CN111668691B - Hundred picoseconds laser with high power and high repetition frequency - Google Patents
Hundred picoseconds laser with high power and high repetition frequency Download PDFInfo
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/1086—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering using scattering effects, e.g. Raman or Brillouin effect
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2316—Cascaded amplifiers
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Abstract
The invention discloses a hundred picoseconds laser with high power and high repetition frequency, which comprises: the seed laser emits seed light with first frequency, the seed light enters a double-pass amplifier through a first optical isolator to be amplified, and the seed light enters an SBS pulse compressor to compress the seed light with first frequency to laser with second frequency after sequentially passing through a first reflector, a first beam shaper, a first single-pass amplifier, a second reflector, a third reflector, a second beam shaper and a second optical isolator; the second-frequency laser sequentially passes through a fourth reflector, a third beam shaper, a plurality of second single-pass amplifiers, a fifth reflector, a sixth reflector, a fourth beam shaper and a plurality of four-way slat amplifiers for amplification; the amplified laser passes through a seventh reflecting mirror, a fifth beam shaper and a frequency multiplier to generate third-frequency laser, and finally, the third-frequency laser is output through a spectroscope. The invention solves the problems of small size of solid SBS medium, damage of high-power laser to SBS material, low output narrow pulse width laser power and the like.
Description
Technical Field
The invention relates to the field of lasers, in particular to a high-power high-repetition-frequency hundred picoseconds laser.
Background
With the penetration of space exploration, the activity of human entering space is increasing, but similar activities also generate more and more space fragments, which has great influence on satellite launching and space exploration, and the detection of fragments in space orbits is needed. The conventional space target measurement is realized by a radar, but the surface of the space debris has no corner reflector, so that the signal sent by the radar cannot be received and reflected, and the radar is not practical to measure, so that the detection of the space debris by using a laser becomes a research hot spot in recent years.
The laser source for space debris detection needs to be transmitted far away, so that the laser source is required to have high energy, and is required to realize high-precision space measurement, and the laser source also needs to have the characteristics of good beam quality, narrow pulse width and high repetition frequency, so that the acquisition of the laser source with narrow line width, high power and high repetition frequency is a key step for optimizing space detection.
The traditional space debris detection method adopts a nanosecond laser and combines a Main Oscillation Power Amplification (MOPA) method, but the pulse width of the traditional space debris detection method cannot meet the requirements of people on distance measurement precision at present, so that people are exploring a realization method of a high-energy picosecond laser.
At present, the technical means for obtaining picosecond pulse laser output mainly adopts a saturated absorber (SESAM) passive mode locking mode. However, the saturable absorber has a low damage threshold, so that the output power of the passive mode locking picosecond pulse laser is limited, and the laser is often amplified by combining with a complex structure such as a regenerative amplifier, so that the cost is high and the stability is difficult to control. Therefore, the large-energy output of hundred picoseconds is obtained by utilizing large-energy nanosecond pulse compression and amplified, the difficult problem that SESAM mode-locked lasers are difficult to amplify efficiently can be effectively avoided, the method is an important means for effectively obtaining high-power picosecond laser sources, the distance measurement precision is expected to be improved by 1-2 orders of magnitude, and the cost of lasers is effectively controlled and the stability is higher.
Disclosure of Invention
The invention provides a hundred picoseconds laser with high power and high repetition frequency, which solves the problems of small size of solid SBS medium, damage of high power laser to SBS material, low power of output narrow pulse width laser and the like by adopting a mode of combining a plurality of structures of multistage amplification, serial connection of a plurality of Stimulated Brillouin Scattering (SBS) solid media, compression before amplification and the like, and is described in detail below:
a high power high repetition rate hundred picosecond laser, the laser comprising:
The seed laser emits seed light with first frequency, the seed light enters a double-pass amplifier to amplify after passing through a first optical isolator, and the seed light enters an SBS pulse compressor to compress the seed light with first frequency to laser with second frequency after sequentially passing through a first reflector, a first beam shaper, a first single-pass amplifier, a second reflector, a third reflector, a second beam shaper and a second optical isolator;
the second frequency laser sequentially passes through a fourth reflector, a third beam shaper, a plurality of second single-pass amplifiers, a fifth reflector, a sixth reflector, a fourth beam shaper and a plurality of four-way slat amplifiers for laser amplification;
the amplified laser passes through a seventh reflecting mirror, a fifth beam shaper and a frequency multiplier to generate third-frequency laser, and finally, the third-frequency laser is output through a spectroscope.
