CN112708938B - A kind of monocrystalline silicon wafer texturing agent and texturing method - Google Patents
A kind of monocrystalline silicon wafer texturing agent and texturing method Download PDFInfo
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- 229910021421 monocrystalline silicon Inorganic materials 0.000 title claims abstract description 110
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims abstract description 33
- 239000002245 particle Substances 0.000 claims abstract description 53
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 25
- 239000011737 fluorine Substances 0.000 claims abstract description 25
- 239000011259 mixed solution Substances 0.000 claims abstract description 22
- 239000007769 metal material Substances 0.000 claims abstract description 8
- 229910052755 nonmetal Inorganic materials 0.000 claims abstract description 8
- 239000003513 alkali Substances 0.000 claims description 41
- 229920000642 polymer Polymers 0.000 claims description 22
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 239000011859 microparticle Substances 0.000 claims description 15
- 230000007797 corrosion Effects 0.000 claims description 11
- 238000005260 corrosion Methods 0.000 claims description 11
- 239000000243 solution Substances 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- -1 polytetrafluoroethylene, ethylene-tetrafluoroethylene copolymer Polymers 0.000 claims description 7
- 229920001577 copolymer Polymers 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229920000620 organic polymer Polymers 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 238000003756 stirring Methods 0.000 claims description 5
- 229920001774 Perfluoroether Polymers 0.000 claims description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 4
- 230000005587 bubbling Effects 0.000 claims description 4
- 238000002604 ultrasonography Methods 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 25
- 239000012670 alkaline solution Substances 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 7
- 230000007613 environmental effect Effects 0.000 abstract description 5
- 229920002521 macromolecule Polymers 0.000 abstract description 2
- 150000002843 nonmetals Chemical class 0.000 abstract description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 24
- 239000001257 hydrogen Substances 0.000 description 24
- 235000012431 wafers Nutrition 0.000 description 20
- 230000008569 process Effects 0.000 description 10
- 239000000654 additive Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 210000002268 wool Anatomy 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 231100000252 nontoxic Toxicity 0.000 description 3
- 230000003000 nontoxic effect Effects 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 239000004811 fluoropolymer Substances 0.000 description 2
- RWSXRVCMGQZWBV-WDSKDSINSA-N glutathione Chemical compound OC(=O)[C@@H](N)CCC(=O)N[C@@H](CS)C(=O)NCC(O)=O RWSXRVCMGQZWBV-WDSKDSINSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- SQDAZGGFXASXDW-UHFFFAOYSA-N 5-bromo-2-(trifluoromethoxy)pyridine Chemical compound FC(F)(F)OC1=CC=C(Br)C=N1 SQDAZGGFXASXDW-UHFFFAOYSA-N 0.000 description 1
- 229920001287 Chondroitin sulfate Polymers 0.000 description 1
- 108010024636 Glutathione Proteins 0.000 description 1
- 229940059329 chondroitin sulfate Drugs 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 229960003180 glutathione Drugs 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/08—Etching
- C30B33/10—Etching in solutions or melts
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
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Abstract
本发明提供了一种单晶硅片制绒剂，单晶硅片制绒剂包括碱液，碱液中分布有带有动能的微米颗粒，微米颗粒为含氟高分子、抗碱腐蚀有机高分子、无机非金属、金属材料中的至少一种。还提供了一种单晶硅片制绒方法，包括单晶硅片制绒剂的配置，即碱液的配置、微米颗粒加入制备混合溶液、混合溶液中微米颗粒动能的获取等步骤)，和将单晶硅片置入单晶硅片制绒剂中在第三温度及t时间内进行制绒。本发明提供的单晶硅片制绒剂及制绒方法能够影响氢气气泡的大小、密度，及在单晶硅片表面的粘附时间等参数，会直接影响制备的绒面形貌、大小以及均匀性，从而影响单晶硅片表面的减反效果和与其他膜层之间的匹配状况，具有绿色、环保以及低成本的优点。
The invention provides a single-crystal silicon wafer texturing agent. The single-crystal silicon wafer texturing agent comprises an alkaline solution, and micron particles with kinetic energy are distributed in the alkaline solution, and the micron particles are fluorine-containing macromolecules and organic high At least one of molecules, inorganic non-metals, and metal materials. Also provided is a single-crystal silicon wafer texturing method, including the configuration of a single-crystal silicon wafer texturing agent, that is, the configuration of lye, the addition of micron particles to prepare a mixed solution, the acquisition of kinetic energy of micron particles in the mixed solution, etc.), and The single crystal silicon wafer is placed in the single crystal silicon wafer texturing agent for texturing at a third temperature and a time t. The monocrystalline silicon wafer texturing agent and the texturing method provided by the present invention can affect the size and density of hydrogen gas bubbles, and the adhesion time on the surface of the monocrystalline silicon wafer and other parameters, and will directly affect the prepared textured surface. Uniformity, thereby affecting the anti-reflection effect on the surface of the single crystal silicon wafer and the matching state with other film layers, has the advantages of green, environmental protection and low cost.
