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CN111509971B - Integrated circuit, packaging structure and manufacturing method - Google Patents

Integrated circuit, packaging structure and manufacturing method Download PDF

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CN111509971B
CN111509971B CN201910683017.4A CN201910683017A CN111509971B CN 111509971 B CN111509971 B CN 111509971B CN 201910683017 A CN201910683017 A CN 201910683017A CN 111509971 B CN111509971 B CN 111509971B
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voltage
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supply voltage
transistor
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CN111509971A (en
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杨长暻
王良丞
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Anchorage Semiconductor Co ltd
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Delta Electronics Inc
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    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M3/00Conversion of DC power input into DC power output
    • H02M3/02Conversion of DC power input into DC power output without intermediate conversion into AC
    • H02M3/04Conversion of DC power input into DC power output without intermediate conversion into AC by static converters
    • H02M3/06Conversion of DC power input into DC power output without intermediate conversion into AC by static converters using resistors or capacitors, e.g. potential divider
    • H02M3/07Conversion of DC power input into DC power output without intermediate conversion into AC by static converters using resistors or capacitors, e.g. potential divider using capacitors charged and discharged alternately by semiconductor devices with control electrode, e.g. charge pumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/642Capacitive arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/68Capacitors having no potential barriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto

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Abstract

本发明提出一种集成电路、封装结构以及制造方法,其中集成电路包括第一功率晶体管、第二功率晶体管以及隔离器。第一功率晶体管与第一驱动电路整合在一起。第二功率晶体管与第二驱动电路整合在一起。隔离器根据输入信号,提供第一控制信号至第一功率晶体管且提供第二控制信号至第二功率晶体管。

Figure 201910683017

The present invention provides an integrated circuit, a package structure and a manufacturing method, wherein the integrated circuit includes a first power transistor, a second power transistor and an isolator. The first power transistor is integrated with the first driving circuit. The second power transistor is integrated with the second driving circuit. The isolator provides a first control signal to the first power transistor and a second control signal to the second power transistor according to the input signal.

Figure 201910683017

Description

集成电路、封装结构以及制造方法Integrated circuit, package structure, and manufacturing method

技术领域technical field

本发明涉及一种整合氮化镓(GaN)功率晶体管的驱动电路,特别涉及包括驱动电路、隔离器以及氮化镓功率晶体管的封装结构。The present invention relates to a driving circuit integrating a gallium nitride (GaN) power transistor, in particular to a package structure including a driving circuit, an isolator and a gallium nitride power transistor.

背景技术Background technique

在一个电力电路中,往往需要利用电荷泵将供应电压升压至更高的电压来驱动功率晶体管。图1显示一般的电力电路。如图1所示的电力电路100中,上桥驱动电路DRV1用以驱动第一功率晶体管110A,下桥驱动电路DRV2用以驱动第二功率晶体管110B。此外,升压电容CB以及升压二极管DB用以将供应电压VDD升压至升压电压VB,使得第一功率晶体管110A能够完全导通。因此,第一功率晶体管110A由输入电压VIN所供应,第二功率晶体管110B能够通过电感L以及电容C来驱动负载装置RL。In a power circuit, it is often necessary to use a charge pump to boost the supply voltage to a higher voltage to drive the power transistors. Figure 1 shows a general power circuit. In the power circuit 100 shown in FIG. 1 , the upper bridge driving circuit DRV1 is used to drive the first power transistor 110A, and the lower bridge driving circuit DRV2 is used to drive the second power transistor 110B. In addition, the boosting capacitor CB and the boosting diode DB are used to boost the supply voltage VDD to the boosting voltage VB, so that the first power transistor 110A can be fully turned on. Therefore, the first power transistor 110A is supplied by the input voltage VIN, and the second power transistor 110B can drive the load device RL through the inductor L and the capacitor C.

因为电感L会在切换节点SW上产生显著的寄生效应,如通过第二功率晶体管110B的导通的内接二极管(body diode)而在切换节点SW上产生负电压突波,这些寄生效应会在升压电容CB经由功率晶体管充电时干扰升压电压VB。因此,需要降低驱动电路的寄生效应。Because the inductance L will produce significant parasitic effects on the switching node SW, such as a negative voltage surge on the switching node SW through the conducting body diode of the second power transistor 110B, these parasitic effects will be The boost capacitor CB interferes with the boost voltage VB when charged through the power transistor. Therefore, it is necessary to reduce the parasitic effect of the driving circuit.

发明内容SUMMARY OF THE INVENTION

有鉴于此,本发明提出一种集成电路,包括一第一功率晶体管、一第二功率晶体管以及一隔离器。上述第一功率晶体管与一第一驱动电路整合在一起。上述第二功率晶体管与一第二驱动电路整合在一起。上述隔离器可根据一输入信号,提供一第一控制信号至一第一功率晶体管且提供一第二控制信号至一第二功率晶体管。In view of this, the present invention provides an integrated circuit including a first power transistor, a second power transistor and an isolator. The above-mentioned first power transistor is integrated with a first driving circuit. The above-mentioned second power transistor is integrated with a second driving circuit. The isolator can provide a first control signal to a first power transistor and a second control signal to a second power transistor according to an input signal.

根据本发明的一实施例,集成电路还包括一第一电力电路以及一第二电力电路。第一电力电路包括上述第一驱动电路以及上述第一功率晶体管,其中上述第二电力电路包括上述第二驱动电路以及上述第二功率晶体管。According to an embodiment of the present invention, the integrated circuit further includes a first power circuit and a second power circuit. The first power circuit includes the first drive circuit and the first power transistor, and the second power circuit includes the second drive circuit and the second power transistor.

根据本发明的一实施例,集成电路还包括一自举二极管以及一自举电容。上述自举二极管包括一自举阳极以及一自举阴极,其中上述自举阳极耦接至一第一供应电压,上述自举阴极耦接至一第二供应电压。上述自举电容耦接于上述第二供应电压以及一开关节点的一开关电压。According to an embodiment of the present invention, the integrated circuit further includes a bootstrap diode and a bootstrap capacitor. The bootstrap diode includes a bootstrap anode and a bootstrap cathode, wherein the bootstrap anode is coupled to a first supply voltage, and the bootstrap cathode is coupled to a second supply voltage. The bootstrap capacitor is coupled to the second supply voltage and a switch voltage of a switch node.

根据本发明的一实施例,上述第一驱动电路是由上述第二供应电压以及上述开关电压所供电,并可根据上述第一控制信号于一第一驱动节点产生一第一驱动电压,其中上述第一功率晶体管可根据上述驱动电压而将一高电压供电至上述开关节点。According to an embodiment of the present invention, the first driving circuit is powered by the second supply voltage and the switching voltage, and can generate a first driving voltage at a first driving node according to the first control signal, wherein the above The first power transistor can supply a high voltage to the switching node according to the driving voltage.

根据本发明的一实施例,上述第二驱动电路是由上述第一供应电压以及一第二接地端所供电,并可根据上述第二控制信号于一第二驱动节点产生一第二驱动电压,其中上述第二功率晶体管可根据上述第二驱动电压而将上述开关电压下拉至上述第一接地端。According to an embodiment of the present invention, the second driving circuit is powered by the first supply voltage and a second ground terminal, and can generate a second driving voltage at a second driving node according to the second control signal, The second power transistor can pull down the switching voltage to the first ground terminal according to the second driving voltage.

根据本发明的一实施例,上述第一功率晶体管以及上述第二功率晶体管的每一者为一氮化镓晶体管。According to an embodiment of the present invention, each of the first power transistor and the second power transistor is a gallium nitride transistor.

根据本发明的一实施例,上述高电压超过上述第一供应电压以及上述第二供应电压。According to an embodiment of the present invention, the high voltage exceeds the first supply voltage and the second supply voltage.

根据本发明的一实施例,上述隔离器包括一第一子隔离器以及一第二子隔离器。上述第一子隔离器包括一第一发射器、一第一接收器以及一第一隔离阻障。上述第一发射器是由一第三供应电压以及一第二接地端所供电,且可根据上述输入信号发送一第一射频信号。上述第一接收器是由一第二供应电压以及上述开关电压所供电,且可根据上述第一射频信号产生上述第一控制信号。上述第一隔离阻障用以将上述第一发射器以及上述第一接收器之间电性隔离。上述第二子隔离器包括一第二发射器、一第二接收器以及一第二隔离阻障。上述第二发射器是由一第三供应电压以及一第二接地端所供电,且可根据上述输入信号发送一第二射频信号。上述第二接收器是由上述第一供应电压以及上述第一接地端所供电,且可根据上述第二射频信号产生上述第二控制信号。上述第二隔离阻障用以将上述第二发射器以及上述第二接收器之间电性隔离。According to an embodiment of the present invention, the above-mentioned isolator includes a first sub-isolator and a second sub-isolator. The first sub-isolator includes a first transmitter, a first receiver, and a first isolation barrier. The first transmitter is powered by a third supply voltage and a second ground terminal, and can transmit a first radio frequency signal according to the input signal. The first receiver is powered by a second supply voltage and the switching voltage, and can generate the first control signal according to the first radio frequency signal. The first isolation barrier is used to electrically isolate the first transmitter and the first receiver. The second sub-isolator includes a second transmitter, a second receiver, and a second isolation barrier. The second transmitter is powered by a third supply voltage and a second ground terminal, and can transmit a second radio frequency signal according to the input signal. The second receiver is powered by the first supply voltage and the first ground terminal, and can generate the second control signal according to the second radio frequency signal. The second isolation barrier is used to electrically isolate the second transmitter and the second receiver.

根据本发明的一实施例,上述隔离器包括一发射器、一第一接收器、一第一隔离阻障、一第二接收器以及一第二隔离阻障。上述发射器是由一第三供应电压以及一第二接地端所供电,且可根据上述输入信号发送一第一射频信号以及一第二射频信号。上述第一接收器是由上述第二供应电压以及上述开关电压所供电,且可根据上述第一射频信号产生上述第一控制信号。上述第一隔离阻障用以将上述发射器以及上述第一接收器之间电性隔离。上述第二接收器是由上述第一供应电压以及上述第一接地端所供电,且可根据上述第一射频信号产生上述第二控制信号。上述第二隔离阻障用以将上述发射器以及上述第二接收器之间电性隔离。According to an embodiment of the present invention, the above-mentioned isolator includes a transmitter, a first receiver, a first isolation barrier, a second receiver, and a second isolation barrier. The transmitter is powered by a third supply voltage and a second ground terminal, and can transmit a first radio frequency signal and a second radio frequency signal according to the input signal. The first receiver is powered by the second supply voltage and the switching voltage, and can generate the first control signal according to the first radio frequency signal. The first isolation barrier is used to electrically isolate the transmitter and the first receiver. The second receiver is powered by the first supply voltage and the first ground terminal, and can generate the second control signal according to the first radio frequency signal. The second isolation barrier is used to electrically isolate the transmitter and the second receiver.

根据本发明的一实施例,集成电路还包括一解耦合电容。上述解耦合电容耦接于上述高电压以及上述第一接地端之间,其中上述第一子隔离器、上述第二子隔离器、上述第一电力电路、上述第二电力电路以及上述解耦合电容封装在一起。According to an embodiment of the present invention, the integrated circuit further includes a decoupling capacitor. The decoupling capacitor is coupled between the high voltage and the first ground terminal, wherein the first sub-isolator, the second sub-isolator, the first power circuit, the second power circuit and the decoupling capacitor packaged together.

根据本发明的一实施例,上述第一电力电路以及上述第二电力电路的每一者包括一前置驱动电路。上述前置驱动电路可根据一控制信号产生上述第一内部信号,其中上述前置驱动电路用以增进上述控制信号的驱动能力,其中一驱动电路可根据上述第一内部信号,产生一驱动电压。According to an embodiment of the present invention, each of the first power circuit and the second power circuit includes a pre-driver circuit. The pre-driving circuit can generate the first internal signal according to a control signal, wherein the pre-driving circuit is used to improve the driving capability of the control signal, and a driving circuit can generate a driving voltage according to the first internal signal.

根据本发明的一实施例,上述第一电力电路以及上述第二电力电路的每一者还包括一上桥晶体管、一下桥晶体管以及一电荷泵。上述上桥晶体管可根据一上桥节点的一上桥电压,将一供应电压提供至一驱动节点。上述下桥晶体管,可根据上述第一内部信号,将上述驱动节点耦接至一接地端。上述电荷泵耦接至上述上桥节点以及上述驱动节点,其中上述电荷泵用以根据上述第一内部信号,产生超过上述供应电压的上述上桥电压。According to an embodiment of the present invention, each of the first power circuit and the second power circuit further includes an upper-bridge transistor, a lower-bridge transistor, and a charge pump. The above-mentioned high-bridge transistor can provide a supply voltage to a driving node according to a high-bridge voltage of a high-bridge node. The lower bridge transistor can couple the driving node to a ground terminal according to the first internal signal. The charge pump is coupled to the upper bridge node and the driving node, wherein the charge pump is used for generating the upper bridge voltage exceeding the supply voltage according to the first internal signal.

根据本发明的一实施例,上述第一电力电路以及上述第二电力电路的每一者还包括一迟滞电路。上述迟滞电路耦接于上述控制信号以及上述前置驱动电路之间,可用以接收上述控制信号而产生一第二内部信号,使得上述前置驱动电路可根据上述第二内部信号而产生上述第一内部信号,其中上述迟滞电路用以提供一迟滞功能给上述控制信号。According to an embodiment of the present invention, each of the first power circuit and the second power circuit further includes a hysteresis circuit. The hysteresis circuit is coupled between the control signal and the pre-driving circuit, and can be used to receive the control signal to generate a second internal signal, so that the pre-driving circuit can generate the first internal signal according to the second internal signal. The internal signal, wherein the hysteresis circuit is used to provide a hysteresis function to the control signal.

根据本发明的一实施例,上述第一电力电路以及上述第二电力电路的每一者还包括一上桥常导通晶体管。上述上桥常导通晶体管包括耦接至上述驱动节点的源极端、耦接至上述驱动节点的栅极端以及由上述供应电压供电的漏极端,其中上述上桥常导通晶体管用以增进上述上桥晶体管的驱动能力。According to an embodiment of the present invention, each of the first power circuit and the second power circuit further includes an upper-bridge normally-on transistor. The above-mentioned high-bridge normally-on transistor includes a source terminal coupled to the above-mentioned driving node, a gate terminal coupled to the above-mentioned driving node, and a drain terminal powered by the above-mentioned supply voltage, wherein the above-mentioned high-bridge normally-on transistor is used to improve the above-mentioned high drive capability of the bridge transistor.

本发明更提出一种封装结构,包括:一基板、一解耦合电容、一集成电路以及一导线层。上述解耦合电容位于上述基板之上。上述集成电路与上述解耦合电容固定于一第一介电层之中。上述导线层用以将解耦合电容电性耦接至上述集成电路,其中上述导线层位于上述第一介电层且穿过一第二介电层。The present invention further provides a package structure, comprising: a substrate, a decoupling capacitor, an integrated circuit and a wire layer. The decoupling capacitor is located on the substrate. The integrated circuit and the decoupling capacitor are fixed in a first dielectric layer. The wire layer is used for electrically coupling the decoupling capacitor to the integrated circuit, wherein the wire layer is located in the first dielectric layer and passes through a second dielectric layer.

根据本发明的一实施例,上述解耦合电容包括一第一导电单元、一第一介电单元以及一第二导电单元。上述第一导电单元形成于上述第一介电层之中。上述第一介电单元形成于上述第一导电单元之上。上述第二导电单元形成于上述第一介电单元之上。According to an embodiment of the present invention, the decoupling capacitor includes a first conductive unit, a first dielectric unit and a second conductive unit. The first conductive unit is formed in the first dielectric layer. The first dielectric unit is formed on the first conductive unit. The second conductive unit is formed on the first dielectric unit.

根据本发明的一实施例,封装结构还包括一自举电容。上述自举电容位于上述基板之上,其中上述集成电路以及上述自举电容固定于上述第一介电层或上述第二介电层之中。According to an embodiment of the present invention, the package structure further includes a bootstrap capacitor. The bootstrap capacitor is located on the substrate, wherein the integrated circuit and the bootstrap capacitor are fixed in the first dielectric layer or the second dielectric layer.

根据本发明的一实施例,上述自举电容包括一第三导电单元、一第二介电单元以及一第四导电单元。上述第三导电单元形成于上述第一介电层之中。上述第二介电单元形成于上述第一导电单元之上。上述第四导电单元形成于上述第二介电单元之上。According to an embodiment of the present invention, the bootstrap capacitor includes a third conductive unit, a second dielectric unit and a fourth conductive unit. The third conductive unit is formed in the first dielectric layer. The second dielectric unit is formed on the first conductive unit. The fourth conductive unit is formed on the second dielectric unit.

根据本发明的一实施例,上述第一介电单元以及上述第二介电单元的材料与上述第一介电层以及上述第二介电层的材料不同。According to an embodiment of the present invention, the materials of the first dielectric unit and the second dielectric unit are different from the materials of the first dielectric layer and the second dielectric layer.

