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CN113013314A - P-type high-performance Cu-Sn-S diamond-like structure thermoelectric material and preparation method thereof - Google Patents

P-type high-performance Cu-Sn-S diamond-like structure thermoelectric material and preparation method thereof Download PDF

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CN113013314A
CN113013314A CN201911328324.7A CN201911328324A CN113013314A CN 113013314 A CN113013314 A CN 113013314A CN 201911328324 A CN201911328324 A CN 201911328324A CN 113013314 A CN113013314 A CN 113013314A
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diamond
thermoelectric material
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CN113013314B (en
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史迅
邓婷婷
仇鹏飞
陈立东
魏天然
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Shanghai Institute of Ceramics of CAS
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Abstract

本发明公开一种p型高性能Cu‑Sn‑S类金刚石结构热电材料及其制备方法。所述Cu‑Sn‑S类金刚石结构热电材料的化学组成为Cu7Sn3S10‑ x M x ,其中M选自卤族元素F、Cl、Br、I中的至少一种,0≤x≤2。

Figure 201911328324

The invention discloses a p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material and a preparation method thereof. The chemical composition of the Cu-Sn-S diamond-like thermoelectric material is Cu 7 Sn 3 S 10- x M x , wherein M is selected from at least one of halogen elements F, Cl, Br, and I, and 0≤x ≤2.

Figure 201911328324

Description

P-type high-performance Cu-Sn-S diamond-like structure thermoelectric material and preparation method thereof
Technical Field
The invention relates to a p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material and a preparation method thereof, belonging to the field of thermoelectric materials.
Background
Energy has been the material basis on which humans rely for survival. With the rapid economic growth of various countries and the continuous improvement of the living standard of people, together with the increasing exhaustion of the traditional energy, the environmental pollution is more and more serious, and various countries in the world are urgent for developing rich raw materials, protecting environment, cleaning and novel efficient available energy. In addition, a large amount of energy is lost in human activities, and especially the loss is the most serious in a heat energy mode, such as industrial waste heat, automobile exhaust waste heat, waste incineration heat and the like, which are lost by heat emission. In this context, thermoelectric conversion materials have come into play. The thermoelectric material can realize direct interconversion between heat energy and electric energy, has the characteristics of no noise, no pollution, no mechanical transmission and high reliability, and draws much attention in recent decades.
Thermoelectric conversion technology is based on the Seebeck effect and the Peltier effect of thermoelectric materials to realize thermoelectric power generation and refrigeration. Thermoelectric devices are generally single pi pairs composed of p-type and n-type semiconductor materials, and several pi pairs are connected in series to form a device module, so as to realize application. However, the conversion efficiency of the thermoelectric material is still low (< 10%), and large-scale commercial use is not realized. The thermoelectric conversion efficiency of the thermoelectric material depends on the environmental temperature difference and a dimensionless figure of merit zT determined by the material itself, and the larger the value of zT, the higher the energy conversion efficiency. zT can be expressed by the following formula zT ═ S2σT/(κeL) Wherein S is Seebeck coefficient, sigma is conductivity, and kappaeAs carrier thermal conductivity, κLIs the lattice thermal conductivity and T is the absolute temperature. The development of high zT thermoelectric semiconductor materials is therefore a key scientific problem in the field of thermoelectric research.
The copper-based diamond-like structure compound has a structure/functional unit which is favorable for realizing the synergistic regulation and control of electrical property and thermal property. On one hand, the diamond-like structure compound has a Cu-X framework structure, a three-dimensional conductive network channel is formed, and good electric transport performance is ensured; in addition, the twisted crystal structure forms additional scattering to phonons, which is beneficial to obtaining intrinsic low lattice thermal conductivity. Therefore, the compound with the diamond-like structure is a thermoelectric material system with great potential. The Cu-Sn-S system has the characteristics of abundant reserves in the earth crust, low cost, environmental friendliness and the like, but the currently reported Cu-Sn-S system thermoelectric material cannot meet the application requirements of thermoelectric conversion materials and devices due to the low thermoelectric figure of merit, so that the development of the Cu-Sn-S system thermoelectric material in the thermoelectric field is limited.
