CN111292934B

CN111292934B - Inductance structure

Info

Publication number: CN111292934B
Application number: CN201910664942.2A
Authority: CN
Inventors: 康斯坦丁·库兹涅佐夫; 袁晟
Original assignee: Spreadtrum Communications Shanghai Co Ltd
Current assignee: Spreadtrum Communications Shanghai Co Ltd
Priority date: 2019-07-19
Filing date: 2019-07-19
Publication date: 2022-01-04
Anticipated expiration: 2039-07-19
Also published as: CN111292934A

Abstract

An inductive structure, comprising: the rings are wound by the same conducting wire and distributed on the same plane in a overlooking state; wherein the plurality of rings comprises a first partial ring comprising a plurality of nested rings and a second partial ring comprising a plurality of nested rings; the current direction of each ring in the first partial ring is the same, the current direction of each ring in the second partial ring is the same, and the current direction of each ring in the first partial ring is opposite to the current direction of each ring in the second partial ring. The scheme provided by the invention can maximize the inductance isolation and reduce the electromagnetic coupling between the VCO resonators.

Description

Inductance structure

Technical Field

The invention relates to the technical field of circuits, in particular to an inductor structure.

Background

Recent advances in wireless communication technology allow entire Radio Frequency (RF) transceivers to be implemented on a single chip. However, implementing the entire RF transceiver on a single chip presents a number of challenges.

For example, in a Wideband Code Division Multiple Access (W-CDMA) transceiver, a single chip solution requires two RF Voltage-Controlled oscillators (VCOs) to operate on one chip simultaneously. Such an arrangement can produce unwanted interaction between the two VCOs due to various different types of mutual coupling mechanisms, which can result in spurious receiver responses at unwanted frequencies in the transmit spectrum. The primary mutual coupling mechanism is typically the fundamental Electromagnetic (EM) coupling between resonators, i.e., between large inductor structures in the VCO.

There are a number of techniques in the prior art for reducing the EM mutual coupling between VCOs due to inductance. However, these schemes typically require additional circuitry (e.g., power dividers, mixers, etc.) to implement, which increases current consumption.

Disclosure of Invention

The invention solves the technical problem of how to effectively improve the inductance isolation and reduce the electromagnetic coupling between VCO resonators.

To solve the above technical problem, an embodiment of the present invention provides an inductor structure, including: the rings are wound by the same conducting wire and distributed on the same plane in a overlooking state; wherein the plurality of rings comprises a first partial ring comprising a plurality of nested rings and a second partial ring comprising a plurality of nested rings; the current direction of each ring in the first partial ring is the same, the current direction of each ring in the second partial ring is the same, and the current direction of each ring in the first partial ring is opposite to the current direction of each ring in the second partial ring.

Optionally, in the plane, an outer contour of the figure formed by the plurality of rings is an axisymmetric figure.

Optionally, the total area enclosed by each ring in the first partial ring is equal to the total area enclosed by each ring in the second partial ring.

Optionally, the first partial ring and the second partial ring both include n rings, where the area of the ith ring from the outside to the inside in the first partial ring is different from the area of the ith ring from the outside to the inside in the second partial ring, where n and i are positive integers, and i is greater than or equal to 1 and less than or equal to n.

Optionally, the number of rings included in the first partial ring is the same as the number of rings included in the second partial ring.

Optionally, the beginning and the end of the wire are located in the same loop.

Optionally, the number of the plurality of rings is 4.

Optionally, the first partial ring includes a first ring and a second ring from outside to inside, and the second partial ring includes a third ring and a fourth ring from outside to inside.

Optionally, the first outflow end of the first ring is coupled to the first inflow end of the fourth ring, the first outflow end of the fourth ring is coupled to the first inflow end of the third ring, the first outflow end of the third ring is coupled to the first inflow end of the second ring, the first outflow end of the second ring is coupled to the second inflow end of the third ring, the second outflow end of the third ring is coupled to the second inflow end of the fourth ring, and the second outflow end of the fourth ring is coupled to the first inflow end of the first ring.

Optionally, for each of the first inflow end, the first outflow end, the second inflow end, and the second outflow end, the end is located at a center point of one edge of the ring.

Optionally, the sum of the areas enclosed by the first ring and the second ring is equal to the sum of the areas enclosed by the third ring and the fourth ring.

