CN112015053B - Pupil compensation device and photoetching machine - Google Patents
Pupil compensation device and photoetching machine Download PDFInfo
- Publication number
- CN112015053B CN112015053B CN201910464486.7A CN201910464486A CN112015053B CN 112015053 B CN112015053 B CN 112015053B CN 201910464486 A CN201910464486 A CN 201910464486A CN 112015053 B CN112015053 B CN 112015053B
- Authority
- CN
- China
- Prior art keywords
- compensation
- pupil
- guide
- compensation mechanism
- driver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 210000001747 pupil Anatomy 0.000 title claims abstract description 204
- 238000001259 photo etching Methods 0.000 title abstract description 8
- 230000007246 mechanism Effects 0.000 claims abstract description 119
- 238000005286 illumination Methods 0.000 claims description 25
- 238000001459 lithography Methods 0.000 claims description 18
- 230000033001 locomotion Effects 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 230000000903 blocking effect Effects 0.000 claims description 7
- 230000008878 coupling Effects 0.000 abstract description 13
- 238000010168 coupling process Methods 0.000 abstract description 13
- 238000005859 coupling reaction Methods 0.000 abstract description 13
- 238000010586 diagram Methods 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Eye Examination Apparatus (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a pupil compensation device and a photoetching machine, wherein the pupil compensation device comprises a bracket main body, a driving device and a compensation mechanism, the driving device is arranged on the bracket main body, the driving device is used for driving the compensation mechanism to move on a pupil plane, the compensation mechanism is used for compensating pupil uniformity, the compensation mechanism comprises a compensation main body and a compensation piece arranged on the compensation main body, the compensation main body is connected with the bracket main body in a sliding mode, and the compensation piece is used for compensating pupil uniformity. The pupil compensation device can compensate the pupil uniformity on the pupil plane, and the compensation degree of the compensation mechanism to the pupil uniformity is adjustable, so that the position of the compensation mechanism can be adjusted according to different pupil uniformity compensation requirements, and the coupling efficiency of the pupil compensation device is high. In addition, the pupil compensation device is simple in structure and high in reliability.
Description
Technical Field
The invention relates to the technical field of photoetching, in particular to a pupil compensation device and a photoetching machine.
Background
An exposure system in a projection lithography machine transfers a pattern on a mask surface to a silicon wafer surface through an illumination system and forms a desired pattern. The indices of the illumination system include the spot energy projected onto the mask plane, which determines the throughput of the lithography machine, the spot uniformity, which determines the relative difference in the directional width of the exposed lines, i.e. indirectly affects the resolution of the lithography machine, and the pupil uniformity.
The illumination system mostly comprises a mercury lamp and quartz rod dodging unit, especially when the exposure field of the exposure system is in a rectangular structure, the pupil uniformity of the mask surface is generally 25% -30%, and a corresponding pupil compensation device is generally added in order to improve the pupil uniformity of the illumination system.
A pupil compensation arrangement of prior art includes two mounting substrate, a plurality of motor, lead screw, guide rail, probe and control system, control system control motor motion to through the vertical of motor drive correspondence probe in the pupil plane and radially with different stroke motion, thereby influence the light intensity distribution of pupil plane, improve the pupil effect. However, the pupil compensation device has several disadvantages as follows: firstly, the pupil compensation device comprises a plurality of lead screws, guide rails and probes, a plurality of motors are respectively designed in the vertical direction and the radial direction of a pupil plane, the pupil compensation device is very complex in structure, and meanwhile, a control system is also complex, so that the difficulty of debugging and maintenance is increased inevitably, and the efficiency of debugging and maintenance is reduced; secondly, because the pupil compensation device is designed with a plurality of motors, the pupil compensation device has low reliability; thirdly, the pupil compensation device is complicated in structure, occupies a large space, and inevitably affects the spatial layout of the exposure system.
Fig. 1 is a schematic structural diagram of another pupil compensation device in the prior art, and referring to fig. 1, the pupil compensation device performs pupil compensation by means of mechanical light blocking, the pupil compensation device includes a square diaphragm 100, the square diaphragm 100 is located at a position before light enters a dodging system (quartz rod), and an entrance window of the quartz rod is corrected into a symmetrical structure by the square diaphragm 100. Although the pupil compensation device has a simple structure, and the pupil uniformity of the exposure system can be greatly improved by adjusting the entrance window of the quartz rod to be a square symmetrical structure, the defect is that the energy loss of light spots can be caused in other exposure modes without pupil compensation, and the coupling efficiency of the pupil compensation device is reduced.