Disclosure of Invention
In view of the above problems, an object of the present invention is to provide a p-type high performance Cu-Sn-S diamond-like structure thermoelectric material and a method for preparing the same.
The chemical composition of the p-type Cu-Sn-S diamond-like structure thermoelectric material is Cu7Sn3S10-xMxWherein M is selected from at least one of halogen elements F, Cl, Br and I, and x is more than or equal to 0 and less than or equal to 2.
The Cu-Sn-S diamond-like structure thermoelectric material can be doped with halogen elements (such as F, Cl, Br and I) at the S position, the doping amount is 0-2, x is more than or equal to 0, and the carrier concentration of the material is effectively reduced along with the increase of the doping amount, so that the electrical conductivity of the material is obviously reduced, and the carrier thermal conductivity of the material is greatly reduced; meanwhile, a large number of point defects are introduced into the material by doping, so that strong scattering is generated on phonons, and the lattice thermal conductivity of the material is reduced, thereby optimizing the thermal property of the material and improving the thermoelectric figure of merit (ZT) of the material.
Preferably, x is more than or equal to 0.5 and less than or equal to 0.9, and the Cu-Sn-S diamond-like structure thermoelectric material obtained in the range has better electrical property (power factor) and lower thermal conductivity.
Preferably, the electric conductivity of the Cu-Sn-S diamond-like structure thermoelectric material is 15000 to 350000S m-1Preferably 50000-150000S m-1
Preferably, the Seebeck coefficient of the Cu-Sn-S diamond-like structure thermoelectric material is 35-300 mu V K-1Preferably 70 to 200 μ V K-1
Preferably, the thermal conductivity of the Cu-Sn-S diamond-like structure thermoelectric material is 0.5-4.0W m-1K-1Preferably 0.7 to 2W m-1K-1
Preferably, the lattice thermal conductivity of the Cu-Sn-S diamond-like structure thermoelectric material is 0.2-1.6W m-1K-1Preferably 0.5 to 1.5W m-1K-1
Preferably, the thermoelectric figure of merit zT of the Cu-Sn-S diamond-like structure thermoelectric material is 0.5 to 1.5, preferably 0.5 to 1.0 at 750K.
In another aspect, the invention further provides a preparation method of the above Cu-Sn-S diamond-like structure thermoelectric material, which comprises:
(1) weighing compound raw materials according to chemical compositions, carrying out vacuum packaging, heating to 300-600 ℃, preserving heat for 0.5-20 hours, then continuously heating to 800-1100 ℃, and melting at constant temperature for 1-100 hours to obtain a liquid mixture;
(2) cooling the liquid mixture to 300-600 ℃, preserving heat for 1-150 hours, cooling to room temperature, and grinding into powder to obtain sintered powder;
(3) and pressurizing and sintering the obtained sintering powder to obtain the thermoelectric material with the Cu-Sn-S diamond-like structure.
Preferably, the vacuum packaging mode is plasma or flame gun packaging.
Preferably, the temperature rising rate is 1 to 100 ℃/hour, and the temperature lowering rate is 1 to 50 ℃/hour.
Preferably, the sintering atmosphere is argon atmosphere, and the pressure is 0.001 to 0.09 MPa.
Preferably, the pressure sintering mode is hot isostatic pressing sintering and/or spark plasma sintering, and preferably, the sintering temperature is 300-800 ℃, the sintering pressure is 10-65 Mpa, and the sintering time is 5-200 minutes.
The thermal conductivity of the semiconductor material provided by the invention is 0.5-4W m-1K-1The lattice thermal conductivity of the compound is far lower than that of other diamond-like structure compounds reported at present, and can be 0.2-1.6W m-1K-1In the meantime. The thermoelectric material compound provided by the invention has the advantages that the thermal property and the electrical property can be regulated and controlled in a wide range, the thermoelectric figure of merit (ZT) is excellent in a Cu-Sn-S system, and the storage amount of the constituent elements is rich, the cost is low, and the environment is friendly, so that the thermoelectric material compound is a novel thermoelectric material with potential.
