CN111558575A - Nanometer microbubble manufacturing and cleaning system - Google Patents
Nanometer microbubble manufacturing and cleaning system Download PDFInfo
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- CN111558575A CN111558575A CN201910114882.7A CN201910114882A CN111558575A CN 111558575 A CN111558575 A CN 111558575A CN 201910114882 A CN201910114882 A CN 201910114882A CN 111558575 A CN111558575 A CN 111558575A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 115
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 109
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 36
- 239000007789 gas Substances 0.000 claims description 24
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 238000006073 displacement reaction Methods 0.000 claims description 7
- 238000001914 filtration Methods 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 230000008859 change Effects 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000010008 shearing Methods 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 238000005507 spraying Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 239000012530 fluid Substances 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 229910052594 sapphire Inorganic materials 0.000 description 6
- 239000010980 sapphire Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 230000033116 oxidation-reduction process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000013043 chemical agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- -1 hydroxyl radicals Chemical class 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002101 nanobubble Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
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- 238000012795 verification Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/041—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention discloses a system for manufacturing and cleaning nano micro bubbles, which comprises a water pump, an electrolysis unit, a nano micro bubble unit and a cleaning tank. The water pump outputs the nano ionized water to the electrolysis unit, and the nano ionized water is electrolyzed by the electrolysis unit to generate a plurality of bubbles (for example, the bubble size is small-size bubbles and micro-size bubbles); the nanometer ionized water further generates a plurality of nanometer microbubbles through the nanometer microbubble unit; the cleaning tank provides a containing space for arranging the object and injects nanometer ionized water with nanometer micro-bubbles to clean the object. The nanometer ionized water circulates among the electrolysis unit, the nanometer micro-bubble unit and the cleaning tank, so that the object can be continuously cleaned by the nanometer ionized water with nanometer micro-bubbles.
Description
Technical Field
The invention relates to the technical field of cleaning equipment, in particular to a system for manufacturing and cleaning nanometer microbubbles with circulating type powerful cleaning.
Background
Conventional articles (e.g., glass, sapphire, silicon, metal, electronic components, ceramics, wafers, etc.) need to be cleaned using cleaning equipment.
The common industrial cleaning equipment provides a single-tank type, multi-tank type or spraying type cleaning mode. In the cleaning process, the industrial cleaning equipment uses chemical agents and strong acid and alkali for cleaning, so that a large amount of pure water is needed for washing in the cleaning process, and the cleaning liquid and dirt remained on the surface of an object are washed and washed by the large amount of pure water.
Disclosure of Invention
The first objective of the present invention is to provide a system for manufacturing and cleaning nano micro bubbles, which cleans by using a circulating fluid (such as nano ionized water, alkaline liquid without COD, deionized water, etc.), wherein the fluid can continuously generate nano micro bubbles, and can further cooperate or select ultrasonic vibration, temperature adjustment of a heating unit, or spray cleaning, so as to effectively clean the object.
The second objective of the present invention is to provide the above-mentioned system for producing and cleaning nano-micro bubbles, which uses the gas generated by the electrolysis process to generate bubbles (for example, the size of the bubbles can be small bubbles and micro-bubbles, etc.), and the bubbles pass through the nano-micro bubble unit to provide high pressure and shear force, so as to transform the bubbles into smaller nano-micro bubbles, thereby achieving the purpose of effective cleaning.
It is a third object of the present invention to provide the above-mentioned system for generating and cleaning nano-micro-bubbles, which forms a fluid circulation system by a water pump, and can continuously generate and replenish nano-micro-bubbles in the cleaning tank, and in another embodiment, the cleaning capability of the object can be enhanced by, for example, an ultrasonic wave and heating unit (providing heating or constant temperature) disposed in the cleaning tank.
It is a fourth object of the present invention to provide the above-mentioned system for producing and cleaning nano-micro bubbles, which can generate nano-micro bubbles by the rear nano-micro bubble unit by continuously electrolyzing a fluid through the electrolysis unit to generate a gas containing micro-bubbles and micro-bubbles, and can autonomously generate the gas to generate the nano-micro bubbles without additionally injecting the gas.
A fifth object of the present invention is to provide the above system for manufacturing and cleaning nano-micro bubbles, further providing an auxiliary cleaning member and an auxiliary displacement member for swinging, moving and rotating the object, thereby assisting the LED sapphire substrate to be cleaned uniformly, completely and completely.
A sixth object of the present invention is to provide the system for manufacturing and cleaning microbubbles, further applying a heating unit to the fluid to heat and/or maintain the temperature (or called constant temperature) of the fluid, so as to accelerate the action of the microbubbles or the nano ionized water on the object, and further increase the number of bubbles generated by the electrolysis unit, thereby improving the cleaning capability.
The seventh object of the present invention is to provide the above system for manufacturing and cleaning nano micro bubbles, further using a filtering unit to filter nano ionized water during the circulation process, so as to protect the system for manufacturing and cleaning nano micro bubbles, prolong the service life of the fluid, and prevent the removed dirt from adhering to or contaminating the object again.
To achieve the above and other objects, the present invention provides a system for manufacturing and cleaning nano micro bubbles for cleaning an object. The nanometer microbubble manufacturing and cleaning system comprises a water pump, an electrolysis unit, a nanometer microbubble unit and a cleaning tank. The water pump outputs the nanometer ion water. The electrolysis unit is connected with the water pump. The electrolysis unit electrolyzes the nano-ionized water to generate gas to generate bubbles including a plurality of micro-bubbles. The nanometer microbubble unit is connected with the electrolysis unit to receive the nanometer ion water and the bubbles and enable the nanometer ion water to generate a plurality of nanometer microbubbles. The cleaning tank comprises an output end and an input end. The cleaning tank forms an accommodating space for arranging objects. The accommodating space is arranged between the output end and the input end. The input end is connected with the nanometer microbubble unit to receive nanometer ionized water containing the nanometer microbubbles, the nanometer ionized water with the nanometer microbubbles is injected into the accommodating space to clean the object, and the output end is connected with the water pump to output the nanometer ionized water in the accommodating space. The nanometer ionized water continuously washes the object by circulating among the electrolysis unit, the nanometer micro-bubble unit and the washing tank. In addition, the nano-micro bubble manufacturing and cleaning system can also swing, move or rotate the object in the cleaning tank through the heating unit to further improve the cleaning capability.
Compared with the prior art, the system for manufacturing and cleaning nano micro bubbles provided by the invention can electrolyze nano ionized water through the electrolysis unit to generate small bubbles and micro bubbles containing hydrogen, oxygen and ozone, for example, wherein the hydrogen, oxygen and ozone account for a larger proportion of hydrogen than oxygen and ozone. The small bubbles and microbubbles pass through the nano-microbubble unit, which can add nano-scale bubbles to the nano-ionized water (possibly accompanied by other levels of bubbles). The hydrogen nanometer micro-bubbles containing hydrogen have stronger negative electrode property, can adsorb dirt attached to an object, and further play a cleaning role, and compared with the common nanometer micro-bubbles generated by air, the hydrogen nanometer micro-bubbles containing hydrogen have stronger cleaning force.
In the invention, the nano ionized water is continuously electrolyzed by the electrolysis unit, so that gas with an inexhaustible source is generated to generate small bubbles and micro bubbles, and the small bubbles and the micro bubbles are processed into the nano micro bubbles by the nano micro bubble unit, so that the invention does not need to be externally connected with any gas supply device or inject other gases. Moreover, the gas generated by the electrolysis unit is small bubbles and micro-bubbles, so that the gas quantity required by the generation of nano-micro-bubbles at the rear section is greatly reduced, and the speed of generating nano-micro-bubbles can be obviously improved. Due to the reduction of the gas consumption, the hydrogen consumption required for generating the nano-micro bubbles can be greatly reduced, and the danger of easy combustion caused by the use of a large amount of hydrogen is reduced.
In addition, experiments and verification prove that the invention can rapidly increase the oxidation-reduction value (ORP) in water from-200 mV to-500 mV in a short time and can be maintained all the time in the cleaning process. The foregoing values represent negative ions in the nano-ionic water and the number of negative-electrode air bubbles, which indicates that the present invention can maintain the cleaning ability that should be maintained in the washing process at all times.
Moreover, most of the bubbles generated by the invention are nano-level micro-bubbles, and compared with the time and speed that the bubbles with the size of more than micron rise to the liquid level and disappear in the atmosphere, the nano-level micro-bubbles can stay in the water for a longer time, so that the invention can not use an external gas supply device.
In another embodiment, the electrolysis unit and the nano-micro-bubble unit can rapidly supplement nano-micro-bubbles which disappear rapidly during the ultrasonic wave or spray cleaning process, so as to maintain an effective amount of nano-micro-bubbles in the nano-ionized water, thereby maintaining a relatively high cleaning capability.
In summary, the present invention can improve the cleaning ability and efficiency of the nano ionized water by the nano microbubbles, thereby replacing the chemical agent for cleaning and reducing the usage amount of the pure water, and even reducing the cleaning time.
Drawings
Fig. 1 is a block diagram of a nano-microbubble manufacturing and cleaning system according to a first embodiment of the present invention.
Fig. 2 is a block diagram of a nano-microbubble manufacturing and cleaning system according to a second embodiment of the present invention.
Detailed Description
For a fuller understanding of the objects, features and effects of the present invention, reference should be made to the following detailed description taken in conjunction with the accompanying drawings.
In the present disclosure, "a" or "an" is used to describe elements, components and components described herein. This is done for convenience of illustration only and to provide a general sense of the scope of the invention. Accordingly, unless clearly indicated to the contrary, such description should be read to include one, at least one and the singular also includes the plural.
In the present disclosure, the terms "comprise," "include," "have," "contain," or any other similar terms are intended to cover non-exclusive inclusions. For example, an element, structure, article, or apparatus that comprises a plurality of elements is not limited to only those elements but may include other elements not expressly listed or inherent to such element, structure, article, or apparatus. In addition, unless expressly stated to the contrary, the term "or" is intended to mean an inclusive "or" rather than an exclusive "or".
Referring to fig. 1, a block diagram of a system for manufacturing and cleaning microbubbles according to a first embodiment of the invention is shown. In fig. 1, the nano-microbubble generation and cleaning system 10 is capable of cleaning an object 2, for example, the object 2 may be a substrate or an electronic component. The substrate may be made of glass, sapphire, silicon, metal, ceramic, wafer, etc.
The nano-microbubble generation and cleaning system 10 includes a water pump 12, an electrolysis unit 14, a nano-microbubble unit 16, and a cleaning tank 18.
For convenience of description, the water pump 12 is used in the present embodiment, and the nano-micro bubble producing and cleaning system 10 is actually a circulation system, so the following description is not limited to the water pump 12 and must be started by the water pump 12.
The water pump 12 outputs the nano-ionized water 4.
The electrolysis unit 14 is connected with the water pump 12. The electrolysis unit 14 electrolyzes the nano-ionized water 4 to generate the gas 6, and the gas 6 is used to generate the bubbles 8 of the same size as the small bubbles and the micro-bubbles. In the present embodiment, the size of the bubbles 6 may be small bubbles of other sizes besides the microbubbles.
The nano micro bubble unit 16 is connected to the electrolysis unit 14 to receive the nano ionized water 4 and the bubbles 8. The nano-microbubble unit 16 allows the nano-ionized water 4 to generate a plurality of nano-microbubbles 162. For example, the aforementioned manner of generating the nano-microbubbles 162 can be controlled by the nano-microbubble unit 16 through, for example, a regulating valve (not shown) to control the appropriate speed and pressure, and the nano-microbubbles 162 are continuously generated through, for example, shear force generated by the speed and pressure. In yet another embodiment, the nano-microbubble unit 16 further controls the nano-microbubbles 162 to mix with the gas 6 generated from the electrolysis unit 14 to produce nano-bubbles containing a specific gas, thereby meeting different product cleaning requirements and increasing the cleaning capacity. Since the gas generated by the electrolysis unit 14 is of small bubble and microbubble level, the gas amount required for generating nano microbubbles is greatly reduced, and the speed of generating nano microbubbles 162 by the nano microbubble unit 16 is also obviously increased. For example, the amount of hydrogen gas required for generating the nano-micro bubbles 162 is reduced due to the reduction of the amount of gas, thereby reducing the risk of using a large amount of hydrogen gas.
It should be noted that the advantages of using the nano-microbubble unit 16 are as follows:
from the volume formula of the bubble (V-4 pi/3 r)3) As can be seen from the surface area equation (a ═ 4 tr 2), the total surface area of the bubbles is inversely proportional to the diameter of the individual bubbles, with the total volume (V) of the bubbles being constant. For example, a bubble with a diameter of 10 μm should have a surface area 100 times larger than that of a bubble with a diameter of 1mm, and thus the contact area of the bubble is increased by 100 times, which also promotes a 100-fold increase in the reaction speed.
Further, the nano-microbubbles 162 generated by the nano-microbubble unit 16 have a bubble level of nano (10)-9) And (4) grading. According to stokes' law, the rising speed of bubbles in water is proportional to the square of the bubble diameter. Therefore, the smaller the bubble diameter, the slower the rising speed of the bubbles. For example, when bubbles with a diameter of 1mm rise in water at a rate of 6mm/min, bubbles with a diameter of 10 μm rise in water at a rate of 3 mm/min. The latter is 1/2000 for the former. Considering the increase of the surface area, the dissolving capacity of the nano-micro bubbles 162 is increased by 20 ten thousand times compared with that of the general air.
Furthermore, when the nano-micro bubbles 162 are broken, due to the rapid change of the disappearance of the gas-liquid interface, the high concentration ions accumulated on the interface release the accumulated chemical energy at a time, and at this time, a large amount of hydroxyl radicals can be generated by excitation. The hydroxyl free radical has ultrahigh oxidation-reduction potential, and the generated super-strong oxidation effect can remove pollutants in water under normal conditions.
The nano-microbubble generation and cleaning system 10 is able to rapidly increase the oxidation-reduction value (ORP) of water from-200 mV to-500 mV over time, and is maintained throughout the time course. This number represents the number of negative ions and negative-electrode air bubbles in the nano-ionic water, which indicates that the cleaning ability in the washing process can be maintained at all times.
Therefore, when the nano-ionized water 4 circulates among the electrolysis unit 14, the nano-microbubble unit 16, and the cleaning tank 18 by the water pump 12, it can continuously clean the object 2 with the nano-ionized water 4 having the nano-microbubbles 162.
It is noted that the cleaning tank 14 may further comprise a vibration generating unit (not shown) or a spraying unit (not shown), which are respectively described as follows:
regarding the vibration generating unit: the vibration generating unit can provide a vibration force, for example, the vibration generating unit can be an ultrasonic wave. The vibration generation unit drives the nano-ionized water 4 with the nano-microbubbles 162 to act on the object 2, and dirt on the nano-microbubbles 162 can be removed, or the nano-microbubbles 162 are influenced by vibration force, and the nano-microbubbles 162 can be accelerated to remove dirt on the object 2. For example, the vibration generating units are disposed at the left, right, and lower sides of the cleaning tank 18, and the vibration frequency thereof is set at, for example, 25 to 120kHz to accommodate different cleaning needs of the object 2. By adjusting the position of the vibration generating unit disposed in the cleaning tank 18, the object 2 can be uniformly covered in each area of the cleaning tank 14 during ultrasonic cleaning, for example, so as to achieve overall cleaning without dead corners.
Regarding the spray unit: the spraying unit can output the nano ionized water 4 with the nano micro bubbles 162 according to the frequency and/or the pressure and act on the object 2, that is, the spraying unit sprays the nano ionized water 4 of the nano micro bubbles 162 on the object 2 at a certain pressure, so that the dirt on the object 2 can be effectively removed. For example, the spraying units can be disposed on the left and right sides of the cleaning tank 18, so that the objects 2 can be uniformly sprayed and cleaned. Wherein, the spraying angle of the spraying unit can be adjusted according to the appearance or shape of the object 2, or the spraying unit can change the spraying position thereof through an electromechanical assembly.
It should be noted that the electrolysis unit 14 and the nano-micro bubble unit 16 of the present invention can rapidly supplement the nano-micro bubbles 162 that disappear rapidly during the ultrasonic wave or spray cleaning process, for example, so as to maintain the effective nano-micro bubble amount of the nano-ionized water 4, thereby maintaining the cleaning capability.
In yet other embodiments, to accommodate a particular object 2, such as a sapphire wafer/substrate. The cleaning tank 18 may further include an auxiliary displacement member (not shown) and an auxiliary cleaning member (not shown).
With regard to the auxiliary displacement member: the auxiliary displacement member can be used to set the object 2 and swing, move, and rotate the object 2, i.e., change the setting position, direction, and angle of the object 2 in the cleaning tank 18. For example, the auxiliary displacement member may be installed at the bottom of the cleaning tank 18, and the auxiliary displacement member may be made of a plastic material that does not damage the sapphire wafer, and by rotating and moving for a small distance, each portion of the sapphire wafer may be cleaned uniformly.
Regarding the auxiliary cleaning member: the auxiliary cleaning elements are capable of contacting the object 2 to contact the object 2 with an object (e.g., a brush head, etc.) to remove foreign matter/dirt on the surface or edge of the object 2.
Referring to fig. 2, a block diagram of a system for manufacturing and cleaning microbubbles according to a second embodiment of the invention is shown. In fig. 2, the nano-microbubble manufacturing and cleaning system 10' includes a sub-tank 20, a heating unit 22, and a filtering unit 24 in addition to the water pump 12, the electrolysis unit 14, the nano-microbubble unit 16, and the cleaning tank 18 of the first embodiment.
The sub-tank 20 is disposed between the cleaning tank 18 and the water pump 12, and is configured to receive the nano-ionized water 4 from the cleaning tank 18 and output the nano-ionized water 4 to the water pump 12, which may be used to, for example, adjust/buffer the amount of water entering the water pump 12. In the present embodiment, the number of the sub-slots 20 is described as one example, and in other embodiments, the number of the sub-slots 20 may be multiple.
The heating unit 22 may be used to heat the nano-ionized water 4 or the nano-ionized water 4 having the nano-micro bubbles 162. In the present embodiment, the heating unit 22 is disposed in the nano-micro bubble unit 16 as an example, and in other embodiments, the heating unit may be disposed in any component in the system, or may not be limited to only one component. The heating unit 22 acts on the nano ionized water 4, and can heat or maintain the temperature, and the purpose of the heating unit is to accelerate the cleaning reaction when the nano micro bubbles 162 or the nano ionized water 4 acts on the object 2, and in addition, the number of the bubbles 8 generated by the electrolysis unit 14 can be increased, so that the cleaning capability is improved.
The filtering unit 24 is disposed between the water pump 12 and the electrolysis unit 14 to filter the nano-ionized water 4 from the water pump 12 and output the nano-ionized water 4 to the electrolysis unit 14. In the embodiment, the filtering unit 24 may be used to filter the nano ionized water 4 with impurities. Therefore, the nano-ionized water 4 is filtered by the filtering unit 24 during the circulation process, so that the removed dirt can be prevented from being attached/polluted to the object 2 again besides protecting the system and prolonging the service life.
The invention provides a nano micro bubble manufacturing and cleaning system, which can effectively and environmentally improve the cleanness of cleaned objects and reduce the generation of pollutants.
While the invention has been described in terms of preferred embodiments, it will be understood by those skilled in the art that the embodiments are merely illustrative of the invention and should not be construed as limiting the scope of the invention. It is noted that equivalent variations and substitutions of the embodiments are intended to be included within the scope of the present invention. Therefore, the protection scope of the present invention should be determined by the claims.
[ notation ] to show
2 article
4 nanometer ion water
6 gas
8 bubbles
10. 10' nanometer microbubble manufacturing and cleaning system
12 water pump
14 electrolytic cell
16 nm microbubble unit
162 nm microbubble
18 cleaning tank
182 input terminal
184 output terminal
20 pairs of grooves
22 heating unit
24 Filter Unit
SP accommodation space
Claims (10)
1. A nano-microbubble manufacturing and cleaning system for cleaning an object, the nano-microbubble manufacturing and cleaning system comprising:
the water pump outputs nano ionized water;
an electrolysis unit connected to the water pump, the electrolysis unit electrolyzing the nano-ionized water to generate gas for generating bubbles containing a plurality of micro-bubbles;
the nanometer microbubble unit is connected with the electrolysis unit and used for receiving the nanometer ionized water and the bubbles, and the nanometer microbubble unit enables the nanometer ionized water to generate a plurality of nanometer microbubbles; and
a cleaning tank having an output end and an input end, the cleaning tank forming an accommodating space for accommodating the object, the accommodating space being disposed between the output end and the input end, the input end being connected to the nano-micro-bubble unit to receive the nano-ionized water containing the plurality of nano-micro-bubbles and inject the nano-ionized water having the plurality of nano-micro-bubbles into the accommodating space to clean the object, and the output end being connected to the water pump to output the nano-ionized water located in the accommodating space;
wherein the nano-ionized water circulates among the electrolysis unit, the nano-micro bubble unit and the cleaning tank, and the nano-ionized water of the nano-micro bubbles is continuously used for cleaning the object.
2. The nano-microbubble generation and cleaning system as claimed in claim 1, wherein the electrolysis unit electrolyzes the nano-ionized water to generate at least one gas of hydrogen, oxygen, and ozone for generating the bubbles in the nano-ionized water.
3. The nano-microbubble manufacturing and cleaning system as claimed in claim 2, wherein the nano-microbubble unit receives the nano-ionized water and the gas from the electrolysis unit, the nano-microbubble unit providing a shearing force to cause the gas to be merged into the nano-ionized water to form nano-ionized water having the nano-microbubbles.
4. The nano-microbubble manufacturing and cleaning system as claimed in claim 1, wherein the cleaning tank further comprises a vibration generating unit that generates a vibration force and drives nano-ionized water having the plurality of nano-microbubbles to act on the object.
5. The nano-microbubble generation and cleaning system as claimed in claim 1, wherein the cleaning tank further comprises a spray unit that outputs nano-ionized water having the nano-microbubbles according to at least one of frequency and pressure and acts on the object.
6. The nano-microbubble manufacturing and cleaning system as claimed in claim 4 or 5, wherein the cleaning tank further comprises an auxiliary displacement member for disposing the object to change a position where the object is disposed or rotate the object.
7. The nano-microbubble manufacturing and cleaning system as claimed in claim 4 or 5, wherein the cleaning tank further comprises an auxiliary cleaning member for contacting the object to clean the object.
8. The nano-microbubble manufacturing and cleaning system as claimed in claim 1, further comprising a sub-tank disposed between the cleaning tank and the water pump to receive nano-ionized water from the cleaning tank and output the nano-ionized water to the water pump.
9. The nano-microbubble manufacturing and cleaning system as claimed in claim 1 or 8, further comprising a heating unit to heat the nano-ionized water or the nano-ionized water having the plurality of nano-microbubbles.
10. The nano-microbubble manufacturing and cleaning system as claimed in claim 1, further comprising a filtering unit disposed between the water pump and the electrolysis unit to filter nano-ionized water from the water pump and output the nano-ionized water to the electrolysis unit.
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CN201910114882.7A CN111558575A (en) | 2019-02-14 | 2019-02-14 | Nanometer microbubble manufacturing and cleaning system |
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CN201910114882.7A CN111558575A (en) | 2019-02-14 | 2019-02-14 | Nanometer microbubble manufacturing and cleaning system |
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CN201910114882.7A Pending CN111558575A (en) | 2019-02-14 | 2019-02-14 | Nanometer microbubble manufacturing and cleaning system |
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