In another pupil compensation device in the prior art, a plurality of spliced filters are used to compensate the pupil, the structure of the pupil compensation device is similar to the principle of the pupil compensation device in fig. 1, and the position of the filter is adjusted in real time by a control system of the pupil compensation device to compensate the pupil. However, the defects are that the compensation accuracy of the pupil compensation device is influenced by the detection accuracy of the energy detector, the transmittance of the filter is influenced by the temperature, the large-angle light is easy to filter, the illumination of the mask surface is reduced by the influence of the filter, namely, the energy loss is easy to cause, the coupling efficiency of the pupil compensation device is low, the pupil compensation device has a complex structure, and the reliability is low.
Therefore, it is urgently needed to provide a pupil compensation device with simple structure and high coupling efficiency.
Disclosure of Invention
The invention aims to provide a pupil compensation device and a photoetching machine, and aims to solve the problems that the existing pupil compensation device and the traditional photoetching machine are simple in structure and cannot achieve high coupling efficiency. In order to solve the above technical problems, the present invention provides a pupil compensation apparatus, which includes a support main body, a driving device and a compensation mechanism, wherein the driving device is disposed on the support main body, the driving device is used for driving the compensation mechanism to move on a pupil plane, the compensation mechanism is used for compensating pupil uniformity, the compensation mechanism includes a compensation main body, and a compensation element disposed on the compensation main body, the compensation main body is slidably connected with the support main body, and the compensation element is used for compensating pupil uniformity.
Optionally, the compensator is a plate provided with a plurality of through holes, or the compensator is a light plate.
Optionally, the compensation element is made of a transparent material or a non-transparent material.
Optionally, the compensating part includes at least two strip structures extending from the compensating body, and the strip structures may be cylinders or polyhedrons.
Optionally, the compensating mechanism further comprises a guide device, wherein the guide device is arranged on the bracket main body and used for guiding the compensating mechanism to move.
Optionally, the guide device includes a guide rail, the guide rail is fixedly disposed on the bracket main body, and the guide rail is slidably connected to the compensation mechanism.
Optionally, the guide device further includes a sliding block, the guide rail is connected with the sliding block in a sliding manner, and the compensation mechanism is fixedly connected with the sliding block.
Optionally, the guide rail is a linear guide rail.
Optionally, the guide device further comprises a first guide for blocking the compensation mechanism from tilting relative to the guide rail in the pupil plane or in a plane parallel to the pupil plane.
Optionally, the first guiding element comprises a first guiding bracket and at least one first guiding wheel rotatably connected with the first guiding bracket, the rotating shaft of the first guide wheel is vertical to the pupil plane, the driving device comprises a driver, a gear and a spur rack meshed with the gear, the driver is arranged on the bracket main body and used for providing driving force, the output end of the driver is connected with the gear, the gear is rotationally connected with the bracket main body, the spur rack is fixedly connected with the compensation mechanism, the spur rack comprises a first side surface and a second side surface, the first side surface and the second side surface are perpendicular to the pupil plane, a plurality of meshing teeth are formed in the first side face and are arranged along the length direction of the straight rack, and the peripheral face of the first guide wheel is in contact with the second side face of the straight rack.
Optionally, the number of the first guide wheels is two, and the two first guide wheels are sequentially arranged along the moving direction of the compensation mechanism.
Optionally, the guide device further comprises a second guide for blocking the compensation mechanism from tilting relative to the guide rail in a plane perpendicular to the pupil plane and parallel to the direction of movement of the compensation mechanism.
Optionally, the second guiding element includes a second guiding bracket and at least one second guiding wheel rotatably connected to the second guiding bracket, a rotation shaft of the second guiding wheel is parallel to the pupil plane, the driving device includes a driver, a gear and a spur rack engaged with the gear, the driver is disposed on the bracket main body, the driver is configured to provide a driving force, an output end of the driver is connected to the gear, the gear is rotatably connected to the bracket main body, the spur rack is fixedly connected to the compensating mechanism, the spur rack includes a third side surface and a fourth side surface, the third side surface and the fourth side surface are parallel to the pupil plane, and an outer peripheral surface of the second guiding wheel is in contact with one of the third side surface and the fourth side surface of the spur rack.
Optionally, the number of the second guide wheels is two, the outer peripheral surface of one of the second guide wheels is in contact with the third side surface of the spur rack, and the outer peripheral surface of the other of the second guide wheels is in contact with the fourth side surface of the spur rack.