Drawings
FIG. 1 shows a schematic flow diagram for the preparation of an exemplary thermoelectric material of the present invention;
FIG. 2 shows a thermoelectric material Cu of example 17Sn3S10Graph of thermoelectric performance versus temperature;
FIG. 3 shows a thermoelectric material Cu of example 27Sn3S9.9Cl0.1Graph of thermoelectric performance versus temperature;
FIG. 4 shows a thermoelectric material Cu of example 37Sn3S9.5Cl0.5Graph of thermoelectric performance versus temperature;
FIG. 5 shows the thermoelectric material Cu of example 47Sn3S9.1Cl0.9Graph of thermoelectric performance versus temperature;
FIG. 6 shows a thermoelectric material Cu of example 57Sn3S8Cl2Graph of thermoelectric performance versus temperature;
FIG. 7 shows a thermoelectric material Cu of example 67Sn3S9.7F0.3Graph of thermoelectric performance versus temperature;
FIG. 8 shows a thermoelectric material Cu of example 77Sn3S9.5Br0.5The thermoelectric property of the alloy is changed along with the temperature;
FIG. 9 shows a thermoelectric material Cu of example 87Sn3S9.5I0.5Graph of thermoelectric performance versus temperature;
in the above fig. 2-9, (a) a graph of conductivity versus temperature; (b) a curve chart of the Seebeck coefficient changing with the temperature is shown; (c) is a graph of thermal conductivity and lattice thermal conductivity as a function of temperature; (d) is a graph of thermoelectric figure of merit zT versus temperature.
Detailed Description
The present invention is further illustrated by the following examples, which are to be understood as merely illustrative and not restrictive.
The Cu-Sn-S ternary diamond-like structure compound system has the characteristics of rich raw material reserves, low cost, environmental friendliness and the like, and has a wide application basis. But its application in the thermoelectric field is limited due to its lower thermoelectric figure of merit. Therefore, the present inventionThe high-performance p-type Cu-Sn-S diamond-like structure thermoelectric material has the chemical composition of Cu7Sn3S10-xMx(M is at least one of halogen elements F, Cl, Br and I), wherein x is more than or equal to 0 and less than or equal to 2. That is, the Cu-Sn-S diamond-like structure thermoelectric material may be a single compound Cu7Sn3S10Or partial doping can be carried out on the S bit.
The crystal structure of ternary chalcogenides is generally such that anions constitute the structural framework of the polyhedron, while cations fill the interstitial sites of the framework. Diamond-like structures generally refer to a structural framework of regular tetrahedra formed by anions, with cations filling interstitial sites of the tetrahedra. When the number of anions and cations does not match the coordination rules of tetrahedrons, other irregular coordination structural units may appear, increasing the complexity and distortion of the structure. Compared with the chemical composition of Cu of the high-temperature thermoelectric semiconductor in the Chinese patent CN 105970060A2Sn3S7The mismatching of the numbers of anions and cations in the chemical components may be the manifestation of the complexity of the crystal structure, and the material has extremely low lattice thermal conductivity and a complex energy band structure.
General formula Cu7Sn3S10-xMxWherein x is the doping content of M at the S site, and can be adjusted within the range of x being more than or equal to 0 and less than or equal to 2. The thermal and electrical properties of the Cu-Sn-S diamond-like structure thermoelectric material can be regulated and controlled in a wide range, and the electric conductivity of the Cu-Sn-S diamond-like structure thermoelectric material can be 15000-350000S m-1To (c) to (d); the Seebeck coefficient of the Cu-Sn-S diamond-like structure thermoelectric material can be 35-300 mu V K-1To (c) to (d); the thermal conductivity of the Cu-Sn-S diamond-like structure thermoelectric material can be 0.5-4W m-1K-1To (c) to (d); the lattice thermal conductivity of the compound is far lower than that of other diamond-like structural compounds reported at present, and can be 0.2-1.6W m-1K-1To (c) to (d); the ZT value of the Cu-Sn-S diamond-like structure thermoelectric material is between 0.5 and 1.5 when the ZT value is 750K.
