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CN112125654A - 一种光电镀膜材料 - Google Patents

一种光电镀膜材料 Download PDF

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CN112125654A
CN112125654A CN201910552746.6A CN201910552746A CN112125654A CN 112125654 A CN112125654 A CN 112125654A CN 201910552746 A CN201910552746 A CN 201910552746A CN 112125654 A CN112125654 A CN 112125654A
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coating material
nitride
titanate
photoelectric
parts
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徐永华
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Hunan Shengyun Electronics Co ltd
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Hunan Shengyun Electronics Co ltd
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Abstract

本发明提供一种光电镀膜材料，包括下述组分：二氧化硅、二氧化锆、三氧化钨、钛酸盐、氟化铬、冰晶石、氮化物。本发明提供一种光电镀膜材料，通过特定的配方及其配比，采用多种原料相互配合，相互协调，使得本发明的光电镀膜材料光学性能和机械性能大大提高，能够满足现有的生产需求，且能够持久耐用。

Description

一种光电镀膜材料
技术领域
本发明属于光电镀膜材料技术领域，具体为一种光电镀膜材料。
背景技术
光电镀膜材料是指在光学零件表面上镀上一层或多层薄膜材料。常用的镀膜法有真空镀膜(物理镀膜的一种)和化学镀膜。
随着薄膜在光学、激光器等方面的应用日益扩大，对光电镀膜材料的光学和机械性能要求越来越高，研制一种光学性能好、机械性能好，且耐用的光电镀膜材料已成为当今薄膜的重要趋势。
发明内容
为解决上述问题，本发明的目的在于提供一种光电镀膜材料。
本发明所采取的技术方案是：
本发明提供一种光电镀膜材料，包括下述组分：二氧化硅、二氧化锆、三氧化钨、钛酸盐、氟化铬、冰晶石、氮化物。
作为本发明的进一步方案，以重量份数计，所述光电镀膜材料包括：二氧化硅5-10份、二氧化锆3-5份、三氧化钨1-2份、钛酸盐0.5-1份、氟化铬0.2-0.3份、冰晶石0.3-0.5份、氮化物0.5-1份。
作为本发明的进一步方案，所述氮化物包括氮化硼和氮化硅。
作为本发明的进一步方案，以重量百分数计，氮化物包括氮化硼30-40%和氮化硅60-70%。
作为本发明的进一步方案，钛酸盐包括钛酸锌和钛酸镁。
作为本发明的进一步方案，以重量百分数计，钛酸盐包括钛酸锌45-50%和钛酸镁50-55%。
作为本发明的进一步方案，所述光学镀膜材料在真空条件下烧结，其烧结温度为800-1500℃。
作为本发明的进一步方案，所述光学镀膜材料的形式为颗粒状、片状或者板状。
本发明的有益效果在于：
本发明提供一种光电镀膜材料，通过特定的配方及其配比，采用多种原料相互配合，相互协调，使得本发明的光电镀膜材料光学性能和机械性能大大提高，能够满足现有的生产需求，且能够持久耐用。
具体实施方式
以下将结合实施例对本发明的构思、具体结构及产生的技术效果进行清楚、完整地描述，以充分地理解本发明的目的、特征和效果。显然，所描述的实施例只是本发明的一部分实施例，而不是全部实施例，基于本发明的实施例，本领域的技术人员在不付出创造性劳动的前提下所获得的其他实施例，均属于本发明保护的范围。
实施例1
本发明实施例1提供一种光电镀膜材料，包括下述组分：二氧化硅、二氧化锆、三氧化钨、钛酸盐、氟化铬、冰晶石、氮化物。
以重量份数计，所述光电镀膜材料包括：二氧化硅5份、二氧化锆3份、三氧化钨1份、钛酸盐0.5份、氟化铬0.2份、冰晶石0.3份、氮化物0.5-1份。
所述氮化物包括氮化硼和氮化硅。
以重量百分数计，氮化物包括氮化硼30%和氮化硅70%。
钛酸盐包括钛酸锌和钛酸镁。
以重量百分数计，钛酸盐包括钛酸锌45%和钛酸镁55%。
所述光学镀膜材料在真空条件下烧结，其烧结温度为1500℃。
所述光学镀膜材料的形式可以为颗粒状、片状或者板状。
实施例2
本发明实施例2提供一种光电镀膜材料，包括下述组分：二氧化硅、二氧化锆、三氧化钨、钛酸盐、氟化铬、冰晶石、氮化物。
以重量份数计，所述光电镀膜材料包括：二氧化硅10份、二氧化锆5份、三氧化钨2份、钛酸盐1份、氟化铬0.3份、冰晶石0.5份、氮化物0.5-1份。
所述氮化物包括氮化硼和氮化硅。
以重量百分数计，氮化物包括氮化硼40%和氮化硅60%。
钛酸盐包括钛酸锌和钛酸镁。
以重量百分数计，钛酸盐包括钛酸锌50%和钛酸镁50%。
所述光学镀膜材料在真空条件下烧结，其烧结温度为1500℃。
所述光学镀膜材料的形式可以为颗粒状、片状或者板状。
实施例3
本发明实施例3提供一种光电镀膜材料，包括下述组分：二氧化硅、二氧化锆、三氧化钨、钛酸盐、氟化铬、冰晶石、氮化物。
以重量份数计，所述光电镀膜材料包括：二氧化硅8份、二氧化锆4份、三氧化钨1.5份、钛酸盐0.6份、氟化铬0.15份、冰晶石0.4份、氮化物0.6份。
所述氮化物包括氮化硼和氮化硅。
以重量百分数计，氮化物包括氮化硼40%和氮化硅60%。
钛酸盐包括钛酸锌和钛酸镁。
以重量百分数计，钛酸盐包括钛酸锌45%和钛酸镁55%。
所述光学镀膜材料在真空条件下烧结，其烧结温度为1200℃。
所述光学镀膜材料的形式可以为颗粒状、片状或者板状。
需要说明的是，在整个申请文件中，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、物品或者设备所固有的要素。
本文中应用了具体个例对本发明的原理及实施方式进行了阐述，以上实例的说明只是用于帮助理解本发明的方法及其核心思想。以上仅是本发明的优选实施方式，应当指出，由于文字表达的有限性，而客观上存在无限的试试方式，对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进、润饰或变化，也可以将上述技术特征以适当的方式进行组合；这些改进润饰、变化或组合，或未经改进将发明的构思和技术方案直接应用于其它场合的，均应视为本发明的保护范围。

Claims (8)

1.一种光电镀膜材料,其特征在于，包括下述组分：二氧化硅、二氧化锆、三氧化钨、钛酸盐、氟化铬、冰晶石、氮化物。
2.根据权利要求1所述的光电镀膜材料，其特征在于，以重量份数计，所述光电镀膜材料包括：二氧化硅5-10份、二氧化锆3-5份、三氧化钨1-2份、钛酸盐0.5-1份、氟化铬0.2-0.3份、冰晶石0.3-0.5份、氮化物0.5-1份。
3.根据权利要求1所述的光电镀膜材料，其特征在于，所述氮化物包括氮化硼和氮化硅。
4.根据权利要求3所述的光电镀膜材料，其特征在于，以重量百分数计，氮化物包括氮化硼30-40%和氮化硅60-70%。
5.根据权利要求1所述的光电镀膜材料，其特征在于，钛酸盐包括钛酸锌和钛酸镁。
6.根据权利要求5所述的光电镀膜材料，其特征在于，以重量百分数计，钛酸盐包括钛酸锌45-50%和钛酸镁50-55%。
7.根据权利要求1所述的光电镀膜材料，其特征在于，所述光学镀膜材料在真空条件下烧结，其烧结温度为800-1500℃。
8.根据权利要求1所述的光电镀膜材料，其特征在于，所述光学镀膜材料的形式为颗粒状、片状或者板状。
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN114133226A (zh) * 2021-12-30 2022-03-04 苏州晶生新材料有限公司 一种光学镀层基材及使用方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114133226A (zh) * 2021-12-30 2022-03-04 苏州晶生新材料有限公司 一种光学镀层基材及使用方法

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