Optionally, drive arrangement include driver, gear and with gear engagement's spur rack, the driver sets up in the support main part, the driver is used for providing drive power, the output of driver with gear connection, the gear with the support main part rotates to be connected, the spur rack with compensation mechanism fixed connection.
Optionally, the compensation mechanism further comprises a limiting device and a position sensor, the limiting device is used for limiting the compensation mechanism to move within a predetermined travel range, and the position sensor is used for detecting the position of the compensation mechanism.
Optionally, the support further comprises a cover, the cover is fixedly connected with the support main body, and the compensation mechanism is arranged in a space enclosed by the cover and the support main body.
The invention also provides a lithography machine, which comprises an illumination system and at least one pupil compensation device fixed in the illumination system, wherein the compensation mechanism is arranged on a pupil plane of the illumination system, and the moving direction of the compensation mechanism is parallel to the pupil plane.
Optionally, the number of the pupil compensation devices is two, and the two pupil compensation devices are symmetrically fixed in the illumination system.
The pupil compensation device and the photoetching machine provided by the invention have the following beneficial effects:
the compensation mechanism in the pupil compensation device is used for compensating the pupil uniformity, and the driving device is used for driving the compensation mechanism to move on the pupil plane, so that the compensation mechanism in the pupil compensation device can compensate the pupil uniformity on the pupil plane, and the compensation mechanism can move on the pupil plane, therefore, the compensation degree of the compensation mechanism on the pupil uniformity can be adjusted, the position of the compensation mechanism can be adjusted according to different pupil uniformity compensation requirements, and the coupling efficiency of the pupil compensation device is high. In addition, the pupil compensation device only comprises a bracket main body, a driving device and a compensation mechanism, and is simple in structure and high in reliability.
Drawings
FIG. 1 is a schematic diagram of a conventional pupil compensation apparatus;
FIG. 2 is a schematic diagram of a pupil compensation apparatus according to an embodiment of the invention;
FIG. 3 is a schematic view of the internal structure of the pupil compensation apparatus of FIG. 2 with the housing removed;
FIG. 4 is a schematic view of a further internal structure of the pupil compensation apparatus of FIG. 2 with the housing removed;
FIG. 5a is a schematic structural diagram of a compensating mechanism in one embodiment of the present invention;
FIG. 5b is a schematic structural diagram of a compensating mechanism in another embodiment of the present invention;
FIG. 5c is a schematic structural diagram of a compensating mechanism in yet another embodiment of the present invention;
FIG. 5d is a schematic structural diagram of a compensating mechanism in yet another embodiment of the present invention;
FIG. 6 is a schematic diagram of an illumination system of a lithography machine provided with two pupil compensators according to an embodiment of the invention;
FIG. 7 is a graph comparing pupil uniformity without compensation by a pupil compensation device and with compensation by a pupil compensation device for a lithography machine according to an embodiment of the invention;
FIG. 8 is a graph comparing coupling efficiency of a lithography machine compensated using a pupil compensation device and compensated using an aperture in an embodiment of the invention;
FIG. 9 is a graph comparing pupil uniformity for a lithography machine compensated using a pupil compensation device and compensated using an aperture in accordance with an embodiment of the present invention.
Description of reference numerals:
100-square diaphragm;
200-pupil compensation means;
210-a stent body;
221-a driver; 222-a gear; 223-straight rack; 224-a first side; 225-second side; 226-third side; 228-engaging teeth;
230-a compensation mechanism; 231-a compensating body; 232-a compensator; 233-circular through holes;
241-a guide rail; 242-a slider; 243-a first guide bracket; 244 — a first guide wheel; 245-a second guide bracket; 246-a second guide wheel;
251-a limiting device; 252-a position sensor;
260-housing.
