[go: up one dir, main page]

CN112062552A - A kind of preparation method of lead-free thin film material using phase transition induction - Google Patents

A kind of preparation method of lead-free thin film material using phase transition induction Download PDF

Info

Publication number
CN112062552A
CN112062552A CN202010979458.1A CN202010979458A CN112062552A CN 112062552 A CN112062552 A CN 112062552A CN 202010979458 A CN202010979458 A CN 202010979458A CN 112062552 A CN112062552 A CN 112062552A
Authority
CN
China
Prior art keywords
bct
bmt
thin film
lead
precursor solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010979458.1A
Other languages
Chinese (zh)
Inventor
彭彪林
陈婷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangxi University
Original Assignee
Guangxi University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangxi University filed Critical Guangxi University
Priority to CN202010979458.1A priority Critical patent/CN112062552A/en
Publication of CN112062552A publication Critical patent/CN112062552A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/46Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
    • C04B35/462Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
    • C04B35/465Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
    • C04B35/468Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/46Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
    • C04B35/462Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates
    • C04B35/475Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on bismuth titanates
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/62218Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic films, e.g. by using temporary supports
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3206Magnesium oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3208Calcium oxide or oxide-forming salts thereof, e.g. lime
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Inorganic Chemistry (AREA)

Abstract

本发明涉及一种利用相变诱导无铅薄膜材料制备方法,属于化学工程技术领域。一种利用相变诱导无铅薄膜材料制备方法,先制备BCT‑BMT前驱体溶液,所得BCT‑BMT前驱体溶液旋涂于Pt(111)/TiOx/SiO2/Si(100)衬底上面,得到湿膜;所得湿膜干燥、热解、退火制得一层BCT‑BMT薄膜;重复以上步骤制得多层BCT‑BMT薄膜。本发明制备方法相对简单,是一种方便快捷的制备技术。

Figure 202010979458

The invention relates to a preparation method of lead-free thin film material induced by phase transition, and belongs to the technical field of chemical engineering. A method for preparing a lead-free thin film material utilizing phase transition induction, firstly preparing a BCT-BMT precursor solution, and spin-coating the obtained BCT-BMT precursor solution on a Pt(111)/TiO x /SiO 2 /Si(100) substrate , to obtain a wet film; the obtained wet film is dried, pyrolyzed, and annealed to obtain a layer of BCT-BMT thin film; the above steps are repeated to prepare a multi-layer BCT-BMT thin film. The preparation method of the invention is relatively simple, and is a convenient and quick preparation technology.

Figure 202010979458

Description

一种利用相变诱导无铅薄膜材料制备方法A kind of preparation method of lead-free thin film material using phase transition induction

技术领域technical field

本发明涉及一种利用相变诱导无铅薄膜材料制备方法,属于化学工程技术领域。The invention relates to a preparation method of lead-free thin film material induced by phase transition, and belongs to the technical field of chemical engineering.

背景技术Background technique

具备大的正/负电卡效应的铁电/反铁电薄膜或厚膜材料在商业化芯片级制冷器件的设计上起着至关重要的作用。近年来,铁电薄膜中大的正电卡效应的突破在诸多成分体系中已屡见报道,一般常见于锆钛酸铅(PZT)为代表的铅基铁电或反铁电薄膜材料中。对于正电卡效应,其电卡制冷温度或熵的变化一般随着电场的增加而增加。相比之下,目前已报道的负电卡效应的获得一般处于一个适中的电场之下,当超过一定电场后,其电卡制冷温度变化绝对值将随着电场的增加而减少,从而限制和导致其总的绝对值较低,远小于目前已报道的正电卡效应值。Ferroelectric/antiferroelectric thin-film or thick-film materials with large positive/negative electric card effects play a crucial role in the design of commercial chip-scale refrigeration devices. In recent years, breakthroughs in the large positive card effect in ferroelectric thin films have been reported frequently in many composition systems, generally in lead-based ferroelectric or antiferroelectric thin film materials represented by lead zirconate titanate (PZT). For the positive electric card effect, the change of the electric card refrigeration temperature or entropy generally increases with the increase of the electric field. In contrast, the negative electric card effect reported so far is generally obtained under a moderate electric field. When the electric field exceeds a certain electric field, the absolute value of the electric card refrigeration temperature change will decrease with the increase of the electric field, thus limiting and causing Its total absolute value is low, far smaller than the positive electric card effect value reported so far.

