高反应物的传质效率,进而提高光催化反应的效率。The present invention also provides a three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared by the preparation method described in the above technical solution, wherein the three-dimensional porous NiO/ZnO heterojunction material has a hierarchical pore structure, and the hierarchical pores include Macroporous, mesoporous and microporous. In the present invention, the micropores and mesopores are left by calcining to remove the high molecular polymer, which can greatly increase the specific surface area of the material and provide a large number of reaction sites for the photocatalytic reaction, and the macropores are left after deicing. The pore structure and the pore structure formed by particle accumulation can significantly improve the mass transfer efficiency of the reactants, thereby improving the efficiency of the photocatalytic reaction.
在本发明中,所述微孔的孔径优选为0.5~2nm,更优选为1~2nm;所述介孔的孔径优选为2~50nm,更优选为5~50nm;所述大孔的孔径优选为50nm~10μm,更优选为100nm~10μm。In the present invention, the pore size of the micropores is preferably 0.5-2 nm, more preferably 1-2 nm; the pore size of the mesopores is preferably 2-50 nm, more preferably 5-50 nm; the pore size of the macropores is preferably It is 50 nm to 10 μm, and more preferably 100 nm to 10 μm.
下面将结合本发明中的实施例,对本发明中的技术方案进行清楚、完整地描述。显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions of the present invention will be clearly and completely described below with reference to the embodiments of the present invention. Obviously, the described embodiments are only some, but not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
实施例1Example 1
将0.372g乙酸镍、0.328g乙酸锌和4g聚乙烯吡咯烷酮溶解在50mL去离子水中,以600r/min的速率在室温下磁力搅拌12h,得到前驱体溶液(前驱体溶液中聚乙烯吡络烷酮的质量浓度为8%,乙酸镍的质量浓度为0.74%,乙酸锌的质量浓度为0.65%);Dissolve 0.372g nickel acetate, 0.328g zinc acetate and 4g polyvinylpyrrolidone in 50mL deionized water, stir magnetically at room temperature for 12h at a rate of 600r/min to obtain a precursor solution (polyvinylpyrrolidone in the precursor solution) The mass concentration of nickel acetate is 8%, the mass concentration of nickel acetate is 0.74%, and the mass concentration of zinc acetate is 0.65%);
将上述前驱体溶液注入离心管中,并以1cm/s的速度垂直浸入-196℃的液氮中,保持10min,去除离心管的封盖后将离心管置于真空冷冻干燥机中,在真空度为20Pa,温度为-70℃的条件下干燥48h,得到三维多孔自支撑NiO/ZnO异质结材料前驱体;The above precursor solution was injected into a centrifuge tube, and immersed vertically in liquid nitrogen at -196 °C at a speed of 1 cm/s for 10 min. After removing the cap of the centrifuge tube, the centrifuge tube was placed in a vacuum freeze dryer. The three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor was obtained by drying at a temperature of -70 °C for 48 h at a temperature of 20 Pa;
将上述三维多孔自支撑NiO/ZnO异质结材料前驱体置于马弗炉中,然后按照2.5℃/min的升温速率,将煅烧温度由室温升高至550℃,之后保温2h,然后自然降至室温,得到具有大孔、介孔和微孔的三维多孔自支撑NiO/ZnO异质结材料(记为NiO/ZnO-1)。其中,大孔孔径为7μm、介孔孔径为48nm、微孔孔径为1nm。The above three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor was placed in a muffle furnace, and then the calcination temperature was increased from room temperature to 550 °C at a heating rate of 2.5 °C/min, and then kept for 2 h, and then naturally At room temperature, a three-dimensional porous self-supporting NiO/ZnO heterojunction material (denoted as NiO/ZnO-1) with macropores, mesopores and micropores was obtained. Among them, the macropore diameter is 7 μm, the mesopore diameter is 48 nm, and the micropore diameter is 1 nm.