The thermal conductivity of a material is composed of the lattice thermal conductivity and the carrier thermal conductivity of the material (κ=κLe). The lattice thermal conductivity of the material is related to the distortion degree or the irregularity degree of the lattice, and the structural distortion degree can be increased and the lattice thermal conductivity of the material can be reduced by means of element doping, solid solution and the like; while the carrier thermal conductance (κ)eL σ T) is directly related to the electrical conductivity of the material, so reducing electrical conductivity (i.e., reducing carrier concentration) can effectively reduce carrier thermal conductivity. Compound Cu in Chinese patent CN 105970060A2Sn3S7Has an intrinsically complex distorted crystal structure and thus has a very low lattice thermal conductivity and also a very low electrical conductivity, so that its overall thermal conductivity is relatively low. Cu in the invention7Sn3S10The matching of chemical components leads the diamond-like material to have a regular tetragonal diamond-like structure, but weak chemical bonds and point defects exist in the crystal structure due to the fact that the crystal structure is microscopically occupied by the intrinsically diversified cations, and the diamond-like material further shows the defect ratio than other diamond-like materials (CuInS)2,CuGaTe2Etc.) have lower lattice thermal conductivity. Doping of elements will generally greatly adjust the carrier thermal conductivity of the material while somewhat reducing the lattice thermal conductivity.
The electrical conductivity of a thermoelectric material is a crucial performance parameter, and too high or too low can affect the thermoelectric performance of the material. Experimentally, the method of adjusting the carrier concentration inside the material is usually adopted to reach an optimal interval, so as to obtain the optimal thermoelectric performance. Ternary diamond-like carbon compound A of Chinese patent 102194989A2BX3(A is selected from one of Cu and Ag; B is selected from one of Ge and Sn; and X is selected from one of S, Se and Te) are all p-type semiconductors, and carriers participating in conductive transport are holes. The conductivity of the system is low (e.g. Cu)2SnSe3Room temperature conductivity 14500S m-1) Therefore, it is necessary to increase the concentration of holes in the material to increase the conductivity. Usually by incorporating a low valent cation at the cation site (e.g., at Sn)4+Doped with Zn2+Or In3+Etc.) or incorporate higher anions at the anion sites to create excess holes (e.g.: at S2-Doping with P3-Etc.). Ternary diamond-like carbon compound C in the inventionu7Sn3S10Also a p-type semiconductor, but this material has a very high conductivity of 350000S m-1(room temperature value), it is necessary to reduce the hole concentration inside the material. Usually, higher cations are incorporated at the cation sites (e.g., in Cu)+Doped with Zn2+Etc.) or by incorporating a lower anion at the anion site (e.g.: at S2-Doping with Cl-Etc.).
The following is an exemplary description of the preparation method of the high-performance Cu-Sn-S diamond-like structure thermoelectric material provided by the invention, as shown in FIG. 1.
Mixing a Cu simple substance, a Sn simple substance, a S simple substance and CuMn(M is at least one of halogen elements F, Cl, Br and I, and n is 1 or 2) the compound is weighed according to the molar ratio of (7-x):3, (10-x): x (n is 1) or (7-x):3, (10-2x): x (n is 2) and is packaged in vacuum. Selecting CuMnThe compound (M is at least one of halogen elements F, Cl, Br and I) is mainly solid powder at room temperature, is easy to operate and is safer. Wherein the vacuum packaging is performed under the protection of inert gas. When packaging, the container is vacuumized, and the internal pressure is 0.1-40000 Pa. The vacuum packaging adopts a plasma or flame gun packaging mode. Wherein, the adopted raw materials are preferably high-purity elements and compounds. As an example, the elementary Cu, the elementary Sn, the elementary S and the CuM are mixedn(M is at least one of halogen elements F, Cl, Br and I, and n is 1 or 2) is packaged in a quartz tube according to a stoichiometric ratio, and is subjected to vacuum packaging in an argon atmosphere glove box by adopting plasma or a flame gun, wherein the internal pressure of the glove box is 0.1-40000 Pa.
Then, the vacuum-packed raw materials are melted to form a liquid mixture. As an example, the temperature of the packaged quartz tube is raised to 300-600 ℃ at the heating rate of 1-100 ℃/h, the temperature is maintained for 0.5-20 h, then the temperature is raised to 800-1100 ℃, and the quartz tube is melted at constant temperature for 1-100 h.
And cooling the liquid mixture to a certain temperature, annealing, cooling to room temperature, and grinding into powder to obtain sintered powder. As an example, the cooling rate is 1-50 ℃/h, the annealing temperature is 300-600 ℃, and the annealing time is 1-150 h.