根据本发明的一实施例,上述集成电路包括一隔离器、一第一电力电路以及一第二电力电路。上述隔离器可根据一输入信号,提供一第一控制信号以及一第二控制信号。上述第一电力电路包括一第一驱动电路以及一第一功率晶体管。上述第一驱动电路是由一第二供应电压以及一开关电压所供电,且可根据上述第一控制信号于一第一驱动节点产生一第一驱动电压,其中一自举二极管以及上述自举电容用以将一第一供应电压升压至上述第二供应电压,其中上述自举二极管包括耦接至上述第一供应电压的一自举阳极以及耦接至上述第二供应电压的一自举阴极,其中上述自举电容耦接于上述第二供应电压以及一开关节点的上述开关电压之间。上述第一功率晶体管可根据上述第一驱动电压,将一高电压供电至上述开关节点。上述第二电力电路包括一第二驱动电路以及一第二功率晶体管。上述第二驱动电路是由上述第一供应电压以及一第一接地端所供电,且根据上述第二控制信号于一第二驱动节点产生一第二驱动电压。上述第二功率晶体管可根据上述第二驱动电压,将上述开关电压下拉至上述第一接地端。According to an embodiment of the present invention, the above-mentioned integrated circuit includes an isolator, a first power circuit and a second power circuit. The isolator can provide a first control signal and a second control signal according to an input signal. The above-mentioned first power circuit includes a first driving circuit and a first power transistor. The first driving circuit is powered by a second supply voltage and a switching voltage, and can generate a first driving voltage at a first driving node according to the first control signal, wherein a bootstrap diode and the bootstrap capacitor for boosting a first supply voltage to the second supply voltage, wherein the bootstrap diode includes a bootstrap anode coupled to the first supply voltage and a bootstrap cathode coupled to the second supply voltage , wherein the bootstrap capacitor is coupled between the second supply voltage and the switch voltage of a switch node. The first power transistor can supply a high voltage to the switching node according to the first driving voltage. The above-mentioned second power circuit includes a second driving circuit and a second power transistor. The second driving circuit is powered by the first supply voltage and a first ground terminal, and generates a second driving voltage at a second driving node according to the second control signal. The second power transistor can pull down the switching voltage to the first ground terminal according to the second driving voltage.

根据本发明的一实施例,上述第一功率晶体管以及上述第二功率晶体管的每一者为一氮化镓晶体管。According to an embodiment of the present invention, each of the first power transistor and the second power transistor is a gallium nitride transistor.

根据本发明的一实施例,上述隔离器包括一第一子隔离器以及一第二子隔离器。上述第一子隔离器包括一第一发射器、一第一接收器以及一第一隔离阻障。上述第一发射器是由一第三供应电压以及一第二接地端所供电,且可根据上述输入信号发送一第一射频信号。上述第一接收器是由一第二供应电压以及上述开关电压所供电,且可根据上述第一射频信号产生上述第一控制信号。上述第一隔离阻障用以将上述第一发射器以及上述第一接收器之间电性隔离。上述第二子隔离器包括一第二发射器、一第二接收器以及一第二隔离阻障。上述第二发射器是由一第三供应电压以及一第二接地端所供电,且可根据上述输入信号发送一第二射频信号。上述第二接收器是由上述第一供应电压以及上述第一接地端所供电,且可根据上述第二射频信号产生上述第二控制信号。上述第二隔离阻障用以将上述第二发射器以及上述第二接收器之间电性隔离。According to an embodiment of the present invention, the above-mentioned isolator includes a first sub-isolator and a second sub-isolator. The first sub-isolator includes a first transmitter, a first receiver, and a first isolation barrier. The first transmitter is powered by a third supply voltage and a second ground terminal, and can transmit a first radio frequency signal according to the input signal. The first receiver is powered by a second supply voltage and the switching voltage, and can generate the first control signal according to the first radio frequency signal. The first isolation barrier is used to electrically isolate the first transmitter and the first receiver. The second sub-isolator includes a second transmitter, a second receiver, and a second isolation barrier. The second transmitter is powered by a third supply voltage and a second ground terminal, and can transmit a second radio frequency signal according to the input signal. The second receiver is powered by the first supply voltage and the first ground terminal, and can generate the second control signal according to the second radio frequency signal. The second isolation barrier is used to electrically isolate the second transmitter and the second receiver.

根据本发明的一实施例,上述隔离器包括一发射器、一第一接收器、一第一隔离阻障、一第二接收器以及一第二隔离阻障。上述发射器是由一第三供应电压以及一第二接地端所供电,且可根据上述输入信号发送一第一射频信号以及一第二射频信号。上述第一接收器是由上述第二供应电压以及上述开关电压所供电,且可根据上述第一射频信号产生上述第一控制信号。上述第一隔离阻障用以将上述发射器以及上述第一接收器之间电性隔离。上述第二接收器是由上述第一供应电压以及上述第一接地端所供电,且可根据上述第一射频信号产生上述第二控制信号。上述第二隔离阻障用以将上述发射器以及上述第二接收器之间电性隔离。According to an embodiment of the present invention, the above-mentioned isolator includes a transmitter, a first receiver, a first isolation barrier, a second receiver, and a second isolation barrier. The transmitter is powered by a third supply voltage and a second ground terminal, and can transmit a first radio frequency signal and a second radio frequency signal according to the input signal. The first receiver is powered by the second supply voltage and the switching voltage, and can generate the first control signal according to the first radio frequency signal. The first isolation barrier is used to electrically isolate the transmitter and the first receiver. The second receiver is powered by the first supply voltage and the first ground terminal, and can generate the second control signal according to the first radio frequency signal. The second isolation barrier is used to electrically isolate the transmitter and the second receiver.

根据本发明的一实施例,上述解耦合电容耦接于上述高电压以及上述第一接地端之间。According to an embodiment of the present invention, the decoupling capacitor is coupled between the high voltage and the first ground terminal.

根据本发明的一实施例,上述第一电力电路以及上述第二电力电路的每一者包括一前置驱动电路。上述前置驱动电路可根据一控制信号产生上述第一内部信号,其中上述前置驱动电路用以增进上述控制信号的驱动能力,其中一驱动电路根据上述第一内部信号,产生一驱动电压。According to an embodiment of the present invention, each of the first power circuit and the second power circuit includes a pre-driver circuit. The pre-driving circuit can generate the first internal signal according to a control signal, wherein the pre-driving circuit is used to improve the driving capability of the control signal, and a driving circuit generates a driving voltage according to the first internal signal.

根据本发明的一实施例,上述第一电力电路以及上述第二电力电路的每一者包括一上桥晶体管、一下桥晶体管以及一电荷泵。上述上桥晶体管可根据一上桥节点的一上桥电压,将一供应电压提供至一驱动节点。上述下桥晶体管可根据上述第一内部信号,将上述驱动节点耦接至一接地端。上述电荷泵耦接至上述上桥节点以及上述驱动节点,其中上述电荷泵用以根据上述第一内部信号,产生超过上述供应电压的上述上桥电压。According to an embodiment of the present invention, each of the first power circuit and the second power circuit includes an upper-bridge transistor, a lower-bridge transistor, and a charge pump. The above-mentioned high-bridge transistor can provide a supply voltage to a driving node according to a high-bridge voltage of a high-bridge node. The lower bridge transistor can couple the driving node to a ground terminal according to the first internal signal. The charge pump is coupled to the upper bridge node and the driving node, wherein the charge pump is used for generating the upper bridge voltage exceeding the supply voltage according to the first internal signal.

根据本发明的一实施例,上述上桥晶体管以及上述下桥晶体管皆为常闭晶体管。According to an embodiment of the present invention, the upper-bridge transistor and the lower-bridge transistor are both normally-off transistors.

本发明还提出一种制造方法,用以制造一封装结构,包括:提供一解耦合电容放置于一基板上;提供一集成电路放置于上述基板上;The present invention also provides a manufacturing method for manufacturing a package structure, comprising: providing a decoupling capacitor and placing it on a substrate; providing an integrated circuit and placing it on the substrate;

通过一第一介电质固定上述解耦合电容以及上述集成电路,并形成一第一介电层;形成一导线层于上述第一介电层之上,使得上述解耦合电容通过上述导线层电性耦接至上述集成电路;以及通过一第二介电质固定上述导线层以及上述第一介电层,并形成一第二介电层放置于上述第一介电层之上。The decoupling capacitor and the integrated circuit are fixed by a first dielectric, and a first dielectric layer is formed; a wire layer is formed on the first dielectric layer, so that the decoupling capacitor is electrically connected through the wire layer. coupled to the integrated circuit; and fix the wire layer and the first dielectric layer through a second dielectric, and form a second dielectric layer and place it on the first dielectric layer.

根据本发明的一实施例,上述提供上述解耦合电容放置于上述基板上的步骤还包括:形成一第一导电单元于上述第一介电层中;形成一第一介电单元于上述第一导电单元之上;以及形成一第二导电单元于上述第一介电单元之上。According to an embodiment of the present invention, the step of providing the decoupling capacitor and placing it on the substrate further includes: forming a first conductive unit in the first dielectric layer; forming a first dielectric unit on the first on the conductive unit; and forming a second conductive unit on the first dielectric unit.

根据本发明的一实施例,制造方法还包括:提供一自举电容于上述基板上;以及通过上述第一介电质固定上述自举电容、解耦合电容以及上述集成电路,并形成上述第一介电层。According to an embodiment of the present invention, the manufacturing method further includes: providing a bootstrap capacitor on the substrate; and fixing the bootstrap capacitor, the decoupling capacitor and the integrated circuit through the first dielectric, and forming the first dielectric layer.

根据本发明的一实施例,上述提供上述自举电容放置于上述基板上的步骤还包括:形成一第三导电单元于上述第一介电层中;形成一第二介电单元于上述第三导电单元之上;以及形成一第四导电单元于上述第二介电单元之上。According to an embodiment of the present invention, the step of providing the bootstrap capacitor to be placed on the substrate further includes: forming a third conductive unit in the first dielectric layer; forming a second dielectric unit on the third on the conductive unit; and forming a fourth conductive unit on the second dielectric unit.

根据本发明的一实施例,上述集成电路包括一隔离器、一第一电力电路以及一第二电力电路。上述隔离器包括一第一供应节点、一第二供应节点、一第三供应节点、一第四供应节点、一第一参考节点、一第二参考节点、一第三参考节点、一第四参考节点、一第一输入节点、一第二输入节点、一第一输出节点以及一第二输出节点。上述第一电力电路包括耦接至上述第二供应节点的一第五供应节点、一第六供应节点、耦接至上述第二参考节点的一第五参考节点以及耦接至第一输出节点的一第一PWM节点。上述第二电力电路包括耦接至上述第四供应节点的一第七供应节点、耦接至上述第五参考节点的一第八参考节点、一第六参考节点以及耦接至上述第二输出节点的一第二PWM节点。According to an embodiment of the present invention, the above-mentioned integrated circuit includes an isolator, a first power circuit and a second power circuit. The isolator includes a first supply node, a second supply node, a third supply node, a fourth supply node, a first reference node, a second reference node, a third reference node, and a fourth reference node node, a first input node, a second input node, a first output node, and a second output node. The first power circuit includes a fifth supply node coupled to the second supply node, a sixth supply node, a fifth reference node coupled to the second reference node, and a power supply coupled to the first output node. a first PWM node. The second power circuit includes a seventh supply node coupled to the fourth supply node, an eighth reference node coupled to the fifth reference node, a sixth reference node and coupled to the second output node a second PWM node.

根据本发明的一实施例,制造方法还包括:形成一第一导电层于上述基板之上,其中上述第一电力电路以及上述自举电容放置于上述第一导电层之上。上述第一导电层耦接至上述自举电容的一第一端以及上述第五参考节点,上述自举电容的一第二端通过上述导线层耦接至上述第五供应节点,其中上述第六供应节点通过上述导线层耦接至上述解耦合电容的一第三端。According to an embodiment of the present invention, the manufacturing method further includes: forming a first conductive layer on the substrate, wherein the first power circuit and the bootstrap capacitor are placed on the first conductive layer. The first conductive layer is coupled to a first end of the bootstrap capacitor and the fifth reference node, a second end of the bootstrap capacitor is coupled to the fifth supply node through the wire layer, wherein the sixth The supply node is coupled to a third terminal of the decoupling capacitor through the wire layer.

根据本发明的一实施例,制造方法还包括:形成一第二导电层于上述基板之上。上述第二电力电路以及上述解耦合电容放置于上述第二导电层之上,其中上述第二导电层耦接至上述解耦合电容的一第四端以及一第六参考节点。According to an embodiment of the present invention, the manufacturing method further includes: forming a second conductive layer on the substrate. The second power circuit and the decoupling capacitor are placed on the second conductive layer, wherein the second conductive layer is coupled to a fourth end of the decoupling capacitor and a sixth reference node.

根据本发明的一实施例,制造方法还包括:形成一第三导电层于上述基板之上,其中上述隔离器位于上述第三导电层之上。According to an embodiment of the present invention, the manufacturing method further includes: forming a third conductive layer on the substrate, wherein the spacer is located on the third conductive layer.

根据本发明的一实施例,上述第一供应节点以及上述第三供应节点是由一第三供应电压所供电,上述第二供应节点以及上述第五供应节点是由一第二供应电压所供电,上述第一输入节点接收一输入信号,上述第二输入节点接收一反相输入信号,上述第一输出节点产生一第一控制信号,上述第二输出节点产生一第二控制信号,上述第四供应节点以及上述第七供应节点是由一第一供应电压所供电,上述第六供应节点是由一高电压所供电,上述第一参考节点以及上述第三参考节点耦接至一第二接地端,上述第四参考节点以及上述第六参考节点耦接至一第一接地端,其中上述输入信号以及上述反相输入信号为反相。According to an embodiment of the present invention, the first supply node and the third supply node are powered by a third supply voltage, the second supply node and the fifth supply node are powered by a second supply voltage, The first input node receives an input signal, the second input node receives an inverted input signal, the first output node generates a first control signal, the second output node generates a second control signal, and the fourth supply The node and the seventh supply node are powered by a first supply voltage, the sixth supply node is powered by a high voltage, the first reference node and the third reference node are coupled to a second ground terminal, The fourth reference node and the sixth reference node are coupled to a first ground terminal, wherein the input signal and the inverted input signal are inverted.

根据本发明的一实施例,上述第一电力电路包括一第一驱动电路以及一第一功率晶体管。上述第一驱动电路由上述第二供应电压以及一开关电压所供电,且根据上述第一控制信号于一第一驱动节点产生一第一驱动电压。上述第一功率晶体管根据上述第一驱动电压,将上述第六供应节点耦接至上述第五参考节点。According to an embodiment of the present invention, the first power circuit includes a first driving circuit and a first power transistor. The first driving circuit is powered by the second supply voltage and a switching voltage, and generates a first driving voltage at a first driving node according to the first control signal. The first power transistor couples the sixth supply node to the fifth reference node according to the first driving voltage.

根据本发明的一实施例,上述第二电力电路包括一第二驱动电路以及一第二功率晶体管。上述第二驱动电路由上述第一供应电压以及一第一接地端所供电,且根据上述第二控制信号于一第二驱动节点产生一第二驱动电压。上述第二功率晶体管根据上述第二驱动电压,将一第八供应节点耦接至上述第一接地端。According to an embodiment of the present invention, the second power circuit includes a second driving circuit and a second power transistor. The second driving circuit is powered by the first supply voltage and a first ground terminal, and generates a second driving voltage at a second driving node according to the second control signal. The second power transistor couples an eighth supply node to the first ground terminal according to the second driving voltage.

根据本发明的一实施例,上述第一功率晶体管以及上述第二功率晶体管的任一者为一氮化镓晶体管。According to an embodiment of the present invention, any one of the first power transistor and the second power transistor is a gallium nitride transistor.

根据本发明的一实施例,上述集成电路还包括一自举二极管。上述自举二极管包括一自举阳极端以及一自举阴极端,其中上述自举阳极关系耦接至一第一供应电压,上述自举阴极端耦接至一第二供应电压。According to an embodiment of the present invention, the above-mentioned integrated circuit further includes a bootstrap diode. The bootstrap diode includes a bootstrap anode terminal and a bootstrap cathode terminal, wherein the bootstrap anode terminal is coupled to a first supply voltage, and the bootstrap cathode terminal is coupled to a second supply voltage.

根据本发明的一实施例,上述高电压超过上述第一供应电压以及上述第二供应电压。According to an embodiment of the present invention, the high voltage exceeds the first supply voltage and the second supply voltage.

根据本发明的一实施例,上述隔离器包括一第一子隔离器以及一第二子隔离器。上述第一子隔离器包括:一第一发射器、一第一接收器以及一第一隔离阻障。上述第一发射器是由一第三供应电压以及一第二接地端所供电,且根据上述输入信号发送一第一射频信号。上述第一接收器是由一第二供应电压以及上述开关电压所供电,且根据上述第一射频信号产生上述第一控制信号。上述第一隔离阻障用以将上述第一发射器以及上述第一接收器之间电性隔离。上述第二子隔离器包括一第二发射器、一第二接收器以及一第二隔离阻障。上述第二发射器是由一第三供应电压以及一第二接地端所供电,且根据上述输入信号发送一第二射频信号。上述第二接收器是由上述第一供应电压以及上述第一接地端所供电,且根据上述第二射频信号产生上述第二控制信号。上述第二隔离阻障用以将上述第二发射器以及上述第二接收器之间电性隔离。According to an embodiment of the present invention, the above-mentioned isolator includes a first sub-isolator and a second sub-isolator. The above-mentioned first sub-isolator includes: a first transmitter, a first receiver and a first isolation barrier. The first transmitter is powered by a third supply voltage and a second ground terminal, and transmits a first radio frequency signal according to the input signal. The first receiver is powered by a second supply voltage and the switching voltage, and generates the first control signal according to the first radio frequency signal. The first isolation barrier is used to electrically isolate the first transmitter and the first receiver. The second sub-isolator includes a second transmitter, a second receiver, and a second isolation barrier. The second transmitter is powered by a third supply voltage and a second ground terminal, and transmits a second radio frequency signal according to the input signal. The second receiver is powered by the first supply voltage and the first ground terminal, and generates the second control signal according to the second radio frequency signal. The second isolation barrier is used to electrically isolate the second transmitter and the second receiver.

