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CN112349683B - A four-layer wiring LCP package substrate, manufacturing method and multi-chip system-in-package structure - Google Patents

A four-layer wiring LCP package substrate, manufacturing method and multi-chip system-in-package structure Download PDF

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CN112349683B
CN112349683B CN202011038715.8A CN202011038715A CN112349683B CN 112349683 B CN112349683 B CN 112349683B CN 202011038715 A CN202011038715 A CN 202011038715A CN 112349683 B CN112349683 B CN 112349683B
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lcp
metal circuit
substrate
circuit layer
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CN112349683A (en
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戴广乾
陶霞
高阳
罗洁
笪余生
曾策
舒攀林
马宁
林玉敏
徐榕青
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CETC 29 Research Institute
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49894Materials of the insulating layers or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4853Connection or disconnection of other leads to or from a metallisation, e.g. pins, wires, bumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76895Local interconnects; Local pads, as exemplified by patent document EP0896365
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49838Geometry or layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5386Geometry or layout of the interconnection structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/552Protection against radiation, e.g. light or electromagnetic waves
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

The invention discloses a four-layer wiring LCP packaging substrate, a manufacturing method and a multi-chip system-level packaging structure, wherein the LCP packaging substrate comprises 4 graphical metal circuit layers distributed from the surface to the bottom surface, namely a first graphical metal circuit layer, a second graphical metal circuit layer, a third graphical metal circuit layer and a fourth graphical metal circuit layer in sequence; at least one edge of the outermost periphery of the first layer of patterned metal circuit layer is distributed with pads or patterns for external secondary cascade I/O welding; the insulating medium layer is positioned between the adjacent graphical metal circuit layers; the plurality of blind grooves are positioned in the insulating medium layer and have openings facing the first patterned metal circuit layer; and the plurality of blind holes penetrate through and are connected with the adjacent patterned metal circuit layers. The LCP packaging substrate with the airtight packaging structure can meet the system-level packaging requirements of multiple chips, high airtight requirements, high electromagnetic shielding and high reliable interconnection.

Description

一种四层布线LCP封装基板、制造方法及多芯片系统级封装 结构A four-layer wiring LCP package substrate, manufacturing method and multi-chip system-in-package structure

技术领域technical field

本发明涉及集成电路、芯片封装技术领域,尤其是一种四层布线LCP封装基板、制造方法及多芯片系统级封装结构,用于面向射频、微波、毫米波等高频应用的高可靠系统级封装。The invention relates to the technical field of integrated circuits and chip packaging, in particular to a four-layer wiring LCP packaging substrate, a manufacturing method and a multi-chip system-level packaging structure, which are used for high-reliability system-level applications for radio frequency, microwave, millimeter wave and other high-frequency applications package.

背景技术Background technique

随着半导体及集成电路技术进步,系统集成要求进一步提升,当前的电子电路设计和制造,都朝着尺寸更小、集成密度更高方向发展,相当大的工作都在多芯片封装领域进行。在先进的封装形式中,通过SIP技术,将多个射频(RF)芯片、数字集成电路(IC)芯片、微小型片式元器件等,组装在封装基板上,然后集成于一个封装体中。这种多芯片的封装形式,缩短了芯片之间的引脚距离,大大提高了封装密度,一定程度可以满足系统级封装的需求。With the advancement of semiconductor and integrated circuit technology, the requirements for system integration have been further improved. The current electronic circuit design and manufacturing are developing towards smaller size and higher integration density. A considerable amount of work is carried out in the field of multi-chip packaging. In advanced packaging forms, through SIP technology, multiple radio frequency (RF) chips, digital integrated circuit (IC) chips, micro-miniature chip components, etc. are assembled on the packaging substrate, and then integrated into a package body. This multi-chip packaging form shortens the pin distance between chips, greatly improves the packaging density, and can meet the needs of system-level packaging to a certain extent.

根据封装基板材料的不同,封装方式通常又可分为两种:一种是采用具有空腔结构的多层陶瓷封装,另一种是采用多层PCB基板作为芯片衬底材料的塑料封装。According to the different packaging substrate materials, packaging methods can usually be divided into two types: one is a multi-layer ceramic packaging with a cavity structure, and the other is a plastic packaging using a multi-layer PCB substrate as the chip substrate material.

陶瓷封装基板具有高集成密度、高可靠性、高气密性、高热导率、优良的耐腐蚀性等优点。但受制于陶瓷材料与PCB电路板材料的热失配,无法进行大尺寸的封装,同时陶瓷封装存在制造成本极高的问题。Ceramic packaging substrates have the advantages of high integration density, high reliability, high air tightness, high thermal conductivity, and excellent corrosion resistance. However, due to the thermal mismatch between ceramic materials and PCB circuit board materials, large-scale packaging cannot be performed, and ceramic packaging has the problem of extremely high manufacturing costs.

塑料封装基板具有成本低,工艺相对简单,互联密度较高的特点,且可通过BGA等形式,实现与PCB母板的二次高密度互联。其最大不足是普通PCB材料吸湿率高、阻挡水汽性能较差,无法做到气密封装;同时受限一般树脂材料的介电特性(介电常数、介质损耗),无法应用于射频/微波传输。这些不足限制了塑料封装在高可靠、高性能芯片封装中的应用,目前其主要应用领域是消费类电子。The plastic packaging substrate has the characteristics of low cost, relatively simple process and high interconnection density, and can realize secondary high-density interconnection with the PCB motherboard through BGA and other forms. Its biggest disadvantage is that ordinary PCB materials have high moisture absorption rate and poor water vapor blocking performance, so they cannot be airtightly packaged; at the same time, due to the limited dielectric properties (dielectric constant, dielectric loss) of general resin materials, they cannot be applied to radio frequency/microwave transmission. . These deficiencies limit the application of plastic packaging in high-reliability, high-performance chip packaging, and its main application field is consumer electronics.

液晶聚合物(LCP)材料,由于具有优异的介电传输特性,极低的吸湿率、透水性和氧透过率,与铜匹配的平面热膨胀系数,高的耐热性和耐化学腐蚀性等突出优点,契合了射频/微波芯片对封装基板材料的严苛要求,是高可靠、高性能芯片封装应用领域潜力巨大、应用前景广阔的新一代基板材料。Liquid crystal polymer (LCP) material, due to its excellent dielectric transmission properties, extremely low moisture absorption rate, water permeability and oxygen permeability, in-plane thermal expansion coefficient matching copper, high heat resistance and chemical resistance, etc. The outstanding advantages meet the strict requirements of RF/microwave chips for packaging substrate materials. It is a new generation of substrate materials with great potential and broad application prospects in the field of high reliability and high performance chip packaging.

液晶聚合物(LCP)材料,由于具有优异的介电传输特性,极低的吸湿率、透水性和氧透过率,与铜匹配的平面热膨胀系数,高的耐热性和耐化学腐蚀性等突出优点,契合了射频/微波芯片对封装基板材料的严苛要求,是高可靠、高性能芯片封装应用领域潜力巨大、应用前景广阔的新一代基板材料。Liquid crystal polymer (LCP) material, due to its excellent dielectric transmission properties, extremely low moisture absorption rate, water permeability and oxygen permeability, in-plane thermal expansion coefficient matching copper, high heat resistance and chemical resistance, etc. The outstanding advantages meet the strict requirements of RF/microwave chips for packaging substrate materials. It is a new generation of substrate materials with great potential and broad application prospects in the field of high reliability and high performance chip packaging.

中国专利CN106486427A、CN206259334U,公开了一种基于LCP基板的封装外壳及制备方法,以LCP基板作为芯片安装的衬底层,辅以芯片组装、金属围框、盖板焊接等技术,提供一个芯片气密封装的解决方案。该封装形式中,没有给出作为封装基板的具体结构和制造方法;其封装形式缺少对外互联接口,无法实现封装体的二次级联;LCP基板不具备电路分区特征,无法为多芯片复杂系统提供的良好电磁屏蔽基础,电路串扰问题难以规避。Chinese patents CN106486427A and CN206259334U disclose a packaging shell based on an LCP substrate and a preparation method. The LCP substrate is used as the substrate layer for chip mounting, supplemented by technologies such as chip assembly, metal enclosure, cover plate welding, etc., to provide a chip hermetic seal installed solution. In this packaging form, the specific structure and manufacturing method of the packaging substrate are not given; the packaging form lacks external interconnection interfaces, and cannot realize the secondary cascade of the packaging; Provides a good electromagnetic shielding foundation, and the problem of circuit crosstalk is difficult to avoid.

中国专利CN102593077A,公开了一种液晶聚合物的封装结构,采用高熔点LCP复合盖板和低熔点LCP管壳热熔组合在一起,形成一种用于芯片气密封装的结构。该封装结构过于简单,没有涉及基板的具体结构特征和实现方法。Chinese patent CN102593077A discloses a liquid crystal polymer packaging structure, which adopts a high melting point LCP composite cover plate and a low melting point LCP tube shell to hot-melt together to form a structure for chip hermetic packaging. The package structure is too simple, and does not involve specific structural features and implementation methods of the substrate.