应用例1Application example 1
将实施例1制得的三维多孔自支撑NiO/ZnO异质结材料用于光催化降解甲基橙,以50W的紫外灯作为光源。将30mg实施例1制备的NiO/ZnO-1加入到30mL 10ppm的甲基橙溶液中,在黑暗中吸附30min以达到吸附-解吸平衡,之后将混合溶液置于紫外灯下,每隔15min,取出2mL溶液,用UH4150分光光度计检测溶液在463nm处的吸光度,结果如图12所示。The three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 was used for photocatalytic degradation of methyl orange, and a 50W UV lamp was used as the light source. 30mg of NiO/ZnO-1 prepared in Example 1 was added to 30mL of 10ppm methyl orange solution, adsorbed in the dark for 30min to reach adsorption-desorption equilibrium, then the mixed solution was placed under an ultraviolet lamp, and taken out every 15min. 2mL solution, the absorbance at 463nm of the solution was detected with a UH4150 spectrophotometer, the results are shown in Figure 12.
实施例2Example 2
将0.496g乙酸镍、0.219g乙酸锌和4g聚乙烯吡咯烷酮溶解在50mL去离子水中,以600r/min的速率在室温下磁力搅拌12h,得到前驱体溶液(前驱体溶液中聚乙烯吡络烷酮的质量浓度为8%,乙酸镍的质量浓度为0.99%,乙酸锌的质量浓度为0.44%);Dissolve 0.496g nickel acetate, 0.219g zinc acetate and 4g polyvinylpyrrolidone in 50mL deionized water, stir magnetically at room temperature for 12h at a rate of 600r/min to obtain a precursor solution (polyvinylpyrrolidone in the precursor solution) The mass concentration of 8%, the mass concentration of nickel acetate is 0.99%, the mass concentration of zinc acetate is 0.44%);
将上述前驱体溶液注入离心管中,并以1cm/s的速度垂直浸入-196℃的液氮中,保持10min,去除离心管的封盖后将离心管置于真空冷冻干燥机中,在真空度为20Pa,温度为-70℃的条件下干燥48h,得到三维多孔自支撑NiO/ZnO异质结材料前驱体;The above precursor solution was injected into a centrifuge tube, and immersed vertically in liquid nitrogen at -196 °C at a speed of 1 cm/s for 10 min. After removing the cap of the centrifuge tube, the centrifuge tube was placed in a vacuum freeze dryer. The three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor was obtained by drying at a temperature of -70 °C for 48 h at a temperature of 20 Pa;
将上述三维多孔自支撑NiO/ZnO异质结材料前驱体置于马弗炉中,按照2.5℃/min的升温速率,将煅烧温度由室温升高至550℃,之后保温2h,然后自然降至室温,得到具有大孔、介孔和微孔的三维多孔自支撑NiO/ZnO异质结材料(记为NiO/ZnO-2)。其中,大孔孔径为6μm、介孔孔径为48nm、微孔孔径为1nm。The above three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor was placed in a muffle furnace, and the calcination temperature was increased from room temperature to 550 °C at a heating rate of 2.5 °C/min, followed by holding for 2 h, and then naturally decreased. At room temperature, a three-dimensional porous self-supporting NiO/ZnO heterojunction material (denoted as NiO/ZnO-2) with macropores, mesopores and micropores was obtained. Among them, the macropore diameter is 6 μm, the mesopore diameter is 48 nm, and the micropore diameter is 1 nm.