And pressurizing and sintering the obtained sintering powder to obtain the Cu-Sn-S diamond-like structure thermoelectric material. Wherein, the sintering mode is hot isostatic pressing sintering and/or spark plasma sintering. The sintering temperature is 300-800 ℃, the sintering heat preservation time is 5-200 minutes, and the sintering pressure is 10-65 Mpa. The sintering atmosphere is a low-pressure argon atmosphere, and the pressure is 0.001-0.09 MPa. Specifically, the formed compact polycrystalline block (the thermoelectric material with the Cu-Sn-S diamond-like structure) can be obtained by hot isostatic pressing sintering or discharge plasma sintering, the sintering method is that annealed polycrystalline ingots are ground into powder, the obtained powder is subjected to pressure sintering, the sintering temperature is 300-800 ℃, the sintering heat preservation time is 5-200 minutes, the sintering pressure is 10-65 MPa, the sintering atmosphere is a low-pressure argon atmosphere, and the pressure is 0.001-0.09 MPa.
According to the invention, at least one of halogen elements (F, Cl, Br and I) is doped at the S position to adjust the thermal property and the electrical property of the Cu-Sn-S diamond-like structure thermoelectric material, and the thermal property and the electrical property can be adjusted and controlled in a wide range.
Measuring thermal diffusion coefficient lambda of the thermoelectric material by using a laser thermal conductivity meter, and estimating specific heat C of the material by utilizing Neumann-Kopp rulepThe density D of the material is tested by the Archimedes principle, and the formula kappa ═ lambda C is utilizedpAnd D, calculating the thermal conductivity of the material. The sample is then diamond cut to the desired shape (e.g., a long strip), the conductivity σ of the sample is measured using the classical four-terminal method, and the seebeck coefficient S is measured as the ratio of the potential difference across the sample to the temperature difference. Lattice thermal conductivity κL=κ-κe,κeL σ T. Using the formula zT ═ S2And calculating the thermoelectric figure of merit of the measured material by the sigma T/kappa.
The conductivity of the semiconductor material provided by the invention can be 15000-350000S m-1To (c) to (d); the Seebeck coefficient of the semiconductor material provided by the invention can be 35-300 mu V K-1To (c) to (d); the thermal conductivity of the semiconductor material provided by the invention can be 0.5-4W m-1K-1The lattice thermal conductivity of the compound is far lower than that of other diamond-like structure compounds reported at present, and can be 0.2-1.6W m-1K-1To (c) to (d); the zT value of the semiconductor material provided by the invention is between 0.5 and 1.5 at 750K.
The present invention will be described in detail with reference to examples. It is also to be understood that the following examples are illustrative of the present invention and are not to be construed as limiting the scope of the invention, and that certain insubstantial modifications and adaptations of the invention by those skilled in the art may be made in light of the above teachings. The specific process parameters and the like of the following examples are also only one example of suitable ranges, i.e., those skilled in the art can select the appropriate ranges through the description herein, and are not limited to the specific values of the following examples.
Example 1: cu7Sn3S10Polycrystalline bulk of semiconductor material
The method comprises the steps of mixing raw materials of a Cu simple substance, a Sn simple substance and an S simple substance according to a molar ratio of 7:3:10, then packaging in a quartz tube in vacuum, heating to 450 ℃ at a heating rate of 100 ℃/hour, preserving heat for 2 hours, then continuously heating to 950 ℃, and melting at constant temperature for 12 hours. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 2, the resulting Cu7Sn3S10Thermoelectric property measurement of the polycrystalline block shows that the material has higher conductivity (the conductivity is 150000-350000S m) within a measured temperature range (300-750K)-1) And a moderate Seebeck coefficient (the Seebeck coefficient is 40-100 mu V K-1In (d) of (a); while the material exhibits moderate thermal conductivity (whichThe thermal conductivity is 2.0-4.0W m-1K-1And (C) has a lattice thermal conductivity of 0.2 to 1.6W m-1K-1In the meantime. The zT value of the material calculated from the performance measurements can reach 0.5 at 750K.