中国专利CN104282632B,公开了一种基于LCP基板的封装外壳及制备方法,利用LCP多层基板为载板,进行芯片的气密封装。其将LCP封装基板结构,按照表面密封层、芯片安装层、焊接层、互联层等进行划分,对各个组成结构特征进行限定,并提供了一种实现方法。在该基板结构中,线路互联层的孔,位于芯片密封区的四周,由于通孔的存在,芯片的外围是非气密的,这种基板结构,减少了基板的有效气密封装区域,对各层的线路互联设计有一定限制;其表面层定义为密封区,与内层键合层分开设计,电气互不连接或仅有接地连接,此种结构只适合单颗芯片的简单封装,不适用多芯片封装、多电磁屏蔽要求的复杂的系统级应用场合。而且,其公开的实现方法,采用的是多次叠层、热压的方式制作。LCP粘接膜材料本质是热塑性的,理论上无法进行多次层压的操作,故该结构的工艺实现实际还是非常困难、不现实的。Chinese patent CN104282632B discloses a packaging shell based on an LCP substrate and a preparation method. The LCP multi-layer substrate is used as a carrier board to carry out hermetic packaging of chips. It divides the LCP package substrate structure according to surface sealing layer, chip mounting layer, soldering layer, interconnection layer, etc., defines the structural features of each composition, and provides an implementation method. In this substrate structure, the holes of the circuit interconnection layer are located around the chip sealing area. Due to the existence of the through holes, the periphery of the chip is not airtight. This substrate structure reduces the effective airtight packaging area of the substrate. The circuit interconnection design of the layer has certain limitations; its surface layer is defined as a sealing area, which is designed separately from the inner bonding layer, and is not electrically connected to each other or only has a ground connection. This structure is only suitable for simple packaging of a single chip, not applicable Complex system-level applications with multi-chip packages and multiple electromagnetic shielding requirements. Moreover, the disclosed realization method adopts the method of multiple lamination and hot pressing. The LCP adhesive film material is thermoplastic in nature, and theoretically it is impossible to perform multiple lamination operations, so it is still very difficult and unrealistic to realize the process of this structure.

中国专利CN107324273B,公开了一种基于LCP多层堆叠技术的MEMS器件的封装方法,采用多层LCP堆叠层压方式制备MEMS器件所用的盖帽,将LCP材料直接应用于单芯片的塑料封装。在该发明中,LCP材料仅起到封装盖帽的作用,应用领域不涉及封装基板,也无法进行布线设计。Chinese patent CN107324273B discloses a packaging method for MEMS devices based on LCP multi-layer stacking technology, using multi-layer LCP stacking and lamination to prepare caps for MEMS devices, and applying LCP materials directly to single-chip plastic packaging. In this invention, the LCP material only plays the role of the package cap, the application field does not involve the package substrate, and the wiring design cannot be performed.

中国专利CN102683220B,公开了一种制作多层有机液晶聚合物基板结构的方法,可同时将有源和无源器件埋置到多层液晶聚合物基板中,实现芯片的气密封装。其利用倒装焊技术将带有凸点的有源器件连接到LCP基板上,然后对LCP粘接膜开窗,层压,最后通过金属化通孔进行互联,最终形成封装结构体。此种封装结构,采用芯片内埋基板的制造路线,主要面向单芯片封装,对高电磁屏蔽要求的多芯片封装应用不适用;基板的互联孔通过一次钻孔金属化制作完成,基板互联功能简单,无法满足多芯片封装所需的复杂互联要求。Chinese patent CN102683220B discloses a method for fabricating a multi-layer organic liquid crystal polymer substrate structure, which can simultaneously embed active and passive devices in the multi-layer liquid crystal polymer substrate to realize hermetic sealing of the chip. It uses flip-chip welding technology to connect active devices with bumps to the LCP substrate, then open the LCP adhesive film, laminate, and finally interconnect through metallized through holes to finally form a package structure. This kind of package structure adopts the manufacturing route of the substrate embedded in the chip, which is mainly for single-chip packaging, and is not suitable for multi-chip packaging applications with high electromagnetic shielding requirements; the interconnection holes of the substrate are fabricated by one-time drilling and metallization, and the interconnection function of the substrate is simple. , unable to meet the complex interconnect requirements required for multi-chip packaging.

中国专利CN106252339B,公开了一种高密度射频多芯片封装结构,采用多层基片和壳体作为载体,将多个芯片和器件以在垂直方向上堆叠进行三维高密度混合集成。该种多芯片的封装,本质是多芯片封装体形式的混合集成,电磁屏蔽性能有限,且涉及多温度梯度及焊料的选择,工艺实现性困难。Chinese patent CN106252339B discloses a high-density radio frequency multi-chip packaging structure, using a multi-layer substrate and a casing as a carrier, stacking multiple chips and devices in a vertical direction for three-dimensional high-density hybrid integration. This kind of multi-chip package is essentially a hybrid integration in the form of a multi-chip package, with limited electromagnetic shielding performance, and involves multiple temperature gradients and selection of solders, making the process difficult to implement.

中国专利CN103165479B,公开了一种多芯片系统级封装结构的制作方法,通过多芯片垂直堆叠的方式,将多个芯片集成于转接板上,形成系统封装的结构。该结构适用于IC芯片的高密度集成,但对多射频芯片的电磁屏蔽要求,则不再适用。Chinese patent CN103165479B discloses a method for manufacturing a multi-chip system-in-package structure. By vertically stacking multi-chips, multiple chips are integrated on an adapter board to form a system packaging structure. This structure is suitable for high-density integration of IC chips, but it is no longer applicable to the electromagnetic shielding requirements of multi-radio frequency chips.

中国专利CN103930989B,公开了一种射频层叠封装电路,通过两个射频封装体的垂直堆叠,形成了射频层叠封装(PoP)电路的两级封装。该种结构封装体,没有详细涉及单个封装体内芯片的电磁屏蔽问题,且基板功能简单,基板结构方面也没有具体描述。Chinese patent CN103930989B discloses a radio-frequency package-on-package circuit, which forms a two-level package of a radio-frequency package-on-package (PoP) circuit by vertically stacking two radio frequency packages. This structural package does not deal with the electromagnetic shielding problem of the chip in a single package in detail, and the function of the substrate is simple, and the structure of the substrate is not described in detail.

美国专利US2019/0080817Al,公开了一种LCP树脂多层基板的制造方法,通过特殊的LCP膏料,作为LCP多层基板粘合层和厚度调整层,可以起到提高平整度,避免缺胶引起的翘曲等制造问题。该基板结构的互联孔,采用导电浆料填充制作,由于导电浆料的粘接剂成分,高温下会有挥发造成基板起层、鼓泡甚至爆板风险,此种方式制作的基板,无法承受高温应用场合。且LCP膏料与LCP层、LCP膏料与导电浆料的附着力,理论比常规LCP粘接膜层压方法要差很多。此种方式制作的多层LCP基板,不适用高互联孔可靠性的射频芯片封装应用场合。U.S. Patent US2019/0080817Al discloses a method for manufacturing an LCP resin multilayer substrate. Using a special LCP paste as an adhesive layer and a thickness adjustment layer for an LCP multilayer substrate, it can improve the flatness and avoid the lack of glue. warping and other manufacturing issues. The interconnection holes of the substrate structure are filled with conductive paste. Due to the adhesive component of the conductive paste, there will be volatilization under high temperature, which may cause the substrate to form layers, bubbling or even the risk of explosion. The substrate produced in this way cannot withstand the High temperature applications. And the adhesion between LCP paste and LCP layer, LCP paste and conductive paste is theoretically much worse than that of conventional LCP adhesive film lamination method. The multilayer LCP substrate produced in this way is not suitable for RF chip packaging applications with high interconnection hole reliability.

然而现有已公开的技术,还没有利用LCP实现满足多芯片、高气密要求、高电磁屏蔽、高可靠互联的系统级封装要求的封装基板及系统级封装结构的技术解决方案。However, there is no technical solution for realizing the packaging substrate and the system-in-package structure that meets the system-in-package requirements of multi-chip, high air tightness, high electromagnetic shielding, and high-reliable interconnection by using LCP in the existing disclosed technologies.

发明内容SUMMARY OF THE INVENTION

本发明所要解决的技术问题是:针对上述存在的问题,提供一种四层布线LCP封装基板、制造方法及基于该基板的多芯片系统级封装结构,以满足多芯片、高气密要求、高电磁屏蔽、高可靠互联的系统级封装要求。The technical problem to be solved by the present invention is to provide a four-layer wiring LCP packaging substrate, a manufacturing method and a multi-chip system-level packaging structure based on the substrate to meet the requirements of multi-chip, high air tightness and high System-in-package requirements for electromagnetic shielding and high-reliability interconnection.

本发明提供的一种四层布线LCP封装基板,包括:A four-layer wiring LCP packaging substrate provided by the present invention includes:

从表面至底面分布的4层图形化金属线路层,依次为第一层图形化金属线路层、第二层图形化金属线路层、第三层图形化金属线路层和第四层图形化金属线路层;所述第一层图形化金属线路层的最外围至少一条边上,分布有所述LCP封装基板对外二次级联I/O焊接用焊盘或图形;The 4-layer patterned metal circuit layer distributed from the surface to the bottom surface is the first layer of patterned metal circuit layer, the second layer of patterned metal circuit layer, the third layer of patterned metal circuit layer and the fourth layer of patterned metal circuit layer. layer; at least one edge of the outermost periphery of the first layer of patterned metal circuit layer is distributed with the external secondary cascade I/O soldering pads or patterns of the LCP package substrate;

位于相邻图形化金属线路层之间的3层绝缘介质层;3 insulating dielectric layers between adjacent patterned metal circuit layers;

位于绝缘介质层中且开口朝向所述第一层图形化金属线路层的多个盲槽;a plurality of blind trenches located in the insulating dielectric layer and opening toward the first patterned metal circuit layer;

贯穿并连接相邻图形化金属线路层的多个盲孔,其中有若干盲孔分布在所述对外二次级联I/O焊接用焊盘或图形上。A plurality of blind vias running through and connecting adjacent patterned metal circuit layers, wherein several blind vias are distributed on the external secondary cascade I/O soldering pads or patterns.

