CN112255898A - Device for monitoring exposure energy of exposure machine - Google Patents
Device for monitoring exposure energy of exposure machine Download PDFInfo
- Publication number
- CN112255898A CN112255898A CN202011348478.5A CN202011348478A CN112255898A CN 112255898 A CN112255898 A CN 112255898A CN 202011348478 A CN202011348478 A CN 202011348478A CN 112255898 A CN112255898 A CN 112255898A
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- CN
- China
- Prior art keywords
- exposure
- platform
- measuring instrument
- detection
- transmission device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000012544 monitoring process Methods 0.000 title claims abstract description 11
- 238000001514 detection method Methods 0.000 claims abstract description 26
- 230000005540 biological transmission Effects 0.000 claims abstract description 16
- 238000012545 processing Methods 0.000 claims abstract description 12
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000000047 product Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 5
- 238000011161 development Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to a device for monitoring exposure energy of an exposure machine, and belongs to the technical field of circuit board manufacturing. Including exposure lamp, dry plate platform region, post-exposure transmission device, bear product platform, exposure measuring instrument platform and processing control transmitter, the exposure lamp set up in the top of dry plate platform region, post-exposure transmission device sets up in dry plate platform region below, bears the below that the product platform set up transmission device after the exposure, the middle of post-exposure transmission device and bearing product platform sets up the exposure measuring instrument platform, the exposure measuring instrument platform is connected and is handled the control transmitter, the exposure measuring instrument platform is collected the exposure of exposure lamp. The invention has the beneficial effects that: the exposure detector can control the problem of exposure energy through monitoring the exposure energy, thereby causing the problem of bad circuits in batches. The artificial exposure energy detection is reduced, and the detection automation is realized.
Description
Technical Field
The invention relates to a device for monitoring exposure energy of an exposure machine, and belongs to the technical field of circuit board manufacturing.
Background
COF is a flexible circuit board having a light weight, a thin thickness, a thin circuit, and a flexible circuit board, and is currently used in the fields of mobile phones, computers, televisions, and the like, and the weight and thickness reduction of the final product can be reduced. The exposure machine principle is the mode of passing through standard template with the product circuit, see through the light and map the circuit on the product of scribbling the coating liquid, through after the development process, the circuit can show, it is very important to the exposure amount of exposure, the dry plate of exposure machine is after the illumination light irradiation of exposure machine, through various refractions, shine the circuit on the product, the product of shining passes through the development process, show the circuit, at this in-process, if the exposure amount exceeds the standard value, it is too big to appear developing, if the exposure amount is less than the standard value, can appear developing inadequately, when the etching process, the phenomenon that the etching is incomplete appears.
In the exposure process of the existing exposure equipment, the emitted exposure capacity is not monitored, and only the detection is carried out within a specified period time.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a device for monitoring the exposure energy of an exposure machine, which can perform alarm feedback outside the set tolerance range of the exposure capability by adding a group of exposure energy instruments and a group of sensors of exposure times on an exposure carrying platform of the original exposure machine.
The invention is realized by the following technical scheme: a device for monitoring exposure energy of an exposure machine is characterized in that: including exposure lamp, dry plate platform region, post-exposure transmission device, bear product platform, exposure measuring instrument platform and processing control transmitter, the exposure lamp set up in the top of dry plate platform region, post-exposure transmission device sets up in dry plate platform region below, bears the below that the product platform set up transmission device after the exposure, the middle of post-exposure transmission device and bearing product platform sets up the exposure measuring instrument platform, the exposure measuring instrument platform is connected and is handled the control transmitter, the exposure measuring instrument platform is collected the exposure of exposure lamp.
The processing control transmitter receives exposure data measured by the exposure measuring instrument platform, the detected exposure data is in a specification range, the equipment does not give an alarm, the detected exposure capacity is out of the specification range, the processing control transmitter feeds the abnormity back to an internal alarm device of the exposure machine, and the alarm device gives an alarm to stop action.
The exposure detection platform can set a detection frequency, and when the exposure detection platform needs to be detected, the exposure detection platform moves to an exposure position, retracts after the detection is finished, and moves out when the detection is carried out.
The invention has the beneficial effects that: the exposure detector can control the problem of exposure energy through monitoring the exposure energy, thereby causing the problem of bad circuits in batches. The artificial exposure energy detection is reduced, and the detection automation is realized.
Drawings
The invention is further illustrated below with reference to the figures and examples.
Fig. 1 is a schematic structural view of the present invention.
In the figure: 1. an exposure lamp; 2. a dry plate platform area; 3. a post-exposure transfer device; 4. a product bearing platform; 5. an exposure measurement instrument platform; 6. the control transmitter is processed.
Detailed Description
An apparatus for monitoring exposure energy of an exposure machine as shown in fig. 1 is characterized in that: including exposure lamp 1, dry board platform region 2, after-exposure transmission device 3, bear product platform 4, exposure measuring instrument platform 5 and processing control transmitter 6, exposure lamp 1 set up in the top of dry board platform region 2, after-exposure transmission device 3 sets up in dry board platform region 2 below, bear product platform 4 and set up the below at after-exposure transmission device 3, after-exposure transmission device 3 and the centre of bearing product platform 4 set up exposure measuring instrument platform 5, exposure measuring instrument platform 5 connects processing control transmitter 6, exposure measuring instrument platform 5 collects the exposure of exposure lamp 1.
The processing control transmitter 6 receives the exposure data measured by the exposure measuring instrument platform 5, the detected exposure data is in the specification range, the equipment is not alarmed, the detected exposure capability is out of the specification range, the processing control transmitter 6 feeds the abnormity back to an internal alarm device of the exposure machine, and the alarm device alarms and stops acting.