The first optical isolator and the second optical isolator are composed of a first polarizer, a Faraday rotator and a first half wave plate, so that incident seed light passes through the first polarizer unidirectionally, and reversely transmitted light deflects and exits when passing through the first polarizer due to the change of polarization state.
Further, the dual-pass amplifier consists of a second polarizer, a first side pump module, a first quarter wave plate and a zero-degree total reflection mirror;
the first quarter wave plate is used for changing the polarization state of the seed light; the zero-degree total reflection mirror is plated with a total reflection film for the first frequency seed light, and forms an included angle of 90 degrees with the incidence direction of the first frequency seed light, so that total reflection is realized.
The first single-pass amplifier consists of a second side pump module, a first 90-degree quartz rotor and a third side pump module.
Further, the SBS pulse compressor consists of a third polarizer, a second quarter wave plate, a first focusing lens and a plurality of Brillouin media;
The second quarter wave plate is used for changing the polarization state of the laser after pulse compression; the first focusing lens focuses the incident seed light into the Brillouin medium; the first frequency seed light is in a horizontal polarization state, is transmitted into a third polarizer, is changed into elliptical polarized light through a second quarter wave plate, is focused into a Brillouin medium through a first focusing lens to generate second frequency laser, and is changed into a vertical polarization state through the first focusing lens and the second quarter wave plate after being subjected to backward scattering and pulse compression, and finally the compressed second frequency laser is reflected out of an SBS pulse compressor through the third polarizer.
In specific implementation, the second single-pass amplifier consists of a fourth side pump module, a second 90-degree quartz rotor, a second focusing lens, a first vacuum tube, a third focusing lens, a fifth side pump module, a second half wave plate and a fourth polarizer, wherein a first aperture diaphragm is arranged in the first vacuum tube;
The second focusing lens, the first vacuum tube, the first aperture diaphragm and the third focusing lens form a spatial filter together, and the spatial filter is used for eliminating the spontaneous radiation amplifying effect generated in the amplifying process; the second half wave plate and the fourth polarizer are combined to control the laser output energy without changing the polarization state of the laser.
The four-way slat amplifier consists of a fifth polarizer, a slat gain medium, an eighth reflecting mirror, a sixth beam shaper, a ninth reflecting mirror, a tenth reflecting mirror, a seventh beam shaper, a third quarter wave plate, an eleventh reflecting mirror, a fourth focusing lens, a second vacuum tube, a fifth focusing lens and a third half wave plate, wherein a second small aperture diaphragm is arranged in the second vacuum tube;
The sixth beam shaper and the seventh beam shaper are composed of a single optical lens or an optical lens group and are used for shaping the amplified seed beam to reduce the negative influence of reducing the amplifying efficiency caused by beam divergence; the third quarter wave plate is used for changing the polarization state of laser in the amplifying process; the eleventh reflecting mirror is plated with a total reflection film for the second-frequency laser and forms an included angle of 90 degrees with the incidence direction of the second laser, so that the total reflection of the second-frequency laser is realized.
The technical scheme provided by the invention has the beneficial effects that:
1. The laser adopts a mode of connecting a plurality of solid SBS media in series to increase the action distance of SBS pulse compression, can effectively perform pulse compression on high-repetition-frequency laser, improves the pulse compression efficiency, and makes up the defect of small size of a single solid SBS medium;
2. The laser firstly carries out pulse compression through the SBS and then amplifies the laser power, so that the problem that high-power laser damages an SBS material is avoided;
3. The laser adopts a multi-stage amplification mode of a dual-pass amplifier and a single-pass amplifier to amplify seed laser, and simultaneously adopts a four-way slat amplifier to amplify the seed light after pulse compression, so that the effective amplification of hundred picosecond order pulse laser can be realized, and the energy utilization rate and the amplification efficiency can be improved.