进一步地,所述第一层图形化金属线路层包括在最外围的对外二次级联I/O焊接用焊盘或图形内侧的环绕金属层,以及在环绕金属层内侧的多组芯片I/O焊接及信号传输线路层,每组芯片I/O焊接及信号传输线路层的形状为矩形或异形的孤岛,且每组芯片I/O焊接及信号传输线路层经一个电绝缘区域与环绕金属层相接;该环绕金属层的电学属性为接地层、工艺属性为气密焊接层;所述第一层图形化金属线路层上表面依次设有涂覆层和上表面阻焊层;所述涂覆层覆盖所述对外二次级联I/O焊接用焊盘或图形、环绕金属层和每组芯片I/O焊接及信号传输线路层;所述上表面阻焊层包括第一环绕阻焊层和多个第二环绕阻焊层,其中,每个第二环绕阻焊层对应围绕每个电绝缘区域,所述第一环绕阻焊层围绕所有第二环绕阻焊层;Further, the first layer of patterned metal circuit layer includes a surrounding metal layer on the outermost periphery of the external secondary cascading I/O soldering pad or the inner side of the pattern, and multiple groups of chip I/O on the inner side of the surrounding metal layer. O welding and signal transmission circuit layer, the shape of each group of chip I/O welding and signal transmission circuit layer is a rectangular or special-shaped island, and each group of chip I/O welding and signal transmission circuit layer is connected to the surrounding metal through an electrical insulating area The electrical property of the surrounding metal layer is a ground layer, and the process property is an airtight soldering layer; the upper surface of the first layer of patterned metal circuit layer is sequentially provided with a coating layer and an upper surface solder resist layer; the The coating layer covers the pads or patterns for external secondary cascade I/O welding, the surrounding metal layer, and the I/O welding and signal transmission circuit layers of each group of chips; the upper surface solder resist layer includes a first surrounding resistor. a solder layer and a plurality of second surrounding solder mask layers, wherein each second surrounding solder mask layer surrounds each electrical insulating region correspondingly, and the first surrounding solder mask layer surrounds all the second surrounding solder mask layers;

每组芯片I/O焊接及信号传输线路层内,包含芯片I/O焊盘及信号传输线路,以及一个或多个盲槽;每组芯片I/O焊接及信号传输用线路层内信号的传输,通过该组芯片I/O焊接及信号传输用线路层内的芯片I/O焊盘及信号传输线路,或者经由各层盲孔及下层图形化金属线路层中对应部分共同完成;两组及以上芯片I/O焊接及信号传输层之间,以及多组芯片I/O焊接及信号传输层与对外二次级联I/O焊接用焊盘或图形之间的信号传输,由各层盲孔及下层图形化金属线路层中对应部分共同完成。Each group of chip I/O soldering and signal transmission line layers includes chip I/O pads, signal transmission lines, and one or more blind slots; The transmission is completed through the chip I/O pads and signal transmission lines in the circuit layer for chip I/O welding and signal transmission of the group, or through the blind holes of each layer and the corresponding parts in the lower patterned metal circuit layer; two groups of and the above chip I/O soldering and signal transmission layers, as well as the signal transmission between multiple groups of chip I/O soldering and signal transmission layers and the pads or patterns for external secondary cascade I/O soldering. The blind hole and the corresponding part in the lower patterned metal circuit layer are completed together.

进一步地,所述4层图形化金属线路层中,位于第二层图形化金属线路层和第三层图形化金属线路层之间绝缘介质层,由LCP基板构成;位于第一层图形化金属线路层和第二层图形化金属线路层之间,以及第三层图形化金属线路层和第四层图形化金属线路层之间的绝缘介质层,由LCP基板和LCP粘接膜构成。Further, in the four-layer patterned metal circuit layer, an insulating medium layer located between the second layer of patterned metal circuit layer and the third layer of patterned metal circuit layer is composed of an LCP substrate; located in the first layer of patterned metal circuit layer; The insulating medium layers between the circuit layer and the second patterned metal circuit layer and between the third patterned metal circuit layer and the fourth patterned metal circuit layer are composed of an LCP substrate and an LCP adhesive film.

进一步地,所述LCP粘接膜的熔点比LCP基板的熔点低10~60℃。Further, the melting point of the LCP adhesive film is 10-60° C. lower than the melting point of the LCP substrate.

进一步地,所述盲槽底部为第二层图形化金属线路层、第三层图形化金属线路层或第四层图形化金属线路层中的大面积金属接地层,并具有涂覆层;所述盲槽在第一层图形化金属线路层的开口周围是芯片I/O焊盘或图形;所述盲槽的数量、大小和深度根据安装芯片的数量、大小和高度确定。Further, the bottom of the blind groove is a large-area metal ground layer in the second layer of patterned metal circuit layers, the third layer of patterned metal circuit layers or the fourth layer of patterned metal circuit layers, and has a coating layer; The blind grooves are surrounded by chip I/O pads or patterns around the opening of the first patterned metal circuit layer; the number, size and depth of the blind grooves are determined according to the number, size and height of the mounted chips.

进一步地,所有盲孔在垂直方向上可对正或错排堆叠,用于实现4层图形化金属线路层中任意层互联要求;每个盲孔的直径大小相同,且盲孔深径比≤1,盲孔内填充实心电镀铜。Further, all blind vias can be stacked vertically or staggered to meet the interconnection requirements of any layer in the 4-layer patterned metal circuit layer; the diameter of each blind via is the same, and the blind via depth-to-diameter ratio ≤ 1. Fill the blind hole with solid electroplated copper.

本发明还提供一种四层布线LCP封装基板的制造方法,所述制造方法用于制造上述的LCP封装基板,包括如下步骤:The present invention also provides a manufacturing method of a four-layer wiring LCP packaging substrate, the manufacturing method is used to manufacture the above-mentioned LCP packaging substrate, and includes the following steps:

S1,在双面覆铜LCP基板上激光钻盲孔,用于连接第二层图形化金属线路层和第三层图形化金属线路层,盲孔深径比≤1;S1, laser drilling blind holes on the double-sided copper-clad LCP substrate to connect the second layer of patterned metal circuit layer and the third layer of patterned metal circuit layer, and the blind hole depth-diameter ratio is less than or equal to 1;

S2,盲孔金属化,形成填充实心电镀铜的盲孔;S2, blind hole metallization to form blind holes filled with solid electroplated copper;

S3,在双面覆铜LCP基板上表面和下表面制造第二层图形化金属线路层和第三层图形化金属线路层;S3, fabricating a second patterned metal circuit layer and a third patterned metal circuit layer on the upper surface and the lower surface of the double-sided copper-clad LCP substrate;

S4,取第一单面覆铜LCP基板、第二单面覆铜LCP基板、第一LCP粘接膜、第二LCP粘接膜,然后从上到下按照第一单面覆铜LCP基板、第一LCP粘接膜、S3处理后的双面覆铜LCP基板、第二LCP粘接膜、第二单面覆铜LCP基板的顺序,对位叠层后压合形成LCP多层基板;其中,第一单面覆铜LCP基板的覆铜面朝上,第二单面覆铜LCP基板的覆铜面朝下;所述第一LCP粘接膜和第二LCP粘接膜的熔点比第一单面覆铜LCP基板和第二单面覆铜LCP基板的熔点低;S4, take the first single-sided copper-clad LCP substrate, the second single-sided copper-clad LCP substrate, the first LCP adhesive film, and the second LCP adhesive film, and then follow the first single-sided copper-clad LCP substrate, The sequence of the first LCP adhesive film, the double-sided copper-clad LCP substrate processed by S3, the second LCP adhesive film, and the second single-sided copper-clad LCP substrate are aligned and laminated to form an LCP multilayer substrate; wherein , the copper-clad surface of the first single-sided copper-clad LCP substrate faces up, and the copper-clad surface of the second single-sided copper-clad LCP substrate faces down; the melting points of the first LCP adhesive film and the second LCP adhesive film are higher than the The melting point of one single-sided copper-clad LCP substrate and the second single-sided copper-clad LCP substrate is low;

S5,在LCP多层基板的第一单面覆铜LCP基板和第二单面覆铜LCP基板上激光钻盲孔,分别用于连接第一层图形化金属线路层和第二层图形化金属线路层,以及第三层图形化金属线路层和第四层图形化金属线路层,盲孔深径比≤1;S5, laser drilling blind holes on the first single-sided copper-clad LCP substrate and the second single-sided copper-clad LCP substrate of the LCP multilayer substrate, which are respectively used to connect the first layer of patterned metal circuit layer and the second layer of patterned metal The circuit layer, as well as the third layer of patterned metal circuit layer and the fourth layer of patterned metal circuit layer, the blind hole aspect ratio is less than or equal to 1;

S6,盲孔金属化,形成填充实心电镀铜的盲孔;S6, blind hole metallization to form blind holes filled with solid electroplated copper;

