[go: up one dir, main page]

CN112151401B - A Grain Orientation Control Method Based on Semiconductor Temperature Control - Google Patents

A Grain Orientation Control Method Based on Semiconductor Temperature Control Download PDF

Info

Publication number
CN112151401B
CN112151401B CN202011084546.1A CN202011084546A CN112151401B CN 112151401 B CN112151401 B CN 112151401B CN 202011084546 A CN202011084546 A CN 202011084546A CN 112151401 B CN112151401 B CN 112151401B
Authority
CN
China
Prior art keywords
module
semiconductor refrigeration
semiconductor
bonding pad
sub
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202011084546.1A
Other languages
Chinese (zh)
Other versions
CN112151401A (en
Inventor
曾志
覃永昊
彭倍
于慧君
周吴
杜旭荧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Electronic Science and Technology of China
Original Assignee
University of Electronic Science and Technology of China
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Electronic Science and Technology of China filed Critical University of Electronic Science and Technology of China
Priority to CN202011084546.1A priority Critical patent/CN112151401B/en
Publication of CN112151401A publication Critical patent/CN112151401A/en
Application granted granted Critical
Publication of CN112151401B publication Critical patent/CN112151401B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/75Apparatus for connecting with bump connectors or layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/7525Means for applying energy, e.g. heating means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/755Cooling means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/83801Soldering or alloying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/83801Soldering or alloying
    • H01L2224/83805Soldering or alloying involving forming a eutectic alloy at the bonding interface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/83909Post-treatment of the layer connector or bonding area
    • H01L2224/8393Reshaping
    • H01L2224/83935Reshaping by heating means, e.g. reflowing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/83909Post-treatment of the layer connector or bonding area
    • H01L2224/83948Thermal treatments, e.g. annealing, controlled cooling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B30/00Energy efficient heating, ventilation or air conditioning [HVAC]

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

The invention discloses a crystal grain orientation control method based on semiconductor temperature control, which comprises the following steps that a first bonding pad, a soldering tin joint, a piece to be welded and a second bonding pad are welded and connected through vacuum brazing before heating and remelting; loading the power source on the first bonding pad, and generating Joule heat to remelt the soldering joint after the soldering joint is electrified; loading the power source on the first semiconductor refrigeration module and the second semiconductor refrigeration module, so that one surface of the first semiconductor refrigeration module attached to the first bonding pad heats, and one surface of the second semiconductor refrigeration module attached to the second bonding pad refrigerates, and forming a temperature gradient in the cooling process of the soldering joint; according to the solidification device provided by the invention, the power supply is applied to the first bonding pad and the second bonding pad, so that the joule heating remelting is realized by applying current to the soldering tin joint, the grain orientation of the soldering tin joint is rearranged, and the power fatigue damage resistance of the IGBT high-power component is improved.

Description

一种基于半导体温控的晶粒取向控制方法A Grain Orientation Control Method Based on Semiconductor Temperature Control

技术领域technical field

本发明涉及金属焊接工艺领域,具有而言涉及一种基于半导体温控的晶粒取向控制方法及装置。The invention relates to the field of metal welding technology, in particular to a method and device for controlling grain orientation based on semiconductor temperature control.

背景技术Background technique

绝缘栅双极型晶体管(Insulated Gate Bipolar Transistor, IGBT)是一种由双极结型晶体三极管(BJT)和绝缘栅型场效应管(MOS)组成的复合全控型-电压驱动式-功率半导体器件,具有驱动功率小和饱和压低的优点。内部包含数层不同功能的结构材料,通常采用软钎焊工艺将芯片下表面通过焊层与绝缘陶瓷衬板相连(一次焊接),并将半导体芯片并联,以提高电流承载能力;芯片上表面采用引线键合的方式实现电气互连(二次焊接)。IGBT功率电子器件在实际工作过程中不仅会因为热疲劳、剪切疲劳等因素而失效,疲劳问题也是影响器件可靠性的关键性因素之一。IGBT原件的疲劳失效会导致相关的高功率电子器件失效,在控制系统可靠性要求较高的领域会造成严重的影响。在焊接封装过程中焊锡接头的粒子运动方向散乱且不可控,导致接头处抗疲劳可靠性较低,大大降低了电路的使用寿命。Insulated Gate Bipolar Transistor (IGBT) is a composite fully-controlled-voltage-driven-power semiconductor composed of a bipolar junction transistor (BJT) and an insulated gate field effect transistor (MOS). The device has the advantages of small driving power and low saturation voltage. The interior contains several layers of structural materials with different functions. Usually, the soldering process is used to connect the lower surface of the chip with the insulating ceramic liner through the soldering layer (one-time welding), and connect the semiconductor chips in parallel to improve the current carrying capacity; the upper surface of the chip is made of Electrical interconnection is achieved by wire bonding (secondary soldering). IGBT power electronic devices will not only fail due to factors such as thermal fatigue and shear fatigue during actual work, but fatigue is also one of the key factors affecting device reliability. The fatigue failure of IGBT components will lead to the failure of related high-power electronic devices, which will have a serious impact in the field of control system reliability requirements. During the soldering and packaging process, the particle movement direction of the solder joint is scattered and uncontrollable, resulting in low reliability of fatigue resistance at the joint and greatly reducing the service life of the circuit.

发明内容Contents of the invention

为了解决现有技术中所存在的技术问题,本发明在此的提供一种可以使焊锡接头的晶粒取向重新排列,提高元器件抗功率疲劳损伤能力的分区电流驱动重熔与半导体温控定向凝固装置。In order to solve the technical problems existing in the prior art, the present invention provides a current-driven remelting and semiconductor temperature-controlled orientation that can rearrange the grain orientation of solder joints and improve the ability of components to resist power fatigue damage. Solidification device.

为实现本发明的目的,在此提供的分区电流驱动重熔与半导体温控定向凝固装置包括第一半导体制冷模块、第二半导体制冷模块、第一焊盘、第二焊盘和焊锡接头;所述第一半导体制冷模块与所述第一焊盘的上表面贴合接触,所述第二半导体制冷模块与所述第二焊盘的下表面贴合接触,所述第一焊盘和所述第二焊盘相对设置;所述第一焊盘和所述第二焊盘在电源加载时,所述焊锡接头呈电阻性,被电加热后重新融化,焊锡呈流动状态;所述第一半导体制冷模块在电源加载时,贴合于所述第一焊盘的一面制热;所述第二半导体制冷模块在电源加载时,贴合于所述第二焊盘的一面制冷,在焊锡接头的冷却过程中形成温度梯度。In order to achieve the purpose of the present invention, the device for zonal current-driven remelting and semiconductor temperature-controlled directional solidification provided here includes a first semiconductor refrigeration module, a second semiconductor refrigeration module, a first pad, a second pad and a solder joint; The first semiconductor refrigeration module is in contact with the upper surface of the first pad, the second semiconductor refrigeration module is in contact with the lower surface of the second pad, and the first pad and the The second pads are oppositely arranged; when the first pad and the second pad are powered on, the solder joint is resistive, and re-melted after being electrically heated, and the solder is in a fluid state; the first semiconductor When the power is loaded on the refrigeration module, the side attached to the first pad is heated; when the power is loaded on the second semiconductor refrigeration module, the side attached to the second pad is cooled, and the side of the solder joint is heated. A temperature gradient is formed during cooling.

本发明提供的凝固装置通过给第一焊盘和第二焊盘加载电源,从而给焊锡接头施加电流实现焦耳热加热重熔,再通过第一半导体制冷模块和第二半导体制冷模块实现焊锡接头在凝固过程中的一维温度梯度,使焊锡接头的晶粒取向重新排列,提高了IGBT高功率元器件抗功率疲劳损伤的能力。The solidification device provided by the present invention applies power to the first pad and the second pad to apply current to the solder joint to achieve Joule heating and remelting, and then realizes the solder joint through the first semiconductor refrigeration module and the second semiconductor refrigeration module. The one-dimensional temperature gradient during the solidification process rearranges the grain orientation of the solder joints, improving the ability of IGBT high-power components to resist power fatigue damage.