Drawings
FIG. 1 is a schematic diagram of a high power high repetition rate hundred picosecond laser;
FIG. 2 is a schematic diagram of a first optical isolator;
FIG. 3 is a schematic diagram of a dual pass amplifier;
FIG. 4 is a schematic diagram of a first single pass amplifier;
FIG. 5 is a schematic diagram of the structure of an SBS pulse compressor;
FIG. 6 is a schematic diagram of a second single pass amplifier;
FIG. 7 is a schematic diagram of a four-way slat amplifier;
Fig. 8 is a schematic diagram of a multistage four-way slat amplifier in series.
In the drawings, the list of components represented by the various numbers is as follows:
1: a seed laser; 2: a first optical isolator;
3: a two-pass amplifier; 4: a first mirror;
5: a first beam shaper; 6: a first single pass amplifier;
7: a second mirror; 8: a third mirror;
9: a second beam shaper; 10: a second optical isolator;
11: an SBS pulse compressor; 12: a fourth mirror;
13: a third beam shaper; 14: a second single pass amplifier;
15: a fifth reflecting mirror; 16: a sixth mirror;
17: a fourth beam shaper; 18: a four-way slat amplifier;
19: a seventh mirror; 20: a fifth beam shaper;
21: a frequency multiplier; 22: a spectroscope.
Wherein the method comprises the steps of
2-1: A first polarizer; 2-2: a Faraday rotator;
2-3: a first half-wave plate;
3-1: a second polarizer; 3-2: a first side pump module;
3-3: a first quarter wave plate; 3-4: zero degree total reflection mirror;
6-1: a second side pump module; 6-2: a first 90 ° quartz rotor;
6-3: a third side pump module;
11-1: a third polarizer; 11-2: a second quarter wave plate;
11-3: a first focusing lens; 11-4: brillouin medium;
14-1: a fourth side pump module; 14-2: a second 90 ° quartz rotor;
14-3: a second focusing lens; 14-4: a first vacuum tube;
14-5: a first aperture stop; 14-6: a third focusing lens;
14-7: a fifth side pump module; 14-8: a second half wave plate;
14-9: a fourth polarizer;
18-1: a fifth polarizer; 18-2: a slab gain medium;
18-3: an eighth mirror; 18-4: a sixth beam shaper;
18-5: a ninth reflecting mirror; 18-6: a tenth reflecting mirror;
18-7: a seventh beam shaper; 18-8: a third quarter wave plate;
18-9: an eleventh reflecting mirror; 18-10: a fourth focusing lens;
18-11: a second vacuum tube; 18-12: a second aperture stop;
18-13: a fifth focusing lens; 18-14: a third half wave plate.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in further detail below.
By knowing the shortages existing in the traditional space target detection technology, the laser can be used for realizing rapid and accurate detection of the space target, especially measurement of space fragments in a near-earth orbit, which has important significance for satellite emission and further space exploration. In order to realize long-distance space target detection by laser, the adopted laser source is required to have higher energy, and in order to realize high-precision space measurement, the laser source is required to have the characteristics of good beam quality, narrow pulse width and high repetition frequency, so that the acquisition of the laser source with narrow line width, high power and high repetition frequency is a key step for optimizing space detection. The SESAM passive mode locking mode can obtain picosecond-level narrow linewidth laser output, but is limited by the fact that the damage threshold of the saturable absorber is low, and the output power of the pulse laser is limited greatly.
In summary, the present invention proposes to use the combination of multi-stage oscillation power amplification and SBS pulse compression to obtain a high-power, narrow-linewidth, high-repetition frequency laser source for space debris detection.