应用例2Application example 2
将实施例2制备的三维多孔自支撑NiO/ZnO异质结材料用于光催化降解罗丹明B,以50W的紫外灯作为光源。将30mg实施例2制备的NiO/ZnO-2加入到30mL 10ppm的罗丹明B溶液中,在黑暗中吸附30min以达到吸附-解吸平衡,之后将混合溶液置于紫外灯下,每隔15min,取出2mL溶液,用UH4150分光光度计检测溶液在553nm处的吸光度,结果如图14所示。The three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2 was used for photocatalytic degradation of Rhodamine B, and a 50W UV lamp was used as the light source. 30mg of NiO/ZnO-2 prepared in Example 2 was added to 30mL of 10ppm Rhodamine B solution, adsorbed in the dark for 30min to reach adsorption-desorption equilibrium, then the mixed solution was placed under an ultraviolet lamp, and taken out every 15min. 2mL solution, the absorbance at 553nm of the solution was detected with a UH4150 spectrophotometer, the results are shown in Figure 14.
实施例3Example 3
将0.496g乙酸镍、0.219g乙酸锌和2g聚乙烯吡咯烷酮溶解在50mL去离子水中,以600r/min的速率在室温下磁力搅拌12h,得到前驱体溶液(前驱体溶液中聚乙烯吡络烷酮的质量浓度为4%,乙酸镍的质量浓度为0.99%,乙酸锌的质量浓度为0.44%);Dissolve 0.496g nickel acetate, 0.219g zinc acetate and 2g polyvinylpyrrolidone in 50mL deionized water, stir magnetically at room temperature for 12h at a rate of 600r/min to obtain a precursor solution (polyvinylpyrrolidone in the precursor solution) The mass concentration of nickel acetate is 4%, the mass concentration of nickel acetate is 0.99%, and the mass concentration of zinc acetate is 0.44%);
将上述前驱体溶液注入离心管中,并以1cm/s的速度垂直浸入-196℃的液氮中,保持10min,去除离心管的封盖后将离心管置于真空冷冻干燥机中,在真空度为30Pa,温度为-50℃的条件下干燥48h,得到三维多孔自支撑NiO/ZnO异质结材料前驱体;The above precursor solution was injected into a centrifuge tube, and immersed vertically in liquid nitrogen at -196 °C at a speed of 1 cm/s for 10 min. After removing the cap of the centrifuge tube, the centrifuge tube was placed in a vacuum freeze dryer. The three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor was obtained by drying at a temperature of -50 °C for 48 h at a temperature of 30 Pa;
将上述三维多孔自支撑NiO/ZnO异质结材料前驱体置于马弗炉中,按照1℃/min的升温速率,将煅烧温度由室温升高至500℃,之后保温2h,然后自然降至室温,得到具有大孔、介孔和微孔的三维多孔自支撑NiO/ZnO异质结材料(记为NiO/ZnO-3)。其中,大孔孔径为2μm、介孔孔径为32nm、微孔孔径为1nm。The above-mentioned three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor was placed in a muffle furnace, and the calcination temperature was increased from room temperature to 500 °C at a heating rate of 1 °C/min, followed by holding for 2 h, and then naturally decreased. At room temperature, a three-dimensional porous self-supporting NiO/ZnO heterojunction material (denoted as NiO/ZnO-3) with macropores, mesopores and micropores was obtained. Among them, the macropore diameter is 2 μm, the mesopore diameter is 32 nm, and the micropore diameter is 1 nm.
对比例1Comparative Example 1
将0.744g乙酸镍和4g聚乙烯吡咯烷酮溶解在50mL去离子水中,以600r/min的速率在室温下磁力搅拌12h,得到前驱体溶液;Dissolve 0.744g of nickel acetate and 4g of polyvinylpyrrolidone in 50mL of deionized water, and stir magnetically at room temperature for 12h at a rate of 600r/min to obtain a precursor solution;
将上述前驱体溶液注入离心管中,并以1cm/s的速度垂直浸入-196℃的液氮中,保持10min,去除离心管的封盖后将离心管置于真空冷冻干燥机中,在真空度为20Pa,温度为-70℃的条件下干燥48h,得到三维多孔自支撑NiO材料前驱体;The above precursor solution was injected into a centrifuge tube, and immersed vertically in liquid nitrogen at -196 °C at a speed of 1 cm/s for 10 min. After removing the cap of the centrifuge tube, the centrifuge tube was placed in a vacuum freeze dryer. The three-dimensional porous self-supporting NiO material precursor was obtained by drying at a temperature of -70 °C for 48 h at a temperature of 20 Pa;
将上述三维多孔自支撑NiO材料前驱体材料置于马弗炉中,按照2.5℃/min的升温速率,将煅烧温度由室温升高至550℃,之后保温2h,然后自然降至室温,得到具有大孔、介孔和微孔的三维多孔自支撑NiO。The above-mentioned three-dimensional porous self-supporting NiO material precursor material is placed in a muffle furnace, and the calcination temperature is increased from room temperature to 550 °C at a heating rate of 2.5 °C/min, followed by holding for 2 hours, and then naturally lowered to room temperature to obtain Three-dimensional porous free-standing NiO with macropores, mesopores and micropores.