Optionally, the areas enclosed by the first ring, the second ring, the third ring and the fourth ring are different.

Optionally, the area enclosed by the first ring is equal to the area enclosed by the third ring, and the area enclosed by the second ring is equal to the area enclosed by the fourth ring.

Optionally, a distance from the second ring to a first side of the first ring is greater than a distance from the second ring to a second side of the first ring, and/or a distance from the fourth ring to a first side of the third ring is greater than a distance from the fourth ring to a second side of the third ring, wherein the first side of the first ring is opposite to the second side, and the first side of the third ring is opposite to the second side.

Optionally, a distance from the second ring to a first side of the first ring is equal to a distance from the second ring to a second side of the first ring, and a distance from the fourth ring to a first side of the third ring is equal to a distance from the fourth ring to a second side of the third ring, wherein the first side of the first ring is opposite to the second side, and the first side of the third ring is opposite to the second side.

Compared with the prior art, the technical scheme of the embodiment of the invention has the following beneficial effects:

an embodiment of the present invention provides an inductor structure, including: the rings are wound by the same conducting wire and distributed on the same plane in a overlooking state; wherein the plurality of rings comprises a first partial ring comprising a plurality of nested rings and a second partial ring comprising a plurality of nested rings; the current direction of each ring in the first partial ring is the same, the current direction of each ring in the second partial ring is the same, and the current direction of each ring in the first partial ring is opposite to the current direction of each ring in the second partial ring. Compared with the prior art, the inductance structure can maximize inductance isolation and reduce electromagnetic coupling between VCO resonators. Specifically, the inductance structure according to the embodiment of the present invention can achieve the effect of minimizing the generated magnetic field without being interfered by the magnetic field from the external source on the basis of not depending on the symmetrical design, and minimize the interference of the inductance structure to other devices or electronic circuits. Further, the current direction of each ring in the first partial ring is opposite to that of each ring in the second partial ring, so that the inductance structure can counteract forward and reverse magnetic fields, inductance isolation is achieved to the maximum extent, and electromagnetic coupling between VCO resonators and between the VCO internal inductance structure and other devices is reduced.

Further, the total area enclosed by each ring in the first partial ring is equal to the total area enclosed by each ring in the second partial ring. Since the inductance structure is formed by winding the same wire, the magnitude of the current flowing through each ring in the first partial ring and the second partial ring can be maintained in a substantially same state at any time, and the magnitude of the total magnetic flux generated by the first partial ring and the magnitude of the total magnetic flux generated by the second partial ring can be substantially equal by combining that the total area enclosed by each ring in the first partial ring is equal to the total area enclosed by each ring in the second partial ring. Further, since the direction of the current on each ring in the first partial ring is opposite to the direction of the current on each ring in the second partial ring, the direction of the magnetic flux generated by the first partial ring is opposite to the direction of the magnetic flux generated by the second partial ring. Therefore, the magnetic flux generated by the first partial ring and the magnetic flux generated by the second partial ring can be basically offset, so that the inductor structure basically has no magnetic field leakage to the outside, and the inductor isolation is realized.

Drawings

Fig. 1 is a schematic diagram of a first inductor structure according to an embodiment of the present invention;

fig. 2 is a schematic diagram of a second inductor structure according to an embodiment of the present invention;

fig. 3 is a schematic diagram of a variation of the inductor structure shown in fig. 2;

FIG. 4 is a schematic diagram of a third inductor structure in accordance with an embodiment of the present invention;

FIG. 5 is a schematic diagram of a fourth inductor configuration in accordance with an embodiment of the present invention;

fig. 6 is a schematic diagram of a fifth inductor structure according to an embodiment of the present invention.

Detailed Description

As noted in the background, existing inductive designs for reducing electromagnetic coupling between VCO resonators need to be implemented by means of additional circuitry, increasing the current consumption of the VCO.

On the other hand, in some prior art schemes, the magnetic field of the inductance structure itself is cancelled by adopting a symmetrical design. For example, by designing the coils to be symmetrical about a horizontal and/or vertical axis, the magnetic fields generated by the inductive structure may be made to tend to cancel.

However, the inductor structure based on the symmetric design has strict requirements on the shape, so that the placeable position of the inductor structure in the VCO is limited, which is not favorable for the miniaturization design of the whole structure of the VCO.

