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CN112103384A - Mini LED screen structure and packaging method thereof - Google Patents

Mini LED screen structure and packaging method thereof Download PDF

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Publication number
CN112103384A
CN112103384A CN202011009199.6A CN202011009199A CN112103384A CN 112103384 A CN112103384 A CN 112103384A CN 202011009199 A CN202011009199 A CN 202011009199A CN 112103384 A CN112103384 A CN 112103384A
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led light
film
packaging
water
driving device
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温质康
庄丹丹
乔小平
苏智昱
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Fujian Huajiacai Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/855Optical field-shaping means, e.g. lenses
    • H10H20/856Reflecting means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • H10H20/852Encapsulations
    • H10H20/854Encapsulations characterised by their material, e.g. epoxy or silicone resins
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H10H29/14Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
    • H10H29/142Two-dimensional arrangements, e.g. asymmetric LED layout
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0362Manufacture or treatment of packages of encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/036Manufacture or treatment of packages
    • H10H20/0363Manufacture or treatment of packages of optical field-shaping means

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Abstract

本发明公开了一种Mini LED屏的封装方法,制作TFT驱动器件,在TFT驱动器件背面上制作金属反射薄膜,TFT驱动器件的电极穿过金属反射薄膜;金属反射薄膜上制作LED发光单元,LED发光单元的电极与TFT驱动器件的电极连接,LED发光单元阵列排布于金属反射薄膜上;制作封装胶,封装胶高度低于LED发光单元的高度;制作透明的水氧吸收层,水氧吸收层覆盖于封装胶和LED发光单元上;在水氧吸收层上制作氮化物封装薄膜。起到保护Mini LED芯片,延长Mini LED屏寿命的作用,氮化物封装薄膜隔离外部水氧的进入,金属反射薄膜将光线向TFT驱动器件发射的光反射回到屏幕出光的方向,增加显示器的亮度。

Figure 202011009199

The invention discloses a packaging method for a Mini LED screen. A TFT driving device is produced, a metal reflective film is formed on the back of the TFT driving device, the electrodes of the TFT driving device pass through the metal reflective film; an LED light-emitting unit is fabricated on the metal reflective film, and the LED The electrode of the light-emitting unit is connected with the electrode of the TFT driving device, and the LED light-emitting unit array is arranged on the metal reflective film; the packaging glue is made, and the height of the sealing glue is lower than the height of the LED light-emitting unit; the transparent water and oxygen absorption layer is made to absorb water and oxygen The layer is covered on the encapsulation glue and the LED light-emitting unit; the nitride encapsulation film is made on the water and oxygen absorption layer. It protects the Mini LED chip and prolongs the life of the Mini LED screen. The nitride encapsulation film isolates the entry of external water and oxygen, and the metal reflective film reflects the light emitted by the TFT drive device back to the direction of the screen, increasing the brightness of the display. .

Figure 202011009199

Description

一种Mini LED屏结构及其封装方法A Mini LED screen structure and its packaging method

技术领域technical field

本发明属于Mini LED屏领域,尤其涉及一种Mini LED屏结构及其封装方法。The invention belongs to the field of Mini LED screens, and in particular relates to a Mini LED screen structure and a packaging method thereof.

背景技术Background technique

Mini LED(mini Light Emitting Diode)即次毫米发光二极管,其特点使轻薄、功耗低、柔性好可弯曲度高、色域范围好,能精细调节调光分区能,达到更高的HDR、对比度高,并可实现窄边框全面屏显示器件,现已成为市场关注的焦点。Mini LED (mini Light Emitting Diode) is a sub-millimeter light-emitting diode, which is characterized by lightness and thinness, low power consumption, good flexibility, high bendability, good color gamut range, and can finely adjust the dimming zone performance to achieve higher HDR and contrast. It has become the focus of market attention now.

Mini LED背光源技术采用倒装封装的形式,避免传统的侧入式背光需要透镜二次光学设计,实现均匀混光,到达更高的对比度效果;并且Mini LED的背光通过阵列驱动实现动态的区域调光,实现更高精细的调色,使LCD屏幕对比度更高,提高了画面显示效果;Mini LED backlight technology adopts the form of flip-chip packaging, which avoids the need for lens secondary optical design in traditional edge-lit backlights, achieves uniform light mixing, and achieves higher contrast effects; and Mini LED backlights are driven by arrays to achieve dynamic areas. Dimming, to achieve higher and finer toning, make the LCD screen higher contrast, improve the screen display effect;

Mini LED背光亮度高,相比OLED功耗高,现当下采用在背光源的金属板上贴反射膜,将LED照射在金属板上的光通过发射膜反射到LCD基板上,来提高LED的光利用率,实现更加精细的高亮度调光;但是反射膜造价高,张贴反射膜增加了产品成本,增加了工艺步骤;Mini LED backlight has high brightness and higher power consumption than OLED. Currently, a reflective film is attached to the metal plate of the backlight source, and the light irradiated by the LED on the metal plate is reflected on the LCD substrate through the emissive film to improve the light of the LED. The utilization rate is high, and more precise high-brightness dimming is realized; however, the cost of the reflective film is high, and the posting of the reflective film increases the cost of the product and the process steps;

目前MinilLED屏幕多采用金属氧化物TFT驱动,但是金属氧化物TFT采用IGZO薄膜作为有源层,IGZO薄膜水氧很敏感,并且MiniLED显示屏的封装工艺中,LED灯固定后进行硅胶涂布封装,硅胶对水氧的阻隔能力较差,LED芯片的侧边容易受到水汽的侵蚀,而且下层的TFT驱动中的有源层IGZO薄膜容易因为水氧的侵染导致器件失效。At present, MinilLED screens are mostly driven by metal oxide TFTs, but metal oxide TFTs use IGZO film as the active layer. IGZO film is very sensitive to water and oxygen, and in the packaging process of MiniLED display, the LED lamp is fixed and then coated with silica gel for packaging. Silica gel has poor blocking ability to water and oxygen, and the side of the LED chip is easily eroded by water vapor, and the active layer IGZO film in the underlying TFT driver is prone to device failure due to water and oxygen infection.

