[go: up one dir, main page]

CN112040743A - Heat conducting fin with coating layer structure - Google Patents

Heat conducting fin with coating layer structure Download PDF

Info

Publication number
CN112040743A
CN112040743A CN202010939719.7A CN202010939719A CN112040743A CN 112040743 A CN112040743 A CN 112040743A CN 202010939719 A CN202010939719 A CN 202010939719A CN 112040743 A CN112040743 A CN 112040743A
Authority
CN
China
Prior art keywords
layer
conductive sheet
inorganic
thermally conductive
inorganic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010939719.7A
Other languages
Chinese (zh)
Inventor
任泽明
王号
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Suqun Industrial Co ltd
Original Assignee
Guangdong Suqun Industrial Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Suqun Industrial Co ltd filed Critical Guangdong Suqun Industrial Co ltd
Priority to CN202010939719.7A priority Critical patent/CN112040743A/en
Publication of CN112040743A publication Critical patent/CN112040743A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating
    • H05K7/2039Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
    • H05K7/20509Multiple-component heat spreaders; Multi-component heat-conducting support plates; Multi-component non-closed heat-conducting structures
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating
    • H05K7/2089Modifications to facilitate cooling, ventilating, or heating for power electronics, e.g. for inverters for controlling motor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating
    • H05K7/20954Modifications to facilitate cooling, ventilating, or heating for display panels

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Laminated Bodies (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

The invention provides a heat conducting strip with a coating layer structure, wherein an inorganic layer, an organic layer and an inorganic layer are sequentially deposited on the surface of the heat conducting strip, and the inorganic layer is deposited by utilizing a plasma enhanced chemical vapor deposition method and has heat conductivity and gas barrier property; the organic layer is a polymer layer deposited by conventional chemical vapor deposition, and the toughness of the inorganic layer and the binding force between the inorganic layers are improved by hot melting treatment. The heat conducting fin with the coating layer structure has the characteristics of excellent heat conducting performance and good structural stability, and is suitable for heat conducting and radiating of high-power-consumption electronic and electric equipment.

Description

一种具有包覆层结构的导热片A thermally conductive sheet with a cladding structure

技术领域technical field

本发明涉及导热材料技术领域,具体涉及一种具有包覆层结构的导热片。The invention relates to the technical field of thermally conductive materials, in particular to a thermally conductive sheet with a cladding layer structure.

背景技术Background technique

石墨具有独特的晶粒取向,因此具有各向异性高导热的特点。以石墨为导热体的商业化产品,目前广泛应用于手机、笔记本电脑、医疗设备、LED屏幕等发热源的导热散热。石墨类导热片本身具有韧性差、易折断、导电性好等特点,在模切加工和使用中会造成石墨破碎、掉粉现象,从而存在电子设备短路的风险,因此往往需要进行包覆。Graphite has a unique grain orientation, so it has the characteristics of anisotropic high thermal conductivity. Commercial products using graphite as thermal conductors are currently widely used in heat conduction and heat dissipation of heat sources such as mobile phones, notebook computers, medical equipment, and LED screens. Graphite thermally conductive sheets have the characteristics of poor toughness, easy to break, and good electrical conductivity. During die-cutting and use, graphite will be broken and powder will fall off, so there is a risk of short circuit in electronic equipment, so it often needs to be coated.