Detailed Description
The pupil compensation device and the lithography machine according to the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more apparent from the following description. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Referring to fig. 2, 3 and 4, fig. 2 is a schematic structural diagram of a pupil compensation apparatus 200 in an embodiment of the present invention, fig. 3 is a schematic structural diagram of an internal structure of the pupil compensation apparatus 200 in fig. 2 with a cover 260 removed, and fig. 4 is a schematic structural diagram of another internal structure of the pupil compensation apparatus 200 in fig. 2 with the cover 260 removed, this embodiment provides a pupil compensation apparatus 200, the pupil compensation apparatus 200 includes a support main body 210, a driving apparatus and a compensation mechanism 230, the driving apparatus is disposed on the support main body 210, the driving apparatus is used for driving the compensation mechanism 230 to move on a pupil plane, and the compensation mechanism 230 is used for compensating pupil uniformity. Since the compensation mechanism 230 in the pupil compensation apparatus 200 is used for compensating the pupil uniformity, and the driving apparatus is used for driving the compensation mechanism 230 to move on the pupil plane, the compensation mechanism 230 in the pupil compensation apparatus 200 can compensate the pupil uniformity on the pupil plane, and the compensation mechanism 230 can move on the pupil plane, so that the compensation degree of the compensation mechanism 230 on the pupil uniformity can be adjusted, and thus the position of the compensation mechanism 230 can be adjusted according to different pupil uniformity compensation requirements, so that the coupling efficiency of the pupil compensation apparatus 200 is high. In addition, the pupil compensation device 200 only comprises the bracket main body 210, the driving device and the compensation mechanism 230, and has simple structure and high reliability. Compared with the device adopting a fixed square diaphragm for pupil uniformity compensation, the energy loss in the illumination mode without pupil uniformity compensation can be reduced. Pupil uniformity compensation for a variety of illumination systems can be achieved by replacing the compensation mechanisms 230 of different shapes, sizes, and compensation ratios.
As shown in fig. 2, 3 and 4, the compensation mechanism 230 moves in the X direction, and a direction parallel to the pupil plane and perpendicular to the X direction is the Y direction and a direction perpendicular to the pupil plane is the Z direction.
The driving device includes a driver 221 and a transmission device, and the driver 221 and the transmission device are disposed on the stand body 210. The driver 221 is configured to provide a driving force, and the transmission is configured to convert the driving force into a linear driving force and transmit the linear driving force to the compensating mechanism 230 to drive the compensating mechanism 230 to move.
Specifically, the driver 221 may be a motor. The transmission device comprises a gear 222 and a spur rack 223 engaged with the gear 222, the gear 222 is rotatably connected with the bracket main body 210 and is coaxially arranged with an output shaft of the motor, and the spur rack 223 is arranged on the bracket main body 210 and is slidably connected with the bracket main body 210. As shown in fig. 2, 3 and 4, the output shaft of the motor and the rotation shaft of the gear 222 are arranged in a direction perpendicular to the pupil plane, i.e., in the Z direction, and the spur rack 223 is arranged in the same direction as the movement direction of the compensation mechanism 230, i.e., in the X direction.
As shown in fig. 3 and 4, the spur rack 223 includes a first side 224, a second side 225, a third side 226, and a fourth side. The first side 224 and the second side 225 are perpendicular to the pupil plane, the third side 226 and the fourth side are parallel to the pupil plane, and the first side 224, the third side 226, the second side 225 and the fourth side are sequentially connected in a clockwise direction. The first side surface 224 is provided with a plurality of engaging teeth 228, and the engaging teeth 228 are arranged along the length direction of the first side surface 224. The spur rack 223 is movable along the length of the first side 224, the second side 225, the third side 226, and the fourth side. That is, the first side 224 and the second side 225 are parallel to the XOY plane, the third side 226 and the fourth side are parallel to the XOZ plane, and the spur rack 223 is movable in the X direction.
The pupil compensation device 200 further includes a guide device disposed on the holder main body 210 for guiding the compensation mechanism 230 to move. The guide means is preferably a linear guide means for guiding the compensation mechanism 230 to move linearly.
The guide device comprises a guide rail 241 and a sliding block 242, the guide rail 241 is fixedly arranged on the bracket main body 210, the guide rail 241 is in sliding connection with the sliding block 242, the compensation mechanism 230 is fixedly connected with the sliding block 242, and the sliding block 242 is fixedly connected with the spur rack 223. In this embodiment, the compensation mechanism 230 is fixedly connected to the sliding block 242, and the spur rack 223 is disposed on the compensation mechanism 230 and is indirectly fixedly connected to the sliding block 242 through the compensation mechanism 230. In other embodiments, the guide rail 241 may be directly slidably coupled to the compensating mechanism 230. Specifically, as shown in fig. 2 and 3, the guide rail 241 is a linear guide rail.
The guide device further comprises a first guide for blocking the compensation mechanism 230, which is tilted with respect to the guide rail 241 in the pupil plane or in a plane parallel to the pupil plane. Specifically, the first guide member includes a first guide bracket 243, and two first guide wheels 244 rotatably connected to the first guide bracket 243. The rotating shaft of the first guide wheel 244 is perpendicular to the pupil plane, the outer peripheral surface of the first guide wheel 244 contacts with the second side surface 225 of the spur rack 223, the second side surface 225 of the spur rack 223 is perpendicular to the pupil plane and parallel to the moving direction of the compensation mechanism 230, and the two first guide wheels 244 are sequentially arranged along the moving direction of the compensation mechanism 230, so as to improve the motion stability and reliability of the compensation mechanism 230. In other embodiments, the number of the first guide wheels 244 is one, three or other, which is not limited by the present invention.