Description
Technical Field
The invention relates to the technical field of solar cell manufacturing, in particular to a monocrystalline silicon piece texturing agent and a texturing method.
Background
In the production process, in order to prepare a high-efficiency monocrystalline silicon solar cell, a textured surface needs to be manufactured on the surface of a silicon wafer so as to reduce optical loss caused by reflection of incident light on the surface of crystalline silicon as much as possible. At present, a pyramid-shaped suede structure with an anti-reflection effect is prepared mostly according to the anisotropic corrosion characteristic of a low-concentration alkaline solution on the surface of a silicon wafer. The principle of generating the textured surface on the surface of the monocrystalline silicon solar cell is as follows: the alkaline solution and the surface of the silicon wafer are subjected to chemical corrosion, and the alkaline solution and the silicon react to generate hydrogen bubbles enriched on the surface of the monocrystalline silicon wafer.
In the preparation process of the texture surface, the industry generally adds a liquid additive to reduce the surface tension of the silicon wafer and improve the viscosity of an alkaline solution, so as to improve the properties of the hydrogen bubbles, such as size, density, adsorption time and the like, and obtain a good texture surface. At present, common additives for texturing monocrystalline silicon wafers comprise alcohol texturing additives such as isopropanol and ethanol and alcohol-free texturing additives, and have the following disadvantages:
1. additives such as isopropanol, ethanol and the like have strong volatility, the loss in the texturing process is large, liquid needs to be replenished frequently, the operation is inconvenient and the environment is not protected;
2. the alcohol-free additive is usually a chemical liquid (such as tetramethylammonium hydroxide, vinyl pyrrolidone-vinyl imidazole copolymer, glutathione, chondroitin sulfate and the like) containing a plurality of complex organic matters, and on one hand, most of the chemical liquid is toxic and expensive, so that the wool making cost is greatly increased; on the other hand, organic residues of the monocrystalline silicon wafer after texturing are not easy to remove, a complex cleaning process is required to be added, the waste liquid after cleaning also increases a generation process, increases the environmental protection treatment cost, and seriously affects the production efficiency of monocrystalline silicon solar energy.
Therefore, it is necessary to develop a new texturing agent and a texturing process to solve the above problems.
Disclosure of Invention
Aiming at the problems of economy, environmental protection, safety and the like of various conventional liquid additives used in the texturing process of the existing monocrystalline silicon piece, the invention designs the monocrystalline silicon piece texturing agent which has simple, environmental protection and high efficiency and can be recycled and the texturing method.
The technical scheme for realizing the purpose of the invention is as follows:
the invention provides a monocrystalline silicon piece texturing agent which comprises alkali liquor, wherein micron particles with kinetic energy are distributed in the alkali liquor, and the micron particles are at least one of fluorine-containing polymers, alkali corrosion resistant organic polymers, inorganic nonmetal and metal materials.
The invention realizes the preparation and adjustment of the pyramid suede on the surface of the monocrystalline silicon piece by improving the existing alkaline texturing agent and adding the micron particles with kinetic energy into the alkaline liquor.
The action principle of the monocrystalline silicon piece texture surface making agent is as follows: the alkali liquor and the monocrystalline silicon piece are subjected to chemical reaction to generate hydrogen bubbles, the micron particles with kinetic energy collide with the hydrogen bubbles to destroy or split the hydrogen bubbles, and meanwhile, the micron particles desorb the hydrogen bubbles attached to the surface of the monocrystalline silicon piece, so that the texturing on the surface of the monocrystalline silicon piece is realized.