对比应用例1Comparative application example 1
将对比例1制备的三维多孔自支撑NiO用于光催化降解甲基橙,以50W的紫外灯作为光源。将30mg对比例1制备的NiO加入到30mL 10ppm的甲基橙溶液中,在黑暗中吸附30min以达到吸附-解吸平衡,之后将混合溶液置于紫外灯下,每隔15min,取出2mL溶液,用UH4150分光光度计检测溶液在463nm处的吸光度,结果如图12所示。The three-dimensional porous self-supporting NiO prepared in Comparative Example 1 was used for photocatalytic degradation of methyl orange with a 50W UV lamp as the light source. 30 mg of NiO prepared in Comparative Example 1 was added to 30 mL of 10 ppm methyl orange solution, adsorbed in the dark for 30 min to achieve adsorption-desorption equilibrium, then the mixed solution was placed under a UV lamp, and 2 mL of the solution was taken out every 15 min. UH4150 spectrophotometer detects the absorbance of the solution at 463 nm, and the results are shown in Figure 12.
对比例2Comparative Example 2
将0.656g乙酸锌和4g聚乙烯吡咯烷酮溶解在50mL去离子水中,以600r/min的速率在室温下磁力搅拌12h,得到前驱体溶液;Dissolve 0.656g of zinc acetate and 4g of polyvinylpyrrolidone in 50mL of deionized water, and magnetically stir at room temperature for 12h at a rate of 600r/min to obtain a precursor solution;
将上述前驱体溶液注入离心管中,并以1cm/s的速度垂直浸入-196℃的液氮中,保持10min,去除离心管的封盖后将离心管置于真空冷冻干燥机中,在真空度为20Pa,温度为-70℃的条件下干燥48h,得到三维多孔自支撑ZnO材料前驱体;The above precursor solution was injected into a centrifuge tube, and immersed vertically in liquid nitrogen at -196 °C at a speed of 1 cm/s for 10 min. After removing the cap of the centrifuge tube, the centrifuge tube was placed in a vacuum freeze dryer. The three-dimensional porous self-supporting ZnO material precursor was obtained by drying at a temperature of -70 °C for 48 h at a temperature of 20 Pa;
将上述三维多孔自支撑ZnO材料前驱体置于马弗炉中,按照2.5℃/min的升温速率,将煅烧温度由室温升高至550℃,之后保温2h,然后自然降至室温,得到具有大孔、介孔和微孔的三维多孔自支撑ZnO。The above three-dimensional porous self-supporting ZnO material precursor was placed in a muffle furnace, and the calcination temperature was increased from room temperature to 550 °C at a heating rate of 2.5 °C/min, followed by holding for 2 h, and then naturally lowered to room temperature to obtain a Three-dimensional porous free-standing ZnO with macropores, mesopores and micropores.