The inductance structure can maximize inductance isolation and reduce electromagnetic coupling between the VCO resonators. Those skilled in the art understand that the same conductive line is not necessarily the same continuous conductive line, but may be connected by a connecting line due to layer crossing or line crossing in the layout.

Specifically, the inductance structure according to the embodiment of the present invention can achieve the effect of minimizing the generated magnetic field without being interfered by the magnetic field from the external source on the basis of not depending on the symmetrical design, and minimize the interference of the inductance structure to other devices or electronic circuits.

Further, the current direction of each ring in the first partial ring is opposite to that of each ring in the second partial ring, so that the inductance structure can counteract forward and reverse magnetic fields, inductance isolation is achieved to the maximum extent, and electromagnetic coupling between VCO resonators and between the VCO internal inductance structure and other devices is reduced.

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.

Fig. 1 is a schematic diagram of a first inductor structure according to an embodiment of the present invention. The inductance structure described in this embodiment can be applied to a VCO resonator.

Specifically, referring to fig. 1, the inductance structure 100 may include: the plurality of rings 110 may be wound from the same wire, and in a top view, the plurality of rings 110 may be distributed on the same plane. The plane may be a plane formed by an x axis and a y axis in the drawing, and the top view state may be a state of viewing the inductance structure 100 along a direction perpendicular to the plane formed by the x axis and the y axis.

For example, referring to fig. 1, the number of the plurality of rings 110 may be 4 rings 110, and the 4 rings 110 are, in a top view, a first ring 111, a second ring 112, a third ring 113 and a fourth ring 114 from top to bottom and from outside to inside in the plane.

More specifically, the plurality of rings 110 may include a first partial ring 120 and a second partial ring 130, the first partial ring 120 may include a plurality of nested rings 110, and the second partial ring 130 may include a plurality of nested rings 110.

Further, the current direction of each ring 110 in the first partial ring 120 is the same, the current direction of each ring 110 in the second partial ring 130 is the same, and the current direction of each ring 110 in the first partial ring 120 is opposite to the current direction of each ring 110 in the second partial ring 130. Here, the current direction means a direction in which a current flows in the ring 110 in a plan view.

For example, referring to fig. 1, the first partial ring 120 may include the first ring 111 and the second ring 112 from the outside inward, and the second partial ring 130 may include the third ring 113 and the fourth ring 114 from the outside inward. Wherein the second ring 112 is nested within the area encompassed by the first ring 111 and the fourth ring 114 is nested within the area encompassed by the third ring 113.

Further, assuming that the current inflow end of the inductance structure 100 is the beginning end 100a of the conductive wire and the current outflow end is the end 100b of the conductive wire, the current directions of the first ring 111 and the second ring 112 are both clockwise directions in a top view according to the current directions indicated by arrows in fig. 1. Accordingly, the directions of the magnetic fluxes generated by the first ring 111 and the second ring 112 are both directions (indicated by "-" in the figure) perpendicular to the plane and extending into the plane; the third ring 113 and the fourth ring 114 are both counterclockwise, and accordingly, the directions of the magnetic fluxes generated by the third ring 113 and the fourth ring 114 are both directions perpendicular to the plane and extending out of the plane (indicated by "+" in the drawing).

In a variation, the positions of the current inflow end and the current outflow end may be interchanged, that is, current may flow into the end 100b of the conductive wire and flow out from the start end 100 a. At this time, the current directions of the first ring 111 and the second ring 112 are both counterclockwise, and the current directions of the third ring 113 and the fourth ring 114 are both clockwise.

In one or more embodiments, the beginning 100a and the end 100b of the wire may be located in the same ring 110 of the plurality of rings 110.

For example, referring to fig. 1, the beginning 100a and the end 100b of the wire may be located on either side of the first loop 111.

In one or more embodiments, each of the first partial ring 120 and the second partial ring 130 may include n rings 110, wherein the area of the i-th ring 110 from the outside to the inside in the first partial ring 120 may be different from the area of the i-th ring 110 from the outside to the inside in the second partial ring 130, where n and i are positive integers, and 1 ≦ i ≦ n.

For example, referring to fig. 1, the area enclosed by the first ring 111 and the area enclosed by the third ring 113 may not be the same.