As shown in fig. 2, 3 and 4, the compensation mechanism 230 moves in a direction parallel to the X-axis direction, the rotation axis of the first guide wheel 244 is parallel to the Z-axis, the second side 225 of the spur rack 223 is parallel to the XOZ plane, and the pupil plane is parallel to the XOY plane.
The guiding device further comprises a second guide for blocking the compensation mechanism 230 from tilting relative to the guiding rail 241 in a plane perpendicular to the pupil plane and parallel to the direction of movement of the compensation mechanism 230. Specifically, the second guide member includes a second guide bracket 245, and a second guide wheel 246 rotatably coupled to the second guide bracket 245, a rotation shaft of the second guide wheel 246 is parallel to the pupil plane, an outer circumferential surface of the second guide wheel 246 is in contact with one of the third side 226 and the fourth side of the spur rack 223, and the third side 226 and the fourth side of the spur rack 223 are parallel to the pupil plane. Preferably, the number of the second guide wheels 246 is two, the outer peripheral surface of one of the second guide wheels 246 and the third side 226 of the spur rack 223 are in contact with each other, and the outer peripheral surface of the other of the second guide wheels 246 and the fourth side of the spur rack 223 are in contact with each other, so as to prevent the compensation mechanism 230 from being inclined with respect to the guide rail 241 on a plane perpendicular to a pupil plane and parallel to a moving direction of the compensation mechanism 230, thereby improving the motion stability and reliability of the compensation mechanism 230. Further, two second guide wheels 246 are sequentially arranged along a direction perpendicular to the pupil plane, so as to further improve the motion stability and reliability of the compensation mechanism 230. In other embodiments, the number of the second guide wheels 246 is one, three or other, the present invention is not limited thereto,
as shown in fig. 2, 3 and 4, the second guide wheel 246 axis of rotation is parallel to the Y axis, the third side 226 and fourth side of the rack are parallel to the XOY plane, and the pupil plane is parallel to the XOY plane.
The pupil compensation arrangement 200 further comprises position detection means for detecting the position of the compensation mechanism 230. The position detecting device comprises a limiting device 251 and a position sensor 252, wherein the limiting device 251 is used for limiting the compensation mechanism 230 or the spur rack 223 to move in a preset travel range, and the position sensor 252 is used for detecting the position of the compensation mechanism 230 or the spur rack 223. The position limiting device 251 is, for example, a position limiting column disposed on the bracket main body 210. The position detection device may monitor and position the initial position of the compensation mechanism 230. The position controllability of the compensating mechanism 230 and the stability of the movement of the compensating mechanism 230 can be improved by providing the position detecting device.
The holder main body 210 may have a plate shape.
The pupil compensation device 200 further includes a cover 260, the cover 260 is fixedly connected to the support main body 210, and the transmission device, the guide device, the compensation mechanism 230 and the position detection device can be disposed in a space defined by the cover 260 and the support main body 210. As shown in fig. 2, in this embodiment, the driver 221 of the driving device is disposed outside the space enclosed by the cover 260 and the bracket main body 210, and is fixedly connected to the cover 260. In other embodiments, the driver 221 may also be fixedly connected to the bracket main body 210, which is not limited in the present invention.
Referring to fig. 5a, fig. 5a is a schematic structural diagram of a compensation mechanism 230 according to an embodiment of the present invention, the compensation mechanism 230 includes a compensation body 231, and a compensation member 232 disposed on the compensation body 231, the compensation body 231 is fixedly connected to the slider 242, and the compensation member 232 is used for compensating pupil uniformity.
As shown in fig. 5a, the compensating mechanism 230 is plate-shaped, the compensating member 232 is provided with at least two uniformly distributed circular through holes 233, and the compensating member 232 is made of opaque material. In other embodiments, the through holes may have other shapes, as shown in fig. 5b, the through holes are square, as shown in fig. 5c, the through holes are elongated, and the compensating member 232 may also be a light plate without through holes. As shown in fig. 5d, the compensating element 232 may include at least two strip structures extending from the compensating body 231, and the strip structures may be cylindrical, but the strip structures may also be other polyhedrons. The material of the compensation member 232 may be a transparent material or an opaque material.
