CN111606560B - 一种无碱铝硼硅酸盐玻璃 - Google Patents
一种无碱铝硼硅酸盐玻璃 Download PDFInfo
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- 239000005407 aluminoborosilicate glass Substances 0.000 title claims abstract description 17
- 229910052796 boron Inorganic materials 0.000 claims abstract description 32
- 239000002994 raw material Substances 0.000 claims abstract description 8
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims abstract description 6
- 239000011521 glass Substances 0.000 claims description 85
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 60
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 32
- 229910052593 corundum Inorganic materials 0.000 claims description 32
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 32
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 31
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 31
- 239000000203 mixture Substances 0.000 claims description 21
- 229910052681 coesite Inorganic materials 0.000 claims description 19
- 229910052906 cristobalite Inorganic materials 0.000 claims description 19
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 229910052682 stishovite Inorganic materials 0.000 claims description 19
- 229910052905 tridymite Inorganic materials 0.000 claims description 19
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 18
- 238000002844 melting Methods 0.000 claims description 16
- 230000008018 melting Effects 0.000 claims description 16
- 239000002131 composite material Substances 0.000 claims description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 abstract 3
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 2
- 229910006404 SnO 2 Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 22
- 238000004519 manufacturing process Methods 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 5
- 150000001342 alkaline earth metals Chemical class 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000004031 devitrification Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 239000008395 clarifying agent Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000010309 melting process Methods 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B18/00—Shaping glass in contact with the surface of a liquid
- C03B18/02—Forming sheets
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/411—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by materials, geometry or structure of the substrates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Nonlinear Science (AREA)
- Ceramic Engineering (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
Abstract
Description