For another example, referring to fig. 1, the area encompassed by the second ring 112 may not be the same as the area encompassed by the fourth ring 114.

For another example, referring to fig. 1, the areas surrounded by the first ring 111, the second ring 112, the third ring 113, and the fourth ring 114 are not equal to each other.

In one or more embodiments, the first partial ring 120 may include the same number of rings 110 as the second partial ring 130.

For example, referring to fig. 1, the first partial ring 120 and the second partial ring 130 may include 2 rings 110, respectively.

In one or more embodiments, the outer contour of the figure formed by the plurality of rings 110 may be an axisymmetric figure within the plane. In practical applications, the axisymmetric pattern may be substantially symmetrical to meet the requirements of the manufacturing process. For example, in order to reduce sharp corners, some smoothing process may be performed at the corners of the rings 110, so that the outline of the graph formed by the plurality of rings 110 is slightly non-axisymmetric; for example, in manufacturing, the outer contour of the pattern formed by the plurality of rings 110 may be non-axisymmetric in a slight portion due to process errors. But these do not affect the general axial symmetry of the outer contour.

For example, referring to fig. 1, the outer contour of the figure formed by the first ring 111, the second ring 112, the third ring 113 and the fourth ring 114 may be equivalent to a T-shape, and the T-shape is symmetrical to the left and right along the symmetry axis α shown in the figure.

For another example, when the first ring 111 and the third ring 113 have the same shape and area, the outer contour of the graph formed by the first ring 111, the second ring 112, the third ring 113, and the fourth ring 114 may be equivalent to a rectangle.

In one or more embodiments, the total area enclosed by each ring 110 in the first partial ring 120 may be equal to the total area enclosed by each ring 110 in the second partial ring 130. Based on the above description of the manufacturing process, the total area may be substantially equal, or the deviation between the total area enclosed by each ring 110 in the first partial ring 120 and the total area enclosed by each ring 110 in the second partial ring 130 may be within a preset error range. For example, the preset error range can reach 1000-5000 square microns.

For example, referring to fig. 1, the sum of the areas surrounded by the first ring 111 and the second ring 112 may be equal to the sum of the areas surrounded by the third ring 113 and the fourth ring 114.

Since the inductance structure 100 is formed by winding the same wire, the magnitude of the current flowing through the first partial loop 120 and the second partial loop 130 can be maintained in a substantially same state at any time, and when the total area enclosed by each loop 110 in the first partial loop 120 is equal to the total area enclosed by each loop 110 in the second partial loop 130, the magnitude of the total magnetic flux generated by the first partial loop 120 and the magnitude of the total magnetic flux generated by the second partial loop 130 can be ensured to be substantially equal.

Further, since the direction of the current on the first partial ring 120 is opposite to the direction of the current on the second partial ring 130, the direction of the magnetic flux generated by the first partial ring 120 (corresponding to the direction "-" of the magnetic flux of the first ring 111 and the second ring 112 in fig. 1) is opposite to the direction of the magnetic flux generated by the second partial ring 130 (corresponding to the direction "+" of the magnetic flux of the third ring 113 and the fourth ring 114 in fig. 1). Therefore, the magnetic flux generated by the first partial ring 120 and the magnetic flux generated by the second partial ring 130 can be substantially cancelled out, so that the inductor structure 100 has substantially no magnetic field leakage to the outside, and the inductor isolation is realized.

Further, referring to fig. 1, the first outflow end 111a of the first ring 111 is coupled to the first inflow end 114a of the fourth ring 114, the first outflow end 114b of the fourth ring 114 is coupled to the first inflow end 113a of the third ring 113, the first outflow end 113b of the third ring 113 is coupled to the first inflow end 112a of the second ring 112, the first outflow end 112b of the second ring 112 is coupled to the second inflow end 113c of the third ring 113, the second outflow end 113d of the third ring 113 is coupled to the second inflow end 114c of the fourth ring 114, and the second outflow end 114d of the fourth ring 114 is coupled to the first inflow end 111b of the first ring 111.

Further, the conducting wire segment connecting the first inflow end 111b of the first ring 111 and the end 100b, and the conducting wire segment connecting the first outflow end 111a of the first ring 111 and the start end 100a form the first ring 111.

Further, the wire segments connecting the first inflow end 112a and the first outflow end 112b of the second ring 112 form the second ring 112.

