CN112394529B - Unit beam splitting and combining interferometer - Google Patents
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Abstract
本发明涉及一种单元件分束合束干涉仪,包括元件,光束进入元件后分为两束光,即第一束光和第二束光,所述第一束光和第二束光在元件内分别经过偶数次和奇数次反射,反射后两束光在元件内重新合束,最终从元件射出。本发明解决了现有干涉仪由多个元件组成,相当复杂,稳定性不足等问题,通过反射次数奇偶性不同能够在元件内同时实现分束和合束,具有紧凑稳定、高度集成化、高效率、耐受大功率等优势,在许多应用场景可以替代传统的多元件构成的干涉仪,例如,但不限于在矢量光场生成、涡旋光束拓扑荷测量、量子光学逻辑门等方面具有广泛潜在应用。
The invention relates to a single-element beam splitting and combining interferometer, which includes an element, and a light beam is divided into two beams after entering the element, that is, a first beam of light and a second beam of light, and the first beam of light and the second beam of light are After even and odd times of reflection in the component, the two beams of light are recombined in the component after reflection, and finally emitted from the component. The present invention solves the problems that the existing interferometer is composed of multiple elements, which is quite complex and lacks stability, and can realize beam splitting and beam combining in the elements at the same time through the parity of the number of reflections, and has the advantages of compactness, stability, high integration, and high efficiency. It can replace the traditional multi-element interferometer in many application scenarios, such as, but not limited to, it has wide potential in vector light field generation, vortex beam topological charge measurement, quantum optical logic gate, etc. application.
Description
技术领域technical field
本发明涉及干涉仪和棱镜器件技术领域,具体地说是一种单元件分束合束干涉仪。The invention relates to the technical field of interferometers and prism devices, in particular to a single-element beam splitting and combining interferometer.
背景技术Background technique
现有棱镜的作用通常是分光、改变传播方向、色散、偏振分光等。在单棱镜中同时实现“分束+合束”双过程的棱镜尚属空白。在光场调控和应用中,最常见的一类手段和需求是:先对光束进行分束(分振幅或者分波前),然后分别对两束光进行调制后再合束输出。最常用的方法是利用各种干涉光路:例如Sagnac干涉仪、马赫曾德干涉仪、迈克尔逊干涉仪等。但是使用这类干涉仪往往需要多个使用多个光学元件构成光路,且为了保证足够的空间放置这些元件,干涉臂往往相对较长,多元件和较长的光程二者共同对光路稳定性造成负面影响。因此,如何将单棱镜简洁稳定的优势和干涉仪光场调控的功能融合到一个元件上,对于光场调控及高维量子光学实验等需要大量使用干涉仪的场合,具有十分重要的科学和实用意义。目前基于这个思路的研究和发明几乎空白。The functions of existing prisms are usually light splitting, changing the direction of propagation, dispersion, polarization splitting, etc. A prism that realizes the dual process of "beam splitting + beam combining" in a single prism is still blank. In light field regulation and application, the most common means and requirements are: first split the beam (splitting the amplitude or splitting the wavefront), and then modulate the two beams separately before combining the beams for output. The most commonly used method is to use various interference optical paths: such as Sagnac interferometer, Mach-Zehnder interferometer, Michelson interferometer, etc. However, the use of this type of interferometer often requires multiple optical elements to form an optical path, and in order to ensure sufficient space for placing these elements, the interference arm is often relatively long, and the combination of multiple elements and long optical paths affects the stability of the optical path. cause negative impact. Therefore, how to integrate the simple and stable advantages of single prisms and the light field control functions of interferometers into one component is of great scientific and practical importance for occasions that require a large number of interferometers such as light field control and high-dimensional quantum optics experiments. significance. Research and invention based on this train of thought is almost blank at present.