根据本发明的一实施例,上述第一电力电路以及上述第二电路的每一者包括一前置驱动电路。上述前置驱动电路根据一控制信号产生上述第一内部信号,其中上述前置驱动电路用以增进上述控制信号的驱动能力,其中一驱动电路根据上述第一内部信号,产生一驱动电压。According to an embodiment of the present invention, each of the first power circuit and the second circuit includes a pre-driver circuit. The pre-driving circuit generates the first internal signal according to a control signal, wherein the pre-driving circuit is used to improve the driving capability of the control signal, and a driving circuit generates a driving voltage according to the first internal signal.

根据本发明的一实施例,上述第一电力电路以及上述第二电路的每一者包括一上桥晶体管、一下桥晶体管以及一电荷泵。上述上桥晶体管根据一上桥节点的一上桥电压,将一供应电压提供至一驱动节点。上述下桥晶体管根据上述第一内部信号,将上述驱动节点耦接至一接地端。上述电荷泵耦接至上述上桥节点以及上述驱动节点,其中上述电荷泵用以根据上述第一内部信号,产生超过上述供应电压的上述上桥电压。According to an embodiment of the present invention, each of the first power circuit and the second circuit includes an upper-bridge transistor, a lower-bridge transistor, and a charge pump. The above-mentioned upper bridge transistor provides a supply voltage to a driving node according to an upper bridge voltage of an upper bridge node. The lower bridge transistor couples the driving node to a ground terminal according to the first internal signal. The charge pump is coupled to the upper bridge node and the driving node, wherein the charge pump is used for generating the upper bridge voltage exceeding the supply voltage according to the first internal signal.

根据本发明的一实施例,上述第一电力电路以及上述第二电路的每一者包括一迟滞电路。上述迟滞电路耦接于上述控制信号以及上述前置驱动电路之间,其中上述迟滞电路接收上述控制信号而产生一第二内部信号,使得上述前置驱动电路根据上述第二内部信号而产生上述第一内部信号,其中上述迟滞电路用以提供一迟滞功能给上述控制信号。According to an embodiment of the present invention, each of the first power circuit and the second circuit includes a hysteresis circuit. The hysteresis circuit is coupled between the control signal and the pre-driver circuit, wherein the hysteresis circuit receives the control signal and generates a second internal signal, so that the pre-driver circuit generates the first internal signal according to the second internal signal. an internal signal, wherein the hysteresis circuit is used to provide a hysteresis function to the control signal.

附图说明Description of drawings

图1显示一般的电力电路;Figure 1 shows a general power circuit;

图2显示根据本发明的一实施例所述的电力电路的方框图;FIG. 2 shows a block diagram of a power circuit according to an embodiment of the present invention;

图3显示根据本发明的一实施例所述的图2的电力电路200的电荷泵的电路图;FIG. 3 shows a circuit diagram of the charge pump of the power circuit 200 of FIG. 2 according to an embodiment of the present invention;

图4显示根据本发明的另一实施例所述的电力电路的方框图;FIG. 4 shows a block diagram of a power circuit according to another embodiment of the present invention;

图5显示根据本发明的另一实施例所述的电力电路的方框图;FIG. 5 shows a block diagram of a power circuit according to another embodiment of the present invention;

图6显示根据本发明的另一实施例所述的电力电路的方框图;FIG. 6 shows a block diagram of a power circuit according to another embodiment of the present invention;

图7显示根据本发明的另一实施例所述的电力电路的方框图;7 shows a block diagram of a power circuit according to another embodiment of the present invention;

图8显示根据本发明的另一实施例所述的电力电路的方框图;8 shows a block diagram of a power circuit according to another embodiment of the present invention;

图9显示根据本发明的另一实施例所述的电力电路的方框图;9 shows a block diagram of a power circuit according to another embodiment of the present invention;

图10显示根据本发明的另一实施例所述的电力电路的方框图;10 shows a block diagram of a power circuit according to another embodiment of the present invention;

图11显示根据本发明的另一实施例所述的集成电路的方框图;11 shows a block diagram of an integrated circuit according to another embodiment of the present invention;

图12显示根据本发明的另一实施例所述的集成电路的方框图;12 shows a block diagram of an integrated circuit according to another embodiment of the present invention;

图13显示根据本发明的另一实施例所述的集成电路的方框图;13 shows a block diagram of an integrated circuit according to another embodiment of the present invention;

图14显示根据本发明的一实施例所述的封装结构的上视图;14 shows a top view of a package structure according to an embodiment of the present invention;

图15显示根据本发明的一实施例所述的封装结构的剖面图;15 shows a cross-sectional view of a package structure according to an embodiment of the present invention;

图16A-图16B显示根据本发明的一实施例所述的第一电力电路的上视图以及剖面图;以及16A-16B show a top view and a cross-sectional view of a first power circuit according to an embodiment of the present invention; and

图17A-图17F显示根据本发明的一实施例所述的图14的封装结构1400以及图15的封装结构1500的制造流程图。FIGS. 17A-17F show a manufacturing flow chart of the package structure 1400 of FIG. 14 and the package structure 1500 of FIG. 15 according to an embodiment of the present invention.

附图标记说明:Description of reference numbers:

100、200、400、500、600、700、800、900、1000 电力电路100, 200, 400, 500, 600, 700, 800, 900, 1000 Power Circuits

110A 第一功率晶体管110A first power transistor

110B 第二功率晶体管110B second power transistor

210、410、510、610、710、810、910 功率晶体管210, 410, 510, 610, 710, 810, 910 power transistors

220、420、520、620、720、820、920、1020 驱动电路220, 420, 520, 620, 720, 820, 920, 1020 drive circuit

221 上桥晶体管221 high-side transistor

222 下桥晶体管222 lower bridge transistor

230 电荷泵230 Charge Pump

310 第一单向导通装置310 The first one-way conduction device

320 第二单向导通装置320 Second one-way conduction device

330 第三单向导通装置330 Third one-way conduction device

340 开关340 switches

421 上桥晶体管421 high-side transistor

423 上桥常导通晶体管423 High Bridge Normally On Transistor

530 第一前置驱动电路530 first pre-driver circuit

531 第一常导通晶体管531 The first normally on transistor

532 第一常闭晶体管532 The first normally closed transistor

630、730 第一前置驱动电路630, 730 first pre-driver circuit

640、740 第二前置驱动电路640, 740 second pre-driver circuit

641 第二常导通晶体管641 Second normally on transistor

642 第二常闭晶体管642 Second normally closed transistor

750、850、950、1050 第一迟滞电路750, 850, 950, 1050 first hysteresis circuit

751 第三常闭晶体管751 Third normally closed transistor

752 第四常闭晶体管752 Fourth normally closed transistor

753 第五常闭晶体管753 Fifth normally closed transistor

830、930、1030 前置驱动电路830, 930, 1030 pre-driver circuit

931、1031 第一子前置驱动电路931, 1031 The first sub-pre-driver circuit

932、1032 第二子前置驱动电路932, 1032 Second sub-pre-driver circuit

1033 第三子前置驱动电路1033 The third sub-pre-driver circuit

1034 第四子前置驱动电路1034 Fourth sub-pre-driver circuit

1100、1200、1300 集成电路1100, 1200, 1300 integrated circuits

1110 隔离器1110 Isolator

1120 第一电力电路1120 First power circuit

1121 第一驱动电路1121 The first drive circuit

1122 第一功率晶体管1122 first power transistor

1130 第二电力电路1130 Second power circuit

1131 第二驱动电路1131 Second drive circuit

1132 第二功率晶体管1132 second power transistor

1400、1500 封装结构1400, 1500 package structure

1401 第一导电层1401 The first conductive layer

1402 第二导电层1402 second conductive layer

1403 第三导电层1403 The third conductive layer

1411 第一导体1411 First conductor

1412 第二导体1412 Second conductor

1510 第一介电层1510 first dielectric layer

1520 第二介电层1520 second dielectric layer

1520a 第一固定层1520a First pinned layer

1520b 第二固定层1520b second fixed layer

1521 导线层1521 Wire Layer

1521a 第一金属单元1521a First Metal Unit

1521b 金属单元1521b Metal Unit

1522 第一导电单元1522 The first conductive unit

1523 第一介电单元1523 First Dielectric Unit

1524 第二导电单元1524 Second Conductive Unit

1525 第三导电单元1525 Third Conductive Unit

1526 第二介电单元1526 Second Dielectric Unit

1527 第四导电单元1527 Fourth Conductive Unit

14 基板14 substrate

141 第一载体141 The first carrier

142 第二载体142 Second carrier

143 第三载体143 Third Carrier

DB 自举二极管DB bootstrap diode

CB 自举电容CB bootstrap capacitor

NBA 自举阳极NBA bootstrap anode

NBC 自举阴极NBC Bootstrap Cathode

NSW 开关节点NSW switch node

SIN 输入信号SIN input signal

SC1 第一控制信号SC1 first control signal

SC2 第二控制信号SC2 second control signal

SIN 输入信号SIN input signal

SINB 反相输入信号SINB inverted input signal

VDD1 第一供应电压VDD1 first supply voltage

VDD2 第二供应电压VDD2 second supply voltage

VDD3 第三供应电压VDD3 third supply voltage

VSW 开关电压VSW switch voltage

VD1 第一驱动电压VD1 first drive voltage

VD2 第二驱动电压VD2 second driving voltage

VHV 高电压VHV high voltage

GND1 第一接地端GND1 first ground terminal

GND2 第二接地端GND2 Second ground terminal

TX 发射器TX transmitter

T1 第一发射器T1 first transmitter

T2 第二发射器T2 second transmitter

R1 第一接收器R1 first receiver

R2 第二接收器R2 second receiver

IB1 第一隔离阻障IB1 First Isolation Barrier

IB2 第二隔离阻障IB2 Second Isolation Barrier

RF1 第一射频信号RF1 first radio frequency signal

RF2 第二射频信号RF2 second radio frequency signal

CD 解耦合电容CD Decoupling Capacitor

NR5 第五参考节点NR5 Fifth Reference Node

NR6 第六参考节点NR6 sixth reference node

S1、S2 源极端S1, S2 source terminal

G1 栅极端G1 gate terminal

D1 漏极端D1 drain terminal

H 孔洞H hole

C 电容C Capacitor

CB 升压电容CB boost capacitor

DRV1 上桥驱动电路DRV1 upper bridge driver circuit

DRV2 下桥驱动电路DRV2 lower bridge driver circuit

DB 升压二极管DB boost diode

E1 第一子常闭晶体管E1 first sub normally closed transistor

E2 第二子常闭晶体管E2 Second sub normally closed transistor

E3 第三子常闭晶体管E3 third sub normally closed transistor

E4 第四子常闭晶体管E4 fourth sub normally closed transistor

E5 第五子常闭晶体管E5 fifth sub normally closed transistor

E6 第六子常闭晶体管E6 sixth sub normally closed transistor

E7 第七子常闭晶体管E7 seventh sub normally closed transistor

E8 第八子常闭晶体管E8 Eighth sub normally closed transistor

D1 第一子常导通晶体管D1 first sub normally-on transistor

D2 第二子常导通晶体管D2 Second sub normally-on transistor

D3 第三子常导通晶体管D3 third sub normally on transistor

D4 第四子常导通晶体管D4 fourth sub normally-on transistor

L 电感L Inductance

IP 功率电流IP power current

R1 第一电阻R1 first resistor

R2 第二电阻R2 second resistor

RL 负载装置RL load device

RD 放电电阻RD discharge resistance

SW 切换节点SW switch node

VB 升压电压VB boost voltage

VDD 供应电压VDD supply voltage

VD 驱动电压VD drive voltage

VH 上桥电压VH high-side voltage

VIN 输入电压VIN input voltage

SC 控制信号SC control signal

SB1 第一子内部信号SB1 First sub internal signal

SB2 第二子内部信号SB2 Second sub internal signal

SB3 第三子内部信号SB3 Third sub internal signal

SI1 第一内部信号SI1 First internal signal

SI2 第二内部信号SI2 Second internal signal

SI3 第三内部信号SI3 Third internal signal

ND 驱动节点ND driver node

NH 上桥节点NH bridge node

N1 第一节点N1 first node

N2 第二节点N2 second node

N3 第三节点N3 third node

N4 第四节点N4 fourth node

具体实施方式Detailed ways

以下说明为本发明的实施例。其目的是要举例说明本发明一般性的原则,不应视为本发明的限制,本发明的范围当以相关申请文件所界定者为准。The following descriptions are examples of the present invention. Its purpose is to illustrate the general principles of the present invention, and should not be regarded as a limitation of the present invention, and the scope of the present invention should be defined by the relevant application documents.

值得注意的是,以下所公开的内容可提供多个用以实践本发明的不同特点的实施例或范例。以下所述的特殊的元件范例与安排仅用以简单扼要地阐述本发明的构思,并非用以限定本发明的范围。此外,以下说明书可能在多个范例中重复使用相同的元件符号或文字。然而,重复使用的目的仅为了提供简化并清楚的说明,并非用以限定多个以下所讨论的实施例以及/或配置之间的关系。此外,以下说明书所述的一个特征连接至、耦接至以及/或形成于另一特征之上等的描述,实际可包含多个不同的实施例,包括该等特征直接接触,或者包含其它额外的特征形成于该等特征之间等等,使得该等特征并非直接接触。Notably, the following disclosure may provide multiple embodiments or examples for practicing various features of the present invention. The specific component examples and arrangements described below are only used to briefly and briefly illustrate the concept of the present invention, and are not intended to limit the scope of the present invention. Furthermore, the following description may reuse the same reference numerals or words in multiple instances. However, the purpose of re-use is merely to provide a simplified and clear illustration, and not to limit the relationship between the various embodiments and/or configurations discussed below. Furthermore, descriptions in the following description of a feature being connected to, coupled to and/or formed on another feature, etc., may actually encompass a number of different embodiments, including direct contact of the feature, or including other additional The features are formed between the features, etc., such that the features are not in direct contact.

图2显示根据本发明的一实施例所述的电力电路的方框图。如图2所示,电力电路200包括功率晶体管210以及驱动电路220。功率晶体管210根据驱动节点ND的驱动电压VD,而汲取功率电流IP。根据本发明的一实施例,功率晶体管210为氮化镓(GaN)晶体管。FIG. 2 shows a block diagram of a power circuit according to an embodiment of the present invention. As shown in FIG. 2 , the power circuit 200 includes a power transistor 210 and a driving circuit 220 . The power transistor 210 draws the power current IP according to the driving voltage VD of the driving node ND. According to an embodiment of the present invention, the power transistor 210 is a gallium nitride (GaN) transistor.

驱动电路220包括上桥晶体管221、下桥晶体管222以及电荷泵230。上桥晶体管221根据上桥节点NH的上桥电压VH,将供应电压VDD供应至驱动节点ND。下桥晶体管222耦接于驱动节点ND以及接地端之间,并且根据控制信号SC而将驱动电压VD拉至接地位准(电平)。根据本发明的一实施例,上桥晶体管221以及下桥晶体管222为常闭晶体管。The driving circuit 220 includes an upper bridge transistor 221 , a lower bridge transistor 222 and a charge pump 230 . The upper bridge transistor 221 supplies the supply voltage VDD to the driving node ND according to the upper bridge voltage VH of the upper bridge node NH. The lower bridge transistor 222 is coupled between the driving node ND and the ground terminal, and pulls the driving voltage VD to the ground level (level) according to the control signal SC. According to an embodiment of the present invention, the upper bridge transistor 221 and the lower bridge transistor 222 are normally closed transistors.

电荷泵230是由供应电压VDD以及接地端所供应,并且电荷泵230耦接至上桥节点NH以及驱动节点ND。为了完全导通上桥晶体管221,电荷泵230用以产生超过供应电压VDD的上桥电压VH,使得上桥晶体管221的栅极-源极电压至少超过阈值电压(临限电压)而将供应电压VDD施加至驱动节点ND。根据本发明的一实施例,驱动电路220为满摆幅(rail-to-rail)驱动电路,使得驱动电压VD的范围从供应电压VDD至接地位准。The charge pump 230 is supplied by the supply voltage VDD and the ground terminal, and the charge pump 230 is coupled to the upper bridge node NH and the driving node ND. In order to turn on the high-side transistor 221 completely, the charge pump 230 is used to generate the high-side voltage VH that exceeds the supply voltage VDD, so that the gate-source voltage of the high-side transistor 221 at least exceeds the threshold voltage (threshold voltage) to supply the voltage VDD is applied to the drive node ND. According to an embodiment of the present invention, the driving circuit 220 is a rail-to-rail driving circuit, so that the driving voltage VD ranges from the supply voltage VDD to the ground level.

图3显示根据本发明的一实施例所述的图2的电力电路200的电荷泵的电路图。如图3所示,耦接至驱动节点ND以及上桥节点NH的电荷泵300包括第一单向导通装置310、放电电阻RD、电容C、第二单向导通装置320、第三单向导通装置330以及开关340。FIG. 3 shows a circuit diagram of the charge pump of the power circuit 200 of FIG. 2 according to an embodiment of the present invention. As shown in FIG. 3 , the charge pump 300 coupled to the driving node ND and the upper bridge node NH includes a first one-way conduction device 310, a discharge resistor RD, a capacitor C, a second one-way conduction device 320, and a third one-way conduction device 320. device 330 and switch 340 .

