CN112987511A - Laser parallel direct writing device and method based on super lens array - Google Patents
Laser parallel direct writing device and method based on super lens array Download PDFInfo
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- CN112987511A CN112987511A CN202110253890.7A CN202110253890A CN112987511A CN 112987511 A CN112987511 A CN 112987511A CN 202110253890 A CN202110253890 A CN 202110253890A CN 112987511 A CN112987511 A CN 112987511A
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- 238000000034 method Methods 0.000 title claims abstract description 13
- 230000003287 optical effect Effects 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 20
- 238000003384 imaging method Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 16
- 238000001459 lithography Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
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Abstract
The invention relates to a laser parallel direct writing device and method based on a super lens array, wherein the super lens array is arranged in a direct writing light path, and super-resolution imaging of a super lens is fully utilized, so that a high-resolution image can be formed on the lower surface of the super lens and the distance within the near field range of the super lens, the size of a focused light spot is reduced, the writing density is improved, and the writing of a high-density grating can be realized. By utilizing the super lens array, multi-point light spots can be formed, namely, a plurality of grating grid lines are directly written at one time, and the direct writing parallelism of the laser direct writing device is improved. The invention is suitable for large-size diffraction optical elements with high density and high precision in writing.
Description
Technical Field
The invention relates to a laser direct writing technology, in particular to a laser parallel direct writing device and method based on a super lens array.
Background
The large-size and high-density diffraction grating has more and more applications in high-power laser and chirped pulse compression technologies, and is a core key optical device in optical systems and scientific instruments such as large astronomical telescopes and inertial confinement nuclear fusion laser ignition systems. Microelectronic processing technology has made tremendous progress in the field of the fabrication of diffractive optical elements. The development of laser direct writing technology as an emerging technology in microelectronic processing technology is receiving more and more attention. Laser direct writing is a maskless lithography technique, which utilizes intensity-modulated focused laser spots to perform two-dimensional scanning lithography on the surface of a substrate coated with a photosensitive material, and generates a required mask pattern through development. In recent years, laser direct writing technology is increasingly applied to the fields of processing masks, micro-nano optical devices and the like, and the development of the laser direct writing technology is mature day by day. Compared with the traditional holographic technology and electron beam lithography technology, the laser direct writing technology has the advantages of higher flexibility and relatively lower price, and compared with other mask lithography technologies, the laser direct writing technology does not need an expensive mask plate, so that the cost and the loss are reduced.
The laser direct writing technology generally adopts a visible light wave band as a direct writing light source, and the size of a direct writing light spot is limited by an optical diffraction resolution limit. In 2006, professor Berry and Popescu in UK proposes the theory of super-oscillation (0.38 lambda/NA), and theoretically proves that a specially designed grating structure can realize super-diffraction limit focusing in a far field without participation of evanescent waves, and the structure is called a super lens. In order to further improve the direct-writing resolution and break through the diffraction limit, a novel super-resolution laser direct-writing technology is urgently needed to be designed.
Disclosure of Invention
The first purpose of the present invention is to overcome the disadvantages and shortcomings of the prior art, and to provide a laser parallel direct writing device based on a superlens array, which is suitable for writing large-sized diffractive optical elements with high density and high precision.
The second purpose of the invention is to provide a laser parallel direct writing method based on a super lens array, which can improve the writing density and the direct writing efficiency and realize the writing of large-size and high-density gratings.
The first purpose of the invention is realized by the following technical scheme:
a laser parallel direct writing device based on a super lens array comprises,
the movable platform (9) is used for placing the grating substrate;
a laser direct-write optical path assembly, wherein,
the laser direct writing light path component comprises a blue light laser light source (1), a lens (2), a small hole (3), a lens (4), a super lens array (6) and a microscope (7), wherein light beams output by the blue light laser light source (1) are collimated and expanded through the lens (2), the small hole (3) and the lens (4) in sequence, then are incident to the super lens array (6), and finally are focused on the surface of a grating substrate to be engraved on a moving platform through the microscope (7).
Preferably, the super lens array is a supercritical lens array.
Furthermore, the supercritical lens array is a plane diffraction lens array.
Preferably, the superlens array (6) is placed on a turret (5).
Furthermore, the device also comprises a control system which is connected with and controls the blue laser light source (1), the rotary table (5) and the movable platform (9).
Furthermore, the control system is provided with a super-lens rotation control module, a platform position adjusting module and a light source control module, wherein the super-lens rotation control module is used for controlling the rotation of the turntable (5); the platform position adjusting module is used for controlling the precise movement of the movable platform (9); the light source control module is used for controlling the power of the blue laser light source (1).
Further, the control system is a computer (10).
Furthermore, a sample fine adjustment table (8) is arranged on the movable platform (9), and the grating substrate is placed on the sample fine adjustment table (8).
The second purpose of the invention is realized by the following technical scheme:
a laser parallel direct writing method based on a super lens array comprises the following steps:
s1, placing the grating substrate to be inscribed on a movable platform (9);
s2, emitting a light beam by using a blue laser light source, collimating and expanding the light beam sequentially through a lens (2), a small hole (3) and a lens (4), and then entering a super lens array (6) to generate a plurality of paths of light spots;
and S3, focusing the multi-path light spots on the surface of the grating substrate to be written through a microscope (7), and finally forming a mask pattern on the surface of the grating substrate.
Preferably, before step S2, the superlens array (6) is placed on the turret (5);
in the laser direct writing process, the rotation of the rotary table (5) is controlled by a superlens rotation control module of the computer (10), the precise movement of the movable platform (9) is controlled by a platform position adjusting module, and the power of the blue laser light source (1) is controlled by a light source control module.