Furthermore, the particle size range of the micron particles is 5-500 mu m.
Furthermore, the mass fraction range of the micron particles in the monocrystalline silicon piece texture surface making agent is 0.2-20%.
In a preferred embodiment of the monocrystalline silicon wafer texturing agent of the present invention, the fluorine-containing polymer is one or more of polytetrafluoroethylene, ethylene-tetrafluoroethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer, and tetrafluoroethylene-perfluoroether copolymer. The fluorine-containing polymer is nontoxic, can not volatilize, has excellent acid-base corrosion resistance, can hardly cause loss in alkali liquor, is safe and environment-friendly, can be repeatedly utilized for a long time, and can greatly reduce the cost of the monocrystalline silicon piece texturing agent. Meanwhile, due to the arrangement and the adhesiveness of the fluorine-containing polymer, the monocrystalline silicon piece surface can not be adsorbed and remained after the texturing, and the monocrystalline silicon piece surface texturing agent can be cleaned simply.
Further, the alkali liquor comprises a sodium hydroxide solution or a potassium hydroxide solution, the concentration range of the alkali liquor is 0.05-1.0 mol/L, and the alkali liquor is the sodium hydroxide solution or the potassium hydroxide solution.
The invention also provides a monocrystalline silicon piece texturing method, which comprises the following steps:
preparing alkali liquor, and heating the alkali liquor to a first temperature;
adding the micron particles into alkali liquor to form a mixed solution;
heating the mixed solution to a second temperature;
dispersing the micron particles in the mixed solution and obtaining kinetic energy to obtain the monocrystalline silicon piece texturing agent;
putting the monocrystalline silicon piece into a monocrystalline silicon piece texturing agent, and texturing at a third temperature;
and after t time, taking out the textured monocrystalline silicon wafer and cleaning.
Furthermore, the first temperature range is 40-60 ℃, the second temperature range is 70-90 ℃, and the third temperature range is 70-90 ℃.
Furthermore, the particle size range of the micron particles is 80-200 mu m, and the mass fraction range of the micron particles in the monocrystalline silicon piece texture surface making agent is 1.0-8.0%.
Further, in the dispersing and kinetic energy obtaining of the microparticles in the mixed solution, the method for dispersing and kinetic energy obtaining of the microparticles in the mixed solution includes one or more of stirring, ultrasound, and bubbling.
Furthermore, t is 180-600 s, and the texture surface of the monocrystalline silicon wafer is controlled by strictly controlling the texture surface making time t.
Compared with the prior art, the invention has the beneficial effects that:
1. the micron particles, particularly the kinetic energy-containing micron particles, can destroy and split hydrogen bubbles generated by the reaction of the monocrystalline silicon piece and the alkali liquor in the texturing process, so that the hydrogen bubbles are desorbed from the surface of the monocrystalline silicon piece, the size and the density of the hydrogen bubbles and the adhesion time on the surface of the monocrystalline silicon piece are controlled, and finally the texture surface of the monocrystalline silicon piece is controlled.
2. The micron particles are fluorine-containing polymers, and have the characteristics of no toxicity, safety, environmental protection, no volatilization, recyclability, excellent acid-base corrosion resistance, almost no loss in an alkali solution, long-term use and the like, and the cost of the monocrystalline silicon piece texturing agent can be greatly reduced. Meanwhile, due to the special non-adhesiveness of the fluorine-containing polymer, adsorption residue on the surface of the monocrystalline silicon wafer can not be caused after texturing is finished, and the subsequent cleaning steps can be reduced.
3. The invention further ensures the texture-making effect of the monocrystalline silicon piece by adjusting the grain diameter, the concentration (mass fraction) and the energy (kinetic energy) of the micron particles in the texture-making agent of the monocrystalline silicon piece.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a flowchart of a method for texturing a single-crystal silicon wafer according to embodiment 2 of the present invention;
FIG. 2 is a comparative illustration of the effect of microparticles in the texturing process of example 2 of the present invention;
wherein, the method comprises the following steps of 1, a texturing groove, 2, alkali liquor, 3, a monocrystalline silicon wafer, 4, hydrogen bubbles, 5 and micron particles.