在过去的十年中,电卡效应由于在商用固态制冷装置中的潜在应用,得到了人们的广泛研究。自2006年观察到铅基材料的正电卡效应从12K显著增强到40K,但负电卡效应仍保持在10K左右的很低水平,这限制了冷却效率的进一步提高,特别是当我们试图在一个冷却周期中将负和正电卡效应结合起来时。由于铅的毒性,人们总是想寻找无铅材料来取代含铅材料。Over the past decade, the electric card effect has been extensively studied due to its potential application in commercial solid-state refrigeration units. Since 2006, it has been observed that the positive galvanic effect of lead-based materials increases significantly from 12K to 40K, but the negative galvanic effect still remains at a very low level around 10K, which limits further improvements in cooling efficiency, especially when we try to operate in a When combining negative and positive electrical card effects during a cooling cycle. Due to the toxicity of lead, people are always looking for lead-free materials to replace lead-containing materials.

发明内容SUMMARY OF THE INVENTION

本发明的目的在于提供一种利用相变诱导无铅薄膜材料制备方法。BCT-BMT是一种具有巨大电卡效应的铁电体材料,通过溶胶凝胶合成法在Pt(111)/TiOx/SiO2/Si(100)(0<x<10)基底上面制备出的BCT-BMT无铅弛豫铁电薄膜材料具有巨大的负电卡效应,利用这一巨大的负电卡效应并结合正电卡效应,将使得铁电薄膜材料在芯片级电子元器件(如CPU等)等固态制冷技术中的制冷效率得到极大的提高,单个制冷循环内所施加电场方向无须交替改变;相比之下,利用单一的正电卡效应进行制冷,在单个制冷循环内则需要施加交变电场。这一研究成果的突破将为固态电卡制冷器件的设计和制备提供新的技术路径,有望解决电子元器件因其发热问题而导致性能下降和恶化问题。The purpose of the present invention is to provide a preparation method of lead-free thin film material using phase transition induction. BCT-BMT is a ferroelectric material with a huge electric card effect, which was prepared on a Pt(111)/TiO x /SiO 2 /Si(100) (0<x<10) substrate by a sol-gel synthesis method. The BCT-BMT lead-free relaxor ferroelectric thin film material has a huge negative electric card effect. Using this huge negative electric card effect combined with the positive electric card effect will make the ferroelectric thin film material in chip-level electronic components (such as CPU, etc.). ) and other solid-state refrigeration technologies have greatly improved the refrigeration efficiency, and the direction of the electric field applied in a single refrigeration cycle does not need to be changed alternately; alternating electric field. The breakthrough of this research achievement will provide a new technical path for the design and preparation of solid-state electric card refrigeration devices, and is expected to solve the problem of performance degradation and deterioration of electronic components due to their heating problems.

本发明的目的通过如下技术方案实现:The object of the present invention is achieved through the following technical solutions:

一种利用相变诱导无铅薄膜材料制备方法,包括以下步骤:A method for preparing a lead-free thin film material utilizing phase transition induction, comprising the following steps:

1)制备BCT-BMT前驱体溶液,所述BCT-BMT通式为n(BaxCa(1-x))TiO3-(1-n)Bi(MgyTi(1-y))O3,其中0<x<1,0<y<1,0<n<1;1) Prepare a BCT-BMT precursor solution, the general formula of the BCT-BMT is n(Ba x Ca (1-x) )TiO 3 -(1-n)Bi(Mg y Ti (1-y) )O 3 , where 0<x<1, 0<y<1, 0<n<1;