S7,在第一单面覆铜LCP基板的上表面制造第一层图形化金属线路层,在第二单面覆铜LCP基板的下表面制造第四层图形化金属线路层;并去除第一层图形化金属线路层中盲槽开槽区域的铜;S7, fabricating a first layer of patterned metal circuit layers on the upper surface of the first single-sided copper-clad LCP substrate, and fabricating a fourth layer of patterned metal circuit layers on the lower surface of the second single-sided copper-clad LCP substrate; and removing the first layer of patterned metal circuit layers Copper in the blind groove slotted area in the layer patterned metal circuit layer;

S8,采用激光加工手段对盲槽开槽区域进行开槽,形成安装芯片的盲槽,并对盲槽的底部和侧壁进行去污处理;S8, use laser processing to slot the blind slot slotted area to form a blind slot for mounting chips, and decontaminate the bottom and side walls of the blind slot;

S9,在第一层图形化金属线路层、第四层图形化金属线路层以及盲槽底部进行涂覆层制造,并在相应部分的涂覆层上制作上表面阻焊层后,得到LCP封装基板;S9, the coating layer is fabricated on the first layer of patterned metal circuit layer, the fourth layer of patterned metal circuit layer and the bottom of the blind groove, and the upper surface solder resist layer is formed on the corresponding part of the coating layer to obtain an LCP package substrate;

S10,若是以拼接形式经步骤S1~S9制造LCP封装基板,则对以拼接形式制造的LCP封装基板进行铣切,形成单个的LCP封装基板。S10 , if the LCP package substrate is manufactured in a spliced form through steps S1 to S9 , the LCP package substrate manufactured in the spliced form is milled to form a single LCP package substrate.

进一步地,所述盲孔深径比≤1。Further, the aspect ratio of the blind hole is less than or equal to 1.

进一步地,所述第一LCP粘接膜和第二LCP粘接膜的熔点比第一单面覆铜LCP基板和第二单面覆铜LCP基板的熔点低10~60℃。Further, the melting points of the first LCP adhesive film and the second LCP adhesive film are 10-60° C. lower than the melting points of the first single-sided copper-clad LCP substrate and the second single-sided copper-clad LCP substrate.

本发明还提供一种多芯片系统级封装结构,包括:如上述的LCP封装基板,以及芯片、金属围框和金属盖板;The present invention also provides a multi-chip system-level packaging structure, comprising: the above-mentioned LCP packaging substrate, and a chip, a metal enclosure and a metal cover;

所述多芯片系统级封装结构以导电胶粘接或焊接的方式固定于PCB母板上,以位于所述LCP封装基板上的对外二次级联I/O焊接用焊盘或图形作为该多芯片系统级封装结构对外部的二次级联I/O接口;The multi-chip system-level packaging structure is fixed on the PCB motherboard by means of conductive adhesive bonding or welding, and the external secondary cascade I/O soldering pads or patterns on the LCP packaging substrate are used as the multi-chip. Chip system-in-package structure to external secondary cascade I/O interface;

所述金属围框中分布有金属隔筋;所述金属围框和金属隔筋焊接于LCP封装基板上表面并使所述对外二次级联I/O焊接用焊盘或图形在金属围框之外,所述金属盖板焊接于金属围框和金属隔筋上,使LCP封装基板和金属盖板之间,通过金属围框和金属隔筋形成具有气密封装性能和电磁屏蔽性能的多个空腔结构;每个空腔结构中包含一个或多个盲槽;每个盲槽用于安装一个芯片,当安装的芯片无电磁屏蔽要求时,则安装在同一空腔结构中,当安装的芯片有电磁屏蔽要求时,则安装在不同空腔结构中;所述芯片通过导电胶粘接于盲槽中,并通过金丝键合的方式与所述第一层图形化金属线路层中的芯片I/O焊接及信号传输用线路层实现电气互连。The metal enclosure is distributed with metal ribs; the metal enclosure and the metal ribs are welded on the upper surface of the LCP package substrate, and the external secondary cascade I/O welding pads or patterns are placed on the metal enclosure. In addition, the metal cover plate is welded on the metal enclosure frame and the metal spacer ribs, so that between the LCP package substrate and the metal cover plate, a multi-layer structure with airtight packaging performance and electromagnetic shielding performance is formed through the metal enclosure frame and the metal spacer ribs. Each cavity structure contains one or more blind slots; each blind slot is used to install a chip, when the installed chip does not require electromagnetic shielding, it is installed in the same cavity structure, when the installation When the chip has electromagnetic shielding requirements, it is installed in different cavity structures; the chip is bonded in the blind groove by conductive glue, and is bonded with the first layer of patterned metal circuit layer by gold wire bonding. The chip I/O soldering and signal transmission use the circuit layer to achieve electrical interconnection.

综上所述,由于采用了上述技术方案,本发明的有益效果是:To sum up, due to the adoption of the above-mentioned technical solutions, the beneficial effects of the present invention are:

1.本发明的封装基板基于全LCP材料体系制造,利用了液晶聚合物(LCP)材料优异的高频传输特性、极低的吸湿和透水性和氧透过率,实现了一种用于多芯片气密封装的LCP封装基板。1. The packaging substrate of the present invention is manufactured based on an all-LCP material system, and utilizes the excellent high-frequency transmission characteristics, extremely low moisture absorption and water permeability and oxygen permeability of liquid crystal polymer (LCP) materials, and realizes a LCP package substrate for hermetically packaged chips.

2.该封装基板可实现4层图形线路的任意层互联布线,含有多个芯片安装用盲槽,配合基板表层线路的电磁兼容性和工艺兼容性设计,是一种能够满足多芯片、高电磁屏蔽、高可靠的系统级封装要求的封装基板。2. The package substrate can realize any layer interconnection wiring of 4-layer pattern circuit, and contains multiple blind slots for chip mounting. With the electromagnetic compatibility and process compatibility design of the surface layer circuit of the substrate, it is a kind of multi-chip, high electromagnetic compatibility design. Package substrate for shielded, highly reliable system-in-package requirements.

3.采用本发明的LCP封装基板实现的多芯片系统级封装结构,以导电胶粘接或焊接方式固定于PCB母板上,以位于LCP封装基板最外围的对外二次级联I/O焊接用焊盘或图形,作为该多芯片系统级封装结构对外部的二次级联I/O接口,与PCB母板兼容性良好,且封装使用简单、组装效率高,可进行大尺寸、高集成密度的系统级封装。3. The multi-chip system-level packaging structure realized by the LCP packaging substrate of the present invention is fixed on the PCB motherboard by means of conductive adhesive bonding or welding, and is welded with the external secondary cascade I/O located at the outermost periphery of the LCP packaging substrate. Using pads or graphics as the external secondary cascade I/O interface of the multi-chip system-in-package structure, it has good compatibility with the PCB motherboard, and the packaging is simple to use, with high assembly efficiency, and can be large-scale and highly integrated. density system-in-package.

附图说明Description of drawings

为了更清楚地说明本发明实施例的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,应当理解,以下附图仅示出了本发明的某些实施例,因此不应被看作是对范围的限定,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他相关的附图。In order to illustrate the technical solutions of the embodiments of the present invention more clearly, the following briefly introduces the accompanying drawings used in the embodiments. It should be understood that the following drawings only show some embodiments of the present invention, and therefore do not It should be regarded as a limitation of the scope, and for those of ordinary skill in the art, other related drawings can also be obtained according to these drawings without any creative effort.

图1为本发明实施例1的LCP封装基板结构示意图;1 is a schematic structural diagram of an LCP package substrate according to Embodiment 1 of the present invention;

其中:1-LCP封装基板;11-图形化金属线路层;111-第一层图形化金属线路层;112-第二层图形化金属线路层;113-第三层图形化金属线路层;114-第四层图形化金属线路层;12-盲槽;13-涂覆层;14-盲孔;141-第一类盲孔;142-第二类盲孔;143-第三类盲孔;15-绝缘介质层;151-LCP基板;152-LCP粘接膜;16-基板内信号传输路径;17-上表面阻焊层;1111-对外二次级联I/O焊接用焊盘或图形。Among them: 1-LCP packaging substrate; 11-patterned metal circuit layer; 111-first layer of patterned metal circuit layer; 112-second layer of patterned metal circuit layer; 113-third layer of patterned metal circuit layer; 114 -The fourth layer of patterned metal circuit layer; 12-Blind slot; 13-Coating layer; 14-Blind hole; 141-Type 1 blind hole; 142-Type 2 blind hole; 15-Insulation dielectric layer; 151-LCP substrate; 152-LCP adhesive film; 16-Signal transmission path in the substrate; 17-Solder resist layer on the upper surface; 1111- External secondary cascade I/O soldering pad or pattern .

图2为本发明实施例1的第一层图形化金属线路层结构示意图;2 is a schematic diagram of the structure of the first layer of patterned metal circuit layers according to Embodiment 1 of the present invention;

其中,21、22、23-芯片I/O焊接及信号传输用线路层;211、221、231-芯片安装盲槽位置;212、222、232-芯片I/O焊盘及信号传输线路;213、223、233-电绝缘区域;171、172、173-第二环绕阻焊层;24-环绕金属层;174-第一环绕阻焊层;16-基板内信号传输路径。Among them, 21, 22, 23 - chip I/O welding and signal transmission circuit layer; 211, 221, 231 - chip mounting blind slot position; 212, 222, 232 - chip I/O pad and signal transmission line; 213 , 223, 233—electrically insulating area; 171, 172, 173—the second surrounding solder resist layer; 24—the surrounding metal layer; 174—the first surrounding solder resist layer; 16—the signal transmission path in the substrate.

