CN111656540A - semiconductor device - Google Patents
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Abstract
Description
技术领域technical field
本发明涉及半导体装置。The present invention relates to semiconductor devices.
背景技术Background technique
一直以来,使用于光学式编码器等中的受发光元件采用在设置受光元件的芯片上搭载发光元件的结构。受发光元件在配置于受发光单元的外部的被测量体上反射来自发光元件的光,通过在受光元件中接收该反射光而传递信号。该结构由于是在受光元件上层叠发光元件的结构,因此受发光元件的厚度变厚。在受发光元件的内部具有反射面类型的光耦合器中,已知在受光元件的大致中央部设置发光元件收纳孔并在该发光元件收纳孔内配置发光元件的结构。在该结构中,在发光元件收纳孔的周侧面设置反射层,在反射层中反射来自发光元件的光。根据该结构,由于发光元件配置于设置于受光元件上的发光元件收纳孔内,因此能够使受发光元件的厚度变薄(例如参照专利文献1)。Conventionally, a light-emitting element used in an optical encoder or the like has been adopted a structure in which a light-emitting element is mounted on a chip on which the light-receiving element is provided. The light-receiving and light-emitting element reflects light from the light-emitting element on a measured object disposed outside the light-receiving and light-emitting unit, and transmits a signal by receiving the reflected light in the light-receiving element. In this structure, since the light-emitting element is stacked on the light-receiving element, the thickness of the light-receiving and light-emitting element is increased. In a photocoupler of a type having a reflection surface inside the light-receiving element, a light-emitting element accommodating hole is provided substantially in the center of the light-receiving element, and the light emitting element is arranged in the light emitting element accommodating hole. In this structure, the reflective layer is provided on the peripheral surface of the light-emitting element housing hole, and the light from the light-emitting element is reflected in the reflective layer. According to this structure, since the light-emitting element is arranged in the light-emitting element housing hole provided in the light-receiving element, the thickness of the light-receiving element can be reduced (for example, refer to Patent Document 1).
现有技术文献prior art literature
专利文献Patent Literature
专利文献1:日本国实开昭58-148954号公报Patent Document 1: Japanese Patent Application Publication No. Sho 58-148954
发明内容SUMMARY OF THE INVENTION
发明所要解决的课题The problem to be solved by the invention
在上述专利文献1中记载的受发光单元中,由于在设置于发光元件收纳孔的周侧面的发射层中反射发光元件的光,因此需要使受光元件的厚度比发光元件的厚度厚,换而言之,将发光元件的发光面配置于比受光元件的受光面高的位置,提高反射率。即,受光元件的受光面与发光元件的发光面的高度方向的位置不同。因此,从受光元件的受光面至被测量体的距离与从发光元件的发光面至被测量体的距离不同,会出现不能得到高检测灵敏度的问题。In the light-receiving and light-emitting unit described in the above-mentioned
用于解决课题的方案solutions to problems
根据第一方案,半导体装置具有在预定的区域形成孔的受光元件、设置于上述受光元件的上述孔内的发光元件以及覆盖上述受光元件的周缘部的第一树脂,上述受光元件的表面与上述发光元件的表面实质上位于同一平面上。According to the first aspect, the semiconductor device includes a light-receiving element having a hole formed in a predetermined region, a light-emitting element provided in the hole of the light-receiving element, and a first resin covering a peripheral portion of the light-receiving element, the surface of the light-receiving element being the same as the surface of the light-receiving element. The surfaces of the light-emitting elements are substantially on the same plane.
根据第二方案,在第一方案的半导体装置中,还具备保持上述发光元件的基板、从上述基板分离而形成的引线端子、连接上述引线端子和上述受光元件连接的第一金属丝,上述第一树脂优选密封上述基板的周缘部、上述引线端子的一部分以及上述第一金属丝。According to a second aspect, the semiconductor device of the first aspect further includes a substrate holding the light-emitting element, lead terminals formed separately from the substrate, and first wires connecting the lead terminals and the light-receiving element, the first wire A resin preferably seals the peripheral portion of the substrate, a part of the lead terminal, and the first wire.
根据第三方案,在第二方案的半导体装置中,上述基板优选具有设置上述发光元件的发光元件收纳部,在上述受光元件的上述孔内配置上述发光元件收纳部。According to a third aspect, in the semiconductor device of the second aspect, the substrate preferably includes a light-emitting element housing portion in which the light-emitting element is provided, and the light-emitting element housing portion is arranged in the hole of the light-receiving element.
