CN111441021A - Preparation method of rotary target and spraying equipment thereof - Google Patents

Abstract

The invention relates to the technical field of sputtering coating, in particular to a preparation method of a rotating target and spraying equipment thereof, including a smelting furnace; a heating device for heating the smelting furnace; a spraying device, including a nozzle and a melt conveying pipeline; wherein The nozzle includes a melt pipe and a gas pipe sleeved on the outside of the melt pipe. A jet gap is formed between the outer side wall of the melt pipe and the inner side wall of the gas pipe, and the melt pipe is communicated with the melting furnace through the melt conveying pipe. The smelting and spraying equipment provided by the invention has the characteristics of simple structure and low manufacturing cost. The layer is evenly and reliably adhered to the surface of the substrate, which helps to improve the uniformity of the film formed by the sputtering of the target.

Description

A kind of preparation method of rotating target and spraying equipment thereof

technical field

The invention relates to the technical field of sputtering coating, in particular to a preparation method of a rotating target and spraying equipment thereof.

Background technique

Low melting point materials such as tin, indium, and indium-tin alloys are important raw materials for glass coatings and copper indium gallium selenide solar cells. The above-mentioned low melting point alloy materials are mainly used in the sputtering coating industry in the form of targets. According to the different sputtering coating equipment, the targets are mainly flat and cylindrical (rotating targets). ) The raw material utilization rate of the target is as high as 70-80%, so the large-scale coating equipment often uses the rotating target as the raw material.

In the prior art, the molten metal is usually directly cast on the substrate, and then the molten metal is controlled to condense to obtain a metal rotating target. In order to obtain a good condensation effect, vertical casting is often used. Large-sized rotating target casting platforms and molds require 4 -5m height, the operation risk is high, and the equipment investment is also large.

SUMMARY OF THE INVENTION

The purpose of the present invention is to provide a preparation method of a rotating target and a spraying equipment thereof, which are helpful for simplifying the structure of the equipment, and the process is relatively safe, and at the same time, the prepared target material helps to improve the uniformity of the film formed by sputtering.

In order to achieve the above object, the present invention provides a method for preparing a rotating target, comprising the following steps:

S1: uniformly coat metal indium on the surface of the substrate to form an indium coating;

S2: smelting low melting point metal in an inert protective atmosphere to obtain a metal melt;

S3: Using the metal melt obtained in step S2, uniformly spraying the metal melt obtained in step S1 on the surface of the substrate obtained in step S1 in an inert protective atmosphere to obtain a target.

Optionally, surface alloying heat treatment is performed on the target obtained in step S3.

Optionally, in step S3, the substrate moves back and forth relative to the nozzle of the spraying equipment at a speed of 20-70 mm/min during the spraying process, and the substrate rotates at a speed of 60-150 r/min.

Based on the purpose of the above invention, there is also provided a spraying equipment of a rotating target, comprising:

melting furnace;

a heating device for heating the smelting furnace;

Spraying equipment, including nozzles and melt delivery pipes;

Wherein, the nozzle includes a melt pipe and a gas pipe sleeved on the outside of the melt pipe, and a jetting gap is formed between the outer side wall of the melt pipe and the inner side wall of the gas pipe, and the melt pipe Communication with the smelting furnace is via the melt transfer conduit.

Optionally, the smelting furnace is equipped with a switch assembly for replacing gas in the furnace.

Optionally, the switch assembly includes a vacuum valve and an intake valve.

Optionally, the heating device includes a heating box and a heating unit, the smelting furnace is arranged in the heating box, and the heating unit is arranged in the heating box for heating the smelting furnace.

Optionally, the melt conveying pipeline is provided with a melt regulating valve for regulating the melt flow.

Optionally, the gas pipeline is connected with a gas delivery pipeline, and a gas regulating valve is provided on the gas delivery pipeline.

Optionally, the width of the air jet gap is 0.5-1 mm, and the diameter of the open end of the melt pipeline is 1-3 mm.

Implementing the embodiments of the present invention has the following technical effects:

The smelting and spraying equipment provided by the present invention smelts metal by setting a smelting furnace. During the metal smelting process, a heating device is used to continuously and stably heat the smelting furnace. It has the characteristics of simple structure and low manufacturing cost; among them, in the process of spraying the melt through the melt pipeline, the gas pipeline passes through the high-speed and high-pressure gas, and the high-speed and high-pressure gas is sprayed from the spray gap at the same time. The liquid flow is instantly broken into micron-sized particles, and pushes the melt particles ejected from the melt pipe to hit the surface of the substrate. After the melt particles hit the back pipe, they will plastically deform and stick to the substrate to form a dense coating to realize the stability of the substrate. Spray processing.

In addition, the present invention makes use of the strong adhesion between indium and Sn, In and InSn particles by coating the indium coating on the surface of the substrate, so that the sprayed layer can be uniformly and reliably adhered to the surface of the substrate, which helps to improve the The uniformity of the film formed by target sputtering.

Description of drawings

1 is a schematic structural diagram of a preferred embodiment of the present invention;

FIG. 2 is a schematic structural diagram of a nozzle in a preferred embodiment of the present invention;

FIG. 3 is a schematic diagram of steps in a preferred embodiment of the present invention.

Description of reference numbers:

1. Melting furnace, 11, first pressure gauge, 12, pressure relief valve, 13, intake valve, 14, vacuum valve, 15, exhaust valve, 16, insulation base, 17, detection unit;

2. Heating device, 21, heating box, 22, heating unit;

3. Spraying device, 31, Nozzle, 311, Melt pipeline, 312, Gas pipeline, 313, Air jet gap, 32, Melt delivery pipeline, 33, Melt regulating valve, 34, Gas delivery pipeline, 35, Gas regulating valve , 36, the second pressure gauge.

Detailed ways

The specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments. The following examples are intended to illustrate the present invention, but not to limit the scope of the present invention.

In the description of this specification, references to the terms "one embodiment/mode", "some embodiments/modes", "example", "specific example", or "some examples", etc. are intended to be combined with the description of the embodiment/mode A particular feature, structure, material, or characteristic described by way of example or example is included in at least one embodiment/mode or example of the present application. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment/mode or example. Furthermore, the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments/means or examples. Furthermore, those skilled in the art may combine and combine the different embodiments/modes or examples described in this specification and the features of the different embodiments/modes or examples without conflicting each other.

In addition, the terms "first", "second", etc. are used in the present invention to describe various kinds of information, but the information should not be limited to these terms, which are only used to distinguish the same type of information from each other. For example, "first" information may also be referred to as "second" information, and similarly, "second" information may also be referred to as "first" information, without departing from the scope of the present invention.

Example 1:

One embodiment of the present invention provides a spraying device for a rotating target, comprising:

melting furnace 1;

a heating device 2 for heating the melting furnace 1;

The spraying device 3 includes a nozzle 31 and a melt conveying pipeline 32;

The nozzle 31 includes a melt pipe 311 and a gas pipe 312 sleeved on the outside of the melt pipe 311. A jetting gap 313 is formed between the outer side wall of the melt pipe 311 and the inner side wall of the gas pipe 312, and the melt pipe 311 passes through the melt pipe 311. The body conveying pipe 32 communicates with the smelting furnace 1 .

The smelting and spraying equipment provided by the present invention smelts metal by setting a smelting furnace 1. During the metal smelting process, the heating device 2 is used to continuously and stably heat the smelting furnace 1. In addition, the smelted metal melt is sprayed out through the nozzle 31. , to realize the spraying of the melt, which has the characteristics of simple structure and low manufacturing cost; wherein, during the process of spraying the melt through the melt pipe 311, the gas pipe 312 passes high-speed and high-pressure gas, and the high-speed and high-pressure gas is sprayed from the jet gap 313. At the same time, the liquid flow of the melt is instantly broken into micron-sized particles, and the melt particles ejected from the melt pipe 311 are pushed to hit the surface of the substrate. Dense coating to realize the spraying process of the substrate.

Specifically, the melting furnace 1 in this embodiment is made of alloy steel, which can be made of stainless steel such as 304, 304L, and 316, and the melting furnace 1 needs to meet an operating pressure of 0.7-1.0 MPa. The starting pressure of the pressure relief valve 12 on the melting furnace 1 is 0.6-0.9Mpa.

Further, in order to prevent the metal from reacting with oxygen in the air during the melting process, the furnace space of the smelting furnace 1 in this embodiment is sealed, so that it is convenient to fill the furnace with inert gas to replace the air in the furnace. The smelting furnace 1 in the smelting furnace 1 is equipped with a switch assembly for replacing the gas in the furnace.

Specifically, the switch assembly in this embodiment includes a vacuum valve 14 and an air intake valve 13. The smelting furnace 1 is evacuated by arranging a vacuum pumping device to connect the vacuum valve 14, and the air in the smelting furnace 1 is evacuated, and the air in the smelting furnace 1 is evacuated through the inlet valve 14. The gas valve 13 is filled with inert gas to form an inert gas environment in the smelting furnace 1 to avoid oxidation of the metal melt.

It also includes an exhaust valve 1 for exhausting the furnace after production is completed.

Further, in order to ensure the safety of the smelting furnace 1 in use, the switch assembly in this embodiment further includes a pressure relief valve 12 and a first pressure gauge 11, which is convenient for adjusting and monitoring the pressure in the furnace.

The heating device 2 in this embodiment includes a heating box 21 and a heating unit 22. The melting furnace 1 is arranged in the heating box 21, and the heating unit 22 is arranged in the heating box 21 for heating the melting furnace 1. Specifically, heating The unit 22 is a number of heating tubes, and the heating tubes are evenly arranged on the inner side wall of the heating box 21 to uniformly heat the smelting furnace 1; wherein, the heating box 21 is made of high-purity graphite.

In order to reduce energy consumption and stabilize the temperature in the heating box, the bottom of the heating box 21 is provided with a thermal insulation base 16 to reduce heat transfer. The thermal insulation base 16 is made of aluminum silicate thermal insulation cotton with a thickness of 30mm.

This embodiment also includes a detection unit 17 for detecting the temperature of the smelting furnace 1, which is convenient for monitoring the temperature in the smelting furnace 1 and adjusting it at any time. Specifically, the detection unit 17 in this embodiment is a K-type thermocouple, the thermocouple type OMEGA NB3-CAIN-18E-12.

Further, the melt conveying pipeline 32 in this embodiment is provided with a melt regulating valve 33 for adjusting the melt flow, which is convenient for adjusting the flow rate and pressure of the melt output. In addition, the melt conveying pipeline 32 adopts BA grade 304L or 316L. The pipeline, the melt conveying pipeline 32 and the smelting furnace 1 are connected by stainless steel ferrule joints or VCR joints, and the flow coefficient CV value of the melt regulating valve 33 for controlling the melt conveying is 0.09-0.37.

In order to further ensure that the temperature of the melt remains stable during the output process, the melt conveying pipe 32 includes a conveying pipe and a pipe heating unit 22 for heating the conveying pipe, so that the melt is kept warm or heated by the pipe heating unit 22 during the output process , to control the temperature of the melt when the melt is sprayed out from the nozzle 31 . Specifically, the pipeline heating unit 22 is a heating sheet covered on the surface of the conveying pipe.

In this embodiment, the gas pipeline 312 is connected to the gas delivery pipeline 34 , and the gas delivery pipeline 34 is provided with a gas regulating valve 35 and a second pressure gauge 36 , and the pressure of the output gas on the gas delivery pipeline 34 is monitored by the second pressure gauge 36 . , and is adjusted by the gas regulating valve 35, which is more convenient to use.

Specifically, the width of the jetting gap 313 in this embodiment is 0.5-1 mm, and the diameter of the open end of the melt pipe 311 is 1-3 mm, so that the gas ejected from the jetting gap 313 forms a stable annular air flow channel , push the melt ejected from the melt pipe 311 in the flow channel to hit the substrate.

Based on the above-mentioned smelting and spraying equipment, an embodiment of the present invention provides a preparation method of a rotating target, through the following steps:

S1: Evenly coat metal indium on the surface of the substrate to form an indium coating. In order to ensure a strong bonding effect between the indium coating and the spray coating, the thickness of the indium coating is 0.05-0.4mm, and the thickness of the indium coating is too high. Thin, the bonding effect between the spray coating and the indium coating is poor, the indium coating is too thick, the cost increases, and the uniformity is difficult to guarantee, therefore, the thickness of the indium coating in this embodiment is 0.2mm;

S2: Weigh 20Kg4N metal indium (melting point 156.61°C) and put it into the melting furnace 1. In order to avoid the oxidation of the material in the melting furnace 1 during the melting process, it is necessary to smelt the low melting point metal in an inert protective atmosphere to obtain a metal melt. , in this embodiment, by repeating the operation of vacuuming-inflating;

Wherein, the above-mentioned vacuuming-inflating process includes:

Open the vacuum valve 14, close the intake valve 13 and the exhaust valve 1, evacuate until the pressure in the furnace is less than 1pa, close the vacuum valve 14, open the intake valve 13, and fill in the inert gas until the pressure in the melting furnace 1 returns to normal pressure, repeat the above operation 3 times, completely replace the air in the smelting furnace 1, and then feed the inert gas into the smelting furnace 1 to make the pressure in the furnace reach 0.3Mpa;

The final temperature of the smelting furnace 1 is set to 200°C, and then the smelting furnace 1 enters the holding stage. While the smelting furnace 1 is heating up, the pipeline heating unit 22 is turned on, and the final temperature is set to 180°C, which is 23.39°C higher than the melting point of the metal.

S3: using the metal melt obtained in step S2, uniformly sprayed on the surface of the substrate obtained in step S1 in an inert protective atmosphere to obtain a target;

During the spraying process, the melt is sprayed through the melt pipeline 311, the gas pipeline 312 is fed with high-speed and high-pressure gas, and the high-speed and high-pressure gas is sprayed from the jet gap 313, and the liquid flow of the melt is instantly broken into micron-level particles, so that the grain size of the obtained target material is uniform, which helps to improve the uniformity of the film formed by the sputtering of the target material, and pushes the melt particles sprayed from the melt pipe 311 to hit the surface of the substrate, and the melt particles hit the surface of the substrate. After the back tube, plastic deformation occurs and a dense coating is formed on the substrate to realize the spraying process of the substrate. Preferably, the relative position of the nozzle 31 and the substrate satisfies the following conditions:

A. The direction of the nozzle 31 is vertical and facing the center line of the substrate, and the level tolerance of the nozzle 31 is controlled within ±5°, so that the melt sprayed by the nozzle 31 hits the substrate as much as possible to ensure that the spraying process is high The deposition rate is high, and the loss of materials is reduced. Further, the level tolerance of the nozzle 31 in this embodiment is controlled within 2°;

B. On the one hand, in order to prevent the loss of kinetic energy after the melt is ejected from the nozzle 31, resulting in poor compactness of the formed spray coating, on the other hand, in order to avoid excessive kinetic energy after the melt is ejected from the nozzle 31, resulting in melt particles After colliding with the substrate, the deposition rate of the ejected material is relatively low, and the distance d between the nozzle 31 and the outside of the substrate is controlled at 3-10cm, and further, the distance d between the nozzle 31 and the outside of the substrate in this embodiment is controlled at 4cm-8cm;

C. Align the nozzle 31 with the starting point of the base indium coating spraying to start spraying

D. During the spraying process, the moving speed of the substrate relative to the nozzle 31 is 30mm/min, and the substrate rotates at the same time, and the rotation speed is 70r/min, so that the melt sprayed by the nozzle 31 is evenly bonded to the surface of the substrate;

E. The jetting pressure of jetting gap 313 is controlled at 0.5Mpa, and the melt regulating valve 33 on the melt conveying pipeline 32 is opened to a valve opening of 20°;

F. During the spraying process, due to the continuous decrease of the liquid level in the smelting furnace, the static pressure of the melt at the nozzle always decreases. Therefore, it is necessary to continuously supplement the inert gas into the smelting furnace 1, and control the pressure in the smelting furnace 1 to be at 0.35Mpa;

When the sprayed coating reaches the preset thickness, the melt regulating valve 33 and the gas regulating valve 35 are turned off in sequence.

The rotating target obtained in this example includes a substrate, an indium coating layer and an indium coating layer sequentially covering the substrate. The relative density of the rotating target is 98.5%, and the oxygen content is 240 pm.

Example 2:

Based on the smelting and spraying equipment provided in Embodiment 1, an embodiment of the present invention provides a preparation method of a rotating target for producing low-melting-point materials by spraying, through the following steps:

S1: uniformly coat metal indium on the surface of the substrate to form an indium tin coating. In order to ensure a strong bonding effect between the indium tin coating and the spray coating, the thickness of the indium tin coating is 0.05-0.4mm, and the indium tin coating is 0.05-0.4mm thick. The thickness of the indium coating is too thin, the bonding effect between the spray coating and the indium coating is poor, the indium coating is too thick, the cost increases, and the uniformity is difficult to guarantee. Therefore, the thickness of the indium coating in this embodiment is 0.3mm;

S2: Weigh 15Kg4N In30Sn70 (atomic ratio of 30% In: 70% Sn, melting point 173°C) and put it into the melting furnace 1. In order to avoid the oxidation of the material in the melting furnace 1 during the melting process, it must be smelted in an inert protective atmosphere. The melting point metal obtains a metal melt, specifically, in this embodiment, by repeating the operation of vacuuming-gassing;

Wherein, the above-mentioned vacuuming-inflating process includes:

Open the vacuum valve 14, close the intake valve 13 and the exhaust valve 1, evacuate until the pressure in the furnace is less than 1pa, close the vacuum valve 14, open the intake valve 13, and fill in the inert gas until the pressure in the melting furnace 1 returns to normal pressure, repeat the above operation 3 times, completely replace the air in the smelting furnace 1, and then feed the inert gas into the smelting furnace 1 to make the pressure in the furnace reach 0.35Mpa;

The final temperature of the smelting furnace 1 is set to 223°C, and then the smelting furnace 1 enters the holding stage. While the smelting furnace 1 is heating up, the pipeline heating unit 22 is turned on, and the final temperature is set to 200°C, which is 27°C higher than the melting point of the metal.

S3: using the metal melt obtained in step S2, uniformly sprayed on the surface of the substrate obtained in step S1 in an inert protective atmosphere to obtain a target;

In the spraying process, preferably, the relative position of the nozzle 31 and the substrate satisfies the following conditions:

A. The direction of the nozzle 31 is vertical and facing the centerline of the substrate, and the level tolerance of the nozzle 31 is controlled within 3°;

B. The distance d between the nozzle 31 and the outside of the substrate is controlled at 6-10cm;

C. Align the nozzle 31 with the starting point of the substrate indium coating spraying to start spraying;

D. During the spraying process, the moving speed of the substrate relative to the nozzle 31 is 25mm/min, and the substrate rotates at the same time, and the rotation speed is 100r/min;

E. The jetting pressure of jetting gap 313 is controlled at 0.65Mpa, and the melt regulating valve 33 on the melt conveying pipeline 32 is opened to a valve opening of 30°;

F. During the spraying process, due to the continuous decrease of the liquid level in the smelting furnace, the static pressure of the melt at the nozzle always decreases. Therefore, it is necessary to continuously supplement the inert gas into the smelting furnace 1, and control the pressure in the smelting furnace 1 to be at 0.45Mpa;

When the sprayed coating reaches the preset thickness, the melt regulating valve 33 and the gas regulating valve 35 are turned off in sequence.

S4: Perform surface alloying heat treatment on the target obtained in step S3, remove the sprayed indium tin target and place it in an annealing furnace, preferably, the optimum temperature for alloying is 170°C, and the annealing time is 5h.

The rotating target obtained in this example includes a substrate, an indium coating layer and an indium-tin alloy layer sequentially covering the substrate. The relative density of the rotating target is 97.2% and the oxygen content is 238 pm.

Example 3:

Based on the smelting and spraying equipment provided in Embodiment 1, an embodiment of the present invention provides a preparation method of a rotating target for producing low-melting-point materials by spraying, through the following steps:

S1: Evenly coat metal indium on the surface of the substrate to form a tin coating. In order to ensure a strong bonding effect between the tin coating and the spray coating, the thickness of the tin coating is 0.05-0.4mm, and the thickness of the indium coating is too high. Thin, the bonding effect between the spray coating and the indium coating is poor, the indium coating is too thick, the cost increases, and the uniformity is difficult to guarantee, therefore, the thickness of the indium coating in this embodiment is 0.2mm;

S2: Weigh 20kg of 4N metal tin (melting point: 231.89°C) and put it into the smelting furnace 1. In order to avoid oxidation of the material in the smelting furnace 1 during the smelting process, it is necessary to smelt the low-melting point metal in an inert protective atmosphere to obtain a metal melt. , in this embodiment, by repeating the operation of vacuuming-inflating;

Wherein, the above-mentioned vacuuming-inflating process includes:

Open the vacuum valve 14, close the intake valve 13 and the exhaust valve 1, evacuate until the pressure in the furnace is less than 1pa, close the vacuum valve 14, open the intake valve 13, and fill in the inert gas until the pressure in the melting furnace 1 returns to normal pressure, repeat the above operation 3 times, completely replace the air in the smelting furnace 1, and then feed the inert gas into the smelting furnace 1 to make the pressure in the furnace reach 0.4Mpa;

The final temperature of the smelting furnace 1 is set to 280°C, and then the smelting furnace 1 enters the holding stage. While the smelting furnace 1 is heating up, the pipeline heating unit 22 is turned on, and the final temperature is set to 262°C, which is 30.11°C higher than the melting point of the metal.

S3: using the metal melt obtained in step S2, uniformly sprayed on the surface of the substrate obtained in step S1 in an inert protective atmosphere to obtain a target;

In the spraying process, preferably, the relative position of the nozzle 31 and the substrate satisfies the following conditions:

A. The direction of the nozzle 31 is vertical and facing the centerline of the substrate, and the level tolerance of the nozzle 31 is controlled within 3°;

B. The distance d between the nozzle 31 and the outside of the substrate is controlled at 5cm-10cm;

C. Align the nozzle 31 with the starting point of the base indium coating spraying to start spraying

D. During the spraying process, the moving speed of the substrate relative to the nozzle 31 is 30mm/min, and the substrate rotates at the same time, and the rotation speed is 80r/min;

E. The air pressure of the air injection gap 313 is controlled at 0.65Mpa, and the melt regulating valve 33 on the melt conveying pipeline 32 is opened to a valve opening of 45°;

F. During the spraying process, due to the continuous decrease of the liquid level in the smelting furnace, the static pressure of the melt at the nozzle always decreases. Therefore, it is necessary to continuously supplement the inert gas into the smelting furnace 1, and control the pressure in the smelting furnace 1 to be at 0.5Mpa;

When the sprayed coating reaches the preset thickness, the melt regulating valve 33 and the gas regulating valve 35 are turned off in sequence.

S4: Perform surface alloying heat treatment on the target obtained in step S3. Preferably, the sprayed tin target is removed and placed in an annealing furnace, heated to 180°C, kept for 3 hours, cooled to room temperature and taken out.

