CN111247273B - Surface treatment device and workpiece holding jig - Google Patents
Surface treatment device and workpiece holding jig Download PDFInfo
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- CN111247273B CN111247273B CN201880067500.3A CN201880067500A CN111247273B CN 111247273 B CN111247273 B CN 111247273B CN 201880067500 A CN201880067500 A CN 201880067500A CN 111247273 B CN111247273 B CN 111247273B
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
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Abstract
A surface treatment device (1) is provided with: a treatment tank (3-1) for containing a treatment liquid; at least one anode (20) disposed within the treatment tank; n (N is an integer of 2 or more) cathode tracks (40A, 40B); a plurality of clamps (30) which respectively hold one of a plurality of workpieces (2) immersed in the treatment liquid and contact the N cathode rails to set one of the workpieces as a cathode; and at least N rectifiers (50) connected to each of the N cathode rails and the at least one anode. The plurality of jigs each include N conduction paths (31A, 31B), the N conduction paths (31A, 31B) conducting from each of the N cathode rails to each of different N sites of each of the plurality of workpieces, the N conduction paths being insulated from each other.
Description
Technical Field
The present invention relates to a surface treatment apparatus and the like for performing a treatment with a workpiece held by a jig as a cathode.
Background
Patent document 1 discloses a plating apparatus that intermittently transfers a plurality of workpieces into a plating tank containing a plating solution, and performs plating on each workpiece by controlling, by a rectifier, a current flowing between an anode and a workpiece (cathode) at a stop position of each of the plurality of workpieces.
In particular, in this plating apparatus, the amount of current supplied to the workpiece at each stop position in the plating tank is integrated, and when the integrated value reaches the required amount of current for the workpiece, the control device drives the lifting device to move the hook supporting and conveying the workpiece upward of the plating tank, thereby releasing the energization of the workpiece. Thus, for example, the amount of current supplied to a plurality of types of workpieces can be individually adjusted, and the amount of current can be individually adjusted according to the shape and surface area of the workpiece.
Documents of the prior art
Patent document
Patent document 1: japanese patent No. 2727250
Disclosure of Invention
Problems to be solved by the invention
In recent years, more precise control of surface treatment performed on a workpiece is required. Even if the current flowing through one workpiece held by one jig is to be adjusted by one rectifier, accurate current control may not be achieved due to differences in resistance values or the like in a plurality of conduction paths provided in one jig. This is a common problem both in the case of continuously conveying workpieces and in the case of intermittently conveying workpieces.
Further, when a plurality of workpieces held by one jig are batch-processed due to differences in resistance values or the like in a plurality of conduction paths provided in one jig, there is a possibility that the surface processing quality of each of the plurality of workpieces processed simultaneously may be different.
An object of at least one embodiment of the present invention is to provide a surface treatment apparatus capable of setting a cathode setting portion including a workpiece held by one jig as a plurality of cathodes independently and performing accurate current control for each cathode.
It is an object of at least one other aspect of the present invention to provide a surface treatment apparatus capable of setting each of a plurality of workpieces held by one jig to be subjected to batch processing as an independent cathode and performing precise current control for each workpiece.
Means for solving the problems
(1) One embodiment of the present invention relates to a surface treatment apparatus including:
a treatment tank for containing a treatment liquid;
at least one anode disposed within the treatment tank;
n cathode tracks, wherein N is an integer of 2 or more;
a plurality of jigs that hold one of a plurality of workpieces immersed in the processing liquid, respectively, and that contact the N cathode rails to set one of the plurality of workpieces as a cathode; and
at least N rectifiers connected to each of said N cathode rails and said at least one anode,
the plurality of jigs each include N conduction paths that conduct from each of the N cathode rails to each of N different locations including each of the plurality of workpieces, the N conduction paths being insulated from each other.
In one aspect of the present invention, each of the plurality of jigs holding each of the plurality of workpieces immersed in the processing liquid includes N conductive paths insulated from each other, and the N conductive paths are connected to the N rectifiers through the N cathode rails, respectively. Thus, the power feeding portions including the workpiece held by one jig are set as N cathodes. The N rectifiers control the current for each of the N cathodes, thereby enabling accurate current control of N cathode setting portions (which may include the workpiece and a virtual portion to be processed around the workpiece) including the workpiece held by one jig.
(2) In one aspect (1) of the present invention, the N conduction paths may be conducted from each of the N cathode rails to different N portions of each of the plurality of workpieces. Thus, the workpiece held by one jig can be set to N cathodes, and the in-plane uniformity of the workpiece to be processed can be improved.
(3) In the aspect (2) of the present invention, each of the plurality of jigs may include at least N grippers that grip the workpiece, and the different portion of each of the plurality of workpieces may be at least one portion that is gripped by the at least N grippers. In this way, the workpiece held by one jig can be set to N cathodes by N clamps, and the in-plane uniformity of the workpiece to be processed can be improved.
(4) In the aspect (3) of the present invention, the at least one portion gripped by the at least N grippers may include an upper end portion and a lower end portion of each of the plurality of workpieces held by each of the plurality of jigs. Generally, it is difficult to set the wiring resistance value equally between the upper clamp and the lower clamp of the jig due to the difference in the distance from the cathode rail, but the rectifier can control the current on the premise of the difference in the resistance value. This improves the in-plane uniformity of the workpiece to be processed.
(5) In one aspect (3) of the present invention, the at least one anode may include at least 2 anodes facing front and back surfaces of the plurality of workpieces, and the at least one portion gripped by the at least N grippers may include the front and back surfaces of each of the plurality of workpieces held by each of the plurality of jigs. In this way, the front and back surfaces of the workpiece held by one jig can be set as independent cathodes by the clamp, and the processing quality can be improved on the front and back surfaces of the workpiece. Further, if one side of one clamp which is in contact with the front and back surfaces of the workpiece is a conductive portion and the other side is an insulating portion, it is possible to apply current to only one of the front and back surfaces of the workpiece.
(6) In one aspect (1) of the present invention, the plurality of jigs may include a virtual processing target portion around each of the plurality of workpieces, and the N conduction paths may include: a1 st conduction path that conducts from at least one of the N cathode rails to each of the plurality of workpieces; and a2 nd conduction path that conducts from at least another one of the N cathode rails to the virtual processed portion. In this way, the virtual part to be processed is also processed in the same manner as the workpiece. Since the peripheral edge of the workpiece is located inside the virtual processed portion, the peripheral edge of the workpiece does not become an edge. Accordingly, the electric field is not concentrated on the periphery of the workpiece, and thus a thick film portion called a dog bone (dog bone) is not generated. The virtual part to be processed is set to be independent of the cathode of the workpiece to perform current control, thereby improving the in-plane uniformity of the workpiece.
(7) In one aspect (1) to (6) of the present invention, 1 rectifier may double as at least 2 of the at least N rectifiers, a terminal of the 1 rectifier may be connected to one of the N conduction paths via one of the N cathode rails, and a terminal of the 1 rectifier may be connected to another one of the N conduction paths via another one of the N cathode rails and a variable resistor. In this way, instead of at least one rectifier, the terminals of the other rectifiers may be shared, and the current supplied to at least one of the N conduction paths provided in the jig may be controlled by adjusting the variable resistor.