根据第四方案,在第三方案的半导体装置中,上述受光元件具有第一受光部和第二受光部、连接上述第一受光部和上述第二受光部并比上述第一受光部以及上述第二受光部薄壁的连接部,上述受光元件的上述孔优选形成于上述连接部。According to a fourth aspect, in the semiconductor device of the third aspect, the light-receiving element includes a first light-receiving portion and a second light-receiving portion, and connects the first light-receiving portion and the second light-receiving portion and is larger than the first light-receiving portion and the second light-receiving portion. It is preferable that the connection portion of the two light-receiving portions is thin, and the hole of the light-receiving element is formed in the connection portion.
根据第五方案,在第四方案的半导体装置中,上述基板优选具有收纳上述受光元件的上述连接部的凹部,向收纳了上述受光元件的上述凹部内填充第二树脂。According to a fifth aspect, in the semiconductor device of the fourth aspect, it is preferable that the substrate has a concave portion that accommodates the connection portion of the light-receiving element, and the second resin is filled in the concave portion that accommodates the light-receiving element.
根据第六方案,在第五方案的半导体装置中,优选还向上述基板与上述受光元件之间的缝隙内填充上述第二树脂。According to a sixth aspect, in the semiconductor device of the fifth aspect, preferably, the gap between the substrate and the light-receiving element is further filled with the second resin.
根据第七方案,在第一方案的半导体装置中,优选具有设置于受光元件的周围的引线端子、连接上述引线端子和上述发光元件的第一金属丝、连接上述发光元件和上述受光元件的第二金属丝、密封上述受光元件、上述发光元件、上述引线端子的一部分以及上述第一金属丝的第二树脂。According to a seventh aspect, the semiconductor device of the first aspect preferably includes lead terminals provided around the light-receiving element, a first wire connecting the lead terminals and the light-emitting element, and a first wire connecting the light-emitting element and the light-receiving element. Two wires, a second resin sealing the light-receiving element, the light-emitting element, a part of the lead terminal, and the first wire.
根据第八方案,在第一方案的半导体装置中,还具备保持上述受光元件以及上述发光元件的基板、从上述基板分离而形成的引线端子、连接上述引线端子和上述受光元件的第一金属丝、连接上述发光元件和上述受光元件的第二金属丝,上述第一树脂优选密封上述引线端子的一部分以及上述第一金属丝。According to an eighth aspect, the semiconductor device of the first aspect further includes a substrate holding the light-receiving element and the light-emitting element, lead terminals separated from the substrate, and a first wire connecting the lead terminals and the light-receiving element. and a second wire connecting the light-emitting element and the light-receiving element, the first resin preferably seals a part of the lead terminal and the first wire.
根据第九方案,在第一至第八任一方案的半导体装置中,上述受光元件的表面与上述发光元件的表面的高度差优选为10μm以内。According to a ninth aspect, in the semiconductor device of any one of the first to eighth aspects, a height difference between the surface of the light-receiving element and the surface of the light-emitting element is preferably within 10 μm.
发明效果Invention effect
根据本发明,通过使受光元件的表面、设置于形成于受光元件的孔中的发光元件表面实质上位于同一平面上而使物体以及受光元件的距离与物体以及发光元件的距离平齐,能够得到高检测灵敏度。According to the present invention, by making the surface of the light-receiving element and the surface of the light-emitting element provided in the hole formed in the light-receiving element substantially on the same plane and making the distance between the object and the light-receiving element equal to the distance between the object and the light-emitting element, it is possible to obtain High detection sensitivity.
附图说明Description of drawings
图1是示意地表示本发明的第一实施方式的半导体装置的形状的图。FIG. 1 is a diagram schematically showing the shape of the semiconductor device according to the first embodiment of the present invention.
图2是示意地表示第一实施方式的半导体装置的形状的图。FIG. 2 is a diagram schematically showing the shape of the semiconductor device according to the first embodiment.
图3是示意地表示第一实施方式的受光芯片的形状的图。FIG. 3 is a diagram schematically showing the shape of the light-receiving chip of the first embodiment.
图4是说明第一实施方式的半导体装置的制造方法的图。4 is a diagram illustrating a method of manufacturing the semiconductor device according to the first embodiment.