对比应用例2Comparative application example 2
将对比例2制备的三维多孔自支撑ZnO用于光催化降解甲基橙,以50W的紫外灯作为光源。将30mg对比例2制备的ZnO加入到30mL 10ppm的甲基橙溶液中,在黑暗中吸附30min以达到吸附-解吸平衡,之后将混合溶液置于紫外光源下,每隔15min,取出2mL溶液,用UH4150分光光度计检测溶液在463nm处的吸光度,结果如图12所示。The three-dimensional porous self-supporting ZnO prepared in Comparative Example 2 was used for photocatalytic degradation of methyl orange with a 50W UV lamp as the light source. 30 mg of ZnO prepared in Comparative Example 2 was added to 30 mL of 10 ppm methyl orange solution, adsorbed in the dark for 30 min to achieve adsorption-desorption equilibrium, then the mixed solution was placed under an ultraviolet light source, and 2 mL of the solution was taken out every 15 min. UH4150 spectrophotometer detects the absorbance of the solution at 463 nm, and the results are shown in Figure 12.
对比例3Comparative Example 3
将0.496g乙酸镍、0.219g乙酸锌和4g聚乙烯吡咯烷酮溶解在50mL去离子水中,以600r/min的速率在室温下磁力搅拌12h,得到前驱体溶液;Dissolve 0.496g of nickel acetate, 0.219g of zinc acetate and 4g of polyvinylpyrrolidone in 50mL of deionized water, and magnetically stir at room temperature for 12h at a rate of 600r/min to obtain a precursor solution;
将上述前驱体溶液注入离心管中,去除离心管的封盖后将离心管置于烘箱中,在60℃下烘干48h,得到粉体NiO/ZnO材料前驱体;The above-mentioned precursor solution was injected into a centrifuge tube, the cap of the centrifuge tube was removed, and the centrifuge tube was placed in an oven, and dried at 60° C. for 48 hours to obtain a powder NiO/ZnO material precursor;
将上述粉体NiO/ZnO材料前驱体置于马弗炉中,按照2.5℃/min的升温速率,将煅烧温度由室温升高至550℃,之后保温2h,然后自然降至室温,得到粉体NiO/ZnO材料(记为NiO/ZnO-E)。The above-mentioned powder NiO/ZnO material precursor was placed in a muffle furnace, and the calcination temperature was increased from room temperature to 550 ° C according to the heating rate of 2.5 ° C/min, followed by holding for 2 hours, and then naturally lowered to room temperature to obtain powder. Bulk NiO/ZnO material (referred to as NiO/ZnO-E).
对比应用例3Comparative application example 3
将实施例3制备的粉体NiO/ZnO异质结材料用于光催化降解罗丹明B,以50W的紫外灯作为光源。将30mg对比例3制备的NiO/ZnO-E加入到30mL10ppm的罗丹明B溶液中,在黑暗中吸附30min以达到吸附-解吸平衡。之后将混合溶液置于紫外灯下,每隔15min,取出2mL溶液,用UH4150分光光度计检测溶液在553nm处的吸光度,结果如图14所示。The powder NiO/ZnO heterojunction material prepared in Example 3 was used for photocatalytic degradation of Rhodamine B, and a 50W UV lamp was used as the light source. 30 mg of NiO/ZnO-E prepared in Comparative Example 3 was added to 30 mL of 10 ppm Rhodamine B solution, and adsorbed in the dark for 30 min to reach the adsorption-desorption equilibrium. After that, the mixed solution was placed under an ultraviolet lamp, and 2 mL of the solution was taken out every 15 minutes, and the absorbance of the solution at 553 nm was detected with a UH4150 spectrophotometer. The results are shown in Figure 14.
