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CN112986704A - Longitudinal piezoelectric coefficient measuring method based on atomic force microscope - Google Patents

Longitudinal piezoelectric coefficient measuring method based on atomic force microscope Download PDF

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CN112986704A
CN112986704A CN202110207388.2A CN202110207388A CN112986704A CN 112986704 A CN112986704 A CN 112986704A CN 202110207388 A CN202110207388 A CN 202110207388A CN 112986704 A CN112986704 A CN 112986704A
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probe
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CN112986704B (en
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曾慧中
黄芬
孟奔阳
张文旭
张万里
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University of Electronic Science and Technology of China
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    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/22Measuring piezoelectric properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
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Abstract

本发明属于压电系数测试领域,具体提供一种基于原子力显微镜的纵向压电系数测量方法;通过对原子力显微镜的探针各部分静电力的贡献比例分析、以及探针所受静电力与探针‑样品间隙z0的变化关系分析,设置探针‑样品间隙z0的初始值z00≥1μm、终止值0<z01≤10nm,使得同一压电材料样品在探针‑样品间隙z00与z01时分别表现为非压电和压电两种状态,并采用两种状态下的lg(|Fes|)‑lg(Vtip)曲线的围合面积S作为纵向压电系数d33的表征参数,最终通过标准压电薄膜样品的标定得到d33‑S曲线,进而实现待测压电薄膜的纵向压电系数的测量。本发明能够在待测压电材料样品表面无需沉淀电极的前提下,利用原子力显微镜探针的非接触模式测量得到待测压电材料样品的纵向压电系数d33,且测量操作简单、测量准确度高。

Figure 202110207388

The invention belongs to the field of piezoelectric coefficient testing, and specifically provides a longitudinal piezoelectric coefficient measurement method based on an atomic force microscope; ‑Analysis of the variation relationship of the sample gap z 0 , set the initial value of the probe‑sample gap z 0 z 00 ≥1μm, and the end value 0<z 01 ≤10nm, so that the same piezoelectric material sample is in the probe‑sample gap z 00 and At z 01 , there are two states: non-piezoelectric and piezoelectric, respectively, and the enclosed area S of the lg(|F es |)‑lg(V tip ) curve in the two states is used as the value of the longitudinal piezoelectric coefficient d 33 . Characterize the parameters, and finally obtain the d 33 ‑S curve through the calibration of the standard piezoelectric film sample, and then realize the measurement of the longitudinal piezoelectric coefficient of the piezoelectric film to be measured. The invention can obtain the longitudinal piezoelectric coefficient d 33 of the piezoelectric material sample to be measured by using the non-contact mode measurement of the atomic force microscope probe on the premise that the surface of the piezoelectric material sample to be measured does not need a precipitation electrode, and the measurement operation is simple and the measurement is accurate high degree.