(8) In one aspect (1) to (7) of the present invention, the surface treatment apparatus may further include an intermittent conveyance device that intermittently conveys the plurality of jigs with M stop positions in the treatment tank as a start point and/or an end point, where M is an integer equal to or greater than 2, the N cathode rails each include M conductive portions that are in contact with the M jigs that respectively stop at the M stop positions and are electrically insulated from each other, the plurality of rectifiers may be provided in N × M numbers corresponding to a total of the N × M conductive portions, and each of the N × M rectifiers may be connected to each of the N × M conductive portions. One embodiment of the present invention can also be applied to a continuous conveyance type surface treatment apparatus, but in the above case, N × M cathode tracks are required. The surface treatment apparatus is particularly suitable for an intermittent conveyance type surface treatment apparatus capable of reducing the number of cathode tracks to N (each 1 track includes M conductive parts).
(9) In one aspect (1) to (8) of the present invention, the at least one anode may include at least M anodes facing the M workpieces stopped at the M stop positions, respectively, each of the M anodes may be connected in common to N rectifiers, and the N rectifiers may be connected to each of the M jigs stopped at the M stop positions, respectively. In this way, for each of a plurality of workpieces, a plurality of cathodes and an anode are connected in an insulated manner, so that a completely separate supply of power to each workpiece and cathode division within the workpiece can be achieved.
(10) Another aspect of the present invention relates to a surface treatment apparatus including:
a treatment tank for containing a treatment liquid;
at least one anode disposed within the treatment tank;
n (N is a plurality of) cathode connecting parts;
a jig that holds a plurality of workpieces immersed in the treatment liquid, and that is in contact with the plurality of cathode connection portions to set each of the plurality of workpieces as an independent cathode; and
n rectifiers connected to each of the N cathode connections and the at least one anode,
the plurality of jigs include N conduction paths that conduct from each of the N cathode connection portions to each of the plurality of workpieces, the N conduction paths being insulated from each other. In another aspect of the present invention, a plurality of workpieces to be processed in a batch process can be set as independent cathodes, respectively, to perform accurate current control.
(11) In another aspect (10) of the present invention, at least 2 of the N × M rectifiers may be replaced with 1 rectifier, and a terminal of the 1 rectifier may be directly connected to one of N conduction paths that are conducted to different N portions of one of the M workpieces, and connected to another of the N conduction paths via a variable resistor. In this way, instead of at least one rectifier, the terminals of the other rectifiers may be shared, and the current supplied to at least one of the N conduction paths that conduct to different N portions of one of the M workpieces may be controlled by the adjustment of the variable resistor.
Drawings
Fig. 1 is a schematic cross-sectional view of a plating section in an intermittent feed type plating apparatus according to an embodiment of the present invention.
FIG. 2 is a schematic plan view of a processing unit of the plating apparatus shown in FIG. 1.
Fig. 3 is a diagram showing a positional relationship between a workpiece stopped in one processing unit and an anode.
Fig. 4 is a perspective view of a conveying jig that conveys a workpiece.
Fig. 5 is a diagram schematically showing the connection of the anode, the conductive part on the cathode rail, and the rectifier.
Fig. 6 (a) and (B) are a front view and a cross-sectional view of N =2 cathode tracks.
Fig. 7 is a diagram schematically showing an example of connection of 2 cathode rails, a workpiece (cathode), an anode, and 2 rectifiers.
Fig. 8 is a diagram schematically showing a state where the supplied portion of the conveying jig switches the conductive portion of the cathode track between the units.
FIG. 9 is a top view of the nozzle showing reciprocating horizontal scanning movement within the unit.
Fig. 10 is a diagram showing the arrangement pitch of the ejection ports of the nozzle.
Fig. 11 is a diagram showing an example of the intermittent conveyance device disposed for each processing unit.
Fig. 12 (a) and (B) are diagrams showing another example of the intermittent conveyance device disposed for each processing unit.
Fig. 13 is a diagram showing a modification of the conveyance jig suitable for the intermittent conveyance system.
Fig. 14 is a diagram showing a modification of a pair of rectifiers connected to a conductive portion of N =2 cathode tracks in combination with one rectifier.
Fig. 15 is a diagram showing a modification of the transport jig to which a cleaning function of the cathode rail is added.
Fig. 16 is a sectional view of the batch type surface treatment apparatus.
Fig. 17 is a plan view of the batch type surface treatment apparatus.
Fig. 18 is a diagram showing a modification of connection between an anode and an anode rod.
Detailed Description
Hereinafter, preferred embodiments of the present invention will be described in detail. The present embodiment described below is not intended to unduly limit the contents of the present invention described in the claims, and not all of the configurations described in the present embodiment are necessarily essential as means for solving the problems of the present invention.
1. Multiple processing units
Fig. 1 is a cross-sectional view of a plating apparatus (broadly, a surface treatment apparatus) according to the present embodiment. In fig. 1, a plating apparatus 1 is configured such that a plating section for plating a work 2 such as a circuit board is formed by connecting 1 or more processing units 3-1 to 3-n (n is a natural number). The plurality of processing units 3-1 to 3-n can have substantially the same structure. The work 2 may be continuously conveyed or the work 2 may be intermittently conveyed in each of the plurality of processing units 3-1 to 3-n. In the case of the intermittent-conveyance-type plating apparatus 1, at least one, M (M is an integer of 2 or more) workpieces 2 (for example, M = 4) in fig. 1 can be intermittently stopped in each of the plurality of processing units 3-1 to 3-n. Fig. 1 shows a workpiece 2 of a maximum size, and the plating apparatus 1 has versatility to be able to process workpieces 2 of this maximum size or less. Hereinafter, the plating apparatus 1 of the intermittent conveyance type will be described by way of example. The present invention can be applied to a configuration in which a plurality of processing units are not connected, that is, a configuration in which a plurality of workpieces are intermittently or continuously conveyed by a single processing unit.
The workpiece 2 is intermittently conveyed in the a direction sequentially from the current stop position toward the next stop position by an intermittent conveyance device described later. In the present embodiment, one workpiece 2 is stopped at M =4 sites in each processing unit. A carry-in unit 4 for carrying in the workpiece 2 by descending in the B direction may be connected to the upstream side of the most upstream processing unit 3-1. When the workpiece 2 in the processing unit 3-1 is intermittently conveyed, the workpiece 2 in the carry-in unit 4 is also intermittently conveyed and moved to the processing unit 3-1. A carry-out unit 5 may be connected to the downstream side of the most downstream processing unit 3-n, and the carry-out unit 5 may raise and carry out the workpiece 2 horizontally moving from the processing unit 3-n in the C direction. The workpiece 2 in the carry-out unit 5 is carried out upward before the workpiece 2 in the processing unit 3-n is intermittently conveyed. However, the carry-in unit 4 and/or the carry-out unit 5 may be omitted. In this case, the workpiece 2 is lowered to the most upstream stop position of the processing unit 3-1, and the workpiece 2 at the most downstream stop position of the processing unit 3-n is raised and carried out.
Fig. 2 is a plan view of the process unit 3-1 having a structure common to the process units 3-2 to 3-n. The processing unit 3-1 has a divided processing bath 6 for containing a plating liquid (broadly, a processing liquid). The work 2 is immersed in the plating liquid in the divided treatment tanks 6. The divided processing tank 6 is a substantially box body having an upper opening, and openings 6A and 6B are provided in the upstream and downstream partitions, respectively, to allow the workpiece 2 to move horizontally between the divided processing tank and an adjacent unit (processing unit, carry-in unit, or carry-out unit).
