CN111218649A - Preparation method and preparation device of optical thin film pigment flakes - Google Patents
Preparation method and preparation device of optical thin film pigment flakes Download PDFInfo
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- CN111218649A CN111218649A CN201811427416.6A CN201811427416A CN111218649A CN 111218649 A CN111218649 A CN 111218649A CN 201811427416 A CN201811427416 A CN 201811427416A CN 111218649 A CN111218649 A CN 111218649A
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- 239000000049 pigment Substances 0.000 title claims abstract description 107
- 230000003287 optical effect Effects 0.000 title claims abstract description 63
- 239000010409 thin film Substances 0.000 title claims abstract description 48
- 238000002360 preparation method Methods 0.000 title abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 162
- 239000010408 film Substances 0.000 claims abstract description 152
- 238000000151 deposition Methods 0.000 claims abstract description 105
- 239000011248 coating agent Substances 0.000 claims abstract description 100
- 238000000576 coating method Methods 0.000 claims abstract description 100
- 239000000758 substrate Substances 0.000 claims abstract description 74
- 238000000034 method Methods 0.000 claims abstract description 65
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 238000007747 plating Methods 0.000 claims description 45
- 230000008021 deposition Effects 0.000 claims description 31
- 238000002834 transmittance Methods 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 121
- 239000007888 film coating Substances 0.000 description 22
- 238000009501 film coating Methods 0.000 description 22
- 238000010586 diagram Methods 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 10
- 239000012788 optical film Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229940095709 flake product Drugs 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/0015—Pigments exhibiting interference colours, e.g. transparent platelets of appropriate thinness or flaky substrates, e.g. mica, bearing appropriate thin transparent coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
The invention discloses a preparation method and a preparation device of an optical thin film pigment flake, wherein the method comprises the following steps: providing a pigment flake substrate and a comparison flake, wherein the comparison flake at least comprises a first coating position and a second coating position; synchronously and respectively depositing first materials on the first coating position and the pigment flake substrate to form respective first film layers, and stopping depositing the first materials when detecting that the light signal intensity value on the first coating position reaches a first preset intensity value; synchronously depositing a second material on the second coating position and the pigment flake substrate deposited with the first film layer to form respective second film layers, and stopping depositing the second material when detecting that the light signal intensity value on the second coating position reaches a second preset intensity value; the above process of depositing the first material and the second material is repeated. Through the mode, the production efficiency of the optical thin film pigment flake can be improved.
Description
Technical Field
The invention relates to the technical field of optical thin film pigment flakes, in particular to a preparation method and a preparation device of an optical thin film pigment flake.
Background
The optical thin film pigment flake is prepared by alternately depositing metal oxides or nonmetal oxides with different refractive indexes on a substrate, and the nano-structure color crystal formed by crushing the optical thin film pigment flake is widely applied to industries of high-grade ink, coating, printing ink and the like. And the optical thin-film pigment flakes can be made to exhibit different colors by controlling the refractive index of the deposited film layer and the thickness of the deposited film layer.
In the prior art, the optical thin film pigment flake is prepared by a method of overlapping a plurality of film systems, the total thickness of the overlapped optical thin film pigment flake needs to be more than 20 micrometers, correspondingly, the thickness of a film layer needing to be deposited on a comparison sheet needs to be more than 20 micrometers, and as the thickness of the film layer alternately deposited on the comparison sheet is increased, a signal detected by a film layer thickness sensor is continuously reduced until the signal cannot be used for indicating the deposition process of the film layer in the optical thin film pigment flake, so that the production cannot be continued.
In a long-term research and development process, the inventor of the application finds that in the existing production process of the optical thin-film pigment flake, the detection signal is continuously weakened along with the increase of the thickness of the film layer deposition, and finally the detection cannot be carried out, the production is forced to stop, and correspondingly, the production efficiency of the optical thin-film pigment flake is low.
Disclosure of Invention
The invention mainly solves the technical problem of providing a preparation method and a preparation device of an optical thin film pigment flake, which can improve the production efficiency of the optical thin film pigment flake.