Figure 202110207388

Description

Longitudinal piezoelectric coefficient measuring method based on atomic force microscope
Technical Field
The invention belongs to the field of piezoelectric coefficient test, and relates to a longitudinal piezoelectric coefficient (d) of a piezoelectric material33) The measuring technology specifically provides a longitudinal piezoelectric coefficient measuring method based on an atomic force microscope.
Background
The piezoelectric coefficient is a crucial parameter for measuring the electromechanical conversion efficiency of the piezoelectric element, is used for representing the conversion coefficient of converting mechanical energy into electric energy or converting electric energy into mechanical energy, and is a key parameter for realizing an MEMS device, so that the accurate measurement of the piezoelectric coefficient of the piezoelectric film is an important link for developing a micro-force sensor. The traditional measurement technology of the piezoelectric coefficient is mainly divided into direct measurement and indirect measurement, and the piezoelectric coefficient of the material is measured in a macroscopic scale. Early methods for measuring the piezoelectric coefficient of a piezoelectric material include a static method, a dynamic method and a quasi-static method, wherein the static method has low measurement precision, the dynamic method has complex operation and only can test a cylindrical sample; although the quasi-static method has high test accuracy, the vibration force is applied to the sample through the point contact electrode, so the measured piezoelectric coefficient only reflects the local performance of the contact part of the electrode, and the measured piezoelectric coefficients may be different when the contact points are different.
In recent years, the Atomic Force Microscope (AFM) technology has been rapidly developed in the field of piezoelectric coefficient measurement, and an AFM operating in a piezoelectric response mode is called a Piezoresponse Force Microscope (PFM). The PFM technology is taken as a nano-scale testing means, and the tested piezoelectric coefficient is the nano-scale piezoelectric coefficient. For the PFM testing technology, on one hand, a probe is taken as a movable electrode during PFM testing, the radius of a needle point is very small, and a sample has very high dielectric constant, so that an electric field in the sample caused by the needle point has highly non-uniform characteristics; on the other hand, the piezoelectric displacement of the PFM test is also related to intrinsic parameters of other materials than the piezoelectric coefficient; thus, accurate quantitative measurement d by PFM33It is very difficult. To overcome this difficulty, it is common to deposit a dimension on the sample surfaceThe electrode is a few square microns, so that an electric field is uniformly distributed in the electrode; however, this test method greatly reduces the PFM resolution and may cause various errors due to improper operation during the deposition process, which may cause the test results to deviate from the actual results; therefore, how to avoid depositing electrodes to reduce process errors has been the research direction of the present invention.
Furthermore, the piezoelectric coefficient d of the piezoelectric material is influenced33The test accuracy of the test method has a plurality of factors, wherein the factors which have great influence on the stress state of the test sample, such as whether pressure is completely applied to the test sample, whether the direction of the pressure is parallel to the polarization axis of the test sample, whether the test working surfaces are flat and parallel to each other, whether the areas stressed and generating the induction electric effect are equal, whether the test sample shakes at the moment of pressure release, and the like; therefore, how to avoid the pressure to the longitudinal piezoelectric coefficient d of the test33The adverse effects of accuracy are also a consideration of the present invention.
Disclosure of Invention
The invention aims to solve the problems of the conventional piezoelectric material longitudinal piezoelectric coefficient measuring method and provides a novel atomic force microscope-based longitudinal piezoelectric coefficient measuring method33(ii) a In addition, the method is simple to operate, small in measurement error and high in measurement accuracy.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows:
a longitudinal piezoelectric coefficient measuring method based on an atomic force microscope is characterized by comprising the following steps:
step 1, adopting a plurality of standard piezoelectric film samples, and carrying out the following measurement on each standard piezoelectric film sample:
step 1.1, placing a standard piezoelectric film sample below a probe, and setting a probe bias voltage Vtip=V1Setting the initial distance z between the probe and the sample00:z00Not less than 1 μm, and a termination spacing of z01:0<z01Less than or equal to 10nm, controlling the probe to move to the standard piezoelectric film sample according to the moving step length of the probe, and measuring the electrostatic force borne by the probe in real time so as to measure the probe bias voltage Vtip=V1Is ofes|-z0Curve, | FesI represents electrostatic force, z borne by the probe measured by the atomic force microscope0Representing the distance between the probe and the sample;
step 1.2, adjust probe bias voltage V in turntip=V2,...,VnSeparately measuring probe bias voltage Vtip=V2,V3,...,VnIs ofes|-z0A curve;
step 1.3, according to the probe bias voltage Vtip=V1,V2,...,VnN pieces of | Fes|-z0Curves, taking z on each curve0=z01And taking logarithm of the obtained data to obtain lg (| F)es|)-lg(Vtip) Curve, for lg (| F)esI) and lg (V)tip) A third order fit was performed, labeled lg (| F)es,z01|)-lg(Vtip) Curve, | Fes,z01I represents taking z0=z01The probe bias voltage is VtipElectrostatic force on the probe; taking z in the same way0=z00To obtain lg (| F)es|)-lg(Vtip) Curve, for lg (| F)esI) and lg (V)tip) A linear fit was performed, labeled lg (| F)es,z00|)-lg(Vtip) A straight line;
step 1.4, in the same coordinate system, the
Figure BDA0002949813520000021
The curve is translated so that
Figure BDA0002949813520000022
Curve and
Figure BDA0002949813520000023
the start points of the curves coincide, in lg (V)1) As starting point, lg (V)n) As an end point, calculatingTo obtain
Figure BDA0002949813520000024
Curve and
Figure BDA0002949813520000025
the enclosed area S of the curve;
step 2, obtaining the enclosed area S of each standard piezoelectric film sample and the prior longitudinal piezoelectric coefficient d of each standard piezoelectric film sample according to the measurement in the step 133Obtaining a fitting curve of the longitudinal piezoelectric coefficient and the area S, marked as d33-an S-curve;
step 3, obtaining the enclosed area S 'of the piezoelectric film to be measured by adopting the steps 1.1 to 1.4 to carry the enclosed area S' into the step d33And carrying out interpolation fitting in the S curve to obtain the longitudinal piezoelectric coefficient of the piezoelectric film to be measured.
In terms of working principle:
the invention provides a method for measuring the longitudinal piezoelectric coefficient d of a piezoelectric material33The basic principle of the method is as follows:
the measuring instrument used in the invention is an atomic force microscope, and the probe of the atomic force microscope comprises: cantilever (cantilever), cone (cone) and sphere (sphere), as shown in the left diagram of FIG. 1, the electrostatic force applied to each part of the probe is dependent on the tip-sample gap z0The change curve of (a), wherein,
Figure BDA0002949813520000031
as can be seen, the electrostatic force on the sphere is along with the tip-sample gap z0Becomes larger and sharply attenuated, and the electrostatic force borne by the cone is also along with the space z between the needle tip and the sample0Becomes smaller but at a slower speed, while the cantilever is at a smaller electrostatic force and hardly changes with distance, due to its being farther from the sample surface (cantilever-sample spacing-tip-sample gap + tip height, typically greater than 10 μm); the right graph in FIG. 1 shows the ratio η of the probe to the total electrostatic force as a function of the tip-sample gap, and it can be seen that the electrostatic force contribution of the sphere is greater than 50% within 200nm, while in general, it is trueTip-sample gap z during measurement0<100nm, therefore, the electrostatic force applied to the sphere is approximate to the electrostatic force applied to the probe in the invention, namely the probe of the atomic force microscope is simplified into the sphere; whereas according to the reference the sphere-sample electrostatic force is expressed as:
Figure BDA0002949813520000032
wherein, VtipFor probe bias, e ═ e0εr、εrIs the relative dielectric constant of the medium between the sphere and the sample (i.e., the relative dielectric constant of air is 1), epsilon0The dielectric constant is vacuum (8.854 × 10)-12F/m),
Figure BDA0002949813520000033
R is the radius of the sphere;
when z is0R, the formula (1) can be simplified to
