CN110736726A - Measuring device and measuring method for low-damage threshold defect of large-caliber fused quartz glass - Google Patents
Measuring device and measuring method for low-damage threshold defect of large-caliber fused quartz glass Download PDFInfo
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- 239000005350 fused silica glass Substances 0.000 title claims abstract description 64
- 230000007547 defect Effects 0.000 title claims abstract description 47
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 title claims abstract description 8
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- 238000005259 measurement Methods 0.000 claims abstract description 23
- 238000002189 fluorescence spectrum Methods 0.000 claims abstract description 12
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- 230000005284 excitation Effects 0.000 description 1
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- 239000005304 optical glass Substances 0.000 description 1
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Abstract
一种大口径熔石英元件低阈值缺陷的测量装置和测量方法,系统通过探测缺陷的荧光光谱,来识别大口径熔石英元件上的低阈值缺陷。与现有普遍采用的光热弱吸收测量方法相比,本发明可以把低阈值缺陷的测量速度提高上万倍。
A measuring device and method for measuring low-threshold defects of large-diameter fused silica elements. The system identifies low-threshold defects on large-diameter fused silica elements by detecting the fluorescence spectrum of the defects. Compared with the existing commonly used photothermal weak absorption measurement method, the invention can increase the measurement speed of low-threshold defects by tens of thousands of times.
Description
技术领域technical field
本发明涉及光学元件缺陷的测量领域,特别是一种大口径熔石英玻璃低损伤阈值缺陷的测量装置和测量方法。The invention relates to the field of optical element defect measurement, in particular to a measurement device and measurement method for large-diameter fused silica glass with low damage threshold defects.
背景技术Background technique
大口径熔石英光学玻璃是强激光装置中光学元器件的重要基石,其表面和亚表面加工质量直接影响并决定强激光系统的综合性能指标(如峰值功率、光束质量等)。目前主流的熔石英加工工艺往往会在熔石英玻璃的表面和亚表面上产生各种类型的缺陷,其中低损伤阈值缺陷会对强激光装置中的光学元器件造成致命的破坏,从而严重制约强激光系统各项性能的提升,因此大口径熔石英加工表面低阈值缺陷的准确测量具有非常重要的意义。Large-diameter fused silica optical glass is an important cornerstone of optical components in high-power laser devices, and its surface and sub-surface processing quality directly affects and determines the comprehensive performance indicators of high-power laser systems (such as peak power, beam quality, etc.). The current mainstream fused silica processing technology often produces various types of defects on the surface and sub-surface of fused silica glass, among which low damage threshold defects can cause fatal damage to optical components in high-power laser devices, thus seriously restricting the The performance of the laser system is improved, so the accurate measurement of low-threshold defects on the surface of large-diameter fused silica is of great significance.
现有检测小口径熔石英玻璃加工表面低阈值缺陷的常用方法是光热弱吸收测量法,但是由于该方法单次测量的区域面积太小(≈10×10μm),对于大口径熔石英玻璃(如400×400mm),如果通过二维逐点扫描的测量方式,光热弱吸收测量法需要大约50000多个小时才能完成大口径熔石英玻璃全口径内低阈值缺陷的测量,这显然是不切合实际的。有鉴于此,目前生产的大口径熔石英元件往往没有缺陷检测这一工艺流程,因而在强激光装置中,存在着很多安全隐患。The existing common method for detecting low-threshold defects on the surface of small-diameter fused silica glass is photothermal weak absorption measurement. Such as 400×400mm), if the measurement method is two-dimensional point-by-point scanning, the photothermal weak absorption measurement method needs about 50,000 hours to complete the measurement of low-threshold defects in the full aperture of large-diameter fused silica glass, which is obviously inappropriate. actual. In view of this, the large-diameter fused silica components currently produced often do not have the process of defect detection, so there are many potential safety hazards in strong laser devices.