Further, the lead segments connecting the first inflow end 113a and the first outflow end 113b of the third loop 113, and the lead segments connecting the second inflow end 113c and the second outflow end 113d of the third loop 113 form the third loop 113.

Further, the lead segments connecting the first inflow end 114a and the first outflow end 114b of the fourth ring 114, and the lead segments connecting the second inflow end 114c and the second outflow end 114d of the fourth ring 114 form the fourth ring 114.

Therefore, the first ring 111 and the fourth ring 114 can form an inductor structure similar to a figure 8, and the second ring 112 and the third ring 113 can also form an inductor structure similar to a figure 8, so that the first ring 111 and the fourth ring 114 which are wound by the same wire have opposite current directions, and the second ring 112 and the third ring 113 have opposite current directions. And the second ring 112 is nested in the first ring 111, and the fourth ring 114 is nested in the inductive structure in the third ring 113.

In practical application, referring to fig. 1, after the right half turn of the first ring 111 is wound from the starting end 100a, the left half turn of the fourth ring 114 is wound downwards along the counterclockwise direction. Then, the third ring 113 is wound upwards along the counterclockwise direction to obtain a right half turn, and the second ring 112 is wound upwards along the clockwise direction across the connection position of the first ring 111 and the fourth ring 114. Wherein, the connection point of the first ring 111 and the fourth ring 114 is the coupling point of the first outflow end 111a of the first ring 111 and the first inflow end 114a of the fourth ring 114.

Further, after the second ring 112 is obtained by winding, a left half turn of the third ring 113 is obtained by winding downwards along the counterclockwise direction across the connection between the second ring 112 and the third ring 113. Then, the right half turn of the fourth ring 114 is wound upwards along the counterclockwise direction across the connection part of the third ring 113 and the fourth ring 114. Wherein, the connection position of the second ring 112 and the third ring 113 is the coupling position of the first inflow end 112a of the second ring 112 and the first outflow end 113b of the third ring 113; the junction of the third ring 113 and the fourth ring 114 is the coupling of the first inflow end 113a of the third ring 113 and the first outflow end 114b of the fourth ring 114.

Further, after the right half of the fourth ring 114 is obtained by winding, the left half of the first ring 111 is obtained by winding upwards along the clockwise direction across the joint of the first ring 111 and the fourth ring 114 and the joint of the second ring 112 and the third ring 113. Wherein, the connection point of the second ring 112 and the third ring 113 is the coupling point of the first outflow end 112b of the second ring 112 and the second inflow end 113c of the third ring 113.

Thus, an inductor structure 100 with two nested figure-8-like structures as shown in fig. 1 can be obtained.

Taking the figure-8-like structure formed by the first ring 111 and the fourth ring 114 as an example, by designing a plurality of coils which are not axisymmetric and connecting the plurality of coils, the current induced by the external magnetic field on the coils can be basically cancelled. Wherein the first ring 111 and the fourth ring 114 may be asymmetric in a direction parallel to the x-axis.

Further, when the total magnetic flux of the two coils is the same and connected with opposite polarities, the magnetic field interference of the two coils with each other can be substantially cancelled without being affected by the shape or symmetry of the two coils. Wherein the total magnetic flux is an integral of the magnetic field over an area encompassed by the coil.

From the above, the first ring 111 and the fourth ring 114 may form a first order system for canceling a magnetic field, and similarly, the second ring 112 and the third ring 113 may also form the first order system. By connecting two of the first order systems, a second order system of the inductive structure 100 shown in fig. 1 can be obtained to further cancel the residual current of the first order system. Further, by connecting the two second-order systems, a three-order system in which the two inductance structures 100 are nested can be obtained, and so on. For higher order systems, the degree of magnetic field cancellation gradually increases.

Further, by interleaving or weaving two figure-8-like structures together as shown in fig. 1, the resulting inductive structure 100 is able to achieve inductive isolation without relying on a symmetrical design.

In one variation, the inflow and outflow ends may be entirely interchanged to reverse the direction of current flow through the first, second, third, and

fourth rings

111, 112, 113, 114.

In one or more embodiments, each end can be located at a center point of an edge of the ring 110.

For example, referring to fig. 1, the first inflow end 111b and the first outflow end 111a of the first ring 111 may be located at a center point of an adjacent side of the first ring 111 adjacent to the fourth ring 114.