Figure BDA0002949813520000034
As can be seen, | FesI is proportional to Vtip 2Namely: lg (| F)esI (ordinate) with lg (V)tip) The change curve (abscissa) is a straight line and has a slope of 2.
Further, the sample to be measured of the present invention is a piezoelectric sample, as shown in fig. 3, when the distance between the needle tip and the piezoelectric sample is relatively long, the electrostatic force applied to the needle tip is relatively small, the surface of the piezoelectric material is almost not deformed, and the electrostatic force is mainly related to the probe bias voltage; when the needle tip is gradually close to the surface of the piezoelectric sample, the electrostatic force borne by the needle tip comprises a pure electrostatic action influenced by the bias voltage and a piezoelectric part influenced by the piezoelectric material, and the surface of the piezoelectric sample is deformed due to the electrostatic force. The invention sets a plurality of probe bias values: v tip10V, obtained under each probe bias, | FesL with z0Taking several points in each curve: z is a radical of01nm, 3nm, 9nm, 1 μm, obtained at each z0< F > ofesI with VtipVariation curve, labeled | Fes|-VtipThe curves are shown in fig. 4. Further, the same test as above was carried out using piezoelectric and non-piezoelectric materials as samples, respectively, to obtain a signal at z01nm, | F at 1 μmesI with VtipThe variation curve of (A) is shown in FIG. 5, and it can be seen from the figure that when z is01nm, | F of piezoelectric and non-piezoelectric materialsesI with VtipThe variation curves have large difference and the difference value is delta | FesI with VtipIncreased by an increase; when z is01 μm, | F of piezoelectric and non-piezoelectric materialsesI with VtipThe curves are nearly coincident and lg (| F)esI) with lg (V)tip) The slope of the change curve is 2, which is consistent with the formula (1); it can be seen that when z is0When the diameter is more than or equal to 1 mu m, the electrostatic force borne by the spherical cap is basically pure electrostatic, the influence of a piezoelectric material is very small and can be ignored, and the situation is equivalent to the non-piezoelectric situation; z is a radical of0When the diameter is less than or equal to 10nm, the electrostatic force borne by the spherical cap comprises a pure electrostatic part influenced by bias voltage and a piezoelectric part influenced by a piezoelectric material; according to the characteristics, the invention can utilize the same piezoelectric material sample in different tip-sample gaps z0Lg (| F) belowesI) with lg (V)tip) The variation curve is used for extracting piezoelectric contributions under different piezoelectric coefficients, and the specific process is as follows:
when z is0≤10nm(z01) When, for lg (| F)esI) and lg (V)tip) Performing third-order fitting to obtain lg (| F)esI) with lg (V)tip) A change curve; when z is0≥1μm(z00) When, for lg (| F)esI) and lg (V)tip) Linear fitting is carried out to obtain lg (| F)esI) with lg (V)tip) A change curve; as shown in FIG. 6, in z01=1nm、z 001 μm as an example, when z 001 μm, lg (| F)esI) with lg (V)tip) The curve is a straight line A marked as lg (| F)es|)-lg(Vtip) Curve when z is011nm, lg (| F)esI) with lg (V)tip) The curve of the change is a curve B, which is a straight line C, and the curve B and the straight line C overlap each other at lg (1V) (starting point) by translating the straight line A upwardThe area of a shadow part enclosed between 1V) and lg (10V) is S, and the area S can be used for effectively representing the piezoelectric contribution of the piezoelectric material, namely representing the longitudinal piezoelectric coefficient d of a piezoelectric material sample33(ii) a Then, the longitudinal piezoelectric coefficient d is obtained by calibrating a plurality of standard piezoelectric material samples33Fitting a curve to the area S, denoted d33S curve, when the area S parameter of the piezoelectric material to be measured is obtained through measurement, the area S parameter can pass through d33The longitudinal piezoelectric coefficient d of the piezoelectric material to be measured is obtained by S curve fitting33
The invention has the beneficial effects that by combining the working principle:
the invention provides a method for measuring the longitudinal piezoelectric coefficient d of a piezoelectric material based on an atomic force microscope33By analyzing the contribution ratio of electrostatic force to each part of the probe of the atomic force microscope, and the electrostatic force applied to the probe and the probe-sample gap z0Analysis of the variation relationship of (a) by setting a probe-sample gap z0Initial value z of00More than or equal to 1 mu m, a termination value of 0 < z01Less than or equal to 10nm, so that the same piezoelectric material sample is in the probe-sample gap z00And z01The time is respectively expressed as a non-piezoelectric state and a piezoelectric state according to lg (| F) in the two stateses|)-lg(Vtip) Curve, obtaining lg (| F) under two states through data processinges|)-lg(Vtip) Curve at starting point V1The enclosed area S under superposition is used as the longitudinal piezoelectric coefficient d33Finally obtaining d by calibrating a standard piezoelectric film sample33-an S-curve; the enclosed area S' of the piezoelectric film to be measured is brought into d33And carrying out interpolation fitting in the S curve to obtain the longitudinal piezoelectric coefficient of the piezoelectric film to be measured.
In conclusion, the method can obtain the longitudinal piezoelectric coefficient d of the piezoelectric material sample to be measured by utilizing the non-contact mode measurement of the atomic force microscope on the premise of not needing a precipitation electrode on the surface of the piezoelectric material sample to be measured33And the measurement operation is simple, the measurement accuracy is higher, and the measurement in a non-contact mode can effectively avoid the influence of pressure on the measurement result.
Drawings
FIG. 1 shows electrostatic forces acting on various parts of an AFM probe and electrostatic contribution η of the various parts with respect to a tip-sample gap z0The change curve of (2).
FIG. 2 is a graph of electrostatic force applied to a spherical cap of an AFM probe with a sphere-sample gap z0The change curve of (2).
FIG. 3 is a schematic diagram of the deformation of the surface of a sample when an atomic force microscope probe is close to a piezoelectric film sample.
FIG. 4 shows the equation when z01nm, 3nm, 9nm, 1 μm, | Fes|-VtipThe graph is schematic.
FIG. 5 shows the equation when z01nm, | F for piezoelectric and non-piezoelectric material sampleses|-VtipThe curves are compared with the graph.
FIG. 6 shows the longitudinal piezoelectric coefficient d33The characterization parameters of (1): schematic diagram of enclosed area S.
FIG. 7 shows z in an embodiment of the present invention01D at 1nm, 3nm, 9nm33-S fitting a curve.
Detailed Description
The technical solution of the present invention will be described in detail below with reference to the accompanying drawings and examples.
The embodiment provides a method for measuring the longitudinal piezoelectric coefficient of a piezoelectric thin film AlN based on an atomic force microscope, wherein Vtip=1V、1.5V、2V...10V,z01=1nm、3nm、9nm,z00D is 1 μm, normalized33The S-curve is shown in FIG. 7;
when z is01When the thickness is 1nm, the enclosed area S' of the piezoelectric thin film AlN is 71/60000, and d is substituted for the enclosed area S33Interpolation fitting is carried out in the S curve to obtain the longitudinal piezoelectric coefficient d of the piezoelectric film to be measured33≈4.89pm/V;
When z is01When the thickness is 3nm, the enclosed area S 'of the piezoelectric thin film AlN is 13/30000, and the enclosed area S' is substituted by d33Interpolation fitting is carried out in the S curve to obtain the longitudinal piezoelectric coefficient d of the piezoelectric film to be measured33≈5.00pm/V;
When z is01When the thickness is 9nm, the enclosed area S 'of the piezoelectric thin film AlN is 11/120000, and the enclosed area S' is substituted by d33Interpolation fitting is carried out in the S curve to obtain the longitudinal piezoelectric coefficient d of the piezoelectric film to be measured33≈5.14pm/V;
And the longitudinal piezoelectric coefficient d of the piezoelectric thin film AlN334.96pm/V, therefore, the invention can measure and obtain the longitudinal piezoelectric coefficient d of the piezoelectric material sample to be measured by utilizing the non-contact mode of the probe of the atomic force microscope on the premise of not needing a precipitation electrode on the surface of the piezoelectric material sample to be measured33And the measurement operation is simple and the measurement accuracy is high.
While the invention has been described with reference to specific embodiments, any feature disclosed in this specification may be replaced by alternative features serving the same, equivalent or similar purpose, unless expressly stated otherwise; all of the disclosed features, or all of the method or process steps, may be combined in any combination, except mutually exclusive features and/or steps.