发明内容SUMMARY OF THE INVENTION

为此,需要提供一种Mini LED屏结构及其封装方法,提高Mini LED屏的亮度,更加精细的调节调光分区,提高液晶显示屏的对比度,并且使Mini LED屏具备良好的隔绝水氧和吸收已侵入薄膜水氧的能力,提高了金属反射薄膜和TFT驱动器件的稳定性和使用寿命,从而实现更高亮度的显示效果。To this end, it is necessary to provide a Mini LED screen structure and its packaging method, which can improve the brightness of the Mini LED screen, adjust the dimming zone more finely, improve the contrast of the liquid crystal display, and enable the Mini LED screen to have good isolation of water, oxygen and The ability to absorb water and oxygen that has invaded the film improves the stability and service life of the metal reflective film and the TFT drive device, thereby achieving a higher brightness display effect.

为实现上述目的,本申请提供了一种Mini LED屏的封装方法,包括步骤:In order to achieve the above purpose, the present application provides a packaging method for a Mini LED screen, comprising the steps of:

制作TFT驱动器件,并在所述TFT驱动器件背面上制作金属反射薄膜,所述TFT驱动器件的电极穿过所述金属反射薄膜;making a TFT driving device, and making a metal reflective film on the back of the TFT driving device, and the electrode of the TFT driving device passes through the metal reflective film;

在所述金属反射薄膜上制作多个LED发光单元,所述LED发光单元的电极与所述TFT驱动器件的电极连接,多个所述LED发光单元阵列排布于所述金属反射薄膜上;A plurality of LED light-emitting units are fabricated on the metal reflective film, electrodes of the LED light-emitting units are connected to electrodes of the TFT driving device, and a plurality of the LED light-emitting unit arrays are arranged on the metal reflective film;

制作封装胶,所述封装胶高度低于所述LED发光单元的高度;Making an encapsulant, the height of the encapsulant is lower than the height of the LED light-emitting unit;

制作透明的水氧吸收层,所述水氧吸收层覆盖于所述封装胶和所述LED发光单元上;making a transparent water-oxygen absorbing layer, the water-oxygen absorbing layer covering the encapsulant and the LED light-emitting unit;

在所述水氧吸收层上制作氮化物封装薄膜。A nitride encapsulation film is fabricated on the water-oxygen absorbing layer.

进一步地,还包括步骤:Further, it also includes the steps:

在所述氮化物封装薄膜上制作应力缓冲层。A stress buffer layer is formed on the nitride encapsulation film.

进一步地,所述金属反射薄膜为Ag反射薄膜。Further, the metal reflective film is an Ag reflective film.

进一步地,所述封装胶为封装硅胶,所述封装硅胶用于固定所述LED发光单元的位置。Further, the encapsulating glue is encapsulating silica gel, and the encapsulating silica gel is used to fix the position of the LED light-emitting unit.

进一步地,所述氮化物封装薄膜为氮化硅封装薄膜。Further, the nitride encapsulation film is a silicon nitride encapsulation film.

进一步地,所述应力缓冲层为聚酰亚胺应力缓冲层,所述聚酰亚胺应力缓冲层用于释放应力和保护Mini LED屏。Further, the stress buffer layer is a polyimide stress buffer layer, and the polyimide stress buffer layer is used for releasing stress and protecting the Mini LED screen.

为实现上述目的,本申请还提供了一种Mini LED屏结构,包括:TFT驱动器件、金属反射薄膜、LED发光单元、封装胶、水氧吸收层和氮化物封装薄膜;In order to achieve the above purpose, the present application also provides a Mini LED screen structure, including: a TFT drive device, a metal reflective film, an LED light-emitting unit, an encapsulation glue, a water-oxygen absorption layer and a nitride encapsulation film;

在所述TFT驱动器件背面上设置金属反射薄膜,所述TFT驱动器件的电极穿过所述金属反射薄膜;在所述金属反射薄膜上设置多个LED发光单元,所述LED发光单元的电极与所述TFT驱动器件的电极连接,多个所述LED发光单元阵列排布于所述金属反射薄膜上;在阵列的多个所述LED发光单元直接填充有所述封装胶,且所述封装胶高度低于所述LED发光单元的高度;所述水氧吸收层覆盖于所述封装胶和所述LED发光单元上;在所述水氧吸收层上设置氮化物封装薄膜。A metal reflective film is arranged on the back of the TFT driving device, and the electrodes of the TFT driving device pass through the metal reflective film; a plurality of LED light-emitting units are arranged on the metal reflective film, and the electrodes of the LED light-emitting units are connected to the The electrodes of the TFT driving device are connected, and a plurality of the LED light-emitting unit arrays are arranged on the metal reflective film; the plurality of the LED light-emitting units in the array are directly filled with the encapsulant, and the encapsulant The height is lower than the height of the LED light-emitting unit; the water-oxygen absorption layer covers the encapsulation glue and the LED light-emitting unit; a nitride packaging film is arranged on the water-oxygen absorption layer.