进一步的,所述第一半导体制冷模块包括第一半导体制冷子模块A和第一半导体制冷子模块B,所述第一半导体制冷子模块A和所述第一半导体制冷子模块B均包括第一半导体制冷片。Further, the first peltier cooling module includes a first peltier cooling submodule A and a first peltier refrigerating submodule B, and both the first peltier cooling submodule A and the first peltier cooling submodule B include a first peltier cooling submodule B. semiconductor cooler.

进一步的,所述第一半导体制冷子模块A和所述第一半导体制冷子模块B还包括第一冷却腔,所述第一半导体制冷片与所述第一冷却腔层叠设置;所述第一半导体制冷片和所述第一冷却腔之间用第一盖板电隔离并进行热传递。Further, the first semiconductor refrigeration sub-module A and the first semiconductor refrigeration sub-module B also include a first cooling chamber, and the first semiconductor refrigeration sheet is stacked with the first cooling chamber; the first A first cover plate is used to electrically isolate and conduct heat transfer between the semiconductive refrigerating sheet and the first cooling chamber.

进一步的,所述第一冷却腔包括蛇形流管和用于密封所述蛇形流管的密封槽,所述蛇形流管的两端分别开设有冷却水入口和冷却水出口。Further, the first cooling chamber includes a serpentine flow pipe and a sealing groove for sealing the serpentine flow pipe, and two ends of the serpentine flow pipe are respectively provided with a cooling water inlet and a cooling water outlet.

进一步的,所述第一冷却腔与所述第一盖板的接触面上涂有导热硅脂,提高导热性。Further, the contact surface between the first cooling cavity and the first cover plate is coated with thermal conductive silicone grease to improve thermal conductivity.

进一步的,所述第一半导体制冷子模块A和所述第一半导体制冷子模块B独立加载电源,电源可以仅加载于所述第一半导体制冷子模块A,或仅加载于所述第一半导体制冷子模块B,或者同时加载于所述第一半导体制冷子模块A和所述第一半导体制冷子模块B。Further, the first semiconductor refrigeration sub-module A and the first semiconductor refrigeration sub-module B are independently loaded with power, and the power can be loaded only on the first semiconductor refrigeration sub-module A, or only on the first semiconductor refrigeration sub-module A. The cooling sub-module B, or loaded on the first semiconductor cooling sub-module A and the first semiconductor cooling sub-module B at the same time.

进一步的,所述第二半导体制冷模块包括第二半导体制冷子模块A和第二半导体制冷子模块B,所述第二半导体制冷子模块A和第二半导体制冷子模块B均包括第二半导体制冷片。Further, the second peltier refrigeration module includes a second peltier refrigeration submodule A and a second peltier refrigeration submodule B, and both the second peltier refrigeration submodule A and the second peltier refrigeration submodule B include a second peltier refrigeration submodule B. piece.

进一步的,所述第二半导体制冷子模块A和所述第二半导体制冷子模块B还包括第二冷却腔,所述第二半导体制冷片与所述第二冷却腔层叠设置;所述第二半导体制冷片和所述第二冷却腔之间用第二盖板电隔离并进行热传递。Further, the second semiconductor cooling sub-module A and the second semiconductor cooling sub-module B also include a second cooling cavity, and the second semiconductor cooling sheet is stacked with the second cooling cavity; the second A second cover plate is used to electrically isolate and conduct heat transfer between the semiconductive cooling plate and the second cooling chamber.

进一步的,所述第二冷却腔包括蛇形流管和用于密封所述蛇形流管的密封槽,所述蛇形流管的两端分别开设有冷却水入口和冷却水出口。Further, the second cooling chamber includes a serpentine flow pipe and a sealing groove for sealing the serpentine flow pipe, and two ends of the serpentine flow pipe are respectively provided with a cooling water inlet and a cooling water outlet.

进一步的,所述第二冷却腔与所述第二盖板的接触面上涂有导热硅脂。Further, the contact surface between the second cooling cavity and the second cover plate is coated with thermal conductive silicone grease.

进一步的,所述第二半导体制冷子模块A和所述第二半导体制冷子模块B独立加载电源,电源可以仅加载于所述第二半导体制冷子模块A,或仅加载于所述第二半导体制冷子模块B,或者同时加载于所述第二半导体制冷子模块A和所述第二半导体制冷子模块B。Further, the second semiconductor refrigeration sub-module A and the second semiconductor refrigeration sub-module B are independently loaded with power, and the power can be loaded only on the second semiconductor refrigeration sub-module A, or only on the second semiconductor refrigeration sub-module B. The cooling sub-module B, or loaded on the second semiconductor cooling sub-module A and the second semiconductor cooling sub-module B at the same time.

进一步的,本发明提供的装置还包括电源系统,所述电源系统输出的电源一方面加载于所述第一焊盘和所述第二焊盘上,另一方面加载于所述第一半导体制冷模块和所述第二半导体制冷模块上。Furthermore, the device provided by the present invention also includes a power supply system, the power output by the power supply system is loaded on the first pad and the second pad on the one hand, and on the other hand is loaded on the first semiconductor cooling pad. module and the second peltier cooling module.

进一步的,所述电源系统包括:Further, the power system includes:

上位机,用于人机交互;Host computer for human-computer interaction;

单片机,用于与所述上位机通信连接,根据接受到的所述上位机发出的控制指令输出控制信号,并将接收到的数据上传至所述上位机;A single-chip microcomputer, used for communication connection with the upper computer, outputting a control signal according to the received control instruction sent by the upper computer, and uploading the received data to the upper computer;

加热重熔电源,正负极分别与所述第一焊盘和所述第二焊盘电连接;heating and remelting power supply, the positive and negative electrodes are respectively electrically connected to the first pad and the second pad;

继电器,串联于所述单片机的信号输出端于所述加热重熔电源之间,在所述单片机输出控制信号时导通使所述单片机输出的控制信号加载于所述加热重熔电源,所述加热重熔电源输出电源加载于所述第一焊盘和所述第二焊盘上;The relay is connected in series between the signal output terminal of the single-chip microcomputer and the heating and remelting power supply, and is turned on when the single-chip microcomputer outputs the control signal so that the control signal output by the single-chip microcomputer is loaded on the heating and remelting power supply. The output power of the heating and remelting power supply is loaded on the first pad and the second pad;

数模转换器,与所述单片机的信号输出端连接,用于将所述单片机输出的数字信号转换成模拟信号分别加载于所述第一半导体制冷模块、所述第二半导体制冷模块上。The digital-to-analog converter is connected to the signal output end of the single-chip microcomputer, and is used to convert the digital signal output by the single-chip microcomputer into an analog signal and load it on the first semiconductor refrigeration module and the second semiconductor refrigeration module respectively.

进一步的,所述电源系统还包括与所述单片机通信连接的温度采集装置,所述温度采集装置用于采集重熔过程中所述第一焊盘和所述第二焊盘之间的温度,并经所述单片机上传至所述上位机;根据上传的温度数据通过所述上位机向所述单片机输入控制指令,使所述继电器切断的同时使所述单片机输出信号经所述数模转换器后加载于所述第一半导体制冷模块和所述第二半导体制冷模块上,使所述第一半导体制冷模块贴合于所述第一焊盘的一面制热,所述第二半导体制冷模块贴合于所述第二焊盘的一面制冷。Further, the power supply system further includes a temperature acquisition device communicatively connected with the single chip microcomputer, the temperature acquisition device is used to acquire the temperature between the first pad and the second pad during the remelting process, and upload to the host computer through the single-chip microcomputer; according to the uploaded temperature data, input control instructions to the single-chip microcomputer through the upper computer, so that the output signal of the single-chip microcomputer is passed through the digital-to-analog converter while the relay is cut off. Afterwards, it is loaded on the first semiconductor refrigeration module and the second semiconductor refrigeration module, so that the first semiconductor refrigeration module is attached to the first welding pad for heating, and the second semiconductor refrigeration module is attached to the The side close to the second solder pad is refrigerated.