Detailed Description
The invention will be further described with reference to specific embodiments, and the advantages and features of the invention will become apparent as the description proceeds. These examples are illustrative only and do not limit the scope of the present invention in any way. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention, and that such changes and modifications may be made without departing from the spirit and scope of the invention.
Furthermore, the terms "first," "second," "third," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicit to a number of indicated technical features. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the invention, the meaning of "a plurality" is two or more unless otherwise specified.
Example 1:
in this embodiment, the monocrystalline silicon wafer texturing agent includes an alkali solution, and microparticles with kinetic energy are distributed in the alkali solution, and the microparticles are at least one of fluorine-containing polymers, alkali corrosion resistant organic polymers, inorganic non-metals, and metal materials.
When the micro-particles are made of fluorine-containing polymer materials, the fluorine-containing polymer is one or more of polytetrafluoroethylene, ethylene-tetrafluoroethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer and tetrafluoroethylene-perfluoroether copolymer. The fluorine-containing polymer is nontoxic, can not volatilize, has excellent acid-base corrosion resistance, can hardly cause loss in alkali liquor, is safe and environment-friendly, can be repeatedly utilized for a long time, and can greatly reduce the cost of the monocrystalline silicon piece texturing agent. Meanwhile, due to the arrangement and the adhesiveness of the fluorine-containing polymer, the monocrystalline silicon piece surface can not be adsorbed and remained after the texturing, and the monocrystalline silicon piece surface texturing agent can be cleaned simply.
When the micron particles are made of inorganic nonmetallic materials, quartz can be selected; when the micrometer particles are made of a metal material, materials such as nickel and nickel-based alloy can be selected, and it should be noted that the quartz, nickel and nickel-based alloy are only one material of the micrometer particles, and other corresponding materials can also be selected for substitution.
The micron particles, especially the micron particles containing kinetic energy (the kinetic energy is energy generated by enabling the micron particles to move in the wool making agent through methods of stirring, ultrasound, bubbling and the like), can destroy and split hydrogen bubbles generated by the reaction of the monocrystalline silicon piece and alkali liquor in the wool making process, and enable the hydrogen bubbles to be desorbed from the surface of the monocrystalline silicon piece, so that the size and the density of the hydrogen bubbles and the adhesion time on the surface of the monocrystalline silicon piece are controlled, and finally the control on the texture surface of the monocrystalline silicon piece is realized.
Furthermore, the particle size range of the micron particles is 5-500 mu m.
Furthermore, the mass fraction range of the micron particles in the monocrystalline silicon piece texture surface making agent is 0.2-20%.
Further, the alkali liquor is sodium hydroxide solution or potassium hydroxide solution, and the concentration range of the alkali liquor is 0.05-1.0 mol/L.
The invention realizes the preparation and adjustment of the pyramid suede on the surface of the monocrystalline silicon piece by improving the existing alkaline texturing agent and adding the micron particles with kinetic energy into the alkaline liquor.
The action principle of the monocrystalline silicon piece texture surface making agent is as follows: the alkali liquor and the monocrystalline silicon piece are subjected to chemical reaction to generate hydrogen bubbles, the micron particles with kinetic energy collide with the hydrogen bubbles to destroy or split the hydrogen bubbles, and meanwhile, the micron particles desorb the hydrogen bubbles attached to the surface of the monocrystalline silicon piece, so that the texturing on the surface of the monocrystalline silicon piece is realized.
In the process of impacting the hydrogen bubbles by the micron particles, parameters such as the size and the density of the hydrogen bubbles, the time for adhering the hydrogen bubbles to the surface of the monocrystalline silicon piece and the like can be directly influenced, so that the appearance, the size and the uniformity of the prepared texture are directly influenced, and the anti-reflection effect of the surface of the monocrystalline silicon piece and the matching condition between the surface of the monocrystalline silicon piece and other film layers are further influenced.
