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CN111867226A - A plasma jet generation system with recyclable gas - Google Patents

A plasma jet generation system with recyclable gas Download PDF

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Publication number
CN111867226A
CN111867226A CN202010824958.8A CN202010824958A CN111867226A CN 111867226 A CN111867226 A CN 111867226A CN 202010824958 A CN202010824958 A CN 202010824958A CN 111867226 A CN111867226 A CN 111867226A
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gas
plasma jet
flow
generating system
supply passage
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刘熊
甘汶艳
王谦
李永福
李小平
李思全
彭华东
高晨璐
任啸
向竑宇
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Electric Power Research Institute of State Grid Chongqing Electric Power Co Ltd
State Grid Corp of China SGCC
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Electric Power Research Institute of State Grid Chongqing Electric Power Co Ltd
State Grid Corp of China SGCC
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
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  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

本发明公开了一种可回收利用气体的等离子体射流产生系统,其包括等离子体射流组件、混气腔、工作气体供气通路和前驱气体供气通路,工作气体供气通路接入混气腔,用于提供工作气体,前驱气体供气通路接入混气腔,用于提供携带单体材料的前驱气体,混气腔将工作气体和前驱气体混合后给等离子体射流组件供气,使得等离子体射流组件喷射等离子体射流,还包括防护罩和回气通路,防护罩用于罩设在被处理材料表面形成隔绝外界空气的密闭空间,等离子体射流仅能喷射在密闭空间内,防护罩上设有回气口,回气口通过回气通路接入混气腔。本发明可以排除外界杂质气体对材料表面处理的干扰,加强等离子体射流处理效果,同时有效减少气体浪费,提升环保经济性。

Figure 202010824958

The invention discloses a plasma jet generation system that can recycle gas, which comprises a plasma jet assembly, a gas mixing chamber, a working gas supply passage and a precursor gas supply passage, and the working gas supply passage is connected to the gas mixing chamber , used to provide the working gas, the precursor gas supply channel is connected to the gas mixing chamber, used to provide the precursor gas carrying the monomer material, and the gas mixing chamber mixes the working gas and the precursor gas to supply gas to the plasma jet assembly, so that the plasma The body jet assembly sprays the plasma jet, and also includes a protective cover and a return air passage. The protective cover is used to cover the surface of the material to be processed to form a closed space isolated from the outside air. The plasma jet can only be sprayed in the closed space. A return air port is provided, and the return air port is connected to the air mixing chamber through the return air passage. The invention can eliminate the interference of the external impurity gas on the surface treatment of the material, strengthen the plasma jet treatment effect, effectively reduce the gas waste, and improve the environmental protection economy.

Figure 202010824958

Description

一种可回收利用气体的等离子体射流产生系统A plasma jet generation system with recyclable gas

技术领域technical field

本发明涉及等离子体技术领域,特别是一种可回收利用气体的等离子体射流产生系统。The invention relates to the field of plasma technology, in particular to a plasma jet generation system that can recycle gas.

背景技术Background technique

随着等离子体技术的快速发展,等离子体在材料处理、能源化工和生物医学等领域的应用得到了越来越多的推广。等离子体射流通过气体流动将放电区域的活性粒子输运到被处理区域,完成材料改性。但是,在放电过程中,射流管管口处的空气容易被电离,形成各种含氧粒子,不利于材料的疏水改性,极大地限制了等离子体射流处理效果。因此,有必要进一步优化等离子体装置,隔绝外界杂质气体(主要是空气),提高等离子体作用材料表面的处理效率。With the rapid development of plasma technology, the application of plasma in the fields of material processing, energy chemical industry and biomedicine has been more and more popularized. The plasma jet transports the active particles in the discharge area to the treated area through the gas flow to complete the material modification. However, during the discharge process, the air at the nozzle of the jet tube is easily ionized to form various oxygen-containing particles, which is not conducive to the hydrophobic modification of the material and greatly limits the effect of plasma jet treatment. Therefore, it is necessary to further optimize the plasma device, isolate the external impurity gas (mainly air), and improve the treatment efficiency of the surface of the plasma-acting material.