当供应电压VDD超过第一节点N1的电压时,第一单向导通装置310为导通。当供应电压VDD并未超过第一节点N1的电压时,第一单向导通装置310为不导通。电容C耦接于第一节点N1以及第二节点N2之间,放电电阻RD耦接于第一节点N1以及上桥节点NH之间。When the supply voltage VDD exceeds the voltage of the first node N1, the first unidirectional conduction device 310 is turned on. When the supply voltage VDD does not exceed the voltage of the first node N1, the first unidirectional conduction device 310 is non-conductive. The capacitor C is coupled between the first node N1 and the second node N2, and the discharge resistor RD is coupled between the first node N1 and the upper bridge node NH.

第二单向导通装置320耦接于第二节点N2以及上桥节点NH之间。当第二节点N2的电压超过上桥电压VH时,第二单向导通装置320为导通。当第二节点N2的电压并未超过上桥电压VH时,第二单向导通装置320为不导通。The second unidirectional conduction device 320 is coupled between the second node N2 and the upper bridge node NH. When the voltage of the second node N2 exceeds the upper bridge voltage VH, the second unidirectional conduction device 320 is turned on. When the voltage of the second node N2 does not exceed the upper bridge voltage VH, the second unidirectional conduction device 320 is non-conductive.

第三单向导通装置330耦接于驱动节点ND以及第二节点N2之间。当驱动节点ND的驱动电压VD超过第二节点N2的电压时,第三单向导通装置330为导通。当驱动电压VD并未超过第二节点N2的电压时,第三单向导通装置330为不导通。The third unidirectional conduction device 330 is coupled between the driving node ND and the second node N2. When the driving voltage VD of the driving node ND exceeds the voltage of the second node N2, the third unidirectional conduction device 330 is turned on. When the driving voltage VD does not exceed the voltage of the second node N2, the third one-way conduction device 330 is non-conductive.

开关340接收控制信号SC,且耦接于上桥节点NH以及接地端之间。此外,开关340用以根据控制信号SC,将上桥节点NH耦接至接地端。The switch 340 receives the control signal SC and is coupled between the upper bridge node NH and the ground terminal. In addition, the switch 340 is used for coupling the upper bridge node NH to the ground terminal according to the control signal SC.

为了简化说明,开关340在此是以N型晶体管作为一举例。根据本发明的一实施例,当控制信号SC位于高电压位准(如,供应电压VDD)时,开关340为导通且供应电压VDD对电容C充电且经由第一单向导通装置310、第二单向导通装置320以及开关340而至接地端。To simplify the description, the switch 340 is taken as an example of an N-type transistor. According to an embodiment of the present invention, when the control signal SC is at a high voltage level (eg, the supply voltage VDD), the switch 340 is turned on and the supply voltage VDD charges the capacitor C and passes through the first one-way conduction device 310, the second The two one-way conducting devices 320 and the switch 340 are connected to the ground.

根据本发明的另一实施例,当控制信号SC位于低电压位准(如接地位准)时,开关340为不导通,并且第三单向导通装置330提供驱动电压VD至第二节点N2,使得电容C通过放电电阻RD而放电至驱动节点ND。According to another embodiment of the present invention, when the control signal SC is at a low voltage level (eg, ground level), the switch 340 is non-conductive, and the third unidirectional conduction device 330 provides the driving voltage VD to the second node N2 , so that the capacitor C is discharged to the drive node ND through the discharge resistor RD.

根据本发明的一实施例,放电电阻RD的电阻值决定电容C所能充电的最高电压,也决定了上桥电压VH所能到达的最高电压。此外,放电电阻RD的电阻值越大,就会造成上桥电压VD的上升时间越慢。因此,放电电阻RD的电阻值存在着权衡取舍(trade-off)。According to an embodiment of the present invention, the resistance value of the discharge resistor RD determines the highest voltage that the capacitor C can charge, and also determines the highest voltage that the high-bridge voltage VH can reach. In addition, the larger the resistance value of the discharge resistor RD is, the slower the rise time of the upper bridge voltage VD will be. Therefore, there is a trade-off in the resistance value of the discharge resistor RD.

根据本发明的一实施例,第一单向导通装置310、第二单向导通装置320以及第三单向导通装置330的每一者为二极管。根据本发明的其他实施例,第一单向导通装置310、第二单向导通装置320以及第三单向导通装置330的每一者为耦接成二极管形式的常闭晶体管。According to an embodiment of the present invention, each of the first one-way conduction device 310 , the second one-way conduction device 320 and the third one-way conduction device 330 is a diode. According to other embodiments of the present invention, each of the first one-way conduction device 310 , the second one-way conduction device 320 and the third one-way conduction device 330 is a normally-off transistor coupled in the form of a diode.

图4显示根据本发明的另一实施例所述的电力电路的方框图。如图4所示的电力电路400中,功率晶体管410以及驱动电路420分别对应至图2的功率晶体管210以及驱动电路220。FIG. 4 shows a block diagram of a power circuit according to another embodiment of the present invention. In the power circuit 400 shown in FIG. 4 , the power transistor 410 and the driving circuit 420 correspond to the power transistor 210 and the driving circuit 220 in FIG. 2 , respectively.

驱动电路420还包括上桥常导通晶体管423。上桥常导通晶体管423的源极端以及栅极端皆耦接至驱动节点ND,上桥常导通晶体管423的漏极端是由供应电压VDD所供电。上桥常导通晶体管423为持续导通,用以增进上桥晶体管221的驱动能力。The driving circuit 420 also includes a high-bridge normally-on transistor 423 . Both the source terminal and the gate terminal of the high-bridge normally-on transistor 423 are coupled to the driving node ND, and the drain terminal of the high-bridge normally-on transistor 423 is powered by the supply voltage VDD. The high-bridge normally-on transistor 423 is continuously turned on to improve the driving capability of the high-bridge transistor 221 .

图5显示根据本发明的另一实施例所述的电力电路的方框图。如图5所示,电力电路500包括功率晶体管510、驱动电路520以及第一前置驱动电路530,其中功率晶体管510以及驱动电路520分别对应至图2的功率晶体管210以及驱动电路220。FIG. 5 shows a block diagram of a power circuit according to another embodiment of the present invention. As shown in FIG. 5 , the power circuit 500 includes a power transistor 510 , a driving circuit 520 and a first pre-driving circuit 530 , wherein the power transistor 510 and the driving circuit 520 correspond to the power transistor 210 and the driving circuit 220 in FIG. 2 , respectively.

第一前置驱动电路530接收控制信号SC而产生第一内部信号SI1至驱动电路520,用以增进控制信号SC的驱动能力。第一前置驱动电路530包括第一常导通晶体管531以及第一常闭晶体管532。The first pre-driving circuit 530 receives the control signal SC to generate a first internal signal SI1 to the driving circuit 520 for improving the driving capability of the control signal SC. The first pre-driver circuit 530 includes a first normally-on transistor 531 and a first normally-off transistor 532 .

第一常导通晶体管531的栅极端以及源极端皆耦接至驱动电路520,并且第一常导通晶体管531的漏极端是由供应电压所供电。第一常闭晶体管532的栅极端接收控制信号SC,第一常闭晶体管532的源极端耦接至接地端,第一常闭晶体管532的漏极端耦接至驱动电路520。The gate terminal and the source terminal of the first normally-on transistor 531 are both coupled to the driving circuit 520, and the drain terminal of the first normally-on transistor 531 is powered by the supply voltage. The gate terminal of the first normally closed transistor 532 receives the control signal SC, the source terminal of the first normally closed transistor 532 is coupled to the ground terminal, and the drain terminal of the first normally closed transistor 532 is coupled to the driving circuit 520 .

图6显示根据本发明的另一实施例所述的电力电路的方框图。如图6所示,电力电路600包括功率晶体管610、驱动电路620、第一前置驱动电路630以及第二前置驱动电路640,其中功率晶体管610、驱动电路620以及第一前置驱动电路630分别对应至图5的功率晶体管510、驱动电路520以及第一前置驱动电路530。6 shows a block diagram of a power circuit according to another embodiment of the present invention. As shown in FIG. 6 , the power circuit 600 includes a power transistor 610 , a driving circuit 620 , a first pre-driving circuit 630 and a second pre-driving circuit 640 , wherein the power transistor 610 , the driving circuit 620 and the first pre-driving circuit 630 Corresponding to the power transistor 510 , the driving circuit 520 and the first pre-driving circuit 530 in FIG. 5 , respectively.

第二前置驱动电路640接收控制信号SC而产生第二内部信号SI2至第一前置驱动电路630,用以进一步增进控制信号SC的驱动能力。第二前置驱动电路640包括第二常导通晶体管641以及第二常闭晶体管642。The second pre-driving circuit 640 receives the control signal SC to generate a second internal signal SI2 to the first pre-driving circuit 630, so as to further improve the driving capability of the control signal SC. The second pre-driver circuit 640 includes a second normally-on transistor 641 and a second normally-off transistor 642 .

第二常导通晶体管641的栅极端以及源极端皆耦接至第一前置驱动电路630的第一常闭晶体管532的栅极端,并且第二常导通晶体管641的漏极端是由供应电压VDD所供电。第二常闭晶体管642的栅极端接收控制信号SC,第二常闭晶体管642的源极端耦接至接地端,而第二常闭晶体管642的漏极端耦接至第一前置驱动电路630的第一常闭晶体管532的栅极端。The gate terminal and the source terminal of the second normally-on transistor 641 are both coupled to the gate terminal of the first normally-off transistor 532 of the first pre-driver circuit 630, and the drain terminal of the second normally-on transistor 641 is powered by the supply voltage Powered by VDD. The gate terminal of the second normally closed transistor 642 receives the control signal SC, the source terminal of the second normally closed transistor 642 is coupled to the ground terminal, and the drain terminal of the second normally closed transistor 642 is coupled to the first pre-driving circuit 630 The gate terminal of the first normally closed transistor 532 .

图7显示根据本发明的另一实施例所述的电力电路的方框图。如图7所示,电力电路700包括功率晶体管710、驱动电路720、第一前置驱动电路730、第二前置驱动电路740以及第一迟滞电路750,其中功率晶体管710、驱动电路720、第一前置驱动电路730以及第二前置驱动电路740分别对应至图6的功率晶体管610、驱动电路620、第一前置驱动电路630以及第二前置驱动电路640。FIG. 7 shows a block diagram of a power circuit according to another embodiment of the present invention. As shown in FIG. 7 , the power circuit 700 includes a power transistor 710, a driving circuit 720, a first pre-driving circuit 730, a second pre-driving circuit 740 and a first hysteresis circuit 750, wherein the power transistor 710, the driving circuit 720, the first A pre-driving circuit 730 and a second pre-driving circuit 740 correspond to the power transistor 610 , the driving circuit 620 , the first pre-driving circuit 630 and the second pre-driving circuit 640 in FIG. 6 , respectively.

第一迟滞电路750接收控制信号SC而产生第三内部信号SI3,用以进一步提供迟滞功能给控制信号SC。第一迟滞电路750包括第一电阻R1、第三常闭晶体管751、第四常闭晶体管752、第五常闭晶体管753以及第二电阻R2。The first hysteresis circuit 750 receives the control signal SC to generate a third internal signal SI3 for further providing a hysteresis function to the control signal SC. The first hysteresis circuit 750 includes a first resistor R1, a third normally-closed transistor 751, a fourth normally-closed transistor 752, a fifth normally-closed transistor 753, and a second resistor R2.

第一电阻R1耦接于供应电压VDD以及第二前置驱动电路740的第二常闭晶体管642的栅极端之间,第三常闭晶体管751的栅极端耦接至第三节点N3,第三常闭晶体管751的源极端耦接至第四节点N4,第三常闭晶体管751的漏极端耦接至第一电阻R1以及第二前置驱动电路740的第二常闭晶体管642的栅极端。第四常闭晶体管752的栅极端耦接至第三节点N3,第四常闭晶体管752的源极端耦接至接地端,第四常闭晶体管的漏极端耦接至第四节点N4。The first resistor R1 is coupled between the supply voltage VDD and the gate terminal of the second normally-closed transistor 642 of the second pre-driving circuit 740. The gate terminal of the third normally-closed transistor 751 is coupled to the third node N3, and the third The source terminal of the normally closed transistor 751 is coupled to the fourth node N4 , and the drain terminal of the third normally closed transistor 751 is coupled to the first resistor R1 and the gate terminal of the second normally closed transistor 642 of the second pre-driver circuit 740 . The gate terminal of the fourth normally closed transistor 752 is coupled to the third node N3, the source terminal of the fourth normally closed transistor 752 is coupled to the ground terminal, and the drain terminal of the fourth normally closed transistor is coupled to the fourth node N4.

第五常闭晶体管753的栅极端耦接至第一电阻R1以及第二前置驱动电路740的第二常闭晶体管642的栅极端,第五常闭晶体管753的源极端耦接至第四节点N4,第五常闭晶体管753的漏极端由供应电压VDD所供电。第二电阻R2耦接至第三节点N3,并且接收控制信号SC。The gate terminal of the fifth normally closed transistor 753 is coupled to the first resistor R1 and the gate terminal of the second normally closed transistor 642 of the second pre-driver circuit 740 , and the source terminal of the fifth normally closed transistor 753 is coupled to the fourth node N4, the drain terminal of the fifth normally closed transistor 753 is powered by the supply voltage VDD. The second resistor R2 is coupled to the third node N3 and receives the control signal SC.

图8显示根据本发明的另一实施例所述的电力电路的方框图。如图8所示,电力电路800包括功率晶体管810、驱动电路820、前置驱动电路830以及第一迟滞电路850,其中功率晶体管810、驱动电路820以及第一迟滞电路850分别对应至图7的功率晶体管710、驱动电路720以及第一迟滞电路750。FIG. 8 shows a block diagram of a power circuit according to another embodiment of the present invention. As shown in FIG. 8 , the power circuit 800 includes a power transistor 810 , a driving circuit 820 , a pre-driving circuit 830 and a first hysteresis circuit 850 , wherein the power transistor 810 , the driving circuit 820 and the first hysteresis circuit 850 correspond to those shown in FIG. 7 , respectively. The power transistor 710 , the driving circuit 720 and the first hysteresis circuit 750 .

根据本发明的一实施例,前置驱动电路830根据第二内部信号SI2而产生第一内部信号SI1,用以增进控制信号SC的驱动能力。根据本发明的一实施例,第一内部信号SI1以及第二内部信号SI2为同相。According to an embodiment of the present invention, the pre-driving circuit 830 generates the first internal signal SI1 according to the second internal signal SI2 to improve the driving capability of the control signal SC. According to an embodiment of the present invention, the first internal signal SI1 and the second internal signal SI2 are in the same phase.

图9显示根据本发明的另一实施例所述的电力电路的方框图。如图9所示,电力电路900包括功率晶体管910、驱动电路920、前置驱动电路930以及第一迟滞电路950,其中功率晶体管910、驱动电路920、前置驱动电路930以及第一迟滞电路950分别对应至图8的功率晶体管810、驱动电路820、前置驱动电路830以及第一迟滞电路850。FIG. 9 shows a block diagram of a power circuit according to another embodiment of the present invention. As shown in FIG. 9 , the power circuit 900 includes a power transistor 910 , a driving circuit 920 , a pre-driving circuit 930 and a first hysteresis circuit 950 , wherein the power transistor 910 , the driving circuit 920 , the pre-driving circuit 930 and the first hysteresis circuit 950 Corresponding to the power transistor 810 , the driving circuit 820 , the pre-driving circuit 830 and the first hysteresis circuit 850 in FIG. 8 , respectively.

如图9所示,前置驱动电路930包括第一子前置驱动电路931以及第二子前置驱动电路932。第一子前置驱动电路931包括第一子常闭晶体管E1、第二子常闭晶体管E2以及第一子常导通晶体管D1,其中第一子前置驱动电路931根据第一子内部信号SB1而产生第一内部信号SI1。As shown in FIG. 9 , the pre-driver circuit 930 includes a first sub-pre-driver circuit 931 and a second sub-pre-driver circuit 932 . The first sub-pre-driver circuit 931 includes a first sub-normally closed transistor E1, a second sub-normally-closed transistor E2 and a first sub-normally-on transistor D1, wherein the first sub-pre-driver circuit 931 is based on the first sub-internal signal SB1 And the first internal signal SI1 is generated.

第一子常闭晶体管E1的栅极端接收第一子内部信号SB1,第一子常闭晶体管E1的源极端耦接至接地端。第二子常闭晶体管E2的栅极端接收第二内部信号SI2。也就是,第二子常闭晶体管E2的栅极端耦接至第三子常闭晶体管E3的栅极端。第二子常闭晶体管E2的漏极端是由供应电压VDD所供电。The gate terminal of the first sub-normally closed transistor E1 receives the first sub-internal signal SB1, and the source terminal of the first sub-normally closed transistor E1 is coupled to the ground terminal. The gate terminal of the second sub normally-off transistor E2 receives the second internal signal SI2. That is, the gate terminal of the second sub-normally closed transistor E2 is coupled to the gate terminal of the third sub-normally closed transistor E3. The drain terminal of the second sub-normally closed transistor E2 is powered by the supply voltage VDD.

第二子常闭晶体管E2的源极端耦接至第一子常闭晶体管E1的漏极端,其中第一子常闭晶体管E1的漏极端产称第一内部信号SI1而提供至驱动电路920。第一子常导通晶体管D1的栅极端以及源极端耦接在一起,第一子常导通晶体管D1的源极端是由供应电压VDD所供电。The source terminal of the second sub-normally closed transistor E2 is coupled to the drain terminal of the first sub-normally closed transistor E1 , wherein the drain terminal of the first sub-normally closed transistor E1 generates the first internal signal SI1 and is provided to the driving circuit 920 . The gate terminal and the source terminal of the first sub-normally-on transistor D1 are coupled together, and the source terminal of the first sub-normally-on transistor D1 is powered by the supply voltage VDD.