进一步的,本发明提供的装置还包括与所述上位机通信连接的冷却水循环机,所述冷却水循环机冷却水的流速通过所述上位机控制。Further, the device provided by the present invention further includes a cooling water circulation machine communicatively connected with the host computer, and the flow rate of the cooling water of the cooling water circulation machine is controlled by the host computer.

本发明在此的第二个目的在于提供一种基于半导体温控的晶粒取向控制方法,该方法包括以下步骤:The second object of the present invention here is to provide a method for controlling grain orientation based on semiconductor temperature control, the method comprising the following steps:

步骤S1:将第一焊盘、焊锡接头、待焊接件和第二焊盘在加热重熔前通过真空钎焊焊接连接;Step S1: Connecting the first pad, the solder joint, the piece to be welded and the second pad by vacuum brazing before heating and remelting;

步骤S2:加载电源于第一焊盘上,焊锡接头在通电后产生焦耳热重新融化;Step S2: Apply power to the first pad, and the solder joint will re-melt due to Joule heat after electrification;

步骤S3:一定时间后,加载电源于第一半导体制冷模块和第二半导体制冷模块上,使第一半导体制冷模块贴合于第一焊盘的一面制热,第二半导体制冷模块贴合于第二焊盘的一面制冷,在焊锡接头的冷却过程中形成温度梯度。Step S3: After a certain period of time, load power on the first semiconductor refrigeration module and the second semiconductor refrigeration module, so that the first semiconductor refrigeration module is attached to the side of the first pad for heating, and the second semiconductor refrigeration module is attached to the first pad. One side of the two pads is refrigerated, forming a temperature gradient during the cooling of the solder joint.

进一步的,所述真空钎焊包括以下步骤:Further, the vacuum brazing includes the following steps:

步骤S11:将焊锡材料用10%的NaOH溶液浸蚀10min保持溶液温度40~60℃,其次在硝酸+氢氟酸溶液中浸蚀5min;Step S11: Etch the solder material with 10% NaOH solution for 10 minutes to keep the solution temperature at 40-60°C, and then etch it in nitric acid + hydrofluoric acid solution for 5 minutes;

步骤S12:将经步骤S11处理后的焊锡材料放置于第一焊盘、焊锡接头、待焊接件和第二焊盘之间的焊点处,装配好后放置于真空钎焊炉中,并提供一定的外在压力,待钎焊炉内真空抽至6×10^(-3)Pa以下时开始升温加热到钎焊温度进行钎焊。Step S12: Place the solder material processed in step S11 on the solder joint between the first pad, the solder joint, the piece to be welded and the second pad, place it in a vacuum brazing furnace after assembly, and provide A certain external pressure, when the vacuum in the brazing furnace is evacuated to below 6×10^(-3)Pa, start to heat up to the brazing temperature for brazing.

本发明的有益效果包括:The beneficial effects of the present invention include:

1)通过给焊锡接头施加电流实现了焦耳热加热重熔,再通过第一半导体制冷模块和第二半导体制冷模块实现焊锡接头在凝固过程中的一维温度梯度,使焊锡接头的晶粒取向重新排列,提高了元器件抗功率疲劳损伤的能力。1) Joule heating and remelting is achieved by applying current to the solder joint, and then the one-dimensional temperature gradient of the solder joint during the solidification process is realized through the first semiconductor refrigeration module and the second semiconductor refrigeration module, so that the grain orientation of the solder joint is re- Arrangement improves the ability of components to resist power fatigue damage.

2)第一半导体制冷模块和第二半导体制冷模块独立控制,提高了装置的独立可控性。2) The first semiconductor refrigeration module and the second semiconductor refrigeration module are independently controlled, which improves the independent controllability of the device.

3)通过冷却腔能够对热端进行散热,当半导体制冷模块的冷端你制冷无法达到要求时,可以在热端的冷却腔通入冷却水,由于半导体制冷片的原理是通电后将冷端的热量传导至热端,故当热端通过冷却腔冷却后冷端的温度进一步下降,由此可以进一步扩大温度梯度,加速了凝固;3) The cooling cavity can dissipate heat from the hot end. When the cooling of the cold end of the semiconductor refrigeration module cannot meet the requirements, you can pass cooling water into the cooling cavity of the hot end. Conducted to the hot end, so when the hot end is cooled by the cooling chamber, the temperature of the cold end further drops, thereby further expanding the temperature gradient and accelerating solidification;

4)采用单片机作为控制模块,结合温度采集装置实时采集的温度场数据,并根据温度数据控制第一半导体制冷模块和第二半导体制冷模块工作,实现了对焊锡接头重熔过程中温度梯度的PID闭环控制。4) Using a single-chip microcomputer as the control module, combined with the temperature field data collected in real time by the temperature acquisition device, and controlling the work of the first semiconductor refrigeration module and the second semiconductor refrigeration module according to the temperature data, the PID of the temperature gradient during the solder joint remelting process is realized Closed-loop control.

5)本发明使用的半导体温度控制模块体积小,通过单片机和上位机的配合调节加载于第一半导体制冷模块和第二半导体制冷模块上的电流大小和方向就可以控制温度梯度的区间,控制精度高。5) The semiconductor temperature control module used in the present invention is small in size, and the range of temperature gradient can be controlled by adjusting the magnitude and direction of the current loaded on the first semiconductor refrigeration module and the second semiconductor refrigeration module through the cooperation of the single-chip microcomputer and the host computer. high.

6)上位机还控制冷却水循环机的冷却水循环速度,使装置的温度梯度能够达到冷却凝固要求。6) The upper computer also controls the cooling water circulation speed of the cooling water circulation machine, so that the temperature gradient of the device can meet the cooling and solidification requirements.

附图说明Description of drawings

此处的附图被并入说明书中并构成本说明书的一部分,示出了符合发明的实施例,并与说明书一起用于解释发明的原理。显而易见地,下面描述中的附图仅仅是发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。在附图中:The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and together with the description serve to explain the principles of the invention. Apparently, the drawings in the following description are only some embodiments of the invention, and those skilled in the art can obtain other drawings according to these drawings without creative efforts. In the attached picture:

图1为本发明实施例提供的分区电流驱动重熔与半导体温控定向凝固装置的整体结构示意图;FIG. 1 is a schematic diagram of the overall structure of a device for partitioned current-driven remelting and semiconductor temperature-controlled directional solidification provided by an embodiment of the present invention;

图2为本发明实施例记载的第一半导体制冷子模块的结构示意图;Fig. 2 is a schematic structural diagram of the first semiconductor refrigeration sub-module recorded in the embodiment of the present invention;

图3为本发明实施例记载的第二半导体制冷子模块的结构示意图;Fig. 3 is a schematic structural view of the second semiconductor refrigeration sub-module recorded in the embodiment of the present invention;

图4为本发明实施例记载的冷却腔结构示意图;Fig. 4 is a schematic structural diagram of a cooling cavity recorded in an embodiment of the present invention;

附图中:1-第一半导体制冷模块,11-第一半导体制冷子模块A,12-第一半导体制冷子模块B,111-第一半导体制冷片,112-第一冷却腔,113-第一盖板,2-第二半导体制冷模块,21-第二半导体制冷子模块A,22-第二半导体制冷子模块B,211-第二半导体制冷片,212-第二冷却腔,213-第二盖板,3-第一焊盘,4-第二焊盘,5-焊锡接头,6-待焊接件,7-上位机,8-单片机,9-加热重熔电源,10-继电器,13-温度采集装置,14-蛇形流管,15-密封槽。In the drawings: 1-the first semiconductor refrigeration module, 11-the first semiconductor refrigeration sub-module A, 12-the first semiconductor refrigeration sub-module B, 111-the first semiconductor refrigeration sheet, 112-the first cooling cavity, 113-the first A cover plate, 2-the second semiconductor refrigeration module, 21-the second semiconductor refrigeration sub-module A, 22-the second semiconductor refrigeration sub-module B, 211-the second semiconductor refrigeration sheet, 212-the second cooling cavity, 213-the second cooling chamber Two cover plates, 3-first pad, 4-second pad, 5-solder joint, 6-piece to be welded, 7-host computer, 8-single-chip microcomputer, 9-heating and remelting power supply, 10-relay, 13 - temperature collection device, 14 - serpentine flow tube, 15 - sealing groove.