同时,这种单元件干涉仪在矢量光场生成、涡旋拓扑荷测量、量子光学中具有十分重要的应用价值和意义。目前的矢量光场生成方式主要分为主动生成方法和被动生成方法,其中,主动生成方法通常指在激光谐振腔内直接产生空间偏振非均匀分布的矢量光束,例如,2005年和2006年,分别有研究小组设计特殊的谐振腔产生了径向矢量光场,2016年Forbes小组利用在激光谐振腔内加入涡旋相位元件及偏振元件在腔内生成了多种矢量光场,这类生成方法效率高且稳定,但是灵活性较差,往往不能在多种矢量光场之间灵活切换。被动生成方法主要是在激光谐振腔外,利用各类位相、振幅、偏振调控元件,生成矢量场。这类方法往往较为灵活,尤其是伴随着液晶空间光调制器的发展,往往可以灵活地生成各类矢量光场,例如王慧田研究小组利用空间光调制器和4f系统构建了任意矢量光场生成系统,但是被动法生成矢量光场往往涉及到大量光学元件,而且大部分基于分束干涉的原理,虽然各类干涉仪各有特色,但是都涉及到多个元件共同配合完成干涉,光路不够简洁和稳定。因此一种简洁、稳定、高效的矢量光场生成装置,对于矢量光场的广泛应用具有重大意义。At the same time, this single-element interferometer has very important application value and significance in vector light field generation, vortex topological charge measurement, and quantum optics. The current vector light field generation methods are mainly divided into active generation methods and passive generation methods. Among them, the active generation method usually refers to directly generating vector beams with non-uniform distribution of spatial polarization in the laser resonator. For example, in 2005 and 2006, respectively A research team designed a special resonator to generate a radial vector light field. In 2016, the Forbes group used a vortex phase element and a polarization element in the laser resonator to generate a variety of vector light fields in the cavity. The efficiency of this generation method is High and stable, but poor flexibility, often can not flexibly switch between a variety of vector light fields. The passive generation method mainly uses various phase, amplitude, and polarization control elements outside the laser resonator to generate a vector field. This type of method is often more flexible, especially with the development of liquid crystal spatial light modulators, it can often flexibly generate various vector light fields. For example, Wang Huitian's research group has constructed an arbitrary vector light field generation system using spatial light modulators and 4f systems , but the passive method to generate vector light fields often involves a large number of optical components, and most of them are based on the principle of beam splitting interference. Although various interferometers have their own characteristics, they all involve multiple components to cooperate to complete the interference. Stablize. Therefore, a simple, stable and efficient vector light field generating device is of great significance for the wide application of vector light field.
此外,涡旋光场在近30年取得了很大的发展,在光学微操纵、超分辨显微成像、微纳加工、非线性光学、量子光学等领域被广泛应用,其中,如何高效准确地测试涡旋光场地拓扑荷,对于各类应用都具有十分重要地意义。研究者们发明了一系列方法测量涡旋光场的拓扑荷:利用旋转多普勒效应、利用涡旋光束特殊的衍射或者干涉图样等。例如采用双缝干涉,三角孔衍射、柱透镜聚焦、马赫曾德干涉仪等方法测量拓扑荷。然而这类方法有一定的局限性,往往不能兼顾简便性和易读性,尤其是当待测拓扑荷非常大的情况下,不易读取。因此,一种简洁紧凑的适用于任意大小拓扑荷测量的装置对于涡旋光的应用具有重大意义。In addition, the vortex light field has made great progress in the past 30 years, and has been widely used in the fields of optical micromanipulation, super-resolution microscopic imaging, micro-nano processing, nonlinear optics, quantum optics, etc. Among them, how to efficiently and accurately test The topological charge of the vortex light site is very important for various applications. Researchers have invented a series of methods to measure the topological charge of the vortex light field: using the rotating Doppler effect, using the special diffraction or interference pattern of the vortex beam, etc. For example, double-slit interference, triangular hole diffraction, cylindrical lens focusing, Mach-Zehnder interferometer and other methods are used to measure topological charges. However, this type of method has certain limitations, and often cannot take into account simplicity and readability, especially when the topological charge to be measured is very large, it is not easy to read. Therefore, a simple and compact device suitable for measuring topological charges of any size is of great significance for the application of vortex light.
综上,如何提供一种单元件分束合束干涉仪,以解决现有技术所存在的问题,对其应用具有重要意义。To sum up, how to provide a single-element beam splitting and combining interferometer to solve the problems existing in the prior art is of great significance to its application.
发明内容Contents of the invention
有鉴于此,本申请的目的在于提供一种单元件分束合束干涉仪,以适用于高温介质通断的平板阀结构,实现高温介质管道的安全可靠通断,满足高温油气传输、化学冶炼和核电站冷却等高温环境下的使用要求。In view of this, the purpose of this application is to provide a single-element beam splitting and combining interferometer, which is suitable for the flat valve structure of high-temperature medium on-off, realizes safe and reliable on-off of high-temperature medium pipelines, and satisfies high-temperature oil and gas transmission, chemical smelting and nuclear power plant cooling and other high-temperature environments.
为了达到上述目的,本申请提供如下技术方案。In order to achieve the above purpose, the present application provides the following technical solutions.
一种单元件分束合束干涉仪,包括元件,光束进入元件后分为两束光,即第一束光和第二束光,所述第一束光和第二束光在元件内分别经过偶数次和奇数次反射,反射后两束光在元件内重新合束,最终从元件射出。A single-element beam splitting and combining interferometer, including an element, a light beam is divided into two beams after entering the element, that is, the first beam and the second beam, and the first beam and the second beam are separated in the element After even-numbered and odd-numbered reflections, the two beams of light are recombined in the component after reflection, and finally emitted from the component.