图3为本发明实施例2的LCP封装基板制造方法的流程框图。FIG. 3 is a flow chart of a method for manufacturing an LCP package substrate according to Embodiment 2 of the present invention.

图4a~4i为本发明实施例2的LCP封装基板制造方法流程中分步骤的结构示意图:4a to 4i are schematic structural diagrams of steps in the process of manufacturing a LCP package substrate according to Embodiment 2 of the present invention:

图4a为双面覆铜LCP基板激光钻盲孔后的结构示意图;Figure 4a is a schematic structural diagram of a double-sided copper-clad LCP substrate after laser drilling blind holes;

图4b为盲孔金属化得到第二类盲孔的结构示意图;Figure 4b is a schematic structural diagram of blind via metallization to obtain the second type of blind via;

图4c为制造第二层、第三层图形化金属线路层后的结构示意图;4c is a schematic structural diagram of the second layer and the third layer of patterned metal circuit layers after manufacturing;

图4d为制造LCP多层基板的对位叠层的结构示意图;4d is a schematic structural diagram of an alignment stack for manufacturing an LCP multilayer substrate;

图4e为制造LCP多层基板的层压后的结构示意图;FIG. 4e is a schematic diagram of the laminated structure of the LCP multilayer substrate;

图4f为LCP多层基板激光钻盲孔的结构示意图;FIG. 4f is a schematic structural diagram of a laser-drilled blind hole in an LCP multilayer substrate;

图4g为盲孔金属化得到第一类盲孔、第三类盲孔的结构示意图;FIG. 4g is a schematic structural diagram of blind via metallization to obtain the first type blind via and the third blind via;

图4h为制造第一层、第四层图形化金属线路层后的结构示意图;其中:121-盲槽开槽区域。FIG. 4h is a schematic view of the structure after the first and fourth layers of patterned metal circuit layers are fabricated; wherein: 121-blind slot slotting area.

图4i为制作盲槽后的结构示意图;Fig. 4i is the structural schematic diagram after making blind groove;

图4j为制作涂覆层和阻焊层后得到的LCP封装基板的结构示意图。FIG. 4j is a schematic structural diagram of the LCP package substrate obtained after the coating layer and the solder resist layer are fabricated.

图5为本发明实施例3的基于LCP封装基板的多芯片系统级封装结构的示意图;5 is a schematic diagram of a multi-chip system-in-package structure based on an LCP packaging substrate according to Embodiment 3 of the present invention;

其中:1-LCP封装基板;2-多芯片系统级封装结构;3-芯片;4-金丝;5-金属围框;51-金属隔筋;6-金属盖板;7-空腔结构;12-盲槽;16-基板内信号传输路径。Among them: 1-LCP packaging substrate; 2-Multi-chip system-level packaging structure; 3-Chip; 4-Gold wire; 5-Metal enclosure; 51-Metal ribs; 6-Metal cover plate; 7-Cavity structure; 12-blind slot; 16-signal transmission path in the substrate.

具体实施方式Detailed ways

以下结合实施例对本发明的特征和性能作进一步的详细描述。The features and performances of the present invention will be further described in detail below in conjunction with the embodiments.

实施例1Example 1

如图1所示,本实施例的一种四层布线LCP封装基板,包括:As shown in FIG. 1 , a four-layer wiring LCP packaging substrate of this embodiment includes:

从表面至底面分布的4层图形化金属线路层,依次为第一层图形化金属线路层、第二层图形化金属线路层、第三层图形化金属线路层和第四层图形化金属线路层;所述第一层图形化金属线路层的最外围至少一条边上,分布有所述LCP封装基板对外二次级联I/O焊接用焊盘或图形;The 4-layer patterned metal circuit layer distributed from the surface to the bottom surface is the first layer of patterned metal circuit layer, the second layer of patterned metal circuit layer, the third layer of patterned metal circuit layer and the fourth layer of patterned metal circuit layer. layer; at least one edge of the outermost periphery of the first layer of patterned metal circuit layer is distributed with the external secondary cascade I/O soldering pads or patterns of the LCP package substrate;

位于相邻图形化金属线路层之间的3层绝缘介质层;3 insulating dielectric layers between adjacent patterned metal circuit layers;

位于绝缘介质层中且开口朝向所述第一层图形化金属线路层的多个盲槽;a plurality of blind trenches located in the insulating dielectric layer and opening toward the first patterned metal circuit layer;

贯穿并连接相邻图形化金属线路层的多个盲孔,其中有若干盲孔分布在所述对外二次级联I/O焊接用焊盘或图形上。A plurality of blind vias running through and connecting adjacent patterned metal circuit layers, wherein several blind vias are distributed on the external secondary cascade I/O soldering pads or patterns.

1、4层图形化金属线路层:1. 4-layer patterned metal circuit layer:

如图2所示,所述第一层图形化金属线路层111包括在最外围的对外二次级联I/O焊接用焊盘或图形1111内侧的环绕金属层24,以及在环绕金属层24内侧的多组芯片I/O焊接及信号传输线路层21、22、23,每组芯片I/O焊接及信号传输线路层21、22、23经一个电绝缘区域213、223、233与环绕金属层24相接;该环绕金属层24的电学属性为接地层、工艺属性为气密焊接层;所述第一层图形化金属线路层111上表面依次设有涂覆层13和上表面阻焊层17;所述涂覆层13覆盖所述对外二次级联I/O焊接用焊盘或图形1111、环绕金属层24和每组芯片I/O焊接及信号传输线路层21、22、23;所述上表面阻焊层17包括第一环绕阻焊层174和多个第二环绕阻焊层171、172、173,其中,每个第二环绕阻焊层171、172、173对应围绕每个电绝缘区域213、223、233,所述第一环绕阻焊层174围绕所有第二环绕阻焊层171、172、173;As shown in FIG. 2 , the first layer of patterned metal circuit layer 111 includes a surrounding metal layer 24 on the outermost periphery of the external secondary cascading I/O soldering pads or the inner side of the pattern 1111 , and the surrounding metal layer 24 Multiple groups of chip I/O soldering and signal transmission line layers 21, 22, 23 on the inner side, each group of chip I/O soldering and signal transmission line layers 21, 22, 23 are connected to the surrounding metal through an electrical insulating area 213, 223, 233. The electrical property of the surrounding metal layer 24 is a ground layer, and the process property is an airtight soldering layer; the upper surface of the first layer of patterned metal circuit layer 111 is sequentially provided with a coating layer 13 and an upper surface solder resist Layer 17; the coating layer 13 covers the external secondary cascade I/O soldering pads or patterns 1111, the surrounding metal layer 24 and the I/O soldering and signal transmission circuit layers 21, 22, 23 of each group of chips ; The upper surface solder mask layer 17 includes a first surrounding solder mask layer 174 and a plurality of second surrounding solder mask layers 171, 172, 173, wherein each second surrounding solder mask layer 171, 172, 173 corresponds to surrounding each electrically insulating regions 213, 223, 233, the first surrounding solder resist layer 174 surrounds all the second surrounding solder resist layers 171, 172, 173;

每组芯片I/O焊接及信号传输线路层21、22、23内,包含芯片I/O焊盘及信号传输线路212、222、223,以及一个或多个盲槽12;每组芯片I/O焊接及信号传输用线路层21、22、23内信号的传输,通过该组芯片I/O焊接及信号传输用线路层21、22、23内的芯片I/O焊盘及信号传输线路212、222、223,或者经由各层盲孔14(141、142、143)及下层图形化金属线路层(第二层图形化金属线路层112、第三层图形化金属线路层113、第四层图形化金属线路层114)中对应部分共同完成;两组及以上芯片I/O焊接及信号传输层21、22、23之间,以及多组芯片I/O焊接及信号传输层21、22、23与对外二次级联I/O焊接用焊盘或图形1111之间的信号传输,由各层盲孔14(141、142、143)及下层图形化金属线路层(第二层图形化金属线路层112、第三层图形化金属线路层113、第四层图形化金属线路层114)中对应部分共同完成,如图2中的传输路径16。Each group of chip I/O soldering and signal transmission circuit layers 21, 22, and 23 includes chip I/O pads, signal transmission lines 212, 222, and 223, and one or more blind slots 12; The signal transmission in the circuit layers 21, 22, 23 for soldering and signal transmission passes through the chip I/O pads and signal transmission lines 212 in the circuit layers 21, 22, and 23 for chip I/O soldering and signal transmission. , 222, 223, or through each layer of blind vias 14 (141, 142, 143) and the lower patterned metal circuit layer (the second layer of patterned metal circuit layer 112, the third layer of patterned metal circuit layer 113, the fourth layer The corresponding parts in the patterned metal circuit layer 114) are jointly completed; between two or more chip I/O welding and signal transmission layers 21, 22, 23, and between multiple groups of chip I/O welding and signal transmission layers 21, 22, 23 and the external secondary cascade I/O soldering pads or patterns 1111 for signal transmission, by the blind holes 14 (141, 142, 143) of each layer and the lower patterned metal circuit layer (the second layer of patterned metal Corresponding parts of the circuit layer 112 , the third-layer patterned metal circuit layer 113 , and the fourth-layer patterned metal circuit layer 114 ) are completed together, such as the transmission path 16 in FIG. 2 .

