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CN111196899A - Superfine grinding preparation process for nano silicon oxide - Google Patents

Superfine grinding preparation process for nano silicon oxide Download PDF

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Publication number
CN111196899A
CN111196899A CN201811385064.2A CN201811385064A CN111196899A CN 111196899 A CN111196899 A CN 111196899A CN 201811385064 A CN201811385064 A CN 201811385064A CN 111196899 A CN111196899 A CN 111196899A
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CN
China
Prior art keywords
grinding
stage
particle size
zirconium silicate
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811385064.2A
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Chinese (zh)
Inventor
王俊甫
李强
周雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
King's Ceramic Grinding Technology Co ltd
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King's Ceramic Grinding Technology Co ltd
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Application filed by King's Ceramic Grinding Technology Co ltd filed Critical King's Ceramic Grinding Technology Co ltd
Priority to CN201811385064.2A priority Critical patent/CN111196899A/en
Publication of CN111196899A publication Critical patent/CN111196899A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3009Physical treatment, e.g. grinding; treatment with ultrasonic vibrations
    • C09C1/3018Grinding
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/04Physical treatment, e.g. grinding, treatment with ultrasonic vibrations
    • C09C3/041Grinding
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

The invention discloses a novel process for preparing nanometer silicon oxide superfine powder by using common commercially available silicon micropowder as a raw material and adopting a multistage cascade grinding process. Firstly, carrying out wet ball milling on zirconium silicate-aluminum oxide grinding balls with the particle size of F3.5mm to grind the silicon micropowder until the particle size is less than 2 microns; then zirconium silicate-alumina grinding ball microbeads are adopted to carry out multistage sand grinding cascade superfine grinding in three stages until the grain diameter is less than 100 nanometers: finally, the nanometer-level silicon oxide superfine powder is obtained through spray drying.