In order to solve the technical problems, the invention adopts a technical scheme that: a method for preparing an optical thin film pigment flake is provided.
Wherein the method comprises the following steps:
providing a pigment flake substrate and a comparison flake, wherein the comparison flake at least comprises a first coating position and a second coating position;
synchronously and respectively depositing first film layer materials on the first film coating position and the pigment flake substrate to form respective first film layers, and stopping depositing the first material when detecting that the light signal intensity value on the first film coating position reaches a first preset intensity value;
synchronously and respectively depositing second materials on the second coating positions and the pigment flake substrate deposited with the first film layers to form respective second film layers, and stopping depositing the second materials when detecting that the light signal intensity value on the second coating positions reaches a second preset intensity value;
the above-described process of depositing the first material and the second material is repeated to alternately form respective film layers of the first material and the second material on the pigment flake substrate.
In order to solve the above technical problems, the second technical solution adopted by the present invention is: an apparatus for preparing optical thin film pigment flakes is provided.
Wherein the apparatus comprises:
coating a film cavity;
the first placing platform is positioned in the coating cavity and used for placing the pigment flake substrate;
the second placing platform is positioned in the coating cavity and used for placing a comparison sheet, and the comparison sheet at least comprises a first coating position and a second coating position;
the control system is used for controlling the first coating position and the pigment flake substrate to synchronously deposit a first material to form a first film layer, and stopping depositing the first material when the intensity of the optical signal on the first coating position is detected to reach a first preset intensity;
the control system is further used for controlling a second material to be deposited on the second coating position and the pigment flake substrate deposited with the first film layer to form a second film layer, and stopping depositing the second material when the light signal intensity on the second coating position is detected to reach a second preset intensity;
the control system is further configured to control the process of depositing the first material and the second material to be repeated to alternately form corresponding film layers of the first material and the second material on the pigment flake substrate.
The invention has the beneficial effects that: in contrast to the prior art, the present invention provides at least a first and a second coating position on the comparison sheet, corresponding to the first and second materials deposited on the substrate, respectively. Therefore, when the first material and the second material are alternately deposited on the substrate, the first material is continuously deposited on the first coating position, the second material is continuously deposited on the second coating position, and in the process of continuously depositing the same film material on the same coating position, the signal intensity on the corresponding coating position detected by the sensor is periodically changed but not gradually reduced, so that the film deposition control process on the comparison sheet is stable, the thickness of the film synchronously deposited on the substrate is in a reliable control state, and the production efficiency of the optical film pigment sheet is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Wherein:
FIG. 1 is a schematic flow chart of a first embodiment of a method for making optical thin-film pigment flakes according to the present invention;
FIG. 2 is a schematic diagram of one embodiment of a process corresponding to step S200 in FIG. 1;
FIG. 3 is a schematic diagram of one embodiment of a process corresponding to step S300 of FIG. 1;
FIG. 4 is a schematic diagram of one embodiment of a process corresponding to step S400 of FIG. 1;
FIG. 5 is a schematic diagram of one embodiment of a process corresponding to a second embodiment of a method for making optical thin-film pigment flakes according to the invention;
FIG. 6 is a schematic diagram of one embodiment of a process corresponding to the third embodiment of a method for making optical thin-film pigment flakes according to the invention;
FIG. 7 is a schematic diagram illustrating one embodiment of a process corresponding to a fourth embodiment of a method for making optical thin-film pigment flakes according to the invention;
FIG. 8 is a schematic flow chart diagram illustrating a fifth embodiment of a method for making optical thin-film pigment flakes according to the present invention;
FIG. 9 is a schematic diagram of one embodiment of a process corresponding to the method illustrated in FIG. 8;
FIG. 10 is a top view of one embodiment of a comparative sheet of the present invention;
fig. 11 is a schematic diagram of an apparatus for preparing optical thin-film pigment flakes according to one embodiment of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, 2, 3 and 4, fig. 1 is a schematic flow chart illustrating a first embodiment of a method for preparing an optical thin-film pigment flake according to the present invention, and fig. 2 is a schematic flow chart illustrating a process corresponding to step S200 in fig. 1; FIG. 3 is a schematic diagram of one embodiment of a process corresponding to step S300 of FIG. 1; FIG. 4 is a schematic diagram of an embodiment of a process corresponding to step S400 in FIG. 1, the method comprising the steps of:
s100, providing a pigment flake substrate and a comparison flake, wherein the comparison flake at least comprises a first coating position and a second coating position.