再者,第二层图形化金属线路层112和第三层图形化金属线路层113包括多组芯片I/O焊接及信号传输线路层、电绝缘区域和环绕金属层,均为常规的图形化金属线路层,其具体结构在此不再赘述。第四层图形化金属线路层114的工艺属性和电学属性为大面积金属地层。Furthermore, the second patterned metal circuit layer 112 and the third patterned metal circuit layer 113 include multiple groups of chip I/O soldering and signal transmission circuit layers, electrical insulating regions and surrounding metal layers, all of which are conventional patterned layers. The specific structure of the metal circuit layer is not repeated here. The technological and electrical properties of the fourth patterned metal circuit layer 114 are large area metal formations.

2、绝缘介质层2. Insulating dielectric layer

所述4层图形化金属线路层11中,位于第二层图形化金属线路层112和第三层图形化金属线路层113之间绝缘介质层15,由LCP基板151构成;位于第一层图形化金属线路层111和第二层图形化金属线路层112之间,以及第三层图形化金属线路层113和第四层图形化金属线路层114之间的绝缘介质层,由LCP基板151和LCP粘接膜构成152。所述LCP粘接膜152的熔点比LCP基板151的熔点低10~60℃;采用LCP基板151和LCP粘接膜152混合介质,是因为多层基板层压制造过程中,需要用到低熔点的LCP粘接膜152,作为LCP基板152的粘合层。In the four-layer patterned metal circuit layer 11, the insulating dielectric layer 15 is located between the second layer of patterned metal circuit layer 112 and the third layer of patterned metal circuit layer 113, and is composed of an LCP substrate 151; The insulating dielectric layers between the patterned metal circuit layer 111 and the second patterned metal circuit layer 112, and between the third patterned metal circuit layer 113 and the fourth patterned metal circuit layer 114 are composed of the LCP substrate 151 and the The LCP adhesive film constitutes 152 . The melting point of the LCP adhesive film 152 is 10-60°C lower than the melting point of the LCP substrate 151; the mixed medium of the LCP substrate 151 and the LCP adhesive film 152 is used because a low melting point needs to be used in the multi-layer substrate lamination manufacturing process The LCP adhesive film 152 is used as the adhesive layer of the LCP substrate 152 .

3、盲槽3. Blind slot

所述盲槽12(211、221、231)底部为第二层图形化金属线路层112、第三层图形化金属线路层113或第四层图形化金属线路层114中的大面积金属接地层,并具有涂覆层;所述盲槽12在第一层图形化金属线路层111的开口周围是芯片I/O焊盘或图形(即芯片I/O焊盘及信号传输线路212、222、223中的芯片I/O焊盘或图形);所述盲槽12的数量、大小和深度根据安装芯片的数量、大小和高度确定。The bottom of the blind trenches 12 ( 211 , 221 , 231 ) is a large-area metal ground layer in the second-layer patterned metal circuit layer 112 , the third-layer patterned metal circuit layer 113 or the fourth-layer patterned metal circuit layer 114 , and has a coating layer; the blind groove 12 is a chip I/O pad or pattern around the opening of the first patterned metal circuit layer 111 (ie, the chip I/O pad and the signal transmission lines 212, 222, 223 chip I/O pads or patterns); the number, size and depth of the blind grooves 12 are determined according to the number, size and height of the mounted chips.

4、盲孔4. Blind hole

所述盲孔14根据在4层图形化金属线路层11中的位置可以分为三类:The blind vias 14 can be classified into three types according to their positions in the four-layer patterned metal circuit layer 11:

第一类盲孔141贯穿并连接第一层图形化金属线路层111和第二层图形化金属线路层112,包括在所述对外二次级联I/O焊接用焊盘或图形1111上分布的若干盲孔;The first type of blind vias 141 run through and connect the first patterned metal circuit layer 111 and the second patterned metal circuit layer 112, including being distributed on the external secondary cascade I/O soldering pads or patterns 1111 several blind holes;

第二类盲孔142贯穿并连接第二层图形化金属线路层112和第三层图形化金属线路层113;The second type of blind vias 142 penetrate and connect the second patterned metal circuit layer 112 and the third patterned metal circuit layer 113;

第三类盲孔143贯穿并连接第三层图形化金属线路层113和第四层图形化金属线路层114;The third type of blind vias 143 penetrate and connect the third patterned metal circuit layer 113 and the fourth patterned metal circuit layer 114;

以上三类的所有盲孔14在垂直方向上可对正或错排堆叠,用于实现4层图形化金属线路层11中任意层互联要求。另外,每个盲孔14的直径大小相同,且盲孔深径比≤1,盲孔14内填充实心电镀铜。三类盲孔14的直径大小相同,一方面是为了后期填充实心电镀铜可以统一制作完成;更重要地,可以在后期高温组装过程中均匀形变,从而提升整体封装基板互联可靠性。而盲孔深径比≤1,可以实现盲孔填孔实心电镀铜的过程更好实现,避免电镀铜空洞缺陷的出现。All the blind vias 14 of the above three types can be vertically aligned or stacked in a staggered direction, so as to realize the interconnection requirements of any layer in the four-layer patterned metal circuit layer 11 . In addition, each blind hole 14 has the same diameter, and the blind hole depth-diameter ratio is less than or equal to 1, and the blind hole 14 is filled with solid electroplated copper. The diameters of the three types of blind holes 14 are the same. On the one hand, the solid electroplating copper can be uniformly fabricated in the later stage; more importantly, it can be uniformly deformed during the later high-temperature assembly process, thereby improving the interconnection reliability of the overall package substrate. The blind hole depth-to-diameter ratio is less than or equal to 1, which can better realize the process of blind hole filling and solid copper electroplating, and avoid the appearance of void defects in electroplated copper.

实施例2Example 2

如图3所示,本实施例提供一种如实施例1所述的四层布线LCP封装基板1的制造方法,包括如下步骤:As shown in FIG. 3 , this embodiment provides a method for manufacturing a four-layer wiring LCP package substrate 1 as described in Embodiment 1, which includes the following steps:

S1,如图4a所示,在双面覆铜LCP基板151上激光钻盲孔,用于连接第二层图形化金属线路层112和第三层图形化金属线路层113,盲孔深径比≤1;S1, as shown in FIG. 4a, laser drilling blind holes on the double-sided copper-clad LCP substrate 151 for connecting the second patterned metal circuit layer 112 and the third patterned metal circuit layer 113, the blind hole aspect ratio ≤1;

S2,如图4b所示,盲孔金属化,形成填充实心电镀铜的盲孔;进行盲孔金属化前,需要先进行盲孔去钻污、等离子活化等前处理;盲孔金属化通过填孔电镀铜工艺实现,填孔电镀后,对表面的镀铜层减薄处理,形成填充实心电镀铜的盲孔,该盲孔为第二类盲孔142;S2, as shown in Figure 4b, blind holes are metallized to form blind holes filled with solid electroplated copper; before blind hole metallization, blind hole decontamination, plasma activation and other pretreatments need to be carried out; blind hole metallization is performed by filling The hole electroplating copper process is realized. After the hole is filled and electroplated, the copper plating layer on the surface is thinned to form a blind hole filled with solid electroplated copper, and the blind hole is the second type of blind hole 142;

S3,如图4c所示,可以通过印制板的贴膜→曝光→显影→蚀刻等常规工艺流程,在双面覆铜LCP基板上表面和下表面制造第二层图形化金属线路层112和第三层图形化金属线路层113;S3, as shown in Fig. 4c, the second layer of patterned metal circuit layer 112 and the second layer of patterned metal circuit layer 112 and the second layer of patterned metal circuit layer 112 and the second layer of patterned metal circuit layer 112 and the second layer of patterned metal circuit layer 112 and the second layer of patterned metal circuit layer 112 and the second layer of patterned metal circuit layer 112 and the second layer of patterned metal circuit layer 112 and the second layer of the double-sided copper-clad LCP substrate can be fabricated on the upper and lower surfaces of the double-sided copper-clad LCP substrate through conventional processes such as film bonding of the printed board → exposure → development → etching, as shown in Fig. 4c. Three-layer patterned metal circuit layer 113;

S4,取第一单面覆铜LCP基板151、第二单面覆铜LCP基板152、第一LCP粘接膜151、第二LCP粘接膜152,然后从上到下按照第一单面覆铜LCP基板151、第一LCP粘接膜152、S3处理后的双面覆铜LCP基板151、第二LCP粘接膜152、第二单面覆铜LCP基板151的顺序,进行如图4d所示的对位叠层,然后压合形成如图4e所示的LCP多层基板;其中,第一单面覆铜LCP基板151的覆铜面朝上,第二单面覆铜LCP基板152的覆铜面朝下;所述第一LCP粘接膜和第二LCP粘接膜的熔点比第一单面覆铜LCP基板和第二单面覆铜LCP基板的熔点低,一般低10~60℃;S4, take the first single-sided copper-clad LCP substrate 151, the second single-sided copper-clad LCP substrate 152, the first LCP adhesive film 151, and the second LCP adhesive film 152, and then cover the first single-sided coating from top to bottom. The order of the copper LCP substrate 151, the first LCP adhesive film 152, the double-sided copper-clad LCP substrate 151 after S3 treatment, the second LCP adhesive film 152, and the second single-sided copper-clad LCP substrate 151 is performed as shown in FIG. 4d. The LCP multi-layer substrate shown in FIG. 4e is formed by pressing and laminating as shown in FIG. 4e; wherein, the copper-clad surface of the first single-sided copper-clad LCP substrate 151 faces upward, and the second single-sided copper-clad LCP substrate 152 is The copper-clad surface faces down; the melting points of the first LCP adhesive film and the second LCP adhesive film are lower than the melting points of the first single-sided copper-clad LCP substrate and the second single-sided copper-clad LCP substrate, generally 10-60 °C;