优选地,所述元件包括分光平面,所述分光平面为偏振分光平面或非偏振分光平面。Preferably, the element includes a beam-splitting plane, and the beam-splitting plane is a polarizing beam-splitting plane or a non-polarizing beam-splitting plane.
优选地,所述第一束光在元件内经过2次反射,所述第二束光在元件内经过3次或5次反射。Preferably, the first beam of light undergoes 2 reflections in the element, and the second beam of light undergoes 3 or 5 reflections in the element.
优选地,所述元件的光束入射端和光束射出端均为直角结构。Preferably, the light beam incident end and the light beam exit end of the element both have a right-angle structure.
优选地,所述元件对应所述第一束光一侧的棱镜面数比第一束光的反射次数大2,所述元件对应所述第二束光一侧的棱镜面数与第二束光的反射次数相同,所述元件两侧的棱镜分布沿中间分光平面的中心法线对称。Preferably, the number of prism faces on the side of the element corresponding to the first light beam is 2 greater than the number of reflections of the first light beam, and the number of prism faces on the side corresponding to the second light beam of the element is equal to the number of reflection times of the second light beam. The number of reflections is the same, and the distribution of prisms on both sides of the element is symmetrical along the central normal of the middle beam splitting plane.
优选地,所述元件对应所述第一束光一侧的棱镜面数为4个,即镜面A1、镜面A2、镜面A3、镜面A4,所述镜面A1与镜面A2的夹角、镜面A3与镜面A4的夹角均为154~160°,所述镜面A2与镜面A3的夹角为132~138°。Preferably, the number of prism faces on the side of the element corresponding to the first beam of light is four, that is, mirror A1, mirror A2, mirror A3, and mirror A4, the angle between the mirror A1 and the mirror A2, the angle between the mirror A3 and the mirror The included angles of A4 are both 154° to 160°, and the included angles between the mirror surface A2 and the mirror surface A3 are 132° to 138°.
优选地,所述元件对应所述第二束光一侧的棱镜面数为3个,即镜面B1、镜面B2、镜面B3,所述镜面B1与镜面B2的夹角、镜面B2与镜面B3的夹角均为132~138°。Preferably, the number of prism faces on the side of the element corresponding to the second beam of light is three, that is, mirror B1, mirror B2, and mirror B3, the angle between mirror B1 and mirror B2, and the angle between mirror B2 and mirror B3 The angles are all 132-138°.
优选地,所述元件对应所述第二束光一侧的棱镜面数为5个,即镜面B1、镜面B2、镜面B3、镜面B4、镜面B5,所述镜面B1与镜面B2的夹角、镜面B4与镜面B5的夹角均为162~168°,所述镜面B2与镜面B3的夹角、镜面B3与镜面B4的夹角均为147~153°。Preferably, the number of prism faces on the side of the element corresponding to the second beam of light is five, namely mirror B1, mirror B2, mirror B3, mirror B4, mirror B5, the angle between the mirror B1 and mirror B2, the mirror surface The included angles between B4 and the mirror surface B5 are both 162° to 168°, and the included angles between the mirror surface B2 and the mirror surface B3, and the included angles between the mirror surface B3 and the mirror surface B4 are both 147° to 153°.
一种矢量光场生成装置,包括上述单元件分束合束干涉仪。A vector light field generating device includes the above-mentioned single-element beam splitting and combining interferometer.
一种涡旋光场拓扑荷测量装置,包括上述单元件分束合束干涉仪。A vortex light field topological charge measuring device includes the above-mentioned single-element beam splitting and combining interferometer.
本发明所获得的有益技术效果:Beneficial technical effect that the present invention obtains:
1)本发明解决了现有干涉仪由多个元件组成,相当复杂,稳定性不足等问题,本发明通过反射次数奇偶性不同能够在元件内同时实现分束和合束,具有紧凑稳定、高度集成化、高效率、耐受大功率等优势,在许多应用场景可以替代传统的多元件构成的干涉仪,例如,但不限于在矢量光场生成、涡旋光束拓扑荷测量、量子光学逻辑门等方面具有广泛潜在应用。1) The present invention solves the problems that the existing interferometer is composed of multiple components, which is quite complicated and lacks stability. The present invention can realize beam splitting and beam combining in the components at the same time through different parity of the number of reflections, and has the advantages of compactness, stability and high integration It can replace traditional multi-element interferometers in many application scenarios, such as, but not limited to, vector light field generation, vortex beam topological charge measurement, quantum optical logic gates, etc. has wide potential applications.