目前,产生等离子体射流所需的气体流速一般为3升/分钟,处理时间一般为150秒,一方面,处理过程中工作气体的耗气量较大,成本较高;另一方面,处理后的工作气体直接混入空气中,损害空气质量,极大地限制了利用等离子体射流进行材料表面处理的实际应用。因此,将射流管喷出的工作气体进行收集并回收再利用,是当前亟待解决的问题。At present, the gas flow rate required to generate the plasma jet is generally 3 liters/min, and the processing time is generally 150 seconds. On the one hand, the gas consumption of the working gas during the processing is large and the cost is high; The working gas is directly mixed into the air, which damages the air quality and greatly limits the practical application of material surface treatment with plasma jets. Therefore, it is an urgent problem to be solved at present to collect and recycle the working gas ejected from the jet tube.

发明内容SUMMARY OF THE INVENTION

有鉴于现有技术的上述缺陷,本发明的目的就是提供一种可回收利用气体的等离子体射流产生系统,本发明可以排除外界杂质气体对材料表面处理的干扰,加强等离子体射流处理效果,同时有效减少气体浪费,提升环保经济性。In view of the above-mentioned defects of the prior art, the purpose of the present invention is to provide a plasma jet generation system that can recycle gas. The present invention can eliminate the interference of external impurity gas on the surface treatment of materials, strengthen the plasma jet treatment effect, and simultaneously. Effectively reduce gas waste and improve environmental protection and economy.

本发明的目的之一是通过这样的技术方案实现的,一种可回收利用气体的等离子体射流产生系统,包括等离子体射流组件、混气腔、工作气体供气通路和前驱气体供气通路,所述工作气体供气通路接入混气腔,用于提供工作气体,所述前驱气体供气通路接入混气腔,用于提供携带单体材料的前驱气体,所述混气腔将工作气体和前驱气体混合后给等离子体射流组件供气,使得等离子体射流组件喷射等离子体射流,还包括防护罩和回气通路,所述防护罩用于罩设在被处理材料表面上形成隔绝外界空气的密闭空间,所述等离子体射流仅能喷射在所述密闭空间内,所述防护罩上设有回气口,所述回气口通过回气通路接入混气腔,以将所述防护罩内的工作气体回收至混气腔。One of the objectives of the present invention is achieved through such a technical solution, a plasma jet generation system that can recycle gas, comprising a plasma jet assembly, a gas mixing chamber, a working gas supply passage and a precursor gas supply passage, The working gas supply passage is connected to the gas mixing chamber for providing working gas, and the precursor gas supply passage is connected to the gas mixing chamber for providing the precursor gas carrying the monomer material, and the gas mixing chamber will work After the gas and the precursor gas are mixed, the plasma jet assembly is supplied with gas, so that the plasma jet assembly sprays the plasma jet, and also includes a protective cover and a return gas passage. A closed space of air, the plasma jet can only be sprayed in the closed space, and the protective cover is provided with an air return port, and the air return port is connected to the air mixing chamber through the return air passage to connect the protective cover to the air. The working gas inside is recovered to the mixing chamber.

进一步,所述防护罩为内部具有中空空间且底面呈开口的形状,以与被处理材料表面紧密接触。Further, the protective cover has a hollow space inside and an open bottom surface, so as to be in close contact with the surface of the material to be processed.

进一步,所述防护罩由绝缘材料制成。Further, the protective cover is made of insulating material.

进一步,所述回气通路上从出气口开始依次设有干燥瓶和气泵,所述干燥瓶用于对回气通路中的工作气体进行干燥除氧,所述气泵用于将回气通路中的工作气体排入混气腔。Further, a drying bottle and an air pump are arranged on the return air passage in sequence from the air outlet. The working gas is discharged into the mixing chamber.