图5是说明第一实施方式的半导体装置的制造方法的图。5 is a diagram illustrating a method of manufacturing the semiconductor device according to the first embodiment.
图6是示意地表示本发明的第二实施方式的半导体装置的形状的图。6 is a diagram schematically showing a shape of a semiconductor device according to a second embodiment of the present invention.
图7是说明第二实施方式的半导体装置的制造方法的图。FIG. 7 is a diagram illustrating a method of manufacturing the semiconductor device according to the second embodiment.
图8是说明第二实施方式的半导体装置的制造方法的图。FIG. 8 is a diagram illustrating a method of manufacturing the semiconductor device according to the second embodiment.
图9是示意地表示本发明的第三实施方式的半导体装置的形状的图。9 is a diagram schematically showing a shape of a semiconductor device according to a third embodiment of the present invention.
图10是说明第三实施方式的半导体装置的制造方法的图。10 is a diagram illustrating a method of manufacturing a semiconductor device according to a third embodiment.
图11是说明第三实施方式的半导体装置的制造方法的图。11 is a diagram illustrating a method of manufacturing a semiconductor device according to a third embodiment.
具体实施方式Detailed ways
以下,参照附图关于用于实施本发明的方式进行说明。Hereinafter, embodiments for implementing the present invention will be described with reference to the accompanying drawings.
-第一实施方式--First Embodiment-
图1~图3是示意地表示作为本发明的第一实施方式的半导体装置的光耦合器1的一例的图。图1(a)是上面立体图,图1(b)是从图1(a)中除去树脂的情况的上面立体图,图2(a)是图1(a)中的A-A’以及B-B’剖视图,图2(b)是上面俯视图,图2(c)是背面俯视图。但是,在图2(a)中,A’—B剖面的区域省略图示。图3是后述的受光芯片的立体图。并且,为了便于说明,使用由如图所示设定的X轴、Y轴、Z轴构成的坐标系。1 to 3 are diagrams schematically showing an example of the
另外,作为半导体装置举例说明光耦合器1进行以下的说明,但作为半导体装置并不限于光耦合器1,也可以是光电传感器、标记传感器等。In addition, the
光耦合器1是一体构成具有发光元件的发光芯片30以及具有受光元件的受光芯片20的平板型光耦合器。在图1中,发光元件的发光面以及受光元件的受光面都是上面(Z轴方向+侧)。本实施方式的光耦合器1适用于光学式编码器用,从发光元件发出的光与反射面的垂直方向、即Z轴方向大致平行地射出。被测量体(未图示)配置于Z轴方向中的光耦合器1的外部,光耦合器1以利用受光元件接收从被测量体反射的光的方式构成。The
光耦合器1具备基板10、发光芯片30、受光芯片20、引线端子101、树脂51。The
受光芯片20在内部具有多个受光元件(光电二极管:PD),在俯视中具有矩形形状。并且,受光芯片20既可以为将PD以及晶体管组合的光电晶体管的构成,也可以为含有PD以及构成该PD驱动用电路的集成电路的PDIC的构成。如图3所示,在受光芯片20的上面的包括中央的预定区域形成孔201。在该孔201内收纳后述的基板10的中央凹部103(参照图2)。另外,受光芯片20包括孔201,在沿图的X轴方向的区域形成薄壁的连接部202(参照图3)。受光芯片20夹持连接部202而具备第一受光部203(图的Y轴方向+侧)、第二受光部204(图的Y轴方向-侧)。连接部202的上面(Z轴方向+侧的面)从第一受光部203的上面以及第二受光部204的上面凹陷而形成。即,连接部202的上面在Z轴方向+侧位于比第一受光部203的上面以及第二受光部204的上面低的位置。The light-receiving
如图2所示,基板10具有例如由引线架等构成且设置于上述受光芯片20的连接部202的上部的中央部102。在基板10的中央部102上与形成受光芯片20的孔201的区域对应地形成中央凹部(发光元件收纳部)103。如上述,中央凹部103被收纳于受光芯片20的孔201内。引线端子101沿受光芯片20的第一受光部203以及第二受光部204的外周而排列。后述,引线端子101当初与基板10一起作为引线架而一体化形成,通过截断作为与引线架的连结部的引线部而从基板10分离地形成。中央部102的上面(Z轴方向+侧的面)与第一受光部203的上面以及第二受光部204的上面大致为同一面。受光芯片20的第一受光部203与第二受光部204通过接合线21与引线端子101连接。基板10的中央凹部103的凹部的底面103a以成为比中央部102的上面低的位置(图的Z轴方向-侧)的方式形成中央凹部103。在中央凹部103的底面103a上设置发光芯片30。As shown in FIG. 2 , the
发光芯片30具有发光元件,设置在形成于上述基板10的中央部102的中央凹部103的底面103a上。发光芯片30例如通过银焊丝、焊锡等的导电性接合剂电接合于基板10。由此,发光芯片30的一个电极如阴极电极连接于基板10。发光芯片30的上面即发光面、受光芯片20的上面即受光面实质性地位于相同高度、即在Z轴方向上实质性地位于相同位置。具体的说,发光芯片30的发光面与受光芯片20的受光面的高度差优选为30μm以下的范围,更优选为10μm以下的范围。在本说明书中,发光芯片30的上面与受光芯片20的上面的Z轴方向的位置差为使30μm以下的范围为实质性相同的范围。换而言之,以基板10的中央凹部103的底面103a为比中央部102的上面低发光芯片30的Z轴方向的大小的量的位置的方式形成中央凹部103。The light-emitting
发光芯片30的其他电极、如正极电极通过接合线31与受光芯片20(在图中所示的示例中为第一受光部203)连接。The other electrodes of the light-emitting
如图2(a)所示,基板10的中央部102在下面侧、即Z轴方向-侧上具有凹部102a。在基板10的中央部102的凹部102a内收纳受光芯片20的连接部202。受光芯片20的连接部202在被收纳于基板10的中央部102的凹部120a内的状态下被树脂41密封。在光耦合器1的上部(Z轴方向+侧)通过树脂51密封受光芯片20的周缘部、基板10的周缘部的引线端子101的一部分(即去除背面(Z轴-侧的面)的部分)、接合线21。并且,树脂41以及树脂51例如是如环氧树脂那样具有遮光性的不透明的树脂。As shown in FIG.2(a), the
关于上述的光耦合器1的制造方法,参照图4、图5进行说明。图4、图5与图2(a)相同是图1(a)中的A-A’以及B-B’剖视图,在该情况下,A’—B剖面的区域也省略图示。The manufacturing method of the above-mentioned
如图4(a)所示,在金属、背带等的薄支撑基体60上安装形成有多个引线端子101、中央部102、中央凹部103的基板10、受光芯片20。并且,形成基板10的母材是具有如能得到多个光耦合器1的大小的材料,在附图中仅表示一个光耦合器1的区域以及其周围。受光芯片20以连接部202配置于基板10的中央部102的凹部102a内的方式安装。此时,基板10的中央部102的凹部102a的Z轴方向-侧面的高度在与受光芯片20的连接部的Z轴方向+侧面之间以形成缝隙g的方式而预先设定。并且,基板10预先准备可形成中央凹部103的厚度的厚板状的母材,通过蚀刻法等去除母材的一部分而形成凹部102a以及中央凹部103。另外,在该状态下,基板10的中央部102以及多个引线端子101作为在基板10的外周具有机架部的引线架(未图示)而一体地形成,中央部102以及各引线端子101通过形成于引线架的引线部102b而连结于该引线架。As shown in FIG. 4( a ), the
以覆盖受光芯片20与基板10的方式利用树脂41密封。此时,受光芯片20的连接部202通过向设置于基板10的中央部102的凹部102a内填充的树脂,也包含与基板10的中央部102之间的缝隙部分地密封全周侧面。在使树脂41硬化之后,剥离去除支撑基体60而成为中间制品1A(图4(b))。并且,可以通过使用于支撑基体60的金属溶解去除。使中间制品1A的上下方向反转,利用接合线21对受光芯片20与引线端子101进行接合连接(图4(c))。以覆盖受光芯片20的周缘部、基板10的周缘部的引线端子101的一部分(即去除背面(Z轴-侧面)的部分)、接合线21的方式利用树脂51密封(图4(d))。It is sealed with
在形成于基板10的中央部102的中央凹部103的底面103a上通过使用如银焊丝等粘接剂的小片接合连接发光芯片30(图5(a))。用接合线31粘接连接发光芯片30的电极、受光芯片20的电极(图5(b))。然后,在图5(c)的单点划线表示的位置上与树脂51一起裁断基板10的中央部102以及各引线端子101而碎片化。由此,得到图1所示的光耦合器1。The light-emitting
根据上述的第一实施方式能得到以下的作用效果。According to the above-described first embodiment, the following effects can be obtained.