2)本发明元件内部分束的两路光经历的反射次数奇偶性不同,在例如涡旋光束入射等应用中,可以实现内部分出的两束涡旋光拓扑荷互相相反(轨道角动量态正交)后合束,在涉及到涡旋光的许多光学测量和量子光学应用中,可以替代传统多元件构成的干涉光路,实现光路的超级紧凑和极高的稳定性。2) The parity of the number of reflections experienced by the two beams of light in the component of the present invention is different. In applications such as the incidence of vortex beams, the topological charges of the two beams of vortex lights that are internally split can be opposite to each other (the orbital angular momentum state is positive). In many optical measurements and quantum optics applications involving vortex light, it can replace the traditional multi-element interference optical path to achieve ultra-compact and extremely high stability of the optical path.
3)本发明光束入射后,首先遇到元件内部的分光平面(该分光平面可以设计加工为偏振分光平面或者非偏振分光平面),该平面将光束分为两路,这两路光在元件内分别经历奇数次和偶数次反射,最后再经过元件内的分光平面合束,两路光干涉重新合到一起。3) After the light beam of the present invention is incident, it first encounters the beam-splitting plane inside the element (the beam-splitting plane can be designed and processed as a polarized beam-splitting plane or a non-polarized beam-splitting plane), which divides the beam into two paths, and the two paths of light are in the element. After experiencing odd and even times of reflection respectively, and finally passing through the beam splitting plane in the component, the two paths of light are interfered and recombined together.
4)本发明光束的反射既可以通过全内反射实现,也可以通过介质膜等其他反射方法实现;分光平面既可以设计加工为偏振分光平面,即将光分为正交偏振分量,也可以为普通分光平面,即对偏振不敏感,此外,分光平面的两路分光比也可以灵活设计加工。4) The reflection of the light beam of the present invention can be realized by total internal reflection, and can also be realized by other reflection methods such as a dielectric film; the beam splitting plane can be designed and processed as a polarization beam splitting plane, that is, the light is divided into orthogonal polarization components, or it can be ordinary The beam splitting plane is insensitive to polarization. In addition, the two-way splitting ratio of the beam splitting plane can also be flexibly designed and processed.
上述说明仅是本申请技术方案的概述,为了能够更清楚了解本申请的技术手段,从而可依照说明书的内容予以实施,并且为了让本申请的上述和其他目的、特征和优点能够更明显易懂,以下以本申请的较佳实施例并配合附图详细说明如后。The above description is only an overview of the technical solution of the present application. In order to understand the technical means of the present application more clearly, it can be implemented according to the contents of the description, and in order to make the above and other purposes, features and advantages of the present application more obvious and understandable , the preferred embodiments of the application and accompanying drawings are described in detail below.
根据下文结合附图对本申请具体实施例的详细描述,本领域技术人员将会更加明了本申请的上述及其他目的、优点和特征。According to the following detailed description of specific embodiments of the application in conjunction with the accompanying drawings, those skilled in the art will be more aware of the above and other objectives, advantages and features of the application.
附图说明Description of drawings
为了更清楚地说明本申请实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。在所有附图中,类似的元件或部分一般由类似的附图标记标识。附图中,各元件或部分并不一定按照实际的比例绘制。In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are For some embodiments of the present application, those of ordinary skill in the art can also obtain other drawings based on these drawings without creative effort. Throughout the drawings, similar elements or parts are generally identified by similar reference numerals. In the drawings, elements or parts are not necessarily drawn in actual scale.
图1是本公开一种实施例中单元件分束合束干涉仪的结构示意图;FIG. 1 is a schematic structural diagram of a single-element beam splitting and combining interferometer in an embodiment of the present disclosure;
图2是本公开一种实施例中单元件分束合束干涉仪的光路图;Fig. 2 is an optical path diagram of a single-element beam splitting and combining interferometer in an embodiment of the present disclosure;
图3是本公开另一种实施例中单元件分束合束干涉仪的结构示意图;3 is a schematic structural diagram of a single-element beam splitting and combining interferometer in another embodiment of the present disclosure;
图4是本公开另一种实施例中单元件分束合束干涉仪的光路图;4 is an optical path diagram of a single-element beam splitting and combining interferometer in another embodiment of the present disclosure;
图5是本公开一种实施例中矢量光场生成装置的结构示意图;5 is a schematic structural diagram of a vector light field generating device in an embodiment of the present disclosure;
图6是基于图5矢量光场生成装置生成的局域线偏振矢量光场。FIG. 6 is a local linearly polarized vector light field generated based on the vector light field generation device in FIG. 5 .
图7是基于图5矢量光场生成装置生成的杂化偏振矢量光场。FIG. 7 is a hybrid polarization vector light field generated based on the vector light field generation device in FIG. 5 .
图8是基于图5矢量光场生成装置生成的高阶庞加莱球矢量光场。FIG. 8 is a high-order Poincaré sphere vector light field generated based on the vector light field generating device in FIG. 5 .
