CN112535911B - Optical device and method for operating the same - Google Patents
Optical device and method for operating the same Download PDFInfo
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- CN112535911B CN112535911B CN202010886744.3A CN202010886744A CN112535911B CN 112535911 B CN112535911 B CN 112535911B CN 202010886744 A CN202010886744 A CN 202010886744A CN 112535911 B CN112535911 B CN 112535911B
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- 230000003287 optical effect Effects 0.000 title claims abstract description 142
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000007789 gas Substances 0.000 claims abstract description 298
- 238000004140 cleaning Methods 0.000 claims abstract description 144
- 238000001914 filtration Methods 0.000 claims abstract description 83
- 238000004891 communication Methods 0.000 claims abstract description 22
- 239000002253 acid Substances 0.000 claims abstract description 13
- 238000007493 shaping process Methods 0.000 claims description 45
- 239000002245 particle Substances 0.000 claims description 40
- 238000012545 processing Methods 0.000 claims description 37
- 239000007787 solid Substances 0.000 claims description 31
- 239000003595 mist Substances 0.000 claims description 22
- 238000005070 sampling Methods 0.000 claims description 20
- 238000001514 detection method Methods 0.000 claims description 14
- 230000010287 polarization Effects 0.000 claims description 10
- 230000003068 static effect Effects 0.000 claims description 9
- 230000002378 acidificating effect Effects 0.000 claims description 8
- 230000007547 defect Effects 0.000 claims description 7
- 239000007800 oxidant agent Substances 0.000 claims description 4
- 238000005086 pumping Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- -1 moisture Substances 0.000 claims description 3
- 239000002585 base Substances 0.000 description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/56—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition
- B01D46/62—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition connected in series
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention provides an optical device and a working method thereof, wherein the optical device comprises: a gas supply device for supplying a cleaning gas; a flow dividing unit for dividing the cleaning gas into a first cleaning gas and a second cleaning gas; the first filtering device is used for carrying out first filtering treatment on the first clean gas and comprises an acid-base filter, and the acid-base filter is used for removing acid and/or alkaline gases in the first clean gas to form a third clean gas; an optical chamber in communication with the third cleaning gas, the optical chamber configured to form an optical path therein; a pneumatic device in communication with a second cleaning gas for providing a force to the pneumatic device. The optical device can reduce the cost under the condition of reducing the pollution of the optical element.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing, in particular to optical equipment and a working method thereof.
Background
In semiconductor manufacturing, an apparatus for inspecting and processing a wafer generally includes a light source for providing incident light to a surface of the wafer through an optical element.
The wafer detecting and processing device comprises: the device comprises a front-end device, a light source component and a vacuum chuck; the opening and closing of the valve of the front end device, the protective gas of the light source component, the movement of the moving platform and the like all need the gas supply device to provide gas.
The prior art provides the same gas for the front-end device, the light source assembly, the vacuum chuck and the like through the same gas supply system. However, since different components of the wafer inspection and processing apparatus have different gas requirements, it is difficult to supply the same gas to meet the gas requirements of the various components.
Disclosure of Invention
The invention aims to provide optical equipment and a working method thereof, which can reduce the cost on the premise of meeting different requirements of different parts of the optical equipment on gas.
The technical scheme of the invention provides optical equipment, which comprises: a gas supply device for supplying a cleaning gas; a flow dividing unit for dividing the cleaning gas into a first cleaning gas and a second cleaning gas; the first filtering device is used for carrying out first filtering treatment on the first clean gas and comprises an acid-base filter, and the acid-base filter is used for removing acid and/or alkaline gases in the first clean gas to form a third clean gas; an optical chamber in communication with the third cleaning gas, the optical chamber configured to form an optical path therein; a pneumatic device in communication with a second cleaning gas for providing a force to the pneumatic device.
Optionally, the gas supply device includes: a gas source for generating a raw gas; the second filtering device is used for carrying out second filtering treatment on the original gas to form the clean gas; the second filtering device is used for removing one or more of solid particles, moisture and oil mist in the raw gas.
Optionally, the second filtering device includes a primary filtering device and a secondary filtering device; the primary filtering device is used for primary filtering the original gas; the secondary filtering device is used for carrying out secondary filtering on the gas subjected to the primary filtering;
the primary filtering device and the secondary filtering device are at least used for removing solid particles in the original gas; the size of the solid particles filtered by the secondary filtering device is smaller than or equal to that of the solid particles filtered by the primary filtering device.
Optionally, the first filtering device further includes: a gas cleaner for removing one or more combinations of solid particles, moisture, oil mist in a cleaning gas.
Optionally, the number of the optical chambers is multiple, and the multiple optical chambers include: a shaping chamber and a light source chamber located in the light source device;
the light source apparatus for generating an exit light source, the light source apparatus comprising: a pumping light source in the light source chamber for emitting pumping light; the resonance cavity is used for improving the parallelism of the pump light and forming an emergent light beam;
the shaping chamber has therein: one or the combination of the shaping component and the polarization component, wherein the shaping component is used for shaping the emergent light beam reaching the shaping component and adjusting the shape of a light spot formed by the emergent light beam; the polarizing component is used for adjusting the polarization state of the emergent light beam.
Optionally, the method further includes: a detection chamber having therein: the receiving assembly is used for collecting the signal light beam formed by the object to be processed; and the detector is used for detecting the signal light beams collected by the receiving assembly and acquiring the light intensity information of the collected signal light beams.
Optionally, the number of the optical chambers communicated with the third cleaning gas is one or more;
the optical chamber in communication with the third cleaning gas comprises one or more combinations of a light source chamber, a shaping chamber, and a detection chamber.
Optionally, the signal light beam is a light beam formed by scattering the emission light beam by an object to be processed; the detector is also used for acquiring the position information or/and the size information of the surface defect of the object to be processed according to the light intensity information.
Optionally, the light beam forming the light path comprises ultraviolet light.
Optionally, the pneumatic means in communication with the second cleaning gas comprises: one or more of a pneumatic valve, a motion stage, and a static eliminator;
wherein the pneumatic valve is powered by the second cleaning gas to move the pneumatic valve; the second cleaning gas provides power for the moving platform to enable the moving platform to drive the object to be treated to move; the static eliminator blows out a large amount of positive and negative ions by the second cleaning gas to neutralize static electricity.
Optionally, the number of the pneumatic valves communicated with the second cleaning gas is one or more; the one or more pneumatic valves include one or both of a first pneumatic valve and a second pneumatic valve;
the optical apparatus further includes: the bearing chamber is provided with a bearing device for bearing an object to be processed so as to process the object to be processed; the side wall of the bearing chamber is provided with a processing window, an object to be processed enters and exits the processing chamber through the processing window, and the first pneumatic valve is positioned in the processing window; a gas control valve for controlling a direction of force applied to the first pneumatic valve to cause the first pneumatic valve to open or close the process window;
the optical apparatus further includes a housing box for housing an object to be processed, the housing box having a sampling window at which the second pneumatic valve is located, the second pneumatic valve being controlled to open and close the sampling window by the second cleaning gas; the object to be processed enters and exits the containing box through the sampling window.
Optionally, one or a combination of the first gas filter and the second gas filter is further included;
the first gas filter is used for filtering the third cleaning gas to remove particles in the third cleaning gas; the second gas filter is used for filtering the second cleaning gas and removing particles in the second cleaning gas.
Optionally, the optical device comprises a plurality of first gas filters and a plurality of second gas filters; a first gas filter for filtering third cleaning gas entering an optical chamber; a second gas filter is used to filter the second clean gas entering a pneumatic device.
Optionally, at least one first pressure valve, one said first pressure valve for controlling the flow of a third cleaning gas into an optical chamber; and/or the presence of a gas in the atmosphere,
at least one second pressure valve, one second pressure valve for controlling the flow of the second cleaning gas into a pneumatic device.
Optionally, the acid-base filter comprises: an oxidizer for removing acidic and/or basic gases in the first cleaning gas; a filter element for removing particles from the first cleaning gas.
Optionally, the method further includes: the dryer is used for drying the first cleaning gas.
A method of operating an optical device as described above, comprising: generating a cleaning gas by a gas supply device; dividing the cleaning gas into a first cleaning gas and a second cleaning gas by using a flow dividing unit;
performing a first filtering treatment on the first clean gas through a first filtering device, wherein the first filtering device comprises an acid-base filter, and the acid-base filter is used for removing acid and/or alkaline gases in the first clean gas to form a third clean gas;
introducing the third cleaning gas into the optical chamber, wherein the optical chamber is used for forming an optical path;
causing the second cleaning gas to provide a force to the pneumatic device.
Optionally, the plurality of optical chambers in communication with the third cleaning gas comprises: a shaping chamber and a light source chamber located in the light source device; the shaping chamber comprises a shaping element and a polarizing component;
passing the third cleaning gas into the optical chamber comprises: passing the third cleaning gas into the light source chamber and shaping chamber;
after the third cleaning gas is introduced into the optical chamber, the third cleaning gas is used for generating an emergent light source through the light source equipment; shaping the emergent light beam reaching the shaping component through the shaping component, and adjusting the shape of a light spot formed by the emergent light beam; and adjusting the polarization state of the emergent light beam through the polarization component.
Optionally, the pneumatic valve in communication with the second cleaning gas comprises a first pneumatic valve and a second pneumatic valve; the optical apparatus further includes: the device comprises a bearing chamber, a gas control valve, an accommodating box and a manipulator, wherein the manipulator is used for conveying an object to be processed; the bearing chamber is provided with a bearing device;
causing the second cleaning gas to provide a force to the pneumatic device comprises: providing a second cleaning gas to the first pneumatic valve and enabling the first pneumatic valve to open the sampling window; providing a second cleaning gas to the second pneumatic valve and opening the process window through the gas control valve;
after opening the first pneumatic valve, the method of operation further comprises: the mechanical arm takes out the object to be processed from the accommodating box through the sampling window; after the second pneumatic valve is opened, the manipulator places the object to be processed taken out of the containing box on the bearing device through the processing window; after the robot arm places the object to be processed taken out from the containing box on the carrying device through the processing window, the second valve is controlled by the gas control valve to close the processing window.
Compared with the prior art, the technical scheme of the invention has the following advantages:
in the optical equipment provided by the technical scheme of the invention, acid-base gas and light beams in the optical cavity are easy to decompose so as to pollute the optical element, so that the acid-base gas content in the optical cavity cannot be too high; the pneumatic device mainly utilizes the force provided by gas, and has lower requirements on gas components. According to the technical scheme, the cleaning gas is divided into the first cleaning gas and the second cleaning gas, and the first filtering device is used for filtering the acid gas and/or the alkaline gas in the first cleaning gas, so that the content of the acid gas and/or the alkaline gas in the optical chamber can be reduced, and pollutants generated by decomposition of the acid gas and/or the alkaline gas can be reduced; acid and alkali gases in the second clean gas are not removed, so that the cost can be reduced, and the stability of the second clean gas flow is facilitated.
Drawings
Fig. 1 to 3 are schematic structural diagrams of an embodiment of an optical apparatus according to the present invention;
fig. 4 is a flow chart of steps of an embodiment of a method of operating an optical device of the present invention.
Detailed Description
Optical devices have a number of problems, for example: the optical elements are heavily contaminated or the optical equipment costs are high.
The optical equipment comprises a front-end device, an optical element and a motion platform; the front-end device and the motion platform both need gas to provide force; the optical element requires a cleaning gas to protect it.
An optical apparatus supplies a front-end device, an optical element, and a vacuum chuck with a dried and deoiled mist of cleaning gas through a gas supply system;
however, the acid-base gas is inevitably present in the cleaning gas, and under the irradiation of light beams (especially ultraviolet light), the acid-base gas is easy to generate decomposition reaction, so that the light intensity reaching the surface of the wafer is easy to be unstable for the optical element, thereby reducing the processing and detection precision, and the pollutant is easy to cause the collection of light energy, thereby causing the damage of the optical element.
The technical scheme of the invention provides optical equipment, which can reduce the content of acid gas and/or alkaline gas in an optical cavity by dividing clean gas into first clean gas and second clean gas and filtering the acid gas and/or the alkaline gas in the first clean gas through a first filtering device, thereby reducing pollutants generated by decomposition of the acid gas and/or the alkaline gas; acid and alkali gases in the second cleaning gas are not removed, so that the cost can be reduced, and the stability of the second cleaning gas flow is facilitated.
The technical scheme of the invention is explained in detail in the following with reference to the attached drawings.
FIGS. 1 to 3 are schematic structural diagrams of an embodiment of an optical device according to the present invention
Referring to fig. 1, fig. 1 is a schematic diagram of a gas supply path of an embodiment of the optical apparatus of the present invention.
The optical apparatus includes: a gas supply device 10 for supplying a cleaning gas; a flow dividing unit for dividing the cleaning gas into a first cleaning gas 1 and a second cleaning gas 2; a first filtering device 20, configured to perform a first filtering process on the first clean gas 1, where the first filtering device 20 includes an acid-base filter 21, and the acid-base filter 21 is configured to remove acidic and/or basic gases in the first clean gas 1 to form a third clean gas 3; an optical chamber in communication with the third cleaning gas 3 for forming an optical path therein; a pneumatic device in communication with a second cleaning gas 2, the second cleaning gas 2 being used to provide a force to the pneumatic device.
The gas supply device 10 includes: a gas source 11 for generating a raw gas; and a second filtering device 12 for performing a second filtering process on the raw gas to form the clean gas.
The raw gas passing through the second filter means 12 forms clean gas which is used to provide a force for the pneumatic means.
The second filter device 12 includes: one or more of a water remover, an oil mist separator and an activated carbon filter.
Specifically, in this embodiment, the second filtering device 12 includes: a primary filtering device and a secondary filtering device; the primary filtering device is used for primary filtering the original gas; the secondary filtering device is used for carrying out secondary filtering on the gas subjected to the primary filtering.
The second filtering device 12 comprises a primary filtering device and a secondary filtering device, and both the primary filtering device and the secondary filtering device are used for removing solid particles in the original gas; the size of the solid particles filtered by the secondary filtering device is smaller than or equal to that of the solid particles filtered by the primary filtering device.
In other embodiments, the second filter device 12 may include only the primary filter device or the secondary filter device.
In this embodiment, the primary filtering device includes: a filter, an oil mist separator and a micro mist separator; the filter, the oil mist separator and the micro mist separator are sequentially arranged in the air flow direction.
The filter is used for removing moisture and solid particles in the original gas; the minimum size of the solid particles removed by the filter was 5 μm.
The oil mist separator is used for removing oil mist and solid particles in the original gas; the minimum size of the solid particles removed by the oil mist separator is 0.3 μm.
The micro-mist separator is used for removing moisture and solid particles in the original gas; the minimum size of the solid particles removed by the micro mist separator was 0.01 μm.
The secondary filter device comprises: a clean air filter, a clean oil mist separator and a clean activated carbon filter; the clean air filter, the clean oil mist separator and the clean active carbon filter are sequentially arranged in the air flow direction.
The clean air filter is used for removing moisture and solid particles in the original gas; the minimum size of the solid particles removed by the clean air filter was 0.3 μm.
The clean oil mist separator is used for removing oil mist and solid particles in the original gas; the minimum size of the solid particles removed by the clean oil mist separator is 0.01 μm.
The clean activated carbon filter is used for removing oil mist and solid particles in the original gas; the minimum size of the solid particles removed by the clean activated carbon filter is 0.01 μm.
In this embodiment, the size of the solid particles refers to the diameter of the particles.
The first filter device 20 includes: an acid-base filter 21, wherein the acid-base filter 21 is used for removing acid and/or alkaline gases in the first clean gas 1; a gas cleaner 22, the gas cleaner 22 for removing one or more combinations of solid particles, moisture, oil mist in the cleaning gas.
In this embodiment, the gas cleaner 22 is a dryer for performing a drying process on the first cleaning gas.
In this embodiment, the acid-base filter 21 includes: an oxidizing agent for removing acidic and/or basic gases in the first cleaning gas 1; a filter element for removing particles from the first cleaning gas 1.
Specifically, the oxidant is a nickel catalyst. The filter element is a stainless steel filter element.
The optical device further comprises one or a combination of a first gas filter and a second gas filter; the first gas filter is used for filtering the third cleaning gas 3 to remove particles in the third cleaning gas; the second gas filter is used for filtering the second clean gas 2 to remove particles in the second clean gas. In particular, in this embodiment, the optical device includes both the first gas filter and the second gas filter.
The optical device comprises a plurality of first gas filters and a plurality of second gas filters; a first gas filter for filtering third cleaning gas 3 entering an optical chamber; a second gas filter is used to filter the second clean gas 2 entering a pneumatic device.
The first gas filter is used for removing solid particles in the third cleaning gas 3; the second gas filter is used to remove solid particles from the second cleaning gas 2.
The optical apparatus further includes: at least one first pressure valve, one said first pressure valve for controlling the flow of third cleaning gas 3 into an optical chamber; and/or at least one second pressure valve, one second pressure valve for controlling the flow of the second cleaning gas 2 into a pneumatic device.
Specifically, in this embodiment, the optical apparatus includes a plurality of first pressure valves and a plurality of second pressure valves.
The optical apparatus further includes: at least a first float flow meter, one said float flow meter for displaying the pressure of gas entering an optical chamber; and/or at least one second float flow meter, one said float flow meter for displaying the pressure of the gas entering one pneumatic chamber.
Specifically, in the present embodiment, the optical device includes a plurality of first float flow meters and a plurality of second float flow meters.
The second cleaning gas 2 enters the pneumatic chamber through the second gas filter after passing through the second pressure valve; the third cleaning gas 3 enters the optical chamber through the first gas filter after passing only through the first pressure valve.
Referring to fig. 2, the pneumatic device in communication with the second cleaning gas 2 includes: one or more of a pneumatic valve, a motion stage, and a static eliminator in combination: wherein the pneumatic valve is powered by the second cleaning gas 2 to move the pneumatic valve; the second cleaning gas 2 provides power for the motion platform, so that the motion platform drives the object to be processed 100 to move; the static eliminator blows out a large amount of positive and negative ions by the second cleaning gas 2 to neutralize static electricity.
In this embodiment, the second cleaning gas 2 is divided to provide gas for the pneumatic valve, the vacuum chuck and the electrostatic eliminator.
The number of the pneumatic valves communicated with the second cleaning gas 2 is one or more; the one or more pneumatic valves include one or both of a first pneumatic valve and a second pneumatic valve; specifically, in the present embodiment, the plurality of pneumatic valves includes both the first pneumatic valve and the second pneumatic valve.
The optical apparatus further includes: a carrying chamber 23 having a carrying device 231 for carrying the object 100 to be processed so as to process the object 100 to be processed; the side wall of the carrying chamber 23 has a processing window through which the object 100 to be processed enters and exits the processing chamber, and the first pneumatic valve is located at the processing window; a gas control valve for controlling a direction of force applied to the first pneumatic valve to cause the first pneumatic valve to open or close the process window;
the optical apparatus further includes a housing box 331, the housing box 331 for housing the object 100 to be processed, the housing box 331 having a sampling window, the second pneumatic valve being located at the sampling window, the second pneumatic valve being controlled to open and close the sampling window by the second cleaning gas 2; the object 100 to be processed enters and exits the housing box 331 through the sampling window.
In this embodiment, the optical apparatus is a wafer defect detecting apparatus, and the object 100 to be processed is a wafer.
The detection device further comprises a conveying device, wherein the conveying device comprises a driving assembly and a mechanical arm, and the driving assembly is used for driving the mechanical arm to move; the mechanical arm is used for picking up an object to be detected; the air extractor is used for extracting air from the vacuum chuck; the carrier 231 is used for carrying and fixing the object 100 to be processed. In this embodiment, the carrying device 231 is a vacuum chuck, and in other embodiments, the carrying device 231 may also be an electrostatic chuck, a mechanical chuck, or an air-float chuck.
In this embodiment, the carrying device 231 is located in the carrying chamber 23, and the carrying device 231 is used for adsorbing the object 100 to be processed and driving the object 100 to be processed to rotate and/or translate.
In this embodiment, the second cleaning gas 2 is communicated with the first valve, and the second cleaning gas 2 is controlled to open the sampling window of the first valve, so that the driving device drives the robot arm to take out the object 100 to be processed in the accommodating box 331 through the sampling window; the gas control valve controls the moving direction of the second valve so that the second valve opens the processing window, and a robot arm places the object to be processed 100 on the surface of the vacuum chuck of the carrying chamber 23 through the processing window; after the robot arm places the object to be processed 100 on the surface of the vacuum chuck of the carrying chamber 23 through the processing window, the vacuum chuck is evacuated by the evacuation device, so that the vacuum chuck adsorbs the object to be processed 100; the object 100 to be processed is provided with a light beam through the optical chamber, so that the object 100 to be processed is optically processed.
Specifically, in this embodiment, the optical processing includes optical detection. In other embodiments, the object 100 to be processed may be optically processed by providing a light beam to the object 100 to be processed through the optical chamber, for example: optical cutting or lithography.
The optical apparatus further includes: the motion platform is positioned in the bearing chamber and moves to drive the bearing table to move; in this embodiment, the second cleaning gas 2 is also in communication with the motion stage. Specifically, in the optical processing process, the second cleaning gas 2 provides a force for the motion stage, so that the motion stage drives the vacuum chuck to move. Specifically, the motion table drives the vacuum chuck to move, translate and/or rotate.
Referring to fig. 2 and 3, the optical chamber in communication with the third cleaning gas 3 includes one or more of a combination of a light source chamber, a shaping chamber, and a detection chamber.
In this embodiment, the number of the optical chambers is plural, and the plural optical chambers include: a shaping chamber 32 and a light source chamber 31 in the light source device; the light source apparatus for generating outgoing light, the light source apparatus comprising: a pump light source 311 located in the light source chamber 31 for emitting pump light; the resonant cavity 312 is used to improve the parallelism of the pump light to form the outgoing beam.
In this embodiment, the light source is a laser, specifically, the light source is a solid laser, and the resonant cavity 312 has a crystal therein. The light source can also be a semiconductor laser, a fiber laser or a gas laser. In other embodiments, the light source may also be an LED light source.
In this embodiment, the optical device is used to detect defects on the surface of the wafer. The defects include solid particles, scratches, bumps, or depressions.
The light source equipment is used for generating emergent light which is ultraviolet light, and the sensitivity of the ultraviolet light to defect detection is higher; however, since the ultraviolet light easily reacts with the emission of the acidic or basic gas in the light source chamber 31 to contaminate the optical elements in the optical chamber, the contamination easily causes the collection of light energy, resulting in the damage of the optical elements. According to the technical scheme, the clean gas is subjected to the first filtering treatment, so that acidic and alkaline gases in the gas can be removed, and pollution is reduced.
Referring to fig. 2, the shaping chamber 32 has therein: one or a combination of the shaping component 321 and the polarization component 322, wherein the shaping component 321 is used for shaping the emergent beam reaching the shaping component 321 and adjusting the spot shape formed by the emergent beam; the polarizing component 322 is used to adjust the polarization state of the outgoing light beam.
Specifically, in this embodiment, the shaping chamber 32 has: a shaping component 321 and a polarizing component 322. The shaping component comprises: a beam expander and an optical diffraction element.
In this embodiment, the optical device further includes: a detection chamber 33, the detection chamber 33 having therein: a receiving assembly for collecting a signal beam formed through the object to be processed 100; and a detector 330 for detecting the signal beam collected by the receiving assembly and acquiring the light intensity information of the collected signal beam. In other embodiments, the optical device does not include the detection chamber, for example: the optical equipment is used for optically processing an object to be processed.
In this embodiment, the signal beam is a beam formed by scattering the emission beam through the object 100 to be processed; the detector 330 is further configured to obtain position information or/and size information of the surface defect of the object to be processed according to the light intensity information.
In this embodiment, the detection chamber 33 is not in communication with the third cleaning gas 3. In other embodiments, the detection chamber may be in communication with the third cleaning gas.
Fig. 4 is a flowchart of steps of an operating method of an optical device according to an embodiment of the present invention.
With reference to fig. 1 to 4, the present invention further provides a working method of an optical device, including:
SP1: generating a cleaning gas by a gas supply device 10;
SP2: dividing the cleaning gas into a first cleaning gas 1 and a second cleaning gas 2 by using a flow dividing unit;
SP3: performing a first filtering treatment on the first clean gas 1 through a first filtering device 20, wherein the first filtering device 20 comprises an acid-base filter 21, and the acid-base filter 21 is used for removing acidic and/or alkaline gases in the first clean gas 1 to form a third clean gas 3;
SP4: introducing the third cleaning gas 3 into the optical chamber, wherein the optical chamber is used for forming an optical path;
SP5: so that the second cleaning gas 2 provides a force to the pneumatic means.
In this embodiment, the optical device is the same as the optical device in the embodiments shown in fig. 1 to 3, and is not described herein again.
In the present embodiment, the plurality of optical chambers communicating with the third cleaning gas 3 include: a shaping chamber 32 and a light source chamber 31 in the light source device; the shaping cavity 32 is internally provided with a shaping element 321 and a polarizing component 322;
passing the third cleaning gas 3 into the optical chamber comprises: the third cleaning gas 3 is made to enter the light source chamber 31 and the shaping chamber 32;
after the third cleaning gas 3 is introduced into the optical chamber, the third cleaning gas is used for generating an emergent light source through the light source equipment; shaping the emergent light beam reaching the shaping component through the shaping component, and adjusting the shape of a light spot formed by the emergent light beam; the polarization state of the outgoing beam is adjusted by the polarizing component 322.
The pneumatic valves communicated with the second cleaning gas 2 comprise a first pneumatic valve and a second pneumatic valve; the optical apparatus further includes: a carrying chamber 23, a gas control valve, an accommodation box 331, and a robot for transferring the object to be processed 100; the carrying chamber 23 has a carrying device 231 therein;
causing the second cleaning gas 2 to provide a force to the pneumatic device comprises: providing a second cleaning gas 2 to the first pneumatic valve and causing the first pneumatic valve to open the sampling window; providing second clean gas 2 for the second pneumatic valve and enabling the second pneumatic valve to open the processing window through a gas control valve; .
After opening the first pneumatic valve, the method of operation further comprises: the robot takes out the object to be processed 100 from the housing box 331 through the sampling window; after the second pneumatic valve is opened, the robot arm places the object to be processed 100 taken out of the receiving box 331 on the carrier 231 through the processing window; after the robot hand places the object to be processed 100 taken out of the receiving box 331 on the carrier 231 through the processing window, the second valve is closed by the gas control valve to close the processing window.
In this embodiment, the working method of the optical device specifically includes: the first valve opens the sampling window by controlling the second cleaning gas 2, and the driving device drives the robot arm to take out the object to be processed 100 in the containing box 331 through the sampling window; the gas control valve controls the moving direction of the second valve so that the second valve opens the processing window, and the robot arm places the object 100 to be processed on the surface of the carrying device 231 of the carrying chamber 23 through the processing window; after the robot arm places the object 100 to be processed on the surface of the carrying device 231 of the carrying chamber 23 through the processing window, the carrying device 231 fixes the object 100 to be processed;
blowing the optical chamber by the third cleaning gas 3 and providing a light beam for the object to be processed 100 through the optical chamber, thereby optically processing the object to be processed 100; after the optical treatment, the carrying device 231 releases the object to be treated 100; after the vacuum chuck stops sucking the object to be processed 100, the object to be processed 100 is taken away by the robot.
In this embodiment, the carrying device is a vacuum chuck. The fixing of the object 100 to be processed by the supporting device 231 includes sucking the vacuum chuck by the air sucking device, so that the object 100 to be processed is sucked by the vacuum chuck; after the optical processing, causing the carrier 231 to release the wafer includes: the vacuum chuck is stopped from sucking the object to be processed 100.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (19)
1. An optical device, comprising:
a gas supply device for supplying a cleaning gas;
a flow dividing unit for dividing the cleaning gas into a first cleaning gas and a second cleaning gas;
the first filtering device is communicated with one output end of the flow dividing unit and is used for carrying out first filtering treatment on the first clean gas, the first filtering device comprises an acid-base filter, and the acid-base filter is used for removing acidic and/or alkaline gases in the first clean gas to form third clean gas;
an optical chamber in communication with the third cleaning gas, the optical chamber for forming an optical path therein;
and the pneumatic device is communicated with second clean gas at the other output end of the flow dividing unit, and the second clean gas is used for providing force action for the pneumatic device.
2. The optical apparatus according to claim 1, wherein the gas supply means comprises:
a gas source for generating a raw gas;
the second filtering device is used for carrying out second filtering treatment on the original gas to form the clean gas; the second filtering device is used for removing one or more of solid particles, moisture and oil mist in the original gas.
3. The optical apparatus of claim 2, wherein the second filtering means comprises a primary filtering means and a secondary filtering means; the primary filtering device is used for performing primary filtering on the original gas; the secondary filtering device is used for carrying out secondary filtering on the gas subjected to the primary filtering; the primary filtering device and the secondary filtering device are at least used for removing solid particles in the original gas; the size of the solid particles filtered by the secondary filtering device is smaller than or equal to that of the solid particles filtered by the primary filtering device.
4. The optical device of claim 1, wherein the first filtering means further comprises: a gas cleaner for removing one or more combinations of solid particles, moisture, oil mist in a cleaning gas.
5. The optical apparatus of claim 1, wherein the number of optical chambers is plural, the plural optical chambers comprising: a shaping chamber and a light source chamber located in the light source device;
the light source apparatus for generating an exit light source, the light source apparatus comprising: a pumping light source in the light source chamber for emitting pumping light; the resonance cavity is used for improving the parallelism of the pump light and forming an emergent light beam;
the shaping chamber has therein: one or the combination of the shaping component and the polarizing component, wherein the shaping component is used for shaping the emergent light beam reaching the shaping component and adjusting the shape of a light spot formed by the emergent light beam; the polarizing component is used for adjusting the polarization state of the emergent light beam.
6. The optical device of claim 5, further comprising: a detection chamber having therein: the receiving assembly is used for collecting the signal light beam formed by the object to be processed; and the detector is used for detecting the signal light beams collected by the receiving assembly and acquiring the light intensity information of the collected signal light beams.
7. The optical apparatus of claim 6, wherein the number of optical chambers in communication with the third cleaning gas is one or more;
the optical chamber in communication with the third cleaning gas comprises one or more combinations of a light source chamber, a shaping chamber, and a detection chamber.
8. The optical apparatus according to claim 7, wherein the signal beam is a beam formed by scattering the outgoing beam by the object to be processed; the detector is also used for acquiring the position information or/and the size information of the surface defect of the object to be processed according to the light intensity information.
9. The optical device of claim 1, wherein the light beam forming the optical path comprises ultraviolet light.
10. The optical apparatus of claim 1, wherein the pneumatic device in communication with the second cleaning gas comprises: one or more of a pneumatic valve, a motion stage, and a static eliminator;
wherein the pneumatic valve is powered by the second cleaning gas to move the pneumatic valve; the second cleaning gas provides power for the moving platform to enable the moving platform to drive the object to be treated to move; the static eliminator blows out a large amount of positive and negative ions through the second cleaning gas to neutralize static electricity.
11. The optical apparatus of claim 10, wherein the number of pneumatic valves in communication with the second cleaning gas is one or more; the one or more pneumatic valves include one or both of a first pneumatic valve and a second pneumatic valve;
the optical apparatus further includes: the bearing chamber is provided with a bearing device for bearing an object to be processed so as to process the object to be processed; the side wall of the bearing chamber is provided with a processing window, objects to be processed enter and exit the processing chamber through the processing window, and the first pneumatic valve is positioned in the processing window; a gas control valve for controlling a direction of force applied to the first pneumatic valve to cause the first pneumatic valve to open or close the process window;
the optical apparatus further includes a housing box for housing an object to be processed, the housing box having a sampling window at which the second pneumatic valve is located, the second pneumatic valve being controlled to open and close the sampling window by the second cleaning gas; the object to be processed enters and exits the accommodating box through the sampling window.
12. The optical device of claim 1, further comprising one or a combination of a first gas filter and a second gas filter;
the first gas filter is used for filtering the third cleaning gas to remove particles in the third cleaning gas; the second gas filter is used for filtering the second cleaning gas and removing particles in the second cleaning gas.
13. The optical apparatus of claim 12, wherein the optical apparatus comprises a plurality of first gas filters and a plurality of second gas filters; a first gas filter for filtering third cleaning gas entering an optical chamber; a second gas filter is used to filter the second clean gas entering a pneumatic device.
14. The optical apparatus of claim 1, further comprising at least one first pressure valve, one said first pressure valve for controlling the flow of a third cleaning gas into one optical chamber; and/or the presence of a gas in the gas,
at least one second pressure valve, one second pressure valve for controlling the flow of the second cleaning gas into a pneumatic device.
15. The optical device of claim 1, wherein the acid-base filter comprises: an oxidizer for removing acidic and/or basic gases in the first cleaning gas; a filter element for removing particles from the first cleaning gas.
16. The optical device of claim 1, further comprising: the dryer is used for drying the first cleaning gas.
17. A method of operating an optical device as claimed in any one of claims 1 to 16, comprising:
generating a cleaning gas by a gas supply device;
dividing the cleaning gas into a first cleaning gas and a second cleaning gas by using a flow dividing unit;
performing a first filtering treatment on the first clean gas through a first filtering device, wherein the first filtering device comprises an acid-base filter, and the acid-base filter is used for removing acid and/or alkaline gases in the first clean gas to form a third clean gas;
introducing the third cleaning gas into the optical chamber, wherein the optical chamber is used for forming a light path;
causing the second cleaning gas to provide a force to the pneumatic device.
18. The method of operation of claim 17, wherein the plurality of optical chambers in communication with the third cleaning gas comprises: a shaping chamber and a light source chamber located in the light source device; the shaping chamber comprises a shaping element and a polarizing component;
passing the third cleaning gas into the optical chamber comprises: passing the third cleaning gas into the light source chamber and shaping chamber;
after the third cleaning gas is introduced into the optical chamber, the third cleaning gas is used for generating an emergent light source through the light source equipment; shaping the emergent light beam reaching the shaping component through the shaping component, and adjusting the shape of a light spot formed by the emergent light beam; and adjusting the polarization state of the emergent light beam through the polarization component.
19. The method of operation of claim 17 wherein the pneumatic valve in communication with the second cleaning gas comprises a first pneumatic valve and a second pneumatic valve; the optical apparatus further includes: the device comprises a bearing chamber, a gas control valve, a containing box and a manipulator, wherein the manipulator is used for conveying an object to be processed; the bearing chamber is provided with a bearing device;
causing the second cleaning gas to provide a force to the pneumatic device comprises: providing a second cleaning gas for the first pneumatic valve, and enabling the first pneumatic valve to open a sampling window; providing a second cleaning gas for the second pneumatic valve, and enabling the second pneumatic valve to open a processing window through a gas control valve;
after opening the first pneumatic valve, the method of operation further comprises: the mechanical arm takes out the object to be processed from the accommodating box through the sampling window; after the second pneumatic valve is opened, the manipulator places the object to be processed taken out of the containing box on the bearing device through the processing window; the manipulator places the object to be processed taken out from the containing box on the bearing device through the processing window, and the second valve is controlled by the gas control valve to close the processing window.
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| CN102003215A (en) * | 2010-05-13 | 2011-04-06 | 石家庄中煤装备制造有限公司 | Multistage air motor |
| CN106449487A (en) * | 2016-10-28 | 2017-02-22 | 北京七星华创电子股份有限公司 | Oxygen control and pressure control system for treatment chamber of semiconductor equipment |
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| AUPN965996A0 (en) * | 1996-05-03 | 1996-05-30 | Vision Products Pty Ltd | The detection of airborne pollutants |
| WO2000031780A1 (en) * | 1998-11-19 | 2000-06-02 | Nikon Corporation | Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method |
| CN100547755C (en) * | 2007-02-06 | 2009-10-07 | 中芯国际集成电路制造(上海)有限公司 | Device for measuring wafer film thickness |
| CN104406050A (en) * | 2014-11-07 | 2015-03-11 | 合肥大安印刷有限责任公司 | Working gas shunting system |
| CN208833689U (en) * | 2018-08-31 | 2019-05-07 | 深圳中科飞测科技有限公司 | Testing Equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102003215A (en) * | 2010-05-13 | 2011-04-06 | 石家庄中煤装备制造有限公司 | Multistage air motor |
| CN106449487A (en) * | 2016-10-28 | 2017-02-22 | 北京七星华创电子股份有限公司 | Oxygen control and pressure control system for treatment chamber of semiconductor equipment |
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