Compared with the prior art, the invention has at least the following beneficial effects:
the laser direct writing device combines the laser direct writing technology with the super lens array, the super lens array is arranged in the direct writing light path, and the parallel direct writing is realized by utilizing the characteristic of beam splitting of the super lens array, namely, multi-point light spots can be formed, and a plurality of grating grid lines can be directly written at one time, so the direct writing parallelism of the laser direct writing device can be realized, and the direct writing efficiency is improved. Meanwhile, the focal spots are reduced by utilizing super-resolution imaging of the super lens, the super lens can effectively inhibit the intensity of side lobes while ensuring the focal spots at the limit of super diffraction, so that multi-path light spots generated by beam splitting are reduced at the same time, the limit of optical diffraction is broken through, a high-resolution image is formed on the grating substrate within a certain distance range on the lower surface of the super lens, the writing density is improved, and the writing of large-size and high-density gratings is realized.
Drawings
FIG. 1 is a schematic diagram of a laser parallel direct writing device based on a superlens array according to the present invention.
Fig. 2 is a schematic diagram of a supercritical lens array, where black represents a pi phase and white represents a 0 phase.
Detailed Description
The present invention will be further described with reference to the following examples and drawings, but the scope of the present invention should not be limited thereto.
The embodiment discloses a laser parallel direct writing device based on a super lens array, which comprises a mobile platform 9, a laser direct writing optical path component and a control system, as shown in fig. 1.
A sample fine adjustment table 8 is arranged on the movable platform 9, and a grating substrate to be inscribed can be placed on the sample fine adjustment table 8.
The laser direct writing light path component comprises a blue laser light source 1, a lens 2, a small hole 3, a lens 4, a super lens array 6 and a microscope 7. The superlens array 6 may be placed on the turret 5 so as to rotate the angle of the superlens. Light beams output by the blue laser light source 1 are collimated and expanded through the lens 2, the small hole 3 and the lens 4 in sequence, then enter the super lens array 6, and finally are focused on the surface of a grating substrate to be inscribed on the moving platform through the microscope 7.
In the present embodiment, the blue laser light source 1 may be a 405nm blue laser.
The supercritical lens array is a supercritical lens array, is composed of a plurality of same supercritical lenses and is uniformly arranged. The supercritical lens is a new type of planar diffractive lens, and the supercritical lens array can be seen in fig. 2, where black represents the pi phase and white represents the 0 phase.
The super lens array of the embodiment adopts the super critical lens array, so that a high-resolution image can be formed within a certain range of the distance of the lower surface of the super lens, and the half-height width of the laser beam can be further narrowed compared with that of a common lens.
Because the super lens array 6 is provided with a plurality of super lenses, the collimated and expanded light beams pass through the super lens array 6 and can be directly written in parallel to generate a plurality of paths of light spots, and the plurality of paths of light spots are reduced by a microscope, so that a high-resolution image can be formed on the surface of the grating substrate. By utilizing the super-resolution imaging of the super lens, the optical diffraction limit can be broken through, so that the size of the light spot of the ruler is not limited by the optical diffraction resolution limit, the writing density is favorably improved, and the direct writing resolution is improved.
The control system is connected with and controls the blue laser light source 1, the rotary table 5 and the mobile platform 9. The control system of the present embodiment is a computer 10, which has a super-lens rotation control module, a platform position adjustment module, and a light source control module, which may be software programs for inputting control commands to control the corresponding devices. In particular, said superlens rotation control module can be used to control the rotation of the turret 5; the platform position adjusting module can be used for controlling the precise movement of the movable platform 9; the light source control module may be used to control the power of the light source 1.
In addition, the embodiment also discloses a laser parallel direct writing method based on the superlens array, which is applied to the laser parallel direct writing device and comprises the following steps:
s1, placing the grating substrate to be inscribed on the movable platform 9;
placing the superlens array 6 on the turret 5;
s2, emitting a light beam by using a blue laser light source, collimating and expanding the light beam sequentially through a lens 2, a small hole 3 and a lens 4, and then entering a super lens array 6 to generate a plurality of paths of light spots;
s3, focusing the multi-path light spot on the surface of the grating substrate to be written by the microscope 7, and finally forming a mask pattern on the surface of the grating substrate.
In the laser direct writing process, the computer 10 can issue a control command to control the super-lens rotation control module, the platform position adjustment module and the light source control module: the rotation of the turntable 5 is controlled by the superlens rotation control module, the precise movement of the movable platform 9 is controlled by the platform position adjusting module, and the power of the light source 1 is controlled by the light source control module.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be construed as equivalents thereof, and all such changes, modifications, substitutions, combinations, and simplifications are intended to be included in the scope of the present invention.
Claims (10)
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| CN202110253890.7A CN112987511A (en) | 2021-03-09 | 2021-03-09 | Laser parallel direct writing device and method based on super lens array |
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| CN202110253890.7A CN112987511A (en) | 2021-03-09 | 2021-03-09 | Laser parallel direct writing device and method based on super lens array |
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Cited By (2)
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| CN116520645A (en) * | 2023-04-14 | 2023-08-01 | 西北工业大学宁波研究院 | Super-long focal depth super-resolution optical needle generation method and high aspect ratio laser direct writing system thereof |
| WO2024010520A1 (en) * | 2022-07-08 | 2024-01-11 | Agency For Science, Technology And Research | Optical system, method of forming the same, method of direct laser writing |
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