When the pupil compensation device 200 works, the position of the compensation mechanism 230 can be adjusted according to the compensation requirement of pupil uniformity in the illumination system of the lithography machine, so as to adjust the influence degree of the compensation mechanism 230 on the light intensity distribution of the pupil plane. Specifically, the motor can be controlled to rotate to generate driving force according to the position information of the rack and the compensation mechanism 230 detected by the position detection device and the rotation information of the motor, so that the driving force is transmitted to the compensation mechanism 230 through the gear 222 and the rack transmission device, the compensation mechanism 230 is driven to reciprocate along the X direction within a certain travel range, and therefore the position adjustment of the compensation mechanism 230 fixedly connected with the spur rack 223 is realized, the light intensity distribution of the pupil plane is influenced by the position change of the compensation mechanism 230 to different degrees, the compensation degree of the pupil compensation device 200 on the pupil uniformity is adjustable, and the coupling efficiency of the pupil compensation device 200 is improved.
Referring to fig. 6, fig. 6 is a schematic structural diagram of two pupil compensation devices 200 arranged in an illumination system of a lithography machine according to an embodiment of the present invention, and the embodiment further provides a lithography machine including an illumination system and at least one of the pupil compensation devices 200 fixedly arranged in the illumination system.
Specifically, the number of the pupil compensation device 200 is two, the housing 260 of the pupil compensation device 200 is fixedly connected to the illumination system, the compensation mechanism 230 in the pupil compensation device 200 is disposed on a pupil plane of the illumination system, and a moving direction of the compensation mechanism 230 is parallel to the pupil plane. As shown in fig. 6, the compensation mechanism 230 is parallel to the XOY plane, and the compensation mechanism 230 moves in the X direction.
In a specific application, the positions of the two compensation mechanisms 230 in the pupil plane of the illumination system may be symmetrically or asymmetrically arranged. The two motors can be controlled to rotate independently or simultaneously to move the two compensating mechanisms 230 back and forth or towards each other. When two compensation mechanisms 230 are arranged asymmetrically, asymmetric pupil uniformity compensation can be realized.
FIG. 7 is a comparison graph of pupil uniformity of a lithography machine without compensation by the pupil compensation device 200 and with compensation by the pupil compensation device 200 according to an embodiment of the present invention, and as shown in FIG. 7, the pupil uniformity can be improved by about 20% by compensation by the pupil compensation device 200.
FIG. 8 is a comparison graph of coupling efficiency of a lithography machine using the pupil compensation device 200 and a stop, as shown in FIG. 8, in an embodiment of the present invention, the coupling efficiency of the lithography machine in a partial illumination mode can be effectively improved by using the pupil compensation device 200.
FIG. 9 is a comparison graph of pupil uniformity of a lithography machine using the pupil compensation device 200 and using an aperture stop to perform compensation according to an embodiment of the present invention, and as shown in FIG. 9, the compensation effect of pupil uniformity is similar when using the pupil compensation device 200 and using the aperture stop to perform compensation.
As can be seen from the above embodiments, the pupil compensation apparatus 200 provided in this embodiment can implement pupil uniformity compensation by disposing the compensation mechanism 230 on the pupil plane to affect the light intensity distribution of the pupil plane, and adjust the degree to which the compensation mechanism 230 affects the light intensity distribution of the pupil plane by making the position of the compensation mechanism 230 on the pupil plane adjustable, so as to avoid that the degree to which the compensation mechanism 230 affects the light intensity distribution of the pupil plane is too low or too high, which affects the coupling efficiency of the pupil compensation apparatus 200. In addition, the structure of the pupil compensation device 200 can be simplified, thereby reducing the manufacturing cost of the pupil compensation device 200, improving the reliability of the pupil compensation device 200, and enabling the pupil compensation device 200 to have the characteristics of simple structure and high coupling efficiency.
The pupil compensation apparatus 200 in the above embodiment may also be used to compensate pupil uniformity of an illumination system of other apparatuses, and the present invention is not limited thereto.
The above description is only for the purpose of describing the preferred embodiments of the present invention, and is not intended to limit the scope of the present invention, and any variations and modifications made by those skilled in the art based on the above disclosure are within the scope of the appended claims.
Claims (18)
1. A pupil compensation device is characterized by comprising a support body, a driving device and a compensation mechanism, wherein the driving device is arranged on the support body, the driving device is used for driving the compensation mechanism to move on a pupil plane, the compensation mechanism is used for compensating pupil uniformity, the compensation mechanism comprises a compensation body and a compensation piece arranged on the compensation body, the compensation body is connected with the support body in a sliding mode, the compensation piece is used for compensating pupil uniformity, the compensation piece comprises at least two strip-shaped structures extending from the compensation body, and therefore the driving device is used for driving the at least two strip-shaped structures to move on the pupil plane.