发明内容SUMMARY OF THE INVENTION
为了解决现有方法测量低阈值缺陷速度非常慢的缺点,本发明提供一种大口径熔石英元件低阈值缺陷的测量装置和测量方法,该装置可以把现有低阈值缺陷的测量速度提高上万倍。In order to solve the shortcoming of the low-threshold defect measurement speed of the existing method, the present invention provides a measurement device and a measurement method for the low-threshold defect of a large-diameter fused silica element, which can increase the measurement speed of the existing low-threshold defect by tens of thousands times.
本发明的技术解决方案如下:The technical solution of the present invention is as follows:
一种大口径熔石英玻璃低阈值缺陷的测量装置,其特点在于包括二维机械扫描机构、激光光源、滤光片、光谱仪、步进电机控制器、数据采集器、激光器控制器和计算机,所述的二维机械扫描机构用于放置待测的大口径熔石英玻璃,所述的激光光源发出的激光照射在所述的待测的大口径熔石英玻璃的表面上,在所述的待测大口径熔石英玻璃表面缺陷发出的荧光方向,依次是所述的滤光片和光谱仪,该光谱仪的输出端与所述的计算机的输入端相连,所述的计算机的输出端分别经所述的步进电机控制器与所述的二维机械扫描机构的控制端相连,经所述的激光器控制器与所述的激光光源的控制端相连。A low-threshold defect measurement device for large-diameter fused silica glass, which is characterized in that it includes a two-dimensional mechanical scanning mechanism, a laser light source, an optical filter, a spectrometer, a stepping motor controller, a data collector, a laser controller and a computer. The two-dimensional mechanical scanning mechanism is used to place the large-diameter fused silica glass to be measured, and the laser light emitted by the laser light source is irradiated on the surface of the large-diameter fused silica glass to be measured. The direction of the fluorescence emitted by the surface defects of the large-diameter fused silica glass is the filter and the spectrometer in sequence, the output end of the spectrometer is connected with the input end of the computer, and the output end of the computer is respectively The stepping motor controller is connected with the control end of the two-dimensional mechanical scanning mechanism, and is connected with the control end of the laser light source through the laser controller.
激光器用于为测量系统提供激发光源,光谱仪用于检测低阈值缺陷的荧光光谱(通过前期的实验研究,我们发现熔石英玻璃的表面上,几乎所有的低阈值缺陷都有特定波长位置处的荧光峰,因此通过测量荧光光谱,可以反过来判断熔石英样品表面是否存在低阈值缺陷),滤光片用于过滤掉其他波长的环境杂散光,二维扫描机构用于在两个维度上扫描待测的大口径熔石英玻璃,步进电机控制器用于控制二维扫描机构的机械运动,激光器控制器用于操控激光器,数据采集器用于采集探测器输出的电信号,计算机用于实现硬件控制、数据采集、数据存储等自动化测控功能。The laser is used to provide the excitation light source for the measurement system, and the spectrometer is used to detect the fluorescence spectrum of low-threshold defects (through previous experimental studies, we found that on the surface of fused silica glass, almost all low-threshold defects have fluorescence at specific wavelength positions) Therefore, by measuring the fluorescence spectrum, it can be judged in turn whether there are low-threshold defects on the surface of the fused silica sample), the filter is used to filter out ambient stray light of other wavelengths, and the two-dimensional scanning mechanism is used to scan in two dimensions. The large-diameter fused silica glass is measured, the stepping motor controller is used to control the mechanical movement of the two-dimensional scanning mechanism, the laser controller is used to control the laser, the data collector is used to collect the electrical signals output by the detector, and the computer is used to realize hardware control, data Automatic measurement and control functions such as acquisition and data storage.