组分wt% | 实施例1 | 实施例2 | 实施例3 | 实施例4 | 实施例5 | 实施例6 | 实施例7 | 实施例8 |
SiO<sub>2</sub> | 60.15 | 60.26 | 60.39 | 60.53 | 61.45 | 61.57 | 61.64 | 61.89 |
Al<sub>2</sub>O<sub>3</sub> | 17.59 | 16.50 | 17.01 | 16.42 | 16.56 | 16.22 | 18.00 | 16.44 |
B<sub>2</sub>O<sub>3</sub> | 8.94 | 9.81 | 9.92 | 8.53 | 8.81 | 9.13 | 8.50 | 8.73 |
MgO | 1.86 | 2.53 | 1.26 | 2.57 | 2.78 | 2.04 | 2.48 | 3.47 |
CaO | 4.11 | 3.38 | 6.43 | 5.56 | 6.19 | 5.35 | 3.56 | 3.25 |
SrO | 1.42 | 1.53 | 2.37 | 3.08 | 1.19 | 2.30 | 2.32 | 4.32 |
ZrO<sub>2</sub> | 0.50 | 0.80 | 1.00 | 1.71 | 0.71 | 1.51 | 1.36 | 0.79 |
P<sub>2</sub>O<sub>5</sub> | 4.93 | 4.89 | 1.12 | 1.10 | 2.20 | 1.75 | 1.99 | 1.01 |
SnO<sub>2</sub> | 0.50 | 0.30 | 0.50 | 0.50 | 0.11 | 0.13 | 0.15 | 0.10 |
SiO<sub>2</sub>+Al<sub>2</sub>O<sub>3</sub> | 77.74 | 76.76 | 77.40 | 76.95 | 78.01 | 77.79 | 79.64 | 78.33 |
(MgO+CaO+SrO)/Al<sub>2</sub>O<sub>3</sub> | 0.42 | 0.45 | 0.59 | 0.68 | 0.61 | 0.60 | 0.46 | 0.67 |
碱土金属总量 | 7.39 | 7.44 | 10.06 | 11.21 | 10.16 | 9.69 | 8.36 | 11.04 |
B<sub>2</sub>O<sub>3</sub>/(B<sub>2</sub>O<sub>3</sub>+ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>) | 0.62 | 0.63 | 0.82 | 0.75 | 0.75 | 0.74 | 0.72 | 0.83 |
(ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>)/(MgO+CaO+SrO) | 0.73 | 0.76 | 0.21 | 0.25 | 0.29 | 0.34 | 0.40 | 0.16 |
β-OH | 0.36 | 0.29 | 0.19 | 0.24 | 0.3 | 0.39 | 0.38 | 0.4 |
硼挥发率% | 9.56 | 10.33 | 10.17 | 9.23 | 8.42 | 9.71 | 10.35 | 10.06 |
热膨胀系数(50-350℃)10<sup>-7</sup>/℃ | 39.5 | 38.1 | 38.8 | 35.9 | 36.6 | 35.7 | 39.4 | 36.8 |
杨氏模量GPa | 78.90 | 80.6 | 79.8 | 81.2 | 80.4 | 79.9 | 81.8 | 78.3 |
维氏硬度Hv | 679.7 | 677.1 | 676.3 | 673.8 | 674.7 | 679.4 | 680.8 | 678.3 |
比模数GPa/g×cm<sup>-3</sup> | 30.46 | 31.24 | 30.69 | 31.21 | 32.83 | 31.49 | 32.04 | 31.63 |
应变点℃ | 711.00 | 706 | 690 | 712 | 720 | 704 | 693 | 726 |
熔化温度T<sub>2.3</sub>℃ | 1601.00 | 1612 | 1606 | 1613 | 1608 | 1632 | 1613 | 1622 |
热收缩率(600℃、10min)ppm | 10.84 | 11.03 | 9.05 | 10.74 | 11.37 | 7.68 | 11.29 | 10.48 |
组分wt% | 实施例9 | 实施例10 | 实施例11 | 实施例12 | 实施例13 | 实施例14 | 实施例15 | 实施例16 |
SiO<sub>2</sub> | 62.35 | 62.51 | 62.73 | 62.80 | 63.24 | 63.73 | 63.81 | 64.17 |
Al<sub>2</sub>O<sub>3</sub> | 16.11 | 16.03 | 15.30 | 15.19 | 15.52 | 14.32 | 14.52 | 14.05 |
B<sub>2</sub>O<sub>3</sub> | 9.23 | 8.62 | 10.00 | 9.31 | 8.72 | 8.81 | 9.01 | 8.55 |
MgO | 4.02 | 2.85 | 4.01 | 3.25 | 3.13 | 1.65 | 2.56 | 1.95 |
CaO | 3.66 | 4.69 | 5.14 | 4.17 | 3.25 | 4.16 | 5.03 | 4.14 |
SrO | 2.61 | 1.83 | 1.15 | 1.14 | 1.19 | 3.55 | 2.15 | 2.08 |
ZrO<sub>2</sub> | 0.58 | 1.21 | 0.55 | 1.10 | 0.55 | 1.59 | 1.31 | 1.21 |
P<sub>2</sub>O<sub>5</sub> | 1.29 | 2.14 | 1.01 | 2.89 | 4.27 | 2.07 | 1.46 | 3.74 |
SnO<sub>2</sub> | 0.15 | 0.12 | 0.11 | 0.15 | 0.13 | 0.12 | 0.15 | 0.11 |
SiO<sub>2</sub>+Al<sub>2</sub>O<sub>3</sub> | 78.46 | 78.54 | 78.03 | 77.99 | 78.76 | 78.05 | 78.33 | 78.22 |
(MgO+CaO+SrO)/Al<sub>2</sub>O<sub>3</sub> | 0.64 | 0.58 | 0.67 | 0.56 | 0.49 | 0.65 | 0.67 | 0.58 |
碱土金属总量 | 10.29 | 9.37 | 10.30 | 8.56 | 7.57 | 9.36 | 9.74 | 8.17 |
B<sub>2</sub>O<sub>3</sub>/(B<sub>2</sub>O<sub>3</sub>+ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>) | 0.83 | 0.72 | 0.87 | 0.70 | 0.64 | 0.71 | 0.76 | 0.63 |
(ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>)/(MgO+CaO+SrO) | 0.18 | 0.36 | 0.15 | 0.47 | 0.64 | 0.39 | 0.28 | 0.61 |
β-OH | 0.37 | 0.34 | 0.32 | 0.28 | 0.31 | 0.35 | 0.24 | 0.18 |
硼挥发率% | 9.52 | 10.37 | 9.19 | 8.62 | 7.06 | 8.87 | 9.45 | 10.23 |
热膨胀系数(50-350℃)10<sup>-7</sup>/℃ | 37.1 | 38.5 | 36.4 | 39.3 | 37.9 | 35.2 | 34.6 | 36.9 |
杨氏模量GPa | 80.6 | 78.2 | 79.4 | 81.7 | 79.6 | 81.2 | 79.7 | 80.3 |
维氏硬度Hv | 677.4 | 673.9 | 678.5 | 668.6 | 680.3 | 679.4 | 677.1 | 676.9 |
比模数GPa/g×cm<sup>-3</sup> | 30.7 | 31.34 | 32.06 | 30.65 | 31.27 | 30.25 | 30.94 | 31.83 |
应变点℃ | 706 | 694 | 725 | 718 | 724 | 708 | 713 | 725 |
熔化温度T<sub>2.3</sub>℃ | 1634 | 1609 | 1614 | 1621 | 1626 | 1618 | 1605 | 1622 |
热收缩率(600℃、10min)ppm | 10.83 | 8.75 | 10.71 | 8.35 | 9.56 | 11.25 | 10.76 | 8.89 |
组分wt% | 实施例17 | 实施例18 | 实施例19 | 实施例20 | 实施例21 | 实施例22 | 实施例23 | 实施例24 |
SiO<sub>2</sub> | 64.55 | 65.39 | 65.61 | 65.82 | 66.41 | 66.83 | 67.17 | 67.42 |
Al<sub>2</sub>O<sub>3</sub> | 14.26 | 14.61 | 14.14 | 14.09 | 13.86 | 13.29 | 13.02 | 13.15 |
B<sub>2</sub>O<sub>3</sub> | 8.91 | 9.15 | 8.64 | 9.26 | 8.55 | 8.75 | 9.03 | 9.59 |
MgO | 2.08 | 1.99 | 2.15 | 1.64 | 1.95 | 2.17 | 3.05 | 1.15 |
CaO | 3.65 | 4.17 | 3.55 | 4.86 | 4.91 | 4.05 | 4.22 | 3.64 |
SrO | 2.87 | 2.06 | 2.18 | 1.09 | 2.37 | 1.96 | 1.25 | 1.47 |
ZrO<sub>2</sub> | 1.96 | 1.32 | 1.35 | 0.85 | 0.75 | 1.63 | 0.79 | 1.95 |
P<sub>2</sub>O<sub>5</sub> | 1.60 | 1.21 | 2.23 | 2.27 | 1.05 | 1.20 | 1.36 | 1.48 |
SnO<sub>2</sub> | 0.12 | 0.10 | 0.15 | 0.12 | 0.15 | 0.12 | 0.11 | 0.15 |
SiO<sub>2</sub>+Al<sub>2</sub>O<sub>3</sub> | 78.81 | 80.00 | 79.75 | 79.91 | 80.27 | 80.12 | 80.19 | 80.57 |
(MgO+CaO+SrO)/Al<sub>2</sub>O<sub>3</sub> | 0.60 | 0.56 | 0.56 | 0.54 | 0.67 | 0.62 | 0.65 | 0.48 |
碱土金属总量 | 8.60 | 8.22 | 7.88 | 7.59 | 9.23 | 8.18 | 8.52 | 6.26 |
B<sub>2</sub>O<sub>3</sub>/(B<sub>2</sub>O<sub>3</sub>+ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>) | 0.71 | 0.78 | 0.71 | 0.75 | 0.83 | 0.76 | 0.81 | 0.74 |
(ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>)/(MgO+CaO+SrO) | 0.41 | 0.31 | 0.45 | 0.41 | 0.20 | 0.35 | 0.25 | 0.55 |
β-OH | 0.21 | 0.26 | 0.22 | 0.17 | 0.11 | 0.2 | 0.14 | 0.16 |
硼挥发率% | 6.92 | 8.35 | 10.24 | 10.22 | 9.95 | 5.67 | 6.52 | 9.57 |
热膨胀系数(50-350℃)10<sup>-7</sup>/℃ | 35.6 | 34.7 | 35.1 | 36.3 | 35.7 | 34.4 | 33.7 | 35.6 |
杨氏模量GPa | 81.6 | 80.7 | 79.2 | 81.5 | 84.1 | 81.3 | 82.4 | 80.9 |
维氏硬度Hv | 668.3 | 673.8 | 669.4 | 678.4 | 679.1 | 682.2 | 681.6 | 678.6 |
比模数GPa/g×cm<sup>-3</sup> | 32.31 | 30.97 | 31.62 | 30.76 | 33.29 | 31.62 | 32.97 | 31.86 |
应变点℃ | 719 | 716 | 720 | 709 | 721 | 719 | 724 | 722 |
熔化温度T<sub>2.3</sub>℃ | 1618 | 1628 | 1632 | 1638 | 1619 | 1633 | 1621 | 1636 |
热收缩率(600℃、10min)ppm | 9.42 | 10.59 | 7.83 | 8.92 | 9.21 | 10.34 | 9.11 | 11.45 |
组分wt% | 实施例25 | 实施例26 | 实施例27 | 实施例28 | 实施例29 | 实施例30 | 实施例31 | 实施例32 |
SiO<sub>2</sub> | 67.78 | 68.14 | 68.63 | 68.85 | 69.31 | 69.79 | 70.33 | 70.71 |
Al<sub>2</sub>O<sub>3</sub> | 13.05 | 14.21 | 13.04 | 13.17 | 13.35 | 13.07 | 13.01 | 13.00 |
B<sub>2</sub>O<sub>3</sub> | 8.83 | 8.62 | 8.57 | 8.74 | 8.74 | 8.85 | 8.55 | 8.67 |
MgO | 1.42 | 1.03 | 2.25 | 1.19 | 2.12 | 1.92 | 1.38 | 1.16 |
CaO | 3.11 | 3.28 | 3.08 | 3.13 | 3.35 | 3.34 | 3.45 | 3.25 |
SrO | 3.06 | 1.87 | 1.72 | 1.38 | 1.16 | 1.02 | 1.17 | 1.04 |
ZrO<sub>2</sub> | 0.97 | 0.95 | 0.73 | 1.33 | 0.63 | 0.55 | 0.75 | 1.01 |
P<sub>2</sub>O<sub>5</sub> | 1.64 | 1.79 | 1.86 | 2.06 | 1.21 | 1.31 | 1.21 | 1.02 |
SnO<sub>2</sub> | 0.14 | 0.11 | 0.12 | 0.15 | 0.13 | 0.15 | 0.15 | 0.14 |
SiO<sub>2</sub>+Al<sub>2</sub>O<sub>3</sub> | 80.83 | 82.35 | 81.67 | 82.02 | 82.66 | 82.86 | 83.34 | 83.71 |
(MgO+CaO+SrO)/Al<sub>2</sub>O<sub>3</sub> | 0.58 | 0.43 | 0.54 | 0.43 | 0.50 | 0.48 | 0.46 | 0.42 |
碱土金属总量 | 7.59 | 6.18 | 7.05 | 5.70 | 6.63 | 6.28 | 6.00 | 5.45 |
B<sub>2</sub>O<sub>3</sub>/(B<sub>2</sub>O<sub>3</sub>+ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>) | 0.77 | 0.76 | 0.77 | 0.72 | 0.83 | 0.83 | 0.81 | 0.81 |
(ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>)/(MgO+CaO+SrO) | 0.34 | 0.44 | 0.37 | 0.59 | 0.28 | 0.30 | 0.33 | 0.37 |
β-OH | 0.2 | 0.25 | 0.19 | 0.22 | 0.24 | 0.23 | 0.33 | 0.24 |
硼挥发率% | 8.63 | 7.39 | 10.36 | 7.18 | 10.06 | 7.25 | 9.03 | 10.24 |
热膨胀系数(50-350℃)10<sup>-7</sup>/℃ | 34.2 | 36.6 | 35.5 | 36.3 | 34.8 | 37.1 | 37.4 | 36.2 |
杨氏模量GPa | 81.5 | 79.6 | 80.4 | 81.7 | 80.3 | 82.6 | 79.8 | 80.9 |
维氏硬度Hv | 680.5 | 678.9 | 679.5 | 680.8 | 669.4 | 679.3 | 680.1 | 677.4 |
比模数GPa/g×cm<sup>-3</sup> | 30.4 | 32.64 | 31.32 | 30.24 | 32.69 | 31.93 | 31.44 | 32.36 |
应变点℃ | 714 | 727 | 731 | 739 | 733 | 736 | 728 | 730 |
熔化温度T<sub>2.3</sub>℃ | 1628 | 1634 | 1648 | 1652 | 1643 | 1660 | 1639 | 1651 |
热收缩率(600℃、10min)ppm | 9.97 | 10.63 | 9.03 | 11.31 | 9.66 | 10.23 | 11.02 | 10.76 |
组分wt% | 实施例33 | 实施例34 | 实施例35 | 对比例1 | 对比例2 | 对比例3 | 对比例4 |
SiO<sub>2</sub> | 71.23 | 71.66 | 71.90 | 59.03 | 73.84 | 66.42 | 66.5 |
Al<sub>2</sub>O<sub>3</sub> | 13.09 | 13.00 | 13.00 | 19.23 | 12.42 | 13.51 | 13.45 |
B<sub>2</sub>O<sub>3</sub> | 8.65 | 8.51 | 8.50 | 11.64 | 8.01 | 8.37 | 8.51 |
MgO | 1.00 | 1.09 | 1.00 | 6.17 | 0.56 | 2.01 | 1.95 |
CaO | 3.03 | 3.05 | 3.00 | 2.07 | 1.83 | 4.98 | 5.05 |
SrO | 1.01 | 1.02 | 1.00 | 0.50 | 0.72 | 2.85 | 2.8 |
ZrO<sub>2</sub> | 0.62 | 0.51 | 0.50 | 0.45 | 0.47 | 1.59 | |
P<sub>2</sub>O<sub>5</sub> | 1.24 | 1.06 | 1.00 | 0.76 | 2.00 | 1.71 | |
SnO<sub>2</sub> | 0.13 | 0.10 | 0.10 | 0.15 | 0.15 | 0.15 | 0.15 |
SiO<sub>2</sub>+Al<sub>2</sub>O<sub>3</sub> | 84.32 | 84.66 | 84.90 | 78.26 | 86.26 | 79.93 | 79.95 |
(MgO+CaO+SrO)/Al<sub>2</sub>O<sub>3</sub> | 0.39 | 0.40 | 0.38 | 0.45 | 0.25 | 0.73 | 0.73 |
碱土金属总量 | 5.04 | 5.16 | 5.00 | 8.74 | 3.11 | 9.84 | 9.80 |
B<sub>2</sub>O<sub>3</sub>/(B<sub>2</sub>O<sub>3</sub>+ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>) | 0.82 | 0.84 | 0.85 | 0.91 | 0.76 | 0.83 | 0.84 |
(ZrO<sub>2</sub>+P<sub>2</sub>O<sub>5</sub>)/(MgO+CaO+SrO) | 0.37 | 0.30 | 0.30 | 0.14 | 0.79 | 0.17 | 0.16 |
β-OH | 0.34 | 0.47 | 0.41 | 0.61 | 0.53 | 0.78 | 0.86 |
硼挥发率% | 10.31 | 9.86 | 10.11 | 14.8 | 13.5 | 12.76 | 12.31 |
热膨胀系数(50-350℃)10<sup>-7</sup>/℃ | 35.9 | 37.3 | 38.1 | 38.1 | 36.5 | 36.3 | 35.8 |
杨氏模量GPa | 81.7 | 80.3 | 82.1 | 73.3 | 76.9 | 77.6 | 75.4 |
维氏硬度Hv | 679.5 | 671.7 | 676.6 | 642.4 | 659.2 | 650.7 | 639.6 |
比模数GPa/g×cm<sup>-3</sup> | 30.04 | 31.72 | 30.95 | 27.93 | 32.67 | 28.14 | 29.92 |
应变点℃ | 735 | 726 | 729 | 658 | 684 | 662 | 675 |
熔化温度T<sub>2.3</sub>℃ | 1649 | 1658 | 1662 | 1603 | 1672 | 1621 | 1618 |
热收缩率(600℃、10min)ppm | 8.48 | 11.08 | 9.73 | 20.16 | 14.28 | 15.04 | 9.52 |
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PCT/CN2021/089349 WO2021244180A1 (zh) | 2020-06-05 | 2021-04-23 | 一种无碱铝硼硅酸盐玻璃 |
JP2022504076A JP7340088B2 (ja) | 2020-06-05 | 2021-04-23 | 無アルカリアルミノホウケイ酸ガラス原料 |
US17/773,527 US20220380247A1 (en) | 2020-06-05 | 2021-04-23 | Alkali-Free Aluminoborosilicate Glass |
KR1020227014715A KR102732408B1 (ko) | 2020-06-05 | 2021-04-23 | 무알칼리 알루미노붕규산염 유리 |
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US5824127A (en) * | 1996-07-19 | 1998-10-20 | Corning Incorporated | Arsenic-free glasses |
DE19934072C2 (de) * | 1999-07-23 | 2001-06-13 | Schott Glas | Alkalifreies Aluminoborosilicatglas, seine Verwendungen und Verfahren zu seiner Herstellung |
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