(1)光耦合器1具有在预定的区域中形成孔201的受光芯片20、设置于引线架的中央凹部103的发光芯片30、覆盖受光芯片20的周缘部的树脂51,受光芯片20的表面与发光芯片30的表面实质上位于相同平面上。由此,能够使从发光芯片30射出的光在物体上反射之前的移动距离、在物体中反射的光射入受光芯片20之前的移动距离实质上相等。由此,提高检测精度,可实现传感器的高灵敏度。(1) The
另外,与在受光芯片上载置发光芯片并用接合线连接的情况相比较,由于能缩小Z轴方向的大小,因此能够实现光耦合器1的小型化、薄型化。In addition, since the size in the Z-axis direction can be reduced compared to the case where the light-emitting chip is mounted on the light-receiving chip and connected by bonding wires, the size and thickness of the
另外,在日本实开昭58-148954号公报中公开的现有技术中,将形成于晶体管的主面上的孔部的侧面与底面所呈的角度规定为预定的值,在受光元件中也接收由侧面反射的光。可是,通过硅形成受光元件,通过硅的异方性蚀刻法形成受光元件的发光元件收纳孔。因此,由于成为反射面的周侧面相对于底面所呈的倾斜角被定义为53.7°的预定角度,因此除特定用途以外难以使用而通用性低。相对于此,本实施方式由于不是用受光芯片20接收由构造体的侧面反射的光的结构,因此在特定用户以外也可使用,可提供通用性高的半导体装置。In addition, in the prior art disclosed in Japanese Unexamined Patent Application Publication No. Sho 58-148954, the angle formed by the side surface and the bottom surface of the hole formed on the main surface of the transistor is defined as a predetermined value, and the light-receiving element is also Receives light reflected by the sides. However, the light-receiving element is formed of silicon, and the light-emitting element housing hole of the light-receiving element is formed by anisotropic etching of silicon. Therefore, since the inclination angle which the peripheral side surface which becomes the reflection surface makes with respect to the bottom surface is defined as a predetermined angle of 53.7°, it is difficult to use except for a specific use, and the versatility is low. On the other hand, since the light-receiving
(2)基板10具有作为设置发光芯片30的发光元件收纳部的中央凹部103,在受光芯片20的孔201中配置中央凹部103。由此,由于能够在基板10的中央凹部103上设置发光芯片30,因此能够提高散热性。(2) The
(3)受光芯片20具有第一受光部203与第二受光部204、连接第一受光部203与第二受光部204并相比于第一受光部203以及第二受光部204薄壁的连接部202,孔201设置于连接部202。由此,在使受光芯片20的表面与发光芯片30的表面实质上位于同一平面上的状态下,由于能够将发光芯片30设置在基板10上,因此能够实现检测精度的提高与散热性的提高。(3) The light-receiving
(4)基板10具有收纳受光芯片20的连接部202的凹部102a,向收纳连接部202的凹部102内填充树脂41。树脂41也向基板10与受光芯片20之间的缝隙g填充。由此,能够得到高的冲击性。(4) The
-第二实施方式--Second Embodiment-
关于本发明的第二实施方式的光耦合器进行说明。在以下的说明中,在与第一实施方式相同的构成元件中标注相同的符号,主要说明不同点。而且,关于未说明的方面与第一实施方式相同。A photocoupler according to a second embodiment of the present invention will be described. In the following description, the same reference numerals are assigned to the same constituent elements as those of the first embodiment, and the differences will be mainly described. Moreover, it is the same as that of 1st Embodiment about the point which is not demonstrated.