Description

Superfine grinding preparation process for nano silicon oxide
Technical Field
The invention relates to a superfine grinding preparation process of a fine ceramic raw material nano silicon oxide.
Background
The silicon oxide has wide application, and plays an important role in the fields of textile industry, refractory materials, grinding materials and the like due to good mechanical strength and wear resistance. When the size of the silicon oxide powder reaches the nanometer level, the silicon oxide powder shows excellent properties of reinforcement, thickening, thixotropy, insulation, extinction, sagging prevention and the like in the material due to the nanometer size effect, so the silicon oxide powder is widely applied to the high polymer industrial fields of rubber, plastics, coatings, adhesives, sealants and the like.
The nano silicon oxide raw material is prepared by using silane or silicon chloride as a raw material and adopting a wet chemistry or soft chemistry method, and has the defects of high cost and small scale. In order to promote the large-scale application of nano-silicon oxide, a new technology for producing nano-silicon oxide superfine powder on a large scale at low cost must be found.
Grinding is a commonly used means of pulverization to reduce the particle size of the powder. The traditional wet ball milling method has low rotating speed and long consumption time, the superfine particle size is limited, the superfine particle size can only reach several microns generally, and submicron powder cannot be obtained. The powder of 1-2 microns can be obtained by performing primary superfine by using a sand mill, but the method has the disadvantages of long time consumption, high energy consumption, high slurry viscosity and low solid content, and can not directly obtain submicron alumina superfine powder.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a novel process for preparing nano-silicon oxide superfine powder by using a common commercially available silicon micropowder raw material through a multistage cascade grinding process.
In order to realize the purpose of the invention, the following technical scheme is provided: a nanometer silicon oxide superfine grinding preparation process is characterized by comprising the following steps.
a. Stirring, grinding and coarse grinding: taking zirconium silicate-alumina grinding balls with the diameter of 3.5mm as grinding balls, and grinding the silicon micropowder to silicon oxide with the particle size (D98) of less than 2 microns.
b. The cascade sanding is superfine: the first stage was sand milled with zirconium silicate-alumina grinding balls 1mm in diameter, milling the silica to a particle size (D98) of less than 1 micron; second stage sanding with zirconium silicate-alumina grinding balls of 0.5mm diameter to grind silica to a particle size (D98) of less than 0.3 micron; the third stage was sanded with zirconium silicate-alumina grinding balls 0.2mm in diameter to grind the silica to a particle size (D98) of less than 100 nm. Wherein, ammonia water is added to the second stage and the third stage to adjust the pH value to 9-10, and 0.2 weight percent of ammonium polyacrylate and 0.2 weight percent of polyethylene glycol are added to serve as composite dispersants.
c. In-stage series cycle: each stage comprises 2 or more sand mills filled with zirconium silicate-aluminum oxide grinding balls with the same size, slurry discharged from each sand mill enters a slurry pool, then is pumped into another sand mill filled with zirconium silicate-aluminum oxide with the same size, is circularly ground among the 2 or more sand mills, and is pumped into the slurry pool of the next stage for grinding after the detected particle size (D98) reaches the standard.
d. The slurry discharged from the sand mill must be cooled by water and then enters a slurry pool with water cooling and stirring.
e. And after grinding, spray drying to obtain the superfine nano silicon oxide powder.
The beneficial effects of the invention are as follows.
1. Through the matching of grinding balls with different diameters in the cascade superfine sanding, the particle size of the powder is reduced step by step with the maximum efficiency until the particle size is less than 100 nanometers.
2. In the same level, through the circulation of concatenating of many sand mills, promote the homogeneity of thick liquids in grinding to through the temperature of water-cooling reduction thick liquids at the circulation in-process, avoid the high temperature to the harm of equipment and the rise of thick liquids viscosity, promote the efficiency of grinding.
3. The pH value of the slurry is adjusted in the second stage, and ammonium polyacrylate and polyethylene glycol are added as dispersing agents, so that the viscosity of the superfine silicon oxide powder slurry can be reduced, higher solid content is ensured, the grinding efficiency is improved, and the cost is reduced. Meanwhile, the added ammonium polyacrylate can not add impurity metal ions to the superfine silicon oxide powder.
The method is implemented.
Example 1 was carried out.
Firstly, commercially available silicon micro powder, F3.5mm zirconium silicate-alumina grinding balls and water (weight percentage is 1: 2: 1) are put into a 500L sand mill, the rotation speed is 300rpm, and grinding is carried out for 10-15 hours, so that the particle size of silicon oxide (D98) is less than 2 microns. Then transferring the mixture to a first-stage sanding slurry pool in which two 200L sanding machines are connected in series, adding ammonia water to adjust the pH value to 9-10, adding 0.2 wt% of ammonium polyacrylate and 0.2 wt% of polyethylene glycol serving as dispersing agents, and uniformly stirring. Then pumping the slurry into a grinding ball sand mill provided with F1mm zirconium silicate-alumina grinding balls, rotating at the speed of 300rpm, carrying out sand grinding, cooling by water at the speed of 5L/min, then feeding into a slurry tank of a second sand mill, and after filling, starting to pump into the second sand mill to start grinding. The slurry was ground in two sand mills in a cyclic manner for 2-3 hours to a silica particle size (D98) of less than 1 micron. Then pumped into a second-stage sanding slurry pool formed by connecting two 200L sanding machines in series. The slurry was pumped into a second stage of a ball mill fitted with F0.5mm zirconium silicate-alumina grinding balls and ground in a similar cycle to the first stage in two mills at 300 rpm. After 3-4 hours of circular milling, the particle size of the silica (D98) was less than 0.5 microns. Then pumped into a third-stage sanding slurry tank formed by connecting two 200L sanding machines in series. The slurry was pumped into the third stage of a ball mill fitted with F0.2mm zirconium silicate-alumina grinding balls and ground cyclically in two similar mills at 300 rpm. After 3-4 hours of circular grinding, the particle size of the alumina (D98) is less than 100 nm. Then pumping into a spray drying tower for drying to obtain the nanometer silicon oxide superfine powder.
Example 2 was carried out.
Commercially available fine silica powder, F3.5mm zirconium silicate-alumina grinding balls and water (weight percentage: 0.8: 2: 0.8) were charged into a 500 liter sand mill at 300rpm for 10 to 15 hours to make the silica particle size (D98) less than 2 μm. Then transferring the mixture to a first-stage sanding slurry pool in which two 200L sanding machines are connected in series, adding ammonia water to adjust the pH value to 9-10, adding 0.2 wt% of ammonium polyacrylate and 0.2 wt% of polyethylene glycol serving as dispersing agents, and uniformly stirring. Then pumping the slurry into a grinding ball sand mill provided with F1mm zirconium silicate-alumina grinding balls, rotating at the speed of 300rpm, carrying out sand grinding, cooling by water at the speed of 5L/min, then feeding into a slurry tank of a second sand mill, and after filling, starting to pump into the second sand mill to start grinding. The slurry was ground in two sand mills in a cyclic manner for 2-3 hours to a silica particle size (D98) of less than 1 micron. Then pumped into a second-stage sanding slurry pool formed by connecting two 200L sanding machines in series. The slurry was pumped into a second stage of a ball mill fitted with F0.5mm zirconium silicate-alumina grinding balls and ground in a similar cycle to the first stage in two mills at 300 rpm. After 3-4 hours of circular milling, the particle size of the silica (D98) was less than 0.5 microns. Then pumped into a third-stage sanding slurry tank formed by connecting two 200L sanding machines in series. The slurry was pumped into the third stage of a ball mill fitted with F0.2mm zirconium silicate-alumina grinding balls and ground cyclically in two similar mills at 300 rpm. After 3-4 hours of circular grinding, the particle size of the alumina (D98) is less than 100 nm. Then pumping into a spray drying tower for drying to obtain the nanometer silicon oxide superfine powder.