The exposure detection platform 5 can set a detection frequency, and when the detection is needed, the exposure detection platform is moved to an exposure position and retracted after the detection is finished, and when the detection is carried out, the exposure detection platform 5 is moved out.
The invention monitors the exposure energy in real time, realizes the automation of the exposure energy monitoring and reduces the artificial detection. Underdevelopment and excessive development due to insufficient exposure capability are excluded.
Claims (3)
1. A device for monitoring exposure energy of an exposure machine is characterized in that: including exposure lamp (1), dry plate platform region (2), transmission device (3) after the exposure, bear product platform (4), exposure measuring instrument platform (5) and processing control transmitter (6), exposure lamp (1) set up in the top of dry plate platform region (2), transmission device (3) set up in dry plate platform region (2) below after the exposure, bear product platform (4) and set up the below at transmission device (3) after the exposure, transmission device (3) and the centre of bearing product platform (4) set up exposure measuring instrument platform (5) after the exposure, exposure measuring instrument platform (5) connection processing control transmitter (6), exposure measuring instrument platform (5) are collected the exposure of exposure lamp (1).
2. The apparatus of claim 1, wherein: the processing control transmitter (6) receives exposure data measured by the exposure measuring instrument platform (5), the detected exposure data is in a specification range, the equipment is not alarmed, the detected exposure capacity is out of the specification range, the processing control transmitter (6) feeds the abnormity back to an internal alarm device of the exposure machine, and the alarm device alarms and stops acting.
3. The apparatus of claim 1, wherein: the exposure detection platform (5) can set a detection frequency, and when the detection is needed, the exposure detection platform is moved to an exposure position and retracted after the detection is finished, and when the detection is carried out, the exposure detection platform (5) is moved out.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011348478.5A CN112255898A (en) | 2020-11-26 | 2020-11-26 | Device for monitoring exposure energy of exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011348478.5A CN112255898A (en) | 2020-11-26 | 2020-11-26 | Device for monitoring exposure energy of exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112255898A true CN112255898A (en) | 2021-01-22 |
Family
ID=74225099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011348478.5A Pending CN112255898A (en) | 2020-11-26 | 2020-11-26 | Device for monitoring exposure energy of exposure machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112255898A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010043321A1 (en) * | 1997-04-18 | 2001-11-22 | Nikon Corporation | Exposure apparatus, exposure method using the same, and method of manufacture of circuit device |
| KR20020078200A (en) * | 2001-04-06 | 2002-10-18 | 삼성전자 주식회사 | System for calibrating exposure |
| CN102253602A (en) * | 2010-05-18 | 2011-11-23 | 上海微电子装备有限公司 | Lighting dose real-time controlling apparatus in photolithography system |
| CN104914676A (en) * | 2014-03-12 | 2015-09-16 | 旺昌机械工业(昆山)有限公司 | Screen exposure machine monitoring system |
| CN105404100A (en) * | 2015-12-21 | 2016-03-16 | 中国科学院长春光学精密机械与物理研究所 | Exposure dose monitoring method and exposure method in exposure system and exposure system |
| CN213517878U (en) * | 2020-11-26 | 2021-06-22 | 上达电子（深圳）股份有限公司 | Device for monitoring exposure energy of exposure machine |
-
2020
- 2020-11-26 CN CN202011348478.5A patent/CN112255898A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010043321A1 (en) * | 1997-04-18 | 2001-11-22 | Nikon Corporation | Exposure apparatus, exposure method using the same, and method of manufacture of circuit device |
| KR20020078200A (en) * | 2001-04-06 | 2002-10-18 | 삼성전자 주식회사 | System for calibrating exposure |
| CN102253602A (en) * | 2010-05-18 | 2011-11-23 | 上海微电子装备有限公司 | Lighting dose real-time controlling apparatus in photolithography system |
| CN104914676A (en) * | 2014-03-12 | 2015-09-16 | 旺昌机械工业(昆山)有限公司 | Screen exposure machine monitoring system |
| CN105404100A (en) * | 2015-12-21 | 2016-03-16 | 中国科学院长春光学精密机械与物理研究所 | Exposure dose monitoring method and exposure method in exposure system and exposure system |
| CN213517878U (en) * | 2020-11-26 | 2021-06-22 | 上达电子（深圳）股份有限公司 | Device for monitoring exposure energy of exposure machine |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20210309 Address after: 518100 floors 1-4, 2-3, building a, Huangpu Runhe Industrial Park, South Ring Road, Huangpu Community, Shajing street, Bao'an District, Shenzhen City, Guangdong Province Applicant after: LEADER-TECH ELECTRONICS (SHENZHEN) Inc. Address before: 221300 north of Liaohe Road and west of Huashan Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Applicant before: Jiangsu Shangda Electronics Co.,Ltd. |
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| TA01 | Transfer of patent application right |
Effective date of registration: 20240129 Address after: 221300 north of Liaohe Road and west of Huashan Road, Pizhou Economic Development Zone, Xuzhou City, Jiangsu Province Applicant after: Jiangsu SHANGDA Semiconductor Co.,Ltd. Country or region after: China Address before: 518100 floors 1-4, 2-3, building a, Huangpu Runhe Industrial Park, South Ring Road, Huangpu Community, Shajing street, Bao'an District, Shenzhen City, Guangdong Province Applicant before: LEADER-TECH ELECTRONICS (SHENZHEN) Inc. Country or region before: China |