CN110803796A - Preparation method of plasma defluorination solution, water purification process and equipment - Google Patents
Preparation method of plasma defluorination solution, water purification process and equipment Download PDFInfo
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- CN110803796A CN110803796A CN201911004090.0A CN201911004090A CN110803796A CN 110803796 A CN110803796 A CN 110803796A CN 201911004090 A CN201911004090 A CN 201911004090A CN 110803796 A CN110803796 A CN 110803796A
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 64
- 238000006115 defluorination reaction Methods 0.000 title claims abstract description 34
- 238000000746 purification Methods 0.000 title claims abstract description 16
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 239000002105 nanoparticle Substances 0.000 claims abstract description 43
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 21
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 9
- 239000011737 fluorine Substances 0.000 claims abstract description 9
- 229910052742 iron Inorganic materials 0.000 claims abstract description 9
- 238000005189 flocculation Methods 0.000 claims description 23
- 230000016615 flocculation Effects 0.000 claims description 23
- 239000002923 metal particle Substances 0.000 claims description 22
- 238000004062 sedimentation Methods 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 19
- 238000000108 ultra-filtration Methods 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 5
- 229910052755 nonmetal Inorganic materials 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 238000002955 isolation Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000001556 precipitation Methods 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 230000001788 irregular Effects 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- -1 fluorine ions Chemical class 0.000 abstract description 8
- 239000002994 raw material Substances 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005611 electricity Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009388 chemical precipitation Methods 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
- B01J20/0203—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising compounds of metals not provided for in B01J20/04
- B01J20/0248—Compounds of B, Al, Ga, In, Tl
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/12—Halogens or halogen-containing compounds
- C02F2101/14—Fluorine or fluorine-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
- C02F2201/007—Modular design
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
The invention discloses a preparation method of a plasma defluorination solution, a water purification process and equipment, wherein aluminum balls and/or iron balls are used as raw materials and are put into an ionization chamber, when water passes through the ionization chamber, plasma discharge is carried out on a water body, and nano particles are prepared instantly; the fluorine ions in the water are removed by utilizing the characteristics of large specific surface area and high Zeta potential of the nano particles. The invention has strong defluorination capability, the ionization chamber can continuously carry out plasma discharge, can realize continuous preparation of nano particles, and continuous defluorination is not interrupted. The yield of the nano particles can be controlled by controlling parameters such as voltage, current, discharge period and the like, and the problem of standard exceeding of aluminum ions does not exist. The ionization chamber has small volume, less equipment investment, small occupied area and wide application range.
Description
Technical Field
The invention relates to a preparation method of a defluorination solution, a water purification process and equipment, in particular to a preparation method of a plasma defluorination solution, a water purification process and equipment.
In the background technology, the excessive fluorine ions in drinking water cause a lot of harm, the fluorine ions are difficult to remove by a reverse osmosis method due to small diameter, and in addition, the fluoride has high solubility in water and is difficult to remove by a chemical precipitation method. The activated alumina and the flocculation precipitation technology can remove the fluoride ions in the water to a certain degree, but the cost is high, the occupied area is large, and a good fluoride removal effect is difficult to obtain.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides a preparation method, a water purification process and equipment of a plasma defluorination solution, which can realize continuous preparation of nano particles, realize continuous defluorination without interruption and obviously improve the defluorination effect.
In order to achieve the purpose, the invention provides a preparation method of a plasma defluorination solution, a water purification process and equipment, wherein the preparation method of the plasma defluorination solution comprises the following specific steps:
1) adding aluminum balls with the particle size of 2-5mm into the ionization chamber, wherein the aluminum balls are in contact with the electrodes, and the stacking height of the aluminum balls is 1/5-2/3 of the height of the ionization chamber;
2) injecting water into the ionization chamber through the inlet until the water covers the aluminum ball stack and overflows from the outlet;
3) the power supply is switched on, and a periodic discharge voltage is provided for the electrode;
4) and adjusting the discharge voltage of the power supply to ensure that the discharge current is not less than 5A, thus obtaining the plasma defluorination solution.
Further, the discharge voltage is: 5000V; the discharge current is: 1000-1500A; the discharge period is as follows: 1000 HZ.
Further, the defluorination solution comprises nanoparticles made of aluminum or iron and obtained by plasma discharge, and the diameter of the nanoparticles is 20-100 nm; the Zeta potential of the nano-particles is 10 mkm-3(ii) a The specific surface area of the nanoparticles is 1000m2/g。
The water purification process comprises the following steps:
1) preparing defluorination nanoparticles by adopting plasma;
2) raw water is subjected to defluorination by reaction with nano particles and then is introduced into a flocculation sedimentation tank for flocculation sedimentation;
3) introducing the water subjected to flocculation precipitation into an immersed ultrafiltration tank for ultrafiltration filtration, and intercepting suspended matters in the water to enable the turbidity of the treated water to be less than 0.1 NTU;
4) finally, the water enters a clean water tank or a water supply pipe network after being sterilized.