第二子前置驱动电路932包括第三子常闭晶体管E3、第四子常闭晶体管E4以及第二子常导通晶体管D2,其中第二子前置驱动电路932根据第二内部信号SI2而产生第一子内部信号SB1。The second sub-pre-driver circuit 932 includes a third sub-normally-closed transistor E3, a fourth sub-normally-closed transistor E4 and a second sub-normally-on transistor D2, wherein the second sub-pre-driver circuit 932 operates according to the second internal signal SI2. A first sub-internal signal SB1 is generated.

第三子常闭晶体管E3的栅极端接收第二内部信号SI2,第三子常闭晶体管E3的源极端耦接至接地端。第四子常闭晶体管E4的栅极端耦接至第一迟滞电路950的第三节点N3,第四子常闭晶体管E4的漏极端是由供应电压VDD所供电。The gate terminal of the third sub-normally closed transistor E3 receives the second internal signal SI2, and the source terminal of the third sub-normally closed transistor E3 is coupled to the ground terminal. The gate terminal of the fourth sub-normally closed transistor E4 is coupled to the third node N3 of the first hysteresis circuit 950, and the drain terminal of the fourth sub-normally closed transistor E4 is powered by the supply voltage VDD.

第四子常闭晶体管E4的源极端耦接至第三子常闭晶体管E3的漏极端,其中第三子常闭晶体管E4的漏极端产生第一子内部信号SB1并提供至第一子前置驱动电路931。第二子常导通晶体管D2的栅极端以及源极端耦接在一起,第二子常导通晶体管D2的漏极端是由供应电压VDD所供电。The source terminal of the fourth sub-normally closed transistor E4 is coupled to the drain terminal of the third sub-normally closed transistor E3, wherein the drain terminal of the third sub-normally closed transistor E4 generates the first sub-internal signal SB1 and provides it to the first sub-front-end drive circuit 931 . The gate terminal and the source terminal of the second normally-on transistor D2 are coupled together, and the drain terminal of the second normally-on transistor D2 is powered by the supply voltage VDD.

图10显示根据本发明的另一实施例所述的电力电路的方框图。如图10所示,电力电路1000包括功率晶体管1010、驱动电路1020、前置驱动电路1030以及第一迟滞电路1050,其中功率晶体管1010、驱动电路1020、前置驱动电路1030以及第一迟滞电路1050分别对应至图9的功率晶体管910、驱动电路920、前置驱动电路930以及第一迟滞电路950。10 shows a block diagram of a power circuit according to another embodiment of the present invention. As shown in FIG. 10 , the power circuit 1000 includes a power transistor 1010 , a driving circuit 1020 , a pre-driving circuit 1030 and a first hysteresis circuit 1050 , wherein the power transistor 1010 , the driving circuit 1020 , the pre-driving circuit 1030 and the first hysteresis circuit 1050 Corresponding to the power transistor 910 , the driving circuit 920 , the pre-driving circuit 930 and the first hysteresis circuit 950 in FIG. 9 , respectively.

如图10所示,前置驱动电路1030包括第一子前置驱动电路1031、第二子前置驱动电路1032、第三子前置驱动电路1033以及第四子前置驱动电路1034,其中第一子前置驱动电路1031以及第二子前置驱动电路1032分别对应至图9的第一子前置驱动电路931以及第二子前置驱动电路932,在此不再重复赘述。As shown in FIG. 10, the pre-driver circuit 1030 includes a first sub-pre-driver circuit 1031, a second sub-pre-driver circuit 1032, a third sub-pre-driver circuit 1033 and a fourth sub-pre-driver circuit 1034, wherein the first sub-pre-driver circuit 1034 A sub-pre-driving circuit 1031 and a second sub-pre-driving circuit 1032 respectively correspond to the first sub-pre-driving circuit 931 and the second sub-pre-driving circuit 932 in FIG. 9 , and details are not repeated here.

第二子前置驱动电路1032包括第三子常闭晶体管E3、第四子常闭晶体管E4以及第二子常导通晶体管D2,其中第二子前置驱动电路1032根据第二子内部信号SB2而产生第一子内部信号SB1。The second sub-pre-driver circuit 1032 includes a third sub-normally closed transistor E3, a fourth sub-normally-closed transistor E4 and a second sub-normally-on transistor D2, wherein the second sub-pre-driver circuit 1032 is based on the second sub-internal signal SB2 And the first sub-internal signal SB1 is generated.

第三子常闭晶体管E3的栅极端接收第二子内部信号SB2,第三子常闭晶体管E3的源极端耦接至接地端。第四子常闭晶体管E4的栅极端接收第三子内部信号SB3。第四子常闭晶体管E4的漏极端是由供应电压VDD所供电。The gate terminal of the third sub-normally closed transistor E3 receives the second sub-internal signal SB2, and the source terminal of the third sub-normally closed transistor E3 is coupled to the ground terminal. The gate terminal of the fourth sub normally closed transistor E4 receives the third sub internal signal SB3. The drain terminal of the fourth sub-normally closed transistor E4 is powered by the supply voltage VDD.

第四子常闭晶体管E4的源极端耦接至第三子常闭晶体管E3的漏极端,其中第三子常闭晶体管E3的漏极端产生第二子内部信号SB2至第一子前置驱动电路1031。第二子常导通晶体管D2的栅极端以及源极端耦接在一起,第二子常导通晶体管D2的漏极端是由供应电压VDD所供电。The source terminal of the fourth sub-normally closed transistor E4 is coupled to the drain terminal of the third sub-normally closed transistor E3, wherein the drain terminal of the third sub-normally closed transistor E3 generates the second sub-internal signal SB2 to the first sub-pre-driver circuit 1031. The gate terminal and the source terminal of the second normally-on transistor D2 are coupled together, and the drain terminal of the second normally-on transistor D2 is powered by the supply voltage VDD.

第三子前置驱动电路1033包括第五子常闭晶体管E5、第六子常闭晶体管E6以及第三子常导通晶体管D3,其中第三子驱动电路1033根据第三子内部信号SB3而产生第二子内部信号SB2。The third sub-pre-driving circuit 1033 includes a fifth sub-normally closed transistor E5, a sixth sub-normally-closed transistor E6 and a third sub-normally-on transistor D3, wherein the third sub-driving circuit 1033 generates the third sub-internal signal SB3 according to the The second sub-internal signal SB2.

第五子常闭晶体管E5的栅极端接收第三子内部信号SB3,第五子常闭晶体管E5的源极端耦接至接地端。第六子常闭晶体管E6的栅极端接收第二内部信号SI2,第六子常闭晶体管E6的漏极端是由供应电压VDD所供电。The gate terminal of the fifth sub-normally closed transistor E5 receives the third sub-internal signal SB3, and the source terminal of the fifth sub-normally closed transistor E5 is coupled to the ground terminal. The gate terminal of the sixth sub-normally closed transistor E6 receives the second internal signal SI2, and the drain terminal of the sixth sub-normally closed transistor E6 is powered by the supply voltage VDD.

第六子常闭晶体管E6的源极端耦接至第五子常闭晶体管E5的漏极端,其中第五子常闭晶体管E5的漏极端产生第二子内部信号SB2至第二子前置驱动电路1032。第三子常导通晶体管D3的栅极端以及源极端耦接在一起,第三子常导通晶体管D3的漏极端是由供应电压VDD所供电。The source terminal of the sixth sub-normally closed transistor E6 is coupled to the drain terminal of the fifth sub-normally closed transistor E5, wherein the drain terminal of the fifth sub-normally closed transistor E5 generates the second sub-internal signal SB2 to the second sub-pre-driver circuit 1032. The gate terminal and the source terminal of the third normally-on transistor D3 are coupled together, and the drain terminal of the third normally-on transistor D3 is powered by the supply voltage VDD.

第四子前置驱动电路1034包括第七子常闭晶体管E7、第八子常闭晶体管E8以及第四子常导通晶体管D4,其中第四子前置驱动电路1034根据第二内部信号SI2而产生第三子内部信号SB3。The fourth sub-pre-driver circuit 1034 includes a seventh sub-normally-closed transistor E7, an eighth sub-normally-closed transistor E8 and a fourth sub-normally-on transistor D4, wherein the fourth sub-pre-driver circuit 1034 operates according to the second internal signal SI2. A third sub-internal signal SB3 is generated.

第七子常闭晶体管E7的栅极端接收第二内部信号SI2,第七子常闭晶体管E7的源极端耦接至接地端。第八子常闭晶体管E8的栅极端耦接至第一迟滞电路1050的第三节点N3。第八子常闭晶体管E8的漏极端是由供应电压VDD所供电。The gate terminal of the seventh sub-normally closed transistor E7 receives the second internal signal SI2, and the source terminal of the seventh sub-normally closed transistor E7 is coupled to the ground terminal. The gate terminal of the eighth sub normally-off transistor E8 is coupled to the third node N3 of the first hysteresis circuit 1050 . The drain terminal of the eighth sub-normally closed transistor E8 is powered by the supply voltage VDD.

第八子常闭晶体管E8的源极端耦接至第七子常闭晶体管E7的漏极端,其中第七子常闭晶体管E7的漏极端产生第三子内部信号SB3至第三子前置驱动电路1033。第四子常导通晶体管D4的栅极端以及源极端耦接在一起,第四子常导通晶体管D4的漏极端是由供应电压VDD所供电。The source terminal of the eighth sub-normally closed transistor E8 is coupled to the drain terminal of the seventh sub-normally closed transistor E7, wherein the drain terminal of the seventh sub-normally closed transistor E7 generates the third sub-internal signal SB3 to the third sub-pre-driver circuit 1033. The gate terminal and the source terminal of the fourth sub-normally-on transistor D4 are coupled together, and the drain terminal of the fourth sub-normally-on transistor D4 is powered by the supply voltage VDD.

根据本发明的其他实施例,图8的前置驱动电路830可包括偶数个子前置驱动电路,使得第一内部信号SI1以及第二内部信号SI2的相位为同相。According to other embodiments of the present invention, the pre-driver circuit 830 of FIG. 8 may include an even number of sub-pre-driver circuits, so that the phases of the first internal signal SI1 and the second internal signal SI2 are in the same phase.

图11显示根据本发明的另一实施例所述的集成电路的方框图。如图11所示,集成电路1100包括隔离器1110、第一电力电路1120、第二电力电路1130、自举二极管DB以及自举电容CB。11 shows a block diagram of an integrated circuit according to another embodiment of the present invention. As shown in FIG. 11 , the integrated circuit 1100 includes an isolator 1110 , a first power circuit 1120 , a second power circuit 1130 , a bootstrap diode DB, and a bootstrap capacitor CB.

隔离器1110根据输入信号SIN,产生第一控制信号SC1以及第二控制信号SC2。根据本发明的一些实施例,输入信号SIN可由外部产生。如图11所示,反相输入信号SINB是由反相器INV所产生。隔离器1110根据反相输入信号SINB而产生第一控制信号SC1,根据输入信号SIN产生第二控制信号SC2。根据本发明的其他实施例,反向输入信号SINB以及输入信号SIN可由外部产生。The isolator 1110 generates the first control signal SC1 and the second control signal SC2 according to the input signal SIN. According to some embodiments of the present invention, the input signal SIN may be generated externally. As shown in FIG. 11, the inverted input signal SINB is generated by the inverter INV. The isolator 1110 generates the first control signal SC1 according to the inverted input signal SINB, and generates the second control signal SC2 according to the input signal SIN. According to other embodiments of the present invention, the inverted input signal SINB and the input signal SIN may be generated externally.

第一电力电路1120包括第一驱动电路1121以及第一功率晶体管1122,第二电力电路1130包括第二驱动电路1131以及第二功率晶体管1132。根据本发明的一实施例,第一驱动电路1121与第二驱动电路1131相同,第一功率晶体管1122与第二功率晶体管1132相同。The first power circuit 1120 includes a first drive circuit 1121 and a first power transistor 1122 , and the second power circuit 1130 includes a second drive circuit 1131 and a second power transistor 1132 . According to an embodiment of the present invention, the first driving circuit 1121 and the second driving circuit 1131 are the same, and the first power transistor 1122 and the second power transistor 1132 are the same.

根据本发明的一实施例,第一驱动电路1121以及第二驱动电路1131皆可对应至图2以及图3的驱动电路220、图4的驱动电路420、图5的驱动电路520以及第一前置驱动电路530的组合、图6的驱动电路620、第一前置驱动电路630以及第二前置驱动电路640的组合、图7的驱动电路720、第一前置驱动电路730、第二前置驱动电路740以及第一迟滞电路750的组合、图8的驱动电路820、前置驱动电路830、以及第一迟滞电路850的组合、图9的驱动电路920、前置驱动电路930、以及第一迟滞电路950的组合以及图10的驱动电路1020、前置驱动电路1030、以及第一迟滞电路1050的组合的一者。According to an embodiment of the present invention, both the first driving circuit 1121 and the second driving circuit 1131 may correspond to the driving circuit 220 of FIG. 2 and FIG. 3 , the driving circuit 420 of FIG. 4 , the driving circuit 520 of FIG. The combination of the drive circuit 530, the drive circuit 620 of FIG. 6, the combination of the first pre-drive circuit 630 and the second pre-drive circuit 640, the drive circuit 720 of FIG. 7, the first pre-drive circuit 730, the second pre-drive circuit The combination of the set driving circuit 740 and the first hysteresis circuit 750, the combination of the driving circuit 820, the pre-driving circuit 830, and the first hysteresis circuit 850 of FIG. 8, the driving circuit 920, the pre-driving circuit 930 of FIG. A combination of the hysteresis circuit 950 and one of the combination of the driver circuit 1020 , the pre-driver circuit 1030 , and the first hysteresis circuit 1050 of FIG. 10 .

根据本发明的一实施例,第一功率晶体管1122以及第二功率晶体管1132皆可对应至图2的功率晶体管210、图4的功率晶体管410、图5的功率晶体管510、图6的功率晶体管610、图7的功率晶体管710、图8的功率晶体管810、图9的功率晶体管910、以及图10的功率晶体管1010的任一者。According to an embodiment of the present invention, both the first power transistor 1122 and the second power transistor 1132 may correspond to the power transistor 210 of FIG. 2 , the power transistor 410 of FIG. 4 , the power transistor 510 of FIG. 5 , and the power transistor 610 of FIG. 6 . , any one of the power transistor 710 of FIG. 7 , the power transistor 810 of FIG. 8 , the power transistor 910 of FIG. 9 , and the power transistor 1010 of FIG. 10 .

如图11所示,自举二极管DB包括自举阳极NBA以及自举阴极NBC,其中自举阳极NBA耦接至第一供应电压VDD1,自举阴极NBC耦接至第二供应电压VDD2。自举电容CB耦接于第二供应电压VDD2以及开关节点NSW。根据本发明的一实施例,自举二极管DB以及自举电容CB用以根据开关节点NSW的开关电压VSW,而将第一供应电压VDD1声押至第二供应电压VDD2。As shown in FIG. 11 , the bootstrap diode DB includes a bootstrap anode NBA and a bootstrap cathode NBC, wherein the bootstrap anode NBA is coupled to the first supply voltage VDD1 , and the bootstrap cathode NBC is coupled to the second supply voltage VDD2 . The bootstrap capacitor CB is coupled to the second supply voltage VDD2 and the switch node NSW. According to an embodiment of the present invention, the bootstrap diode DB and the bootstrap capacitor CB are used to push the first supply voltage VDD1 to the second supply voltage VDD2 according to the switching voltage VSW of the switching node NSW.

第一驱动电路1121是由第二供应电压VDD2以及开关电压VSW所供电,并根据第一控制信号SC1产生第一驱动电压VD1。第一功率晶体管1122根据第一驱动电压VD1,而将高电压VHV提供至开关节点NSW。The first driving circuit 1121 is powered by the second supply voltage VDD2 and the switching voltage VSW, and generates the first driving voltage VD1 according to the first control signal SC1. The first power transistor 1122 provides the high voltage VHV to the switching node NSW according to the first driving voltage VD1.

第二驱动电路1131是由第一供应电压VDD1以及第一接地端GND1所供电,并根据第二控制信号SC2产生第二驱动电压VD2。第二功率晶体管1132根据第二驱动电压VD2,而将开关节点NSW耦接至第一接地端GND1。The second driving circuit 1131 is powered by the first supply voltage VDD1 and the first ground terminal GND1, and generates the second driving voltage VD2 according to the second control signal SC2. The second power transistor 1132 couples the switch node NSW to the first ground terminal GND1 according to the second driving voltage VD2.

根据本发明的一实施例,当第一功率晶体管1122为不导通而第二功率晶体管1132为导通时,开关电压VSW耦接至第一接地端GND1,第二供应电压VDD2等于第一供应电压VDD1减去自举二极管DB的顺向导通电压。According to an embodiment of the present invention, when the first power transistor 1122 is turned off and the second power transistor 1132 is turned on, the switching voltage VSW is coupled to the first ground terminal GND1, and the second supply voltage VDD2 is equal to the first supply voltage The forward voltage of the bootstrap diode DB is subtracted from the voltage VDD1.

根据本发明的另一实施例,当第一功率晶体管1122为导通而第二功率晶体管1132为不导通时,开关电压VSW耦于高电压VHV,使得第二供应电压VDD2被升压至高电压VHV以及第一供应电压VDD1的总和,因而完全导通第一功率晶体管1122。According to another embodiment of the present invention, when the first power transistor 1122 is turned on and the second power transistor 1132 is turned off, the switching voltage VSW is coupled to the high voltage VHV, so that the second supply voltage VDD2 is boosted to a high voltage The sum of VHV and the first supply voltage VDD1, thus completely turning on the first power transistor 1122.