进一步,所述工作气体供气通路上设有第一流量阀,所述前驱气体供气通路上设有第二流量阀。Further, the working gas supply passage is provided with a first flow valve, and the precursor gas supply passage is provided with a second flow valve.

进一步,所述工作气体供气通路上设有第一流量计,所述前驱气体供气通路上设有第二流量计,所述回气通路上靠近混气腔的位置设有第三流量计。Further, a first flow meter is arranged on the working gas supply passage, a second flow meter is arranged on the precursor gas supply passage, and a third flow meter is arranged on the return gas passage near the gas mixing chamber .

进一步,还包括流量控制器,所述流量控制器用于读取第一流量计、第二流量计和第三流量计的流量数据,并在开始对被处理材料进行表面处理时,控制气泵的功率、第一流量阀和第二流量阀的开合度,使得第一流量计的流量数据达到第一目标流量、第二流量计的流量数据维持在预定值、第三流量计的流量数据达到第一目标流量;以及在保持预设时间后,关闭第一流量阀、第二流量阀和气泵。Further, it also includes a flow controller, the flow controller is used to read the flow data of the first flowmeter, the second flowmeter and the third flowmeter, and control the power of the air pump when the surface treatment of the material to be processed starts. , the opening degree of the first flow valve and the second flow valve, so that the flow data of the first flow meter reaches the first target flow, the flow data of the second flow meter is maintained at a predetermined value, and the flow data of the third flow meter reaches the first target flow target flow; and after maintaining for a preset time, closing the first flow valve, the second flow valve and the air pump.

进一步,所述等离子体射流组件包括高压电源和至少一根等离子体射流管,所述等离子体射流管的一端伸入并固定有针状电极,所述针状电极与高压电源电连接,所述等离子体射流管的另一端开口并伸入所述密闭空间内,所述等离子体射流管靠近开口处的内部设有接地的地电极,所述混气腔通过固定针状电极的一端给等离子体射流管供气。Further, the plasma jet assembly includes a high-voltage power supply and at least one plasma jet tube, one end of the plasma jet tube extends into and is fixed with a needle-shaped electrode, the needle-shaped electrode is electrically connected to the high-voltage power supply, and the The other end of the plasma jet tube is open and extends into the closed space, the interior of the plasma jet tube near the opening is provided with a grounded ground electrode, and the gas mixing chamber supplies the plasma to the plasma by fixing one end of the needle-shaped electrode. Jet tube air supply.

进一步,所述等离子体射流管采用耐高温绝缘材质制成。Further, the plasma jet tube is made of high temperature resistant insulating material.

进一步,所述针状电极为钨针,所述地电极采用铜箔材料制成。Further, the needle-shaped electrode is a tungsten needle, and the ground electrode is made of copper foil material.

由于采用了上述技术方案,本发明具有如下的优点:Owing to adopting the above-mentioned technical scheme, the present invention has the following advantages:

1、节约了工作气体的用气量,提升了环保经济性;1. Save the gas consumption of the working gas and improve the environmental protection and economy;

2、由于材料表面处理过程中隔绝了外界空气,因此有效减少了气体浪费,加快了处理速度;2. Since the outside air is isolated during the surface treatment of the material, the gas waste is effectively reduced and the processing speed is accelerated;

3、回收气体中含有浓度较高的有效离子,再次利用时进一步跟被处理材料表面反应,提升了等离子体的改性效果。3. The recovered gas contains effective ions with a high concentration, which further reacts with the surface of the treated material when reused, which improves the modification effect of the plasma.

本发明的其他优点、目标和特征在某种程度上将在随后的说明书中进行阐述,并且在某种程度上,基于对下文的考察研究对本领域技术人员而言将是显而易见的,或者可以从本发明的实践中得到教导。Other advantages, objects, and features of the present invention will be set forth in the description that follows, and will be apparent to those skilled in the art based on a study of the following, to the extent that is taught in the practice of the present invention.