图1为实施例1制备三维多孔自支撑NiO/ZnO异质结材料的工艺流程图。如图1所示,先将乙酸镍、乙酸锌、聚乙烯吡咯烷酮和水混合,得到前驱体溶液,然后将前驱体溶液置于液氮中进行冷冻处理,之后置于冷冻干燥机中进行去冰处理,最后置于马弗炉中进行煅烧,进而得到了三维多孔自支撑NiO/ZnO异质结材料。FIG. 1 is a process flow diagram of preparing a three-dimensional porous self-supporting NiO/ZnO heterojunction material in Example 1. As shown in Figure 1, nickel acetate, zinc acetate, polyvinylpyrrolidone and water were first mixed to obtain a precursor solution, and then the precursor solution was placed in liquid nitrogen for freezing treatment, and then placed in a freeze dryer for de-icing After treatment, it was finally calcined in a muffle furnace to obtain a three-dimensional porous self-supporting NiO/ZnO heterojunction material.
图2为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料前驱体和三维多孔自支撑NiO/ZnO异质结材料的SEM图,其中,插图为三维多孔自支撑NiO/ZnO异质结材料的SEM图;由图2可以看出,实施例1制备的三维多孔自支撑NiO/ZnO异质结材料前驱体和三维多孔自支撑NiO/ZnO异质结材料皆有孔道结构,孔壁薄且平滑,同时侧面可以观察到冰升华后留下的孔道结构。2 is the SEM image of the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor and the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1, wherein the inset is the three-dimensional porous self-supporting NiO/ZnO heterojunction The SEM image of the junction material; it can be seen from Figure 2 that the three-dimensional porous self-supporting NiO/ZnO heterojunction material precursor and the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 all have a pore structure, and the pore walls Thin and smooth, and the pore structure left after ice sublimation can be observed on the side.
图3为实施例2制备的三维多孔自支撑NiO/ZnO异质结材料侧面的SEM图,其中,插图为三维多孔自支撑NiO/ZnO异质结材料截面的SEM图。由图3可以看出,实施例2制备的NiO/ZnO-2的微观结构与实施例1制备的NiO/ZnO-1的微观结构相似,都具有丰富的孔道结构。3 is a SEM image of the side surface of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2, wherein the inset is an SEM image of the cross-section of the three-dimensional porous self-supporting NiO/ZnO heterojunction material. It can be seen from Figure 3 that the microstructure of NiO/ZnO-2 prepared in Example 2 is similar to that of NiO/ZnO-1 prepared in Example 1, and both have abundant pore structures.
图4为实施例3制备的三维多孔自支撑NiO/ZnO异质结材料侧面的SEM图,其中,插图为三维多孔自支撑NiO/ZnO异质结材料截面的SEM图。由图4可以看出,实施例3制备的NiO/ZnO-3的微观结构与实施例1制备的NiO/ZnO-1以及实施例2制备的NiO/ZnO-2的微观结构相似,都具有丰富的孔道结构,但是孔道的尺寸有所不同,说明本发明提供的制备方法可以调控孔道结构的尺寸。4 is a SEM image of the side of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 3, wherein the inset is an SEM image of the cross-section of the three-dimensional porous self-supporting NiO/ZnO heterojunction material. It can be seen from Figure 4 that the microstructure of NiO/ZnO-3 prepared in Example 3 is similar to that of NiO/ZnO-1 prepared in Example 1 and NiO/ZnO-2 prepared in Example 2, and both have rich The pore structure is different, but the size of the pore is different, indicating that the preparation method provided by the present invention can control the size of the pore structure.
图5为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO的X射线衍射分析图谱;图6为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO的X射线电子能谱图;图7为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例2制备的ZnO的Zn 2p的X射线电子能谱图;图8为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO的Ni 2p的X射线电子能谱图。由图5~图8可以看出,本发明提供的制备方法成功制备了三维多孔自支撑NiO/ZnO异质结材料。5 is the X-ray diffraction analysis pattern of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2; X-ray electron spectra of the self-supporting NiO/ZnO heterojunction material, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2; FIG. 7 is the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1. and the X-ray electron spectrum of
图9为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料的氮气吸附脱附曲线;图10为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料的BET孔径分布图。由图9和图10可以看出,实施例1制备的三维多孔自支撑NiO/ZnO异质结材料具有微孔和介孔结构。9 is the nitrogen adsorption and desorption curve of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1; FIG. 10 is the BET pore size distribution diagram of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 . It can be seen from FIG. 9 and FIG. 10 that the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 has microporous and mesoporous structures.