2. A pupil compensation device according to claim 1, wherein the compensation element is transparent or non-transparent.
3. Pupil compensation apparatus as claimed in claim 1, characterized in that the strip-like structures are cylinders or polyhedrons.
4. The pupil compensation apparatus of claim 1, further comprising a guide provided on the carriage body for guiding the compensation mechanism to move.
5. A pupil compensation device according to claim 4, characterized in that the guide comprises a guide rail which is fixedly arranged on the carriage body and is connected slidingly to the compensation mechanism.
6. A pupil compensation device according to claim 5, wherein the guide device further comprises a slide, the guide rail being slidably connected to the slide, the compensation mechanism being fixedly connected to the slide.
7. A pupil compensation device according to claim 5, wherein the guide is a linear guide.
8. A pupil compensation apparatus as claimed in claim 5, characterized in that the guide further comprises a first guide for blocking tilting of the compensation mechanism relative to the guide rail in the pupil plane or in a plane parallel to the pupil plane.
9. The pupil compensation apparatus of claim 8, wherein the first guide comprises a first guide bracket and at least one first guide wheel rotatably coupled to the first guide bracket, a rotation shaft of the first guide wheel is perpendicular to the pupil plane, the driving apparatus comprises a driver, a gear and a spur rack engaged with the gear, the driver is disposed on the bracket main body, the driver is configured to provide a driving force, an output end of the driver is coupled to the gear, the gear is rotatably coupled to the bracket main body, the spur rack is fixedly coupled to the compensation mechanism, the spur rack comprises a first side surface and a second side surface, the first side surface and the second side surface are perpendicular to the pupil plane, the first side surface is provided with a plurality of engaging teeth, the plurality of engaging teeth are disposed along a length direction of the spur rack, the outer peripheral surface of the first guide wheel is in contact with the second side surface of the spur rack.
10. A pupil compensation apparatus according to claim 9, wherein the number of the first guide wheels is two, and two first guide wheels are provided in order along the moving direction of the compensation mechanism.
11. A pupil compensation device as claimed in claim 5, characterized in that the guide device further comprises a second guide for blocking tilting of the compensation mechanism relative to the guide rail in a plane perpendicular to the pupil plane and parallel to the direction of movement of the compensation mechanism.
12. Pupil compensation apparatus as claimed in claim 11, characterized in that the second guide comprises a second guide support, and at least one second guide wheel rotatably connected to the second guide support, the second guide wheel having a rotation axis parallel to the pupil plane, the driving device comprises a driver, a gear and a spur rack meshed with the gear, the driver is arranged on the bracket main body, the driver is used for providing driving force, the output end of the driver is connected with the gear, the gear is rotationally connected with the bracket main body, the straight rack is fixedly connected with the compensation mechanism and comprises a third side surface and a fourth side surface, the third side surface and the fourth side surface are parallel to the pupil plane, and the outer peripheral surface of the second guide wheel is in contact with one of the third side surface and the fourth side surface of the spur rack.
13. A pupil compensation apparatus according to claim 12, wherein the number of the second guide wheels is two, and an outer circumferential surface of one of the second guide wheels and the third side surface of the spur rack are in contact with each other, and an outer circumferential surface of the other of the second guide wheels and the fourth side surface of the spur rack are in contact with each other.
14. The pupil compensation apparatus of claim 1, wherein the driving apparatus comprises a driver, a gear and a spur rack engaged with the gear, the driver is disposed on the frame body, the driver is configured to provide a driving force, an output end of the driver is connected to the gear, the gear is rotatably connected to the frame body, and the spur rack is fixedly connected to the compensation mechanism.
15. The pupil compensation apparatus of claim 1, further comprising a limiting device for limiting movement of the compensation mechanism within a predetermined range of travel, and a position sensor for detecting a position of the compensation mechanism.
16. The pupil compensation apparatus of claim 1, further comprising a housing fixedly connected to the holder body, wherein the compensation mechanism is disposed in a space enclosed by the housing and the holder body.
17. A lithography machine, characterized in that it comprises an illumination system, and at least one pupil compensation device according to any one of claims 1 to 16 fixed in the illumination system, the compensation mechanism being arranged in a pupil plane of the illumination system, and the direction of movement of the compensation mechanism being parallel to the pupil plane.