Example 2: cu7Sn3S9.9Cl0.1Polycrystalline bulk of semiconductor material
Mixing the raw materials of the Cu simple substance, the Sn simple substance, the S simple substance and the CuCl compound according to a molar ratio of 6.9:3:9.9:0.1, then packaging in a quartz tube in vacuum, heating to 450 ℃ at a heating rate of 100 ℃/h, preserving heat for 2 hours, then continuing heating to 950 ℃, and melting at constant temperature for 12 hours. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 3, the resulting Cu7Sn3S9.9Cl0.1Thermoelectric property measurement of the polycrystalline block shows that the conductivity of the material is 75000-200000S m within a measured temperature range (300-750K)-1The Seebeck coefficient is 49-130 mu V K-1The thermal conductivity of the material is 1.5-3.3W m-1K-1In the meantime. The zT value of the material calculated from the performance measurements can reach 0.64 at 750K.
Example 3: cu7Sn3S9.5Cl0.5Polycrystalline bulk of semiconductor material
Mixing the raw materials of the Cu simple substance, the Sn simple substance, the S simple substance and the CuCl compound according to a molar ratio of 6.5:3:9.5:0.5, then packaging in a quartz tube in vacuum, heating to 450 ℃ at a heating rate of 100 ℃/h, preserving heat for 2 hours, then continuing heating to 950 ℃, and melting at constant temperature for 12 hours. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 4, the resulting Cu7Sn3S9.5Cl0.5Thermoelectric property measurement of the polycrystalline block shows that the conductivity of the material is 40000-114000S m within a measured temperature range (300-750K)-1The Seebeck coefficient (in the range of 69-162 mu V K)-1The thermal conductivity of the material is 1.0-2.3W m-1K-1In the meantime. The zT value of the material calculated from the performance measurements can reach 0.66 at 750K.
Example 4: cu7Sn3S9.1Cl0.9Polycrystalline bulk of semiconductor material
Mixing the raw materials of the Cu simple substance, the Sn simple substance, the S simple substance and the CuCl compound according to a molar ratio of 6.1:3:9.1:0.9, then packaging in a quartz tube in vacuum, heating to 450 ℃ at a heating rate of 100 ℃/h, preserving heat for 2 hours, then continuing heating to 950 ℃, and melting at constant temperature for 12 hours. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 5, the resulting Cu7Sn3S9.1Cl0.9Thermoelectric property measurement of the polycrystalline block shows that the conductivity of the material is 15800-46000S m within a measured temperature range (300-750K)-1The Seebeck coefficient is 97-213 mu V K-1The thermal conductivity of the material is 0.7-1.5W m-1K-1The lattice thermal conductivity is 0.5-1.3W m-1K-1In the meantime. The zT value of the material calculated from the performance measurements can reach 0.8 at 750K.
Example 5: cu7Sn3S8Cl2Polycrystalline bulk of semiconductor material
The method comprises the steps of mixing raw materials of a Cu simple substance, a Sn simple substance, an S simple substance and a CuCl compound according to a molar ratio of 5:3:8:2, then packaging in a quartz tube in vacuum, heating to 450 ℃ at a heating rate of 100 ℃/h, preserving heat for 2 hours, then continuing heating to 950 ℃, and melting at constant temperature for 12 hours. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 6, the obtained Cu7Sn3S8Cl2Thermoelectric property measurement of the polycrystalline block shows that the conductivity of the material is 17000-44800S m within a measured temperature range (300-750K)-1The Seebeck coefficient is 95-208 mu V K-1The thermal conductivity of the material is 0.7-1.4W m-1K-1In the meantime. The zT value of the material calculated from the performance measurements can reach 0.77 at 750K.
Example 6: cu7Sn3S9.7F0.3Polycrystalline bulk of semiconductor material
Raw materials of a Cu simple substance, a Sn simple substance, an S simple substance and CuF2The compound is prepared according to the mol ratio of 6.85:3:9.7:0.15, then is packaged in a quartz tube in vacuum, is heated to 450 ℃ at the heating rate of 100 ℃/hour, is kept warm for 2 hours, is continuously heated to 950 ℃, and is melted for 12 hours at constant temperature. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 7, the resulting Cu7Sn3S9.7F0.3Thermoelectric performance measurement of the polycrystalline block shows that the material has moderate conductivity (the conductivity is 63000-174000S m) within a measured temperature range (300-750K)-1) And a moderate Seebeck coefficient (the Seebeck coefficient is 52-135 mu V K-1In the middle) and the material shows lower thermal conductivity (the thermal conductivity is 1.3-2.8W m)-1K-1In between). The zT value of the material calculated from the performance measurements can reach 0.66 at 750K.