Example 2:
in the preparation process of the texture, the size, the density, the adhesion time on the surface of the monocrystalline silicon piece and the like of hydrogen bubbles can directly influence the texture appearance, the size and the uniformity of the surface of the monocrystalline silicon piece, and further influence the anti-reflection effect of the surface of the monocrystalline silicon and the matching condition between the surface of the monocrystalline silicon piece and other film layers. Based on the factors, the invention also provides a monocrystalline silicon piece texturing method, and the monocrystalline silicon piece texturing agent is applied to texturing the surface of the monocrystalline silicon piece.
As shown in fig. 1, fig. 1 is a flowchart of a method for texturing a single crystal silicon wafer according to the embodiment, and the method for texturing a single crystal silicon wafer includes the following steps:
s1, preparing alkali liquor 2 in the wool making groove 1, and heating the alkali liquor 2 to a first temperature.
In this step, the first temperature range is 40 to 60 ℃.
S2, adding the micron particles 5 into the alkali liquor 2 in the S1 to form a mixed solution, and heating the mixed solution to a second temperature.
In the step, the second temperature range is 70-90 ℃; the particle size range of the micron particles 5 is 80-200 mu m, and the mass fraction range of the micron particles in the obtained mixed solution monocrystalline silicon piece texture surface making agent is 1.0-8.0%.
S3, dispersing the micron particles 5 in the mixed solution and obtaining kinetic energy to obtain the monocrystalline silicon piece texturing agent.
In this step, the method for dispersing and acquiring kinetic energy of the microparticles 5 in the mixed solution is one or more of stirring, ultrasound, and bubbling.
S4, putting the monocrystalline silicon piece 3 into the monocrystalline silicon piece texturing agent, and texturing by adopting a third temperature.
In this step, the third temperature range is 70 to 90 ℃.
And S5, taking out the monocrystalline silicon wafer 3 after texturing and cleaning.
In the step, t is 180-600 s, and the texture surface of the monocrystalline silicon wafer is controlled by strictly controlling the texture surface making time t.
Of course, the micro-particle component can be expanded from fluorine-containing polymer into organic polymer, inorganic nonmetal (such as quartz), metal (such as nickel and nickel-based alloy) and other materials with certain alkali corrosion resistance.
Preferably, the monocrystalline silicon piece is subjected to texturing by preparing a monocrystalline silicon piece texturing agent by using a fluorine-containing polymer as a material.
S1, preparing a sodium hydroxide alkali solution with the concentration range of 0.5-0.6 mol/L by using sodium hydroxide alkali in the texturing tank 1, and heating the solution to 50 +/-2 ℃.
S2, adding a fluoropolymer (polytetrafluoroethylene or a mixture of polytetrafluoroethylene and tetrafluoroethylene-hexafluoropropylene copolymer) with a particle size range of 120 +/-30 μm into the heated sodium hydroxide alkali solution to prepare a mixed solution, wherein the mass fraction of the fluoropolymer in the mixed solution is 6.0%, and heating the mixed solution to 80 +/-5 ℃.
S3, uniformly dispersing the fluorine-containing macromolecules in the mixed solution into the alkali liquor by ultrasonic or stirring and obtaining kinetic energy with certain energy.
The monocrystalline silicon piece texture surface preparation agent is prepared through the steps S1-S3 for standby.
S4, placing the monocrystalline silicon piece 3 into the monocrystalline silicon piece texturing agent prepared by the method, and texturing under the regulation of 80 +/-5 ℃.
S5, after the surface of the monocrystalline silicon piece is subjected to texturing for 300 +/-60S, taking out the textured monocrystalline silicon piece and cleaning, thus finishing the surface texturing of the monocrystalline silicon piece.