为了防止石墨类导热片掉粉,目前常规使用胶黏剂进行表面包覆,但包覆厚度较厚,通常为2~10μm,影响石墨类导热片导热性能的发挥。为了减小保护层的厚度,专利CN102321867B使用气相沉积法,使石墨片表面被聚合物层包覆,然而聚合物本身的导热系数低,例如该专利使用的聚对二甲苯导热系数只有0.1 W/m·k左右,在一定程度上限制了石墨的导热性能。此外,聚合物是由高分子链组成,链与链之间存在空隙,水汽容易渗透至内部,长时间工作会使包覆层与石墨片鼓泡脱开,破坏导热片结构的完整性,使散热速度变慢。In order to prevent the graphite-based thermally conductive sheet from falling off powder, adhesives are currently used for surface coating, but the coating thickness is relatively thick, usually 2-10 μm, which affects the thermal conductivity of the graphite-based thermally conductive sheet. In order to reduce the thickness of the protective layer, the patent CN102321867B uses a vapor deposition method to coat the surface of the graphite sheet with a polymer layer. However, the thermal conductivity of the polymer itself is low. For example, the thermal conductivity of parylene used in this patent is only 0.1 W/ About m·k, which limits the thermal conductivity of graphite to a certain extent. In addition, the polymer is composed of polymer chains. There are gaps between the chains, and water vapor can easily penetrate into the interior. Long-term work will cause the coating layer and the graphite sheet to bubble off, destroying the structural integrity of the thermal conductive sheet, making the The cooling rate is slowed down.

因此,如何对导热片进行包覆,使其导热性能优异,水汽渗透率低,结构稳定性好是需要解决的问题。Therefore, how to coat the thermally conductive sheet to make it excellent in thermal conductivity, low in water vapor permeability and good in structural stability is a problem that needs to be solved.

发明内容SUMMARY OF THE INVENTION

针对现有技术中存在的问题,本发明的目的是提供一种具有包覆层结构的导热片,该包覆层取代纯有机物包覆,实现包覆层自身具有较高的导热系数,良好的气体阻隔性,与导热片之间具有稳定的结合力,同时包覆层自身具有一定的韧性,使该导热片能稳定地发挥导热性能。In view of the problems existing in the prior art, the purpose of the present invention is to provide a thermally conductive sheet with a coating layer structure, the coating layer replaces the coating of pure organic matter, and realizes that the coating layer itself has a high thermal conductivity, good thermal conductivity. The gas barrier property has a stable bonding force with the thermal conductive sheet, and the coating layer itself has a certain toughness, so that the thermal conductive sheet can stably exert thermal conductivity.

为了实现上述目的,本发明提供了一种具有包覆层结构的导热片,所述的该导热片表面依次沉积无机层、有机层、无机层,所述的无机层是利用等离子体增强化学气相沉积法沉积,具有导热性和气体阻隔性;有机层为常规化学气相沉积的聚合物层,经热熔处理,提高无机层的韧性以及无机层之间的结合力。该导热片具有优异的导热性和良好的结构稳定性。In order to achieve the above purpose, the present invention provides a thermally conductive sheet with a cladding structure, wherein an inorganic layer, an organic layer, and an inorganic layer are sequentially deposited on the surface of the thermally conductive sheet, and the inorganic layer is made of plasma-enhanced chemical vapor. It is deposited by deposition method and has thermal conductivity and gas barrier properties; the organic layer is a conventional chemical vapor deposited polymer layer, which is treated by hot melt to improve the toughness of the inorganic layer and the bonding force between the inorganic layers. The thermally conductive sheet has excellent thermal conductivity and good structural stability.

进一步地,further,

所述的导热片为石墨片、石墨烯膜、发泡石墨膜、石墨/树脂热界面材料。The thermally conductive sheet is a graphite sheet, a graphene film, a foamed graphite film, and a graphite/resin thermal interface material.

所述的导热片按照实际需求,可对其表面先进行等离子体表面活化处理,来增强导热片和无机层的结合力。According to actual requirements, the surface of the thermally conductive sheet may be subjected to plasma surface activation treatment to enhance the bonding force between the thermally conductive sheet and the inorganic layer.

所述的无机层成分为二氧化硅、氮化硅。The components of the inorganic layer are silicon dioxide and silicon nitride.

所述的内外无机层可以为两种相同或不同的成分。The inner and outer inorganic layers may be of the same or different compositions.

所述的等离子体增强化学气相沉积速度为5~80nm/min。当沉积速度小于5nm/min,沉积效率低;当沉积速度大于80nm/min,沉积速度过快会引起无机层内应力大,导致无机层脆性大。The plasma-enhanced chemical vapor deposition rate is 5-80 nm/min. When the deposition rate is less than 5nm/min, the deposition efficiency is low; when the deposition rate is greater than 80nm/min, the excessively fast deposition rate will cause large internal stress in the inorganic layer, resulting in high brittleness of the inorganic layer.