The invention also provides water purification equipment, which comprises a nano-particle defluorination reactor, a flocculation sedimentation tank and an immersed super filter;
the nano-particle defluorination reactor comprises a power supply, electrodes, an ionization chamber, a solvent and metal particles; the solvent is positioned in the ionization chamber, and the metal particles are submerged below the liquid level of the solvent; one end of the electrode is electrically connected with a power supply, and the other end of the electrode is inserted below the liquid level of the solvent and is in contact with the metal particles; the ionization chamber has an inlet for the solvent to enter and exit and an outlet.
Further, the inlet is arranged at the lower part of the ionization chamber, the outlet is arranged at the upper part of the ionization chamber, and the ionization chamber further comprises a separation plate which separates the metal particles from the inlet; the division plate is made of non-metal materials.
Furthermore, the electrode is rectangular and is made of titanium metal; the metal particles are spherical or irregular, the metal particles are made of aluminum and/or iron, and the particle size of the metal particles is 2-30 mm; the ionization chamber is of a non-metal material, the isolation plate is made of PVC, and the solvent is water.
Further, the power supply is a direct current power supply, and the voltage is not less than 24V.
Further, the outlet of the ionization chamber is communicated with a flocculation sedimentation tank, and the flocculation sedimentation tank is communicated with an immersed ultrafiltration tank.
Further, a first-level mud valve and a second-level mud valve are respectively installed at the bottoms of the flocculation sedimentation tank and the immersed super filter, and the top of the immersed super filter is communicated with a water supply network through a water suction pump.
Compared with the prior art, the invention has the following beneficial effects:
1. the specific surface area of the nano particles is large, and the physical adsorption defluorination capability is strong.
2. The nano particles are prepared by plasma discharge, the surface of the nano particles has higher Zeta potential (positive electricity), fluorine ions (negative electricity) in water can be captured, and the fluorine removal capability of chemical reaction is strong.
3. The ionization chamber can continuously perform plasma discharge, can realize continuous preparation of nano particles, and continuously remove fluorine without interruption.
4. The yield of the nano particles can be controlled by controlling parameters such as voltage, current, discharge period and the like, and the problem of standard exceeding of aluminum ions does not exist.
5. The ionization chamber has small volume, less equipment investment, small occupied area and wide application range.
Drawings
FIG. 1 is a schematic diagram of the ionization chamber structure of the present invention;
FIG. 2 is a side view of FIG. 1;
FIG. 3 is a schematic view of a water purification apparatus according to the present invention;
FIG. 4 is a schematic Zeta potential diagram;
FIG. 5 is a schematic diagram of a nanoparticle structure;
in the figure: 1. the device comprises a power supply, 2, electrodes, 3, an ionization chamber, 3.1, an inlet, 3.2, an outlet, 3.3, a partition board, 4, a solvent, 5, metal particles, 6, a flocculation sedimentation tank, 7, an immersed super filter, 8, a first-level mud valve, 9, a second-level mud valve, 10 and a water pump.
Detailed Description
The invention is further described below with reference to the accompanying drawings.
The preparation method of the plasma defluorination solution comprises the following specific steps:
1) adding aluminum balls with the particle size of 2-5mm into the ionization chamber 3, wherein the aluminum balls are in contact with the electrode 2, and the stack height of the aluminum balls is 1/5-2/3 of the height of the ionization chamber 3;
2) water is injected into the ionization chamber 3 through the inlet 3.1 until the water covers the aluminum ball stack and overflows out of the outlet 3.2;
3) the power supply 1 is switched on and supplies a periodic discharge voltage to the electrode 2;
4) and adjusting the discharge voltage of the power supply 1 to ensure that the discharge current is not less than 5A, thus obtaining the plasma defluorination solution.
Further, the discharge voltage is: 5000V; the discharge current is: 1000-1500A; the discharge period is as follows: 1000 HZ.
Further, the defluorination solution comprises nanoparticles made of aluminum or iron and obtained by plasma discharge, and the diameter of the nanoparticles is 20-100 nm; the Zeta potential of the nano-particles is 10 mkm-3(ii) a The specific surface area of the nanoparticles is 1000m2/g。
The water purification process comprises the following steps:
1) preparing defluorination nanoparticles by adopting plasma;
2) raw water is subjected to defluorination by reaction with nano particles and then is introduced into a flocculation sedimentation tank for flocculation sedimentation;
3) introducing the water subjected to flocculation precipitation into an immersed ultrafiltration tank for ultrafiltration filtration, and intercepting suspended matters in the water to enable the turbidity of the treated water to be less than 0.1 NTU;
4) finally, the water enters a clean water tank or a water supply pipe network after being sterilized.