In the present embodiment, at least one anode 20 is provided on at least one of the front surface and the back surface of the workpiece 2 located at M =4 stop positions in the processing unit 3-1. In the present embodiment, there are provided: an anode 20A opposed to the front surface of each of the one workpieces 2 at each of the stop positions; and an anode 20B opposed to the back surface of the workpiece 2. Each of the anodes 20 (20A, 20B) may include a plurality of divided anodes that are electrically connected to each other. In the present embodiment, the anode segment 20A1 (20B 1) on the upstream side and the anode segment 20A2 (20B 2) on the downstream side are divided. The anode 20 may include divided anodes divided into 3 or more, but can be regarded as one anode because of conduction between them.
Fig. 3 is a front view showing a positional relationship between the anodes 20A1, 20A2 (20B 1, 20B 2) arranged in the processing unit 3-1 and the workpiece 2. As shown in fig. 3, the workpiece 2 is held by the conveying jig 30. As shown in fig. 2 and 3, the anodes 20 (20A and 20B) are disposed at positions facing the workpieces 2 located at the 4 stop positions, respectively. In short, as shown in fig. 2, it is sufficient if a uniform electric field can be formed between the workpiece 2 set as a cathode and the anode 20. The shape of the anode 20 is not limited, and the anode shown in fig. 2 and 3 has a rectangular outline, but may have a circular outline in a plan view. The anode may be an insoluble anode or a soluble anode.
In the present embodiment, a shielding plate 23 may be provided to divide one processing unit 3-1 into 4 units 11-1 to 11-4. In each of the cells 11-1 to 11-4, anodes 20 (20 A1, 20A2, 20B1, 20B 2) are arranged on both sides of the workpiece 2 in a plan view. The shield plate 23 is provided to block the influence of an electric field between adjacent cells (an anode-cathode electric field shown by an arrow in fig. 2). An opening 23A through which the workpiece 2 passes is formed in the shield plate 23.
2. Conveying clamp
Fig. 4 shows an example of the conveyance jig 30. The conveying jig 30 has a horizontal arm 300, a vertical arm 310, a work holding portion 320, a guided portion 330, a plurality (e.g., 2) of 1 st and 2 nd power-supplied portions 340A and 340B, and a pushed piece 350. The horizontal arm portion 300 extends in a direction B perpendicular to the intermittent conveying direction a. The vertical arm portion 310 is held in a drooping manner to the horizontal arm portion 300. The workpiece holding portion 320 is fixed to the vertical arm portion 310. The workpiece holding portion 320 includes: an upper frame 321; and a lower frame 322 supported by the upper frame 321 so as to be able to be raised and lowered, for example. The upper frame 321 is provided with a plurality of clamps 323 for clamping the upper portion of the workpiece 2. The lower frame 322 is provided with a plurality of clamps 324 for clamping the lower portion of the workpiece 2. A downward tension is given to the workpiece 2 by the lower clamp 324. However, when the workpiece 2 is thick or when power is not supplied from the lower portion of the workpiece 2, the lower frame 322 and the clamp 324 may be omitted.
The guided portion 330 is disposed along the processing units 3-2 to 3-n, and is guided by a guide rail (not shown) divided for each of the processing units 3-2 to 3-n, for example, to linearly guide the conveying jig 30. The guided portion 330 may include: a roller 331 that is in rolling contact with the top surface of the guide rail; and a roller 332 (only a roller in rolling contact with one side surface is illustrated in fig. 4) in rolling contact with both side surfaces of the guide rail.
The 1 st and 2 nd power receiving portions 340 are in contact with the cathode rails 40A and 40B described in fig. 5 and (a) and (B) of fig. 6, and set the workpiece 2 as 2 cathodes through the 2 conduction paths 31A and 31B shown in fig. 7. The 1 st and 2 nd power-supplied parts 340A and 340B include 2 contacts 342 and 343 supported on the upstream side and the downstream side of the 1 st and 2 nd support arms 341A and 341B extending in the intermittent conveyance direction a, respectively. The contacts 342 and 343 are supported by the support arm 341 via a parallel link mechanism, and are biased by a spring to come into pressure contact with the cathode rail 40A (40B) shown in fig. 5. When the number of the power-supplied portions 340 is 3 or more, the number of the cathode rails 40 is 3 or more according to the number.
The pushed piece 350 is fixed to the vertical arm portion 310, for example, and the pushed piece 350 is vertically arranged at a position directly above the workpiece holding portion 320. The pushed piece 350 is pushed in the direction C shown in the figure by an intermittent conveyance device described later, and transmits an intermittent conveyance force to the conveyance jig 30. The conveyance jig 30 shown in fig. 4 is provided with the engaged portion 360 used in the continuous conveyance, and the conveyance jig 30 can be used for both the intermittent conveyance and the continuous conveyance.
3.N cathode tracks, N conduction paths and NxM rectifiers
As shown in fig. 5, each of the processing units 3-1 to 3-N (only 2 processing units are shown in fig. 5) has N (N is an integer of 2 or more), for example, N =2 cathode tracks 40A and 40B. The 2 cathode tracks 40A, 40B are arranged parallel to the transport direction a. The 2 cathode tracks 40A and 40B preferably have a plurality of divided cathode tracks 40-1 to 40-n (only 2 divided cathode tracks 40-1 and 40-2 are shown in fig. 5) divided for each of the processing units 3-1 to 3-n, respectively, and these divided cathode tracks are connected continuously in the transport direction a. As shown in fig. 5 and 6a, the divided cathode rails 40-1 to 40-n have 4 conductive portions 43 on the insulating rail 41 with a space (non-conductive portion) 42 therebetween, respectively, and correspond to each unit in which the workpiece 2 is stopped. The 4 conductive portions 43 provided in the cathode rail 40A are electrically connected to the 1 st power supply target portion 340A (2 contacts 342, 343) of the transport jig 30 shown in fig. 4 that holds and stops the workpiece 2 at the 4 stop positions of the processing units 3-1 to 3-n, respectively. The 4 conductive portions 43 provided in the cathode rail 40B are electrically connected to the 2 nd power supply target portion 340B (2 contacts 342, 343) of the conveying jig 30 shown in fig. 4 that holds and stops the workpiece 2 at the 4 stop positions of the processing units 3-1 to 3-n. FIG. 5 shows the liquid level L of the plating liquid contained in each of the processing units 3-1 to 3-n, and the work 2 is immersed in the plating liquid.
As shown in fig. 6 (B), partition walls 44A and 44A are provided at both ends in the width direction of the insulating track 41 shared by the 2 cathode tracks 40A and 40B, whereby a non-oily conductive fluid (e.g., water) 45 can be held on the conductive portion 43. Thus, the conductive fluid 45 can more reliably ensure electrical contact between the power-supplied portion 340 (2 contacts 342, 343) and the conductive portion 43. However, since the conductivity of water is much lower than that of the conductive portion 43 which is a metal, the insulation between the adjacent conductive portions 43, 43 is maintained. As shown in fig. 6 (B), the bolts 46 for fixing the conductive portion 43 to the insulating rail 41 can be disposed on both sides of the travel path through the 1 st and 2 nd power-supplied portions 340A and 340B. This eliminates the need to provide a counterbore for the bolt in the conductive portion 34, thereby eliminating a factor that causes electrical resistance.