进一步地,还包括:应力缓冲层;在所述氮化物封装薄膜上设置应力缓冲层,且所述应力缓冲层用于释放应力和保护Mini LED屏。Further, it also includes: a stress buffer layer; a stress buffer layer is provided on the nitride encapsulation film, and the stress buffer layer is used for releasing stress and protecting the Mini LED screen.

进一步地,所述金属反射薄膜的厚度范围为0.05um至0.2um。Further, the thickness of the metal reflective film ranges from 0.05um to 0.2um.

进一步地,所述水氧吸收层与所述氮化物封装薄膜的高度相等。Further, the height of the water and oxygen absorbing layer is equal to that of the nitride encapsulation film.

区别于现有技术,上述技术方案通过将LED发光单元阵列式分布在有金属反射薄膜的TFT驱动器件上,并将LED发光单元的电极焊盘与对应的TFT驱动器件的电极相连,然后涂布封装胶进行封装,封装胶的高度未全部没过LED发光单元高度,采用透明的水氧吸收层填充LED发光单元之间的孔隙,水氧吸收层用于吸收渗透到Mini LED屏内的水氧,起到保护Mini LED芯片,延长Mini LED屏寿命的作用,最后沉积一层氮化物封装薄膜进行薄膜封装隔离外部水氧的进入,金属反射薄膜起到将光线向TFT驱动器件发射的光反射回到屏幕出光的方向,起到增加显示器的亮度,减少LED发光单元对下层TFT驱动器件侧的影响,从而提高驱动器件的稳定性。Different from the prior art, the above technical solution distributes the LED light-emitting units in an array on the TFT driving device with the metal reflective film, and connects the electrode pads of the LED light-emitting unit with the electrodes of the corresponding TFT driving device, and then coats the The encapsulation glue is used for encapsulation. The height of the encapsulation glue is not higher than the height of the LED light-emitting unit. A transparent water and oxygen absorbing layer is used to fill the pores between the LED light-emitting units. The water and oxygen absorbing layer is used to absorb the water and oxygen that penetrates into the Mini LED screen. , plays the role of protecting the Mini LED chip and prolonging the life of the Mini LED screen. Finally, a layer of nitride encapsulation film is deposited for film encapsulation to isolate the entry of external water and oxygen, and the metal reflective film reflects the light emitted by the TFT drive device back. To the direction of light output from the screen, it can increase the brightness of the display and reduce the influence of the LED light-emitting unit on the side of the underlying TFT driving device, thereby improving the stability of the driving device.

附图说明Description of drawings

图1为所述一种Mini LED屏结构图;FIG. 1 is a structural diagram of the Mini LED screen;

图2为具体实施方式制作所述封装胶和LED发光单元流程图;FIG. 2 is a flow chart of manufacturing the encapsulant and the LED light-emitting unit according to the specific embodiment;

图3为具体实施方式制作所述水氧吸收层流程图;FIG. 3 is a flow chart of making the water-oxygen absorbing layer in a specific embodiment;

图4为具体实施方式所述一种Mini LED屏的封装方法步骤图。FIG. 4 is a step diagram of a packaging method of a Mini LED screen according to the specific embodiment.

附图标记说明:Description of reference numbers:

1、TFT驱动器件;2、封装胶;3、LED发光单元;4、金属反射薄膜;5、氮化物封装薄膜;6、水氧吸收层;7、应力缓冲层。1. TFT drive device; 2. Encapsulation glue; 3. LED light-emitting unit; 4. Metal reflection film; 5. Nitride packaging film; 6. Water and oxygen absorption layer; 7. Stress buffer layer.

具体实施方式Detailed ways

为详细说明技术方案的技术内容、构造特征、所实现目的及效果,以下结合具体实施例并配合附图详予说明。In order to describe in detail the technical content, structural features, achieved objectives and effects of the technical solution, the following detailed description is given in conjunction with specific embodiments and accompanying drawings.

请参阅图1至4,本实施例提供了一种Mini LED屏的封装方法,包括步骤:制作TFT驱动器件1,并在所述TFT驱动器件1背面上制作金属反射薄膜4,所述TFT驱动器件1的电极穿过所述金属反射薄膜4;在所述金属反射薄膜4上制作多个LED发光单元3,所述LED发光单元3的电极与所述TFT驱动器件1的电极连接,多个所述LED发光单元3阵列排布于所述金属反射薄膜4上;制作封装胶2,所述封装胶2高度低于所述LED发光单元3的高度;制作透明的水氧吸收层6,所述水氧吸收层6覆盖于所述封装胶2和所述LED发光单元3上;在所述水氧吸收层6上制作氮化物封装薄膜5;即,所述封装胶2置于多个所述LED发光单元3之间,填充所述LED发光单元3与所述LED发光单元3之间的间隙;同理所述水氧吸收层6覆盖于多个所述LED发光单元3上,且填充所述LED发光单元3与所述LED发光单元3之间的间隙。所述封装胶2为封装硅胶。需要说明的是,在本申请中,所述TFT驱动器件1与所述LED发光单元3连接的电机从所述金属反射薄膜4中露出,方便与所述LED发光单元3的电极连接。需要进一步说明的是,在Mini LED屏倒装转移到TFT驱动器件1工艺之前,在TFT驱动的背面制备沉积一层金属反射薄膜4,作为LED发光单元3的反射层,起到将LED灯照射入TFT驱动方向的光,往相反的方向反射,可提高显示器的亮度,并且保护TFT驱动器件1的稳定性。因传统的封装胶2的隔离水、氧能力有限;在制作所述LED发光单元3后,请参阅图2,进行封装胶2的封装,所述封装胶2的高度未超过所述LED发光单元3的高度,在LED发光单元3之间涂布上透明的水氧吸收层6,请参阅图3,用于吸收外界浸透入膜层的水氧,所述水氧吸收层6将所述LED发光单元3完全覆盖住,即,所述水氧吸收层6与所述封装层高度之和大于所述LED发光单元3的高度。所述水氧吸收层6与所述封装层规避了当用封装胶2的隔离水、氧能力有限的缺陷,从而保护Mini LED屏的寿命,阻止水氧对所述金属反射薄膜4的侵蚀,然后再在器件上面采用PECVD(化学气相沉积)沉积一层氮化物封装薄膜5,所述氮化物封装薄膜5隔离水氧的能力能达到WVRT(水汽透过率)≤5E-05(g/m2-day),起到完全隔离水氧的作用。上述技术方案通过将LED发光单元3阵列式分布在有金属反射薄膜4的TFT驱动器件1上,并将LED发光单元3的电极焊盘与对应的TFT驱动器件1的电极相连,然后涂布封装胶2进行封装,封装胶2的高度未全部没过LED发光单元3高度,采用透明的水氧吸收层6填充LED发光单元3之间的孔隙,水氧吸收层6用于吸收渗透到Mini LED屏内的水氧,起到保护Mini LED芯片,延长Mini LED屏寿命的作用,最后沉积一层氮化物封装薄膜5进行薄膜封装隔离外部水氧的进入,金属反射薄膜4起到将光线向TFT驱动器件1发射的光反射回到屏幕出光的方向,起到增加显示器的亮度,减少LED发光单元3对下层TFT驱动器件1侧的影响,从而提高驱动器件的稳定性。Referring to FIGS. 1 to 4 , this embodiment provides a packaging method for a Mini LED screen, including the steps of: fabricating a TFT driving device 1 , and fabricating a metal reflective film 4 on the back of the TFT driving device 1 , and the TFT driving device 1 The electrodes of the device 1 pass through the metal reflective film 4; a plurality of LED light-emitting units 3 are fabricated on the metal reflective film 4, and the electrodes of the LED light-emitting units 3 are connected to the electrodes of the TFT driving device 1. The LED light-emitting units 3 are arranged in an array on the metal reflective film 4; an encapsulant 2 is made, and the height of the encapsulant 2 is lower than the height of the LED light-emitting unit 3; a transparent water and oxygen absorption layer 6 is made, so The water-oxygen absorbing layer 6 is covered on the encapsulant 2 and the LED light-emitting unit 3; a nitride encapsulation film 5 is made on the water-oxygen absorbing layer 6; that is, the encapsulant 2 is placed in a plurality of Between the LED light-emitting units 3, the gap between the LED light-emitting unit 3 and the LED light-emitting unit 3 is filled; similarly, the water-oxygen absorption layer 6 covers the plurality of the LED light-emitting units 3, and fills the gap between the LED light-emitting units 3 and the LED light-emitting units 3; The gap between the LED light-emitting unit 3 and the LED light-emitting unit 3 . The encapsulating glue 2 is encapsulating silica gel. It should be noted that, in the present application, the motor connecting the TFT driving device 1 and the LED light-emitting unit 3 is exposed from the metal reflective film 4 to facilitate connection with the electrodes of the LED light-emitting unit 3 . It should be further noted that, before the Mini LED screen is flip-chip transferred to the TFT drive device 1 process, a metal reflective film 4 is prepared and deposited on the back of the TFT drive, as the reflective layer of the LED light-emitting unit 3, which serves to illuminate the LED light. The light entering the TFT driving direction is reflected in the opposite direction, which can improve the brightness of the display and protect the stability of the TFT driving device 1 . Due to the limited ability of the traditional encapsulant 2 to isolate water and oxygen; after making the LED light-emitting unit 3, please refer to FIG. 2 to encapsulate the encapsulant 2, and the height of the encapsulant 2 does not exceed the LED light-emitting unit. 3 height, a transparent water and oxygen absorbing layer 6 is coated between the LED light-emitting units 3, please refer to FIG. The light-emitting unit 3 is completely covered, that is, the sum of the heights of the water-oxygen absorbing layer 6 and the encapsulation layer is greater than the height of the LED light-emitting unit 3 . The water and oxygen absorbing layer 6 and the encapsulation layer avoid the defect of the limited water and oxygen isolation capability of the encapsulant 2, thereby protecting the life of the Mini LED screen and preventing the erosion of the metal reflective film 4 by water and oxygen. Then, a layer of nitride encapsulation film 5 is deposited on the device by PECVD (chemical vapor deposition), and the ability of the nitride encapsulation film 5 to isolate water and oxygen can reach WVRT (water vapor transmission rate)≤5E-05 (g/m2 -day), which plays a role in completely isolating water and oxygen. In the above technical solution, the LED light-emitting units 3 are distributed in an array on the TFT driving device 1 with the metal reflective film 4, and the electrode pads of the LED light-emitting unit 3 are connected with the electrodes of the corresponding TFT driving device 1, and then coated and packaged. Glue 2 is used for encapsulation, and the height of the encapsulation glue 2 does not completely exceed the height of the LED light-emitting unit 3. A transparent water and oxygen absorbing layer 6 is used to fill the pores between the LED light-emitting units 3. The water and oxygen absorbing layer 6 is used to absorb and penetrate into the Mini LED. The water and oxygen in the screen play a role in protecting the Mini LED chip and prolonging the life of the Mini LED screen. Finally, a layer of nitride encapsulation film 5 is deposited for film encapsulation to isolate the entry of external water and oxygen, and the metal reflective film 4 plays the role of directing the light to the TFT. The light emitted by the driving device 1 is reflected back to the direction of light output from the screen, which increases the brightness of the display and reduces the influence of the LED light-emitting unit 3 on the lower TFT driving device 1 side, thereby improving the stability of the driving device.

请参阅图1,为了进一步保护Mini LED屏,在某些实施例中,还包括步骤在所述氮化物封装薄膜上制作应力缓冲层7。需要说明的是,最后涂布一层所述应力缓冲层7的材料为PI(聚酰亚胺);起到应力释放和缓冲外界撞击的作用,此叠层的薄膜封装取代传统的单层硅胶封装,提高器件阻隔水氧的能力,延长Mini LED屏的使用寿命,提高TFT驱动器件1的稳定性,实现显示器高亮度,高对比度显示。Referring to FIG. 1 , in order to further protect the Mini LED screen, in some embodiments, a step of forming a stress buffer layer 7 on the nitride encapsulation film is further included. It should be noted that the material of the last coating layer of the stress buffer layer 7 is PI (polyimide); it plays the role of stress releasing and buffering external impact, and this laminated thin film package replaces the traditional single-layer silica gel Encapsulation improves the ability of the device to block water and oxygen, prolongs the service life of the Mini LED screen, improves the stability of the TFT drive device 1, and realizes high-brightness and high-contrast display of the display.

需要进一步说明的是,所述金属反射薄膜4为Ag反射薄膜。所述封装胶2为封装硅胶,所述封装硅胶用于固定所述LED发光单元3的位置。所述氮化物封装薄膜5为氮化硅封装薄膜。所述应力缓冲层7为聚酰亚胺应力缓冲层7,所述聚酰亚胺应力缓冲层7用于释放应力和保护Mini LED屏。具体的,It should be further noted that the metal reflective film 4 is an Ag reflective film. The encapsulating glue 2 is encapsulating silica gel, and the encapsulating silica gel is used to fix the position of the LED light-emitting unit 3 . The nitride encapsulation film 5 is a silicon nitride encapsulation film. The stress buffer layer 7 is a polyimide stress buffer layer 7, and the polyimide stress buffer layer 7 is used for releasing stress and protecting the Mini LED screen. specific,

为提高背光源的LED发光单元3的利用率,需要将从TFT驱动器件1反射回来的光重新反射回去,由于金属反射薄膜4的消光系数低,反射率大,所以金属反射薄膜4可用PVD沉积一层金属Ag(银),金属薄膜银的反射率能达到98.8%,该反射膜材料选择不亚于铝,铬,铂,其厚度范围为0.05um至0.2um,优选为0.15um。由于金属薄膜反射层容易与外界水汽和氧气发生反应,因此在封装胶2之上的LED发光单元3之间涂布透明的水氧吸收层6,水氧吸收层6材质可以为氧化镁或氧化钡等,优选的为氧化镁,水氧吸收层6厚度范围0.1um至0.3um,优选为0.15um。在水氧吸收层6上沉积一层氮化物封装薄膜5,所述氮化物封装薄膜5可以为SiNx,氮化物封装薄膜5起到保护LED发光单元3和金属反射薄膜4的作用,氮化物封装薄膜5的厚度范围为0.1um至0.3um,优选为0.15um。Mini LED屏结构中最外层的有机物缓冲层,采用IJP或者涂布机涂布一层有机薄膜,其厚度范围2um至4um,优选3um,实现对缓冲应力集中和抗外界冲击的风险。In order to improve the utilization rate of the LED light-emitting unit 3 of the backlight, the light reflected from the TFT driving device 1 needs to be re-reflected. Due to the low extinction coefficient and high reflectivity of the metal reflective film 4, the metal reflective film 4 can be deposited by PVD. A layer of metal Ag (silver), the reflectivity of the metal thin film silver can reach 98.8%, the reflective film material selection is no less than aluminum, chromium, platinum, and its thickness ranges from 0.05um to 0.2um, preferably 0.15um. Since the metal film reflective layer is easy to react with external water vapor and oxygen, a transparent water-oxygen absorbing layer 6 is coated between the LED light-emitting units 3 above the encapsulant 2. The water-oxygen absorbing layer 6 can be made of magnesium oxide or oxide Barium, etc., preferably magnesium oxide, and the thickness of the water-oxygen absorbing layer 6 ranges from 0.1um to 0.3um, preferably 0.15um. A layer of nitride encapsulation film 5 is deposited on the water and oxygen absorption layer 6. The nitride encapsulation film 5 can be SiNx. The nitride encapsulation film 5 plays the role of protecting the LED light-emitting unit 3 and the metal reflective film 4. The thickness of the thin film 5 ranges from 0.1 um to 0.3 um, preferably 0.15 um. The outermost organic buffer layer in the Mini LED screen structure is coated with an organic film by IJP or a coating machine.

请参阅图4,具体流程如下,采用清洗机和烘烤机将玻璃基板清洗烘烤,制作金属氧化物TFT驱动器件1,再在TFT驱动器件1背面过PVD制备所述金属反射薄膜4,然后将LED发光单元3阵列排列在TFT驱动器件1上,通过涂布封装胶2,然后固化,固化所述LED发光单元3和所述TFT驱动器件1,将形成所述LED发光单元3的电极焊盘与所述TFT驱动器件1的电极连接,再多个所述LED发光单元3之间制备一层所述水氧吸收层6,吸收外界已近侵入的水汽和氧气,然后通过PECVD沉积外界氮化物封装薄膜5,最后通过Coater涂布一层应力缓冲层7用于应力释放和外界冲击缓冲层,最终形成Mini LED屏的制备。Please refer to FIG. 4 . The specific process is as follows. The glass substrate is cleaned and baked by a cleaning machine and a baking machine to make a metal oxide TFT driving device 1 , and then the metal reflective film 4 is prepared by PVD on the back of the TFT driving device 1 , and then The LED light-emitting unit 3 is arrayed on the TFT driving device 1, and the LED light-emitting unit 3 and the TFT driving device 1 are cured by coating the encapsulant 2 and then curing, and the electrodes forming the LED light-emitting unit 3 are welded. The disk is connected to the electrodes of the TFT driving device 1, and a layer of the water-oxygen absorbing layer 6 is prepared between the plurality of the LED light-emitting units 3 to absorb the water vapor and oxygen that have invaded from the outside, and then deposit nitrogen from the outside by PECVD. Finally, a layer of stress buffer layer 7 is coated by Coater for stress release and external impact buffer layer, and finally the preparation of Mini LED screen is formed.

请参阅图1,本实施例提供了一种Mini LED屏结构,包括:TFT驱动器件1、金属反射薄膜4、LED发光单元3、封装胶2、水氧吸收层6和氮化物封装薄膜5;在所述TFT驱动器件1背面上设置金属反射薄膜4,所述TFT驱动器件1的电极穿过所述金属反射薄膜4;在所述金属反射薄膜4上设置多个LED发光单元3,所述LED发光单元3的电极与所述TFT驱动器件1的电极连接,多个所述LED发光单元3阵列排布于所述金属反射薄膜4上;在阵列的多个所述LED发光单元3直接填充有所述封装胶2,且所述封装胶2高度低于所述LED发光单元3的高度;所述水氧吸收层6覆盖于所述封装胶2和所述LED发光单元3上;在所述水氧吸收层6上设置氮化物封装薄膜5。所述封装胶2为封装硅胶。所述封装胶2为封装硅胶。需要说明的是,在本申请中,所述TFT驱动器件1与所述LED发光单元3连接的电机从所述金属反射薄膜4中露出,方便与所述LED发光单元3的电极连接。需要进一步说明的是,所述金属反射薄膜4作为LED发光单元3的反射层,起到将LED灯照射入TFT驱动方向的光,往相反的方向反射,可提高显示器的亮度,并且保护TFT驱动器件1的稳定性。因传统的封装胶2的隔离水、氧能力有限;在设置所述LED发光单元3后,设置有封装胶2,且所述封装胶2为封装硅胶,所述封装胶2的高度未超过所述LED发光单元3的高度,在LED发光单元3之间设置有透明的水氧吸收层6,用于吸收外界浸透入膜层的水氧;所述水氧吸收层6将所述LED发光单元3完全覆盖住,即,所述水氧吸收层6与所述封装层高度之和大于所述LED发光单元3的高度。所述水氧吸收层6与所述封装层规避了当用封装胶2的隔离水、氧能力有限的缺陷,从而保护Mini LED屏的寿命,阻止水氧对所述金属反射薄膜4的侵蚀。设置于所述水氧吸收层6上的所述氮化物封装薄膜5,将隔离水氧的能力能达到WVRT(水汽透过率)≤5E-05(g/m2-day),起到完全隔离水氧的作用。上述技术方案通过将LED发光单元3阵列式分布在有金属反射薄膜4的TFT驱动器件1上,并将LED发光单元3的电极焊盘与对应的TFT驱动器件1的电极相连,然后涂布封装胶2进行封装,封装胶2的高度未全部没过LED发光单元3高度,采用透明的水氧吸收层6填充LED发光单元3之间的孔隙,水氧吸收层6用于吸收渗透到Mini LED屏内的水氧,起到保护Mini LED芯片,延长Mini LED屏寿命的作用,最后沉积一层氮化物封装薄膜5进行薄膜封装隔离外部水氧的进入,金属反射薄膜4起到将光线向TFT驱动器件1发射的光反射回到屏幕出光的方向,起到增加显示器的亮度,减少LED发光单元3对下层TFT驱动器件1侧的影响,从而提高驱动器件的稳定性。Referring to FIG. 1 , this embodiment provides a Mini LED screen structure, including: a TFT driving device 1 , a metal reflective film 4 , an LED light-emitting unit 3 , an encapsulant 2 , a water-oxygen absorption layer 6 and a nitride encapsulation film 5 ; A metal reflective film 4 is arranged on the back of the TFT driving device 1, and the electrodes of the TFT driving device 1 pass through the metal reflective film 4; a plurality of LED light-emitting units 3 are arranged on the metal reflective film 4, and the The electrodes of the LED light-emitting units 3 are connected to the electrodes of the TFT driving device 1, and a plurality of the LED light-emitting units 3 are arranged in an array on the metal reflective film 4; the plurality of the LED light-emitting units 3 in the array are directly filled with There is the encapsulant 2, and the height of the encapsulant 2 is lower than the height of the LED light-emitting unit 3; the water-oxygen absorption layer 6 covers the encapsulant 2 and the LED light-emitting unit 3; A nitride encapsulation film 5 is arranged on the water and oxygen absorption layer 6 . The encapsulating glue 2 is encapsulating silica gel. The encapsulating glue 2 is encapsulating silica gel. It should be noted that, in the present application, the motor connecting the TFT driving device 1 and the LED light-emitting unit 3 is exposed from the metal reflective film 4 to facilitate connection with the electrodes of the LED light-emitting unit 3 . It should be further noted that the metal reflective film 4 is used as the reflective layer of the LED light-emitting unit 3 to irradiate the LED light into the TFT driving direction, and reflect it in the opposite direction, which can improve the brightness of the display and protect the TFT driving Device 1 stability. Because the traditional encapsulation glue 2 has limited ability to isolate water and oxygen; after the LED light-emitting unit 3 is arranged, an encapsulation glue 2 is provided, and the encapsulation glue 2 is encapsulated silica gel, and the height of the encapsulation glue 2 does not exceed all The height of the LED light-emitting unit 3, a transparent water-oxygen absorbing layer 6 is arranged between the LED light-emitting units 3 to absorb the water and oxygen that penetrates into the film layer from the outside; 3 is completely covered, that is, the sum of the heights of the water-oxygen absorbing layer 6 and the encapsulation layer is greater than the height of the LED light-emitting unit 3 . The water-oxygen absorbing layer 6 and the encapsulation layer avoid the defect that the encapsulation glue 2 has limited ability to isolate water and oxygen, thereby protecting the life of the Mini LED screen and preventing the erosion of the metal reflective film 4 by water and oxygen. The nitride encapsulation film 5 disposed on the water-oxygen absorbing layer 6 can isolate water and oxygen up to WVRT (water vapor transmission rate) ≤ 5E-05 (g/m2-day), thus achieving complete isolation The role of water oxygen. In the above technical solution, the LED light-emitting units 3 are distributed in an array on the TFT driving device 1 with the metal reflective film 4, and the electrode pads of the LED light-emitting unit 3 are connected with the electrodes of the corresponding TFT driving device 1, and then coated and packaged. Glue 2 is used for encapsulation, and the height of the encapsulation glue 2 does not completely exceed the height of the LED light-emitting unit 3. A transparent water and oxygen absorbing layer 6 is used to fill the pores between the LED light-emitting units 3. The water and oxygen absorbing layer 6 is used to absorb and penetrate into the Mini LED. The water and oxygen in the screen play a role in protecting the Mini LED chip and prolonging the life of the Mini LED screen. Finally, a layer of nitride encapsulation film 5 is deposited for film encapsulation to isolate the entry of external water and oxygen, and the metal reflective film 4 plays the role of directing the light to the TFT. The light emitted by the driving device 1 is reflected back to the direction of light output from the screen, which increases the brightness of the display and reduces the influence of the LED light-emitting unit 3 on the lower TFT driving device 1 side, thereby improving the stability of the driving device.

请参阅图1,为了进一步保护Mini LED屏,在某些实施例中,还包括:应力缓冲层7;在所述氮化物封装薄膜上设置应力缓冲层7,且所述应力缓冲层7用于释放应力和保护MiniLED屏。所述应力缓冲层7起到应力释放和缓冲外界撞击的作用,此叠层的薄膜封装取代传统的单层硅胶封装,提高器件阻隔水氧的能力,延长Mini LED屏的使用寿命,提高TFT驱动器件1的稳定性,实现显示器高亮度,高对比度显示。Referring to FIG. 1, in order to further protect the Mini LED screen, in some embodiments, it further includes: a stress buffer layer 7; a stress buffer layer 7 is provided on the nitride encapsulation film, and the stress buffer layer 7 is used for Relieve stress and protect MiniLED screen. The stress buffer layer 7 plays the role of stress release and buffering of external impact. This laminated thin film package replaces the traditional single-layer silicone package, which improves the device's ability to block water and oxygen, prolongs the service life of the Mini LED screen, and improves the TFT drive. The stability of the device 1 realizes high brightness and high contrast display of the display.

为提高背光源的LED发光单元3的利用率,需要将从TFT驱动器件1反射回来的光重新反射回去,由于金属反射薄膜4的消光系数低,反射率大,所以金属反射薄膜4可用PVD沉积一层金属Ag(银),金属薄膜银的反射率能达到98.8%,该反射膜材料选择不亚于铝,铬,铂,其厚度范围为0.05um至0.2um,优选为0.15um。所述水氧吸收层6与所述氮化物封装薄膜5的高度相等。由于金属薄膜反射层容易与外界水汽和氧气发生反应,因此在封装胶2之上的LED发光单元3之间涂布透明的水氧吸收层6,水氧吸收层6材质可以为氧化镁或氧化钡等,优选的为氧化镁,水氧吸收层6厚度范围0.1um至0.3um,优选为0.15um。在水氧吸收层6上沉积一层氮化物封装薄膜5,所述氮化物封装薄膜5可以为SiNx,氮化物封装薄膜5起到保护LED发光单元3和金属反射薄膜4的作用,氮化物封装薄膜5的厚度范围为0.1um至0.3um,优选为0.15um。Mini LED屏结构中最外层的有机物缓冲层,采用IJP或者涂布机涂布一层有机薄膜,其厚度范围2um至4um,优选3um,实现对缓冲应力集中和抗外界冲击的风险。In order to improve the utilization rate of the LED light-emitting unit 3 of the backlight, the light reflected from the TFT driving device 1 needs to be re-reflected. Due to the low extinction coefficient and high reflectivity of the metal reflective film 4, the metal reflective film 4 can be deposited by PVD. A layer of metal Ag (silver), the reflectivity of the metal thin film silver can reach 98.8%, the reflective film material selection is no less than aluminum, chromium, platinum, and its thickness ranges from 0.05um to 0.2um, preferably 0.15um. The height of the water and oxygen absorption layer 6 is equal to the height of the nitride encapsulation film 5 . Since the metal film reflective layer is easy to react with external water vapor and oxygen, a transparent water-oxygen absorbing layer 6 is coated between the LED light-emitting units 3 above the encapsulant 2. The water-oxygen absorbing layer 6 can be made of magnesium oxide or oxide Barium, etc., preferably magnesium oxide, and the thickness of the water-oxygen absorbing layer 6 ranges from 0.1um to 0.3um, preferably 0.15um. A layer of nitride encapsulation film 5 is deposited on the water and oxygen absorption layer 6. The nitride encapsulation film 5 can be SiNx. The nitride encapsulation film 5 plays the role of protecting the LED light-emitting unit 3 and the metal reflective film 4. The thickness of the thin film 5 ranges from 0.1 um to 0.3 um, preferably 0.15 um. The outermost organic buffer layer in the Mini LED screen structure is coated with an organic film by IJP or a coating machine.

需要说明的是,尽管在本文中已经对上述各实施例进行了描述,但并非因此限制本发明的专利保护范围。因此,基于本发明的创新理念,对本文所述实施例进行的变更和修改,或利用本发明说明书及附图内容所作的等效结构或等效流程变换,直接或间接地将以上技术方案运用在其他相关的技术领域,均包括在本发明的专利保护范围之内。It should be noted that, although the above embodiments have been described herein, it does not limit the scope of the patent protection of the present invention. Therefore, based on the innovative concept of the present invention, changes and modifications to the embodiments described herein, or equivalent structures or equivalent process transformations made by using the contents of the description and drawings of the present invention, directly or indirectly apply the above technical solutions In other related technical fields, all are included within the scope of patent protection of the present invention.

Claims (10)

1. A method for packaging a Mini LED screen is characterized by comprising the following steps:
manufacturing a TFT driving device, and manufacturing a metal reflecting film on the back surface of the TFT driving device, wherein an electrode of the TFT driving device penetrates through the metal reflecting film;
manufacturing a plurality of LED light-emitting units on the metal reflective film, wherein electrodes of the LED light-emitting units are connected with electrodes of the TFT driving device, and the LED light-emitting units are arrayed on the metal reflective film;
manufacturing packaging glue, wherein the height of the packaging glue is lower than that of the LED light-emitting unit;
manufacturing a transparent water and oxygen absorption layer, wherein the water and oxygen absorption layer covers the packaging adhesive and the LED light-emitting unit;
and manufacturing a nitride packaging film on the water-oxygen absorption layer.
2. The method for encapsulating a Mini LED screen according to claim 1, further comprising the steps of:
and manufacturing a stress buffer layer on the nitride packaging film.
3. The method for encapsulating a Mini LED screen according to claim 1, wherein the metal reflective film is an Ag reflective film.
4. The method for packaging a Mini LED screen according to claim 1, wherein the packaging adhesive is packaging silica gel, and the packaging silica gel is used for fixing the position of the LED light-emitting unit.
5. The method for encapsulating a Mini LED screen according to claim 1, wherein the nitride encapsulation film is a silicon nitride encapsulation film.
6. The method for encapsulating the Mini LED screen according to claim 2, wherein the stress buffer layer is a polyimide stress buffer layer, and the polyimide stress buffer layer is used for releasing stress and protecting the Mini LED screen.
7. A Mini LED screen structure, comprising: the LED packaging structure comprises a TFT driving device, a metal reflecting film, an LED light-emitting unit, packaging glue, a water-oxygen absorption layer and a nitride packaging film;
arranging a metal reflecting film on the back surface of the TFT driving device, wherein an electrode of the TFT driving device penetrates through the metal reflecting film; a plurality of LED light-emitting units are arranged on the metal reflecting film, electrodes of the LED light-emitting units are connected with electrodes of the TFT driving device, and the LED light-emitting units are arrayed on the metal reflecting film; the packaging glue is directly filled in the plurality of LED light-emitting units of the array, and the height of the packaging glue is lower than that of the LED light-emitting units; the water and oxygen absorption layer covers the packaging adhesive and the LED light-emitting unit; and arranging a nitride packaging film on the water-oxygen absorption layer.
8. The Mini LED screen structure of claim 7, further comprising: a stress buffer layer; and arranging a stress buffer layer on the nitride packaging film, wherein the stress buffer layer is used for releasing stress and protecting the Mini LED screen.
9. The Mini LED screen structure of claim 7, wherein the thickness of the metal reflective film is in the range of 0.05um to 0.2 um.
10. The Mini LED panel structure of claim 7, wherein the water oxygen absorption layer is at the same height as the nitride encapsulation film.
CN202011009199.6A 2020-09-23 2020-09-23 Mini LED screen structure and packaging method thereof Withdrawn CN112103384A (en)

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