图12显示根据本发明的另一实施例所述的集成电路的方框图。如图12所示,集成电路1200包括隔离器1110、第一功率晶体管1120、第二电力电路1130、自举二极管DB以及自举电容CB,其中隔离器1110包括发射器TX、第一接收器R1、第一隔离阻障IB1、第二接收器R2以及第二隔离阻障IB2。12 shows a block diagram of an integrated circuit according to another embodiment of the present invention. As shown in FIG. 12, the integrated circuit 1200 includes an isolator 1110, a first power transistor 1120, a second power circuit 1130, a bootstrap diode DB and a bootstrap capacitor CB, wherein the isolator 1110 includes a transmitter TX, a first receiver R1 , a first isolation barrier IB1, a second receiver R2 and a second isolation barrier IB2.

发射器TX是由第三供应电压VDD3以及第二接地端GND2所供电,其中发射器TX调制输入信号SIN而产生越过第一隔离阻障IB1的第一射频信号RF1,并且调制反相输入信号SINB而产生越过第二隔离阻障IB2的第二射频信号RF2。The transmitter TX is powered by the third supply voltage VDD3 and the second ground terminal GND2, wherein the transmitter TX modulates the input signal SIN to generate the first radio frequency signal RF1 across the first isolation barrier IB1, and modulates the inverted input signal SINB And the second radio frequency signal RF2 that crosses the second isolation barrier IB2 is generated.

第一接收器R1是由第二供应电压VDD2以及第二开关电压VSW所供电,其中第一接收器R1解调制第一射频信号RF1,而产生第一控制信号SC1。第一隔离阻障IB1用以将发射器TX以及第一接收器R1之间电性隔离。The first receiver R1 is powered by the second supply voltage VDD2 and the second switching voltage VSW, wherein the first receiver R1 demodulates the first radio frequency signal RF1 to generate the first control signal SC1. The first isolation barrier IB1 is used to electrically isolate the transmitter TX and the first receiver R1.

第二接收器R2是由第一供应电压VDD1以及第一接地端GND1所供电,其中第二接收器R2解调制第二射频信号RF2,而产生第二控制信号SC2。第二隔离阻障IB2用以将发射器TX以及第二接收器R2之间电性隔离。The second receiver R2 is powered by the first supply voltage VDD1 and the first ground terminal GND1, wherein the second receiver R2 demodulates the second radio frequency signal RF2 to generate the second control signal SC2. The second isolation barrier IB2 is used to electrically isolate the transmitter TX and the second receiver R2.

根据本发明的一实施例,第一接地端GND1可与第二接地端GND2相同。根据本发明的另一实施例,第一接地端GND1可与第二接地端GND2不同。根据本发明的一实施例,高电压VHV超过第一供应电压VDD1、第二供应电压VDD2以及第三供应电压VDD3。According to an embodiment of the present invention, the first ground terminal GND1 may be the same as the second ground terminal GND2. According to another embodiment of the present invention, the first ground terminal GND1 may be different from the second ground terminal GND2. According to an embodiment of the present invention, the high voltage VHV exceeds the first supply voltage VDD1 , the second supply voltage VDD2 and the third supply voltage VDD3 .

根据本发明的一实施例,第一供应电压VDD1可与第三供应电压VDD3相同。根据本发明的另一实施例,第一供应电压VDD1可与第三供应电压VDD3不同。According to an embodiment of the present invention, the first supply voltage VDD1 may be the same as the third supply voltage VDD3. According to another embodiment of the present invention, the first supply voltage VDD1 may be different from the third supply voltage VDD3.

如图12所示,集成电路1200还包括解耦合电容CD。解耦合电容CD耦接于高电压VHV以及第一接地端GND1。根据本发明的一实施例,隔离器1110、第一电力电路1120、第二电力电路1130以及解耦合电容CD封装在一起。根据本发明的另一实施例,隔离器1110、第一电力电路1120、第二电力电路1130、自举电容CB以及解耦合电容CD封装在一起。As shown in FIG. 12, the integrated circuit 1200 further includes a decoupling capacitor CD. The decoupling capacitor CD is coupled to the high voltage VHV and the first ground terminal GND1. According to an embodiment of the present invention, the isolator 1110, the first power circuit 1120, the second power circuit 1130, and the decoupling capacitor CD are packaged together. According to another embodiment of the present invention, the isolator 1110, the first power circuit 1120, the second power circuit 1130, the bootstrap capacitor CB, and the decoupling capacitor CD are packaged together.

图13显示根据本发明的另一实施例所述的集成电路的方框图。如图13所示,集成电路1300包括隔离器1110、第一电力电路1120、第二电力电路1130、自举二极管DB以及自举电容CB,其中隔离器1110包括第一子隔离器1111以及第二子隔离器1112。13 shows a block diagram of an integrated circuit according to another embodiment of the present invention. As shown in FIG. 13 , the integrated circuit 1300 includes an isolator 1110 , a first power circuit 1120 , a second power circuit 1130 , a bootstrap diode DB and a bootstrap capacitor CB, wherein the isolator 1110 includes a first sub-isolator 1111 and a second sub-isolator 1110 Sub-isolator 1112.

第一子隔离器1111包括第一发射器T1、第一接收器R1以及第一隔离阻障IB1。第一发射器T1是由第三供应电压VDD3以及第二接地端GND2所供电,其中第一发射器T1调制输入信号SIN而产生越过第一隔离阻障IB1的第一射频信号RF1。第一接收器R1是由第二供应电压VDD2以及开关电压SW所供电,其中第一接收器R1解调制第一射频信号RF1,而产生第一控制信号SC1。第一隔离阻障IB1用以将第一发射器T1以及第一接收器R1之间电性隔离。The first sub-isolator 1111 includes a first transmitter T1, a first receiver R1, and a first isolation barrier IB1. The first transmitter T1 is powered by the third supply voltage VDD3 and the second ground terminal GND2, wherein the first transmitter T1 modulates the input signal SIN to generate the first radio frequency signal RF1 across the first isolation barrier IB1. The first receiver R1 is powered by the second supply voltage VDD2 and the switch voltage SW, wherein the first receiver R1 demodulates the first radio frequency signal RF1 to generate the first control signal SC1. The first isolation barrier IB1 is used to electrically isolate the first transmitter T1 and the first receiver R1.

第二子隔离器1112包括第二发射器T2、第二接收器R2以及第二隔离阻障IB2。第二发射器T2是由第三供应电压VDD3以及第二接地端GND2所供电,其中第二发射器T2调制反相输入信号SINB而产生越过第二隔离阻障IB2的第二射频信号RF2。第二接收器R2是由第一供应电压VDD1以及第一接地端GND1所供电,其中第二接收器R2解调制第二射频信号RF2而产生第二控制信号SC2。第二隔离阻障IB2用以将第二发射器T2以及第二接收器R2之间电性隔离。The second sub-isolator 1112 includes a second transmitter T2, a second receiver R2, and a second isolation barrier IB2. The second transmitter T2 is powered by the third supply voltage VDD3 and the second ground terminal GND2, wherein the second transmitter T2 modulates the inverted input signal SINB to generate the second radio frequency signal RF2 across the second isolation barrier IB2. The second receiver R2 is powered by the first supply voltage VDD1 and the first ground terminal GND1, wherein the second receiver R2 demodulates the second radio frequency signal RF2 to generate the second control signal SC2. The second isolation barrier IB2 is used to electrically isolate the second transmitter T2 and the second receiver R2.

根据本发明的一实施例,第一接地端GND1可与第二接地端GND2相同。根据本发明的另一实施例,第一接地端GND1可与第二接地端GND2不同。根据本发明的一实施例,高电压VHV超过第一供应电压VDD1、第二供应电压VDD2以及第三供应电压VDD3。According to an embodiment of the present invention, the first ground terminal GND1 may be the same as the second ground terminal GND2. According to another embodiment of the present invention, the first ground terminal GND1 may be different from the second ground terminal GND2. According to an embodiment of the present invention, the high voltage VHV exceeds the first supply voltage VDD1 , the second supply voltage VDD2 and the third supply voltage VDD3 .

根据本发明的一实施例,第一供应电压VDD1可与第三供应电压VDD3相同。根据本发明的另一实施例,第一供应电压VDD1可与第三供应电压VDD3不同。According to an embodiment of the present invention, the first supply voltage VDD1 may be the same as the third supply voltage VDD3. According to another embodiment of the present invention, the first supply voltage VDD1 may be different from the third supply voltage VDD3.

如图13所示,集成电路1300还包括解耦合电容CD。解耦合电容CD耦接于高电压VHV以及第一接地端GND1之间。根据本发明的一实施例,第一子隔离器1111、第二子隔离器1112、第一电力电路1120、第二电力电路1130以及解耦合电容CD封装在一起。根据本发明的另一实施例,第一子隔离器1111、第二子隔离器1112、第一电力电路1120、第二电力电路1130、自举电容CB以及解耦合电容CD封装在一起。As shown in FIG. 13, the integrated circuit 1300 further includes a decoupling capacitor CD. The decoupling capacitor CD is coupled between the high voltage VHV and the first ground terminal GND1. According to an embodiment of the present invention, the first sub-isolator 1111 , the second sub-isolator 1112 , the first power circuit 1120 , the second power circuit 1130 and the decoupling capacitor CD are packaged together. According to another embodiment of the present invention, the first sub-isolator 1111 , the second sub-isolator 1112 , the first power circuit 1120 , the second power circuit 1130 , the bootstrap capacitor CB and the decoupling capacitor CD are packaged together.

图14是显示根据本发明的一实施例所述的封装结构的上视图。如图14所示,封装结构1400包括图13所示的解耦合电容CD、自举电容CB、第一子隔离器1111、第二子隔离器1112、第一电力电路1120以及第二电力电路1130。根据本发明的一实施例,封装结构1400位于基板14之上。FIG. 14 is a top view showing a package structure according to an embodiment of the present invention. As shown in FIG. 14 , the package structure 1400 includes the decoupling capacitor CD, the bootstrap capacitor CB, the first sub-isolator 1111 , the second sub-isolator 1112 , the first power circuit 1120 and the second power circuit 1130 as shown in FIG. 13 . . According to an embodiment of the present invention, the package structure 1400 is located on the substrate 14 .

如图14所示,封装结构1400还包括第一导电层1401、第二导电层1402以及第三导电层1403。第一导电层1401、第二导电层1402以及第三导电层1403形成于基板14之上。As shown in FIG. 14 , the package structure 1400 further includes a first conductive layer 1401 , a second conductive layer 1402 and a third conductive layer 1403 . The first conductive layer 1401 , the second conductive layer 1402 and the third conductive layer 1403 are formed on the substrate 14 .

如图14所示,第一电力电路1120以及自举电容CB位于第一导电层1401之上。第二电力电路1130以及解耦合电容CD位于第二导电层1402之上。第一子隔离器1111以及第二子隔离器1112位于第三导电层1403之上。As shown in FIG. 14 , the first power circuit 1120 and the bootstrap capacitor CB are located on the first conductive layer 1401 . The second power circuit 1130 and the decoupling capacitor CD are located on the second conductive layer 1402 . The first sub-isolator 1111 and the second sub-isolator 1112 are located on the third conductive layer 1403 .

根据本发明的一实施例,第一导电层1401、第二导电层1402以及第三导电层1403之间相互电性隔离。根据本发明的一实施例,第一导电层1401电性耦接至第一接地端GND1,第二导电层1402电性耦接至开关电压VSW,其中开关电压VSW耦接至第五参考节点NR5。According to an embodiment of the present invention, the first conductive layer 1401 , the second conductive layer 1402 and the third conductive layer 1403 are electrically isolated from each other. According to an embodiment of the present invention, the first conductive layer 1401 is electrically coupled to the first ground terminal GND1, and the second conductive layer 1402 is electrically coupled to the switching voltage VSW, wherein the switching voltage VSW is coupled to the fifth reference node NR5 .

如图14所示,第五参考节点NR5耦接至第一功率晶体管1122的源极端S1,其中第五参考节点NR5是通过导线层以及第一导体1411,电性耦接至第一导电层1401。As shown in FIG. 14 , the fifth reference node NR5 is coupled to the source terminal S1 of the first power transistor 1122 , wherein the fifth reference node NR5 is electrically coupled to the first conductive layer 1401 through the wire layer and the first conductor 1411 .

第六参考节点NR6耦接至第二功率晶体管1132的源极端S2,其中第六参考节点NR6用以将导线层电性连接至第二导电层1402。The sixth reference node NR6 is coupled to the source terminal S2 of the second power transistor 1132 , wherein the sixth reference node NR6 is used to electrically connect the wire layer to the second conductive layer 1402 .

根据本发明的一实施例,图13所示的自举二极管DB放置于封装结构1400之外。According to an embodiment of the present invention, the bootstrap diode DB shown in FIG. 13 is placed outside the package structure 1400 .

图15显示根据本发明的一实施例所述的封装结构的剖面图。如图15所示,封装结构1500显示沿着图14中自第一端点A至第二端点A'的虚线的剖面图。15 shows a cross-sectional view of a package structure according to an embodiment of the present invention. As shown in FIG. 15 , the package structure 1500 is shown as a cross-sectional view along the dotted line from the first terminal A to the second terminal A′ in FIG. 14 .

封装结构1500包括基板14、第一子隔离器1111、第一电力电路1120、自举电容CB、解耦合电容CD以及导线层1521。基板14包括第一载体141、第二载体142以及第三载体143,其中第一载体141、第二载体142以及第三载体143之间相互隔离。The package structure 1500 includes a substrate 14 , a first sub-isolator 1111 , a first power circuit 1120 , a bootstrap capacitor CB, a decoupling capacitor CD, and a wire layer 1521 . The substrate 14 includes a first carrier 141 , a second carrier 142 and a third carrier 143 , wherein the first carrier 141 , the second carrier 142 and the third carrier 143 are isolated from each other.

第一电力电路1120以及自举电容CB位于第一载体141之上,解耦合电容CD以及第二电力电路1130(图15中未显示)位于第二载体142之上。第一子隔离器1111以及第二子隔离器1112(图15中未显示)位于第三载体143之上。The first power circuit 1120 and the bootstrap capacitor CB are located on the first carrier 141 , and the decoupling capacitor CD and the second power circuit 1130 (not shown in FIG. 15 ) are located on the second carrier 142 . The first sub-isolator 1111 and the second sub-isolator 1112 (not shown in FIG. 15 ) are located on the third carrier 143 .

根据本发明的一些实施例,第一导电单元1522以及第一电力电路1120位于第一导电层1401之上,其中第一导电层1401位于第一载体141之上。解耦合电容CD以及第二电力电路1130(图15中并未显示)位于第二导电层1402之上,其中第二导电层1402位于第二载体142之上。第一子隔离器1111以及第二子隔离器1112(图15中并未显示)位于第三导电层1403之上,其中第三导电层1403位于第三载体143之上。According to some embodiments of the present invention, the first conductive unit 1522 and the first power circuit 1120 are located on the first conductive layer 1401 , wherein the first conductive layer 1401 is located on the first carrier 141 . The decoupling capacitor CD and the second power circuit 1130 (not shown in FIG. 15 ) are located on the second conductive layer 1402 , wherein the second conductive layer 1402 is located on the second carrier 142 . The first sub-isolator 1111 and the second sub-isolator 1112 (not shown in FIG. 15 ) are located on the third conductive layer 1403 , wherein the third conductive layer 1403 is located on the third carrier 143 .

第一载体141、第二载体142以及第三载体143的材料可以是(或包括)铜、铝、金、银、锡、铂及其合金等等。第一载体141以及第一导电层1401可为相同或不同的材料。第三载体143以及第三导电层1403可为相同或不同的材料。Materials of the first carrier 141 , the second carrier 142 and the third carrier 143 may be (or include) copper, aluminum, gold, silver, tin, platinum, alloys thereof, and the like. The first carrier 141 and the first conductive layer 1401 may be of the same or different materials. The third carrier 143 and the third conductive layer 1403 may be the same or different materials.

封装结构1500还包括第一介电层1510以及第二介电层1520,第一子隔离器1111、第二子隔离器1112(图15中并未显示)、第一电力电路1120、第二电力电路1130(图15中并未显示)、自举电容CB以及解耦合电容CD在第一介电层1510中固定在一起。The package structure 1500 further includes a first dielectric layer 1510 and a second dielectric layer 1520, a first sub-isolator 1111, a second sub-isolator 1112 (not shown in FIG. 15), a first power circuit 1120, a second power circuit Circuit 1130 (not shown in FIG. 15 ), bootstrap capacitor CB, and decoupling capacitor CD are held together in first dielectric layer 1510 .

导线层1521位于第一介电层1510之上,且穿过第二介电层1520。在一些实施例中,第一介电层1510是通过第一介电质的封胶工艺(molding process)而形成,因而固定第一子隔离器1111、第二子隔离器1112、第一电力电路1120以及第二电力电路1130。The wire layer 1521 is located on the first dielectric layer 1510 and passes through the second dielectric layer 1520 . In some embodiments, the first dielectric layer 1510 is formed by a molding process of the first dielectric, thereby fixing the first sub-isolator 1111 , the second sub-isolator 1112 , and the first power circuit 1120 and a second power circuit 1130.

