CN112501580A - 一种立式蒸发溅射一体化设备的测量载具 - Google Patents
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Abstract
本发明公开了一种立式蒸发溅射一体化设备的测量载具，属于真空镀膜领域，包括基础框架，基础框架的中间封板上安装有纵向长齿条，纵向长齿条两侧分布有硅片安装槽，纵向长齿条靠近顶部框架板的1/3处与二级齿轮啮合，二级齿轮与一级齿轮啮合，一级齿轮与横向短齿条啮合，横向短齿条安装在狭缝腔的腔壁上，中间封板上还通过挡板齿轮轴安装有两列挡板齿轮，挡板齿轮轴上还固定连接有硅片镀膜挡板，挡板齿轮与纵向长齿条啮合。本发明解决了在一套立式蒸发溅射一体化设备内同时使用蒸发镀膜与溅射镀膜两种工艺时无法单独测量蒸发膜层原子质量比和溅射膜层厚度的问题，无需关闭蒸发源及溅射电源，实现随时在线取样、线下测量的目的。
Description
技术领域
本发明属于真空镀膜领域，具体是一种铜铟镓硒高阻层蒸发溅射集成一体化镀膜设备中硅片的测量载具。
背景技术
CIGS薄膜太阳能电池是在玻璃或者其他廉价衬底上分别沉积多层薄膜而构成的光伏器件。传统的CIGS薄膜太阳能电池的结构是SLG(钠钙玻璃)/底电极Mo/吸收层CIGS/缓冲层CdS/，在大规模生产中，大多采用在蒸发溅射一体化设备中连续镀膜的方式来沉积铜铟镓硒中的高阻层，以减少界面层的缺陷及其它杂质对电池的影响。但由此容易出现测量硅片时相互干扰的问题，如在测量蒸发膜层的原子质量比时需要关闭溅射电源，在测量溅射膜层厚度时需要关闭蒸发源，但蒸发源的加热与冷却都需要大量的时间，因此造成生产稼动率非常低，大大增加了产品的生产成本，从而降低产品在市场上的竞争力。
其次，为了保证生产的可持续性，很多设备都会采用缓冲腔加狭缝腔的布气方式来稳定工艺腔(包括蒸发工艺腔和溅射工艺腔)的工艺压力，因此对测量载具的厚度有很高的要求，如何保证在测量工序不中断、待测硅片顺利通过狭缝腔及不影响生产用硅片夹具正常运行是当前测量载具的设计难点。
发明内容
为了解决现有技术存在的问题，本发明提供一种立式蒸发溅射一体化设备的测量载具，解决了在一套立式蒸发溅射一体化设备内同时使用蒸发镀膜与溅射镀膜两种工艺时无法单独测量蒸发膜层原子质量比和溅射膜层厚度的问题，无需关闭蒸发源及溅射电源，实现随时在线取样、线下测量的目的。
本发明采用如下技术方案：一种立式蒸发溅射一体化设备的测量载具，包括基础框架，所述的基础框架由顶部框架板、侧面框架板和底部框架板构成，顶部框架板与底部框架板之间安装有中间封板，中间封板与侧面框架板之间安装有均热板，顶部框架板顶部安装有顶部导轨，底部框架板底部安装有底部导轨；中间封板上安装有纵向长齿条，纵向长齿条两侧分布有两列相互对称的硅片安装槽，所述的硅片安装槽位于中间封板上；纵向长齿条靠近顶部框架板的1/3处与二级齿轮啮合，二级齿轮与一级齿轮啮合，一级齿轮与横向短齿条啮合，横向短齿条安装在测量载具通过的狭缝腔的腔壁上，一级齿轮通过一级齿轮轴安装在中间封板上，二级齿轮通过二级齿轮轴安装在中间封板上；中间封板上还通过挡板齿轮轴安装有两列挡板齿轮，挡板齿轮轴上还固定连接有硅片镀膜挡板，所述的挡板齿轮轴位于硅片安装槽与纵向长齿条之间，挡板齿轮与纵向长齿条啮合。