附图说明Description of drawings

本发明的附图说明如下:The accompanying drawings of the present invention are described as follows:

图1为可回收利用气体的等离子体射流产生系统的连接示意图。FIG. 1 is a schematic diagram of the connection of a plasma jet generation system for recyclable gas.

具体实施方式Detailed ways

下面结合附图和实施例对本发明作进一步说明。The present invention will be further described below with reference to the accompanying drawings and embodiments.

实施例,如图1所示;一种可回收利用气体的等离子体射流产生系统,包括等离子体射流组件10、混气腔20、工作气体供气通路30和前驱气体供气通路40,工作气体供气通路30接入混气腔20,用于提供工作气体,前驱气体供气通路40接入混气腔20,用于提供携带单体材料的前驱气体,混气腔20将工作气体和前驱气体混合后给等离子体射流组件10供气,使得等离子体射流组件10喷射等离子体射流,此外,该系统还包括防护罩50和回气通路60,防护罩50用于罩设在被处理材料表面上形成隔绝外界空气的密闭空间,等离子体射流仅能喷射在密闭空间内,防护罩50上设有回气口51,回气口51通过回气通路60接入混气腔20,以将防护罩50内的工作气体回收至混气腔20。Embodiment, as shown in Figure 1; a plasma jet generation system that can recycle gas, including a plasma jet assembly 10, a gas mixing chamber 20, a working gas supply passage 30 and a precursor gas supply passage 40, the working gas The gas supply passage 30 is connected to the gas mixing chamber 20 for providing working gas, and the precursor gas supply passage 40 is connected to the gas mixing chamber 20 for providing the precursor gas carrying the monomer material. The gas mixing chamber 20 combines the working gas and the precursor. After the gases are mixed, the plasma jet assembly 10 is supplied with gas, so that the plasma jet assembly 10 sprays the plasma jet. In addition, the system also includes a protective cover 50 and a return gas passage 60, and the protective cover 50 is used to cover the surface of the material to be processed. A closed space isolated from the outside air is formed on the upper surface, and the plasma jet can only be sprayed in the closed space. The protective cover 50 is provided with an air return port 51. The working gas inside is recovered to the gas mixing chamber 20 .

工作气体供气通路30的供气源可以为第一气瓶70,前驱气体供气通路40的供气源可以为第二气瓶80。The gas supply source of the working gas supply passage 30 may be the first gas cylinder 70 , and the gas supply source of the precursor gas gas supply passage 40 may be the second gas cylinder 80 .

在本实施例中,防护罩50内部具有中空空间且底面呈开口的形状,与被处理材料表面紧密接触。本实施例中,该形状为半球形。在其他一些实施例中,防护罩50可以为半椭球形和长方体形等能够与被处理材料表面紧密结合的形状。防护罩50通常由绝缘材料制成,例如塑料或橡胶,本实施例采用塑料。In this embodiment, the protective cover 50 has a hollow space inside and an open bottom surface, which is in close contact with the surface of the material to be processed. In this embodiment, the shape is hemispherical. In other embodiments, the protective cover 50 may be in a shape that can be closely combined with the surface of the material to be processed, such as a semi-ellipsoid and a rectangular parallelepiped. The protective cover 50 is usually made of insulating material, such as plastic or rubber, in this embodiment, plastic is used.

为了加快工作气体回收速度,在本实施例中,回气通路60上从出气口51开始依次设有干燥瓶61和气泵62,干燥瓶61用于对回气通路60中的工作气体进行干燥除氧,气泵62用于将回气通路60中的工作气体排入混气腔20。由于可以将工作气体回收利用,工作气体供气通路30就可以减少供气量。In order to speed up the recovery of the working gas, in this embodiment, a drying bottle 61 and an air pump 62 are arranged on the return gas passage 60 in sequence from the gas outlet 51, and the drying bottle 61 is used to dry and remove the working gas in the return gas passage 60. Oxygen, the air pump 62 is used to discharge the working gas in the return air passage 60 into the air mixing chamber 20 . Since the working gas can be recycled, the working gas supply passage 30 can reduce the amount of gas supplied.