图9是利用本发明测量涡旋光场拓扑荷的示例结果。Fig. 9 is an example result of measuring the topological charge of the vortex light field by using the present invention.
在以上附图中:100、第一束光;110、镜面A1;120、镜面A2;130、镜面A3;140、镜面A4;200、第二束光;210、镜面B1;220、镜面B2;230、镜面B3;240、镜面B4;250、镜面B5;300、分光平面;400、入射端;500、射出端;600、1/2波片;700、波片;800、检偏器。In the above drawings: 100, the first beam of light; 110, the mirror A1; 120, the mirror A2; 130, the mirror A3; 140, the mirror A4; 200, the second beam of light; 210, the mirror B1; 220, the mirror B2; 230, mirror surface B3; 240, mirror surface B4; 250, mirror surface B5; 300, beam splitting plane; 400, incident end; 500, emission end; 600, 1/2 wave plate; 700, wave plate; 800, analyzer.
具体实施方式detailed description
为使本申请实施例的目的、技术方案和优点更加清楚,下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本申请一部分实施例,而不是全部的实施例。在下面的描述中,提供诸如具体的配置和组件的特定细节仅仅是为了帮助全面理解本申请的实施例。因此,本领域技术人员应该清楚,可以对这里描述的实施例进行各种改变和修改而不脱离本申请的范围和精神。另外,为了清楚和简洁,实施例中省略了对已知功能和构造的描述。In order to make the purposes, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments It is a part of the embodiments of this application, not all of them. In the following description, specific details, such as specific configurations and components, are provided merely to help a comprehensive understanding of the embodiments of the present application. Accordingly, those of ordinary skill in the art should recognize that various changes and modifications of the embodiments described herein can be made without departing from the scope and spirit of the application. Also, descriptions of well-known functions and constructions are omitted in the embodiments for clarity and conciseness.
应该理解,说明书通篇中提到的“一个实施例”或“本实施例”意味着与实施例有关的特定特征、结构或特性包括在本申请的至少一个实施例中。因此,在整个说明书各处出现的“一个实施例”或“本实施例”未必一定指相同的实施例。此外,这些特定的特征、结构或特性可以任意适合的方式结合在一个或多个实施例中。It should be understood that references to "one embodiment" or "the present embodiment" throughout the specification mean that a particular feature, structure or characteristic related to the embodiment is included in at least one embodiment of the present application. Thus, appearances of "one embodiment" or "the present embodiment" in various places throughout the specification do not necessarily refer to the same embodiment. Furthermore, the particular features, structures or characteristics may be combined in any suitable manner in one or more embodiments.
此外,本申请可以在不同例子中重复参考数字和/或字母。这种重复是为了简化和清楚的目的,其本身并不指示所讨论各种实施例和/或设置之间的关系。Furthermore, the application may repeat reference numbers and/or letters in different instances. This repetition is for the purposes of simplicity and clarity and does not in itself indicate a relationship between the various embodiments and/or arrangements discussed.
本文中术语“和/或”,仅仅是一种描述关联对象的关联关系,表示可以存在三种关系,例如,A和/或B,可以表示:单独存在A,单独存在B,同时存在A和B三种情况,本文中术语“/和”是描述另一种关联对象关系,表示可以存在两种关系,例如,A/和B,可以表示:单独存在A,单独存在A和B两种情况,另外,本文中字符“/”,一般表示前后关联对象是一种“或”关系。The term "and/or" in this article is just an association relationship describing associated objects, which means that there may be three relationships, for example, A and/or B, which can mean: A exists alone, B exists alone, and A and B exist simultaneously. In the three cases of B, the term "/and" in this article is to describe another associated object relationship, which means that there can be two relationships, for example, A/ and B, which can mean: there is A alone, and there are two cases of A and B alone , In addition, the character "/" in this article generally indicates that the contextual objects are an "or" relationship.
本文中术语“至少一种”,仅仅是一种描述关联对象的关联关系,表示可以存在三种关系,例如,A和B的至少一种,可以表示:单独存在A,同时存在A和B,单独存在B这三种情况。The term "at least one" in this article is just an association relationship describing associated objects, which means that there can be three relationships, for example, at least one of A and B can mean: A exists alone, A and B exist simultaneously, There are three cases of B alone.
还需要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含。It should also be noted that in this article, relational terms such as first and second etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that these entities or operations Any such actual relationship or order exists between. Moreover, the terms "comprises", "comprises" or any other variation thereof are intended to cover a non-exclusive inclusion.