As shown in fig. 1, fig. 2 and fig. 3, the present invention also provides a water purification apparatus, comprising a nanoparticle defluorination reactor, a flocculation sedimentation tank 6 and an immersion ultrafiltration tank 7;
the nano particle defluorination reactor comprises a power supply 1, an electrode 1, an ionization chamber 3, a solvent 4 and metal particles 5; the solvent 4 is positioned in the ionization chamber 3, and the metal particles 5 are submerged below the liquid level of the solvent 4; one end of the electrode 2 is electrically connected with a power supply 1, and the other end of the electrode 2 is inserted below the liquid level of the solvent 4 and is in contact with the metal particles 5; the ionization chamber 3 has an inlet 3.1 for the solvent and an outlet 3.2.
Further, the inlet 3.1 is arranged at the lower part of the ionization chamber 3, the outlet 3.2 is arranged at the upper part of the ionization chamber 3, and the device also comprises a separation plate 3.3, wherein the separation plate 3.3 separates the metal particles 5 from the inlet 3.1; the isolation plate 3.3 is made of non-metal materials.
Further, the electrode 2 is rectangular, and the material of the electrode is titanium metal; the metal particles 5 are spherical or irregular, the metal particles 5 are made of aluminum and/or iron, and the particle size of the metal particles is 2-30 mm; ionization chamber 3 is non-metallic material, division board 3.3's material is PVC, the solvent is water.
Further, the power supply 1 is a direct current power supply, and the voltage is not less than 24V.
Further, an outlet 3.2 of the ionization chamber 3 is communicated with a flocculation sedimentation tank 6, and the flocculation sedimentation tank 6 is communicated with an immersed ultrafiltration tank 7.
Further, a first-level sludge discharge valve 8 and a second-level sludge discharge valve 9 are respectively installed at the bottoms of the flocculation sedimentation tank 6 and the immersed super filter 7, and the top of the immersed super filter 7 is communicated with a water supply network through a water suction pump 10.
The invention adopts aluminum balls and (or) iron balls as raw materials to be put into an ionization chamber, when water passes through the ionization chamber, plasma discharge is carried out on the water body, and nano particles are prepared instantly; the fluorine ions in the water are removed by utilizing the characteristics of large specific surface area and high Zeta potential of the nano particles.
The nano-particles with the diameter of 20-100nm can be obtained by controlling the particle size, the shape, the discharge voltage and the discharge current of the aluminum balls and/or the iron balls, the nano-particles have very high specific surface area, and the adsorption capacity of the defluorination solution is greatly enhanced.
And the obtained nanoparticles are Al0,Al2+,Al3+Has extremely high chemical activity and can be mixed with F-Carrying out reaction; f in water-When ions are close to the nano particles, the nano particles can act on F in a space with the radius of action as high as 1000 times that of F in the space due to the action of opposite attraction of positive and negative ions-Ions are captured to the surface of the nanoparticles and a reaction occurs.
The above description is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments, and all technical solutions belonging to the idea of the present invention belong to the protection scope of the present invention. It should be noted that modifications and embellishments within the scope of the invention may occur to those skilled in the art without departing from the principle of the invention, and are considered to be within the scope of the invention.
Claims (10)
1. A preparation method of plasma defluorination solution is characterized by comprising the following steps:
1) adding aluminum balls with the particle size of 2-5mm into the ionization chamber (3), wherein the aluminum balls are in contact with the electrode (2), and the stack height of the aluminum balls is 1/5-2/3 of the height of the ionization chamber (3);
2) injecting water into the ionization chamber (3) through the inlet (3.1) until the water covers the aluminum ball stack and overflows out of the outlet (3.2);
3) the power supply (1) is switched on to provide periodic discharge voltage to the electrode (2);
4) and adjusting the discharge voltage of the power supply (1) to ensure that the discharge current is not less than 5A, thus obtaining the plasma defluorination solution.
2. The method according to claim 1, wherein the fluorine removal solution is a plasma fluoride removal solution,
the discharge voltage is: 5000V; the discharge current is: 1000-1500A; the discharge period is as follows: 1000 HZ.