In the step S100, the substrate 10 is a substrate for depositing an optical thin-film pigment flake product, and the substrate 10 may be a glass substrate, a metal substrate, a plastic substrate, or the like. The comparison sheet 20 and the substrate 10 are synchronously subjected to film coating operation under the same process condition; meanwhile, the thickness variation of the film deposited on the substrate 10 is determined by detecting the variation of the optical signal intensity value of the film deposited on the comparison sheet 20 to determine when to end the deposition of the current film. This is because the comparison sheet 20 and the substrate 10 are coated in the same step under the same process conditions, and thus the thicknesses of the coated layers of the comparison sheet and the substrate are changed synchronously and have the same change amplitude. The thickness of the film deposited on the comparative sheet 20 was measured and in fact the thickness of the film deposited on the substrate 10 was also measured.
In the present embodiment, when a first material and a second material are alternately deposited on the substrate 10, the first plating sites 1 and the second plating sites 2 on the comparison sheet are used for depositing the first material and the second material, respectively. Of course, the number of the film deposition sites for depositing the first material may be greater than 1, and the number of the film deposition sites for depositing the second material may be greater than 1, that is, the number of the film deposition sites for depositing the first material and the number of the film deposition sites for depositing the second material may be determined according to actual conditions in the production process. Further, when the kinds of the alternately deposited film layers on the substrate 10 are greater than two, the number of the coating sites provided on the comparison sheet 20 is at least the same as the kinds of the alternately deposited film layer materials on the substrate, and of course, the number of the coating sites may be greater than the kinds of the film layer materials.
S200, synchronously and respectively depositing first materials on the first film coating position and the pigment flake substrate to form respective first film layers, and stopping depositing the first materials when detecting that the light signal intensity value on the first film coating position reaches a first preset intensity value.
Referring to fig. 1 and fig. 2, in the step S200, a first material is simultaneously deposited on the first plating position 1 and the pigment flake substrate 10 to form a first film H1, and the first material is stopped being deposited when the light signal intensity value on the first plating position 1 reaches a first predetermined intensity value. Wherein the first preset intensity value is determined according to the type of the first material and the deposition thickness of the first material. In one embodiment, the light signal intensity value refers to a light transmittance value. The first material comprises one of zinc sulfide, zirconium oxide and titanium oxide. Further, the first material may be deposited to a thickness of 10 nm to 600 nm, such as 10 nm, 100 nm, 600 nm, etc., and the thickness of the film layer may be set according to the thickness requirement of the nanostructured color crystals produced by pulverizing the optical thin film pigment flakes.
S300, synchronously and respectively depositing second materials on the second film coating positions and the pigment flake substrate deposited with the first film layers to form respective second film layers, and stopping depositing the second materials when detecting that the light signal intensity value on the second film coating positions reaches a second preset intensity value.
Referring to fig. 1, 2 and 3, in the step S300, a second material is simultaneously deposited on the second coating position 2 and the pigment flake substrate 10 deposited with the first film layer H1 to form respective second film layers L1, and the deposition of the second material is stopped when the light signal intensity value at the second coating position 2 is detected to reach a second preset intensity value. Wherein the second preset intensity value is determined according to the type of the first material, the type of the second material and the deposition thickness of the second material. The second material comprises one of magnesium fluoride, silicon dioxide and aluminum oxide. Further, the second material may be deposited to a thickness of 10 nm to 600 nm, such as 10 nm, 100 nm, 600 nm, etc., and the thickness of the film layer may be set according to the thickness requirement of the nanostructured color crystals produced by pulverizing the optical thin film pigment flakes. Of course, the thickness of the first and second film layers may be the same or different. In this embodiment, the plurality of film layers formed of the first material have the same thickness, and the plurality of film layers formed of the second material have the same thickness.