2)将步骤1)所得BCT-BMT前驱体溶液旋涂于Pt(111)/TiOx/SiO2/Si(100)衬底上面,得到湿膜;2) spin-coating the BCT-BMT precursor solution obtained in step 1) on the Pt(111)/TiO x /SiO 2 /Si(100) substrate to obtain a wet film;

3)将步骤2)所得湿膜干燥、热解、退火制得一层BCT-BMT薄膜,所述退火温度为700-800℃,退火时间为20-30min,退火环境为空气氛围;3) drying, pyrolyzing and annealing the wet film obtained in step 2) to obtain a layer of BCT-BMT film, the annealing temperature is 700-800° C., the annealing time is 20-30 min, and the annealing environment is an air atmosphere;

4)重复步骤2)和步骤3)制得多层BCT-BMT薄膜。4) Repeat steps 2) and 3) to prepare multilayer BCT-BMT films.

优选的是,步骤1)所述的BCT-BMT前驱体溶液由如下方法制得:将Bi(CH3COO)3、Ca(CH3COO)2和Ba(CH3COO)2于60-100℃溶解在冰醋酸和去离子水的混合液体中,同时将Mg(OC2H5)2、Ti(OCH(CH3)2)4溶解在CH3OCH2-CH2OH和CH3COCH2COCH3的混合液体中,将所得的两种混合液再次于室温下搅拌30min混合,并放置20-30h,得到浓度为0.2-0.3M的BCT-BMT前驱体溶液。Preferably, the BCT-BMT precursor solution in step 1) is prepared by the following method: mixing Bi(CH 3 COO) 3 , Ca(CH 3 COO) 2 and Ba(CH 3 COO) 2 at 60-100 ℃ dissolved in a mixed liquid of glacial acetic acid and deionized water, while Mg(OC 2 H 5 ) 2 , Ti(OCH(CH 3 ) 2 ) 4 were dissolved in CH 3 OCH 2 -CH 2 OH and CH 3 COCH 2 In the mixed liquid of COCH 3 , the two obtained mixed liquids were stirred and mixed again at room temperature for 30 min, and left for 20-30 h to obtain a BCT-BMT precursor solution with a concentration of 0.2-0.3 M.

优选的是,步骤2)所述旋涂转速为4000-6000rpm,旋涂时间为30-40s。Preferably, the rotational speed of the spin coating in step 2) is 4000-6000 rpm, and the spin coating time is 30-40 s.

优选的是,步骤3)所述干燥温度为100-300℃,干燥时间为3-10min;所述热解温度为350-500℃,热解时间为3-10min。Preferably, in step 3), the drying temperature is 100-300°C, and the drying time is 3-10min; the pyrolysis temperature is 350-500°C, and the pyrolysis time is 3-10min.

优选的是,步骤4)制得8层BCT-BMT薄膜。Preferably, 8 layers of BCT-BMT films are obtained in step 4).

本发明的有益效果是:获得具有纯度高、致密性好、平均晶粒尺寸小、电场击穿强度大、电卡效应大等优点的薄膜;本发明制备方法相对简单,是一种方便快捷的制备技术。The beneficial effects of the invention are as follows: obtaining a film with the advantages of high purity, good compactness, small average grain size, high electric field breakdown strength, large electric card effect and the like; the preparation method of the invention is relatively simple, and is a convenient and fast preparation technology.

附图说明Description of drawings

图1为本发明实施例1得到的不同电场强度下BCT-BMT薄膜的电卡性能图谱;Fig. 1 is the electric card performance map of BCT-BMT film under different electric field intensities obtained in Example 1 of the present invention;

图2为本发明相变诱导的机理图。Figure 2 is a schematic diagram of the mechanism of phase transition induction in the present invention.

具体实施方式Detailed ways

下面结合具体实施例,对本发明作进一步详细的阐述,但本发明的实施方式并不局限于实施例表示的范围。这些实施例仅用于说明本发明,而非用于限制本发明的范围。此外,在阅读本发明的内容后,本领域的技术人员可以对本发明作各种修改,这些等价变化同样落于本发明所附权利要求书所限定的范围。The present invention will be described in further detail below with reference to specific examples, but the embodiments of the present invention are not limited to the scope represented by the examples. These examples are only used to illustrate the present invention, but not to limit the scope of the present invention. In addition, after reading the content of the present invention, those skilled in the art can make various modifications to the present invention, and these equivalent changes also fall within the scope defined by the appended claims of the present invention.