图6是例示本发明的第二实施方式的光耦合器1的图,图6(a)是剖视图,图6(b)是上面俯视图,图6(c)是背面俯视图。并且,图6(a)是图6(b)中的C-C’剖视图。6 is a view illustrating the
受光芯片20在俯视中具有矩形形状,在包括中央的预定区域中形成孔201。受光芯片20通过由引线架等构成的多个引线端子101与连接线21连接在光耦合器1的周缘部上。在孔201设置发光芯片30。由此,使发光芯片30的上面即发光面、受光芯片20的上面即受光面实质上处于相同的高度,即在Z轴方向上实质上处于相同位置。在第二实施方式中也与第一实施方式的情况相同,发光芯片30的发光面与受光芯片20的受光面的高度差优选为30μm以下的范围,更优选为10μm以下的范围。并且,在本实施方式中,尤其也可使发光芯片30的发光面与受光芯片20的受光面的高度差为数μm以下的范围。The light-receiving
发光芯片30通过接合线31与受光芯片20连接,通过接合线32与引线端子101连接。由此,发光芯片30的一个电极、如阴极电极与引线端子101电连接,另一电极、如正极电极电连接于受光芯片20。The light-emitting
在受光芯片20的孔201上设置发光芯片30的状态下,受光芯片20、引线端子101的一部分(即,除去背面(Z轴-侧的面)的部分)、发光芯片30与接合线32在光耦合器1的下部(Z轴方向-侧)通过树脂41密封。在光耦合器1的上部(Z轴方向+侧)中,通过树脂51密封受光芯片20的周缘部、引线端子101、接合线21。并且,树脂41以及树脂51是如环氧树脂那样具有遮光性的不透明的树脂。In the state where the light-emitting
关于上述第二实施方式的光耦合器1的制造方法,参照图7、图8进行说明。图7、图8与图6(a)相同,是图6(b)中的C-C’剖视图。The manufacturing method of the
如图7(a)所示,在支撑基体60上安装多个引线端子101、受光芯片20、发光芯片30。并且,形成引线端子101的母材是具有如能得到多个光耦合器1的大小的尺寸,在附图中仅表示作为一个光耦合器1的区域以及其周边。发光芯片30通过形成于受光芯片20的孔201而安装于支撑基体60上。另外,在该状态下,多个引线端子101作为在外周具有机架部的引线架(未图示)一体地形成,各引线端子101通过形成于引线架上的引线部102b连结于该引线架。As shown in FIG. 7( a ), a plurality of
利用接合线32接合连接发光芯片30与引线端子101(图7(b))。以覆盖受光芯片20、引线端子101的一部分(即,去除背面(Z轴方向-侧的面)的部分)、发光芯片30、接合线32的方式用树脂41密封,在树脂41硬化之后,剥离去除支撑基体60而成为中间制品1A(图7(c))。使中间制品1A的上下方向反转,用接合线21接合连接受光芯片20与引线端子101(图8(a))。以覆盖受光芯片20的周缘部、引线端子101、接合线21的方式用树脂51密封(图8(b))。利用接合线31接合连接发光芯片30的电极、受光芯片20的电极(图8(b))。The light-emitting
然后,在图8(c)中用单点划线表示的位置中,与树脂51一起裁断连接各引线端子101的引线部102b而碎片化。由此,能得到图6所示的光耦合器1。Then, at the position indicated by the one-dot chain line in FIG. 8( c ), the
根据上述的第二实施方式,除了通过第一实施方式得到的(1)的作用效果,还能得到以下的作用效果。According to the second embodiment described above, in addition to the effect (1) obtained by the first embodiment, the following effects can be obtained.
(1)受光芯片20、发光芯片30、引线端子101的一部分、接合线32通过树脂41从背面密封。由此,除受光芯片20与发光芯片30的上面以外都被树脂41、51覆盖,因此能得到高的耐冲击性。另外,由于引线端子101被树脂41、51以L字状密封,因此能够成为树脂耐碎形状。(1) The light-receiving
(2)如图7、图8所示,在制造时,由于在支撑基体60上安装受光芯片20的上面与发光芯片30的上面,因此能够以高精度使光耦合器1的受光芯片20的上面与发光芯片30的上面位于同一平面上。(2) As shown in FIGS. 7 and 8 , since the upper surface of the light-receiving
-第三实施方式--Third Embodiment-
关于本发明的第三实施方式的光耦合器进行说明。在以下的说明中,在与第一实施方式相同的构成元件中标注相同的符号,主要说明不同点。特别是关于不说明的方面与第一实施方式相同。A photocoupler according to a third embodiment of the present invention will be described. In the following description, the same reference numerals are assigned to the same constituent elements as those of the first embodiment, and the differences will be mainly described. In particular, it is the same as that of the first embodiment about the points that are not explained.
图9是例示本发明的第三实施方式的光耦合器1的图,图9(a)是剖视图,图9(b)是上面俯视图,图9(c)是背面俯视图。并且,图9(a)是图9(b)中的D-D’剖视图。9 is a view illustrating the
受光芯片20在俯视中具有矩形形状,在包括中央的预定区域中形成孔201。受光芯片20与发光芯片30安装于基板10。发光芯片30通过形成于受光芯片20的孔201安装在基板10上。由此,发光芯片30通过由如银焊丝、焊锡等的导电性接合剂接合于基板10,一个电极(如阴极电极)电连接于基板10。能够使发光芯片30的上面即发光面、受光芯片20的上面即受光面实质上处于同一高度,即在Z轴方向上实质上处于同一位置。即使在第三实施方式中也与第一实施方式相同,发光芯片30的发光面与受光芯片20的受光面的高度差优选为30μm以下的范围,更优选为10μm以下的范围。The light-receiving
发光芯片30的另一电极、如阳极电极通过接合线31与受光芯片20连接。The other electrode of the light-emitting
基板10例如由引线架构成,如上述具有安装受光芯片20与发光芯片30的安装部105、设置于周缘部的多个引线端子101。引线端子101与受光芯片20通过接合线21连接。The
受光芯片20、基板10的周缘部(即,安装部105的一部分与引线端子101的一部分(即,除去背面(Z轴-侧的面)的部分))、接合线21在光耦合器1的上部(Z轴方向+侧)被树脂51密封。并且,树脂51是如环氧树脂的具有遮光性的不透明的树脂。The light-receiving
关于上述第三实施方式的光耦合器1的制造方法,参照图10、图11进行说明。图10、图11与图9(a)相同,是图9(b)的D-D’剖视图。A method of manufacturing the
如图10(a)所示,在支撑基体60上安装形成有多个引线端子101、安装部105的基板10。并且,形成基板10的母材是具有如能得到多个光耦合器1的大小的尺寸,在图中仅表示为一个光耦合器1的区域以及其周围。在基板10的安装部105上通过使用如银焊丝等粘接剂的小片接合连接受光芯片20。As shown in FIG. 10( a ), the
利用接合线21接合连接受光芯片20与引线端子101(图10(b))。以覆盖受光芯片20、基板10的周缘部、接合线21的方式用树脂51密封,在树脂51硬化之后剥离去除支撑基体60(图10(c))。通过使用如银焊丝等的粘接剂的接合连接来穿过形成于受光芯片20上的孔201而将发光芯片30连接于基板10的安装部105(图11(a))。利用接合线31接合连接发光芯片30的电极、受光芯片20的电极(图11(a))。然后,在图11(b)中用单点划线表示的位置上,裁断树脂51而碎片化。由此,得到图9所示的光耦合器1。The light-receiving
根据上述的第三实施方式,除了由第一实施方式得到的(1)作用效果以外,还能得到以下的作用效果。According to the above-described third embodiment, in addition to the (1) function and effect obtained by the first embodiment, the following functions and effects can be obtained.
基板10具有保持受光芯片20与发光芯片30的安装部105。由此,由于能够在基板10上设置发光芯片30,因此能够提高散热性。The
只要不损害本发明的特征,本发明便不限于上述实施方式,关于在本发明的技术性思想范畴内所思考的其他实施方式也包含于本发明的范围内。The present invention is not limited to the above-described embodiments as long as the characteristics of the present invention are not impaired, and other embodiments considered within the scope of the technical idea of the present invention are also included in the scope of the present invention.
以下的优先权基础申请的公开内容作为引用文而引用至这里。The disclosures of the following priority basic applications are incorporated herein by reference.
日本国专利申请2018年第012842号(2018年1月29日申请)Japanese Patent Application No. 012842 of 2018 (filed on January 29, 2018)
符号说明Symbol Description
1—光耦合器,10—基板,20—受光芯片,21、31、32—接合线,30—发光芯片,41、51—树脂,101—引线端子,102—中央部,103—中央凹部,105—安装部,201—孔,202—凹部,203—第一受光部,204—第二受光部。1—optical coupler, 10—substrate, 20—light receiving chip, 21, 31, 32—bonding wire, 30—light emitting chip, 41, 51—resin, 101—lead terminal, 102—central part, 103—central concave part, 105—installation part, 201—hole, 202—concave part, 203—first light receiving part, 204—second light receiving part.
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06204508A (en) * | 1992-12-28 | 1994-07-22 | Canon Inc | Optical detector |
JP2001250978A (en) * | 2000-03-08 | 2001-09-14 | Sharp Corp | Optical coupling element |
JP2004063764A (en) * | 2002-07-29 | 2004-02-26 | Toshiba Corp | Optically coupled semiconductor device and manufacturing method thereof |
JP2005043192A (en) * | 2003-07-28 | 2005-02-17 | Olympus Corp | Optical encoder, its manufacturing method, and optical lens module |
JP3684823B2 (en) * | 1998-03-26 | 2005-08-17 | 松下電工株式会社 | Semiconductor relay |
JP2005283457A (en) * | 2004-03-30 | 2005-10-13 | Olympus Corp | Optical encoder and its manufacturing method |
CN101872761A (en) * | 2009-04-23 | 2010-10-27 | 欧姆龙株式会社 | Optical coupling device |
CN104396026A (en) * | 2012-06-20 | 2015-03-04 | 青井电子株式会社 | Light source-integrated optical sensor |
JP2015095584A (en) * | 2013-11-13 | 2015-05-18 | ローム株式会社 | Optical device and method of manufacturing optical device |
CN104916728A (en) * | 2014-03-14 | 2015-09-16 | 株式会社东芝 | Optical coupling device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6132535A (en) * | 1984-07-25 | 1986-02-15 | Sanyo Electric Co Ltd | Manufacture of sensor |
JP3573400B2 (en) * | 1997-07-16 | 2004-10-06 | シャープ株式会社 | Optical input device |
JP4812189B2 (en) * | 2001-06-15 | 2011-11-09 | オリンパス株式会社 | Optical detector |
EP1376960A1 (en) | 2002-06-29 | 2004-01-02 | Deutsche Thomson-Brandt Gmbh | Data link layer device with two transmission modes for a serial communication bus |
JP2005038956A (en) * | 2003-07-17 | 2005-02-10 | Matsushita Electric Ind Co Ltd | Optical component and manufacturing method thereof |
KR101069197B1 (en) * | 2009-09-25 | 2011-09-30 | 전자부품연구원 | Package module in which light emitting and light receiving elements are integrally formed |
EP2860497B2 (en) * | 2013-10-09 | 2019-04-10 | SICK STEGMANN GmbH | Optoelectronic sensor and method for manufacturing the same |
KR102455919B1 (en) * | 2014-07-25 | 2022-10-17 | 에이엠에스 센서스 싱가포르 피티이. 리미티드. | Optoelectronic modules including an image sensor having regions optically separated from one another |
-
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- 2018-12-21 KR KR1020207018716A patent/KR102459822B1/en active Active
- 2018-12-21 WO PCT/JP2018/047287 patent/WO2019146339A1/en active Application Filing
- 2018-12-21 CN CN201880087698.1A patent/CN111656540B/en active Active
-
2019
- 2019-01-28 TW TW108103065A patent/TWI785195B/en active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06204508A (en) * | 1992-12-28 | 1994-07-22 | Canon Inc | Optical detector |
JP3684823B2 (en) * | 1998-03-26 | 2005-08-17 | 松下電工株式会社 | Semiconductor relay |
JP2001250978A (en) * | 2000-03-08 | 2001-09-14 | Sharp Corp | Optical coupling element |
JP2004063764A (en) * | 2002-07-29 | 2004-02-26 | Toshiba Corp | Optically coupled semiconductor device and manufacturing method thereof |
JP2005043192A (en) * | 2003-07-28 | 2005-02-17 | Olympus Corp | Optical encoder, its manufacturing method, and optical lens module |
JP2005283457A (en) * | 2004-03-30 | 2005-10-13 | Olympus Corp | Optical encoder and its manufacturing method |
CN101872761A (en) * | 2009-04-23 | 2010-10-27 | 欧姆龙株式会社 | Optical coupling device |
CN104396026A (en) * | 2012-06-20 | 2015-03-04 | 青井电子株式会社 | Light source-integrated optical sensor |
JP2015095584A (en) * | 2013-11-13 | 2015-05-18 | ローム株式会社 | Optical device and method of manufacturing optical device |
CN104916728A (en) * | 2014-03-14 | 2015-09-16 | 株式会社东芝 | Optical coupling device |
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