And S400, repeating the process of depositing the first material and the second material to alternately form film layers corresponding to the first material and the second material on the pigment flake substrate.
The number of the formed layers can be adjusted according to the needs of the product. Correspondingly, the film structure comprises an alternating structure composed of a film formed by a first material, a film formed by a second material, a film formed by the first material, a film formed by the second material and the like. It will be appreciated that the odd and even film layers are formed of a first material and a second material, respectively. In addition, the total number of layers of the film layer structure can be an odd number or an even number. In one embodiment, the total number of layers of the film layer structure is an odd number.
Further, referring to fig. 1, fig. 2, fig. 3 and fig. 4 together, for example, to prepare an optical thin-film pigment flake including 5 film layers (in the actual production process, the deposition of the film layers may be continuously cycled according to the above period as required), the above process of depositing the first material and the second material is repeated to alternately deposit the first film layer H1, the second film layer L1, the third film layer H2, the fourth film layer L2 and the fifth film layer H3 on the pigment flake substrate. Correspondingly, a first film layer H1, a third film layer H2 and a fifth film layer H3 formed by a first material are deposited on the first film-coating position 1, and a second film layer L1 and a fourth film layer L2 formed by a second material are deposited on the second film-coating position 1.
The present embodiment provides at least a first plating site 1 and a second plating site 2 on the comparison sheet 20, corresponding to the first material and the second material deposited on the substrate 10, respectively. Thus, when the first material and the second material are alternately deposited on the substrate 10, the first material is continuously deposited on the first coating position 1, the second material is continuously deposited on the second coating position 2, and in the process of continuously depositing the same film material on the same coating position, the signal intensity on the corresponding coating position detected by the sensor is periodically changed but not gradually reduced, so that the thickness of the film layer deposited on the substrate 10 is stably and reliably controlled by the signal of the comparison sheet 20, and the production efficiency of the optical thin film pigment sheet is favorably improved.
Further, the refractive index of the first material is greater than the refractive index of the second material. In one embodiment, the first material has a refractive index of 2.25, the second material has a refractive index of 1.46, the comparative sheet has a refractive index of 1.52, and the plated sites are different regions on the comparative sheet 20 and have the same refractive index as the comparative sheet 20.
Furthermore, a complete pigment flake film stack, which is called a set of optical films, can be deposited with a plurality of sets of stacked optical films on the same substrate, the composition and thickness of each optical film pigment flake can be the same or different, and the films formed by deposition are connected tightly, so that in order to facilitate the separation of each set of optical film pigment flakes, the comparison sheet also comprises a sacrificial layer coating position. Referring to fig. 5, for the preparation of an optical thin-film pigment flake including 5 film layers (H1, L1, H2, L2, and H3), before depositing the optical thin-film pigment flake, the method further includes: and synchronously depositing a sacrificial layer consisting of a release agent on the sacrificial layer coating position X and the pigment flake substrate 30, so that the pigment flakes are conveniently separated through the sacrificial layer. Of course, the sacrificial layer may also be formed between different membrane stacks to facilitate separation of the different membrane stacks. I.e., the sacrificial layer facilitates separation of the pigment flakes from the pigment flake substrate 30, separation between adjacent pigment flake film stacks, etc.
Further, the sacrificial layer may be made of an inorganic material or an organic material, such as sodium chloride or polyethylene wax, and accordingly, the separation of each set of membranes may be achieved by dissolving with water or a solvent.
In addition, the optical thin film pigment flakes obtained through separation are crushed through ultrasonic processing and the like, so that the optical thin film pigment is fractured in a direction perpendicular to the extending direction of the film layers, the crushed optical thin film pigment flakes are obtained, and nanostructured color crystals are obtained through grading processing and the like, wherein the number of the film layers of the nanostructured color crystals is the same as that of the optical thin film pigment. While optical thin-film pigment flakes typically include an odd number of film layers and an odd number of film layers formed from a first material having a higher refractive index, the first and last layers of the optical thin-film pigment flakes are formed from the first material.