利用上述大口径熔石英玻璃低阈值缺陷的测量装置,对大口径熔石英玻璃低阈值缺陷的测量方法,主要的测量步骤如下:Using the above-mentioned measuring device for low-threshold defects of large-diameter fused silica glass, the main measurement steps are as follows:
1)将待测的大口径熔石英玻璃放置于所述的二维机械扫描机构上,所述的激光光源输出的激光照射在所述待测大口径熔石英玻璃的表面上,调整所述的光谱仪和滤光片对准所述待测大口径熔石英玻璃表面缺陷发出的荧光;1) The large-diameter fused silica glass to be measured is placed on the two-dimensional mechanical scanning mechanism, and the laser output from the laser light source is irradiated on the surface of the large-diameter fused silica glass to be measured. The spectrometer and the filter are aligned with the fluorescence emitted by the surface defects of the large-diameter fused silica glass to be tested;
2)启动所述的计算机,在所述的计算机的控制下,所述的步进电机控制器控制所述的二维机械扫描机构,将所述的待测大口径熔石英玻璃移动到起始位置,所述的激光光源输出的激光照射在所述待测大口径熔石英玻璃表面的起始位置,并令该位置为n=1,所述待测大口径熔石英玻璃激光扫描照射的位置共N个;2) Start the computer, under the control of the computer, the stepping motor controller controls the two-dimensional mechanical scanning mechanism, and moves the large-diameter fused silica glass to be measured to the starting point. position, the laser output from the laser light source is irradiated on the starting position of the surface of the large-diameter fused silica glass to be measured, and let this position be n=1, the position of the laser scanning irradiation of the large-diameter fused silica glass to be measured A total of N;
3)在所述的计算机的控制下,所述的激光光源3输出的激光照射在所述待测大口径熔石英玻璃表面的位置n,所述的光谱仪测量所述待测大口径熔石英玻璃表面位置n发出的荧光光谱,并输入所述的计算机;3) Under the control of the computer, the laser light output from the
4)所述的计算机判断该位置n是否存在低阈值缺陷对应的荧光光谱,若存在荧光光谱,即表示该位置存在低阈值缺陷,计算机记录该位置n的坐标;4) The computer judges whether there is a fluorescence spectrum corresponding to a low-threshold defect at the position n, if there is a fluorescence spectrum, it means that the position has a low-threshold defect, and the computer records the coordinates of the position n;
5)所述的计算机通过所述的步进电机控制器控制所述的二维机械扫描机构1,将所述待测大口径熔石英玻璃移动到位置n+1,并令n=n+1,当n≤N时,返回步骤3);当n>N时,进入下一步;5) The computer controls the two-dimensional
6)所述的计算机输出所有低阈值缺陷的坐标,即在全口径范围内实现大口径熔石英玻璃低阈值缺陷的测量和坐标定位,测量结束。6) The computer outputs the coordinates of all low-threshold defects, that is, the measurement and coordinate positioning of the low-threshold defects of large-diameter fused silica glass are realized within the full-diameter range, and the measurement ends.
本发明的优点如下:The advantages of the present invention are as follows:
与现有光热弱吸收测量方法(单次测量区域的大小约为10×10μm)相比,本发明的单次测量区域可达到5×5mm,因而测量速度可以提高上万倍。Compared with the existing photothermal weak absorption measurement method (the size of the single measurement area is about 10×10 μm), the single measurement area of the present invention can reach 5×5 mm, so the measurement speed can be increased by tens of thousands of times.
附图说明Description of drawings
图1是大口径熔石英玻璃低阈值缺陷的测量装置结构示意图。FIG. 1 is a schematic structural diagram of a measuring device for low-threshold defects of large-diameter fused silica glass.
图2是激光二维扫描轨迹示意图。FIG. 2 is a schematic diagram of a two-dimensional laser scanning trajectory.
具体实施方式Detailed ways
下面结合附图和实施例对本发明进行详细说明,但不应以此限制本发明的保护范围。The present invention will be described in detail below with reference to the accompanying drawings and embodiments, but the protection scope of the present invention should not be limited by this.