为了精确控制各通路的气体流量,在本实施例中,工作气体供气通路30上设有第一流量阀31,前驱气体供气通路40上设有第二流量阀41。工作气体供气通路30上还设有第一流量计32,前驱气体供气通路40上设有第二流量计42,回气通路60上靠近混气腔20的位置设有第三流量计63。通过第一流量阀31、第二流量阀41和气泵62可以控制气体流量,而第一流量计32、第二流量计42、第三流量计63可以反馈流量控制效果。In order to precisely control the gas flow of each passage, in this embodiment, the working gas supply passage 30 is provided with a first flow valve 31 , and the precursor gas supply passage 40 is provided with a second flow valve 41 . The working gas supply passage 30 is also provided with a first flow meter 32 , the precursor gas supply passage 40 is provided with a second flow meter 42 , and the return gas passage 60 is provided with a third flow meter 63 near the gas mixing chamber 20 . . The gas flow can be controlled by the first flow valve 31 , the second flow valve 41 and the air pump 62 , and the first flowmeter 32 , the second flowmeter 42 and the third flowmeter 63 can feedback the flow control effect.

在具体控制流量时,该系统还包括流量控制器(图未示),流量控制器用于读取第一流量计32、第二流量计42和第三流量计63的流量数据,并在开始对被处理材料进行表面处理时,控制气泵62和第二流量阀41关闭,控制第一流量阀31的开合度,使得第一流量计32的流量数据达到第一目标流量;在维持预设时间后,控制第二流量阀41的开合度,使得第二流量计42的流量数据维持在预定值,且控制第一流量阀31的开合度和气泵62的排气速度,使得第一流量计32的流量数据降低至第一目标流量的一半,同时第三流量计63的流量数据略低于第一流量计32的流量数据;以及在继续维持预设时间后,关闭第一流量阀31、第二流量阀41和气泵62。When specifically controlling the flow, the system further includes a flow controller (not shown in the figure), the flow controller is used to read the flow data of the first flow meter 32, the second flow meter 42 and the third flow meter 63, and at the beginning of the flow control When the material to be treated is subjected to surface treatment, control the air pump 62 and the second flow valve 41 to close, and control the opening and closing degree of the first flow valve 31, so that the flow data of the first flow meter 32 reaches the first target flow; after maintaining the preset time , control the opening and closing degree of the second flow valve 41, so that the flow data of the second flow meter 42 is maintained at a predetermined value, and control the opening and closing degree of the first flow valve 31 and the exhaust speed of the air pump 62, so that the first flow meter 32 The flow data is reduced to half of the first target flow, while the flow data of the third flow meter 63 is slightly lower than the flow data of the first flow meter 32; and after continuing to maintain the preset time, close the first flow valve 31, the second flow Flow valve 41 and air pump 62 .

下面,以对环氧树脂板进行表面憎水处理为实例,对等离子体射流产生系统进行详细说明。在该实例中,采用氩气作为工作气体和前驱气体,前驱气体携带的单体材料为六甲基二硅氮烷(HMDSN),预设时间为1分钟,第一目标流量为1.5升/分钟,预定值为20毫升/分钟。Hereinafter, the plasma jet generation system will be described in detail by taking the surface hydrophobic treatment of the epoxy resin plate as an example. In this example, argon is used as the working gas and the precursor gas, the monomer material carried by the precursor gas is hexamethyldisilazane (HMDSN), the preset time is 1 minute, and the first target flow rate is 1.5 liters/minute , the predetermined value is 20 ml/min.