Example 7 Cu7Sn3S0.5Br0.5Polycrystalline bulk of semiconductor material
Mixing raw materials of a Cu simple substance, a Sn simple substance, an S simple substance and a CuBr compound according to a molar ratio of 6.5:3:9.5:0.5, then packaging in a quartz tube in vacuum, heating to 450 ℃ at a heating rate of 100 ℃/h, preserving heat for 2 hours, then continuing heating to 950 ℃, and melting at constant temperature for 12 hours. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 8, the obtained Cu7Sn3S0.5Br0.5Thermoelectric performance measurement of the polycrystalline block shows that the material has moderate conductivity (the conductivity is 45000-130000S m) in a measured temperature range (300-750K)-1) And a moderate Seebeck coefficient (the Seebeck coefficient is 65-158 mu V K-1In the middle) and the material shows lower thermal conductivity (the thermal conductivity is 1.1-2.3W m)-1K-1In between). The zT value of the material calculated from the performance measurements can reach 0.78 at 750K.
Example 8: cu7Sn3S0.5I0.5Polycrystalline bulk of semiconductor material
Mixing the raw materials of the Cu simple substance, the Sn simple substance, the S simple substance and the CuI compound according to a molar ratio of 6.5:3:9.5:0.5, then packaging in a quartz tube in vacuum, heating to 450 ℃ at a heating rate of 100 ℃/h, preserving heat for 2 hours, then continuing heating to 950 ℃, and melting at constant temperature for 12 hours. Then cooling to 420 ℃ at a cooling rate of 50 ℃/hour for pre-annealing, preserving heat for 72 hours, and cooling to room temperature to obtain an ingot sample;
grinding the obtained cast ingot sample, tabletting, carrying out vacuum packaging in a quartz tube again, heating to 420 ℃ at the heating rate of 100 ℃/hour, annealing for 72 hours, and cooling to room temperature at the cooling rate of 50 ℃/hour;
grinding the obtained product into powder, and performing spark plasma sintering at the sintering temperature of 650 ℃ for 12 minutes under the sintering pressure of 65MPa and the pressure of 0.07MPa under the low-pressure argon atmosphere to finally obtain the compact block material.
As shown in FIG. 9, the obtained Cu7Sn3S0.5I0.5Thermoelectric property measurement of the polycrystalline block shows that the conductivity of the material is 48000-140000S m within a measured temperature range (300-750K)-1The Seebeck coefficient is 61-156 mu V K-1The thermal conductivity of the material is 1.1-2.4W m-1K-1In the meantime. The zT value of the material calculated from the performance measurements can reach 0.8 at 750K.

Claims (10)

1.一种p型高性能Cu-Sn-S类金刚石结构热电材料,其特征在于,所述Cu-Sn-S类金刚石结构热电材料的化学组成为Cu7Sn3S10-x M x ,其中M选自卤族元素F、Cl、Br、I中的至少一种,0≤x≤2。1. a p-type high performance Cu-Sn-S diamond-like structure thermoelectric material, is characterized in that, the chemical composition of described Cu - Sn - S diamond-like structure thermoelectric material is Cu7Sn3S10 - xMx , wherein M is selected from at least one of halogen elements F, Cl, Br, and I, and 0≤x≤2 . 2.根据权利要求1所述的p型高性能Cu-Sn-S类金刚石结构热电材料,其特征在于,0.5≤x≤0.9。2 . The p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material according to claim 1 , wherein 0.5 ≦x≦ 0.9. 3 . 3.