In one embodiment, referring to fig. 6, the number and thickness of the layers formed by depositing another material between the layers formed by the same material may be set according to actual requirements, for example, the 4L1 layers and the 4L2 layers formed by depositing the second material between the H1 layer, the H2 layer and the H3 layer formed by depositing the first material on the substrate 50 each include 4 layers, wherein the 4 layers are made of the same material, and the respective thicknesses thereof may be the same or different. Accordingly, deposited on the first plating site 1 of the comparative sheet 60 are the H1 layer, the H2 layer, and the H3 layer formed of the first material; the second coating position is also deposited with 4L1 layer and 4L2 layer of the second material. When the number of layers and the thickness of the films made of the same material deposited between the films made of the same material are different, the first preset strength and the second preset strength respectively correspond to the number of the first films and the number of the second films deposited, that is, the first preset strength value and the second preset strength value respectively change along with the number of the first films and the number of the second films deposited.
In one embodiment, please refer to fig. 2, fig. 3, fig. 4 and fig. 7, and refer to table 1 and table 2 below, where table 1 is a table of detected changes of optical signals at a first coating position of a comparison sheet during deposition of a first material at the first coating position, and table 2 is a table of detected changes of optical signals during deposition of a second material at a second coating position of the comparison sheet.
TABLE 1 comparison table of optical signals at first coating position
| Number of coating layers | Condition of film coating | Light transmittance% | Difference% |
| 0 | Non-coated film | 91.8 | |
| 1 | H1 | 68.9 | 22.9 |
| 2 | H2 | 91.8 | 22.9 |
| 3 | H3 | 68.9 | 22.9 |
| 5 | …… |
TABLE 2 comparison table of light signals at the second coating site
| Number of times of film coating | Condition of film coating | Light transmittance | Difference value |
| 0 | Non-coated film | 91.8 | |
| 1 | L | 93.2 | 1.4 |
| 2 | 2L | 91.8 | 1.4 |
| 3 | 3L | 93.2 | 1.4 |
| 4 | …… |
As can be seen from tables 1 and 2, since the deposition thicknesses of the first material and the second material are appropriate, the light transmittance detected at the first plating position and the second plating position changes periodically, the light transmittance difference values of the adjacent films formed on the first plating position and the second plating position by the first material and the second material are respectively 22.9% and 1.4%, the light transmittance changes alternately, the optical signal is not attenuated, the film thickness can be well controlled by using an optical film thickness controller, the number of the film layers can be greatly increased, the production requirement can be generally met, and the production efficiency can be improved.
Further, referring to fig. 7, in order to increase the difference of the light transmittance of the film material deposited on the film deposition position and improve the accuracy of the control process, a pre-deposition layer may be disposed on the film deposition position.
In one embodiment, before the simultaneous film deposition of the pigment flake substrate 70 and the comparative flake 80, a pre-deposition layer 81 is pre-deposited on the second film deposition site 2 of the comparative flake 80, wherein the refractive index of the pre-deposition layer 81 is greater than that of the second film. In this embodiment, the second film position 2 is used to deposit a second film layer formed by a second material with a smaller refractive index, such as a refractive index of 1.46, and the refractive index of the pre-deposition layer 81 is 2.26. In the process of preparing the optical thin-film pigment flake, the change of the optical signal on the second coating position is shown in table 3, and comparing table 3 with table 2, it can be known that after the pre-deposition layer 81 is disposed, the difference of the light transmittance of the second film layer formed by the second material adjacently disposed on the second coating position 2 is increased from 1.4% to 22.4%, which is beneficial to improving the accuracy of the coating control process.