实施例1Example 1

一种利用相变诱导无铅薄膜材料实现巨大负电卡效应的方法,具体为n(BaxCa(1-x))TiO3–(1-n)Bi(MgyTi(1-y))O3(BCT-BMT)铁电薄膜,其中x=0.8,y=0.5,n=0.5,即0.5(Ba0.8Ca0.2)TiO3–0.5Bi(Mg0.5Ti0.5)O3铁电薄膜,其制备方法包括如下具体步骤:A method to achieve a giant negative charge card effect using phase transition-induced lead-free thin film materials, specifically n(Ba x Ca (1-x) )TiO 3 –(1-n)Bi(Mg y Ti (1-y) ) O 3 (BCT-BMT) ferroelectric thin film, where x=0.8, y=0.5, n=0.5, i.e. 0.5(Ba 0.8 Ca 0.2 )TiO 3 -0.5Bi(Mg 0.5 Ti 0.5 )O 3 ferroelectric thin film, which The preparation method includes the following specific steps:

(1)按照摩尔比(1.05×0.5):(0.5×0.2):(0.5×0.8):(1.05×0.5×0.5):(0.5+0.5×0.5)分别称取5%过量Bi的Bi(CH3COO)3、Ca(CH3COO)2、Ba(CH3COO)2、5%过量Mg的Mg(OC2H5)2和Ti(OCH(CH3)2)4制备BCT-BMT前驱体溶液;(1) According to the molar ratio (1.05×0.5):(0.5×0.2):(0.5×0.8):(1.05×0.5×0.5):(0.5+0.5×0.5), respectively weigh the Bi(CH) of 5% excess Bi Preparation of BCT-BMT Precursors by 3COO) 3 , Ca(CH 3 COO) 2 , Ba(CH 3 COO) 2 , Mg(OC 2 H 5 ) 2 and Ti(OCH(CH 3 ) 2 ) 4 in 5 % excess Mg body solution;

将含过量Bi的Bi(CH3COO)3、Ca(CH3COO)2和Ba(CH3COO)2于60℃溶解在冰醋酸和去离子水的混合液体中,同时将含过量Mg的Mg(OC2H5)2、Ti(OCH(CH3)2)4溶解在CH3OCH2-CH2OH和CH3COCH2COCH3的混合液体中,最后将前面两种混合液再次混合于室温下搅拌30min,并放置20h,得到浓度为0.2M的BCT-BMT前驱体溶液;Bi(CH 3 COO) 3 , Ca(CH 3 COO) 2 and Ba(CH 3 COO) 2 containing excess Bi were dissolved in a mixed liquid of glacial acetic acid and deionized water at 60°C, while the excess Mg containing Mg(OC 2 H 5 ) 2 , Ti(OCH(CH 3 ) 2 ) 4 were dissolved in the mixed liquid of CH 3 OCH 2 -CH 2 OH and CH 3 COCH 2 COCH 3 , and finally the first two mixed liquids were mixed again Stir at room temperature for 30 min, and place for 20 h to obtain a BCT-BMT precursor solution with a concentration of 0.2 M;

(2)将步骤(1)得到的BCT-BMT前驱体溶液使用匀胶机以4000rpm的转速旋涂30s在Pt(111)/TiO2/SiO2/Si(100)衬底上面,得到湿膜;(2) The BCT-BMT precursor solution obtained in step (1) was spin-coated on the Pt(111)/TiO 2 /SiO 2 /Si(100) substrate at a speed of 4000 rpm for 30 s using a glue spinner to obtain a wet film ;

(3)将步骤(2)制得的湿膜首先在100℃干燥3min,然后在350℃热解3min,最后在700℃于空气氛围中退火20min。得到一层BCT-BMT薄膜;(3) The wet film obtained in step (2) was first dried at 100° C. for 3 minutes, then pyrolyzed at 350° C. for 3 minutes, and finally annealed at 700° C. in an air atmosphere for 20 minutes. A layer of BCT-BMT film was obtained;

(4)重复步骤(2)和步骤(3)8次,得到8层的BCT-BMT薄膜。(4) Repeating step (2) and step (3) 8 times to obtain an 8-layer BCT-BMT film.