导线层1521用以电性耦接第一子隔离器1111、第二子隔离器1112、第一电力电路1120以及第二电力电路1130。在一些实施例中,导线层1521的材料为金属,且利用激光钻孔以及金属电镀工艺所制成。详细的制造方法将于下文中详加叙述。The wire layer 1521 is used for electrically coupling the first sub-isolator 1111 , the second sub-isolator 1112 , the first power circuit 1120 and the second power circuit 1130 . In some embodiments, the material of the wire layer 1521 is metal, and is fabricated by laser drilling and metal plating processes. A detailed manufacturing method will be described in detail below.

如图15所示,自举电容CB包括第一导电单元1522、第一介电单元1523以及第二导电单元1524。第一导电单元1522以及第二导电单元1524可为铜柱。第一导电单元1522位于第一介电层1510中。同样的,解耦合电容CD包括第三导电单元1525、第二介电单元1526以及第四导电单元1527。第一导电单元1522、第二导电单元1524、第三导电单元1525以及第四导电单元1527可为铜柱。第三导电单元1525位于第一介电层1510中。As shown in FIG. 15 , the bootstrap capacitor CB includes a first conductive unit 1522 , a first dielectric unit 1523 and a second conductive unit 1524 . The first conductive unit 1522 and the second conductive unit 1524 may be copper pillars. The first conductive unit 1522 is located in the first dielectric layer 1510 . Likewise, the decoupling capacitor CD includes a third conductive unit 1525 , a second dielectric unit 1526 and a fourth conductive unit 1527 . The first conductive unit 1522, the second conductive unit 1524, the third conductive unit 1525, and the fourth conductive unit 1527 may be copper pillars. The third conductive unit 1525 is located in the first dielectric layer 1510 .

如图15所示,第一介电单元1523以及第二导电单元1524位于第一导电单元1522之上,第二介电单元1526以及第四导电单元1527位于第三导电单元1525之上。第一导电单元1522、第一介电单元1523以及第二导电单元1524形成自举电容CB,第三导电单元1525、第二介电单元1526以及第四导电单元1527形成解耦合电容CD。As shown in FIG. 15 , the first dielectric unit 1523 and the second conductive unit 1524 are located on the first conductive unit 1522 , and the second dielectric unit 1526 and the fourth conductive unit 1527 are located on the third conductive unit 1525 . The first conductive unit 1522, the first dielectric unit 1523 and the second conductive unit 1524 form a bootstrap capacitor CB, and the third conductive unit 1525, the second dielectric unit 1526 and the fourth conductive unit 1527 form a decoupling capacitor CD.

为了调整自举电容CB的电容值,第一介电单元1523的材料可与第一介电层1510的材料以及第二介电层1520的材料不同。举例来说,第一介电单元1523可为陶瓷或云母,其中第一介电单元1523的材料与第一介电质的材料不同。在一些其他的实施例中,自举电容CB不包括第一介电单元1523。第一导电单元1522与第二导电单元1524相距第一距离,第一介电层1510的第一介电质可填充于第一导电单元1522以及第二导电单元1524之间的空间里。换句话说,第一介电单元1523的材料可与第一介电层1510的材料相同。In order to adjust the capacitance value of the bootstrap capacitor CB, the material of the first dielectric unit 1523 may be different from the material of the first dielectric layer 1510 and the material of the second dielectric layer 1520 . For example, the first dielectric unit 1523 can be ceramic or mica, wherein the material of the first dielectric unit 1523 is different from the material of the first dielectric. In some other embodiments, the bootstrap capacitor CB does not include the first dielectric unit 1523 . The first conductive unit 1522 and the second conductive unit 1524 are separated by a first distance, and the first dielectric of the first dielectric layer 1510 can fill the space between the first conductive unit 1522 and the second conductive unit 1524 . In other words, the material of the first dielectric unit 1523 may be the same as the material of the first dielectric layer 1510 .

为了调整解耦合电容CD的电容值,第二介电单元1526的材料可与第一介电层1510的材料以及第二介电层1520的材料不同。举例来说,第二介电单元1526的材料可为陶瓷或云母,其中第二介电单元1526的材料与第一介电质的材料不同。在一切其他的实施例中,解耦合电容CD不包括第二介电单元1525。第三导电单元1525与第四导电单元1527相距第二距离,第一介电层1510的第一介电质可填充于第三导电单元1525以及第四导电单元1527之间的空间里。换句话说,第二介电单元1526的材料可与第一介电层1510的材料相同。In order to adjust the capacitance value of the decoupling capacitor CD, the material of the second dielectric unit 1526 may be different from the material of the first dielectric layer 1510 and the material of the second dielectric layer 1520 . For example, the material of the second dielectric unit 1526 may be ceramic or mica, wherein the material of the second dielectric unit 1526 is different from the material of the first dielectric. In all other embodiments, the decoupling capacitor CD does not include the second dielectric unit 1525 . The third conductive unit 1525 and the fourth conductive unit 1527 are separated by a second distance, and the first dielectric of the first dielectric layer 1510 can fill the space between the third conductive unit 1525 and the fourth conductive unit 1527 . In other words, the material of the second dielectric unit 1526 may be the same as the material of the first dielectric layer 1510 .

根据本发明的一些实施例,自举电容CB的第一距离与解耦合电容CD的第二距离相同或不同。According to some embodiments of the present invention, the first distance of the bootstrap capacitor CB is the same as or different from the second distance of the decoupling capacitor CD.

如图15所示,在一些实施例中,第一导电单元1522以及第一介电单元1523位于第一介电层1510之中,第二导电单元1524位于第二介电层1520之中。第二导电单元1524以及导线层1521经由第二介电层1520所固定,第二导电单元1524是通过导线层1521而电性耦接至第一电力电路1120。然而,在其他实施例中,根据不同的制造方法,第一导电单元1522、第一介电单元1523以及第二导电单元1524皆可位于第一介电层1510中,且通过第一介电层1510的第一介电质而固定。第二导电单元1524通过导线层1521而电性耦接至第一电力电路1120。详细的制造方法将于下文中详加叙述。As shown in FIG. 15 , in some embodiments, the first conductive unit 1522 and the first dielectric unit 1523 are located in the first dielectric layer 1510 , and the second conductive unit 1524 is located in the second dielectric layer 1520 . The second conductive unit 1524 and the wire layer 1521 are fixed by the second dielectric layer 1520 , and the second conductive unit 1524 is electrically coupled to the first power circuit 1120 through the wire layer 1521 . However, in other embodiments, according to different manufacturing methods, the first conductive unit 1522 , the first dielectric unit 1523 and the second conductive unit 1524 may all be located in the first dielectric layer 1510 and pass through the first dielectric layer The first dielectric of 1510 is fixed. The second conductive unit 1524 is electrically coupled to the first power circuit 1120 through the wire layer 1521 . A detailed manufacturing method will be described in detail below.

如图15所示,在一些实施例中,第三导电单元1525以及第二介电单元1526皆位于第一介电层1510之中,第四导电单元1527位于第二介电层1520之中。第四导电单元1527以及导线层1521通过第二介电层1520而固定,第四导电单元1527是通过导线层1521而电性耦接至第一电力电路1120。然而,在其他实施例中,根据不同的制造方法,第三导电单元1525、第二介电单元1526以及第四导电单元1527皆可位于第一介电层1510之中,且通过第一介电层1510的第一介电质而固定。第四导电单元1527是通过导线层1521而电性耦接至第一电力电路1120。详细的制造方法将于下文中详加叙述。As shown in FIG. 15 , in some embodiments, the third conductive unit 1525 and the second dielectric unit 1526 are both located in the first dielectric layer 1510 , and the fourth conductive unit 1527 is located in the second dielectric layer 1520 . The fourth conductive unit 1527 and the wire layer 1521 are fixed by the second dielectric layer 1520 , and the fourth conductive unit 1527 is electrically coupled to the first power circuit 1120 by the wire layer 1521 . However, in other embodiments, according to different manufacturing methods, the third conductive unit 1525 , the second dielectric unit 1526 and the fourth conductive unit 1527 can all be located in the first dielectric layer 1510 and pass through the first dielectric The first dielectric of layer 1510 is fixed. The fourth conductive unit 1527 is electrically coupled to the first power circuit 1120 through the wire layer 1521 . A detailed manufacturing method will be described in detail below.

图16A-图16B显示根据本发明的一实施例所述的第一电力电路的上视图以及剖面图。图16A显示第一电力电路1120的上视图。如图16A所示,第一功率晶体管1122的源极端S1、栅极端G1以及漏极端D1是如图所示。第一驱动电路1121位于第一功率晶体管1122的源极端S1以及栅极端G1的下方。16A-16B show a top view and a cross-sectional view of a first power circuit according to an embodiment of the present invention. FIG. 16A shows a top view of the first power circuit 1120 . As shown in FIG. 16A , the source terminal S1 , the gate terminal G1 and the drain terminal D1 of the first power transistor 1122 are as shown in the figure. The first driving circuit 1121 is located below the source terminal S1 and the gate terminal G1 of the first power transistor 1122 .

图16B显示第一电力电路1120的剖面图。如图16B所示,第一功率晶体管1122位于第一驱动电路1121以及第一功率晶体管1122的漏极端D1的下方。FIG. 16B shows a cross-sectional view of the first power circuit 1120 . As shown in FIG. 16B , the first power transistor 1122 is located below the first driving circuit 1121 and the drain terminal D1 of the first power transistor 1122 .

参考图14以及图15,图14的第一导体1411可为铜柱。第一导体1411位于第一载体141的上方,且通过第一导电层1401而耦接至自举电容CB的一端(即,底面),图15的导线层1521电性耦接至自举电容CB的另一端(即,顶面)。换句话说,第一功率晶体管1122的源极端S1(即,第五参考节点NR5)是通过导线层1521以及第一导体1411,而电性耦接至第一导电层1401。Referring to FIG. 14 and FIG. 15 , the first conductor 1411 of FIG. 14 may be a copper pillar. The first conductor 1411 is located above the first carrier 141 and is coupled to one end (ie, the bottom surface) of the bootstrap capacitor CB through the first conductive layer 1401 , and the wire layer 1521 of FIG. 15 is electrically coupled to the bootstrap capacitor CB the other end (ie, the top surface). In other words, the source terminal S1 (ie, the fifth reference node NR5 ) of the first power transistor 1122 is electrically coupled to the first conductive layer 1401 through the wire layer 1521 and the first conductor 1411 .

图14的第二导体1412可为铜柱。第二导体1412位于第二载体142的上方,且通过第二导电层1402而电性耦接至解耦合电容CD的一端(即,底面)。图15的导线层1521电性耦接至解耦合电容CD的另一端(即,顶面)。换句话说,第二功率晶体管1132的源极端S2(即,第六参考节点NR6)是通过导线层1521以及第二导体1412,而电性耦接至第二导电层1402。The second conductor 1412 of FIG. 14 may be a copper pillar. The second conductor 1412 is located above the second carrier 142 and is electrically coupled to one end (ie, the bottom surface) of the decoupling capacitor CD through the second conductive layer 1402 . The wire layer 1521 of FIG. 15 is electrically coupled to the other end (ie, the top surface) of the decoupling capacitor CD. In other words, the source terminal S2 (ie, the sixth reference node NR6 ) of the second power transistor 1132 is electrically coupled to the second conductive layer 1402 through the wire layer 1521 and the second conductor 1412 .

图17A-图17F显示根据本发明的一实施例所述的图14的封装结构1400以及图15的封装结构1500的制造流程图。如图17A所示,第一导电单元1522、第三导电单元1525、第一子隔离器1111、第二子隔离器1112、第一电力电路1120、第二电力电路1130、第一导体1411以及第二导体1412位于基板14之上。FIGS. 17A-17F show a manufacturing flow chart of the package structure 1400 of FIG. 14 and the package structure 1500 of FIG. 15 according to an embodiment of the present invention. As shown in FIG. 17A, the first conductive unit 1522, the third conductive unit 1525, the first sub-isolator 1111, the second sub-isolator 1112, the first power circuit 1120, the second power circuit 1130, the first conductor 1411, and the first The two conductors 1412 are located on the substrate 14 .

在一些实施例中,自举电容CB的第一导电单元1522形成于第一载体141之上,并且第一导电层1401位于第一导电单元1522以及第一载体141之间。第一电力电路1120以及第二电力电路1130位于第一载体141之上。解耦合电容CD形成于第二载体142之上,且第二导电层1402位于解耦合电容CD以及第二载体142之间。第一子隔离器1111以及第二子隔离器1112位于第三载体143之上,且第三导电层1403位于第一子隔离器1111以及第二子隔离器1112与第三载体143之间。In some embodiments, the first conductive unit 1522 of the bootstrap capacitor CB is formed on the first carrier 141 , and the first conductive layer 1401 is located between the first conductive unit 1522 and the first carrier 141 . The first power circuit 1120 and the second power circuit 1130 are located on the first carrier 141 . The decoupling capacitor CD is formed on the second carrier 142 , and the second conductive layer 1402 is located between the decoupling capacitor CD and the second carrier 142 . The first sub-isolator 1111 and the second sub-isolator 1112 are located on the third carrier 143 , and the third conductive layer 1403 is located between the first sub-isolator 1111 and the second sub-isolator 1112 and the third carrier 143 .

如图17A所示,第一介电单元1523以及第二介电单元1526分别形成于第一导电单元1522以及第三导电单元1525之上。As shown in FIG. 17A , the first dielectric unit 1523 and the second dielectric unit 1526 are respectively formed on the first conductive unit 1522 and the third conductive unit 1525 .

如图17B所示,第一导电单元1522、第一介电单元1523、第三导电单元1525、第二介电单元1526、第一子隔离器1111、第二子隔离器1112、第一电力电路1120以及第二电力电路1130是通过第一介电质而固定在一起,并形成第一介电层1510。在一些实施例中,第一介电质的材料可为环氧树脂(Epoxy)或是BT树脂(Bismaleimide Triazine Resin)。As shown in FIG. 17B, the first conductive unit 1522, the first dielectric unit 1523, the third conductive unit 1525, the second dielectric unit 1526, the first sub-isolator 1111, the second sub-isolator 1112, the first power circuit 1120 and the second power circuit 1130 are fixed together by a first dielectric, and a first dielectric layer 1510 is formed. In some embodiments, the material of the first dielectric may be epoxy resin (Epoxy) or BT resin (Bismaleimide Triazine Resin).

如图17C至图17E所示,位于第一介电层1510的上方的第一固定层1520a是通过封胶工艺而形成。接着,多个第一金属单元1521a是通过激光钻孔以及金属电镀工艺而形成。在一些实施例中,如图17C以及图17D所示,当利用封胶工艺形成第一固定层1520a之后,蚀刻第一固定层1520a以产生对应至第一第一介电单元1522、第一导体1411、第二导体1412与第一子隔离器1111、第二子隔离器1112、第一电力电路1120以及第二电力电路1130的所有端点的多个孔洞H。接着,如图17E所示,通过激光钻孔以及金属电镀工艺处理的第一固定层1520a,在第一介电层1510上形成了个第一金属单元1521a。在一些实施例中,第一金属单元1521a的一者变成第二导电单元1524,第一金属单元1521a的一者变成第四导电单元1527。第一介电层1510上的第一固定层1520a用以固定第二导电单元1524、第四导电单元1527以及第一金属单元1521a。As shown in FIG. 17C to FIG. 17E , the first fixing layer 1520a located above the first dielectric layer 1510 is formed by an encapsulation process. Next, a plurality of first metal units 1521a are formed by laser drilling and metal plating processes. In some embodiments, as shown in FIG. 17C and FIG. 17D , after the first fixed layer 1520a is formed by an encapsulation process, the first fixed layer 1520a is etched to generate first conductors corresponding to the first first dielectric units 1522 . 1411 , the second conductor 1412 and a plurality of holes H at all terminals of the first sub-isolator 1111 , the second sub-isolator 1112 , the first power circuit 1120 and the second power circuit 1130 . Next, as shown in FIG. 17E , a first metal unit 1521 a is formed on the first dielectric layer 1510 through the laser drilling and the first fixing layer 1520 a processed by the metal plating process. In some embodiments, one of the first metal units 1521a becomes the second conductive unit 1524 and one of the first metal units 1521a becomes the fourth conductive unit 1527 . The first fixing layer 1520a on the first dielectric layer 1510 is used for fixing the second conductive unit 1524, the fourth conductive unit 1527 and the first metal unit 1521a.

参考图17F,在第一固定层1520a行程后,第二固定层1520b以及多个第二金属单元1521b形成于第一固定层1520a之上。第一金属单元1521a以及第二金属单元1521b形成导线层1521,使得第一子隔离器1111、第二子隔离器1112、第一电力单电路1120、第二电力电路1130、自举电容CB以及解耦合电容CD之间如图13所示的方式电性耦接。Referring to FIG. 17F , after the first pinned layer 1520a travels, a second pinned layer 1520b and a plurality of second metal units 1521b are formed on the first pinned layer 1520a. The first metal unit 1521a and the second metal unit 1521b form the wire layer 1521, so that the first sub-isolator 1111, the second sub-isolator 1112, the first power single circuit 1120, the second power circuit 1130, the bootstrap capacitor CB and the solution The coupling capacitors CD are electrically coupled as shown in FIG. 13 .

在此提供的制造方法,可直接将封装在同一个封装结构的自举电容CB以及解耦合电容CD放置于基板14之上。也就是,第一导电单元1522、第一介电单元1523以及第二导电单元1524先形成为自举电容CB,第三导电单元1525、第二介电单元1526以及第四导电单元1527先形成为解耦合电容CD。接着,自举电容CB以及解耦合电容CD放置于基板14之上。In the manufacturing method provided herein, the bootstrap capacitor CB and the decoupling capacitor CD packaged in the same package structure can be directly placed on the substrate 14 . That is, the first conductive unit 1522, the first dielectric unit 1523 and the second conductive unit 1524 are first formed as the bootstrap capacitor CB, and the third conductive unit 1525, the second dielectric unit 1526 and the fourth conductive unit 1527 are first formed as Decoupling capacitor CD. Next, the bootstrap capacitor CB and the decoupling capacitor CD are placed on the substrate 14 .