TABLE 3 Change Table of light signal on the second coating position after setting the pre-deposition layer
| Number of times of film coating | Condition of film coating | Light transmittance (%) | Difference (%) |
| 0 | Non-coated film | 91.8 | |
| 1 | Pre-coating H layer | 68.9 | |
| 2 | L1 | 91.3 | 22.4 |
| 3 | L2 | 68.9 | 22.4 |
| 4 | L3 | 91.3 | 22.4 |
| 5 | L4 | 68.9 | 22.4 |
| 6 | …… |
In another embodiment, with continued reference to fig. 7, before the simultaneous film deposition of the pigment flake substrate 70 and the comparative flake 80, a first film 82 and a second film 83 are alternately deposited on the first film-plating site 1 of the comparative flake 80 in advance. The first film coating position 1 is used for depositing a first material with a larger refractive index, the refractive index of the first material is larger than that of the second material, the first film layer is made of the first material, and the second film layer is made of the second material. In the process of preparing the optical thin-film pigment flake, the table of the change of the optical signal at the first coating position 1 is shown in table 4, and comparing table 4 with table 1, it can be known that after the first film layer 82 and the second film layer 83 which are alternately deposited in advance are arranged, the difference of the light transmittance of the first film layer formed by the first material adjacently arranged at the first coating position 1 is increased from 22.9% to 52.1%, which is beneficial to improving the accuracy of the coating control process.
Table 4 table of change of optical signal at the first coating position after the predeposition layer is set
| Number of coating layers | Condition of film coating | Light transmittance (%) | Difference (%) |
| 0 | Non-coated film | 91.8 | |
| 1 | Preplating HL layer | 91.3 | |
| 2 | H1 | 39.2 | 52.1 |
| 3 | H2 | 91.3 | 52.1 |
| 4 | H3 | 39.2 | 52.1 |
| 5 | H4 | 91.3 | 52.1 |
| 6 | H5 | 39.2 | 52.1 |
| 7 | …… |
In an embodiment, please refer to fig. 8 and 9, fig. 8 is a schematic flow chart of a fifth embodiment of a method for preparing an optical thin-film pigment flake according to the present invention, fig. 9 is a schematic diagram of an embodiment of a process corresponding to the method in fig. 8, wherein the comparison flake B includes six plating positions, the six plating positions include a sacrificial layer plating position X, and the remaining five plating positions are a first plating position 1, a second plating position 2, a third plating position 3, a fourth plating position 4, and a fifth plating position 5, respectively, and the arrangement of the six plating positions may be a linear arrangement or a circular arrangement, and of course, the arrangement of the six plating positions may be designed according to an actual operation process. In one embodiment, referring to fig. 10, fig. 10 is a top view of an embodiment of a comparison chip C, which includes a sacrificial layer coating position XX, a first coating position 11, a second coating position 22, a third coating position 33, a fourth coating position 44, and a fifth coating position 55, which are distributed in a ring shape.
Specifically, the method further comprises the steps of:
s10, depositing a first material on the first plating position 1 and the pigment flake substrate a simultaneously to form a first film H1, and stopping depositing the first material when detecting that the light signal intensity value at the first plating position 1 reaches a first predetermined intensity value.
S20, synchronously depositing a second material on the second coating position 2 and the pigment flake substrate a deposited with the first film layer H1 to form respective second film layers L1, and stopping depositing the second material when detecting that the light signal intensity value at the second coating position 2 reaches a second predetermined intensity value.
S30, simultaneously and respectively depositing a first material on the third plating position 3 and the pigment flake substrate a deposited with the second film layer L1 to form a respective third film layer H2, and stopping depositing the first material when detecting that the light signal intensity value at the third plating position 3 reaches a first preset intensity value.
S40, synchronously depositing a second material on the fourth plating position 4 and the pigment flake substrate a deposited with the third film layer H2 to form a respective fourth film layer L2, and stopping depositing the second material when detecting that the light signal intensity value at the fourth plating position 4 reaches a second predetermined intensity value.
S50, synchronously depositing a first material on the fifth film-coating position 5 and the pigment flake substrate a deposited with the fourth film layer L2 to form a respective fifth film layer H3, and stopping depositing the first material when detecting that the light signal intensity value at the fifth film-coating position 5 reaches a first preset intensity value.