Each of the processing units 3-1 to 3-N has N =2 (M × N =8 in total) rectifiers 50 for each of the M =4 units in which the workpiece 2 is stopped (in fig. 5, only 8 rectifiers 50 are shown for the processing units 3-1 to 3-N). One positive terminal 51 of a pair of rectifiers 50 arranged corresponding to each cell (stop position of the workpiece 2) among the 8 rectifiers 50 is commonly connected to the anodes 20A1 and 20A2 arranged in each cell, and one negative terminal 52 of the pair of rectifiers 50 is connected to the conductive portion 43 corresponding to each cell on the power supply rail 40A. The other positive terminal 51 of the pair of rectifiers 50 is commonly connected to the anodes 20B1 and 20B2 arranged in the respective cells, and the other negative terminal 52 of the pair of rectifiers 50 is connected to the conductive portion 43 corresponding to the respective cells on the power supply rail 40B.
As schematically shown in fig. 7, the conveying jig 30 has N = 21 st and 2 nd conduction paths 31A and 31B that conduct from N =2 different sites of the workpiece 2 on each of 2 cathode rails 40A and 40B. In the example of fig. 7, the 1 st conduction path 31A is connected to the upper portion of the workpiece 2, and the 2 nd conduction path 31B is connected to the lower portion of the workpiece 2. The 1 st conduction path 31A includes a1 st power-supplied part 340A, and the 2 nd conduction path 31B includes a2 nd power-supplied part 340B. The 1 st and 2 nd power-supplied parts 340A and 340B arranged in the conveying jig 30 are in contact with N =2 cathode rails 40A and 40B arranged in line as shown in fig. 5, respectively, and N =2 cathodes capable of independently controlling the current are set on the workpiece 2. When N is 3 or more, a cathode having N =3 or more, which can independently control the current, can be set on the workpiece 2.
The 1 st conductive path 31A includes an upper frame 321 and a clamp 323. The 2 nd conduction path 31B includes a lower frame 322 and a holder 324. For example, japanese patent No. 5898540 or japanese patent application No. 2017-204603, which are filed by the present applicant, describe a jig in which an upper frame 321 and a lower frame 322 are insulated to form independent conductive paths. In this jig, when a conduction path from the 1 st power-supplied part 340A to the upper frame 321 and a conduction path from the 2 nd power-supplied part 340B to the lower frame 322 are electrically insulated by, for example, wiring or the like, the 1 st and 2 nd conduction paths 31A and 31B shown in fig. 7 can be established.
In the example of fig. 7, the following two currents, respectively, are controlled independently by 2 rectifiers 50: a current flowing into the upper portion of the workpiece 2 via the upper clamp 323 shown in fig. 5; and a current flowing into the lower portion of the workpiece 2 via the lower clamp 324. The upper holder 323 and the lower holder 324 of the jig 30 are difficult to set the wiring resistance value equally due to the difference in the distances between them from the cathode rails 40A and 40B, but the 2 rectifiers 50 can control the current independently on the premise of the difference in the resistance value. Thereby, substantially equal currents flow into the upper and lower portions of the workpiece 2, and the in-plane uniformity of the workpiece to be processed is improved.
When the workpiece 2 held by one jig 30 is set to N cathodes, the number of cathodes is not limited to 2 cathodes up and down as in the example of fig. 7. For example, different rectifiers 50 may be connected to each of the plurality of upper clamps 323, and then, different rectifiers 50 may be connected to each of the plurality of lower clamps 324. This enables independent current control for each of the N =3 or more locations. In addition, independently controlled currents may be supplied to the front and back surfaces of the workpiece 2. In this way, the front and back surfaces of the workpiece 2 held by one jig 30 are supplied with currents independently controlled by different rectifiers 50, respectively, and the processing quality can be improved on the front and back surfaces of the workpiece 2. In addition, with respect to one clamp holding the workpiece 2, a part of the clamp contacting the front and back surfaces of the workpiece 2 can be used as a conductive portion, and the other part can be used as an insulating portion, whereby current can be passed to only one of the front and back surfaces of the workpiece 2. Thus, in the example of fig. 7, if the upper clamp 323 applies current only to the front surface of the workpiece 2 and the lower clamp 324 applies current only to the rear surface of the workpiece 2, currents independently controlled can be supplied to the front and rear surfaces of the workpiece 2. Further, the electric currents controlled independently may be supplied to both the upper and lower portions and the front and rear surfaces of the workpiece 2.
4. Current control when the work 2 is stopped
The currents flowing into the M =4 workpieces 2 at the M =4 stop positions (cells) of each processing unit 3-1 to 3-n are independently controlled by the rectifiers 50 provided with 2 for each cell. Further, since the cathodes are insulated from each other and the anodes are also insulated from each other between the cells, the workpieces 2 can be separated in an insulated manner, and the power supply control of the workpieces 2 can be performed individually by the rectifiers 50. Moreover, by separating the electric field by the shielding plate 23 between the cells, the influence between the cells is eliminated, and separate power supply to each workpiece 2 is ensured. This can improve the plating quality of the workpiece 2.
In contrast to the conventional continuous conveyance system, the intermittent conveyance system of the present embodiment always changes the positional relationship between the continuously conveyed workpiece (cathode) and the fixed anode, and the stopped workpiece (cathode) 2 of the present embodiment can be directly opposed to the anode 20. Thus, when the work 2 is stopped, the positional relationship between the cathode and the anode is fixed, and the works are subjected to the same plating conditions, and therefore, improvement in plating quality can be expected. In particular, since the fluctuation of the contact resistance disappears when the workpiece 2 is stopped, the current can be accurately controlled. Further, there are counterbores for fixing bolts and the like in the middle of a long cathode rail for continuous conveyance, and the resistance value of the cathode rail differs from place to place and does not become uniform. Therefore, although the current flowing through the workpiece differs depending on the position of the workpiece during continuous conveyance, such a problem can be solved in intermittent conveyance. Further, the present embodiment does not have the following situation as in the case of continuous conveyance: the plating quality is adversely affected depending on the continuous conveying speed of the work.
However, it is also possible that no completely separate supply of power as described above is necessary for the intermittent conveyance of the workpieces 2. That is, the anode may be shared among 4 units 11-1 to 11-4 of the respective processing units 3-1 to 3-n. Further, the workpiece 2 may be continuously conveyed instead of being intermittently conveyed, in which case the spacer (non-conductive portion) 42 between the conductive portions 43 shown in fig. 5 and 6 (a) is not required.
5. Current control in intermittent conveyance of workpiece 2
While the workpiece 2 is intermittently conveyed between the units, the current is also supplied to the workpiece 2 through the rectifier 50. Here, in the intermittent conveyance, at least one of the 2 contacts 342, 343 of the conveyance jig 30 shown in fig. 4 is in contact with the conductive portion 43 on the cathode track. That is, even if the contact 342 on the conveyance upstream side contacts the insulating rail 41 at the position of the spacer 42, the contact 343 on the conveyance downstream side contacts the conductive portion 43. Likewise, even if the contact 343 on the conveyance downstream side comes into contact with the insulating rail 41 at the position of the spacer 42, the contact 342 on the conveyance upstream side comes into contact with the conductive portion 43 of the next cell. In these processes, the contact 343 on the conveyance downstream side is, for example, in contact with the conductive portion 43 of the unit 11-1, and the contact 342 on the conveyance upstream side is in contact with the conductive portion 43 of the unit 11-2. In this case, current is supplied to the workpiece 2 from 2 rectifiers 50 corresponding to the cell 11-1 and the cell 11-2. The state (transition state) in the process of moving between the units is schematically shown in fig. 8. Fig. 8 schematically shows the power-supplied portion 340 of the conveying jig 30 shown in fig. 4, and the power-supplied portion 340 (the 1 st and 2 nd power-supplied portions 340A and 340B are collectively referred to) is in contact with the conductive portion 43 of the upstream-side unit and the conductive portion 43 of the downstream-side unit. Here, if the output of the rectifier 50 when the workpiece 2 is stopped is maintained and the workpiece 2 is intermittently conveyed, there is a concern that a current of 2 times will transiently flow through the workpiece 2 being converted, which is connected to 2 rectifiers 50. In particular, the slower the intermittent conveyance speed, the greater the influence of the transient current.
In the present embodiment, any of the following 2 pieces of current control is adopted in the intermittent conveyance of the workpiece 2. In the case where the intermittent conveyance speed is relatively slow, in order to reduce or prevent the above-described transient current, the output (e.g., 100%) of the rectifier 50 at the time of stopping the workpiece 2 is incremented (restored to 100%) after being decremented (e.g., to 50%). When the intermittent feed speed is relatively high, the period during which the transient current flows is extremely short and therefore negligible. Thus, in this case, the control may not be: the output of the rectifier 50 is different between when the workpiece 2 is stopped and when the workpiece 2 is intermittently conveyed. For example, assuming that the width of the workpiece 2 in the conveying direction is 800mm, the intermittent conveying speed is 12m/min, and the width of the power-supplied portion 430 schematically shown in fig. 8 in the conveying direction is 60mm, the intermittent conveying time is 5sec, and the time required for the power-supplied portion 430 to switch the conductive portion 43 between the cells (the time during which the transient current can flow) is only 0.3sec.
6. Moving scan of nozzle
In 4 units 11-1 to 11-4 of the respective processing units 3-1 to 3-n, as shown in fig. 9, at least 1 nozzle 60 can be further provided between each surface (front surface and back surface) of the workpiece 2 located at the stop position in plan view and the anode 20. Since the nozzles 60 block the electric field formed between the workpiece (cathode) 2 and the anode 20, it is preferable to reduce the number of the nozzles 60 even when a plurality of the nozzles are provided. As shown in fig. 9, the nozzle 60 has a plurality of discharge ports 60A for discharging the plating liquid. The pitch P in the vertical direction of the discharge ports 60A of the nozzle 60 shown in fig. 10 is smaller than the pitch (for example, 7.5 mm) used in the conventional continuous transport system, and can be set to be not less than the outer diameter of the discharge ports 60A but not more than 5 mm. This is to increase the supply amount of the plating liquid per unit time. Further, the pitch P is also preferably made small in order to uniformly supply the plating liquid to the chips or the fine patterns having a small size. In fig. 10, the nozzles 60 on the front and back surface sides of the workpiece 2 are arranged to face each other across the workpiece 2, but may be provided at positions other than the facing positions. When the workpieces 2 are arranged to face each other, the deformation of the workpieces 2 due to the hydraulic pressure can be eliminated, and when the workpieces 2 are not arranged to face each other, the plating liquid can be easily supplied to the through-holes of the workpieces 2. In addition, although the continuous transfer system is also provided with nozzles, the number thereof is as large as several tens of nozzles in one processing unit.
In the continuous work conveying system, a plurality of nozzles are fixed, but in the present embodiment employing the intermittent conveying system, at least 1 nozzle 60 is moved in a horizontal scanning manner, for example, in the directions of arrows A1 and A2 (both parallel to the intermittent conveying direction a) of fig. 8, among 4 units 11-1 to 11-4 of the respective processing units 3-1 to 3-n. As a result, as shown in fig. 9, the plating liquid can be uniformly discharged to the entire surface of the workpiece 2. The moving speed of the nozzle 60 can be higher than the moving speed (for example, 0.8 m/min) of the workpiece 2 in the continuous conveyance system. Thus, the supply amount of the plating liquid per unit time can be increased. In addition, in the continuous conveying system, when the workpiece speed is increased, the total length of the treatment tank is increased, and the apparatus is increased in size.
Although the reciprocating mechanism of the nozzle 60 is not shown, a known reciprocating linear mechanism (for example, a gear-rack mechanism driven by a reversible motor, a piston-crank mechanism, or the like) may be used. The reciprocating mechanism can move 2 nozzles 60 in the following manner: the scanning is repeated at least once cyclically over a length range corresponding to at least the horizontal width of the workpiece 2 stopped in each cell. In this way, the in-plane uniformity of the workpiece 2 being processed is improved. It is particularly preferred to cyclically scan at least once from the initial position of the nozzle 60 and return to the initial position. This is because the shadow of the nozzle 60 is substantially uniform in the workpiece surface. The nozzle 60 may continuously perform the reciprocating scanning movement during the start-up of the apparatus, or may stop the reciprocating scanning movement during the intermittent conveyance of the workpiece 2.
According to the present embodiment, at least one (for example, 2) nozzle pipes 60 can be moved by scanning with respect to the workpiece 2 in accordance with the stop position of the workpiece 2 with respect to the workpiece 2 which is intermittently stopped. As a result, the region that becomes a shadow of the nozzle 60 and blocks the electric field between the anode and the cathode moves with the movement of the nozzle 60, wherein the nozzle 60 is positioned between the workpiece 2 and the anode 20 in a plan view. Therefore, the region where the electric field is blocked by the nozzle 60 is not fixed, and the in-plane uniformity of the workpiece 2 to be processed is improved. In addition, the scanning movement direction of the nozzle 60 is not limited to the horizontal direction. For example, the nozzle 60 may be horizontally disposed and moved in a scanning manner along the vertical direction, and the scanning movement direction may be any of the horizontal and vertical directions.
The nozzle 60 can wind and discharge the plating liquid near the discharge port 60A in the divided treatment vessel by a known structure. This makes it possible to discharge the plating liquid rich in metal ions near the anode 20 toward the workpiece 2, thereby improving the yield.
The scanning movement of the nozzle 60 can be widely applied to the surface treatment apparatus of the intermittent conveyance system, and is not necessarily limited to the structure of the above-described embodiment, that is, the connection structure of the plurality of treatment units, the cathode division structure, the anode division structure, the structure having an intermittent conveyance mechanism by a pusher, which will be described later, and the like.
7. Intermittent conveying device for each processing unit
In the present embodiment, it is preferable to provide an intermittent conveyance device for each of the processing units 3-1 to 3-n. This is because, even if the number n of processing units is changed, there is no need to redesign the intermittent conveying device. If convenience is not required, a circulating type intermittent conveyance device may be used as in patent document 1, or a single intermittent conveyance device shared by the processing units 3-1 to 3-n may be used. The intermittent conveyance device described below is not necessarily limited to the case where: a plurality of processing units are connected to form a plating tank.
As the intermittent conveyance device provided for each of the processing units 3-1 to 3-n, the intermittent conveyance device shown in fig. 11 or 12 can be employed. The intermittent carrying device shown in fig. 11 is constituted by a pusher 70, and the pusher 70 is driven to advance and retreat in forward and reverse directions A1 and A2 parallel to the intermittent carrying direction a by, for example, an air cylinder. The pusher 70 has pushing pieces 71 at 4 places. The 4 pushing pieces 71 can push the pushed pieces 350 of the 4 conveying jigs 30 (refer to fig. 4). In fig. 11, 4 push tabs 71 are urged in the clockwise circumferential direction D.
When the pusher 70 advances in the direction A1, the 4 pushing pieces 71 push the pushed pieces 350 of the 4 conveying jigs 30 to intermittently convey the 4 workpieces 2. When the pusher 70 retreats in the direction A2, if the pushing piece 71 comes into contact with the pushed piece 350, the pushing piece 71 rotates in the direction opposite to the arrow D against the urging force in the arrow D direction, and the pushing piece 71 returns to the initial position without being hindered by the pushed piece 350. Thus, the 4 workpieces 2 located in the respective processing units 3-1 to 3-n are intermittently conveyed by moving one step at a time by the pusher 70. Thereby, 3 workpieces 2 other than the most downstream position in the processing unit move one step in the same processing unit, and the workpiece 2 located at the most downstream position in the processing unit of the same stage or the preceding stage moves to the most upstream position in the processing unit of the subsequent stage. In this way, the 4 workpieces 2 held by the 4 conveying jigs 30 are intermittently conveyed with the 4 stop positions in the processing unit as the start point and/or the end point.
Since the intermittent conveying device shown in fig. 11 merely pushes the conveying jig 30, the stop position of the conveying jig 30 cannot be controlled. The intermittent conveyance device can be used in such a case that: the intermittent conveyance speed is relatively slow, and there is no case where the inertia force that the conveyance jig 30 continues to advance even after the pushing by the pusher 70 is stopped is generated. Alternatively, the intermittent conveying device can also be adopted in the following cases: at least one of the guide rollers 331 and 332 of the transport jig 30 is provided with a brake mechanism described in international patent application PCT/JP2018/020119 filed by the applicant of the present application.
The intermittent conveyance device shown in fig. 12 (a) and (B) includes a pusher 72, and the pusher 72 has 4 pusher pieces 73 and performs forward and backward driving (driving in the directions of A1 and A2) and upward and downward driving (driving in the direction of arrow E). The 4 pushing pieces 73 include, for example, upwardly open recesses 73A into which the pushed pieces 350 of the conveying jig 30 are fitted. As shown in fig. 12 (a), when the pusher 72 is raised, the pushed piece 350 of the conveyance jig 30 fits into the 4 recesses 73A. Thereafter, as shown in fig. 12 (B), when the pusher 72 is advanced in the A1 direction, the 4 conveyance jigs 30 are intermittently conveyed one step at a time. When the advance of the pusher 72 is completed, the stop position of the pushed piece 350 is uniquely determined by the concave portion 73A. Thereafter, the pusher 72 descends and retreats again to return to the original position. In particular, the engagement of the depressed portion 73A with the pushed piece 350 can stop the plurality of conveying jigs 30 at predetermined positions, and thus, higher-speed intermittent conveyance can be performed.
Further, although the present embodiment has been described in detail as described above, it should be easily understood by those skilled in the art that: numerous modifications can be made without substantially departing from the novel aspects and advantages of the present invention. Therefore, all such modifications are included in the scope of the present invention. For example, in the specification or the drawings, a term described at least once together with a different term having a broader meaning or a same meaning can be replaced with a different term in any part of the specification or the drawings. All combinations of the embodiment and the modifications are also included in the scope of the present invention.
Fig. 13 shows a modification in which the work holding portion 320 in the transport jig 30 shown in fig. 4 is changed to a work holding portion 320A. In fig. 13, a dummy processed portion 80 is provided in a rectangular frame region shown by hatching surrounding the workpiece 2. The dummy processed portion 80 is a region to which surface processing (plating) is performed together with the workpiece 2. The dummy processing target portion 80 is connected to a power supply portion 81 shown in fig. 13. Here, the 1 st power supply receiving portion 340A of the jig 30 shown in fig. 4 can be electrically connected to the workpiece 2 via the upper and lower clamps 323 and 324, while the power supply portion 81 shown in fig. 13 can be electrically connected to the 2 nd power supply receiving portion 340B shown in fig. 4. In this way, the virtual processing target section 80 can independently control the current flowing through the workpiece 2 by the different rectifiers 50. The virtual processed portion 80 can be divided into 2 or more portions, for example, 4 portions, i.e., up, down, left, and right, and each portion can be connected to 4 power-supplied portions 340 among the power-supplied portions 340 provided with 5 or more in fig. 4, and the remaining power-supplied portions 340 can be connected to the workpiece, whereby the current control of the virtual processed portion 80 can be performed more finely in a state where the virtual processed portion 80 is divided into 2 or more portions.
Since the peripheral edge of the workpiece 2 is located inside the virtual processed portion 80, the peripheral edge of the workpiece 2 does not become an edge. Accordingly, the electric field is not concentrated on the periphery of the workpiece 2, and thus a thick film portion called a so-called dog bone is not generated. When the current flowing through the virtual part to be processed 80 is made substantially equal to the current flowing through the workpiece 2, a large area around the workpiece 2 including the virtual part to be processed 80 becomes a plating region, and the in-plane uniformity of the workpiece 2 located at the center of the plating region is improved. The plating apparatus 1 has a stripping tank in a step subsequent to the plating section, and after the plating, the conveying jig 30 is put into the stripping tank to strip the plating layer. At this time, since the plating layer formed on the dummy processed portion 80 is also peeled off, the transport jig 30 can be repeatedly reused.
Fig. 14 is a diagram showing a modification of a pair of rectifiers connected to a conductive portion of N =2 cathode tracks in combination with one rectifier. In fig. 5, N × M =8 rectifiers 50 are arranged for each of the processing units 10-1 to 10-N, but M =4 rectifiers 50 are arranged in fig. 14. In fig. 14, 1 rectifier 50 doubles as a pair of rectifiers 50 of fig. 5 arranged in the case of N =2 corresponding to each cell. As shown in fig. 14, the negative terminal 52 of the 1 rectifier 50 corresponding to each cell can be directly connected to the conductive portion 43 of the cathode rail 40A, and can be connected to the conductive portion 43 of the cathode rail 40B via the variable resistor 53. The positive terminals 51 of the 1 rectifiers 50 corresponding to each cell are commonly connected to the anodes 20 (20 A1, 20A2, 20B1, 20B 2) arranged in each cell. Even in this case, the current flowing through the 1 st conduction path 31A of the jig 30 can be controlled by the rectifier 50, and the current flowing through the 2 nd conduction path 31B of the jig 30 can be controlled by the same rectifier 50 and variable resistor 53. The total number of rectifiers 50 can be reduced by half at most. When N =3 or more is set, the following may be used: 3 or more lines are connected to the terminals of one rectifier 50, and 2 or more lines are connected to the variable resistor 53.
Fig. 15 shows a conveying jig 30A as a modification of the conveying jig 30 shown in fig. 4 in which a cleaning function of the cathode rail 40 (a general name of the 40A and 40B) is added to the power-supplied portion 340 (a general name of the 1 st and 2 nd power-supplied portions). In fig. 15, the 1 st and 2 nd fed parts will be described as one fed part 340. In fig. 15, the support arm 341 supports at least one rail cleaning portion 344 that comes into contact with the cathode rail 40 to clean the cathode rail 40, in addition to the contacts 342, 343. The rail cleaning part 344 shown in fig. 15 includes at least one or both of the following two components: a polishing member such as a scraper 344A for polishing the conductive portion 43 of the cathode rail 40 to remove a deposited layer (e.g., an oxide film on the conductive portion); and a brush 344B for removing the grinding powder or dirt. The brush 344B can be disposed downstream of the scraper 344A. The cleaning portions 344 (344A, 344B) are crimped to the cathode rail 40 by the same structure as the contacts 342, 344.
By using the conveying jig 30A having the cleaning portion 344 shown in fig. 15 as at least one of the plurality of conveying jigs that are cyclically used in the plating apparatus 1, it is possible to clean the cathode rail 40 while operating the plating apparatus 1, thereby preventing a failure in energization. This can suppress a problem such as an increase in the resistance value of the conductive portion 43 of the cathode rail 40, and reduce the frequency of maintenance performed at a frequency of once per week in the related art.
The conveying jig 30A shown in fig. 15 is not limited to the intermittent conveyance type surface treatment apparatus described above, and may be used in a continuous conveyance type surface treatment apparatus having a cathode track on which a conductive portion 34 is continuously provided.
Fig. 16 and 17 show a batch type surface treatment apparatus in which a plurality of workpieces are simultaneously immersed in a plating solution to be treated. In this surface treatment apparatus, M =4 workpieces (also referred to as substrates 1 to 4) are immersed in a plating solution contained in a treatment tank 100 via a jig 200. As in the above-described embodiment, in the present embodiment of the batch type, the workpiece 2 (including the dummy processed portion 80 when the dummy processed portion 80 is provided around the workpiece 2 as shown in fig. 13) is set to have N =2 cathodes. Here, in the present embodiment, N =2 cathodes can be provided on the front and back surfaces of each workpiece 2. However, as in the above-described embodiment, the N =2 cathodes may be the upper and lower portions of each workpiece 2, or may be the workpiece 2 and the virtual processed portion 80. As described above, the number N of cathodes is not limited to 2.
In the present embodiment, N × M =8 rectifiers 50 (also referred to as rectifiers 1 to 8) are provided. To the negative terminals of the N × M =8 rectifiers 50, N × M =8 cathode connection portions 110 that can be in contact with the jig 200 are connected. The jig 200 is provided with N × M =8 terminals 210 which are in contact with the 8 cathode connection portions 110. The jig 200 is provided with a lifting arm 220, and the lifting arm 220 is lifted and lowered by a lifting mechanism not shown. When the jig 200 is lowered, the M =4 workpieces 2 are immersed in the plating liquid in the treatment vessel 100, and the terminal 210 is connected to the cathode connection portion 110.
At least one anode 20 is disposed in the treatment tank 100. In the present embodiment, M × 2=8 anodes 20A1 to 20A4 and 20B1 to 20B4 (also referred to as anodes (anode) 1 to 8) are provided at positions facing the front and back of M =4 workpieces 2. The connection of the anodes 1 to 8 to the rectifiers 1 to 8 is shown in fig. 17. The current of the front surface of the substrate 1 and the current of the anode 1 are controlled by the rectifier 1, the current of the back surface of the substrate 1 and the current of the anode 2 are controlled by the rectifier 2, the current of the front surface of the substrate 2 and the current of the anode 3 are controlled by the rectifier 3, and the current of the back surface of the substrate 2 and the current of the anode 4 are controlled by the rectifier 4. The current of the front surface of the substrate 3 and the current of the anode 5 are controlled by the rectifier 5, the current of the back surface of the substrate 3 and the current of the anode 6 are controlled by the rectifier 6, the current of the front surface of the substrate 4 and the current of the anode 7 are controlled by the rectifier 7, and the current of the back surface of the substrate 4 and the current of the anode 8 are controlled by the rectifier 8. As described above, in the present embodiment, it is possible to set each of a plurality of workpieces subjected to batch processing as an independent cathode and perform accurate current control.
Here, in the present embodiment, as in fig. 14, 1 rectifier 50 may also serve as at least 2 rectifiers 50 out of the N × M rectifiers 50. In this case, the terminal of the 1-piece rectifier 50 used in common can be directly connected to one of the N conduction paths that are conducted to different N portions (for example, the front/back surface, the upper/lower portion, or the workpiece 2/the dummy processed portion 80) of one of the M workpieces 2, and can be connected to the other of the N conduction paths via the variable resistor 53. In this way, instead of at least one rectifier 50, the terminals of the other rectifiers 50 may be shared, and the current supplied to at least one of the N conduction paths that conduct to different N sites of one workpiece 2 of the M workpieces 2 may be controlled by the adjustment of the variable resistor 53.
In the present embodiment, for example, the connection between the anode 20 and the anode rod 22 can be changed as shown in fig. 18. In fig. 18, a plurality of contact points 21 are provided on a surface of the anode 20 not facing the workpiece 2. Each of the plurality of contacts 21 is electrically connected to the anode rod 22 via a conductive member 22A made of, for example, titanium. Here, conventionally, the upper end portion of the anode 20 is fixed to the anode rod 22, and power is supplied only from the upper side of the anode 20. Since the liquid in the processing units 3-1 to 3-n has a large resistance, electrons easily pass through the low-resistance portions of the workpiece 2 and the anode 20, and the current distribution in the workpiece 2 becomes non-uniform in the plane. By supplying power through the plurality of contacts 21 of the anode 20 as shown in fig. 18, the in-plane uniformity of the current distribution is improved, and the in-plane uniformity is improved in the processing of the workpiece 2. Further, the rectifier can be connected to each of at least 1 contact 21 of the plurality of contacts 21 to adjust the current, and thus the in-plane uniformity of the current distribution can be further improved regardless of the resistance difference.
Description of the reference symbols
1: a surface treatment device; 2: a workpiece; 3-1 to 3-n: a treatment tank (divided treatment tank); 20 (20 A1, 20A2, 20B1, 20B 2): an anode; 30. 30A: conveying the clamp; 31A, 31B: n conduction paths; 40A, 40B: a cathode rail; 41: an insulated rail; 42: a space (non-conductive portion); 43: a conductive portion; 50: a rectifier; 51: a positive terminal; 52: a negative terminal; 53: a variable resistor; 60: a nozzle; 60A: an ejection port; 70. 72: a pusher (intermittent conveyance device); 71. 73: a push sheet; 73A: a recess; 80: a virtual processed part; 100: a treatment tank; 110: n × M cathode connection parts; 200: a clamp; 210: n × M terminals; 322. 324: a clamping member; 340A, 340B: 1 st and 2 nd power-supplied parts.
Claims (17)
1. A surface treatment device is characterized in that,
the surface treatment device comprises:
a treatment tank for containing a treatment liquid;
at least one anode disposed within the treatment tank;
n cathode tracks, wherein N is an integer of 2 or more;
a plurality of jigs that hold one of a plurality of workpieces immersed in the processing liquid, respectively, and that contact the N cathode rails to set one of the plurality of workpieces as a cathode; and
at least N rectifiers connected to each of said N cathode rails and said at least one anode,
the plurality of jigs each include N conduction paths that conduct each of the N cathode rails to each of N cathode setting sites that are different N sites including one workpiece held by one jig provided with the N conduction paths, the N conduction paths being insulated from each other.