实施例1Example 1
一种单元件分束合束干涉仪,包括元件,光束进入元件后分为两束光,即第一束光100和第二束光200,所述第一束光100和第二束光200在元件内分别经过偶数次和奇数次反射,反射后两束光在元件内重新合束,最终从元件合束射出。A single-element beam-splitting and combining interferometer, including elements, a light beam is divided into two beams after entering the element, that is, a first beam of
所述元件包括分光平面300,所述分光平面300为偏振分光平面300,即将光分为正交偏振分量。The element includes a beam-splitting
可替代的,所述分光平面300为非偏振分光平面,为普通分光平面,即对偏振不敏感。Alternatively, the light-splitting
所述分光平面300将光束分为两路光,即第一束光100和第二束光200,这两路光在元件内分别经历奇数次和偶数次反射,最后再经过所述分光平面300合束,两路光干涉重新合到一起。光束的反射既可以通过全内反射实现,也可以通过介质膜等其他反射方法实现。The
进一步的,所述分光平面300的两路分光比也可以灵活设计加工。Further, the two-way splitting ratio of the splitting
所述元件对应所述第一束光100一侧的棱镜面数比第一束光100的反射次数大2,所述元件对应所述第二束光200一侧的棱镜面数与第二束光200的反射次数相同,所述元件两侧的棱镜分布沿中间分光平面300的中心法线对称。The number of prism surfaces on the side of the element corresponding to the first beam of
所述元件的光束入射端400和光束射出端500均为直角结构。Both the light
如附图1-2所示,所述第一束光100在元件内经过2次反射,所述第二束光200在元件内经过3次反射(含2次分光平面300的反射和1次元件侧边的反射),最终从元件合束射出。As shown in Figure 1-2, the first beam of
所述元件对应所述第一束光100一侧的棱镜面数为4个,即镜面A1110、镜面A2120、镜面A3130、镜面A4140,所述镜面A1110与镜面A2120的夹角、镜面A3130与镜面A4140的夹角均为154~160°,所述镜面A2120与镜面A3130的夹角为132~138°。The number of prism surfaces on the side of the element corresponding to the first beam of
优选地,所述镜面A1110与镜面A2120的夹角、镜面A3130与镜面A4140的夹角均为157.5°,所述镜面A2120与镜面A3130的夹角为135°。Preferably, the included angle between the mirror A1110 and the mirror A2120, the included angle between the mirror A3130 and the mirror A4140 are both 157.5°, and the included angle between the mirror A2120 and the mirror A3130 is 135°.
所述元件对应所述第二束光200一侧的棱镜面数为3个,即镜面B1210、镜面B2220、镜面B3230,所述镜面B1210与镜面B2220的夹角、镜面B2220与镜面B3230的夹角均为132~138°。The number of prism faces on the side of the element corresponding to the second beam of
优选地,所述镜面B1210与镜面B2220的夹角、镜面B2220与镜面B3230的夹角均为135°。Preferably, the included angle between the mirror B1210 and the mirror B2220, and the included angle between the mirror B2220 and the mirror B3230 are both 135°.
实施例2Example 2
基于上述实施例1,相同之处不再赘述,所不同之处在于,如附图3-4所示,所述第一束光100在元件内经过2次反射,所述第二束光200在元件内经过5次反射(含2次分光平面300反射和3次元件侧边的反射),最终从元件合束射出。Based on the above-mentioned
所述元件对应所述第一束光100一侧的棱镜面数为4个,即镜面A1110、镜面A2120、镜面A3130、镜面A4140,所述镜面A1110与镜面A2120的夹角、镜面A3130与镜面A4140的夹角均为154~160°,所述镜面A2120与镜面A3130的夹角为132~138°。The number of prism surfaces on the side of the element corresponding to the first beam of
优选地,所述镜面A1110与镜面A2120的夹角、镜面A3130与镜面A4140的夹角均为157.5°,所述镜面A2120与镜面A3130的夹角为135°。Preferably, the included angle between the mirror A1110 and the mirror A2120, the included angle between the mirror A3130 and the mirror A4140 are both 157.5°, and the included angle between the mirror A2120 and the mirror A3130 is 135°.
所述元件对应所述第二束光200一侧的棱镜面数为5个,即镜面B1210、镜面B2220、镜面B3230、镜面B4240、镜面B5250,所述镜面B1210与镜面B2220的夹角、镜面B4240与镜面B5250的夹角均为162~168°,所述镜面B2220与镜面B3230的夹角、镜面B3230与镜面B4240的夹角均为147~153°。The number of prism surfaces of the element corresponding to the side of the second beam of
优选地,所述镜面B1210与镜面B2220的夹角、镜面B4240与镜面B5250的夹角均为165°,所述镜面B2220与镜面B3230的夹角、镜面B3230与镜面B4240的夹角均为150°。Preferably, the angle between the mirror surface B1210 and the mirror surface B2220, the angle between the mirror surface B4240 and the mirror surface B5250 are all 165°, the angle between the mirror surface B2220 and the mirror surface B3230, and the angle between the mirror surface B3230 and the mirror surface B4240 are all 150° .