具体工作流程如下:The specific workflow is as follows:

1.清洁并烘干环氧树脂板;1. Clean and dry the epoxy resin board;

2.将防护罩50罩设在环氧树脂板表面形成密闭空间;2. Set the protective cover 50 on the surface of the epoxy resin board to form a closed space;

3.打开第一流量阀31和气泵62,通入工作气体(维持在3升/分钟),并保持1分钟,直到该系统中各通路的空气排空;3. Open the first flow valve 31 and the air pump 62, feed the working gas (maintain at 3 liters/min), and keep it for 1 minute, until the air in each passage in the system is emptied;

4.开始对环氧树脂板进行表面处理,控制气泵62的功率、第一流量阀31和第二流量阀41的开合度,使得第一流量计32的流量数据达到1.5升/分钟,第二流量计42的流量数据维持在20毫升/分钟,第三流量计63的流量数据也为1.5升/分钟(也就是工作气体回收速率为1.5升/分钟),保证流过射流管的气体流量依然为3升/分钟左右,并保持1分钟;。4. Start the surface treatment of the epoxy resin board, control the power of the air pump 62, the opening and closing degrees of the first flow valve 31 and the second flow valve 41, so that the flow data of the first flow meter 32 reaches 1.5 liters/min, the second The flow data of the flow meter 42 is maintained at 20 ml/min, and the flow data of the third flow meter 63 is also 1.5 liters/min (that is, the working gas recovery rate is 1.5 liters/min), to ensure that the gas flow through the jet tube is still is about 3 liters/minute, and keep it for 1 minute;.

5.保持1分钟后,关闭第一流量阀31、第二流量阀41和气泵62,环氧树脂板表面处理完毕。5. After holding for 1 minute, close the first flow valve 31, the second flow valve 41 and the air pump 62, and the surface treatment of the epoxy resin board is completed.

将本实施例的等离子体射流发生系统与现有技术的等离子体射流发生系统的处理过程进行对比,对比结果如下表所示:The plasma jet generation system of this embodiment is compared with the treatment process of the plasma jet generation system of the prior art, and the comparison results are shown in the following table:

Figure BDA0002635861580000051
Figure BDA0002635861580000051

通过对比可知,本实施例的等离子体射流发生系统通过回收工作气体,不但节约了工作气体的用气量,还缩短了处理时间,加快了处理速度,并且在处理过程中杜绝了空气中氧气的干扰,处理效果更佳。By comparison, it can be seen that the plasma jet generation system of this embodiment not only saves the gas consumption of the working gas, but also shortens the processing time, speeds up the processing speed, and eliminates the interference of oxygen in the air during the processing process by recovering the working gas. , the processing effect is better.

等离子体射流组件10作为产生等离子体射流的装置,其包括高压电源11和至少一根等离子体射流管12。在本实施例中,等离子体射流管12为一根,如果等离子体射流管12为多根,则可以组成射流阵列结构。The plasma jet assembly 10 is used as a device for generating plasma jets, and includes a high-voltage power supply 11 and at least one plasma jet tube 12 . In this embodiment, there is only one plasma jet tube 12 . If there are multiple plasma jet tubes 12 , a jet array structure can be formed.

等离子体射流管12的一端伸入并固定有针状电极13,针状电极13与高压电源11电连接,等离子体射流管12的另一端开口并伸入密闭空间内,等离子体射流管12靠近开口处的内部设有接地的地电极14,混气腔20通过固定针状电极13的一端给等离子体射流管12供气。One end of the plasma jet tube 12 protrudes into and is fixed with a needle-shaped electrode 13, the needle-shaped electrode 13 is electrically connected to the high-voltage power supply 11, the other end of the plasma jet tube 12 is opened and extends into the closed space, and the plasma jet tube 12 is close to The inside of the opening is provided with a grounded ground electrode 14 , and the gas mixing chamber 20 supplies gas to the plasma jet tube 12 through one end of the fixed needle electrode 13 .

等离子体射流管12通常采用耐高温绝缘材质制成,例如为石英玻璃管,长度可为15-20cm,内层玻璃壁直径可为0.5-0.8mm。The plasma jet tube 12 is usually made of a high temperature resistant insulating material, such as a quartz glass tube, the length may be 15-20 cm, and the diameter of the inner glass wall may be 0.5-0.8 mm.