S5,如图4f所示,在LCP多层基板的第一单面覆铜LCP基板151和第二单面覆铜LCP基板151上激光钻盲孔,其中,在第一单面覆铜LCP基板151上的盲孔,用于连接第一层图形化金属线路层111和第二层图形化金属线路层112,在第二单面覆铜LCP基板151上的盲孔,用于连接第三层图形化金属线路层113和第四层图形化金属线路层114,盲孔深径比≤1;S5, as shown in FIG. 4f, laser drilling blind holes on the first single-sided copper-clad LCP substrate 151 and the second single-sided copper-clad LCP substrate 151 of the LCP multilayer substrate, wherein the first single-sided copper-clad LCP substrate is The blind hole on 151 is used to connect the first layer of patterned metal circuit layer 111 and the second layer of patterned metal circuit layer 112, and the blind hole on the second single-sided copper-clad LCP substrate 151 is used to connect the third layer The patterned metal circuit layer 113 and the fourth layer of patterned metal circuit layer 114, the blind hole aspect ratio≤1;

S6,如图4g所示,盲孔金属化,形成填充实心电镀铜的盲孔;该步骤的方法与步骤S2相同,最终形成第一类盲孔141和第三类盲孔143;S6, as shown in FIG. 4g, blind holes are metallized to form blind holes filled with solid electroplated copper; the method of this step is the same as that of step S2, and finally the first type blind holes 141 and the third type blind holes 143 are formed;

S7,如图4h所示,可以采用与步骤S3相同的方法,在第一单面覆铜LCP基板151的上表面制造第一层图形化金属线路层111(包括所述对外二次级联I/O焊接用焊盘或图形1111),在第二单面覆铜LCP基板151的下表面制造第四层图形化金属线路层115;并去除第一层图形化金属线路层中盲槽开槽区域121的铜;盲槽开槽区域121是根据设计确定的位置,该区域为非金属区域,可以采用蚀刻铜工艺加工,将盲槽开槽区域121铜层去除,以方便后续激光开槽处理;S7, as shown in FIG. 4h, the same method as in step S3 can be used to manufacture the first patterned metal circuit layer 111 (including the external secondary cascade I) on the upper surface of the first single-sided copper-clad LCP substrate 151 /O soldering pad or pattern 1111), fabricate the fourth layer of patterned metal circuit layer 115 on the lower surface of the second single-sided copper-clad LCP substrate 151; and remove the blind groove in the first layer of patterned metal circuit layer. Copper in area 121; blind slot slot area 121 is a location determined according to design, this area is a non-metallic area, and can be processed by etching copper process, and the copper layer of blind slot slot area 121 is removed to facilitate subsequent laser slotting processing ;

S8,如图4i所示,采用激光加工手段对盲槽区域进行开槽,形成安装芯片的盲槽12,并对盲槽12的底部和侧壁进行去污处理;所述激光加工手段,其激光光源为固体紫外激光或气体二氧化碳激光;S8, as shown in FIG. 4i, the blind groove area is grooved by a laser processing method to form a blind groove 12 on which the chip is mounted, and the bottom and side walls of the blind groove 12 are decontaminated; the laser processing method, the The laser light source is solid ultraviolet laser or gas carbon dioxide laser;

S9,如图4j所示,在第一层图形化金属线路层111、第四层图形化金属线路层114以及盲槽12底部进行涂覆层制造,并在相应部分的涂覆层13上制作上表面阻焊层17后,得到LCP封装基板1。所述涂覆层13材料,包含但不限于电镀金、化学镍金、化学镍钯金。S9, as shown in FIG. 4j, the coating layer is fabricated on the first layer of patterned metal circuit layer 111, the fourth layer of patterned metal circuit layer 114 and the bottom of the blind groove 12, and is fabricated on the corresponding part of the coating layer 13 After the solder resist layer 17 is formed on the upper surface, the LCP package substrate 1 is obtained. The material of the coating layer 13 includes but is not limited to electroplating gold, electroless nickel gold, and electroless nickel palladium gold.

S10,若是以拼接形式经步骤S1~S9制造LCP封装基板,则对以拼接形式制造的LCP封装基板进行铣切,形成单个的LCP封装基板。S10 , if the LCP package substrate is manufactured in a spliced form through steps S1 to S9 , the LCP package substrate manufactured in the spliced form is milled to form a single LCP package substrate.

也就是说,当直接采用单个LCP基板经步骤S1~S9制造LCP封装基板,得到的LCP封装基板1即是需要的结构;当以拼接形式经步骤S1~S9制造LCP封装基板,得到的LCP封装基板1需要经过铣切才是需要的结构。That is to say, when a single LCP substrate is directly used to manufacture the LCP packaging substrate through steps S1 to S9, the obtained LCP packaging substrate 1 is the required structure; when the LCP packaging substrate is manufactured in a spliced form through steps S1 to S9, the obtained LCP packaging substrate The substrate 1 needs to be milled to be the required structure.

实施例3Example 3

如图5所示,基于实施例1-2所述的LCP封装基板,本实施例提供一种多芯片系统级封装结构2,包括:如实施例1-2所述的LCP封装基板1,以及芯片3、金属围框5和金属盖板6;As shown in FIG. 5 , based on the LCP packaging substrate described in Embodiment 1-2, this embodiment provides a multi-chip system-in-package structure 2 , including: the LCP packaging substrate 1 described in Embodiment 1-2, and Chip 3, metal frame 5 and metal cover 6;

所述多芯片系统级封装结构2以导电胶粘接或焊接的方式固定于PCB母板上,以位于所述LCP封装基板1上的对外二次级联I/O焊接用焊盘或图形1111作为该多芯片系统级封装结构2对外部的二次级联I/O接口;The multi-chip system-in-package structure 2 is fixed on the PCB motherboard by means of conductive adhesive bonding or welding, and the external secondary cascade I/O welding pads or patterns 1111 located on the LCP packaging substrate 1 are used. As the multi-chip system-in-package structure 2 to the external secondary cascade I/O interface;

所述金属围框5中分布有金属隔筋51;所述金属围框5和金属隔筋51焊接于LCP封装基板1上表面并使所述对外二次级联I/O焊接用焊盘或图形1111在金属围框5之外,所述金属盖板6焊接于金属围框5和金属隔筋51上,使LCP封装基板1和金属盖板6之间,通过金属围框5和金属隔筋51形成具有气密封装性能和电磁屏蔽性能的多个空腔结构7;每个空腔结构7中包含一个或多个盲槽12;每个盲槽12用于安装一个芯片3,当安装的芯片3无电磁屏蔽要求时,则可以安装在同一空腔结构7中,当安装的芯片3有电磁屏蔽要求时,则安装在不同空腔结构7中;所述芯片3通过导电胶粘接于盲槽12中,并通过金丝4键合的方式与所述第一层图形化金属线路层111中的芯片I/O焊接及信号传输用线路层21、22、23实现电气互连。Metal rib 51 is distributed in the metal enclosure 5; the metal enclosure 5 and the metal rib 51 are welded to the upper surface of the LCP package substrate 1 and make the external secondary cascade I/O soldering pads or The pattern 1111 is outside the metal enclosure 5, and the metal cover 6 is welded to the metal enclosure 5 and the metal spacer 51, so that the LCP package substrate 1 and the metal cover 6 pass through the metal enclosure 5 and the metal spacer. The ribs 51 form a plurality of cavity structures 7 with hermetic packaging performance and electromagnetic shielding performance; each cavity structure 7 contains one or more blind grooves 12; each blind groove 12 is used to install a chip 3, when installed When the chip 3 has no electromagnetic shielding requirements, it can be installed in the same cavity structure 7, and when the installed chip 3 has electromagnetic shielding requirements, it is installed in a different cavity structure 7; the chips 3 are bonded by conductive glue. In the blind groove 12 , it is electrically interconnected with the chip I/O soldering and signal transmission circuit layers 21 , 22 and 23 in the first patterned metal circuit layer 111 by means of gold wire 4 bonding.

每组芯片I/O焊接及信号传输用线路层21、22、23内信号的传输,通过该组芯片I/O焊接及信号传输用线路层21、22、23内的芯片I/O焊盘及信号传输线路212、222、223,或者经由各层盲孔14(141、142、143)及下层图形化金属线路层(第二层图形化金属线路层112、第三层图形化金属线路层113、第四层图形化金属线路层114)中对应部分共同完成;两组及以上芯片I/O焊接及信号传输层21、22、23之间,以及多组芯片I/O焊接及信号传输层21、22、23与对外二次级联I/O焊接用焊盘或图形1111之间的信号传输,由各层盲孔14(141、142、143)及下层图形化金属线路层(第二层图形化金属线路层112、第三层图形化金属线路层113、第四层图形化金属线路层114)中对应部分共同完成,如图5中的传输路径16。The signal transmission in each group of chip I/O soldering and signal transmission circuit layers 21, 22, and 23 passes through the chip I/O pads in the group of chip I/O soldering and signal transmission circuit layers 21, 22, and 23. and signal transmission lines 212, 222, 223, or through the blind vias 14 (141, 142, 143) of each layer and the lower patterned metal circuit layers (the second patterned metal circuit layer 112, the third patterned metal circuit layer 113. Corresponding parts in the fourth layer of patterned metal circuit layer 114) are jointly completed; two or more chip I/O welding and signal transmission layers 21, 22, 23, and multiple groups of chip I/O welding and signal transmission The signal transmission between the layers 21, 22, 23 and the external secondary cascade I/O soldering pads or patterns 1111 is performed by the blind holes 14 (141, 142, 143) of each layer and the lower patterned metal circuit layer (No. The corresponding parts of the second-layer patterned metal circuit layer 112 , the third-layer patterned metal circuit layer 113 , and the fourth-layer patterned metal circuit layer 114 ) are completed together, as shown in the transmission path 16 in FIG. 5 .