As shown in FIG. 2, the single crystal silicon wafer 3 was subjected to texturing cleaning in the texturing tank 1 by performing a comparative test on whether or not micron particles were added to the texturing agent. Wherein, the left side in fig. 2 is a schematic diagram of the effect of the existing texture surface-making agent on the surface of monocrystalline silicon, and only the alkaline solution 2 acts on the monocrystalline silicon piece 3; on the right side of fig. 2 is a schematic diagram of the action of the texturing agent of the present invention on the surface of single-crystal silicon, and the mixed solution includes microparticles 5 with kinetic energy. As shown in fig. 2, the hydrogen bubbles 4 are significantly increased when the right mixed solution is acted. The invention adopts micron particles 5 with excellent chemical stability, thermal stability and non-adhesiveness, such as fluorine-containing polymer (such as polytetrafluoroethylene) to assist in texturing, and utilizes the impact action of the fluorine-containing polymer with certain kinetic energy dispersed in alkali liquor on hydrogen bubbles 4 on the surface of a monocrystalline silicon piece 3 to destroy and split bubbles or desorb the hydrogen bubbles, thereby replacing the conventional texturing additive to realize the control of the texturing process. The advantages are that:
1. the fluorine-containing polymer micro-particles 5 are nontoxic, have no volatilization problem, can be recovered, and are safe and environment-friendly;
2. because the fluorine-containing polymer micro-particles 5 have excellent acid-base corrosion resistance, almost no loss is caused in alkali liquor, and the fluorine-containing polymer micro-particles can be repeatedly used for a long time, thereby being beneficial to reducing the cost;
3. due to the special non-adhesion property of the fluorine-containing polymer micro-particles 5, adsorption residues on the surface of the monocrystalline silicon wafer can not be caused after the texturing is finished, and the subsequent cleaning steps can be reduced.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (9)
1. A monocrystalline silicon piece texture surface making agent is characterized in that: the monocrystalline silicon piece texturing agent comprises alkali liquor, wherein micron particles with kinetic energy are distributed in the alkali liquor, and the micron particles are at least one of fluorine-containing polymers, alkali corrosion resistant organic polymers, inorganic nonmetal and metal materials; wherein:
the fluorine-containing polymer is one or more of polytetrafluoroethylene, ethylene-tetrafluoroethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer and tetrafluoroethylene-perfluoroether copolymer;
the inorganic nonmetal is quartz;
the metal material is any one of nickel and nickel-based alloy.
2. The monocrystalline silicon wafer texturing agent according to claim 1, characterized in that: the particle size range of the micron particles is 5-500 mu m.
3. The monocrystalline silicon wafer texturing agent according to claim 1, characterized in that: the mass fraction range of the micron particles in the monocrystalline silicon piece texture surface making agent is 0.2-20%.
4. The monocrystalline silicon wafer texturing agent according to claim 1, characterized in that: the alkali liquor comprises a sodium hydroxide solution or a potassium hydroxide solution, and the concentration range of the alkali liquor is 0.05-1.0 mol/L.
5. A monocrystalline silicon piece texturing method is characterized by comprising the following steps: the method comprises the following steps:
preparing alkali liquor, and heating the alkali liquor to a first temperature;
adding micron particles into the alkali liquor to form a mixed solution, wherein the micron particles are at least one of fluorine-containing polymers, alkali corrosion resistant organic polymers, inorganic nonmetal and metal materials;
heating the mixed solution to a second temperature;
dispersing the micron particles in the mixed solution and obtaining kinetic energy to obtain the monocrystalline silicon piece texturing agent;
putting a monocrystalline silicon wafer into the monocrystalline silicon wafer texturing agent, and texturing by adopting a third temperature;
after t time, taking out and cleaning the textured monocrystalline silicon wafer;
wherein: the fluorine-containing polymer is one or more of polytetrafluoroethylene, ethylene-tetrafluoroethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer and tetrafluoroethylene-perfluoroether copolymer;
the inorganic nonmetal is quartz;
the metal material is any one of nickel and nickel-based alloy.
6. The method of texturing a single-crystal silicon wafer according to claim 5, characterized in that: the first temperature range is 40-60 ℃, the second temperature range is 70-90 ℃, and the third temperature range is 70-90 ℃.
7. The method of texturing a single-crystal silicon wafer according to claim 5, characterized in that: the particle size range of the micro particles is 80-200 mu m, and the mass fraction range of the micro particles in the monocrystalline silicon piece texture surface making agent is 1.0-8.0%.
8. The method of texturing a single-crystal silicon wafer according to claim 5, characterized in that: the method for dispersing the micron particles in the mixed solution and acquiring kinetic energy comprises one or more of stirring, ultrasound and bubbling.
9. The method of texturing a single-crystal silicon wafer according to claim 5, characterized in that: and t is 180-600 s.
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