实施例1:Example 1:
先请参阅图1,图1是本发明大口径熔石英玻璃低阈值缺陷的测量装置结构示意图。由图可见,本发明大口径熔石英玻璃低阈值缺陷的测量装置,其特点在于包括二维机械扫描机构1、激光光源3、滤光片4、光谱仪5、步进电机控制器6、数据采集器7、激光器控制器8和计算机9,所述的二维机械扫描机构1用于放置待测的大口径熔石英玻璃2,所述的激光光源3发出的激光照射在所述的待测的大口径熔石英玻璃2的表面上,在所述的待测的大口径熔石英玻璃2表面缺陷发出的荧光方向,依次是所述的滤光片4和光谱仪5,该光谱仪5的输出端与所述的计算机9的输入端相连,所述的计算机9的输出端分别经所述的步进电机控制器6与所述的二维机械扫描机构1的控制端相连,经所述的激光器控制器8与所述的激光光源3的控制端相连。Please refer to FIG. 1 first. FIG. 1 is a schematic structural diagram of a device for measuring low-threshold defects of large-diameter fused silica glass according to the present invention. As can be seen from the figure, the measuring device for the low-threshold defect of large-diameter fused silica glass according to the present invention is characterized in that it includes a two-dimensional
所述的激光光源3发出的激光照射在所述的待测的大口径熔石英玻璃2的表面上,所述待测的大口径熔石英玻璃2表面上的缺陷发出的荧光经过滤光片4的作用后被光谱仪5所收集。The laser light emitted by the
所述的激光器控制器8用于控制所述的激光光源3。The
所述的数据采集器7用于采集所述光谱仪5输出的信号。The
所述的步进电机控制器6控制所述的二维机械扫描机构1。The stepping
本测量装置的工作过程如下:The working process of this measuring device is as follows:
1)将待测的大口径熔石英玻璃2放置于所述的二维机械扫描机构1上,所述的激光光源3输出的激光照射在所述待测大口径熔石英玻璃2的表面上,调整所述的光谱仪5和滤光片4对准所述待测大口径熔石英玻璃2表面缺陷发出的荧光;1) placing the large-diameter fused
2)启动所述的计算机9,在所述的计算机9的控制下,所述的步进电机控制器6控制所述的二维机械扫描机构1,将所述的待测大口径熔石英玻璃2移动到起始位置,所述的激光光源3输出的激光照射在所述待测大口径熔石英玻璃2表面的起始位置,并令该位置为n=1,所述待测大口径熔石英玻璃2激光扫描照射的位置共N个;2) Start the
3)在所述的计算机9的控制下,所述的激光光源3输出的激光照射在所述待测大口径熔石英玻璃2表面的位置n,所述的光谱仪5测量所述待测大口径熔石英玻璃2表面位置n发出的荧光光谱,并输入所述的计算机9;3) Under the control of the
4)所述的计算机9判断该位置n是否存在低阈值缺陷对应的荧光光谱,若存在荧光光谱,即表示该位置存在低阈值缺陷,计算机9记录该位置n的坐标;4) The
5)所述的计算机9通过所述的步进电机控制器6控制所述的二维机械扫描机构1,将所述待测大口径熔石英玻璃2移动到位置n+1,并令n=n+1,当n≤N时,返回步骤3);当n>N时,进入下一步;5) The
6)所述的计算机9输出所有低阈值缺陷的坐标,即在全口径范围内实现大口径熔石英玻璃低阈值缺陷的测量和坐标定位,测量结束。6) The
实验表明,本发明可以把低阈值缺陷的测量速度提高上万倍。Experiments show that the invention can increase the measurement speed of low-threshold defects by tens of thousands of times.
以上所述的具体实施例,对本发明的目的、技术方案和有益效果进行了进一步详细说明,应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限制本发明,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The specific embodiments described above further describe the purpose, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above-mentioned specific embodiments are only specific embodiments of the present invention, and are not intended to limit the present invention. Within the spirit and principle of the present invention, any modifications, equivalent replacements, improvements, etc. made should be included within the protection scope of the present invention.