需要说明的是,本发明中的两束光在元件内经过偶数次和奇数次反射不限于2次和3次,2次和5次,可以为其他奇偶组合,例如,4次和7次,4次和9次等。It should be noted that the two beams of light in the present invention are not limited to 2 and 3, 2 and 5 reflections in the element through even and odd reflections, and can be other odd and even combinations, for example, 4 and 7 times, 4 times and 9 times etc.
上述单元件分束合束干涉仪在一个元件内实现分束、干涉、合束,且元件内的两束光经过的反射次数奇偶性不同,是集成的正交偏振或者同偏振单元件干涉仪,具有多种广泛应用。The above-mentioned single-element beam splitting and combining interferometer realizes beam splitting, interference, and beam combining in one element, and the parity of the reflection times of the two beams of light in the element is different. It is an integrated orthogonal polarization or same polarization single element interferometer , has a wide variety of applications.
上述单元件分束合束干涉仪中两路光反射次数奇偶性不同,因此,当涡旋光束入射到元件时,在该元件内部,分为两束光,其中,一束光经过偶数次反射,涡旋拓扑荷保持不变,另一束光经过奇数次反射,涡旋拓扑荷相反。两束携带相反拓扑荷的光束在元件内部重新合束后出射,当分光平面300设计为偏振分光面时,两束分别为水平偏振态和竖直偏振态,因此,在出射前的合束会是正交线偏振基矢的携带相反拓扑荷涡旋光束的合成,自然形成矢量光束输出。In the above-mentioned single-element beam-splitting and combining interferometer, the parity of the two light reflections is different. Therefore, when the vortex beam is incident on the element, it is divided into two beams inside the element, of which one beam is reflected by an even number of times. , the topological charge of the vortex remains unchanged, and the other beam of light undergoes an odd number of reflections, and the topological charge of the vortex is opposite. Two beams carrying opposite topological charges are recombined inside the element before exiting. When the beam-splitting
实施例3Example 3
基于上述实施例2,构建紧凑的矢量光场生成装置,如图5所示,在偏振干涉棱镜前放置1/2波片600,当水平偏振涡旋光束入射至该1/2波片600后,偏振方向被旋转至2θ,根据马吕斯定律,在该光束进入实施例2中单元件分束合束干涉仪后,若分光平面300为偏振分光,则在内部分为的两束光的强度比例为:cos22θsin22θ,此外,在元件(偏振干涉棱镜)的出射端可以放置或者不放置1/4波片,若放置1/4波片,且光轴方向调节至45°时,两个光束分量合束出射后分别被调制为左右旋圆偏振光,此时,两个携带相反拓扑荷的左右旋圆偏振光叠加后可以生成局域线偏振矢量光场,倘若在出射端额外加入类巴比涅相位延迟器,改变水平和竖直偏振分量间的位相差,则通过调节两个合成基矢间的位相差,改变生成矢量光场的种类。Based on the above-mentioned embodiment 2, construct a compact vector light field generating device, as shown in Figure 5, place a 1/2
图6给出了利用实施例2中单元件分束合束干涉仪及图5的光路生成的局域线偏振矢量光场。其中,第一行为不经过检偏器800的出射光斑,第二至五行分别为经过水平、竖直、45°、-45°检偏器800之后的光斑图样。第一列为检偏器800方向,第二列为径向偏振矢量场,第三列为旋向矢量光场,第四列为拓扑荷为3的涡旋光束经过图5装置后的出射矢量光场,第五列为拓扑荷为5的涡旋光束经过图5装置后生成的矢量光场。FIG. 6 shows the local linear polarization vector light field generated by using the single-element beam splitting and combining interferometer in Embodiment 2 and the optical path in FIG. 5 . Wherein, the first row is the exit light spot that does not pass through the
在一个实施例中,如果图5中的波片(WP)700为1/2波片600或者去掉该波片时,出射的光束基矢分别为+45°和-45°线偏振基矢,则得到的矢量光场表达式:其本质是一类杂化矢量光场,即椭偏率沿旋向角度变化的矢量光场,为了表征各点椭偏度及长轴取向,完全标定偏振态空间分布,图7测量给出了Stokes参量的空间分布。图7中前两行的杂化场具有始终为0的Stokes参量之一:S2=0。第三行表示椭圆偏振基矢合成的杂化矢量场,椭圆偏振基矢的实现通过将WP处放置1/4波片且旋转其角度实现。第四行杂化场为入射涡旋拓扑荷为3的情况。In one embodiment, if the wave plate (WP) 700 in FIG. 5 is a 1/2
实施例4Example 4