For another example, referring to fig. 1, the first inflow end 112a and the first outflow end 112b of the second ring 112 may be located at a center point of an adjacent side of the second ring 112 adjacent to the third ring 113.

For another example, referring to fig. 1, the second inflow end 113c and the first outflow end 113b of the third ring 113 may be located at a center point of an adjacent side of the third ring 113 adjacent to the second ring 112; the first inflow end 113a and the second outflow end 113d of the third ring 113 may be located at a center point of an edge of the third ring 113 away from the second ring 112.

For another example, referring to fig. 1, the first inflow end 114a and the second outflow end 114d of the fourth ring 114 may be located at a center point of adjacent sides of the fourth ring 114 adjacent to the second ring 112; the first and second outflow ends 114b, 114c of the fourth ring 114 may be located at a center point of an edge of the fourth ring 114 that is distal from the second ring 112.

Thereby, it is ensured that the intersection point of the figure-8-like structure is located at the center point of the coil.

It should be noted that fig. 1 illustrates four rings 110 each having a rectangular structure. In practical applications, the plurality of rings 110 may have a polygonal, circular, or the like structure.

In one or more embodiments, the structures of the plurality of rings 110 may not be the same, for example, a part of the rings 110 in the plurality of rings 110 is rectangular, and another part of the rings 110 in the plurality of rings 110 is polygonal.

Therefore, by adopting the scheme of the embodiment, the inductance isolation can be maximized, and the electromagnetic coupling between the VCO resonators can be reduced. Specifically, the inductance structure 100 according to the embodiment of the present invention can achieve the effects of not being interfered by a magnetic field from an external source and minimizing a generated magnetic field on the basis of not depending on a symmetrical design, and minimize interference of the inductance structure 100 on other devices or electronic circuits.

Further, by setting the current direction of each loop 110 in the first partial loop 120 to be opposite to the current direction of each loop 110 in the second partial loop 130, the inductance structure 100 itself achieves the cancellation of forward and reverse magnetic fields, thereby maximally achieving inductance isolation and reducing electromagnetic coupling between VCO resonators and between the VCO internal inductance structure and other devices.

Fig. 2 is a schematic diagram of a second inductor structure according to an embodiment of the present invention. In the following detailed explanation, descriptions about matters and features common to the embodiment shown in fig. 1 are omitted, and only different points are explained. In particular, the same operational effects produced by the same structures are not mentioned one by one for each embodiment. Like parts are designated by like reference numerals throughout the several views.

Only the differences between the inductor structure 200 shown in fig. 2 and the inductor structure 100 shown in fig. 1 will be described here.

In the present embodiment, the difference from the embodiment shown in fig. 1 is mainly that the distance L1 from the second ring 112 to the first side of the first ring 111 may be greater than the distance L2 from the second ring 112 to the second side of the first ring 111.

Wherein the first side of the first ring 111 is opposite to the second side. That is, the second ring 112 nested within the first ring 111 may be offset from the center point of the first ring 111, but closer to the right side of the first ring 111.

In this embodiment, the first side and the second side of the first ring 111 are respectively located at the left and right sides of the symmetry axis α.

Further, the distance L1 from the second ring 112 to the first side of the first ring 111 may refer to a distance from a left boundary of the second ring 112 to a left boundary of the first ring 111.

Further, the distance L2 from the second ring 112 to the second side of the first ring 111 may refer to a distance from a right boundary of the pattern enclosed by the second ring 112 to a right boundary of the pattern enclosed by the first ring 111.

Further, a distance L3 from the fourth ring 114 to a first side of the third ring 113 may be greater than a distance L4 from the fourth ring 114 to a second side of the third ring 113.

Wherein the first side of the third ring 113 is opposite to the second side. That is, the fourth ring 114 nested within the third ring 113 may be offset from the center point of the third ring 113, but closer to the right side of the third ring 113.

In this embodiment, the first side and the second side of the third ring 113 are respectively located at the left and right sides of the symmetry axis α.

Further, the distance L3 from the fourth ring 114 to the first side of the third ring 113 may refer to a distance from a left boundary of the figure formed by the fourth ring 114 to a left boundary of the figure formed by the third ring 113.