具体实施方式Detailed ways

现在将参考附图更全面地描述示例实施方式。然而,示例实施方式能够以多种形式实施,且不应被理解为限于在此阐述的范例;相反,提供这些实施方式使得发明将更加全面和完整,并将示例实施方式的构思全面地传达给本领域的技术人员。Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this invention will be thorough and complete, and will fully convey the concept of example embodiments to the Those skilled in the art.

此外,所描述的特征、结构或特性可以以任何合适的方式结合在一个或更多实施例中。在下面的描述中,提供许多具体细节从而给出对发明的实施例的充分理解。然而,本领域技术人员将意识到,可以实践发明的技术方案而没有特定细节中的一个或更多,或者可以采用其它的方法。在其它情况下,不详细示出或描述公知方法、实现或者操作以避免模糊发明的各方面。Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the invention. One skilled in the art will appreciate, however, that the inventive solution may be practiced without one or more of the specific details, or that other approaches may be employed. In other instances, well-known methods, implementations, or operations have not been shown or described in detail to avoid obscuring aspects of the invention.

参照图1所示,本发明提供的分区电流驱动重熔与半导体温控定向凝固装置,包括第一半导体制冷模块1、第二半导体制冷模块2、第一焊盘3、第二焊盘4和焊锡接头5;第一半导体制冷模块1与第一焊盘3的上表面贴合接触,第二半导体制冷模块2与第二焊盘4的下表面贴合接触,第一焊盘3和第二焊盘4相对设置,焊锡接头5位于第一焊盘3和第二焊盘4之间;第一焊盘3和第二焊盘4在电源加载时,焊锡接头5呈电阻性,被电加热后重新融化,焊锡呈流动状态;第一半导体制冷模块1在电源加载时,贴合于第一焊盘3的一面制热;第二半导体制冷模块2在电源加载时,贴合于第二焊盘4的一面制冷,在焊锡接头5的冷却过程中形成温度梯度。Referring to FIG. 1 , the partitioned current-driven remelting and semiconductor temperature-controlled directional solidification device provided by the present invention includes a first semiconductor refrigeration module 1, a second semiconductor refrigeration module 2, a first pad 3, a second pad 4 and Solder joint 5; the first semiconductor refrigeration module 1 is in contact with the upper surface of the first pad 3, the second semiconductor refrigeration module 2 is in contact with the lower surface of the second pad 4, the first pad 3 and the second The pads 4 are arranged oppositely, and the solder joint 5 is located between the first pad 3 and the second pad 4; when the first pad 3 and the second pad 4 are powered on, the solder joint 5 is resistive and is electrically heated After re-melting, the solder is in a flowing state; when the power is loaded, the first semiconductor refrigeration module 1 is attached to the side of the first pad 3 to heat; the second semiconductor refrigeration module 2 is attached to the second solder pad 3 when the power is loaded. One side of the disc 4 is cooled, creating a temperature gradient during the cooling of the solder joint 5 .

该装置的工作原理是:采用焦耳热加热重熔的方式,使钎焊焊接后的焊锡接头通电重新融化和凝固,具体的是:将第一焊盘3、焊锡接头5、待焊接件6和第二焊盘4在加热重熔前通过真空钎焊焊接连接;加载电源于第一焊盘3上,使第一焊盘3和第二焊盘4之间通过焊锡接头5形成回路,焊锡接头5呈电阻性,通电后产生焦耳热加热使其重新融化,待焊锡接头5呈流动状态时,切断加载于第一焊盘3和第二焊盘4上的电源,并同时向第一半导体制冷模块1和第二半导体制冷模块2加载电源,使第一半导体制冷模块1贴合于第一焊盘3的一面制热,第二半导体制冷模块2贴合于第二焊盘4的一面制冷,在焊锡接头5的冷却过程中形成温度梯度,使融化的焊锡重新冷却凝固。The working principle of the device is: using Joule heat heating and remelting to remelt and solidify the solder joints after brazing and welding, specifically: the first pad 3, the solder joint 5, the parts to be welded 6 and The second pad 4 is connected by vacuum brazing before heating and remelting; the power supply is applied to the first pad 3, so that a circuit is formed between the first pad 3 and the second pad 4 through a solder joint 5, and the solder joint 5 is resistive, and after electrification, it generates Joule heat to re-melt it. When the solder joint 5 is in a flowing state, cut off the power loaded on the first pad 3 and the second pad 4, and simultaneously refrigerate the first semiconductor. The module 1 and the second semiconductor refrigeration module 2 are powered on, so that the side of the first semiconductor refrigeration module 1 attached to the first pad 3 is heated, and the side of the second semiconductor refrigeration module 2 attached to the second pad 4 is cooled. During the cooling process of the solder joint 5, a temperature gradient is formed, so that the melted solder is recooled and solidified.

本文中第一半导体制冷模块1、第二半导体制冷模块2的结构为:In this paper, the structures of the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module 2 are:

第一半导体制冷模块1包括第一半导体制冷子模块A11和第一半导体制冷子模块B12,第一半导体制冷子模块A11和第一半导体制冷子模块B12均包括第一半导体制冷片111。The first peltier cooling module 1 includes a first peltier cooling submodule A11 and a first peltier cooling submodule B12 , and both the first peltier cooling submodule A11 and the first peltier cooling submodule B12 include a first peltier cooling chip 111 .

本文中第一半导体制冷子模块A11和第一半导体制冷子模块B12独立加载电源,电源可以仅加载于第一半导体制冷子模块A11,或仅加载于第一半导体制冷子模块B12,或者同时加载于第一半导体制冷子模块A11和第一半导体制冷子模块B12。In this paper, the first semiconductor refrigeration sub-module A11 and the first semiconductor refrigeration sub-module B12 are independently loaded with power, and the power can be loaded only on the first semiconductor refrigeration sub-module A11, or only on the first semiconductor refrigeration sub-module B12, or both The first semiconductor refrigeration sub-module A11 and the first semiconductor refrigeration sub-module B12.

第二半导体制冷模块2包括第二半导体制冷子模块A21和第二半导体制冷子模块B22,第二半导体制冷子模块A21和第二半导体制冷子模块B22均包括第二半导体制冷片221。The second peltier cooling module 2 includes a second peltier cooling submodule A21 and a second peltier cooling submodule B22 , both of which include a second peltier cooling submodule 221 .

本文中第二半导体制冷子模块A21和第二半导体制冷子模块B22独立加载电源,电源可以仅加载于第二半导体制冷子模块A21,或仅加载于第二半导体制冷子模块B22,或者同时加载于第二半导体制冷子模块A21和第二半导体制冷子模块B22。In this paper, the second semiconductor refrigeration sub-module A21 and the second semiconductor refrigeration sub-module B22 are independently loaded with power, and the power can be loaded only on the second semiconductor refrigeration sub-module A21, or only on the second semiconductor refrigeration sub-module B22, or both The second semiconductor refrigeration sub-module A21 and the second semiconductor refrigeration sub-module B22.

本文第一半导体制冷模块1、第二半导体制冷模块2形成温度梯度的原理是利用了半导体制冷片,半导体制冷片是一种由半导体所组成的冷却装置,其基于半导体材料的帕尔帖效应,当N型半导体和P型半导体串联组成电路并通有直流电时,在电偶的两端就会分别吸收热量和放出热量,实现温度控制的目的。其中帕尔贴效应是可逆的,改变电流方向时,放热和吸热的电偶也随之改变,并且吸收和放出的热量与电流强度成正比。相对于其他制冷和加热装置相比,半导体制冷片无运动部件可靠性较高。当然也可以用其它制冷和加热装置替换本文的中的半导体制冷片,只要能够使重熔的焊锡接头冷却凝固即可。The principle of the temperature gradient formed by the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module 2 in this paper is to use the semiconductor refrigeration sheet. The semiconductor refrigeration sheet is a cooling device composed of semiconductors, which is based on the Peltier effect of semiconductor materials. When the N-type semiconductor and the P-type semiconductor are connected in series to form a circuit and pass through a direct current, heat will be absorbed and released at both ends of the galvanic couple to achieve the purpose of temperature control. Among them, the Peltier effect is reversible. When the direction of the current is changed, the galvanic couple that releases heat and absorbs heat also changes, and the heat absorbed and released is proportional to the current intensity. Compared with other refrigeration and heating devices, semiconductor refrigeration chips have higher reliability without moving parts. Of course, other cooling and heating devices can also be used to replace the peltier in this article, as long as the remelted solder joint can be cooled and solidified.