18. A lithography machine according to claim 17, wherein the number of said pupil compensation devices is two, two of said pupil compensation devices being symmetrically fixed in said illumination system.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910464486.7A CN112015053B (en) | 2019-05-30 | 2019-05-30 | Pupil compensation device and photoetching machine |
| TW109117957A TWI762936B (en) | 2019-05-30 | 2020-05-29 | Pupil compensation device and lithography machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910464486.7A CN112015053B (en) | 2019-05-30 | 2019-05-30 | Pupil compensation device and photoetching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112015053A CN112015053A (en) | 2020-12-01 |
| CN112015053B true CN112015053B (en) | 2022-02-08 |
Family
ID=73500496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910464486.7A Active CN112015053B (en) | 2019-05-30 | 2019-05-30 | Pupil compensation device and photoetching machine |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN112015053B (en) |
| TW (1) | TWI762936B (en) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3826047B2 (en) * | 2002-02-13 | 2006-09-27 | キヤノン株式会社 | Exposure apparatus, exposure method, and device manufacturing method using the same |
| WO2008053881A1 (en) * | 2006-11-01 | 2008-05-08 | Nikon Corporation | Dimmer plate, exposure apparatus, method of exposure and process for manufacturing device |
| WO2010061674A1 (en) * | 2008-11-28 | 2010-06-03 | 株式会社ニコン | Correction unit, illumination optical system, exposure device, and device manufacturing method |
| NL2008322A (en) * | 2011-04-13 | 2012-10-16 | Asml Holding Nv | Double euv illumination uniformity correction system and method. |
| US9083227B2 (en) * | 2011-09-09 | 2015-07-14 | Asml Holding N.V. | Linear motor and lithography arrangement including linear motor |
| CN102331688B (en) * | 2011-10-25 | 2013-06-26 | 中国科学院光电技术研究所 | Pupil uniformity compensation device |
| EP3296723A1 (en) * | 2016-09-14 | 2018-03-21 | ASML Netherlands B.V. | Illumination source for an inspection apparatus, inspection apparatus and inspection method |
| CN107885038A (en) * | 2016-09-30 | 2018-04-06 | 上海微电子装备（集团）股份有限公司 | Device for correcting illumination homogeneity, bearing calibration and a kind of exposure projections system |
-
2019
- 2019-05-30 CN CN201910464486.7A patent/CN112015053B/en active Active
-
2020
- 2020-05-29 TW TW109117957A patent/TWI762936B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| TW202043943A (en) | 2020-12-01 |
| TWI762936B (en) | 2022-05-01 |
| CN112015053A (en) | 2020-12-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100289274B1 (en) | Orthogonality Measuring Method, Stage Device and Exposure Device | |
| US10444642B2 (en) | Movable body apparatus, exposure apparatus, manufacturing method of flat panel display, device manufacturing method, and movable body drive method | |
| TWI610148B (en) | Exposure apparatus, exposure method, and component manufacturing method | |
| US6172373B1 (en) | Stage apparatus with improved positioning capability | |
| US20020050576A1 (en) | Scanning exposure method and apparatus | |
| CN112015053B (en) | Pupil compensation device and photoetching machine | |
| CN106405859A (en) | Calibration device and calibration method for compound-eye type spherical vision system | |
| KR100554869B1 (en) | A Lithographic Apparatus and a Device Manufacturing Method | |
| CN205374982U (en) | Light beam adjusting device | |
| JP5349093B2 (en) | Proximity exposure apparatus, substrate positioning method for proximity exposure apparatus, and display panel substrate manufacturing method | |
| KR101415371B1 (en) | Supporting device and light exposure device | |
| CN114544151A (en) | Lens transmittance detection device and detection method thereof | |
| CN208697360U (en) | A kind of rotary positioning workbench | |
| TW201809896A (en) | Knife edge set of mask aligner, large-view-field mask aligner, and exposure method | |
| JPS62193125A (en) | Exposure-uneveness correcting apparatus | |
| CN204986661U (en) | Pointolite adjusting device of medical endoscope detector | |
| JP2005086031A5 (en) | ||
| CN114326095A (en) | Space light multipath and multi-state switching and adjusting device | |
| CN105717750A (en) | Apparatus and method for setting rotation lens stations of optical diffraction wheel | |
| JP2004349494A (en) | Work stage and method for measuring its position, and exposure device equipped with this | |
| WO2012093534A1 (en) | Exposure device and exposure method | |
| CN220290028U (en) | Multi-freedom-degree motion platform capable of being adjusted in universal mode | |
| JPH0610671Y2 (en) | Mobile table device | |
| CN114413758B (en) | Laser transmission positioning accuracy detection assembly | |
| JP2670984B2 (en) | Device manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |