CN111302516A - 一种光刻胶剥离液废液再生利用的方法 - Google Patents
一种光刻胶剥离液废液再生利用的方法 Download PDFInfo
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- CN111302516A CN111302516A CN202010101582.8A CN202010101582A CN111302516A CN 111302516 A CN111302516 A CN 111302516A CN 202010101582 A CN202010101582 A CN 202010101582A CN 111302516 A CN111302516 A CN 111302516A
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- liquid
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- photoresist stripping
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/38—Treatment of water, waste water, or sewage by centrifugal separation
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
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- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
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CN202010101582.8A CN111302516B (zh) | 2020-02-19 | 2020-02-19 | 一种光刻胶剥离液废液再生利用的方法 |
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CN202010101582.8A CN111302516B (zh) | 2020-02-19 | 2020-02-19 | 一种光刻胶剥离液废液再生利用的方法 |
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CN111302516A true CN111302516A (zh) | 2020-06-19 |
CN111302516B CN111302516B (zh) | 2023-05-05 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115304187A (zh) * | 2022-08-17 | 2022-11-08 | 上海盛剑微电子有限公司 | 剥离液废液的回收处理方法 |
CN116332714A (zh) * | 2022-07-28 | 2023-06-27 | 四川熔增环保科技有限公司 | 一种mmea和bdg混合废溶剂的回收提纯方法 |
RU2805410C1 (ru) * | 2022-12-21 | 2023-10-16 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Способ очистки сточных вод производства печатных плат, содержащих фоторезист спф-вщ, и устройство для его осуществления |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001212596A (ja) * | 2000-02-03 | 2001-08-07 | Matsushita Environment Airconditioning Eng Co Ltd | 現像廃液再生方法 |
CN105314770A (zh) * | 2015-12-01 | 2016-02-10 | 杭州格林达化学有限公司 | 四甲基氢氧化铵显影废液再生系统和再生方法 |
CN106746092A (zh) * | 2017-01-19 | 2017-05-31 | 电信科学技术仪表研究所 | 一种电路板组装件清洗废液的水处理方法及系统 |
CN108911287A (zh) * | 2018-07-23 | 2018-11-30 | 华进半导体封装先导技术研发中心有限公司 | 用于集成电路制造的清洗液再生工艺方法与装置 |
-
2020
- 2020-02-19 CN CN202010101582.8A patent/CN111302516B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001212596A (ja) * | 2000-02-03 | 2001-08-07 | Matsushita Environment Airconditioning Eng Co Ltd | 現像廃液再生方法 |
CN105314770A (zh) * | 2015-12-01 | 2016-02-10 | 杭州格林达化学有限公司 | 四甲基氢氧化铵显影废液再生系统和再生方法 |
CN106746092A (zh) * | 2017-01-19 | 2017-05-31 | 电信科学技术仪表研究所 | 一种电路板组装件清洗废液的水处理方法及系统 |
CN108911287A (zh) * | 2018-07-23 | 2018-11-30 | 华进半导体封装先导技术研发中心有限公司 | 用于集成电路制造的清洗液再生工艺方法与装置 |
Non-Patent Citations (2)
Title |
---|
王海军: "改性硅藻土在线路板废水处理中的应用研究", 《中国优秀硕士学位论文全文数据库 工程科技Ⅰ辑》 * |
郑水林等: "《粉体表面改性》", 30 June 2019, 中国建材工业出版社 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116332714A (zh) * | 2022-07-28 | 2023-06-27 | 四川熔增环保科技有限公司 | 一种mmea和bdg混合废溶剂的回收提纯方法 |
CN115304187A (zh) * | 2022-08-17 | 2022-11-08 | 上海盛剑微电子有限公司 | 剥离液废液的回收处理方法 |
RU2805410C1 (ru) * | 2022-12-21 | 2023-10-16 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) | Способ очистки сточных вод производства печатных плат, содержащих фоторезист спф-вщ, и устройство для его осуществления |
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CN111302516B (zh) | 2023-05-05 |
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Address after: 215000 No. 168, Shanfeng Road, Hedong Industrial Park, Wuzhong Economic Development Zone, Suzhou, Jiangsu Applicant after: Jingrui Electronic Materials Co.,Ltd. Address before: 215000 No. 3, Chenghu East Road, Wuzhong Economic Development Zone, Suzhou, Jiangsu Applicant before: SUZHOU CRYSTAL CLEAR CHEMICAL Co.,Ltd. |
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Effective date of registration: 20231206 Address after: 215124 No. 501 Minfeng Road, Wuzhong Economic Development Zone, Suzhou City, Jiangsu Province Patentee after: Ruihong (Suzhou) Electronic Chemicals Co.,Ltd. Address before: 215000 No. 168, Shanfeng Road, Hedong Industrial Park, Wuzhong Economic Development Zone, Suzhou, Jiangsu Patentee before: Jingrui Electronic Materials Co.,Ltd. |