为了能够达到更低温度,本文的第一半导体制冷子模块A11和第一半导体制冷子模块B12还包括第一冷却腔112,第二半导体制冷子模块A21和第二半导体制冷子模块B22还包括第二冷却腔212。In order to be able to achieve a lower temperature, the first semiconductor refrigeration sub-module A11 and the first semiconductor refrigeration sub-module B12 herein also include a first cooling cavity 112, and the second semiconductor refrigeration sub-module A21 and the second semiconductor refrigeration sub-module B22 also include a first semiconductor refrigeration sub-module B22. Two cooling chambers 212.

如图2所示,第一半导体制冷片111与第一冷却腔112层叠设置;第一半导体制冷片111和第一冷却腔112之间用第一盖板113电隔离并进行热传递。As shown in FIG. 2 , the first peltier refrigerating plate 111 and the first cooling cavity 112 are stacked; the first peltier cooling plate 111 and the first cooling cavity 112 are electrically isolated by a first cover plate 113 and conduct heat transfer.

为了保证传热性能,在第一冷却腔112与第一盖板113的接触面上涂有导热硅脂。In order to ensure heat transfer performance, thermal conductive silicone grease is coated on the contact surface between the first cooling chamber 112 and the first cover plate 113 .

如图3所示,第二半导体制冷片211与第二冷却腔212层叠设置;第二半导体制冷片211和第二冷却腔212之间用第二盖板213电隔离并进行热传递。As shown in FIG. 3 , the second semiconductor cooling plate 211 is stacked with the second cooling chamber 212 ; the second semiconductor cooling plate 211 and the second cooling cavity 212 are electrically isolated by a second cover plate 213 and conduct heat transfer.

同样,为了保证传热性能,在第二冷却腔212与第二盖板213的接触面上涂有导热硅脂。Similarly, in order to ensure the heat transfer performance, the contact surface between the second cooling cavity 212 and the second cover plate 213 is coated with thermal conductive silicone grease.

如图4所示,本文提供的第一冷却腔112、第二冷却腔212包括蛇形流管14,蛇形流管14置于冷却腔中央并使用密封槽15密封,蛇形流管14的两端分别开设有冷却水入口和冷却水出口。需要降低温度时,从冷却水入口通入冷却水并从冷却水出口流出,形成冷却循环。As shown in Figure 4, the first cooling chamber 112 and the second cooling chamber 212 provided herein include a serpentine flow pipe 14, the serpentine flow pipe 14 is placed in the center of the cooling chamber and sealed with a sealing groove 15, the serpentine flow pipe 14 A cooling water inlet and a cooling water outlet are respectively opened at both ends. When the temperature needs to be lowered, the cooling water is introduced from the cooling water inlet and flows out from the cooling water outlet to form a cooling cycle.

本文中的第一盖板113、第二盖板213为绝缘陶瓷盖板。The first cover plate 113 and the second cover plate 213 herein are insulating ceramic cover plates.

本文通过以下电源系统为第一焊盘3和第二焊盘4,以及第一半导体制冷模块1和第二半导体制冷模块2加载电源。In this paper, power is applied to the first pad 3 and the second pad 4 , as well as the first peltier cooling module 1 and the second peltier cooling module 2 through the following power supply system.

该电源系统包括:The power system includes:

上位机7,用于人机交互;The host computer 7 is used for human-computer interaction;

单片机8,用于与上位机7通信连接,根据接受到的上位机7发出的控制指令输出控制信号,并将接收到的数据上传至上位机7;The single-chip microcomputer 8 is used to communicate with the upper computer 7, output control signals according to the received control instructions sent by the upper computer 7, and upload the received data to the upper computer 7;

加热重熔电源9,正负极分别与第一焊盘3和第二焊盘4电连接;Heating and remelting power supply 9, the positive and negative poles are electrically connected to the first pad 3 and the second pad 4 respectively;

继电器10,串联于单片机8的信号输出端于加热重熔电源9之间,在单片机8输出控制信号时导通使单片机8输出的控制信号加载于加热重熔电源9,加热重熔电源9输出电源加载于第一焊盘3和第二焊盘4上;The relay 10 is connected in series between the signal output terminal of the single-chip microcomputer 8 and the heating and remelting power supply 9. When the single-chip microcomputer 8 outputs the control signal, it is turned on so that the control signal output by the single-chip microcomputer 8 is loaded on the heating and remelting power supply 9, and the heating and remelting power supply 9 outputs The power is loaded on the first pad 3 and the second pad 4;

数模转换器,与单片机8的信号输出端连接,用于将单片机8输出的数字信号转换成模拟信号分别加载于第一半导体制冷模块1、第二半导体制冷模块2上,作为第一半导体制冷模块1、第二半导体制冷模块2的工作电源,数模转换器与第一半导体制冷模块1、第二半导体制冷模块2对应匹配,用于独立为第一半导体制冷模块1、第二半导体制冷模块2提供工作电源。The digital-to-analog converter is connected to the signal output terminal of the single-chip microcomputer 8, and is used to convert the digital signal output by the single-chip microcomputer 8 into an analog signal and load it on the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module 2 respectively, as the first semiconductor refrigeration module The working power supply of module 1 and the second semiconductor refrigeration module 2, the digital-to-analog converter is matched with the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module 2, and is used to independently provide the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module 2 provide working power.

当第一半导体制冷模块1、第二半导体制冷模块2分别包括多个半导体制冷子模块时,数模转换器与半导体制冷子模块对应匹配,用于独立为各个半导体制冷子模块提供工作电源;当然也可以一个数模转换器为包括了多个半导体制冷子模块的半导体制冷模块提供工作电源,即一个数模转换器为多个半导体制冷子模块提供工作电源,但这多个半导体制冷子模块应同时被包括在第一半导体制冷模块1或第二半导体制冷模块2内。When the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module 2 respectively include a plurality of semiconductor refrigeration sub-modules, the digital-to-analog converters are correspondingly matched with the semiconductor refrigeration sub-modules, and are used to independently provide working power for each semiconductor refrigeration sub-module; of course It is also possible for a digital-to-analog converter to provide working power for a semiconductor refrigeration module including multiple semiconductor refrigeration sub-modules, that is, a digital-to-analog converter provides working power for multiple semiconductor refrigeration sub-modules, but these multiple semiconductor refrigeration sub-modules should At the same time, it is included in the first peltier module 1 or the second peltier module 2 .

为了使数模转换器能够输出恒流电源,保证半导体制冷模块稳定工作,本文数模转换器的输出还经运算放大器后加载于第一半导体制冷模块1或第二半导体制冷模块2;运算放大器的输出端还与单片机的信号输入端连接,单片机、数模转换器、运算放大器三者构成负反馈系统,单片机根据运算放大器输出的电流情况调整输出,使加载于第一半导体制冷模块1或第二半导体制冷模块2上的电流保持恒定。In order to enable the digital-to-analog converter to output a constant current power supply and ensure the stable operation of the semiconductor refrigeration module, the output of the digital-to-analog converter in this paper is also loaded on the first semiconductor refrigeration module 1 or the second semiconductor refrigeration module 2 after being passed through the operational amplifier; The output end is also connected to the signal input end of the single-chip microcomputer, and the single-chip microcomputer, the digital-to-analog converter, and the operational amplifier form a negative feedback system, and the single-chip microcomputer adjusts the output according to the current situation output by the operational amplifier, so that the load on the first semiconductor refrigeration module 1 or the second The current on the peltier module 2 remains constant.