根据本发明的其他实施例,第一导电单元1522、第一介电单元1523、第三导电单元1525以及第二介电单元1526先封装在一起,再放置于基板14上。接着,在形成第一介电层1510且掩盖至第一导电单元1522、第一介电单元1523、第三导电单元1525以及第二介电单元1526之后,第二导电单元1524以及第四导电单元1527形成于第一介电层1510之上。According to other embodiments of the present invention, the first conductive unit 1522 , the first dielectric unit 1523 , the third conductive unit 1525 and the second dielectric unit 1526 are packaged together first, and then placed on the substrate 14 . Next, after forming the first dielectric layer 1510 and covering the first conductive unit 1522 , the first dielectric unit 1523 , the third conductive unit 1525 and the second dielectric unit 1526 , the second conductive unit 1524 and the fourth conductive unit 1527 is formed over the first dielectric layer 1510.

如图17A至图17F所示的实施例中,第二导电单元1524形成于第一介电单元1523之上且位于第二介电层1520之上,第四导电单元1527形成于第二介电单元1526之上且位于第二介电层1520之上。在其他制造方法的一些实施例中,在分别形成第一介电单元1523以及第二介电单元1526于第一导电单元1522以及第三导电单元1525之上后,将第二导电单元1522形成于第一介电单元1523之上,且将第四导电单元1527形成于第二介电单元1526之上。In the embodiment shown in FIGS. 17A to 17F , the second conductive unit 1524 is formed on the first dielectric unit 1523 and on the second dielectric layer 1520 , and the fourth conductive unit 1527 is formed on the second dielectric layer 1520 . Above cell 1526 and above second dielectric layer 1520 . In some embodiments of other manufacturing methods, after the first dielectric unit 1523 and the second dielectric unit 1526 are formed on the first conductive unit 1522 and the third conductive unit 1525, respectively, the second conductive unit 1522 is formed on the On the first dielectric unit 1523, and a fourth conductive unit 1527 is formed on the second dielectric unit 1526.

接着,利用第一介电质,固定第一导电单元1522、第一介电单元1523、第二导电单元1524、第三导电单元1525、第二介电单元1526以及第四导电单元1527。也就是,第一导电单元1522、第一介电单元1523、第二导电单元1524、第三导电单元1525、第二介电单元1526以及第四导电单元1527皆位于第一介电层1510之中。Next, the first conductive unit 1522 , the first dielectric unit 1523 , the second conductive unit 1524 , the third conductive unit 1525 , the second dielectric unit 1526 and the fourth conductive unit 1527 are fixed by using the first dielectric material. That is, the first conductive unit 1522 , the first dielectric unit 1523 , the second conductive unit 1524 , the third conductive unit 1525 , the second dielectric unit 1526 and the fourth conductive unit 1527 are all located in the first dielectric layer 1510 .

在一些实施例中,在第一导电单元1522以及第三导电单元1526形成于基板14之上后,第一介电质固定第一导电单元1522、第三导电单元1526、第一子隔离器1111、第二子隔离器1112、第一电力电路1120以及第二电力电路1130。在本实施例中,第一介电质作为第一介电单元1523及/或第二介电单元1526的材料。In some embodiments, after the first conductive unit 1522 and the third conductive unit 1526 are formed on the substrate 14 , the first dielectric material fixes the first conductive unit 1522 , the third conductive unit 1526 , and the first sub-isolator 1111 , the second sub-isolator 1112 , the first power circuit 1120 and the second power circuit 1130 . In this embodiment, the first dielectric is used as the material of the first dielectric unit 1523 and/or the second dielectric unit 1526 .

在成第一介电层1510之后,第二导电单元1524位于第一介电层1510之上,第四导电单元1527位于第一介电层1510之上。第一导电单元1522与第二导电单元1524相距第一距离,第三导电单元1525与第四导电单元1527相距第二距离,其中第一距离与第二距离相同或不同。After the first dielectric layer 1510 is formed, the second conductive unit 1524 is located on the first dielectric layer 1510 , and the fourth conductive unit 1527 is located on the first dielectric layer 1510 . The first conductive unit 1522 and the second conductive unit 1524 are separated by a first distance, and the third conductive unit 1525 and the fourth conductive unit 1527 are separated by a second distance, wherein the first distance and the second distance are the same or different.

因此,第一导电单元1522、第二导电单元1524以及在第一导电单元1522与第二导电单元1524之间的第一介电质形成了自举电容CB,第三导电单元1525、第四导电单元1527以及在第三导电单元1525以及第四导电单元1527之间的第一介电质形成了解耦合电容CD。Therefore, the first conductive unit 1522, the second conductive unit 1524 and the first dielectric between the first conductive unit 1522 and the second conductive unit 1524 form a bootstrap capacitor CB, the third conductive unit 1525, the fourth conductive unit 1525 The unit 1527 and the first dielectric between the third conductive unit 1525 and the fourth conductive unit 1527 form a decoupling capacitor CD.

根据本发明的一些实施例,在利用激光钻孔以及金属电镀工艺形成金属单元1521a后,第二介电层1520再次形成,并且再次形成多个孔洞。接着,通过激光钻孔以及金属电镀工艺而形成金属单元1522b。因此,第一子隔离器1111、第二子隔离器1112、第一电力电路1120、第二电力电路1130、自举电容CB以及解耦合电容CD因而电性耦接在一起。According to some embodiments of the present invention, after the metal unit 1521a is formed using the laser drilling and metal plating process, the second dielectric layer 1520 is formed again, and a plurality of holes are formed again. Next, the metal unit 1522b is formed by laser drilling and metal plating processes. Therefore, the first sub-isolator 1111 , the second sub-isolator 1112 , the first power circuit 1120 , the second power circuit 1130 , the bootstrap capacitor CB and the decoupling capacitor CD are thus electrically coupled together.

以上所述为实施例的概述特征。所属技术领域中技术人员应可以轻而易举地利用本发明为基础设计或调整以实行相同的目的和/或实现此处介绍的实施例的相同优点。所属技术领域中技术人员也应了解相同的配置不应背离本发明的构思与范围,在不背离本发明的构思与范围下他们可做出各种改变、取代和交替。说明性的方法仅表示示范性的步骤,但这些步骤并不一定要以所表示的顺序执行。可另外加入、取代、改变顺序和/或消除步骤以视情况而作调整,并与所公开的实施例构思和范围一致。The foregoing are general features of the embodiments. Those skilled in the art will readily be able to utilize the present invention as a basis for designing or adapting to carry out the same purposes and/or achieve the same advantages of the embodiments presented herein. Those skilled in the art should also understand that the same configuration can make various changes, substitutions and alternations without departing from the spirit and scope of the present invention. The illustrative methods represent exemplary steps only, and the steps do not necessarily have to be performed in the order presented. Additional steps may be added, substituted, changed order, and/or eliminated to adjust as appropriate and consistent with the spirit and scope of the disclosed embodiments.

Claims (29)

1. A package structure for an integrated circuit, comprising:
the substrate comprises at least a first carrier and a second carrier, wherein the first carrier and the second carrier are isolated from each other;
a decoupling capacitor located on the second carrier;
an integrated circuit fixed in a first dielectric layer together with the decoupling capacitor, the integrated circuit being located on a first carrier;
a bootstrap capacitor on the substrate, wherein the integrated circuit and the bootstrap capacitor are fixed in the first dielectric layer on the first carrier; and
a conductive layer for electrically coupling the decoupling capacitor to the integrated circuit, wherein the conductive layer is disposed on the first dielectric layer and penetrates a second dielectric layer.
2. The package structure of claim 1, wherein the decoupling capacitor comprises:
a first conductive unit formed in the first dielectric layer;
a first dielectric element formed on the first conductive element; and
a second conductive element formed on the first dielectric element.
3. The package structure of claim 2, wherein the bootstrap capacitor comprises:
a third conductive unit formed in the first dielectric layer;
a second dielectric unit formed on the first conductive unit; and
a fourth conductive element formed on the second dielectric element.
4. The package structure of claim 3, wherein the material of the first dielectric element and the second dielectric element is different from the material of the first dielectric layer and the material of the second dielectric layer.
5. The package structure of claim 1, wherein said integrated circuit comprises:
an isolator for providing a first control signal and a second control signal according to an input signal;
a first power circuit comprising:
a first driving circuit powered by a second supply voltage and a switching voltage and generating a first driving voltage at a first driving node according to the first control signal, wherein a bootstrap diode and the bootstrap capacitor are used to boost a first supply voltage to the second supply voltage, wherein the bootstrap diode includes a bootstrap anode coupled to the first supply voltage and a bootstrap cathode coupled to the second supply voltage, and wherein the bootstrap capacitor is coupled between the second supply voltage and the switching voltage at a switching node; and
a first power transistor for supplying a high voltage to the switching node according to the first driving voltage; and
a second power circuit, comprising:
a second driving circuit, powered by the first supply voltage and a first ground terminal, for generating a second driving voltage at a second driving node according to the second control signal; and
a second power transistor, pulling down the switch voltage to the first ground terminal according to the second driving voltage.
6. The package structure of claim 5, wherein each of the first power transistor and the second power transistor is a GaN transistor.
7. The package structure of claim 5, wherein the isolator comprises:
a first sub-isolator comprising:
a first transmitter powered by a third supply voltage and a second ground and capable of transmitting a first RF signal according to the input signal;
a first receiver powered by a second supply voltage and the switching voltage and generating the first control signal according to the first RF signal; and
a first isolation barrier for electrically isolating the first transmitter from the first receiver; and
a second sub-isolator comprising:
a second transmitter, powered by a third supply voltage and a second ground terminal, for transmitting a second radio frequency signal according to the input signal;
a second receiver powered by the first supply voltage and the first ground and capable of generating the second control signal according to the second RF signal; and
a second isolation barrier for electrically isolating the second transmitter from the second receiver.
8. The package structure of claim 5, wherein said isolator comprises:
a transmitter, powered by a third supply voltage and a second ground terminal, for transmitting a first RF signal and a second RF signal according to the input signal;
a first receiver powered by the second supply voltage and the switching voltage and generating the first control signal according to the first RF signal;
a first isolation barrier for electrically isolating the transmitter from the first receiver;
a second receiver powered by the first supply voltage and the first ground and capable of generating the second control signal according to the first RF signal; and
a second isolation barrier for electrically isolating the transmitter from the second receiver.
9. The package structure of claim 5, wherein the decoupling capacitor is coupled between the high voltage and the first ground.
10. The package structure of claim 5, wherein each of the first power circuit and the second power circuit comprises:
the pre-driver circuit generates a first internal signal according to a control signal, wherein the pre-driver circuit is used for improving the driving capability of the control signal, and a driver circuit generates a driving voltage according to the first internal signal.
11. The package structure of claim 10, wherein each of the first power circuit and the second power circuit comprises:
an upper bridge transistor for providing a supply voltage to a driving node according to an upper bridge voltage of an upper bridge node;
a lower bridge transistor for coupling the driving node to a ground terminal according to the first internal signal; and
a charge pump coupled to the upper bridge node and the driving node for generating the upper bridge voltage exceeding the supply voltage according to the first internal signal.
12. The package structure of claim 11 wherein the top bridge transistor and the bottom bridge transistor are both normally-off transistors.
13. A method of manufacturing a package structure for an integrated circuit, comprising:
providing a decoupling capacitor on a substrate, wherein the substrate comprises at least a first carrier and a second carrier, the first carrier and the second carrier are isolated from each other, and the decoupling capacitor is positioned on the second carrier;
providing an integrated circuit on the substrate, wherein the integrated circuit is positioned on the first carrier;
providing a bootstrap capacitor on the first carrier; and
fixing the bootstrap capacitor, the decoupling capacitor and the integrated circuit through a first dielectric substance to form a first dielectric layer;
forming a conductive line layer on the first dielectric layer to electrically couple the decoupling capacitor to the integrated circuit through the conductive line layer; and
the conductive layer and the first dielectric layer are fixed by a second dielectric substance, and a second dielectric layer is formed and placed on the first dielectric layer.
14. The method of claim 13, wherein the step of providing a decoupling capacitor on a substrate further comprises:
forming a first conductive unit in the first dielectric layer;
forming a first dielectric unit on the first conductive unit; and
a second conductive element is formed over the first dielectric element.
15. The method of claim 13, wherein the step of providing a bootstrap capacitor on the first carrier further comprises:
forming a third conductive unit in the first dielectric layer;
forming a second dielectric unit on the third conductive unit; and
forming a fourth conductive unit on the second dielectric unit.
16. The method of manufacturing of claim 13, wherein said integrated circuit comprises:
an isolator including a first supply node, a second supply node, a third supply node, a fourth supply node, a first reference node, a second reference node, a third reference node, a fourth reference node, a first input node, a second input node, a first output node, and a second output node;
a first power circuit including a fifth supply node coupled to the second supply node, a sixth supply node, a fifth reference node coupled to the second reference node, and a first PWM node coupled to the first output node; and
a second power circuit includes a seventh supply node coupled to the fourth supply node, an eighth reference node coupled to the fifth reference node, a sixth reference node, and a second PWM node coupled to the second output node.
17. The manufacturing method of claim 16, further comprising:
forming a first conductive layer on the substrate, wherein the first power circuit and the bootstrap capacitor are disposed on the first conductive layer, wherein the first conductive layer is coupled to a first terminal of the bootstrap capacitor and the fifth reference node, a second terminal of the bootstrap capacitor is coupled to the fifth supply node through the conductive line layer, and the sixth supply node is coupled to a third terminal of the decoupling capacitor through the conductive line layer.
18. The manufacturing method of claim 17, further comprising:
forming a second conductive layer on the substrate, wherein the second power circuit and the decoupling capacitor are disposed on the second conductive layer, and wherein the second conductive layer is coupled to a fourth terminal of the decoupling capacitor and a sixth reference node.
19. The manufacturing method of claim 18, further comprising:
forming a third conductive layer on the substrate, wherein the isolator is located on the third conductive layer.
20. The method of claim 19, wherein the first supply node and the third supply node are powered by a third supply voltage, the second supply node and the fifth supply node are powered by a second supply voltage, the first input node receives an input signal, the second input node receives an inverted input signal, the first output node generates a first control signal, the second output node generates a second control signal, the fourth supply node and the seventh supply node are powered by a first supply voltage, the sixth supply node is powered by a high voltage, the first reference node and the third reference node are coupled to a second ground, the fourth reference node and the sixth reference node are coupled to a first ground, wherein the input signal and the inverted input signal are inverted.
21. The method of manufacturing of claim 20, wherein said first power circuit comprises:
a first driving circuit powered by the second supply voltage and a switching voltage and generating a first driving voltage at a first driving node according to the first control signal; and
a first power transistor couples the sixth supply node to the fifth reference node according to the first driving voltage.
22. The method of manufacturing of claim 21, wherein said second power circuit comprises:
a second driving circuit, powered by the first supply voltage and a first ground terminal, for generating a second driving voltage at a second driving node according to the second control signal; and
a second power transistor, coupling an eighth supply node to the first ground terminal according to the second driving voltage.
23. The method of claim 22, wherein either of the first power transistor and the second power transistor is a gan transistor.
24. The method of manufacturing of claim 22, wherein said integrated circuit further comprises:
the bootstrap diode includes a bootstrap anode terminal and a bootstrap cathode terminal, wherein the bootstrap anode terminal is coupled to a first supply voltage, and the bootstrap cathode terminal is coupled to a second supply voltage.
25. The method of claim 22, wherein the high voltage exceeds the first supply voltage and the second supply voltage.
26. The method of manufacturing of claim 22, wherein said isolator comprises:
a first sub-isolator comprising:
a first transmitter powered by a third supply voltage and a second ground terminal and transmitting a first RF signal according to the input signal;
a first receiver powered by a second supply voltage and the switching voltage and generating the first control signal according to the first RF signal; and
a first isolation barrier for electrically isolating the first transmitter from the first receiver; and
a second sub-isolator comprising:
a second transmitter, powered by a third supply voltage and a second ground terminal, for transmitting a second radio frequency signal according to the input signal;
a second receiver powered by the first supply voltage and the first ground, the second receiver generating the second control signal according to the second RF signal; and
a second isolation barrier for electrically isolating the second transmitter from the second receiver.
27. The method of manufacturing of claim 22, wherein each of the first power circuit and the second power circuit comprises:
the pre-driver circuit generates a first internal signal according to a control signal, wherein the pre-driver circuit is used for improving the driving capability of the control signal, and a driver circuit generates a driving voltage according to the first internal signal.
28. The method of manufacturing of claim 27, wherein each of the first power circuit and the second power circuit comprises:
an upper bridge transistor for providing a supply voltage to a driving node according to an upper bridge voltage of an upper bridge node;
a lower bridge transistor coupling the driving node to a ground terminal according to the first internal signal; and
a charge pump coupled to the upper bridge node and the driving node, wherein the charge pump is configured to generate the upper bridge voltage exceeding the supply voltage according to the first internal signal.
29. The method of manufacturing of claim 28, wherein each of the first power circuit and the second power circuit comprises:
a hysteresis circuit coupled between the control signal and the pre-driver circuit, wherein the hysteresis circuit receives the control signal to generate a second internal signal, such that the pre-driver circuit generates the first internal signal according to the second internal signal, and the hysteresis circuit is configured to provide a hysteresis function to the control signal.
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