Claims (5)

1. Stirring, grinding and coarse grinding: and (3) grinding the silicon micropowder to silicon oxide with the particle size (D98) of less than 2 microns by taking zirconium silicate-aluminum oxide grinding balls with the diameter of F3.5mm as grinding balls.
2. The cascade sanding is superfine: the first stage was sanded with F1mm zirconium silicate-alumina grinding balls, grinding silica to a particle size (D98) of less than 1 micron; a second stage of sanding with F0.5mm zirconium silicate-alumina grinding balls to grind the silica to a particle size (D98) of less than 0.3 microns; a third stage of sanding with F0.2mm zirconium silicate-alumina grinding balls to grind the silica to a particle size (D98) of less than 100 nanometers; wherein, ammonia water is added to the second stage and the third stage to adjust the pH value to 9-10, and 0.2 weight percent of ammonium polyacrylate and 0.2 weight percent of polyethylene glycol are added to serve as composite dispersants.
3. In-stage series cycle: each stage comprises 2 or more sand mills filled with zirconium silicate-aluminum oxide grinding balls with the same size, slurry discharged from each sand mill enters a slurry pool, then is pumped into another sand mill filled with zirconium silicate-aluminum oxide with the same size, is circularly ground among the 2 or more sand mills, and is pumped into the slurry pool of the next stage for grinding after the detected particle size (D98) reaches the standard.
4. The slurry discharged from the sand mill must be cooled by water and then enters a slurry pool with water cooling and stirring.
5. And after grinding, spray drying to obtain the superfine nano silicon oxide powder.
CN201811385064.2A 2018-11-20 2018-11-20 Superfine grinding preparation process for nano silicon oxide Pending CN111196899A (en)

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Application Number Priority Date Filing Date Title
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112374504A (en) * 2020-11-05 2021-02-19 黄运雷 Process for manufacturing nano silicon dioxide by physical method
CN114057470A (en) * 2020-07-31 2022-02-18 广州市尤特新材料有限公司 Preparation method of molybdenum-doped indium oxide target material and molybdenum-doped indium oxide target material
CN114275808A (en) * 2021-07-01 2022-04-05 芜湖映日科技股份有限公司 Preparation process of nanoscale ITO powder for TFT-LCD target

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1795145A (en) * 2003-03-11 2006-06-28 普里梅精密材料有限公司 Multi-carbide material manufacture and use
CN101590440A (en) * 2008-05-29 2009-12-02 段吉文 Continuous wet-grinding technology and relative device
CN101722085A (en) * 2008-10-15 2010-06-09 许兴康 Grinding technology of high purity sub-nano level superfine zirconium silicate powder
CN103086383A (en) * 2013-01-21 2013-05-08 中国高岭土有限公司 Preparation method of high-quality diatomaceous earth product
CN104446509A (en) * 2014-10-23 2015-03-25 江苏金石研磨有限公司 Preparation method of submicron aluminum oxide superfine powder by virtue of cascade grinding
CN105655570A (en) * 2016-04-01 2016-06-08 四川创能新能源材料有限公司 Refining preparation method of nanoscale silicon powder material
CN206881830U (en) * 2017-06-19 2018-01-16 青岛世纳机械设备有限公司 A kind of special grinding hierarchy system of silicon powder
CN108368354A (en) * 2016-01-27 2018-08-03 克洛诺斯国际有限公司 It can be by the production of the titanium dioxide pigment for the narrow size distribution that sulfate process obtains

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1795145A (en) * 2003-03-11 2006-06-28 普里梅精密材料有限公司 Multi-carbide material manufacture and use
CN101590440A (en) * 2008-05-29 2009-12-02 段吉文 Continuous wet-grinding technology and relative device
CN101722085A (en) * 2008-10-15 2010-06-09 许兴康 Grinding technology of high purity sub-nano level superfine zirconium silicate powder
CN103086383A (en) * 2013-01-21 2013-05-08 中国高岭土有限公司 Preparation method of high-quality diatomaceous earth product
CN104446509A (en) * 2014-10-23 2015-03-25 江苏金石研磨有限公司 Preparation method of submicron aluminum oxide superfine powder by virtue of cascade grinding
CN108368354A (en) * 2016-01-27 2018-08-03 克洛诺斯国际有限公司 It can be by the production of the titanium dioxide pigment for the narrow size distribution that sulfate process obtains
CN105655570A (en) * 2016-04-01 2016-06-08 四川创能新能源材料有限公司 Refining preparation method of nanoscale silicon powder material
CN206881830U (en) * 2017-06-19 2018-01-16 青岛世纳机械设备有限公司 A kind of special grinding hierarchy system of silicon powder

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114057470A (en) * 2020-07-31 2022-02-18 广州市尤特新材料有限公司 Preparation method of molybdenum-doped indium oxide target material and molybdenum-doped indium oxide target material
CN112374504A (en) * 2020-11-05 2021-02-19 黄运雷 Process for manufacturing nano silicon dioxide by physical method
CN112374504B (en) * 2020-11-05 2023-01-24 黄运雷 Process for manufacturing nano silicon dioxide by physical method
CN114275808A (en) * 2021-07-01 2022-04-05 芜湖映日科技股份有限公司 Preparation process of nanoscale ITO powder for TFT-LCD target

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Application publication date: 20200526