针状电极13可以为钨针或其它针型导体,地电极14可以采用铜箔材料等导电材料制成,电极宽度可为1cm。The needle-shaped electrode 13 can be a tungsten needle or other needle-shaped conductor, the ground electrode 14 can be made of a conductive material such as copper foil, and the electrode width can be 1 cm.

通过上述方式,本发明实施例的可回收利用气体的等离子体射流产生系统通过防护罩50隔绝外界空气,并通过回气通路60对工作气体进行回收再利用。不仅能够排除外界杂质气体对材料表面处理的干扰,加强等离子体射流处理效果,同时有效减少气体浪费,提升环保经济性。In the above manner, the plasma jet generation system for recyclable gas according to the embodiment of the present invention isolates the outside air through the protective cover 50 , and recycles and reuses the working gas through the air return passage 60 . It can not only eliminate the interference of external impurity gas on the surface treatment of materials, but also strengthen the effect of plasma jet treatment, and at the same time effectively reduce gas waste and improve environmental protection and economy.

以上仅为本发明的实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均包含在申请待批的本发明的权利要求范围之内。The above are only examples of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention are included in the application for pending approval of the present invention. within the scope of the claims.

应当理解的是,本说明书未详细阐述的部分均属于现有技术。最后说明的是,以上实施例仅用以说明本发明的技术方案而非限制,尽管参照较佳实施例对本发明进行了详细说明,本领域的普通技术人员应当理解,可以对本发明的技术方案进行修改或者等同替换,而不脱离本技术方案的宗旨和范围,其均应涵盖在本发明的权利要求范围当中。It should be understood that the parts not described in detail in this specification belong to the prior art. Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit them. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be Modifications or equivalent replacements, without departing from the spirit and scope of the technical solution, should all be included in the scope of the claims of the present invention.

Claims (10)

1. A plasma jet generating system capable of recycling gas comprises a plasma jet component, a gas mixing cavity, a working gas supply passage and a precursor gas supply passage, wherein the working gas supply passage is connected into the gas mixing cavity and used for providing working gas, the precursor gas supply passage is connected into the gas mixing cavity and used for providing precursor gas carrying monomer materials, the gas mixing cavity mixes the working gas and the precursor gas and then supplies the gas to the plasma jet component, so that the plasma jet component sprays plasma jet, the plasma jet generating system is characterized by further comprising a protective cover and a gas return passage, the protective cover is used for covering a closed space which is formed on the surface of a material to be processed and used for isolating external air, the plasma jet can only be sprayed into the closed space, the protective cover is provided with a gas return port, and the gas return port is connected into the gas mixing cavity through the gas return passage, so as to recycle the working gas in the protective cover to the gas mixing cavity.
2. The plasma jet generating system as claimed in claim 1, wherein the shield is formed in a shape having a hollow space inside and an open bottom surface to be in close contact with a surface of a material to be treated.
3. A plasma-jet generating system, as claimed in claim 1 or 2, characterized in that the protective cover is made of an insulating material.
4. The plasma jet generating system according to claim 1, wherein a drying bottle and a gas pump are sequentially arranged on the air return passage from the gas outlet, the drying bottle is used for drying and deoxidizing the working gas in the air return passage, and the gas pump is used for discharging the working gas in the air return passage into the gas mixing chamber.
5. The plasma jet generating system of claim 4, wherein a first flow valve is disposed on the working gas supply passage and a second flow valve is disposed on the precursor gas supply passage.
6. The plasma jet generating system of claim 5, wherein a first flow meter is arranged on the working gas supply passage, a second flow meter is arranged on the precursor gas supply passage, and a third flow meter is arranged on the return gas passage and close to the gas mixing chamber.
7. The plasma jet generating system according to claim 6, further comprising a flow controller for reading flow data of the first flow meter, the second flow meter, and the third flow meter, and controlling the power of the air pump and the opening and closing degree of the first flow valve and the second flow valve so that the flow data of the first flow meter reaches a first target flow, the flow data of the second flow meter is maintained at a predetermined value, and the flow data of the third flow meter reaches a first target flow when surface treatment of the material to be treated is started; and closing the first flow valve, the second flow valve and the air pump after keeping the preset time.
8. The plasma jet generating system according to claim 1, wherein the plasma jet assembly includes a high voltage power supply and at least one plasma jet pipe, one end of the plasma jet pipe extends into and is fixed with a needle electrode, the needle electrode is electrically connected with the high voltage power supply, the other end of the plasma jet pipe is opened and extends into the closed space, a grounded ground electrode is arranged inside the plasma jet pipe close to the opening, and the gas mixing chamber supplies gas to the plasma jet pipe through one end of the fixed needle electrode.
9. The plasma jet generating system of claim 8, wherein the plasma jet pipe is made of a high temperature resistant insulating material.
10. The plasma-jet generating system of claim 8, wherein the needle electrode is a tungsten needle and the ground electrode is made of a copper foil material.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112235928A (en) * 2020-11-08 2021-01-15 赣南师范大学 A gas-mixed double-convergence dielectric barrier discharge low-temperature plasma generator
WO2024031118A3 (en) * 2022-08-09 2024-04-11 Thermal Processing Solutions GmbH Device for providing a plasma