3. The method according to claim 1, wherein the fluorine removal solution is a plasma fluoride removal solution,
the defluorination solution comprises nanoparticles made of aluminum or iron and obtained by plasma discharge, and the diameter of the nanoparticles is 20-100 nm; the Zeta potential of the nano-particles is 10 mkm-3(ii) a The specific surface area of the nanoparticles is 1000m2/g。
4. A water purification process is characterized by comprising the following steps:
1) preparing defluorination nanoparticles by adopting plasma;
2) raw water is subjected to defluorination by reaction with nano particles and then is introduced into a flocculation sedimentation tank for flocculation sedimentation;
3) introducing the water subjected to flocculation precipitation into an immersed ultrafiltration tank for ultrafiltration filtration, and intercepting suspended matters in the water to enable the turbidity of the treated water to be less than 0.1 NTU;
4) finally, the water enters a clean water tank or a water supply pipe network after being sterilized.
5. A water purifying device is characterized in that,
comprises a nano-particle defluorination reactor, a flocculation sedimentation tank (6) and an immersed super filter (7);
the nano-particle defluorination reactor comprises a power supply (1), an electrode (1), an ionization chamber (3), a solvent (4) and metal particles (5); the solvent (4) is positioned in the ionization chamber (3), and the metal particles (5) are submerged below the liquid level of the solvent (4); one end of the electrode (2) is electrically connected with a power supply (1), and the other end of the electrode (2) is inserted below the liquid level of the solvent (4) and is in contact with the metal particles (5); the ionization chamber (3) has an inlet (3.1) for the ingress and egress of solvent and an outlet (3.2).
6. A water purification apparatus according to claim 5,
the inlet (3.1) is arranged at the lower part of the ionization chamber (3), the outlet (3.2) is arranged at the upper part of the ionization chamber (3), and the ionization chamber further comprises a separation plate (3.3), and the separation plate (3.3) separates the metal particles (5) from the inlet (3.1); the isolation plate (3.3) is made of non-metal materials.
7. A water purification apparatus according to claim 5,
the electrode (2) is rectangular and is made of titanium metal; the metal particles (5) are spherical or irregular, the metal particles (5) are made of aluminum and/or iron, and the particle size of the metal particles is 2-30 mm; the ionization chamber (3) is made of a non-metal material, the isolation plate (3.3) is made of PVC, and the solvent is water.
8. The water purifying apparatus according to claim 7,
the power supply (1) is a direct current power supply, and the voltage is not less than 24V.
9. A water purification apparatus according to claim 5,
an outlet (3.2) of the ionization chamber (3) is communicated with a flocculation sedimentation tank (6), and the flocculation sedimentation tank (6) is communicated with an immersed super filter (7).
10. The water purifying apparatus of claim 9,
the bottom of flocculation sedimentation tank (6) and submergence formula surpass filtering pond (7) is installed one-level mud valve (8) and second grade mud valve (9) respectively, the top of submergence formula surpass filtering pond (7) is passed through suction pump (10) and is fed through with the water supply network.
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| CN201911004090.0A CN110803796A (en) | 2019-10-22 | 2019-10-22 | Preparation method of plasma defluorination solution, water purification process and equipment |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020037320A1 (en) * | 2000-06-14 | 2002-03-28 | Denes Ferencz S. | Method and apparatus for producing colloidal nanoparticles in a dense medium plasma |
| CN1653865A (en) * | 2002-05-08 | 2005-08-10 | 译民·托马斯·张 | Plasma formed in a fluid |
| CN102838199A (en) * | 2012-09-26 | 2012-12-26 | 河海大学 | Device and method for removing fluorine ions in groundwater |
| JP2016027184A (en) * | 2014-07-08 | 2016-02-18 | 株式会社Kri | Production method of metal nanoparticle dispersion, solution containing metal cluster, production method of the solution, coating film of the solution, and ascorbic acid sensor |
-
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- 2019-10-22 CN CN201911004090.0A patent/CN110803796A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020037320A1 (en) * | 2000-06-14 | 2002-03-28 | Denes Ferencz S. | Method and apparatus for producing colloidal nanoparticles in a dense medium plasma |
| CN1653865A (en) * | 2002-05-08 | 2005-08-10 | 译民·托马斯·张 | Plasma formed in a fluid |
| CN102838199A (en) * | 2012-09-26 | 2012-12-26 | 河海大学 | Device and method for removing fluorine ions in groundwater |
| JP2016027184A (en) * | 2014-07-08 | 2016-02-18 | 株式会社Kri | Production method of metal nanoparticle dispersion, solution containing metal cluster, production method of the solution, coating film of the solution, and ascorbic acid sensor |
Non-Patent Citations (1)
| Title |
|---|
| 中国硅酸盐学会, 中国科学技术出版社 * |
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