Further, the distance L4 from the fourth ring 114 to the second side of the third ring 113 may refer to a distance from a right boundary of the graph formed by the fourth ring 114 to a right boundary of the graph formed by the third ring 113.

At this time, the figure-8-like structure formed by the first ring 111 and the fourth ring 114 is a non-axisymmetric structure in both the x-axis direction and the y-axis direction. Similarly, the figure-8-like structure formed by the second ring 112 and the third ring 113 is a non-axisymmetric structure in the directions of the x axis and the y axis. And the overall outer contour of the inductor structure 200 may be axisymmetric along the symmetry axis α.

In a variation, L1< L2, and/or L3< L4 are also possible.

In another variant, it is also possible that L1 ═ L2 and L3< L4, or L1 ═ L2 and L3> L4, or L1< L2 and L3 ═ L4, or L1> L2 and L3 ═ L4.

On this basis, the inductance structure 200 shown in fig. 3 can be further obtained, wherein a distance L1 from the second loop 112 to the first side of the first loop 111 can be smaller than a distance L2 from the second loop 112 to the second side of the first loop 111; the distance L3 from the fourth ring 114 to the first side of the third ring 113 may be greater than the distance L4 from the fourth ring 114 to the second side of the third ring 113. That is, the second ring 112 may be located at a left side in the first ring 111, and the fourth ring 114 may be located at a right side in the third ring 113.

In yet another variation, it may be L1> L2 and L3< L4.

Fig. 4 is a schematic diagram of a third inductor structure according to an embodiment of the present invention. Only differences between the inductance structure 300 shown in fig. 4 and the

inductance structures

100 and 200 shown in fig. 1 to 3 will be described here.

In the present embodiment, the difference between the inductance structure 100 and the inductance structure 200 shown in fig. 1 to 3 is mainly that the number of loops 110 included in the first partial loop 320 may be different from the number of loops 110 included in the second partial loop 330.

Specifically, referring to fig. 4, the inductance structure 300 may include 5 loops 110, a first loop 311, a second loop 312, a third loop 313, a fourth loop 314, and a fifth loop 315, respectively. Wherein fifth ring 315 is nested within the area encompassed by second ring 312, second ring 312 is nested within the area encompassed by first ring 311, and fourth ring 314 is nested within the area encompassed by third ring 313.

Further, the first partial ring 320 may include the first ring 311, the second ring 312, and the fifth ring 315, and the second partial ring 330 may include the third ring 313 and the fourth ring 314.

And, the sum of the areas surrounded by each of the first ring 311, the second ring 312, and the fifth ring 315 is equal to the sum of the areas surrounded by each of the third ring 313 and the fourth ring 314.

Further, both the beginning 300a and the end 300b of the conductive line may be located at the first loop 311.

Fig. 5 is a schematic diagram of a fourth inductor structure according to an embodiment of the invention. Only the differences between the inductance structure 400 shown in fig. 5 and the inductance structure 300 shown in fig. 4 will be described here.

In this embodiment, the difference from the inductance structure 300 shown in fig. 4 is mainly that the first partial ring 420 may include a first ring 411 and a second ring 412, and the second partial ring 430 may include a third ring 413, a fourth ring 414, and a fifth ring 415.

Wherein, the second ring 412 and the fifth ring 415 can be nested in the first ring 411, and the second ring 412 and the fifth ring 415 are distributed in parallel in the area enclosed by the first ring 411.

Further, adjacent sides of second loop 412 and fifth loop 415 have intersections such that current flow within second loop 412 and fifth loop 415 are in opposite directions.

Further, the sum of the areas surrounded by each of the first ring 411 and the second ring 412 may be equal to the sum of the areas surrounded by each of the third ring 413, the fourth ring 414, and the fifth ring 415.

Further, both the beginning 400a and the end 400b of the conductive line may be located at the first loop 411.

In a variation, one ring 110 can be nested within the first ring 411, and a plurality of rings 110 can be nested within the third ring 413.

In a common variation of the embodiments shown in fig. 1-5 described above, for each ring 110, there may be at least one other ring 110 in the plurality of rings 110 that is the same shape and area as the ring 110.

For example, the first ring 111 and the third ring 113 may have the same shape and area.

Fig. 6 is a schematic diagram of a fifth inductor structure according to an embodiment of the present invention. Only the differences between the inductor structure 500 shown in fig. 6 and the inductor structure 100 shown in fig. 1 will be described here.