图11是对实施例1制备的三维多孔自支撑NiO/ZnO异质结材料进行压汞测试得到的孔径分布图。由图11可以看出,实施例1制备的三维多孔自支撑NiO/ZnO异质结材料具有大孔结构。11 is a pore size distribution diagram obtained by mercury intrusion testing on the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1. It can be seen from FIG. 11 that the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1 has a macroporous structure.
图12为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO在紫外光(λ<420nm)下对甲基橙的光催化降解曲线;图13为实施例1制备的三维多孔自支撑NiO/ZnO异质结材料和对比例1制备的NiO、对比例2制备的ZnO降解甲基橙的一阶动力学线性拟合图。由图12和图13可以看出,实施例1制备的NiO/ZnO-1具有比相同结构的NiO和ZnO更好的光催化效率。Figure 12 shows the photocatalytic degradation of methyl orange by the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2 under ultraviolet light (λ<420 nm). Figure 13 is a linear fitting diagram of the first-order kinetics of the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 1, NiO prepared in Comparative Example 1, and ZnO prepared in Comparative Example 2 to degrade methyl orange. It can be seen from Figure 12 and Figure 13 that the NiO/ZnO-1 prepared in Example 1 has better photocatalytic efficiency than NiO and ZnO with the same structure.
图14为实施例2制备的三维多孔自支撑NiO/ZnO异质结材料和对比例3制备的粉体NiO/ZnO材料在紫外光(λ<420nm)下对罗丹明B的光催化降解曲线;图15为实施例2制备的三维多孔自支撑NiO/ZnO异质结材料和对比例3制备的粉体NiO/ZnO材料降解罗丹明B的一阶动力学线性拟合图。由图14和图15可以看出,实施例2制备的三维多孔自支撑NiO/ZnO异质结材料相较于对比例3制备的粉体NiO/ZnO异质结具有更高的光催化速率,降解速率是粉体NiO/ZnO材料的3倍左右。由此可知,采用本发明提供的制备方法制备的三维多孔自支撑NiO/ZnO异质结材料因其独特的分级多孔结构,表现出更加优异的光催化性能。Fig. 14 is the photocatalytic degradation curve of rhodamine B under ultraviolet light (λ<420nm) by the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2 and the powder NiO/ZnO material prepared in Comparative Example 3; 15 is a linear fitting diagram of the first-order kinetics of the degradation of Rhodamine B by the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2 and the powder NiO/ZnO material prepared in Comparative Example 3. It can be seen from Figure 14 and Figure 15 that the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in Example 2 has a higher photocatalytic rate than the powder NiO/ZnO heterojunction prepared in Comparative Example 3, The degradation rate is about 3 times that of powder NiO/ZnO material. It can be seen that the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared by the preparation method provided by the present invention exhibits more excellent photocatalytic performance due to its unique hierarchical porous structure.
由以上实施例可以看出,本发明提供的三维多孔自支撑NiO/ZnO异质结材料的制备方法操作简单,无需去模板,也不需要严格控制实验条件。并且,本发明制得的三维多孔自支撑NiO/ZnO异质结材料具有优异的光催化性能。It can be seen from the above examples that the preparation method of the three-dimensional porous self-supporting NiO/ZnO heterojunction material provided by the present invention is simple to operate, does not require template removal, and does not require strict control of experimental conditions. In addition, the three-dimensional porous self-supporting NiO/ZnO heterojunction material prepared in the present invention has excellent photocatalytic performance.
以上所述仅是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。The above are only the preferred embodiments of the present invention. It should be pointed out that for those skilled in the art, without departing from the principles of the present invention, several improvements and modifications can be made. It should be regarded as the protection scope of the present invention.
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