2. The surface treatment apparatus according to claim 1,
the N conduction paths conduct from each of the N cathode rails to different N locations of each of the plurality of workpieces.
3. The surface treatment apparatus according to claim 2,
the plurality of clamps each include at least N clamps that clamp the workpiece,
the different portion of each of the plurality of workpieces is at least one portion held by the at least N grippers.
4. A surface treatment device according to claim 3,
the at least one portion gripped by the at least N grippers includes an upper end portion and a lower end portion of each of the plurality of workpieces held by each of the plurality of clamps.
5. A surface treatment device according to claim 3,
the at least one anode comprises at least 2 anodes opposing the front and back sides of the plurality of workpieces,
the at least one portion gripped by the at least N grippers includes the front surface and the back surface of each of the plurality of workpieces held by each of the plurality of clamps.
6. Surface treatment device according to claim 1,
the plurality of jigs each include a virtual processed portion around each of the plurality of workpieces,
the N conduction paths include: a1 st conduction path that conducts from at least one of the N cathode rails to each of the plurality of workpieces; and a2 nd conduction path that conducts from at least another one of the N cathode rails to the virtual part to be processed.
7. The surface treatment apparatus according to claim 1,
doubling as at least 2 of the at least N rectifiers with 1 rectifier, a terminal of the 1 rectifier being connected to one of the N conduction paths via one of the N cathode rails and a terminal of the 1 rectifier being connected to another of the N conduction paths via a variable resistor and another of the N cathode rails.
8. The surface treatment apparatus according to claim 1,
the surface treatment apparatus further includes an intermittent conveyance device that intermittently conveys the plurality of jigs with M stop positions in the treatment tank as a start point and/or an end point, where M is an integer of 2 or more,
the N cathode tracks each comprising M conductive portions that are respectively in contact with the M jigs respectively stopped at the M stopping positions, and the M conductive portions are electrically insulated,
the at least N rectifiers are provided in an N × M number corresponding to a total of N × M conductive parts, and each of the N × M rectifiers is connected to each of the N × M conductive parts.
9. The surface treatment apparatus according to any one of claims 1 to 8,
the at least one anode includes at least M anodes opposed to the M workpieces respectively stopped at the M stop positions,
each of the M anodes is connected in common to N rectifiers connected to each of the M clamps respectively stopped at the M stop positions.
10. A surface treatment device is characterized in that,
the surface treatment device comprises:
a treatment tank for containing a treatment liquid;
at least one anode disposed within the treatment tank;
n × M cathode connecting parts, wherein N and M are integers of 2 or more;
a jig that holds M pieces of work immersed in the treatment liquid and that sets each of the M pieces as N cathodes in contact with the N × M cathode connection portions; and
NxM rectifiers connected to each of the NxM cathode connections and the at least one anode,
the jig includes N × M conduction paths that conduct from each of the N × M cathode connection portions to different N sites of each of the M workpieces, the N × M conduction paths being insulated from each other.
11. Surface treatment apparatus according to claim 10,
doubling as at least 2 of the N M rectifiers with 1 rectifier, the 1 rectifier having terminals connected to one of N conduction paths and to another of the N conduction paths via a variable resistor, wherein the N conduction paths conduct to different N sites of one of the M workpieces.
12. A workpiece holding jig which holds a workpiece immersed in a treatment liquid and sets the workpiece as a cathode,
the work holding jig includes:
a plurality of N supplied power portions insulated from each other; and
n conduction paths insulated from each other, which are conducted to the N power-supplied parts and N different cathode setting parts including the workpiece.
13. The workpiece holding jig of claim 12,
the N conduction paths are conducted with the N cathode setting parts arranged on the workpiece.
14. The workpiece holding jig of claim 13,
the workpiece holding fixture includes at least N clamping members that clamp the workpiece,
the N cathode setting portions provided to the workpiece are N portions at which the workpiece is held by the at least N holding members.
15. The workpiece holding jig of claim 14,
the N portions of the workpiece gripped by the at least N grippers include an upper end portion and a lower end portion of the workpiece.
16. The workpiece holding jig of claim 14,
the N locations at which the workpiece is held by the at least N grippers include a front side and a back side of the workpiece.
17. The workpiece holding jig of claim 12,
the workpiece holding jig includes a virtual processed portion around the workpiece,
the N conduction paths include: a1 st conduction path that conducts one of the N fed portions to the workpiece; and a2 nd conduction path that conducts the other of the N power-supplied units and the dummy processing-target unit.
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JP2017-203867 | 2017-10-20 | ||
PCT/JP2018/037757 WO2019078064A1 (en) | 2017-10-20 | 2018-10-10 | Surface treatment device |
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KR (1) | KR20200075843A (en) |
CN (1) | CN111247273B (en) |
PH (1) | PH12020500544A1 (en) |
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KR102287457B1 (en) * | 2019-07-10 | 2021-08-10 | 엘지전자 주식회사 | Drying apparatus of organic solution |
JP7380338B2 (en) * | 2020-03-06 | 2023-11-15 | 住友金属鉱山株式会社 | Plating equipment and plating method |
CN112095138B (en) * | 2020-09-23 | 2021-07-09 | 东莞市泰利锐航机械科技有限公司 | Electroplating rack for continuous electroplating production line of circuit board |
JP7529277B2 (en) * | 2021-08-04 | 2024-08-06 | 株式会社アルメックステクノロジーズ | Workpiece holding fixture and surface treatment device |
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JP6041927B2 (en) * | 2015-05-07 | 2016-12-14 | アルメックスPe株式会社 | Surface treatment equipment |
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2018
- 2018-10-10 KR KR1020207012917A patent/KR20200075843A/en not_active Withdrawn
- 2018-10-10 CN CN201880067500.3A patent/CN111247273B/en not_active Expired - Fee Related
- 2018-10-10 JP JP2019549224A patent/JP6744646B2/en active Active
- 2018-10-10 WO PCT/JP2018/037757 patent/WO2019078064A1/en active Application Filing
- 2018-10-17 TW TW107136457A patent/TWI682072B/en not_active IP Right Cessation
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2020
- 2020-06-03 PH PH12020500544A patent/PH12020500544A1/en unknown
- 2020-07-27 JP JP2020126750A patent/JP6820626B2/en not_active Expired - Fee Related
- 2020-12-23 JP JP2020213928A patent/JP7007756B2/en active Active
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JPH03264699A (en) * | 1990-03-14 | 1991-11-25 | Chuo Seisakusho Ltd | Electric power supply controller in plating apparatus |
CN102851722A (en) * | 2011-06-30 | 2013-01-02 | Almexpe株式会社 | Surface treatment system and workpiece-holding jig |
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JP2020169396A (en) | 2020-10-15 |
TW201923164A (en) | 2019-06-16 |
WO2019078064A1 (en) | 2019-04-25 |
JP6744646B2 (en) | 2020-08-19 |
PH12020500544A1 (en) | 2021-01-25 |
CN111247273A (en) | 2020-06-05 |
KR20200075843A (en) | 2020-06-26 |
JP6820626B2 (en) | 2021-01-27 |
JP7007756B2 (en) | 2022-01-25 |
JPWO2019078064A1 (en) | 2020-06-18 |
TWI682072B (en) | 2020-01-11 |
JP2021046613A (en) | 2021-03-25 |
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