实施例2Example 2

一种利用相变诱导无铅薄膜材料实现巨大负电卡效应的方法,具体为n(BaxCa(1-x))TiO3–(1-n)Bi(MgyTi(1-y))O3(BCT-BMT)铁电薄膜,其中x=0.5,y=0.8,n=0.5,即0.5(Ba0.5Ca0.5)TiO3–0.5Bi(Mg0.8Ti0.2)O3铁电薄膜,其制备方法包括如下具体步骤:A method to achieve a giant negative charge card effect using phase transition-induced lead-free thin film materials, specifically n(Ba x Ca (1-x) )TiO 3 –(1-n)Bi(Mg y Ti (1-y) ) O 3 (BCT-BMT) ferroelectric thin film, where x=0.5, y=0.8, n=0.5, i.e. 0.5(Ba 0.5 Ca 0.5 )TiO 3 -0.5Bi(Mg 0.8 Ti 0.2 )O 3 ferroelectric thin film, which The preparation method includes the following specific steps:

(1)按照摩尔比(1.05×0.5):(0.5×0.5):(0.5×0.5):(1.05×0.5×0.8):(0.5+0.5×0.2)分别称取5%过量Bi的Bi(CH3COO)3、Ca(CH3COO)2、Ba(CH3COO)2、5%过量Mg的Mg(OC2H5)2和Ti(OCH(CH3)2)4制备BCT-BMT前驱体溶液;(1) According to the molar ratio (1.05×0.5):(0.5×0.5):(0.5×0.5):(1.05×0.5×0.8):(0.5+0.5×0.2), respectively weigh the Bi(CH) of 5% excess Bi Preparation of BCT-BMT Precursors by 3COO) 3 , Ca(CH 3 COO) 2 , Ba(CH 3 COO) 2 , Mg(OC 2 H 5 ) 2 and Ti(OCH(CH 3 ) 2 ) 4 in 5 % excess Mg body solution;

将含过量Bi(CH3COO)3、Ca(CH3COO)2和Ba(CH3COO)2于80℃溶解在冰醋酸和去离子水的混合液体中,同时将含过Mg的Mg(OC2H5)2、Ti(OCH(CH3)2)4溶解在CH3OCH2-CH2OH和CH3COCH2COCH3的混合液体中,最后将前面两种混合液再次混合于室温下搅拌30min,并放置25h,得到浓度为0.23M的BCT-BMT前驱体溶液;Dissolve excess Bi(CH 3 COO) 3 , Ca(CH 3 COO) 2 and Ba(CH 3 COO) 2 in a mixed liquid of glacial acetic acid and deionized water at 80°C, while Mg(CH 3 COO) containing excess Mg( OC 2 H 5 ) 2 and Ti(OCH(CH 3 ) 2 ) 4 were dissolved in the mixed liquid of CH 3 OCH 2 -CH 2 OH and CH 3 COCH 2 COCH 3 , and finally the first two mixed liquids were mixed again at room temperature Under stirring for 30min, and placed for 25h to obtain a BCT-BMT precursor solution with a concentration of 0.23M;

(2)将步骤(1)得到的BCT-BMT前驱体溶液使用匀胶机以4500rpm的转速旋涂33s在Pt(111)/TiO2/SiO2/Si(100)衬底上面,得到湿膜;(2) The BCT-BMT precursor solution obtained in step (1) was spin-coated on the Pt(111)/TiO 2 /SiO 2 /Si(100) substrate at a speed of 4500 rpm for 33 s using a glue spinner to obtain a wet film ;

(3)将步骤(2)制得的湿膜首先在110℃干燥5min,然后在450℃热解7min,最后在750℃于空气氛围中退火22min。得到一层BCT-BMT薄膜;(3) The wet film obtained in step (2) was first dried at 110° C. for 5 minutes, then pyrolyzed at 450° C. for 7 minutes, and finally annealed at 750° C. in an air atmosphere for 22 minutes. A layer of BCT-BMT film was obtained;

(4)重复步骤(2)和步骤(3)8次,得到8层的BCT-BMT薄膜。(4) Repeating step (2) and step (3) 8 times to obtain an 8-layer BCT-BMT film.