以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements and improvements made within the spirit and principles of the present invention shall be included in the protection of the present invention. within the range.

Claims (8)

1. A four-layer wiring LCP package substrate, comprising:
the metal circuit layer comprises 4 graphical metal circuit layers distributed from the surface to the bottom surface, namely a first graphical metal circuit layer, a second graphical metal circuit layer, a third graphical metal circuit layer and a fourth graphical metal circuit layer in sequence; at least one edge of the outermost periphery of the first patterned metal circuit layer is distributed with bonding pads or patterns for external secondary cascade I/O welding of the LCP packaging substrate; the process property and the electrical property of the fourth patterned metal circuit layer are large-area metal strata;
3 insulating medium layers positioned between the adjacent graphical metal circuit layers;
the plurality of blind grooves are positioned in the insulating medium layer and have openings facing the first patterned metal circuit layer;
a plurality of blind holes penetrating and connecting the adjacent patterned metal circuit layers, wherein a plurality of blind holes are distributed on the pad or the pattern for the outward secondary cascade I/O welding;
the first layer of graphical metal circuit layer comprises a bonding pad or graph for external secondary cascade I/O welding at the outermost periphery, a surrounding metal layer at the inner side and a plurality of groups of chip I/O welding and signal transmission line layers at the inner side of the surrounding metal layer, each group of chip I/O welding and signal transmission line layers is in a rectangular or special-shaped island shape, and each group of chip I/O welding and signal transmission line layers are connected with the surrounding metal layer through an electric insulation area; the surrounding metal layer has an electrical property of a grounding layer and a process property of an airtight welding layer; a coating layer and an upper surface solder mask layer are sequentially arranged on the upper surface of the first patterned metal circuit layer; the coating layer covers the external secondary cascade I/O welding bonding pad or pattern, the surrounding metal layer and each group of chip I/O welding and signal transmission line layer; the upper surface solder mask layer comprises a first surrounding solder mask layer and a plurality of second surrounding solder mask layers, wherein each second surrounding solder mask layer correspondingly surrounds each electric insulation area, and the first surrounding solder mask layer surrounds all the second surrounding solder mask layers;
each group of chip I/O welding and signal transmission line layers comprise chip I/O bonding pads, signal transmission lines and one or more blind slots; the transmission of signals in the circuit layer for I/O welding and signal transmission of each group of chips is completed through chip I/O bonding pads and signal transmission lines in the circuit layer for I/O welding and signal transmission of the group of chips or through corresponding parts in each layer of blind holes and the lower patterned metal circuit layer; signal transmission between two or more groups of chip I/O welding and signal transmission layers, between a plurality of groups of chip I/O welding and signal transmission layers and a bonding pad or a pattern for external secondary cascade I/O welding is jointly completed by corresponding parts in each layer of blind holes and the lower layer of graphical metal circuit layer;
the insulating medium layer is positioned between the second layer of graphical metal circuit layer and the third layer of graphical metal circuit layer and consists of LCP substrates; and the insulating dielectric layers are positioned between the first layer of graphical metal circuit layer and the second layer of graphical metal circuit layer and between the third layer of graphical metal circuit layer and the fourth layer of graphical metal circuit layer and comprise LCP substrates and LCP adhesive films.
2. The LCP package substrate of claim 1, wherein in the 4 patterned metal circuit layers, the LCP adhesive film has a melting point 10-60 ℃ lower than the melting point of the LCP substrate.
3. The LCP package substrate of claim 1, wherein the bottom of the blind trench is a large-area metal ground layer in the second, third or fourth patterned metal circuit layer, and has a coating layer; the blind groove is a chip I/O bonding pad or a pattern around the opening of the first patterned metal circuit layer; the number, size and depth of the blind grooves are determined according to the number, size and height of the mounted chips.
4. The LCP package substrate of claim 1, wherein all blind vias are vertically aligned or staggered for stacking, for implementing any of the 4 patterned metal wiring layers; the diameter of each blind hole is the same, the depth-diameter ratio of the blind holes is less than or equal to 1, and the blind holes are filled with solid electrolytic copper.
5. A method of manufacturing a four-layer wire LCP package substrate, wherein the method is used to manufacture the LCP package substrate of any one of claims 1 to 4, comprising the steps of:
s1, laser drilling blind holes on the double-sided copper-clad LCP substrate for connecting the second patterned metal circuit layer and the third patterned metal circuit layer;
s2, performing blind hole metallization to form blind holes filled with solid electroplated copper;
s3, manufacturing a second layer of graphical metal circuit layer and a third layer of graphical metal circuit layer on the upper surface and the lower surface of the double-sided copper-clad LCP substrate;
s4, taking a first single-sided copper-clad LCP substrate, a second single-sided copper-clad LCP substrate, a first LCP adhesive film and a second LCP adhesive film, and then aligning, laminating and laminating the first single-sided copper-clad LCP substrate, the first LCP adhesive film, the double-sided copper-clad LCP substrate processed in the step S3, the second LCP adhesive film and the second single-sided copper-clad LCP substrate from top to bottom to form an LCP multi-layer substrate; the copper-clad surface of the first single-sided copper-clad LCP substrate faces upwards, and the copper-clad surface of the second single-sided copper-clad LCP substrate faces downwards; the melting points of the first LCP adhesive film and the second LCP adhesive film are lower than those of the first single-sided copper-clad LCP substrate and the second single-sided copper-clad LCP substrate;
s5, blind holes are drilled on a first single-side copper-clad LCP substrate and a second single-side copper-clad LCP substrate of the LCP multilayer substrate through laser, and the blind holes are respectively used for connecting a first graphical metal circuit layer and a second graphical metal circuit layer, and a third graphical metal circuit layer and a fourth graphical metal circuit layer;
s6, performing blind hole metallization to form blind holes filled with solid electroplated copper;
s7, manufacturing a first patterned metal circuit layer on the upper surface of the first single-sided copper-clad LCP substrate, and manufacturing a fourth patterned metal circuit layer on the lower surface of the second single-sided copper-clad LCP substrate; removing copper in a blind groove slotting region in the first patterned metal circuit layer;
s8, grooving the grooving region of the blind groove by adopting a laser processing means to form a blind groove for mounting the chip, and performing decontamination treatment on the bottom and the side wall of the blind groove;
s9, coating layer manufacturing is carried out on the first layer of graphical metal circuit layer, the fourth layer of graphical metal circuit layer and the bottom of the blind groove, and after an upper surface solder mask layer is manufactured on the corresponding part of the coating layer, the LCP packaging substrate is obtained;
and S10, if the LCP packaging substrate is manufactured in a splicing mode through the steps S1-S9, milling the LCP packaging substrate manufactured in the splicing mode to form a single LCP packaging substrate.
6. The method for manufacturing the LCP package substrate as claimed in claim 5, wherein the ratio of the blind hole depth to the blind hole depth is less than or equal to 1.
7. The method for manufacturing the LCP packaging substrate as claimed in claim 5, wherein the melting point of the first LCP adhesive film and the second LCP adhesive film is 10-60 ℃ lower than that of the first single-sided copper-clad LCP substrate and the second single-sided copper-clad LCP substrate.
8. A multi-chip system-in-package structure, comprising: the LCP package substrate of any one of claims 1-4, and a chip, a metal enclosure and a metal lid;
the multi-chip system-in-package structure is fixed on a PCB motherboard in a conductive adhesive bonding or welding mode, and a bonding pad or a pattern for external secondary cascade I/O welding on the LCP packaging substrate is used as an external secondary cascade I/O interface of the multi-chip system-in-package structure;
metal spacer bars are distributed in the metal surrounding frame; the metal enclosure frame and the metal spacer ribs are welded on the upper surface of the LCP packaging substrate, the external secondary cascade I/O welding pads or patterns are arranged outside the metal enclosure frame, the metal cover plate is welded on the metal enclosure frame and the metal spacer ribs, and a plurality of cavity structures with airtight packaging performance and electromagnetic shielding performance are formed between the LCP packaging substrate and the metal cover plate through the metal enclosure frame and the metal spacer ribs; each cavity structure comprises one or more blind grooves; each blind slot is used for mounting a chip, when the mounted chip has no electromagnetic shielding requirement, the mounted chip is mounted in the same cavity structure, and when the mounted chip has the electromagnetic shielding requirement, the mounted chip is mounted in different cavity structures; the chip is adhered in the blind groove through the conductive adhesive and is electrically interconnected with the chip I/O welding and signal transmission circuit layer in the first patterned metal circuit layer in a gold wire bonding mode.
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