In order to solve the problem that the conventional space object measurement technology is not applicable to space debris detection, the embodiment of the invention provides a high-power high-repetition-frequency hundred picosecond laser, referring to fig. 1, the high-power high-repetition-frequency hundred picosecond laser comprises: a seed laser 1, a first optical isolator 2, a two-pass amplifier 3, a first mirror 4, a first beam shaper 5, a first single-pass amplifier 6, a second mirror 7, a third mirror 8, a second beam shaper 9, a second optical isolator 10, an SBS pulse compressor 11, a fourth mirror 12, a third beam shaper 13, a second single-pass amplifier 14, a fifth mirror 15, a sixth mirror 16, a fourth beam shaper 17, a four-way slab amplifier 18, a seventh mirror 19, a fifth beam shaper 20, a frequency multiplier 21, and a beam splitter 22.
The seed laser 1 emits nanosecond seed light with a first frequency (omega p) and a single longitudinal mode kHz magnitude, the nanosecond seed light passes through the first optical isolator 2 and then enters the two-pass amplifier 3 to be amplified, and then sequentially passes through the first reflecting mirror 4, the first beam shaper 5, the first single-pass amplifier 6, the second reflecting mirror 7, the third reflecting mirror 8, the second beam shaper 9 and the second optical isolator 10, and then enters the SBS pulse compressor 11 to compress the nanosecond seed light with the first frequency to laser with a second frequency (omega s) and the unit is hundred picoseconds;
The compressed laser sequentially passes through a fourth reflecting mirror 12, a third beam shaper 13, a plurality of second single-pass amplifiers 14, a fifth reflecting mirror 15, a sixth reflecting mirror 16, a fourth beam shaper 17 and a plurality of four-way slat amplifiers 18 for amplification;
The amplified laser beam passes through the seventh reflecting mirror 19, the fifth beam shaper 20, and the frequency multiplier 21 to generate laser beam with a third frequency (ω H), and finally, the laser beam is output through the beam splitter 22.
The first beam shaper 5, the second beam shaper 9, the third beam shaper 13, the fourth beam shaper 17 and the fifth beam shaper 20 are used for adjusting the divergence angle and the caliber of the light beam, and are composed of a single optical lens or an optical lens group.
In the specific implementation, the first mirror 4, the second mirror 7, the third mirror 8, the fourth mirror 12, the fifth mirror 15, the sixth mirror 16, and the seventh mirror 19 are all plane mirrors, and are highly reflective to the seed light of the first frequency. The spectroscope 22 is coated with an antireflection film for the second frequency (ω s) laser light and a total reflection film for the third frequency (ω H) laser light.
Referring to fig. 2, each of the first optical isolator 2 and the second optical isolator 10 is composed of a first polarizer 2-1, a faraday rotator 2-2, and a first half-wave plate 2-3; the incident seed light passes through the first optical isolator 2 and the second optical isolator 10 in one direction, and the light which is transmitted reversely deflects and exits when passing through the first polarizer 2-1 due to the change of the polarization state, so that the seed light cannot pass through the first optical isolator 2 and the second optical isolator 10, and further the seed laser 1 is protected.
Referring to fig. 3, the dual-pass amplifier 3 is composed of a second polarizer 3-1, a first side pump block 3-2, a first quarter wave plate 3-3 and a zero degree total reflection mirror 3-4; the first quarter-wave plate 3-3 is used for changing the polarization state of seed light; the zero-degree total reflection mirror 3-4 is plated with a total reflection film for the first frequency seed light and forms an included angle of 90 degrees with the incidence direction of the laser so as to realize total reflection for the first frequency seed light; the seed light with the first frequency, which is incident to the dual-pass amplifier 3, is in a horizontal polarization state, is transmitted into the second polarizer 3-1, is amplified through the first side pump module 3-2, is changed into elliptical polarized light through the first quarter wave plate 3-3, then is subjected to total reflection in the zero-degree total reflection mirror 3-4, is changed into a vertical polarization state through the first quarter wave plate 3-3, is amplified again through the first side pump module 3-2 for the second time, and finally, the seed light which is amplified twice and is changed into the vertical polarization state is reflected out of the dual-pass amplifier 3 through the second polarizer 3-1, so that the whole dual-pass amplification process is completed.
Referring to fig. 4, the first single-pass amplifier 6 is composed of a second side pump module 6-1, a first 90 ° quartz rotor 6-2, and a third side pump module 6-3; the first 90 ° quartz rotor 6-2 is used to rotate the polarization direction of the seed light by 90 ° (other values are possible in practice, and the embodiment of the present invention is not limited thereto) to compensate for some negative thermal effects generated during the amplification process.
Referring to fig. 5, the sbs pulse compressor 11 is composed of a third polarizer 11-1, a second quarter-wave plate 11-2, a first focusing lens 11-3, and a plurality of brillouin media 11-4; the second quarter wave plate 11-2 is used for changing the polarization state of the laser after pulse compression; the first focusing lens 11-3 focuses the incident seed light into the brillouin medium 11-4; the first frequency seed light incident to the SBS pulse compressor 11 is in a horizontal polarization state, is transmitted into the third polarizer 11-1, is changed into elliptical polarized light through the second quarter wave plate 11-2, is focused into the Brillouin medium 11-4 through the first focusing lens 11-3 to generate second frequency laser, and after the second frequency laser is subjected to backward scattering and pulse compression, the second frequency laser is changed into a vertical polarization state through the first focusing lens 11-3, is changed into a vertical polarization state through the second quarter wave plate 11-2, and finally the second frequency laser subjected to pulse compression is reflected out of the SBS pulse compressor 11 through the third polarizer 11-1.
Referring to fig. 6, the second single pass amplifier 14 is composed of a fourth side pump module 14-1, a second 90 ° quartz rotor 14-2, a second focusing lens 14-3, a first vacuum tube 14-4 (a first aperture stop 14-5 is disposed in the first vacuum tube 14-4), a third focusing lens 14-6, a fifth side pump module 14-7, a second half wave plate 14-8, and a fourth polarizer 14-9; the second focusing lens 14-3, the first vacuum tube 14-4, the first small aperture diaphragm 14-5 and the third focusing lens 14-6 together form a spatial filter for eliminating the spontaneous emission Amplification (ASE) effect generated in the amplification process; the second half wave plate 14-8 and the fourth polarizer 14-9 are combined to control the laser output energy without changing the polarization state of the laser.
Referring to fig. 7, the four-way slab amplifier 18 is composed of a fifth polarizer 18-1, a slab gain medium 18-2, an eighth mirror 18-3, a sixth beam shaper 18-4, a ninth mirror 18-5, a tenth mirror 18-6, a seventh beam shaper 18-7, a third quarter wave plate 18-8, an eleventh mirror 18-9, a fourth focusing lens 18-10, a second vacuum tube 18-11, a second aperture stop 18-12, a fifth focusing lens 18-13, and a third half wave plate 18-14; the sixth beam shaper 18-4 and the seventh beam shaper 18-7 are composed of a single optical lens or an optical lens group, and are used for shaping the amplified seed beam to reduce negative effects such as reduced amplification efficiency caused by beam divergence; the third quarter wave plate 18-8 is used for changing the polarization state of the laser in the amplifying process; the eleventh reflecting mirror 18-9 is plated with a total reflection film for the laser of the second frequency, and forms an included angle of 90 degrees with the incidence direction of the laser, so that the total reflection of the laser of the second frequency is realized; the second frequency laser light incident to the four-way slab amplifier 18 is in a horizontal polarization state, is transmitted into the fifth polarizer 18-1, passes through the slab gain medium 18-2 for the first time (first amplification), passes through the eighth reflector 18-3, the sixth beam shaper 18-4 and the ninth reflector 18-5 for the second time (second amplification), passes through the slab gain medium 18-2 through the tenth reflector 18-6 and the seventh beam shaper 18-7, passes through the third quarter wave plate 18-8 to become elliptically polarized light, is totally reflected at the eleventh reflector 18-9, passes through the third quarter wave plate 18-8 to become vertically polarized state, passes through the seventh beam shaper 18-7 and the tenth reflector 18-6 again, passes through the slab gain medium 18-2 for the third time (third amplification), passes through the ninth reflector 18-5, the sixth beam shaper 18-4 and the eighth reflector 18-3 in sequence, passes through the fourth slab gain medium 18-2 for the fourth amplification (fourth amplification), passes through the fourth reflector 18-2 to become vertically polarized state after the fourth amplification, and passes through the fourth quarter wave plate 18-8 to become vertically polarized state after the fourth laser light passes through the fourth reflector 18-1; the fourth focusing lens 18-10, the second vacuum tube 18-11 (wherein the second vacuum tube 18-11 is internally provided with a second small aperture diaphragm 18-12), the second small aperture diaphragm 18-12 and the fifth focusing lens 18-13 together form a spatial filter, which is used for eliminating ASE effect generated in the amplifying process and improving the light beam quality; the third half wave plate 18-14 is used for controlling the polarization state of the laser, so that the multi-stage coupling four-way amplification is facilitated, and the deflection and the emission of the amplified laser are controlled.
Referring to fig. 8, a plurality of four-way slab amplifiers 18 may be connected in series to amplify the second frequency (ω s) laser light according to power requirements. In practical application, the gain media of the two-pass amplifier 3, the first single-pass amplifier 6 and the second single-pass amplifier 14 are the same as those of the four-way slat amplifier 18 (such as Nd: YAG), wherein the end surfaces of the gain media of the two-pass amplifier 3 and the first single-pass amplifier 6 are coated with a dielectric film for anti-reflection of seed light of a first frequency (omega p), the end surfaces of the gain media of the second single-pass amplifier 14 and the four-way slat amplifier 18 are coated with a dielectric film for anti-reflection of laser of a second frequency (omega s), and the number of the second single-pass amplifier 14 can be increased or decreased according to power requirements; the SBS pulse compressor 11 adopts a mode that a plurality of solid SBS materials are connected in series, and the SBS medium can be fused quartz, caF 2 or sapphire crystals; the two end surfaces of the slat gain medium 18-2 have a certain end surface cutting angle alpha (45 degrees) to improve the energy utilization rate; the frequency multiplier 21 may be a potassium titanyl phosphate (KTP) or lithium triborate (LBO) crystal, both ends of which are coated with an antireflection film for the second frequency (ω s) laser light and the third frequency (ω H) laser light generated after frequency multiplication.
The brillouin shift of the brillouin medium 11-4 is ω Ω, the second frequency ω s＝ωp-ωΩ, wherein the brillouin shift ω Ω is much smaller than the first frequency ω p, the second frequency ω s, respectively, and the third frequency ω H＝2ωs.
The embodiment of the invention does not limit the model of other devices except the model of each device,
As long as the device is capable of performing the above functions.
Those skilled in the art will appreciate that the drawings are schematic representations of only one preferred embodiment, and that the above-described embodiment numbers are merely for illustration purposes and do not represent advantages or disadvantages of the embodiments.
The foregoing description of the preferred embodiments of the invention is not intended to limit the invention to the precise form disclosed, and any such modifications, equivalents, and alternatives falling within the spirit and scope of the invention are intended to be included within the scope of the invention.
Claims (6)
1. A high power high repetition rate hundred picoseconds laser, said laser comprising:
The seed laser emits seed light with first frequency, the seed light passes through a first optical isolator and then enters a double-pass amplifier to be amplified, and the seed light sequentially passes through a first reflector, a first beam shaper, a first single-pass amplifier, a second reflector, a third reflector, a second beam shaper and a second optical isolator and then enters an SBS pulse compressor to compress the seed light with the first frequency to laser with second frequency, wherein the SBS pulse compressor consists of a third polarizer, a second quarter wave plate, a first focusing lens and a plurality of Brillouin media;
the second frequency laser sequentially passes through a fourth reflector, a third beam shaper, a plurality of second single-pass amplifiers, a fifth reflector, a sixth reflector, a fourth beam shaper and a plurality of four-way slat amplifiers for laser amplification;
the amplified laser passes through a seventh reflecting mirror, a fifth beam shaper and a frequency multiplier to generate third-frequency laser, and finally, the third-frequency laser is output through a spectroscope;
The first optical isolator and the second optical isolator are both composed of a first polarizer, a Faraday rotator and a first half wave plate, so that incident seed light passes through the first polarizer unidirectionally, and reversely transmitted light deflects and exits when passing through the first polarizer due to the change of polarization state.
2. The high power high repetition rate hundred picosecond laser of claim 1, wherein the dual pass amplifier is comprised of a second polarizer, a first side pump block, a first quarter wave plate, and a zero degree total reflection mirror;
the first quarter wave plate is used for changing the polarization state of the seed light; the zero-degree total reflection mirror is plated with a total reflection film for the first frequency seed light, and forms an included angle of 90 degrees with the incidence direction of the first frequency seed light, so that total reflection is realized.
3. The high power high repetition rate hundred picosecond laser of claim 1, wherein the first single pass amplifier is comprised of a second side pump module, a first 90 ° quartz rotor, and a third side pump module.
4. The high power high repetition rate hundred picosecond laser of claim 1, wherein the second quarter wave plate is configured to change a polarization state of the laser after pulse compression; the first focusing lens focuses the incident seed light into the Brillouin medium; the first frequency seed light is in a horizontal polarization state, is transmitted into a third polarizer, is changed into elliptical polarized light through a second quarter wave plate, is focused into a Brillouin medium through a first focusing lens to generate second frequency laser, and is changed into a vertical polarization state through the first focusing lens and the second quarter wave plate after being subjected to backward scattering and pulse compression, and finally the compressed second frequency laser is reflected out of an SBS pulse compressor through the third polarizer.
5. The high power high repetition rate hundred picosecond laser of claim 1, wherein the second single pass amplifier is comprised of a fourth side pump module, a second 90 ° quartz rotor, a second focusing lens, a first vacuum tube, a third focusing lens, a fifth side pump module, a second half wave plate, and a fourth polarizer, wherein a first aperture stop is disposed within the first vacuum tube;
The second focusing lens, the first vacuum tube, the first aperture diaphragm and the third focusing lens form a spatial filter together, and the spatial filter is used for eliminating the spontaneous radiation amplifying effect generated in the amplifying process; the second half wave plate and the fourth polarizer are combined to control the laser output energy without changing the polarization state of the laser.
6. The high power high repetition rate hundred picosecond laser of claim 1, wherein the four-way slab amplifier is comprised of a fifth polarizer, a slab gain medium, an eighth mirror, a sixth beam shaper, a ninth mirror, a tenth mirror, a seventh beam shaper, a third quarter wave plate, an eleventh mirror, a fourth focusing lens, a second vacuum tube, a fifth focusing lens, a third half wave plate, wherein a second aperture stop is disposed within the second vacuum tube;
The sixth beam shaper and the seventh beam shaper are composed of a single optical lens or an optical lens group and are used for shaping the amplified seed beam to reduce the negative influence of reducing the amplifying efficiency caused by beam divergence; the third quarter wave plate is used for changing the polarization state of laser in the amplifying process; the eleventh reflecting mirror is plated with a total reflection film for the second-frequency laser and forms an included angle of 90 degrees with the incidence direction of the second laser, so that the total reflection of the second-frequency laser is realized.
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| CN114498257A (en) * | 2021-12-09 | 2022-05-13 | 中国电子科技集团公司第五十三研究所 | A four-pass slat laser amplification system |
| CN114552344B (en) * | 2022-02-27 | 2024-11-19 | 北京工业大学 | Fiber-solid hybrid picosecond laser amplifier with high energy and high beam quality |
| CN118472770B (en) * | 2024-07-10 | 2024-09-17 | 北京卓镭激光技术有限公司 | Picosecond laser |
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| CN105305221A (en) * | 2015-11-25 | 2016-02-03 | 吕志伟 | Solid laser with adjustable pulse width from hundred picoseconds to nanosecond |
| CN212304188U (en) * | 2020-07-10 | 2021-01-05 | 河北工业大学 | A hundred picosecond laser |
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| CN105305221A (en) * | 2015-11-25 | 2016-02-03 | 吕志伟 | Solid laser with adjustable pulse width from hundred picoseconds to nanosecond |
| CN212304188U (en) * | 2020-07-10 | 2021-01-05 | 河北工业大学 | A hundred picosecond laser |
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