为简单说明问题起见，以下对本发明所述的立式蒸发溅射一体化设备的测量载具均简称为本测量载具。
本测量载具的工作过程是：测量前，把纯硅片放入硅片安装槽内，硅片随测量载具进入真空腔室后，通过蒸发镀膜腔沉积一层蒸发膜层，在测量载具行进过程中，一级齿轮受到狭缝腔腔壁上的横向短齿条的拨动，通过二级齿轮带动纵向长齿条移动，纵向长齿条带动档板齿轮及挡板齿轮轴转动，从而带动硅片挡板旋转180度后，已经沉积蒸发膜层的硅片被硅片挡板遮挡，而未沉积蒸发膜层的硅片在下一步的溅射工序中沉积溅射膜层，然后传送出工艺腔，即可取下硅片进行线下测量，这样，有一部分硅片只沉积蒸发膜层，另一部分硅片只沉积溅射膜层，就可以单独测量蒸发膜层的原子质量比和溅射膜层的厚度，不需要关闭蒸发源和溅射电源，不需要等待蒸发源加热及冷却时间，大大提高生产的稼动率。而且硅片直接安装在硅片安装槽内，不需要每次测量时都要量一下硅片放置尺寸，随放随取，且确保位置准确。
本测量载具的有益效果是：通过挡片的遮挡技术，无论需要单独测量蒸发膜的原子质量比还是需要单独测量溅射膜层的原子质量比都不需关闭蒸发源及溅射电源，都可以随时插入生产间隙进行取样测量，设备时间稼动率可以提升20％以上，大幅度提高了产能，从而降低了产品的时间成本，提高市场竞争力。
作为本发明的优化，传动齿轮采用一级齿轮与二级齿轮的双级传动方式，一级齿轮的齿数与二级齿轮的齿数比为1：2，可以避免测量夹具在前进过程中因带动纵向长齿条运动造成的动量损耗而出现卡顿现象。
作为本发明的优化，一级齿轮采用棘齿结构，保证硅片镀膜挡板在旋转到合适角度后不会后退，保证遮挡效果。
作为本发明的优化，横向短齿条的长度是当硅片镀膜挡板旋转180度后，横向短齿条正好与一级齿轮自动脱离，既保证了硅片镀膜挡板的有效性，又保证了硅片取样的准确性。
作为本发明的优化，硅片镀膜挡板采用1mm厚的不锈钢板，可以充分降低测量夹具的厚度，增加其在腔室内的可通过性。
作为本发明的优化，中间封板上还固定有挡板导引定位条，所述的挡板导引定位条位于硅片安装槽远离纵向长齿条的一侧，硅片镀膜挡板在旋转时通过挡板导引定位条导引定位，避免出现因硅片镀膜挡板变形而导致硅片遮挡不严实的问题。
作为本发明的优化，挡板导引定位条采用斜坡式结构，入口大，内部小，可以避免因硅片镀膜挡板变形而出现不入槽的问题，保证了硅片镀膜挡板的遮挡效果。
附图说明
图1是本发明的测量载具的立体图。
图2是本发明的测量载具的后视图。
图3是图1中M部的放大图。
图4是图1中N部的放大图。
图5是硅片镀膜挡板与挡板齿轮的装配图。
具体实施方式
下面结合附图对本发明的实施例作具体描述：
一种立式蒸发溅射一体化设备的测量载具，如图1—图5所示，包括基础框架1，所述的基础框架1由顶部框架板1a、侧面框架板1b和底部框架板1c构成，顶部框架板1a与底部框架板1b之间安装有中间封板2，中间封板2与两侧的侧面框架板1b之间各安装两块均热板3，纵向的两块均热板3之间还有加强筋14，顶部框架板1a顶部安装有顶部导轨4，底部框架板1c底部安装有底部导轨5；中间封板2上安装有纵向长齿条6，纵向长齿条6两侧分布有两列相互对称的硅片安装槽7，所述的硅片安装槽7位于中间封板2上；纵向长齿条6靠近顶部框架板1a的1/3处与二级齿轮8啮合，二级齿轮8与一级齿轮9啮合