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002151507A (en) * 2000-11-15 2002-05-24 Sekisui Chem Co Ltd Semiconductor element manufacturing method and apparatus thereof
CN103120031A (en) * 2010-06-30 2013-05-22 富士机械制造株式会社 Active species supply device and surface treatment device
CN104108053A (en) * 2014-06-19 2014-10-22 华中科技大学 Plasma and pulse discharge composite polishing method for large-scale complicated metal surface
CN108130522A (en) * 2017-12-22 2018-06-08 中国科学院电工研究所 Metal surface depositing Ti O2Film inhibits the method and device of micro discharge
CN208151445U (en) * 2018-09-03 2018-11-27 成都登特牙科技术开发有限公司 Heat-treatment furnace suitable for metal increasing material manufacturing
CN109267037A (en) * 2018-11-21 2019-01-25 新疆大学 Atmospheric plasma enhances chemical vapor deposition method and the equipment using this method
CN111135770A (en) * 2019-12-31 2020-05-12 河海大学常州校区 Experimental research device and method for generation characteristics of catalytic synergistic discharge active ingredients

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002151507A (en) * 2000-11-15 2002-05-24 Sekisui Chem Co Ltd Semiconductor element manufacturing method and apparatus thereof
CN103120031A (en) * 2010-06-30 2013-05-22 富士机械制造株式会社 Active species supply device and surface treatment device
CN104108053A (en) * 2014-06-19 2014-10-22 华中科技大学 Plasma and pulse discharge composite polishing method for large-scale complicated metal surface
CN108130522A (en) * 2017-12-22 2018-06-08 中国科学院电工研究所 Metal surface depositing Ti O2Film inhibits the method and device of micro discharge
CN208151445U (en) * 2018-09-03 2018-11-27 成都登特牙科技术开发有限公司 Heat-treatment furnace suitable for metal increasing material manufacturing
CN109267037A (en) * 2018-11-21 2019-01-25 新疆大学 Atmospheric plasma enhances chemical vapor deposition method and the equipment using this method
CN111135770A (en) * 2019-12-31 2020-05-12 河海大学常州校区 Experimental research device and method for generation characteristics of catalytic synergistic discharge active ingredients

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112235928A (en) * 2020-11-08 2021-01-15 赣南师范大学 A gas-mixed double-convergence dielectric barrier discharge low-temperature plasma generator
CN112235928B (en) * 2020-11-08 2022-09-23 赣南师范大学 Mixed gas double-convergence dielectric barrier discharge low-temperature plasma generating device
WO2024031118A3 (en) * 2022-08-09 2024-04-11 Thermal Processing Solutions GmbH Device for providing a plasma

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