实施例3Example 3

一种利用相变诱导无铅薄膜材料实现巨大负电卡效应的方法,具体为n(BaxCa(1-x))TiO3–(1-n)Bi(MgyTi(1-y))O3(BCT-BMT)铁电薄膜,其中x=0.5,y=0.8,n=0.5,即0.5(Ba0.5Ca0.5)TiO3–0.5Bi(Mg0.8Ti0.2)O3铁电薄膜,其制备方法包括如下具体步骤:A method to achieve a giant negative charge card effect using phase transition-induced lead-free thin film materials, specifically n(Ba x Ca (1-x) )TiO 3 –(1-n)Bi(Mg y Ti (1-y) ) O 3 (BCT-BMT) ferroelectric thin film, where x=0.5, y=0.8, n=0.5, i.e. 0.5(Ba 0.5 Ca 0.5 )TiO 3 -0.5Bi(Mg 0.8 Ti 0.2 )O 3 ferroelectric thin film, which The preparation method includes the following specific steps:

(1)按照摩尔比(1.05×0.5):(0.5×0.5):(0.5×0.5):(1.05×0.5×0.8):(0.5+0.5×0.2)分别称取5%过量Bi的Bi(CH3COO)3、Ca(CH3COO)2、Ba(CH3COO)2、5%过量Mg的Mg(OC2H5)2和Ti(OCH(CH3)2)4制备BCT-BMT前驱体溶液;(1) According to the molar ratio (1.05×0.5):(0.5×0.5):(0.5×0.5):(1.05×0.5×0.8):(0.5+0.5×0.2), respectively weigh the Bi(CH) of 5% excess Bi Preparation of BCT-BMT Precursors by 3COO) 3 , Ca(CH 3 COO) 2 , Ba(CH 3 COO) 2 , Mg(OC 2 H 5 ) 2 and Ti(OCH(CH 3 ) 2 ) 4 in 5 % excess Mg body solution;

将含过量Bi的Bi(CH3COO)3、Ca(CH3COO)2和Ba(CH3COO)2于100℃溶解在冰醋酸和去离子水的混合液体中,同时将含过量Mg的Mg(OC2H5)2、Ti(OCH(CH3)2)4溶解在CH3OCH2-CH2OH和CH3COCH2COCH3的混合液体中,最后将前面两种混合液再次混合于室温下搅拌30min,并放置30h,得到浓度为0.3M的BCT-BMT前驱体溶液;Bi(CH 3 COO) 3 , Ca(CH 3 COO) 2 and Ba(CH 3 COO) 2 containing excess Bi were dissolved in a mixed liquid of glacial acetic acid and deionized water at 100 °C, while the excess Mg containing Mg(OC 2 H 5 ) 2 , Ti(OCH(CH 3 ) 2 ) 4 were dissolved in the mixed liquid of CH 3 OCH 2 -CH 2 OH and CH 3 COCH 2 COCH 3 , and finally the first two mixed liquids were mixed again Stir at room temperature for 30 min and stand for 30 h to obtain a BCT-BMT precursor solution with a concentration of 0.3 M;

(2)将步骤(1)得到的BCT-BMT前驱体溶液使用匀胶机以6000rpm的转速旋涂40s在Pt(111)/TiO2/SiO2/Si(100)衬底上面,得到湿膜;(2) The BCT-BMT precursor solution obtained in step (1) was spin-coated on the Pt(111)/TiO 2 /SiO 2 /Si(100) substrate at a speed of 6000 rpm for 40 s using a glue spinner to obtain a wet film ;

(3)将步骤(2)制得的湿膜首先在300℃干燥10min,然后在500℃热解10min,最后在800℃于空气氛围中退火30min。得到一层BCT-BMT薄膜;(3) The wet film obtained in step (2) was first dried at 300° C. for 10 minutes, then pyrolyzed at 500° C. for 10 minutes, and finally annealed at 800° C. in an air atmosphere for 30 minutes. A layer of BCT-BMT film was obtained;

(4)重复步骤(2)和步骤(3)8次,得到8层的BCT-BMT薄膜。(4) Repeating step (2) and step (3) 8 times to obtain an 8-layer BCT-BMT film.

Claims (5)

1. A method for preparing a lead-free film material by utilizing phase change induction is characterized by comprising the following steps:
1) preparing a precursor solution of BCT-BMT having the general formula n (Ba)xCa(1-x))TiO3-(1-n)Bi(MgyTi(1-y))O3Wherein x is more than 0 and less than 1, y is more than 0 and less than 1, and n is more than 0 and less than 1;
2) spin coating the BCT-BMT precursor solution obtained in the step 1) on Pt (111)/TiOx/SiO2a/Si (100) substrate to obtain a wet film;
3) drying, pyrolyzing and annealing the wet film obtained in the step 2) to obtain a layer of BCT-BMT film, wherein the annealing temperature is 700-800 ℃, the annealing time is 20-30min, and the annealing environment is air atmosphere;
4) and (3) repeating the step 2) and the step 3) to obtain the multilayer BCT-BMT film.
2. The method for preparing a lead-free thin film material using phase transition induction according to claim 1, wherein the BCT-BMT precursor solution of step 1) is prepared by: adding Bi (CH)3COO)3、Ca(CH3COO)2And Ba (CH)3COO)2Dissolving in mixed liquid of glacial acetic acid and deionized water at 60-100 deg.C while adding Mg (OC)2H5)2、Ti(OCH(CH3)2)4Is dissolved in CH3OCH2-CH2OH and CH3COCH2COCH3And stirring the two mixed solutions at room temperature for 30min, standing for 20-30h to obtain BCT-BMT precursor solution with the concentration of 0.2-0.3M.
3. The method as claimed in claim 1, wherein the spin-coating speed in step 2) is 4000-6000rpm, and the spin-coating time is 30-40 s.
4. The method as claimed in claim 1, wherein the drying temperature in step 3) is 100-300 ℃, and the drying time is 3-10 min; the pyrolysis temperature is 350-500 ℃, and the pyrolysis time is 3-10 min.
5. The method for preparing a lead-free thin film material using phase transition induction according to claim 1, wherein the 8-layer BCT-BMT thin film is prepared in the step 4).
CN202010979458.1A 2020-09-17 2020-09-17 A kind of preparation method of lead-free thin film material using phase transition induction Pending CN112062552A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010979458.1A CN112062552A (en) 2020-09-17 2020-09-17 A kind of preparation method of lead-free thin film material using phase transition induction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010979458.1A CN112062552A (en) 2020-09-17 2020-09-17 A kind of preparation method of lead-free thin film material using phase transition induction

Publications (1)

Publication Number Publication Date
CN112062552A true CN112062552A (en) 2020-12-11

Family

ID=73681613

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010979458.1A Pending CN112062552A (en) 2020-09-17 2020-09-17 A kind of preparation method of lead-free thin film material using phase transition induction

Country Status (1)

Country Link
CN (1) CN112062552A (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003002650A (en) * 2000-12-27 2003-01-08 Mitsubishi Materials Corp Sbt ferroelectric thin film, composition for forming the same, and producing method for the same
CN103265282A (en) * 2013-05-14 2013-08-28 齐齐哈尔大学 Preparation method of barium-calcium carbonate and potassium-sodium niobate alternative spin-coating lead-free piezoelectric thick film
EP2459497B1 (en) * 2009-07-31 2016-12-28 Epcos AG Piezo-electric ceramic composition, method for producing the composition, and electric component comprising the composition
CN107188554A (en) * 2017-06-22 2017-09-22 广西大学 A kind of preparation method of ceramic target
EP2343268B1 (en) * 2008-05-28 2018-02-21 Mitsubishi Materials Corporation Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof
CN111128682A (en) * 2019-12-27 2020-05-08 广西大学 Preparation method of film for regulating and controlling performance of electric card through substrate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003002650A (en) * 2000-12-27 2003-01-08 Mitsubishi Materials Corp Sbt ferroelectric thin film, composition for forming the same, and producing method for the same
EP2343268B1 (en) * 2008-05-28 2018-02-21 Mitsubishi Materials Corporation Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof
EP2459497B1 (en) * 2009-07-31 2016-12-28 Epcos AG Piezo-electric ceramic composition, method for producing the composition, and electric component comprising the composition
CN103265282A (en) * 2013-05-14 2013-08-28 齐齐哈尔大学 Preparation method of barium-calcium carbonate and potassium-sodium niobate alternative spin-coating lead-free piezoelectric thick film
CN107188554A (en) * 2017-06-22 2017-09-22 广西大学 A kind of preparation method of ceramic target
CN111128682A (en) * 2019-12-27 2020-05-08 广西大学 Preparation method of film for regulating and controlling performance of electric card through substrate

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
BIAOLING PENG等: "Phase-transition induced giant negative electrocaloric effect in a lead-free relaxor ferroelectric thin film", 《ENERGY & ENVIRONMENT SCIENCE》 *

Similar Documents

Publication Publication Date Title
CN111128682A (en) Preparation method of film for regulating and controlling performance of electric card through substrate
CN114497390A (en) A kind of perovskite solar cell and preparation method thereof
CN113035991A (en) Low-temperature preparation CsPbI3Method for flexible perovskite solar cell
CN104538539B (en) A Composite Thick Film Material Cooled by Electric Card Effect
CN112062562B (en) Preparation method of KNN-based ultrahigh breakdown electric field single crystal thin film material
CN108892503A (en) A kind of high electric card effect thin-film material and preparation method thereof
CN112062563B (en) A kind of preparation method of PSINT-based high-entropy ferroelectric thin film material
CN108929111A (en) A kind of dielectric film and preparation method thereof of superelevation discharge energy-storage density
CN106935398B (en) A kind of bismuth strontium titanate doping thin film capacitor and preparation method thereof
CN110697771A (en) A kind of preparation method of high performance energy storage film
CN113087636B (en) Iodide, preparation method thereof, all-inorganic perovskite solar cell based on iodide and preparation method thereof
CN112062552A (en) A kind of preparation method of lead-free thin film material using phase transition induction
CN103708739A (en) Zinc-doped sodium bismuth titanate film and low temperature preparation method thereof
CN100586582C (en) Preparation method of barium tin titanate ferroelectric thin film
CN109494076B (en) Flexible sodium bismuth titanate-based thin-film capacitor with high energy storage characteristic and preparation method thereof
CN109957194A (en) A kind of composite film and its production method
CN112201478A (en) Strontium bismuth titanate/bismuth ferrite heterodielectric thin film with high energy storage density and its preparation method and application
CN110698705A (en) Preparation method of potassium tantalate niobate/P (VDF-TrFE-CTFE) based composite dielectric material
CN105198401A (en) Method for preparing double mismatch multi-element doped composite YBCO thin film
CN105957920B (en) A kind of Cu3BiS3The preparation method of film
CN108123045A (en) A kind of unleaded perovskite solar cell and preparation method thereof
CN112062564B (en) Preparation method of PMN-PSN ultrahigh breakdown electric field thin film material
CN111354852A (en) High-stability perovskite solar cell and preparation method thereof
CN112062553B (en) A kind of preparation method of Pb(ZrxTi1-x)O3-based thin film with negative electric trapping effect in ultra-wide temperature region
CN112062578A (en) Method for improving electric field breakdown strength of dielectric material

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20201211