所述的无机层的厚度不大于3μm。当厚度大于3μm,无机层在导热片表面的附着力差。The thickness of the inorganic layer is not more than 3 μm. When the thickness is greater than 3 μm, the adhesion of the inorganic layer on the surface of the thermal conductive sheet is poor.

所述的无机层的导热系数不低于1W/m·k。当无机层的导热系数低于1W/m·k,会影响导热片整体的导热性能。The thermal conductivity of the inorganic layer is not less than 1 W/m·k. When the thermal conductivity of the inorganic layer is lower than 1W/m·k, it will affect the overall thermal conductivity of the thermally conductive sheet.

所述的中间层的聚合物为N型聚对二甲苯、C型聚对二甲苯、D型聚对二甲苯、F型聚对二甲苯、HT型聚对二甲苯。The polymers of the intermediate layer are N-type parylene, C-type parylene, D-type parylene, F-type parylene, and HT-type parylene.

所述的中间层的聚合物优选为N型聚对二甲苯、C型聚对二甲苯。这两种聚对二甲苯具有较低的熔点,热熔处理温度为100~160℃,可以在不破坏导热体含有的组分(如石墨/树脂导热片中的树脂)下实现无机层粘合。The polymer of the intermediate layer is preferably N-type parylene and C-type parylene. These two kinds of parylene have lower melting points, and the hot-melt treatment temperature is 100-160 °C, which can realize the bonding of inorganic layers without destroying the components contained in the thermal conductor (such as the resin in the graphite/resin thermal conductive sheet). .

所述的有机层的厚度为50~500nm。当厚度低于50nm,热熔后粘结性差,当厚度大于500nm,会影响导热片整体的导热性能。The thickness of the organic layer is 50-500 nm. When the thickness is less than 50nm, the adhesion after hot-melting is poor, and when the thickness is greater than 500nm, the overall thermal conductivity of the thermally conductive sheet will be affected.

与现有技术相比,本发明具有以下有益效果:Compared with the prior art, the present invention has the following beneficial effects:

本发明所述的包覆层为无机/有机/无机复合包覆层取代纯有机物包覆,该包覆层具有以下效果:The coating layer of the present invention is an inorganic/organic/inorganic composite coating layer that replaces pure organic coating, and the coating layer has the following effects:

1、包覆层厚度薄且具有良好的导热性,最大程度上降低保护层对导热片导热性能的影响;1. The thickness of the coating layer is thin and has good thermal conductivity, which minimizes the influence of the protective layer on the thermal conductivity of the thermal conductive sheet;

2、包覆层具有良好的气体阻隔性,可防止水汽进入导热片内部,避免包覆层与导热片脱开;2. The coating layer has good gas barrier properties, which can prevent water vapor from entering the interior of the thermal conductive sheet and prevent the coating layer from separating from the thermal conductive sheet;

3、有机层经热熔后提高了无机层韧性和无机层之间的结合力,能使导热片保持整体结构稳定。3. After the organic layer is hot-melted, the toughness of the inorganic layer and the bonding force between the inorganic layers are improved, which can keep the overall structure of the thermal conductive sheet stable.

附图说明Description of drawings

图1为本发明实施例制备的具有包覆层导热片的结构示意图。FIG. 1 is a schematic structural diagram of a thermally conductive sheet with a coating layer prepared in an embodiment of the present invention.

具体实施例specific embodiment

下面将对本发明实施例中的技术方案进行清楚、完整的描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域技术人员在没有付出创造性劳动的前提下所获得的所有其他实施方式,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other implementations obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

除非另有说明,本申请所使用的所有的技术和科学术语与本领域技术人员通常理解的含义相同。Unless otherwise defined, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art.

参见图1,本发明的较佳实施方式是提供一种具有包覆层的导热片100,导热片100表面依次沉积无机层201、有机层202、无机层203,即对导热片采用化学气相沉积包覆无机/有机/无机的复合层。Referring to FIG. 1 , a preferred embodiment of the present invention provides a thermally conductive sheet 100 with a coating layer, and an inorganic layer 201 , an organic layer 202 , and an inorganic layer 203 are sequentially deposited on the surface of the thermally conductive sheet 100 , that is, chemical vapor deposition is used for the thermally conductive sheet. Coating inorganic/organic/inorganic composite layers.

下面通过具体实施例对本发明进行详细说明。The present invention will be described in detail below through specific embodiments.

实施例1:Example 1:

制备具有包覆无机/有机/无机的复合层的导热片,选取人工合成石墨片作为导热片,厚度为25μm,然后开展以下包覆过程:A thermally conductive sheet with an inorganic/organic/inorganic composite layer was prepared, and a synthetic graphite sheet was selected as the thermally conductive sheet with a thickness of 25 μm, and then the following coating process was carried out:

步骤S1,等离子体增强化学气相沉积:将石墨片置于沉积腔内,用氧气-等离子体对石墨片表面预处理,再通入流量为20sccm氨气和流量为130sccm甲硅烷质量分数占5%的甲硅烷/氩气混合气,辉光放电频率为13.56MHz,功率为180W,氮化硅在石墨片表面以35nm/min的速度沉积,氮化硅层厚度为300nm。Step S1, plasma enhanced chemical vapor deposition: the graphite sheet is placed in the deposition chamber, the surface of the graphite sheet is pretreated with oxygen-plasma, and ammonia gas with a flow rate of 20 sccm and a flow rate of 130 sccm of monosilane account for 5% by mass fraction. The monosilane/argon gas mixture, the glow discharge frequency is 13.56MHz, the power is 180W, the silicon nitride is deposited on the surface of the graphite sheet at a speed of 35nm/min, and the thickness of the silicon nitride layer is 300nm.

步骤S2,常规化学气相沉积:将步骤S1的氮化硅包覆的石墨片置于沉积腔内,二氯对二甲苯二聚体在130℃下蒸发,650℃下分解后,在氮化硅表面沉积C型聚对二甲苯,厚度为100nm。Step S2, conventional chemical vapor deposition: place the silicon nitride-coated graphite sheet of step S1 in a deposition chamber, evaporate the dichloro-paraxylene dimer at 130° C., decompose at 650° C. C-type parylene was deposited on the surface with a thickness of 100 nm.

步骤S3,与步骤S1一致,氮化硅层厚度也为300nm。In step S3, which is consistent with step S1, the thickness of the silicon nitride layer is also 300 nm.

步骤S4,将氮化硅/C型聚对二甲苯/氮化硅包覆的石墨片在1MPa压力,温度为120℃下,持续10min,C型聚对二甲苯热熔使包覆层结合力加强。Step S4, the silicon nitride/C-type parylene/silicon nitride-coated graphite sheet is heated at a pressure of 1 MPa and a temperature of 120° C. for 10 minutes, and the C-type parylene is hot-melted to make the bonding force of the coating layer. strengthen.

实施例2:Example 2:

制备具有包覆无机/有机/无机的复合层的导热片,选取石墨纤维/硅胶导热界面材料作为导热片,为了防止石墨纤维掉粉,增加导热片的绝缘性,提高硅胶的耐候性(防水气、氧气,耐热等),对其进行包覆,步骤为:To prepare a thermally conductive sheet with a composite layer coated with inorganic/organic/inorganic, graphite fiber/silica gel thermal interface material is selected as the thermally conductive sheet. , oxygen, heat resistance, etc.), to coat it, the steps are:

步骤S1,等离子体增强化学气相沉积步骤:将石墨纤维/硅胶片置于沉积腔内,通入流量为10sccm六甲基二硅氧烷和流量为30sccm氧气,辉光放电频率为13.56MHz,功率为50W,二氧化硅在石墨纤维/硅胶片表面以40nm/min的速度沉积,二氧化硅层厚度为200nm。Step S1, the plasma-enhanced chemical vapor deposition step: place the graphite fiber/silica gel sheet in the deposition chamber, pass hexamethyldisiloxane with a flow rate of 10 sccm and oxygen with a flow rate of 30 sccm, a glow discharge frequency of 13.56 MHz, and a power of 13.56 MHz. For 50W, silica is deposited on the surface of the graphite fiber/silica sheet at a speed of 40 nm/min, and the thickness of the silica layer is 200 nm.

步骤S2,常规化学气相沉积步骤:将步骤S1的二氧化硅包覆的石墨纤维/硅胶片置于沉积腔内,对二甲苯二聚体在120℃下蒸发,650℃下分解后,在二氧化硅表面沉积N型聚对二甲苯,厚度为150nm。Step S2, conventional chemical vapor deposition step: place the silica-coated graphite fiber/silica gel sheet of step S1 in a deposition chamber, evaporate the p-xylene dimer at 120 °C, decompose at 650 °C, N-type parylene was deposited on the surface of silicon oxide with a thickness of 150 nm.

步骤S3,与步骤S1一致,二氧化硅层厚度为200nm。In step S3, which is consistent with step S1, the thickness of the silicon dioxide layer is 200 nm.

步骤S4,将二氧化硅/N型聚对二甲苯/二氧化硅包覆的石墨纤维/硅胶片,置于温度120℃下,持续5min,N型聚对二甲苯热熔使包覆层结合力加强。In step S4, the silica/N-type parylene/silica-coated graphite fiber/silica gel sheet is placed at a temperature of 120° C. for 5 minutes, and the N-type parylene is hot-melted to bond the coating layer. strengthen.

实施例3:Example 3:

制备具有包覆无机/有机/无机的复合层的导热片,选取发泡石墨膜作为导热片,包覆步骤为:Prepare a thermally conductive sheet with an inorganic/organic/inorganic composite layer, select a foamed graphite film as the thermally conductive sheet, and the coating steps are:

步骤S1,等离子体增强化学气相沉积步骤:将发泡石墨膜置于沉积腔内,用氧气-等离子体对发泡石墨膜表面预处理,再通入流量为20sccm氨气和流量为130sccm甲硅烷质量分数占5%的甲硅烷/氩气混合气,辉光放电频率为13.56MHz,功率为180W,氮化硅在发泡石墨膜表面以70nm/min的速度沉积,氮化硅层厚度为600nm。Step S1, the plasma-enhanced chemical vapor deposition step: placing the foamed graphite film in the deposition chamber, pretreating the surface of the foamed graphite film with oxygen-plasma, and then introducing ammonia gas with a flow rate of 20 sccm and monosilane with a flow rate of 130 sccm Monosilane/argon gas mixture with a mass fraction of 5%, the glow discharge frequency is 13.56MHz, the power is 180W, silicon nitride is deposited on the surface of the foamed graphite film at a speed of 70nm/min, and the thickness of the silicon nitride layer is 600nm .

步骤S2,常规化学气相沉积步骤:将步骤S1的氮化硅包覆的发泡石墨膜置于沉积腔内,二氯对二甲苯二聚体在130℃下蒸发,650℃下分解后,在氮化硅表面沉积C型聚对二甲苯,厚度为300nm。Step S2, a conventional chemical vapor deposition step: placing the silicon nitride-coated foamed graphite film of step S1 in a deposition chamber, evaporating the dichloro-paraxylene dimer at 130° C., decomposing at 650° C., C-type parylene was deposited on the surface of silicon nitride with a thickness of 300 nm.

S3,与实施例2的S1步骤一致,二氧化硅层厚度为200nm。S3, consistent with step S1 in Example 2, the thickness of the silicon dioxide layer is 200 nm.

S4,将二氧化硅/C型聚对二甲苯/氮化硅包覆的发泡石墨膜置于温度120℃下,持续5min,C型聚对二甲苯热熔使包覆层结合力加强。S4, the silica/C-type parylene/silicon nitride-coated foamed graphite film is placed at a temperature of 120° C. for 5 minutes, and the C-type parylene is hot-melted to strengthen the bonding force of the coating layer.

对比例:Comparative ratio:

选取厚度为25μm的人工合成石墨片作为导热片,包覆步骤为:A synthetic graphite sheet with a thickness of 25 μm is selected as the thermal conductive sheet, and the coating steps are as follows:

将石墨片置于沉积腔内,用氧气-等离子体对石墨片表面预处理,二氯对二甲苯二聚体在130℃下蒸发,650℃下分解后,在石墨片表面沉积C型聚对二甲苯,厚度为700nm(与实施例1中氮化硅300nm,C型聚对二甲苯层100nm,氮化硅300nm总厚度一致)。The graphite sheet was placed in a deposition chamber, and the surface of the graphite sheet was pretreated with oxygen-plasma. The dichloro-paraxylene dimer was evaporated at 130 °C, and after decomposing at 650 °C, C-type polyparatyl was deposited on the surface of the graphite sheet. The thickness of xylene is 700 nm (the same as the total thickness of silicon nitride 300 nm, C-type parylene layer 100 nm, and silicon nitride 300 nm in Example 1).

将纯C型聚对二甲苯包覆的石墨片在1MPa压力,温度为120℃下,持续10min处理。The pure C-type parylene-coated graphite sheet was treated at a pressure of 1 MPa and a temperature of 120 °C for 10 min.

实施例1-3和对比例制备得到的具有包覆层结构的导热片,对导热篇中的包覆层进行导热性和气体阻隔性测试。导热性能的测试的方法是3ω瞬态平面热源法(DOI:10.1063/1.2714650)。气体阻隔性测试方法是压差法气体渗透,测试标准为ASTM D1653,仪器为W3/0120水蒸气透过率测试仪。结果如表1所示。The thermal conductivity and gas barrier properties of the cladding layers in the thermal conductivity chapter were tested for the thermally conductive sheets with cladding layer structures prepared in Examples 1-3 and Comparative Examples. The test method for thermal conductivity is the 3ω transient planar heat source method (DOI: 10.1063/1.2714650). The test method of gas barrier property is the differential pressure gas permeability method, the test standard is ASTM D1653, and the instrument is W3/0120 water vapor transmission rate tester. The results are shown in Table 1.

表1 性能测试结果Table 1 Performance test results

Figure 837261DEST_PATH_IMAGE001
Figure 837261DEST_PATH_IMAGE001

从表1可以看出,相对于纯有机物包覆,无机/有机/无机包覆的复合层的导热率更高,水汽透过率更低。也就是说,无机/有机/无机包覆的复合层具有较高的导热系数,良好的气体阻隔性。It can be seen from Table 1 that the thermal conductivity of the inorganic/organic/inorganic-coated composite layer is higher and the water vapor transmission rate is lower than that of the pure organic coating. That is to say, the inorganic/organic/inorganic coated composite layer has high thermal conductivity and good gas barrier properties.

以上所述仅为本申请的优选实施例,并不用于限制本申请,对于本领域的技术人员来说,本申请可以有各种更改和变化。凡在本申请的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本申请的保护范围之内。The above descriptions are only preferred embodiments of the present application, and are not intended to limit the present application. For those skilled in the art, the present application may have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of this application shall be included within the protection scope of this application.

Claims (10)

1. The heat conductor with the coating structure is characterized in that an inorganic layer, an organic layer and an inorganic layer are sequentially deposited on the surface of the heat conductor, the inorganic layer is deposited by utilizing a plasma enhanced chemical vapor deposition method, and the organic layer is a polymer layer deposited by utilizing a conventional chemical vapor deposition method and is subjected to hot melting treatment.
2. A thermally conductive sheet having a clad structure as claimed in claim 1, wherein the thermally conductive sheet is a graphite sheet, a graphene film, a foamed graphite film, or a graphite/resin thermal interface material.
3. A heat-conductive sheet having a clad structure as claimed in claim 1, wherein the inner and outer inorganic layers may be of the same or different composition.
4. A heat conductive sheet having a clad structure as claimed in claim 1 or 3, wherein the inorganic layer is preferably silicon dioxide and/or silicon nitride.
5. A thermally conductive sheet having a clad structure as claimed in claim 1, wherein the inorganic layer has a thickness of not more than 3 μm.
6. The heat conductive sheet with a clad structure as claimed in claim 1 or 5, wherein the PECVD deposition rate is 5-80 nm/min.
7. A thermally conductive sheet having a clad structure as claimed in claim 1, wherein the inorganic layer has a thermal conductivity of not less than 1W/m-k.
8. A heat conductive sheet having a clad structure as claimed in claim 1, wherein the polymer of the intermediate layer is parylene N, parylene C, parylene D, parylene F, parylene HT.
9. A heat conductive sheet having a clad structure as claimed in claim 1, wherein the organic layer has a thickness of 50 to 500 nm.
10. The heat conductive sheet with a covering layer structure as claimed in claim 1, wherein the hot-melt processing temperature is 100 to 160 ℃.
CN202010939719.7A 2020-09-09 2020-09-09 Heat conducting fin with coating layer structure Pending CN112040743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010939719.7A CN112040743A (en) 2020-09-09 2020-09-09 Heat conducting fin with coating layer structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010939719.7A CN112040743A (en) 2020-09-09 2020-09-09 Heat conducting fin with coating layer structure

Publications (1)

Publication Number Publication Date
CN112040743A true CN112040743A (en) 2020-12-04

Family

ID=73584454

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010939719.7A Pending CN112040743A (en) 2020-09-09 2020-09-09 Heat conducting fin with coating layer structure

Country Status (1)

Country Link
CN (1) CN112040743A (en)

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1364396A (en) * 2000-03-07 2002-08-14 出光兴产株式会社 Active-drive organic EL display device and method for manufacturing the same
CN1417375A (en) * 2002-12-13 2003-05-14 北京工业大学 Method and equipment for raising speed of electronic cyclotron resonance chemical vapor deposition
CN1437177A (en) * 2002-02-06 2003-08-20 株式会社日立制作所 Organic Luminous display device
CN1787702A (en) * 2004-12-09 2006-06-14 北京大学 Method for preparing organic luminous device with red light
CN101048055A (en) * 2006-03-30 2007-10-03 通用电气公司 Advanced heat sinks and thermal spreaders
CN101134814A (en) * 2006-08-24 2008-03-05 E.I.内穆尔杜邦公司 hole transport polymer
CN101511903A (en) * 2006-07-28 2009-08-19 第三化成株式会社 Chemical vapor deposition apparatus and method
CN104465721A (en) * 2014-12-05 2015-03-25 国家电网公司 Silicon carbide epitaxial material and preparing method thereof
CN104494249A (en) * 2014-12-12 2015-04-08 中国科学院重庆绿色智能技术研究院 High-barrier graphene composite film and preparation method thereof
CN105185970A (en) * 2015-08-13 2015-12-23 深圳市贝特瑞新能源材料股份有限公司 Silicon-coated carbon particle composite material and preparation method and equipment and application
CN105325067A (en) * 2013-06-19 2016-02-10 日进材料股份有限公司 Conductive heat-dissipating sheet, and electrical parts and electronic devices comprising same
CN107949658A (en) * 2015-09-21 2018-04-20 Posco公司 By the color development treatment method of the substrate of color development treatment and the substrate
CN110224082A (en) * 2019-07-17 2019-09-10 云谷(固安)科技有限公司 The production method and display device of thin-film packing structure, thin-film packing structure
CN210723099U (en) * 2019-12-06 2020-06-09 中国乐凯集团有限公司 Flexible packaging adhesive film for flexible OLED device

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1364396A (en) * 2000-03-07 2002-08-14 出光兴产株式会社 Active-drive organic EL display device and method for manufacturing the same
CN1437177A (en) * 2002-02-06 2003-08-20 株式会社日立制作所 Organic Luminous display device
CN1417375A (en) * 2002-12-13 2003-05-14 北京工业大学 Method and equipment for raising speed of electronic cyclotron resonance chemical vapor deposition
CN1787702A (en) * 2004-12-09 2006-06-14 北京大学 Method for preparing organic luminous device with red light
CN101048055A (en) * 2006-03-30 2007-10-03 通用电气公司 Advanced heat sinks and thermal spreaders
CN101511903A (en) * 2006-07-28 2009-08-19 第三化成株式会社 Chemical vapor deposition apparatus and method
CN101134814A (en) * 2006-08-24 2008-03-05 E.I.内穆尔杜邦公司 hole transport polymer
CN105325067A (en) * 2013-06-19 2016-02-10 日进材料股份有限公司 Conductive heat-dissipating sheet, and electrical parts and electronic devices comprising same
CN104465721A (en) * 2014-12-05 2015-03-25 国家电网公司 Silicon carbide epitaxial material and preparing method thereof
CN104494249A (en) * 2014-12-12 2015-04-08 中国科学院重庆绿色智能技术研究院 High-barrier graphene composite film and preparation method thereof
CN105185970A (en) * 2015-08-13 2015-12-23 深圳市贝特瑞新能源材料股份有限公司 Silicon-coated carbon particle composite material and preparation method and equipment and application
CN107949658A (en) * 2015-09-21 2018-04-20 Posco公司 By the color development treatment method of the substrate of color development treatment and the substrate
CN110224082A (en) * 2019-07-17 2019-09-10 云谷(固安)科技有限公司 The production method and display device of thin-film packing structure, thin-film packing structure
CN210723099U (en) * 2019-12-06 2020-06-09 中国乐凯集团有限公司 Flexible packaging adhesive film for flexible OLED device

Similar Documents

Publication Publication Date Title
CN105050314B (en) Electromagnetic shielding materials for fpc
WO2015072487A1 (en) Electromagnetic-wave-absorbing heat dissipation sheet
TW200916549A (en) Thermosetting encapsulation adhesive sheet
JP2007237588A (en) Gas-barrier film and method for producing the film
CN103275629A (en) High thermal conductivity cellophane and preparation method thereof
CN103382549B (en) A kind of preparation method of multilayered structure high-isolation film
CN110484097A (en) A kind of composite electromagnetic screen conductive coating and preparation method thereof and application method
JP2013506029A (en) Adhesive compositions and methods of use and preparation of these adhesive compositions
CN105419667A (en) Heat-conducting and high-viscosity double-sided tape adopting metal as base material
TW202204511A (en) Prepreg and metallic clad laminate
CN103722805A (en) Highly thermal-conductive aluminum-based copper-clad plate
CN112040743A (en) Heat conducting fin with coating layer structure
CN103619155A (en) Electromagnetic wave shielding film with high barrier property
CN110862695A (en) High-thermal-conductivity high-insulation thermoplastic resin composition and preparation method and application thereof
TW202011086A (en) Composite stacked liquid crystal polymer substrate and preparation method thereof
TW201233319A (en) Electromagnetic wave noise suppression member, method for use thereof and electronic device
CN115746740B (en) Electromagnetic shielding protection film
CN102891115B (en) Substrate and preparation method thereof
TWI605749B (en) Electromagnetic interference shielding film
Qiu et al. Multilayer Graphite–Ga68. 5In21. 5Sn10 Composites as Highly Thermal Conductive and Low‐Cost Material
KR102205956B1 (en) Method for manufacturing glass substrate-metallic substrate assembly for fabricating flexible elements
TW202132520A (en) Bonding film, bonding film laminate comprising the same and metal clad laminate comprising the same
JPH04267597A (en) Manufacturing method of flexible printed wiring board
JP2006306067A (en) Heat conductive sheet
CN113292933A (en) High-thermal-conductivity-coefficient pressure-sensitive adhesive and high-thermal-conductivity-coefficient pressure-sensitive adhesive tape

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20201204

RJ01 Rejection of invention patent application after publication