In the present embodiment, the difference from the inductance structure 100 shown in fig. 1 is mainly that the area surrounded by the first ring 511 is equal to the area surrounded by the third ring 513, and the area surrounded by the second ring 512 is equal to the area surrounded by the fourth ring 514.

In the present embodiment, the difference from the inductance structure 200 shown in fig. 3 is mainly that the distance L1 from the second ring 512 to the first side of the first ring 511 may be equal to the distance L2 from the second ring 512 to the second side of the first ring 511. Wherein, the first side and the second side of the first ring 511 are opposite and respectively located at the left and right sides of the symmetry axis α.

Further, a distance L3 of the fourth ring 514 to a first side of the third ring 513 may be equal to a distance L4 of the fourth ring 514 to a second side of the third ring 513. Wherein the first side and the second side of the third ring 513 are opposite and respectively located at the left and right sides of the symmetry axis α.

Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims

1. An inductive structure, comprising:

the rings are wound by the same conducting wire and distributed on the same plane in a overlooking state;

wherein,

the plurality of rings comprises a first partial ring comprising a plurality of nested rings and a second partial ring comprising a plurality of nested rings;

the current direction of each ring in the first partial ring is the same, the current direction of each ring in the second partial ring is the same, and the current direction of each ring in the first partial ring is opposite to the current direction of each ring in the second partial ring;

wherein the total area enclosed by each ring in the first partial ring is equal to the total area enclosed by each ring in the second partial ring;

the first partial ring and the second partial ring respectively comprise n rings, wherein the area of the ith ring from outside to inside in the first partial ring is different from that of the ith ring from outside to inside in the second partial ring, n and i are positive integers, and i is more than or equal to 1 and less than or equal to n.

2. The inductive structure of claim 1, wherein an outer contour of the pattern of the plurality of loops is an axisymmetric pattern in the plane.

3. The inductive structure of claim 1, wherein the first partial loop comprises the same number of loops as the second partial loop comprises.

4. The inductive structure of claim 1, wherein the beginning and the end of the conductive line are in the same loop.

5. The inductive structure of claim 1, wherein the number of the plurality of loops is 4.

6. The inductive structure of claim 5, wherein the first partial ring comprises a first ring and a second ring from outside to inside, and the second partial ring comprises a third ring and a fourth ring from outside to inside.

7. The inductive structure of claim 6, wherein a first outflow terminal of the first ring is coupled to a first inflow terminal of the fourth ring, a first outflow terminal of the fourth ring is coupled to a first inflow terminal of the third ring, a first outflow terminal of the third ring is coupled to a first inflow terminal of the second ring, a first outflow terminal of the second ring is coupled to a second inflow terminal of the third ring, a second outflow terminal of the third ring is coupled to a second inflow terminal of the fourth ring, and a second outflow terminal of the fourth ring is coupled to the first inflow terminal of the first ring.

8. The inductive structure of claim 7, wherein for each of the first inflow end, the first outflow end, the second inflow end, and the second outflow end, the end is located at a center point of one side of the ring.

9. The inductive structure of claim 6, wherein a sum of areas encompassed by each of the first and second loops is equal to a sum of areas encompassed by each of the third and fourth loops.

10. The inductive structure of claim 6, wherein the first, second, third and fourth loops each enclose an area that is not equal.

11. The inductive structure of claim 6, wherein the area enclosed by the first loop is equal to the area enclosed by the third loop, and wherein the area enclosed by the second loop is equal to the area enclosed by the fourth loop.

12. The inductive structure of claim 6, wherein a distance from said second ring to a first side of said first ring is greater than a distance from said second ring to a second side of said first ring, and/or a distance from a fourth ring to a first side of said third ring is greater than a distance from said fourth ring to a second side of said third ring, wherein said first side of said first ring is opposite to said second side, and said first side of said third ring is opposite to said second side.

13. The inductive structure of claim 6, wherein a distance from said second ring to a first side of said first ring is equal to a distance from said second ring to a second side of said first ring, and a distance from a fourth ring to a first side of said third ring is equal to a distance from said fourth ring to a second side of said third ring, wherein said first side of said first ring is opposite to said second side, and wherein said first side of said third ring is opposite to said second side.