Claims (1)

1.一种基于原子力显微镜的纵向压电系数测量方法,其特征在于,包括以下步骤:1. a longitudinal piezoelectric coefficient measuring method based on atomic force microscope, is characterized in that, comprises the following steps: 步骤1、采用若干个标准压电薄膜样品,并对每一个标准压电薄膜样品进行以下测量:Step 1. Use several standard piezoelectric film samples, and perform the following measurements on each standard piezoelectric film sample: 步骤1.1、将标准压电薄膜样品置于探针下方,设置探针偏压Vtip=V1,设置探针与样品之间的初始间距为z00:z00≥1μm、终止间距为z01:0<z01≤10nm,根据探针移动步长控制探针向标准压电薄膜样品运动,并实时测量探针所受静电力,进而测得探针偏压Vtip=V1的|Fes|-z0曲线,|Fes|表示原子力显微镜测量的探针所受静电力、z0表示探针与样品表面的间距;Step 1.1. Place the standard piezoelectric thin film sample under the probe, set the probe bias voltage V tip =V 1 , set the initial distance between the probe and the sample as z 00 : z 00 ≥ 1 μm, and the termination distance as z 01 : 0 < z 01 ≤ 10 nm, control the movement of the probe to the standard piezoelectric film sample according to the probe movement step, and measure the electrostatic force on the probe in real time, and then measure the probe bias V tip = V 1 |F es |-z 0 curve, |F es | represents the electrostatic force on the probe measured by atomic force microscope, z 0 represents the distance between the probe and the sample surface; 步骤1.2、依次调节探针偏压Vtip=V2,...,Vn,分别测得探针偏压Vtip=V2,V3,...,Vn的|Fes|-z0曲线;Step 1.2, adjust the probe bias voltage V tip =V 2 ,...,V n in turn, and measure the probe bias voltage V tip =V 2 , V 3 ,...,V n |F es |- z 0 curve; 步骤1.3、根据探针偏压Vtip=V1,V2,...,Vn的n条|Fes|-z0曲线,在每条曲线上取z0=z01,并对得到的数据取对数,得到lg(|Fes|)-lg(Vtip)曲线,对lg(|Fes|)与lg(Vtip)进行三阶拟合,标记为
Figure FDA0002949813510000011
曲线,
Figure FDA0002949813510000012
表示取z0=z01、探针偏压为Vtip时的探针所受静电力;以相同方式取z0=z00,得到lg(|Fes|)-lg(Vtip)曲线,对lg(|Fes|)与lg(Vtip)进行线性拟合,标记为
Figure FDA0002949813510000013
曲线;
Step 1.3. According to n |F es |-z 0 curves of probe bias voltage V tip =V 1 , V 2 ,...,V n , take z 0 =z 01 on each curve, and compare the obtained Take the logarithm of the data of , obtain the lg(|F es |)-lg(V tip ) curve, and perform third-order fitting on lg(|F es |) and lg(V tip ), marked as
Figure FDA0002949813510000011
curve,
Figure FDA0002949813510000012
represents the electrostatic force on the probe when z 0 = z 01 and the probe bias is V tip ; taking z 0 =z 00 in the same way, the lg(|F es |)-lg(V tip ) curve is obtained, A linear fit is performed on lg(|F es |) and lg(V tip ), labeled as
Figure FDA0002949813510000013
curve;
步骤1.4、在同一坐标系中,对
Figure FDA0002949813510000014
曲线进行平移,使得
Figure FDA0002949813510000015
曲线与
Figure FDA0002949813510000016
曲线的起点重合,以lg(V1)为起点、lg(Vn)为终点,计算得到
Figure FDA0002949813510000017
曲线与
Figure FDA0002949813510000018
曲线的围合面积S;
Step 1.4, in the same coordinate system, for
Figure FDA0002949813510000014
The curve is translated so that
Figure FDA0002949813510000015
curve with
Figure FDA0002949813510000016
The starting points of the curves coincide, with lg(V 1 ) as the starting point and lg(V n ) as the end point, the calculation
Figure FDA0002949813510000017
curve with
Figure FDA0002949813510000018
The enclosed area S of the curve;
步骤2、根据步骤1测量得到每一个标准压电薄膜样品的围合面积S、以及每一个标准压电薄膜样品的先验纵向压电系数d33,得到纵向压电系数与面积S拟合曲线、标记为d33-S曲线;Step 2. According to step 1, the enclosed area S of each standard piezoelectric film sample and the a priori longitudinal piezoelectric coefficient d 33 of each standard piezoelectric film sample are obtained, and the fitting curve between the longitudinal piezoelectric coefficient and the area S is obtained , marked as d 33 -S curve; 步骤3、采用步骤1.1~步骤1.4测量得到待测压电薄膜的围合面积S′,将围合面积S′带入d33-S曲线中进行插值拟合,得到待测压电薄膜的纵向压电系数。Step 3. Use steps 1.1 to 1.4 to measure and obtain the enclosed area S' of the piezoelectric film to be measured, and bring the enclosed area S' into the d 33 -S curve to perform interpolation fitting to obtain the longitudinal direction of the piezoelectric film to be measured. Piezoelectric coefficient.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114674875A (en) * 2022-03-14 2022-06-28 电子科技大学 Method for measuring longitudinal effective piezoelectric coefficient of piezoelectric film

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