基于上述实施例3,生成高阶庞加莱球矢量场,高阶庞加莱球特点为椭偏率空间均匀,仅长轴取向空间变化。具体生成的操作方法为通过旋转入射端400的1/2波片600,来改变入射光偏振方向,进而改变元件内两束光的光强比例,出射端得到非等光强合成的矢量光场。此时,当元件(棱镜)后放置的1/4波片快轴取向为45°时,其后出射端表达式:其中和为左右旋圆偏振基矢,而a,b则为相对强度,基于这一原理和光路配置,生成了图8中第1,2,4行所示的以左右旋圆偏振基矢的高阶庞加莱球矢量场,其中,第4行为入射涡旋拓扑荷为5的情况。倘若元件(棱镜)后的1/4波片的快轴非45°方向,则可以生成以椭圆偏振为基矢的非等光强相反拓扑荷涡旋场的叠加,叠加后输出端出射场为类似图8第3行所示的矢量场结果。Based on the above-mentioned
实施例5Example 5
基于上述实施例2,用作涡旋光场拓扑荷的测量,例如,携带任意拓扑荷m的涡旋光束入射到本单元件分束合束干涉仪中,利用图5的光路,经过检偏后,可以得到花瓣形状的光斑,且经过分析,其中亮花瓣的数目总等于入射涡旋光场拓扑荷绝对值的2倍,因此,通过数花瓣数量,即可测得涡旋光场的拓扑荷绝对值。为了进一步判断涡旋光场拓扑荷的正负,可以在一次测量后,在入射端400加入一个拓扑荷为1的涡旋位相板,并进行2次测量,如果花瓣数量相较第一次测量结果增加,则说明待测涡旋光场拓扑荷为正数,反之,则为负数。二次测量中,额外加入的涡旋位相板的拓扑荷未必一定是1,也可以是其他任意值。Based on the above-mentioned embodiment 2, it is used as the measurement of the topological charge of the vortex light field. For example, the vortex beam carrying any topological charge m is incident on the beam-splitting and combining interferometer of this single element, and the optical path of FIG. 5 is used to analyze the polarization. , the petal-shaped light spot can be obtained, and after analysis, the number of bright petals is always equal to twice the absolute value of the topological charge of the incident vortex light field. Therefore, the absolute value of the topological charge of the vortex light field can be measured by counting the number of petals . In order to further judge whether the topological charge of the vortex light field is positive or negative, a vortex phase plate with a topological charge of 1 can be added to the
图9给出了测量拓扑荷的实例,第1、2列分别表示直接用检偏器800检测后的出射光斑和经过检偏器800以及透镜聚焦后焦面附近的光斑,第3、4列分别表示加入额外拓扑荷为1的涡旋位相板之后二次测量,得到的检偏后光斑图和焦面附近的焦场图。而从上到下,每一行表示一个拓扑荷涡旋场的测量结果,拓扑荷分别为:+4,-4,+32,-32,+64,+65。通过数前两列的花瓣数,可以得到花瓣分别自上而下每行分别为:8,8,64,64,128,130。在加入拓扑荷为+1的涡旋位相板,进行二次测量后,得到后两列的光斑图样,数得花瓣数分别为10,6,66,62,130,132,由这两次的测量结果,可以完全确定涡旋拓扑荷为:+4,-4,+32,-32,+64,+65。Figure 9 shows an example of the measurement of topological charges.
上述实例证明单元件分束合束干涉仪可以精确完全测量光学涡旋的拓扑荷。此外,本实例中仅使用了分光平面300为偏振分光片面的结构,倘若使用另一种结构:即内部分光平面300为偏振无关的分光面,则在测量拓扑荷时,可以省掉波片和检偏器800,更加简洁地测量涡旋光束拓扑荷。The above examples prove that the single-element beam splitting and combining interferometer can accurately and completely measure the topological charge of the optical vortex. In addition, in this example, only the structure in which the beam-splitting
以上所述仅为本发明的优选实施例而已,其并非因此限制本发明的保护范围,对于本领域的技术人员来说,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,通过常规的替代或者能够实现相同的功能在不脱离本发明的原理和精神的情况下对这些实施例进行变化、修改、替换、整合和参数变更均落入本发明的保护范围内。The above descriptions are only preferred embodiments of the present invention, which do not limit the protection scope of the present invention. For those skilled in the art, the present invention may have various modifications and changes. Within the spirit and principles of the present invention, changes, modifications, substitutions, integrations and parameter changes of these embodiments without departing from the principles and spirit of the present invention by conventional substitutions or capable of achieving the same function fall within the scope of the present invention. Into the protection scope of the present invention.
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