In this embodiment, the refractive index of the first material used to form the first, third, and fifth film layers H1, H2, and H3 is greater than the refractive index of the second material used to form the second and fourth film layers L1 and L2. Further, before the step S10, a sacrificial layer is deposited at the pigment flake substrate a and the sacrificial layer plating site X. Of course, in the process of repeating the above steps S10-S50, when the thickness of the film layer deposited on the pigment flake substrate a reaches a predetermined thickness, the above steps S10-S50 are continuously repeated after depositing the sacrificial layer on the pigment flake substrate a and the sacrificial layer plating site X.
In order to solve the above technical problems, the second technical solution adopted by the present invention is: an apparatus for preparing optical thin film pigment flakes is provided.
Referring to fig. 11, fig. 11 is a schematic structural diagram of an embodiment of an apparatus for preparing optical thin-film pigment flakes according to the invention, wherein the apparatus 1 includes: a coating chamber 100, a first platform 200, a second platform 300 and a control system 400. The first placing platform 200 is located in the coating cavity 100 and is used for placing a pigment flake substrate; the second placing platform 300 is located in the film coating cavity 100 and is used for placing a comparison sheet, and the comparison sheet at least comprises a first film coating position and a second film coating position; the control system 400 is configured to control the first material to be deposited on the first coating position and the pigment flake substrate simultaneously to form a first film layer, and stop depositing the first material when detecting that the intensity of the optical signal at the first coating position reaches a first preset intensity; the control system is further used for depositing a second material on the second coating position and the pigment flake substrate deposited with the first film layer to form a second film layer, and stopping depositing the second material when the light signal intensity on the second coating position is detected to reach a second preset intensity; the control system is further configured to control the process of depositing the first material and the second material to be repeated to alternately form corresponding film layers on the pigment flake substrate.
In this embodiment, the apparatus 1 may be a pvd coating apparatus, and specifically, the apparatus 1 may be an apparatus for preparing optical thin film pigment flakes by a cathodic arc pvd method, an electron beam pvd method, or a magnetron sputtering pvd method. In addition, the control system 400 at least comprises a sensor, a storage device, an execution device and a comparison device, wherein the sensor is used for detecting the intensity of optical signals on the first coating position and the second coating position; the storage device is used for storing instructions for execution, preset intensity and the like, and the comparison device is used for receiving the intensity of the optical signal detected by the sensor, comparing the intensity with an intensity threshold value stored in the storage device and sending a comparison result to the execution device; the executing device is used for executing operations of stopping deposition of a certain film material, starting deposition of another film material and the like according to the comparison result output by the comparing device.
Further, the apparatus 1 further comprises a driving mechanism 500 connected to the second placing platform 300, wherein the driving mechanism 500 is configured to alternately expose the first and second film-coating positions to the deposition spaces of the corresponding film materials. In this embodiment, the driving mechanism 500 may be a motor, the second placing platform 300 is connected to the driving mechanism 500 through a rotating shaft, the rotating shaft of the second placing platform 300 is driven by the driving mechanism 500 to rotate, so that the first plating positions and the second plating positions are alternately exposed to the atmosphere of the corresponding film material, and only the thickness of the film layer is increased at different plating positions on the comparison sheet, and the different kinds of film layers are prevented from being alternately stacked.
In summary, the invention discloses a method and an apparatus for preparing an optical thin film pigment flake, the method comprising: providing a pigment flake substrate and a comparison flake, wherein the comparison flake at least comprises a first coating position and a second coating position; synchronously depositing a first material on the first coating position and the pigment flake substrate to form a first film layer, and stopping depositing the first material when detecting that the intensity of an optical signal on the first coating position reaches a first preset intensity; depositing a second material on the second coating position and the pigment flake substrate deposited with the first film layer to form a second film layer, and stopping depositing the second material when the light signal intensity on the second coating position is detected to reach a second preset intensity; the above process of depositing the first material and the second material is repeated. Through the mode, the production efficiency of the optical thin film pigment flake can be improved.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes performed by the present specification and drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. A method of making an optical thin film pigment flake, the method comprising:
providing a pigment flake substrate and a comparison flake, wherein the comparison flake at least comprises a first coating position and a second coating position;
synchronously and respectively depositing first materials on the first coating position and the pigment flake substrate to form respective first film layers, and stopping depositing the first materials when detecting that the light signal intensity value on the first coating position reaches a first preset intensity value;
synchronously and respectively depositing second materials on the second coating positions and the pigment flake substrate deposited with the first film layers to form respective second film layers, and stopping depositing the second materials when detecting that the light signal intensity value on the second coating positions reaches a second preset intensity value;
the above-described process of depositing the first material and the second material is repeated to alternately form respective film layers of the first material and the second material on the pigment flake substrate.
2. The method of claim 1, further comprising a sacrificial layer plating site on the comparison pad, the method further comprising:
and synchronously and respectively depositing release agents on the sacrificial layer coating position and the pigment flake substrate to form a sacrificial layer, so that the pigment flakes can be conveniently separated through the sacrificial layer.
3. The method of claim 1, wherein the first material has a refractive index greater than the refractive index of the second material.
4. The method as claimed in claim 3, further comprising depositing alternating first and second film layers on the first plating sites prior to simultaneously depositing the film layers on the pigment flake substrate and the comparator flake.
5. The method of claim 3, further comprising pre-depositing a pre-deposited layer on the second coating station prior to simultaneously depositing the layers on the pigment flake substrate and the comparator flake, the pre-deposited layer having a refractive index greater than a refractive index of the second layer.
6. The method of claim 3, wherein the first and second coating position light signal intensity values each vary periodically with the thickness of the deposited film.
7. The method of claim 1, wherein the light signal intensity value comprises a transmittance value.
8. The method of claim 1, wherein the comparison sheet comprises six plating positions, wherein the six plating positions comprise sacrificial layer plating positions, and the remaining five plating positions are the first plating position, the second plating position, the third plating position, the fourth plating position, and the fifth plating position,
after the deposition of the second material is stopped, the method comprises the following steps:
synchronously depositing a first material on the third coating position and the pigment flake substrate deposited with the second film layer to form respective third film layers, and stopping depositing the first material when detecting that the light signal intensity value on the third coating position reaches a first preset intensity value;
synchronously depositing a second material on the fourth coating position and the pigment flake substrate deposited with the third film layer to form respective fourth film layers, and stopping depositing the second material when the intensity of the optical signal on the fourth coating position is detected to reach a second preset intensity;
and synchronously depositing a first material on the fifth coating position and the pigment flake substrate deposited with the fourth film layer to form respective fifth film layers, and stopping depositing the first material when detecting that the light signal intensity value on the fifth coating position reaches a first preset intensity value.
9. An apparatus for producing optical thin-film pigment flakes, the apparatus comprising:
coating a film cavity;
the first placing platform is positioned in the coating cavity and used for placing the pigment flake substrate;
the second placing platform is positioned in the coating cavity and used for placing a comparison sheet, and the comparison sheet at least comprises a first coating position and a second coating position;
the control system is used for controlling a first material to be synchronously deposited on the first coating position and the pigment flake substrate to form a first film layer, and stopping depositing the first material when the intensity of the optical signal on the first coating position is detected to reach a first preset intensity;
the control system is further used for depositing a second material on the second coating position and the pigment flake substrate deposited with the first film layer to form a second film layer, and stopping depositing the second material when the light signal intensity on the second coating position is detected to reach a second preset intensity;
the control system is further configured to control the process of depositing the first material and the second material to be repeated to alternately form corresponding film layers of the first material and the second material on the pigment flake substrate.
10. The manufacturing apparatus of claim 9, further comprising a driving mechanism connected to the second placement platform, the driving mechanism configured to alternately expose the first and second coating locations to the deposition spaces of the respective film layer materials.
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