在此,运算放大器与数模转换器数量相匹配,也可以不匹配。Here, the number of operational amplifiers and digital-to-analog converters may or may not be matched.

本文中的电源系统还包括与单片机通信连接的温度采集装置13,该温度采集装置11位于第一焊盘3和第二焊盘4形成的间隙的一侧,不与第一焊盘3、第二焊盘4接触。The power supply system herein also includes a temperature acquisition device 13 that is communicatively connected with the single-chip microcomputer. The second pad 4 contacts.

温度采集装置用于采集重熔过程中第一焊盘3和第二焊盘4之间的温度,并经单片机8上传至上位机7;工作人员根据上传的温度数据通过上位机7向单片机8输入控制指令,使继电器10切断的同时使单片机8输出信号经数模转换器后加载于第一半导体制冷模块1和第二半导体制冷模块2上,使第一半导体制冷模块1贴合于第一焊盘3的一面制热,第二半导体制冷模块2贴合于第二焊盘4的一面制冷。The temperature acquisition device is used to collect the temperature between the first pad 3 and the second pad 4 in the remelting process, and upload it to the host computer 7 through the single-chip microcomputer 8; Input the control command to cut off the relay 10, and at the same time make the output signal of the single chip microcomputer 8 be loaded on the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module 2 through the digital-to-analog converter, so that the first semiconductor refrigeration module 1 is attached to the first semiconductor refrigeration module. One side of the pad 3 is heated, and the side of the second semiconductor refrigeration module 2 bonded to the second pad 4 is cooled.

温度传感器、单片机和半导体制冷模块共同组成闭环PID控制系统,焊锡接头重新凝固时工作人员通过上位机输入温度梯度的数据到单片机,单片机收到指令后给第一半导体制冷模块和第二半导体制冷模块输入控制电流,温度采集装置将装置的温度场数据返回到单片机中,单片机通过PID算法调整输出到第一半导体制冷模块和第二半导体制冷模块使两者之间的温度梯度达到用户需求。The temperature sensor, single-chip microcomputer and semiconductor refrigeration module together form a closed-loop PID control system. When the solder joint is re-solidified, the staff inputs the temperature gradient data to the single-chip microcomputer through the host computer, and the single-chip microcomputer sends the first semiconductor refrigeration module and the second semiconductor refrigeration module Input the control current, the temperature acquisition device returns the temperature field data of the device to the single-chip microcomputer, and the single-chip microcomputer adjusts the output to the first semiconductor refrigeration module and the second semiconductor refrigeration module through the PID algorithm to make the temperature gradient between the two meet the user's needs.

该温度采集装置在此采用红外摄像仪,当然也可以采用其它可以采集温度的装置。The temperature collection device here uses an infrared camera, and of course other devices capable of collecting temperature can also be used.

工作人员根据上传的温度数据通过上位机向单片机输入控制指令控制加载于第一半导体制冷模块1和/或第二半导体制冷模块2上的电流大小,用于调节第一半导体制冷模块1和第二半导体制冷模块2之间的温度梯度。According to the uploaded temperature data, the staff input control instructions to the single-chip microcomputer through the host computer to control the magnitude of the current loaded on the first semiconductor refrigeration module 1 and/or the second semiconductor refrigeration module 2, which is used to adjust the first semiconductor refrigeration module 1 and the second semiconductor refrigeration module. Temperature gradient between peltier modules 2.

通过上位机实现了人机交互,在焊锡接头凝固时施加一个可控的温度梯度。Human-computer interaction is realized through the host computer, and a controllable temperature gradient is applied when the solder joint is solidified.

本文提供的装置还包括与上位机通信连接的冷却水循环机,冷却水循环机用于向第一冷却腔、第二冷却腔提供冷却水。本文采用的冷却水循环机为独立冷却水循环机,通过USB口直接与上位机连接,通过安装在上位机上的软件手动操作控制冷却水循环机的冷却水流速,使第一半导体制冷模块和第二半导体制冷模块之间的温度梯度达到用户需求。The device provided herein also includes a cooling water circulation machine communicated with the host computer, and the cooling water circulation machine is used to provide cooling water to the first cooling cavity and the second cooling cavity. The cooling water cycle machine used in this paper is an independent cooling water cycle machine, which is directly connected to the host computer through the USB port, and the cooling water flow rate of the cooling water cycle machine is manually controlled through the software installed on the host computer, so that the first semiconductor refrigeration module and the second semiconductor refrigeration module The temperature gradient between modules meets user requirements.

本文在进行重熔、凝固时,需要将第一焊盘、焊锡接头、待焊接件和第二焊盘在加热重熔前通过真空钎焊焊接连接,此处的真空钎焊焊接连接可以采用任何一种,在此采用以下真空钎焊:In this paper, when remelting and solidifying, it is necessary to connect the first pad, the solder joint, the piece to be welded, and the second pad by vacuum brazing before heating and remelting. The vacuum brazing connection here can use any One, where the following vacuum brazing is used:

步骤S11:将焊锡材料用10%的NaOH溶液浸蚀10min保持溶液温度40~60℃,其次在硝酸+氢氟酸溶液中浸蚀5min;Step S11: Etch the solder material with 10% NaOH solution for 10 minutes to keep the solution temperature at 40-60°C, and then etch it in nitric acid + hydrofluoric acid solution for 5 minutes;

步骤S12:将经步骤S11处理后的焊锡材料放置于第一焊盘、焊锡接头、待焊接件和第二焊盘之间的焊点处,装配好后放置于真空钎焊炉中,并提供一定的外在压力,待钎焊炉内真空抽至6×10^(-3)Pa以下时开始升温加热到钎焊温度进行钎焊,钎焊结束后试样随炉冷却到室温后取出。Step S12: Place the solder material processed in step S11 on the solder joint between the first pad, the solder joint, the piece to be welded and the second pad, place it in a vacuum brazing furnace after assembly, and provide Under a certain external pressure, when the vacuum in the brazing furnace is pumped below 6×10^(-3)Pa, it starts to heat up to the brazing temperature for brazing. After the brazing is completed, the sample is cooled to room temperature with the furnace and taken out.

本文采用真空钎焊可以保证焊接过程中不会发生氧化,采用其它焊接方式替换同样可以。In this paper, vacuum brazing can be used to ensure that oxidation will not occur during the welding process, and other welding methods can also be used to replace it.

为了保证在重熔、凝固过程中待焊接件6不会脱落,在重熔、凝固过程中采用压力加载装置施加压力于第一焊盘、第二焊盘、焊锡接头和待焊接件两端,使焊锡接头端面与第一焊盘之间,以及待焊接件以及待焊接件与第二焊盘之间在加热重熔过程中始终压紧。压力加载装置并非特殊,只要保证加热重熔过程中焊接件不脱落就可以了。In order to ensure that the part 6 to be welded will not fall off during the remelting and solidification process, a pressure loading device is used to apply pressure to the first pad, the second pad, the solder joint and both ends of the part to be welded during the remelting and solidification process. The end surface of the solder joint and the first pad, as well as between the part to be welded and the part to be welded and the second pad are always compressed during the heating and remelting process. The pressure loading device is not special, as long as the weldment does not fall off during the heating and remelting process.

本文提供的分区电流驱动重熔与半导体温控定向凝固装置,克服了传统金属焊接工艺中晶粒取向不可控的问题,提高了焊接处的可靠性;利用本文提供的装置对IGBT高功率元器件进行制造,解决了IGBT高功率元器件在制造过程中焊锡接头的晶粒取向在焊接过程中发散且无法控制,造在成热疲劳下高电流密度条件下,铜锡晶体产生扁平化,极化生长的现象,降低了电路元件的可靠性的问题。The partitioned current-driven remelting and semiconductor temperature-controlled directional solidification device provided in this paper overcomes the problem of uncontrollable grain orientation in the traditional metal welding process and improves the reliability of the welding joint; the device provided in this paper is used for IGBT high-power components Manufactured to solve the problem that the grain orientation of the solder joints of IGBT high-power components diverges and cannot be controlled during the welding process, resulting in flattening and polarization of copper-tin crystals under high current density conditions under thermal fatigue growth phenomenon that reduces the reliability of circuit components.

本公开已由上述相关实施例加以描述,然而上述实施例仅为实施本公开的范例。必需指出的是,已揭露的实施例并未限制本公开的范围。相反,在不脱离本公开的精神和范围内所作的变动与润饰,均属本公开的专利保护范围。The present disclosure has been described by the above-mentioned related embodiments, but the above-mentioned embodiments are only examples for implementing the present disclosure. It must be pointed out that the disclosed embodiments do not limit the scope of the present disclosure. On the contrary, changes and modifications made without departing from the spirit and scope of the present disclosure all belong to the patent protection scope of the present disclosure.

Claims (10)

1. A current-driven remelting and semiconductor temperature control directional solidification device is characterized in that: the device comprises a first semiconductor refrigeration module (1), a second semiconductor refrigeration module (2), a first bonding pad (3), a second bonding pad (4) and a soldering joint (5); the first semiconductor refrigeration module (1) is in fit contact with the upper surface of the first bonding pad (3), the second semiconductor refrigeration module (2) is in fit contact with the lower surface of the second bonding pad (4), and the first bonding pad (3) and the second bonding pad (4) are oppositely arranged; when the power supply is loaded, the first bonding pad (3) and the second bonding pad (4) are resistive, the soldering tin joint (5) is melted again after being electrically heated, and soldering tin is in a flowing state; when the power supply is loaded, the first semiconductor refrigeration module (1) is attached to one surface of the first bonding pad (3) for heating; and the second semiconductor refrigeration module (2) is attached to one surface of the second bonding pad (4) for refrigeration when a power supply is loaded, and a temperature gradient is formed in the cooling process of the soldering tin joint (5) so as to rearrange the grain orientation of the soldering tin joint (5).
2. The current-driven reflow and semiconductor temperature-controlled directional solidification apparatus of claim 1 wherein: the first semiconductor refrigeration module (1) comprises a first semiconductor refrigeration sub-module A (11) and a first semiconductor refrigeration sub-module B (12), and the first semiconductor refrigeration sub-module A (11) and the first semiconductor refrigeration sub-module B (12) comprise a first semiconductor refrigeration sheet (111).
3. The current-driven remelting and semiconductor temperature-controlled directional solidification apparatus of claim 2 wherein: the first semiconductor refrigeration sub-module A (11) and the first semiconductor refrigeration sub-module B (12) further comprise a first cooling cavity (112), and the first semiconductor refrigeration sheet (111) and the first cooling cavity (112) are arranged in a stacked mode; the first semiconductor refrigerating sheet (111) and the first cooling cavity (112) are electrically isolated by a first cover plate (113) and are subjected to heat transfer.
4. The current-driven reflow and semiconductor temperature-controlled directional solidification apparatus of claim 1 wherein: the second semiconductor refrigeration module (2) comprises a second semiconductor refrigeration sub-module A (21) and a second semiconductor refrigeration sub-module B (22), and the second semiconductor refrigeration sub-module A (21) and the second semiconductor refrigeration sub-module B (22) comprise second semiconductor refrigeration sheets (211).
5. The current-driven reflow and semiconductor temperature-controlled directional solidification apparatus of claim 4 wherein: the second semiconductor refrigeration sub-module A (21) and the second semiconductor refrigeration sub-module B (22) further comprise a second cooling cavity (212), and the second semiconductor refrigeration piece (211) and the second cooling cavity (212) are stacked; the second semiconductor refrigerating sheet (211) and the second cooling cavity (212) are electrically isolated by a second cover plate (213) and are used for heat transfer.
6. The current-driven reflow and semiconductor temperature-controlled directional solidification apparatus of claim 4 wherein: the second semiconductor refrigeration sub-module A (21) and the second semiconductor refrigeration sub-module B (22) independently load power, and the power can be loaded on the second semiconductor refrigeration sub-module A (21) only, the second semiconductor refrigeration sub-module B (22) only or the second semiconductor refrigeration sub-module A (21) and the second semiconductor refrigeration sub-module B (22) simultaneously.
7. The current-driven remelting and semiconductor temperature-controlled directional solidification apparatus of any one of claims 1-6 wherein: the semiconductor refrigerating module further comprises a power supply system, wherein power output by the power supply system is loaded on the first bonding pad (3) and the second bonding pad (4) on one hand, and on the other hand, the power output by the power supply system is loaded on the first semiconductor refrigerating module (1) and the second semiconductor refrigerating module (2) on the other hand.
8. The current-driven reflow and semiconductor temperature-controlled directional solidification apparatus of claim 7, wherein the power system comprises:
the upper computer is used for man-machine interaction;
the singlechip is used for being in communication connection with the upper computer, outputting a control signal according to a received control instruction sent by the upper computer, and uploading received data to the upper computer;
a heating remelting power supply, wherein the anode and the cathode are respectively electrically connected with the first bonding pad (3) and the second bonding pad (4); the relay is connected in series between the heating remelting power supplies at the signal output end of the singlechip, and is conducted when the singlechip outputs a control signal so that the control signal output by the singlechip is loaded on the heating remelting power supplies, and the heating remelting power supply output power supplies are loaded on the first bonding pad (3) and the second bonding pad (4); the digital-analog converter is connected with the signal output end of the singlechip and is used for converting digital signals output by the singlechip into analog signals which are respectively loaded on the first semiconductor refrigeration module (1) and the second semiconductor refrigeration module (2).
9. The current-driven reflow and semiconductor temperature-controlled directional solidification apparatus of claim 8 wherein: the power supply system further comprises a temperature acquisition device which is in communication connection with the singlechip, wherein the temperature acquisition device is used for acquiring the temperature between the first bonding pad (3) and the second bonding pad (4) in the remelting process and uploading the temperature to the upper computer through the singlechip; according to the uploaded temperature data, a control instruction is input to the singlechip through the upper computer, so that the relay is cut off, meanwhile, an output signal of the singlechip is loaded on the first semiconductor refrigeration module (1) and the second semiconductor refrigeration module (2) after passing through the digital-to-analog converter, the first semiconductor refrigeration module (1) is attached to one side of the first bonding pad (3) for heating, and the second semiconductor refrigeration module (2) is attached to one side of the second bonding pad (4) for refrigerating.
10. A method of controlling grain orientation based on semiconductor temperature control, comprising a current driven remelting and semiconductor temperature controlled directional solidification apparatus according to any one of claims 1-9, characterized in that the method comprises the steps of:
step S1: the first bonding pad, the soldering joint, the piece to be welded and the second bonding pad are welded and connected through vacuum brazing before heating and remelting;
step S2: loading the power source on the first bonding pad, and generating Joule heat to remelt the soldering joint after the soldering joint is electrified;
step S3: after a certain time, the power source is loaded on the first semiconductor refrigeration module and the second semiconductor refrigeration module, so that one surface of the first semiconductor refrigeration module attached to the first bonding pad heats, and the other surface of the second semiconductor refrigeration module attached to the second bonding pad refrigerates, and a temperature gradient is formed in the cooling process of the soldering joint.
CN202011084546.1A 2020-10-12 2020-10-12 A Grain Orientation Control Method Based on Semiconductor Temperature Control Active CN112151401B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011084546.1A CN112151401B (en) 2020-10-12 2020-10-12 A Grain Orientation Control Method Based on Semiconductor Temperature Control

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011084546.1A CN112151401B (en) 2020-10-12 2020-10-12 A Grain Orientation Control Method Based on Semiconductor Temperature Control

Publications (2)

Publication Number Publication Date
CN112151401A CN112151401A (en) 2020-12-29
CN112151401B true CN112151401B (en) 2023-08-18

Family

ID=73951478

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011084546.1A Active CN112151401B (en) 2020-10-12 2020-10-12 A Grain Orientation Control Method Based on Semiconductor Temperature Control

Country Status (1)

Country Link
CN (1) CN112151401B (en)