根据权利要求1或2所述的p型高性能Cu-Sn-S类金刚石结构热电材料,其特征在于,所述Cu-Sn-S类金刚石结构热电材料的电导率为15000~350000 S m-1,优选为50000~150000 S m-13. The p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material according to claim 1 or 2, wherein the electrical conductivity of the Cu-Sn-S diamond-like structure thermoelectric material is 15000-350000 S m -1 , preferably 50,000 to 150,000 S m -1 . 4.根据权利要求1~3中任一项所述的p型高性能Cu-Sn-S类金刚石结构热电材料,其特征在于,所述Cu-Sn-S类金刚石结构热电材料的Seebeck系数为35~300 μV K-1,优选为70~200 μV K-14. The p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material according to any one of claims 1 to 3, wherein the Seebeck coefficient of the Cu-Sn-S diamond-like structure thermoelectric material is 35 to 300 μV K -1 , preferably 70 to 200 μV K -1 . 5.根据权利要求1~4所述的p型高性能Cu-Sn-S类金刚石结构热电材料,其特征在于,所述Cu-Sn-S类金刚石结构热电材料的热导率为0.5~4.0 W m-1 K-1,优选为0.7~2 W m-1K-15 . The p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material according to claim 1 , wherein the thermal conductivity of the Cu-Sn-S diamond-like structure thermoelectric material is 0.5 to 4.0. 6 . W m -1 K -1 , preferably 0.7 to 2 W m -1 K -1 . 6.根据权利要求1~5所述的p型高性能Cu-Sn-S类金刚石结构热电材料,其特征在于,所述Cu-Sn-S类金刚石结构热电材料的晶格热导率为0.2~1.6 W m-1 K-1,优选为0.5~1.5W m-1 K-16 . The p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material according to claim 1 , wherein the thermal conductivity of the lattice of the Cu-Sn-S diamond-like structure thermoelectric material is 0.2. 7 . ~1.6 W m -1 K -1 , preferably 0.5 to 1.5 W m -1 K -1 . 7.根据权利要求1~6中任一项所述的p型高性能Cu-Sn-S类金刚石结构热电材料,其特征在于,所述Cu-Sn-S类金刚石结构热电材料的热电优值zT在750 K时为0.5~1.5,优选为0.5~1.0。7. The p-type high-performance Cu-Sn-S diamond-like structure thermoelectric material according to any one of claims 1 to 6, wherein the thermoelectric figure of merit of the Cu-Sn-S diamond-like structure thermoelectric material zT at 750 K is 0.5 to 1.5, preferably 0.5 to 1.0. 8.根据权利要求1~7中任一项所述的p型高性能Cu-Sn-S类金刚石结构热电材料的制备方法,其特征在于,包括:8. The preparation method of p-type high-performance Cu-Sn-S diamond-like thermoelectric material according to any one of claims 1 to 7, characterized in that, comprising: (1)按化学组成称取化合物原料并真空封装后,升温至300~600 ℃,保温0.5~20小时,然后继续升温至800~1100℃,恒温熔融1~100小时,得到液态混合物;(1) after weighing the compound raw materials according to the chemical composition and vacuum-packing, heating up to 300~600 ℃, keeping the temperature for 0.5~20 hours, then continuing to heat up to 800~1100 ℃, and melting at constant temperature for 1~100 hours to obtain a liquid mixture; (2)将液态混合物降温至300~600 ℃,保温1~150小时,冷却至室温,研磨制成粉末,得到烧结粉体;(2) cooling the liquid mixture to 300-600 °C, keeping the temperature for 1-150 hours, cooling to room temperature, grinding to make powder, and obtaining sintered powder; (3)将所得的烧结粉体加压烧结,得到所述Cu-Sn-S类金刚石结构热电材料。(3) Pressure sintering the obtained sintered powder to obtain the Cu-Sn-S diamond-like thermoelectric material. 9.根据权利要求8所述的制备方法,其特征在于,所述真空封装的方式为等离子体或者火焰枪封装。9 . The preparation method according to claim 8 , wherein the vacuum packaging method is plasma or flame gun packaging. 10 . 10.根据权利要求8或9所述的制备方法,其特征在于,所述的加压烧结方式为热等静压烧结和/或放电等离子烧结,优选地,所述烧结温度为300~800℃,烧结压力为10~65Mpa,烧结时间为5~200分钟。10. The preparation method according to claim 8 or 9, wherein the pressure sintering method is hot isostatic pressing sintering and/or spark plasma sintering, and preferably, the sintering temperature is 300-800°C , the sintering pressure is 10-65Mpa, and the sintering time is 5-200 minutes.
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