The rotating target obtained in this example includes a substrate, an indium coating layer and a tin layer sequentially covering the substrate. The relative density of the rotating target is 96.5% and the oxygen content is 185 ppm.

To sum up, the smelting and spraying equipment provided by the present invention smelts metal by setting a smelting furnace 1. During the metal smelting process, the heating device 2 is used to continuously and stably heat the smelting furnace 1. In addition, the smelted metal melt is passed through the nozzle. 31 is sprayed to realize the spraying of the melt, which has the characteristics of simple structure and low manufacturing cost; wherein, in the process of spraying the melt through the melt pipeline 311, the gas pipeline 312 passes high-speed and high-pressure gas, and the high-speed and high-pressure gas flows from the jet gap. At the same time as 313 is ejected, the liquid flow of the melt is instantly broken into micron-sized particles, and the melt particles ejected from the melt pipe 311 are pushed to hit the surface of the substrate. After the melt particles hit the substrate, plastic deformation occurs and sticks to the substrate. A dense coating is formed on the substrate to realize the spraying process of the substrate.

In addition, in the present invention, by coating an indium coating on the surface of the substrate, the sprayed layer can be reliably adhered to the surface of the substrate by utilizing the strong adhesion between indium and particles such as Sn, In, and InSn, and the sprayed coating can be formed after spraying. The spray coating is subjected to surface alloying heat treatment, thereby enhancing the adhesion between the coating layer and the spray coating.

The above are only the preferred embodiments of the present invention. It should be pointed out that for those skilled in the art, without departing from the technical principle of the present invention, several improvements and replacements can be made. These improvements and replacements It should also be regarded as the protection scope of the present invention.

Claims (10)

1. a preparation method of a rotating target, is characterized in that, comprises the following steps: S1: uniformly coat metal indium on the surface of the substrate to form an indium coating; S2: smelting low melting point metal in an inert protective atmosphere to obtain a metal melt; S3: Using the metal melt obtained in step S2, uniformly spraying the metal melt obtained in step S1 on the surface of the substrate obtained in step S1 in an inert protective atmosphere to obtain a target. 2 . The method for preparing a rotating target according to claim 1 , wherein in S1 , a surface alloying heat treatment is performed on the target material obtained in step S3 . 3 . 3 . The method for preparing a rotating target according to claim 1 , wherein in step S3 , the base material moves back and forth relative to the nozzle of the spraying equipment at a speed of 20-70 mm/min during the spraying process, and the base material is 3. 4 . The wood rotates at a speed of 60-150r/min. 4. a rotating target spraying equipment, is characterized in that, comprises: melting furnace; a heating device for heating the smelting furnace; Spraying equipment, including nozzles and melt delivery pipes; Wherein, the nozzle includes a melt pipe and a gas pipe sleeved on the outside of the melt pipe, and a jetting gap is formed between the outer side wall of the melt pipe and the inner side wall of the gas pipe, and the melt pipe Communication with the smelting furnace is via the melt transfer conduit. 5 . The rotating target spraying equipment according to claim 4 , wherein the smelting furnace is equipped with a switch assembly for replacing gas in the furnace. 6 . 6 . The rotary target spraying equipment according to claim 5 , wherein the switch assembly comprises a vacuum valve and an air intake valve. 7 . 7 . The rotating target spraying equipment according to claim 4 , wherein the heating device comprises a heating box and a heating unit, the smelting furnace is arranged in the heating box, and the heating unit is arranged in the heating box. 8 . The heating box is used to heat the melting furnace. 8 . The rotating target spraying equipment according to claim 4 , wherein the melt conveying pipeline is provided with a melt regulating valve for regulating the melt flow. 9 . 9 . The rotating target spraying equipment according to claim 4 , wherein the gas pipeline is connected with a gas delivery pipeline, and a gas regulating valve is provided on the gas delivery pipeline. 10 . 10 . The rotating target spraying equipment according to claim 4 , wherein the width of the air jet gap is 0.5-1 mm, and the diameter of the open end of the melt pipeline is 1-3 mm. 11 .

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