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4998002A (en) * 1987-01-26 1991-03-05 Hitachi, Ltd. Wire-bonding method, wire-bonding apparatus, and semiconductor device produced by the wire-bonding method
US5031821A (en) * 1988-08-19 1991-07-16 Hitachi, Ltd. Semiconductor integrated circuit device, method for producing or assembling same, and producing or assembling apparatus for use in the method
US5079618A (en) * 1990-06-12 1992-01-07 Micron Technology, Inc. Semiconductor device structures cooled by Peltier junctions and electrical interconnect assemblies
JPH10313020A (en) * 1997-05-13 1998-11-24 Toshiba Corp Manufacturing method of semiconductor device
US6586835B1 (en) * 1998-08-31 2003-07-01 Micron Technology, Inc. Compact system module with built-in thermoelectric cooling
CN1582395A (en) * 2001-11-02 2005-02-16 佛姆费克托公司 Method and system for compensating thermally induced motion of probe cards
JP2005268473A (en) * 2004-03-18 2005-09-29 Ricoh Microelectronics Co Ltd Manufacturing method of member for extension boards
CN101208799A (en) * 2005-06-30 2008-06-25 英特尔公司 Electromigration-resistant and compliant wire interconnects, nano-sized solder compositions, systems made thereof, and methods of assembling soldered packages
JP2008166680A (en) * 2006-12-05 2008-07-17 Toyota Industries Corp Semiconductor device and method of manufacturing the same
TW201015683A (en) * 2008-09-24 2010-04-16 Maxim Integrated Products High-electrical-current wafer level packaging, high-electrical-current WLP electronic devices, and methods of manufacture thereof
CN102901265A (en) * 2012-09-28 2013-01-30 杭州电子科技大学 Adsorption device for semiconductor refrigeration
CN103972165A (en) * 2014-05-24 2014-08-06 哈尔滨工业大学 Method for achieving silicon through hole laminated chip interconnection
CN104716058A (en) * 2015-02-09 2015-06-17 大连理工大学 Manufacturing method and structure for all-intermetallic compound interconnection welding spot for flip chip
JP2016165739A (en) * 2015-03-09 2016-09-15 富士通株式会社 Electronic device and manufacturing method of the same
CN106513890A (en) * 2016-11-17 2017-03-22 大连理工大学 Method for preparing electronic packaging microscale solder joints
CN107138820A (en) * 2017-05-05 2017-09-08 北京工业大学 It is a kind of to ensure that docking monocrystalline solder joint crystal grain is orientated consistent method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7234218B2 (en) * 2005-03-08 2007-06-26 International Business Machines Corporation Method for separating electronic component from organic board
KR100729362B1 (en) * 2006-04-27 2007-06-15 삼성전자주식회사 A semiconductor package having a heat dissipation device directly connected to an internal circuit and a method of manufacturing the same
US7855397B2 (en) * 2007-09-14 2010-12-21 Nextreme Thermal Solutions, Inc. Electronic assemblies providing active side heat pumping
KR20090081472A (en) * 2008-01-24 2009-07-29 삼성전자주식회사 Mounting board and manufacturing method of semiconductor package using same
JP6028449B2 (en) * 2011-10-05 2016-11-16 富士通株式会社 Semiconductor device, electronic device, and manufacturing method of semiconductor device
US9190375B2 (en) * 2014-04-09 2015-11-17 GlobalFoundries, Inc. Solder bump reflow by induction heating
JP2020035960A (en) * 2018-08-31 2020-03-05 株式会社ジェイテクト Joint device and joint manufacturing method

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4998002A (en) * 1987-01-26 1991-03-05 Hitachi, Ltd. Wire-bonding method, wire-bonding apparatus, and semiconductor device produced by the wire-bonding method
US5031821A (en) * 1988-08-19 1991-07-16 Hitachi, Ltd. Semiconductor integrated circuit device, method for producing or assembling same, and producing or assembling apparatus for use in the method
US5079618A (en) * 1990-06-12 1992-01-07 Micron Technology, Inc. Semiconductor device structures cooled by Peltier junctions and electrical interconnect assemblies
JPH10313020A (en) * 1997-05-13 1998-11-24 Toshiba Corp Manufacturing method of semiconductor device
US6586835B1 (en) * 1998-08-31 2003-07-01 Micron Technology, Inc. Compact system module with built-in thermoelectric cooling
CN1582395A (en) * 2001-11-02 2005-02-16 佛姆费克托公司 Method and system for compensating thermally induced motion of probe cards
JP2005268473A (en) * 2004-03-18 2005-09-29 Ricoh Microelectronics Co Ltd Manufacturing method of member for extension boards
CN101208799A (en) * 2005-06-30 2008-06-25 英特尔公司 Electromigration-resistant and compliant wire interconnects, nano-sized solder compositions, systems made thereof, and methods of assembling soldered packages
JP2008166680A (en) * 2006-12-05 2008-07-17 Toyota Industries Corp Semiconductor device and method of manufacturing the same
TW201015683A (en) * 2008-09-24 2010-04-16 Maxim Integrated Products High-electrical-current wafer level packaging, high-electrical-current WLP electronic devices, and methods of manufacture thereof
CN102901265A (en) * 2012-09-28 2013-01-30 杭州电子科技大学 Adsorption device for semiconductor refrigeration
CN103972165A (en) * 2014-05-24 2014-08-06 哈尔滨工业大学 Method for achieving silicon through hole laminated chip interconnection
CN104716058A (en) * 2015-02-09 2015-06-17 大连理工大学 Manufacturing method and structure for all-intermetallic compound interconnection welding spot for flip chip
JP2016165739A (en) * 2015-03-09 2016-09-15 富士通株式会社 Electronic device and manufacturing method of the same
CN106513890A (en) * 2016-11-17 2017-03-22 大连理工大学 Method for preparing electronic packaging microscale solder joints
CN107138820A (en) * 2017-05-05 2017-09-08 北京工业大学 It is a kind of to ensure that docking monocrystalline solder joint crystal grain is orientated consistent method

Also Published As

Publication number Publication date
CN112151401A (en) 2020-12-29

Similar Documents

Publication Publication Date Title
US6767766B2 (en) Electronic module with integrated programmable thermoelectric cooling assembly and method of fabrication
JP6041469B2 (en) Method for forming high melting point solder layer
CN101431207B (en) Method of Welding Laser Crystal Lath and Heat Sink
WO2023246214A1 (en) Power module and manufacturing method therefor
CN107887368A (en) Using the method for the two-sided interconnection silicon substrate IGBT module of low-temperature sintering Nano Silver
CN111902931B (en) Method and manufacturing system for assembling semiconductor power modules or components
JP2005317648A (en) Thermoelectric conversion module
CN103579413B (en) The rework system of vacuum back-flow emptying
CN107910324A (en) A kind of modularized encapsulation method based on the two-sided interconnecting silicon carbide MOS device of nano mattisolda
CN112151401B (en) A Grain Orientation Control Method Based on Semiconductor Temperature Control
JP6405999B2 (en) Chip bonding apparatus and chip bonding method
CN101593712B (en) Low-temperature sintering method for high-power chip connection and nano silver paste thickness control device
TWI301880B (en) Power circuitry with a thermionic cooling system
JP6815678B1 (en) Electronic component sintering equipment and methods
CN106856180A (en) A kind of method for welding IGBT module
CN209328886U (en) The Advanced Packaging structure of graphene-based IPM module
JP7450769B2 (en) Method of manufacturing a semiconductor device, method of manufacturing a substrate for a semiconductor device, semiconductor device and power conversion device
CN101719747A (en) Separated cold/hot end novel n-type temperature-difference power generation module and method for manufacturing same
CN103996631A (en) Method of manufacturing a semiconductor device
CN109786345B (en) Advanced packaging structure and processing technology of graphene-based IPM module
CN102157673A (en) Method for manufacturing heat-resisting temperature differential thermoelectric component
JPH07221352A (en) Layered thermoelectric conversion device, subunit for thermoelectric power generation, and power generating unit
KR102459361B1 (en) Power module package
JP2024025271A (en) Manufacturing method of semiconductor module
JP6675622B1 (en) Electronic component sintering apparatus and method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant