CN111908800A - Water-soluble anti-dazzle high-alumina glass etching solid reagent and high-alumina glass etching process - Google Patents
Water-soluble anti-dazzle high-alumina glass etching solid reagent and high-alumina glass etching process Download PDFInfo
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- CN111908800A CN111908800A CN202010840034.7A CN202010840034A CN111908800A CN 111908800 A CN111908800 A CN 111908800A CN 202010840034 A CN202010840034 A CN 202010840034A CN 111908800 A CN111908800 A CN 111908800A
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- 238000005530 etching Methods 0.000 title claims abstract description 59
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- 238000000034 method Methods 0.000 title claims abstract description 25
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000002994 raw material Substances 0.000 claims abstract description 22
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 17
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims abstract description 16
- 235000011130 ammonium sulphate Nutrition 0.000 claims abstract description 16
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 claims abstract description 15
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 15
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims abstract description 8
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- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical group OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims description 10
- 229960002920 sorbitol Drugs 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 8
- 238000004140 cleaning Methods 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 6
- 229910021641 deionized water Inorganic materials 0.000 claims description 6
- -1 polytetrafluoroethylene Polymers 0.000 claims description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 6
- 238000003756 stirring Methods 0.000 claims description 6
- 239000004094 surface-active agent Substances 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 5
- 229920000168 Microcrystalline cellulose Polymers 0.000 claims description 4
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 14
- 238000002834 transmittance Methods 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 238000001000 micrograph Methods 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- ASZZHBXPMOVHCU-UHFFFAOYSA-N 3,9-diazaspiro[5.5]undecane-2,4-dione Chemical compound C1C(=O)NC(=O)CC11CCNCC1 ASZZHBXPMOVHCU-UHFFFAOYSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- 229920002907 Guar gum Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 230000002490 cerebral effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
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- 238000005260 corrosion Methods 0.000 description 1
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- 238000001514 detection method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
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- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000008103 glucose Substances 0.000 description 1
- 239000000665 guar gum Substances 0.000 description 1
- 229960002154 guar gum Drugs 0.000 description 1
- 235000010417 guar gum Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention provides a water-soluble anti-dazzle high-alumina glass etching solid reagent and a high-alumina glass etching process, wherein the solid reagent comprises the following raw materials in parts by weight: 15-45 parts of ammonium bifluoride, 20-60 parts of citric acid, 6-15 parts of ammonium sulfate, 2-14 parts of potassium bifluoride or potassium sulfate, 1-10 parts of titanium dioxide and 5-50 parts of thickening agent. The solid reagent can be dissolved by water, avoids using strong acid and toxic organic solvent, can realize etching with excellent effect on the high-alumina glass under the condition of normal temperature, and can produce good anti-dazzle effect on the prepared anti-dazzle finished product of the high-alumina glass.
Description
Technical Field
The invention relates to the technical field of functional glass products, in particular to a water-soluble anti-dazzle high-alumina glass etching solid reagent and a high-alumina glass etching process.
Background
The anti-dazzle glass sold in the market at home and abroad at present is generally coated with a film on the surface of the glass or is corroded by hydrofluoric acid to achieve the anti-dazzle purpose. The anti-dazzle glass prepared by a film coating mode has a good effect, but the process is complex, the anti-dazzle glass is generally required to be carried out under the vacuum condition, the cost is higher, a film layer is very easy to fall off when the anti-dazzle glass is used outdoors, the weather resistance and the wear resistance are poor, and the appearance, the transmittance and the like are influenced after the film layer falls off. The traditional glass etching technology is carried out under the condition of temperature rise by hydrofluoric acid and concentrated sulfuric acid, a frosted surface is formed firstly by corroding the surface of glass by the hydrofluoric acid, the transmittance of the glass after frosting is reduced sharply, and the frosted surface needs to be polished by sulfuric acid and the like to improve the transmittance of the glass after frosting.
Chinese patent CN102432185A discloses an etching solution for anti-dazzle glass products and an etching process, wherein the etching solution is prepared by mixing, by weight, 20-30 parts of hydrofluoric acid, 8-15 parts of fluosilicic acid, 10-20 parts of ammonium bifluoride, 5-8 parts of ammonium fluoride, 10-12 parts of potassium bifluoride, 39-50 parts of ammonium chloride, 10-20 parts of glucose, 5-8 parts of guar gum and 6-9 parts of barium sulfate. The hydrofluoric acid is directly used in the formula, and the hydrofluoric acid not only pollutes the environment, but also causes irreparable damage to human bones and cerebral nerves.
Chinese patent CN101215097B discloses a formula of an etching solution for an anti-dazzle glass product and an etching process, wherein the formula comprises, by weight, 17-24 parts of ammonium fluoride or 8.5-12 parts of ammonium bifluoride, 2.5-3 parts of ammonium sulfate, 2.5-3 parts of potassium sulfate, 2.5-3 parts of calcium fluoride, 8-12.5 parts of sulfuric acid or 24-37.5 parts of hydrochloric acid, and 60-75 parts of water; the process comprises the following steps: (1) weighing raw materials according to the formula of the etching solution, mixing, uniformly stirring, and aging to prepare the etching solution; (2) cleaning and drying the pre-etched glass by using an organic solvent doped with glycerol; (3) shielding the side of the cleaned glass which does not need to be etched; (4) soaking the glass in the prepared etching solution, taking out the glass product, washing with clear water, and drying to obtain the anti-dazzle glass finished product. Although the preparation method of the invention is simple, easy to operate and labor-saving, reagents such as hydrochloric acid and sulfuric acid are added, which belong to the formula of the anti-dazzle reagent needing to add an acid solvent, and the use of the strong acid causes environmental pollution, and the hydrochloric acid has strong volatility, causes poor stability of the etching solution and is not easy to recycle.
Disclosure of Invention
In view of the above, the invention provides a water-soluble anti-dazzle high-alumina glass etching solid reagent and a high-alumina glass etching process, which can be dissolved by water without using strong acid and toxic organic solvents and can realize etching with excellent effect under the normal temperature condition.
The technical scheme of the invention is realized as follows:
a water-soluble anti-dazzle high-alumina glass etching solid reagent comprises the following raw materials in parts by weight: 15-45 parts of ammonium bifluoride, 20-60 parts of citric acid, 6-15 parts of ammonium sulfate, 2-14 parts of potassium bifluoride or potassium sulfate, 1-10 parts of titanium dioxide and 5-50 parts of thickening agent.
Preferably, the thickener is D-sorbitol or microcrystalline cellulose.
Preferably, the solid reagent comprises the following raw materials in parts by weight: 40 parts of ammonium bifluoride, 30 parts of citric acid, 8 parts of ammonium sulfate, 6 parts of potassium bifluoride, 10 parts of titanium dioxide and 40 parts of D-sorbitol.
A high-alumina glass etching process comprises the following steps:
(1) weighing the following raw materials in parts by weight according to the water-soluble anti-dazzle glass etching solid reagent of claim 1: 15-45 parts of ammonium bifluoride, 20-60 parts of citric acid, 6-15 parts of ammonium sulfate, 2-14 parts of potassium bifluoride or potassium sulfate, 1-10 parts of titanium dioxide and 5-50 parts of thickening agent, adding 300-500 parts of water, mixing, uniformly stirring, putting into a polytetrafluoroethylene container, and performing ultrasonic ageing for 8-20 hours to prepare an etching solution;
(2) cleaning the pre-etched high-alumina glass by using a surfactant, putting the pre-etched high-alumina glass into deionized water doped with absolute ethyl alcohol, and cleaning and drying the high-alumina glass by using ultrasonic waves;
(3) covering and shielding the part of the high-alumina glass which does not need to be etched with a polytetrafluoroethylene film;
(4) and (2) soaking the high-alumina glass in the etching solution aged in the step (1) for 5-40 minutes, taking out the glass after soaking, washing the glass with water, and drying to obtain the anti-dazzle finished product of the high-alumina glass.
Further, in the step (1), the stirring speed is 250-350 r/min.
Further, in the step (2), the surfactant is a detergent.
Further, in the step (2), the volume ratio of the absolute ethyl alcohol to the deionized water is 1: 0.8-1.2.
Further, the aging temperature in the step (1) and the soaking temperature T in the step (4) are both 0 ℃ and less than T <35 ℃, preferably 15-25 ℃, and most preferably 25 ℃.
Compared with the prior art, the invention has the beneficial effects that: the solid reagent can be dissolved by water, avoids using strong acid and toxic organic solvent, can realize etching with excellent effect on the high-alumina glass under the condition of normal temperature, and the prepared high-alumina glass anti-dazzle finished product has a microstructure which is a micron-sized honeycomb pit continuously and uniformly distributed, can effectively convert mirror reflection into diffuse reflection, and simultaneously keeps high transmittance of the high-alumina glass.
In addition, the etching process of the invention is adopted to prepare a certain concentration, and the aging and etching time is controlled, thereby further improving the etching effect.
(1) The etching process is simple and easy to operate, can be carried out at room temperature, does not need heating, and overcomes the problem that the traditional method needs heating.
(2) The solid reagent is convenient to store and transport, and can be used after being dissolved in water without adding other solvents. Avoiding directly using a large amount of hydrofluoric acid, concentrated sulfuric acid, hydrochloric acid and other acid corrosion agents and simultaneously avoiding using toxic organic solvents.
(3) The dispersing agent and other medicines used in the invention are easy to recover and can be completely recycled.
(4) The invention adopts the reagent to accord with the environmental protection concept, and meets the requirement of clean production.
(5) The glass finished product prepared by the invention has good uniformity, the glass transmittance is not affected, and polishing treatment is not needed.
(6) The glass product prepared by the invention keeps the high transmittance of the high-alumina glass and can meet the use conditions with higher transmittance requirements.
Drawings
FIG. 1 is a micrograph of the surface of a glass product obtained in example 1;
FIG. 2 is a micrograph of the surface of a glass product obtained in example 2;
FIG. 3 is a micrograph of the surface of a glass product obtained in example 3;
FIG. 4 is a micrograph of the surface of a glass product obtained in example 4;
FIG. 5 is a micrograph of the surface of a glass product obtained in example 5;
FIG. 6 is a micrograph of the surface of a glass product obtained in example 6;
FIG. 7 is a micrograph of the surface of a glass product obtained in example 7;
FIG. 8 is a micrograph of the surface of a glass product obtained in example 8;
FIG. 9 is a microscopic view of the surface of a finished glass obtained in comparative example 1;
FIG. 10 is a microscopic view of the surface of a glass product obtained in comparative example 2;
FIG. 11 is a microscopic view of the surface of a finished glass obtained in comparative example 3;
FIG. 12 is a microscopic view of the surface of a glass product obtained in comparative example 4.
Detailed Description
In order to better understand the technical content of the invention, specific examples are provided below to further illustrate the invention.
The experimental methods used in the examples of the present invention are all conventional methods unless otherwise specified.
The materials, reagents and the like used in the examples of the present invention can be obtained commercially without specific description.
The surfactant used in the present invention is a detergent.
Example 1
A water-soluble anti-dazzle high-alumina glass etching solid reagent comprises the following raw materials in parts by weight: 15 parts of ammonium bifluoride, 30 parts of citric acid, 10 parts of ammonium sulfate, 2 parts of potassium bifluoride, 3 parts of titanium dioxide and 5 parts of D-sorbitol.
The high-alumina glass etching process comprises the following steps:
(1) weighing the following raw materials in parts by weight: 15 parts of ammonium bifluoride, 30 parts of citric acid, 10 parts of ammonium sulfate, 2 parts of potassium bifluoride, 3 parts of titanium dioxide and 5 parts of D-sorbitol, adding 300 parts of ultrapure water, mixing at room temperature, uniformly stirring at 300r/min, putting into a polytetrafluoroethylene container, and performing ultrasonic aging at 25 ℃ for 8 hours to prepare an etching solution;
(2) cleaning the pre-etched flat high-alumina glass by using a surfactant, putting the cleaned flat high-alumina glass into deionized water doped with absolute ethyl alcohol, ultrasonically cleaning and drying the cleaned flat high-alumina glass, wherein the volume ratio of the absolute ethyl alcohol to the deionized water is 1: 1;
(3) covering and shielding one side of the flat high-alumina glass, which does not need to be etched, by a polytetrafluoroethylene film;
(4) and (3) soaking the flat high-alumina glass in the aged etching solution for 10 minutes at 25 ℃, taking out the glass, washing the glass with clear water, and drying to obtain the high-alumina glass anti-dazzle finished product.
Example 2
A water-soluble anti-dazzle high-alumina glass etching solid reagent comprises the following raw materials in parts by weight: 35 parts of ammonium bifluoride, 20 parts of citric acid, 8 parts of ammonium sulfate, 2 parts of potassium bifluoride, 3 parts of titanium dioxide and 6 parts of microcrystalline cellulose. The raw materials are weighed according to the weight parts, and the high-alumina glass etching process of the embodiment is also different from the embodiment 1 in that the aging time of the step (1) is 12 hours, and the soaking time of the step (4) is 20 minutes.
Example 3
A water-soluble anti-dazzle high-alumina glass etching solid reagent comprises the following raw materials in parts by weight: 25 parts of ammonium bifluoride, 30 parts of citric acid, 15 parts of ammonium sulfate, 2 parts of potassium sulfate, 4.5 parts of titanium dioxide and 5 parts of D-sorbitol. The raw materials are weighed according to the weight parts, and the high-alumina glass etching process of the embodiment is also different from the embodiment 1 in that the aging time in the step (1) is 16 hours, and the soaking time in the step (4) is 30 minutes.
Example 4
A water-soluble anti-dazzle high-alumina glass etching solid reagent comprises the following raw materials in parts by weight: 35 parts of ammonium bifluoride, 30 parts of citric acid, 15 parts of ammonium sulfate, 10 parts of potassium bifluoride, 4.5 parts of titanium dioxide and 6 parts of microcrystalline cellulose. The raw materials are weighed according to the weight parts, and the high-alumina glass etching process of the embodiment is also different from the embodiment 1 in that the aging time of the step (1) is 20 hours, and the soaking time of the step (4) is 40 minutes.
Example 5
A water-soluble anti-dazzle high-alumina glass etching solid reagent comprises the following raw materials in parts by weight: 40 parts of ammonium bifluoride, 30 parts of citric acid, 8 parts of ammonium sulfate, 6 parts of potassium bifluoride, 10 parts of titanium dioxide and 40 parts of D-sorbitol. The raw materials are weighed according to the parts by weight, 500 parts of ultrapure water is added, and the high-alumina glass etching process of the embodiment is also different from the embodiment 1 in that the aging time in the step (1) is 24 hours.
Example 6
The difference between the embodiment and the embodiment 3 is that the raw materials are different in proportion, and the weight parts of the raw materials are as follows: 45 parts of ammonium bifluoride, 60 parts of citric acid, 8 parts of ammonium sulfate, 14 parts of potassium bifluoride, 1 part of titanium dioxide and 50 parts of D-sorbitol.
Example 7
This example differs from example 3 in that the potassium sulfate was replaced with an equal amount of potassium hydrogen fluoride.
Example 8
This example differs from example 3 in that the aging temperature in step (1) and the soaking temperature in step (4) were both 15 ℃.
Comparative example 1
The difference between the comparative example and the example 3 is that the raw materials are different in proportion, and the weight parts of the raw materials are as follows: 10 parts of ammonium bifluoride, 12 parts of citric acid, 20 parts of ammonium sulfate, 20 parts of potassium bifluoride, 0.5 part of titanium dioxide and 2 parts of D-sorbitol.
Comparative example 2
This comparative example differs from example 3 in that the citric acid was replaced with an equal amount of oxalic acid.
Comparative example 3
The comparative example differs from example 3 in that the aging temperature in step (1) and the soaking temperature in step (4) are both 45 ℃.
Comparative example 4
This comparative example differs from example 3 in that the soaking time in step (4) was 50 minutes.
The glasses used in the above examples and comparative examples were high alumina silica glass (aluminum content greater than 10%), 1.8mm thick, 50mm x 50mm in size,
observing the surface appearance of the etched sample by adopting a scanning electron microscope;
measuring the optical properties of the sample, such as transmittance, reflectivity, haze and the like by using an ultraviolet visible near-infrared spectrophotometer;
testing the glossiness value of the surface of the sample by using a glossiness meter;
and testing the surface roughness of the sample by using a roughness tester.
Specific optical performance indexes in the existing industry standard JC/T2464-2018 anti-dazzle glass are used as evaluation standards, and the specific indexes are shown in the following table:
"anti-dazzle glass" optical performance index
The detection results are as follows:
the results show that the glass prepared in the embodiments 1 to 8 has the surface structure of honeycomb micro pits, is excellent in haze, glass transmittance, glossiness and surface roughness, and can generate a good anti-dazzle effect.
In addition, comparing comparative example 1 with example 3, it is known that the effect of the prepared product is obviously reduced without adopting the mixture ratio of the invention.
In comparison with example 3, it is seen that the effect is significantly reduced by replacing oxalic acid with citric acid in comparative example 2.
In comparison with example 3, it is understood that the etching effect is rather decreased by increasing the aging temperature and the soaking temperature.
In comparison with example 3, comparative example 4 shows that the etching effect is rather reduced by extending the soaking time.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
1. The water-soluble anti-dazzle high-alumina glass etching solid reagent is characterized by comprising the following raw materials in parts by weight: 15-45 parts of ammonium bifluoride, 20-60 parts of citric acid, 6-15 parts of ammonium sulfate, 2-14 parts of potassium bifluoride or potassium sulfate, 1-10 parts of titanium dioxide and 5-50 parts of thickening agent.
2. A water-soluble anti-glare high-alumina glass etching solid agent according to claim 1, wherein the thickener is D-sorbitol or microcrystalline cellulose.
3. The water-soluble anti-dazzle high-alumina glass etching solid reagent as claimed in claim 1, which is characterized by comprising the following raw materials in parts by weight: 40 parts of ammonium bifluoride, 30 parts of citric acid, 8 parts of ammonium sulfate, 6 parts of potassium bifluoride, 10 parts of titanium dioxide and 40 parts of D-sorbitol.
4. The high-alumina glass etching process is characterized by comprising the following steps of:
(1) weighing the following raw materials in parts by weight according to the water-soluble anti-dazzle glass etching solid reagent of any one of claims 1 to 3: 15-45 parts of ammonium bifluoride, 20-60 parts of citric acid, 6-15 parts of ammonium sulfate, 2-14 parts of potassium bifluoride or potassium sulfate, 1-10 parts of titanium dioxide and 5-50 parts of thickening agent, adding 300-500 parts of water, mixing, uniformly stirring, putting into a polytetrafluoroethylene container, and performing ultrasonic ageing for 8-24 hours to prepare an etching solution;
(2) cleaning the pre-etched high-alumina glass by using a surfactant, putting the pre-etched high-alumina glass into deionized water doped with absolute ethyl alcohol, and cleaning and drying the high-alumina glass by using ultrasonic waves;
(3) covering and shielding the part of the high-alumina glass which does not need to be etched with a polytetrafluoroethylene film;
(4) and (2) soaking the high-alumina glass in the etching solution aged in the step (1) for 5-40 minutes, taking out the glass after soaking, washing the glass with water, and drying to obtain the anti-dazzle finished product of the high-alumina glass.
5. The high alumina glass etching process according to claim 4, wherein in the step (1), the stirring speed is 250 to 350 r/min.
6. The high alumina glass etching process according to claim 4, wherein in the step (2), the surfactant is a detergent.
7. The high alumina glass etching process according to claim 4, wherein in the step (2), the volume ratio of the absolute ethyl alcohol to the deionized water is 1: 0.8-1.2.
8. The high alumina glass etching process according to claim 4, wherein the aging temperature in step (1) and the soaking temperature in step (4) are both 0 ℃ < T <35 ℃.
9. The high alumina glass etching process according to claim 8, wherein the aging temperature in step (1) and the soaking temperature in step (4) are both 15-25 ℃.
10. The high alumina glass etching process according to claim 9, wherein the aging temperature in step (1) and the soaking temperature in step (4) are both 25 ℃.
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| CN113173710A (en) * | 2021-06-03 | 2021-07-27 | 江苏亿豪新材料科技有限公司 | Formula and etching process of etching liquid for glass product |
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| CN115537203A (en) * | 2022-09-19 | 2022-12-30 | Oppo广东移动通信有限公司 | Etching solution, jade sand display panel, preparation method of jade sand display panel and electronic equipment |
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