，一级齿轮9采用棘齿结构，一级齿轮9的齿数与二级齿轮8的齿数比为1：2，一级齿轮9与横向短齿条10啮合，横向短齿条10安装在测量载具通过的狭缝腔的腔壁上，一级齿轮9通过一级齿轮轴安装在中间封板2上，二级齿轮8通过二级齿轮轴安装在中间封板2上；中间封板2上还通过挡板齿轮轴15安装有两列挡板齿轮11，挡板齿轮轴15上还固定连接有硅片镀膜挡板12，硅片镀膜挡板12采用1mm厚的不锈钢板，可以充分降低测量夹具的厚度，增加其在腔室内的可通过性，所述的挡板齿轮轴15位于硅片安装槽7与纵向长齿条6之间，挡板齿轮11与纵向长齿条6啮合，横向短齿条10的长度是当硅片镀膜挡板旋转180度后，横向短齿条10正好与一级齿轮9自动脱离，既保证了硅片镀膜挡板12的有效性，又保证了硅片取样的准确性。中间封板2上还固定有挡板导引定位条13，所述的挡板导引定位条13位于硅片安装槽7远离纵向长齿条6的一侧，硅片镀膜挡板12在旋转时通过挡板导引定位条13导引定位，挡板导引定位条13采用斜坡式结构，入口大、内部小，可以避免因硅片镀膜挡板12变形而出现不入槽和遮挡不严实的问题。
以上所述为本发明的较佳实施例而已，但本发明不应局限于该实施例和附图所公开的内容，所以凡是不脱离本发明所公开的精神下完成的等效替换或修改，都应落入本发明保护的范围。
Claims (7)
1.一种立式蒸发溅射一体化设备的测量载具，包括基础框架，所述的基础框架由顶部框架板、侧面框架板和底部框架板构成，顶部框架板与底部框架板之间安装有中间封板，中间封板与侧面框架板之间安装有均热板，顶部框架板顶部安装有顶部导轨，底部框架板底部安装有底部导轨，其特征在于：
中间封板上安装有纵向长齿条，纵向长齿条两侧分布有两列相互对称的硅片安装槽，所述的硅片安装槽位于中间封板上；纵向长齿条靠近顶部框架板的1/3处与二级齿轮啮合，二级齿轮与一级齿轮啮合，一级齿轮与横向短齿条啮合，横向短齿条安装在测量载具通过的狭缝腔的腔壁上，一级齿轮通过一级齿轮轴安装在中间封板上，二级齿轮通过二级齿轮轴安装在中间封板上；中间封板上还通过挡板齿轮轴安装有两列挡板齿轮，挡板齿轮轴上还固定连接有硅片镀膜挡板，所述的挡板齿轮轴位于硅片安装槽与纵向长齿条之间，挡板齿轮与纵向长齿条啮合。
2.根据权利要求l所述的立式蒸发溅射一体化设备的测量载具，其特征在于：一级齿轮采用棘齿结构。
3.根据权利要求2所述的立式蒸发溅射一体化设备的测量载具，其特征在于：一级齿轮的齿数与二级齿轮的齿数比为1：2。
4.根据权利要求l所述的立式蒸发溅射一体化设备的测量载具，其特征在于：横向短齿条的长度是当硅片镀膜挡板旋转180度后，横向短齿条正好与一级齿轮自动脱离。
5.根据权利要求l所述的立式蒸发溅射一体化设备的测量载具，其特征在于：硅片镀膜挡板为1mm厚的不锈钢板。
6.根据权利要求l所述的立式蒸发溅射一体化设备的测量载具，其特征在于：中间封板上还固定有挡板导引定位条，所述的挡板导引定位条位于硅片安装槽远离纵向长齿条的一侧，硅片镀膜挡板在旋转时通过挡板导引定位条导引定位。
7.根据权利要求6所述的立式蒸发溅射一体化设备的测量载具，其特征在于：挡板导引定位条采用斜坡式结构，入口大、内部小。
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