Claims (2)
- The measuring device for the low threshold defect of large-caliber fused silica glass is characterized by comprising a two-dimensional mechanical scanning mechanism (1), a laser light source (3), a light filter (4), a spectrometer (5), a stepping motor controller (6), a data acquisition unit (7), a laser controller (8) and a computer (9), wherein the two-dimensional mechanical scanning mechanism (1) is used for placing the large-caliber fused silica glass (2) to be measured, laser emitted by the laser light source (3) irradiates on the surface of the large-caliber fused silica glass (2) to be measured, the fluorescence direction emitted by the surface defect of the large-caliber fused silica glass (2) to be measured is sequentially the light filter (4) and the spectrometer (5), the output end of the spectrometer (5) is connected with the input end of the computer (9), and the output end of the computer (9) is respectively connected with the control end of the two-dimensional mechanical scanning mechanism (1) through the stepping motor controller (6), and the laser controller (8) is connected with the control end of the laser light source (3).
- 2. The method for measuring the large-caliber fused silica glass low-threshold defect by using the measuring device of the large-caliber fused silica glass low-threshold defect as claimed in claim 1, characterized by comprising the following steps:1) placing the large-caliber fused quartz glass (2) to be detected on the two-dimensional mechanical scanning mechanism (1), irradiating the laser output by the laser source (3) on the surface of the large-caliber fused quartz glass (2) to be detected, and adjusting the spectrometer (5) and the optical filter (4) to align to the fluorescence emitted by the surface defect of the large-caliber fused quartz glass (2) to be detected;2) starting the computer (9), wherein under the control of the computer (9), the stepping motor controller (6) controls the two-dimensional mechanical scanning mechanism (1) to move the large-caliber fused quartz glass (2) to be detected to an initial position, laser output by the laser source (3) irradiates the initial position on the surface of the large-caliber fused quartz glass (2) to be detected, the position is N-1, and the number of positions irradiated by the large-caliber fused quartz glass (2) to be detected in a laser scanning mode is N;3) under the control of the computer (9), the laser output by the laser source (3) irradiates the position n on the surface of the large-caliber fused quartz glass (2) to be measured, and the spectrometer (5) measures the fluorescence spectrum emitted by the position n on the surface of the large-caliber fused quartz glass (2) to be measured and inputs the fluorescence spectrum into the computer (9);4) the computer (9) judges whether the position n has a fluorescence spectrum corresponding to the low threshold defect, if so, the computer (9) records the coordinate of the position n, namely the position has the low threshold defect;5) the computer (9) controls the two-dimensional mechanical scanning mechanism (1) through the stepping motor controller (6), moves the large-caliber fused quartz glass (2) to be detected to a position N +1, and enables N to be N +1, and when N is less than or equal to N, the step returns to the step 3), and when N is greater than N, the step goes to the step ;6) and the computer (9) outputs the coordinates of all the low-threshold defects, namely the measurement and the coordinate positioning of the large-caliber fused quartz glass low-threshold defects are realized in the full-caliber range, and the measurement is finished.
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CN202010025626.3A CN111007052A (en) | 2019-10-10 | 2020-01-10 | Measuring device and measuring method for low-damage threshold defect of large-caliber fused quartz glass |
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CN117705827A (en) * | 2024-02-06 | 2024-03-15 | 上海强华实业股份有限公司 | Method for optimizing quartz glass defect detection based on multivariable fine burning energy consumption |
CN119086516A (en) * | 2024-09-02 | 2024-12-06 | 北京子牛亦东科技有限公司 | A device for detecting defects in quartz glass |
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DE10331589B3 (en) * | 2003-07-09 | 2005-03-24 | Schott Ag | Method for the quantitative determination of the pulse laser resistance of synthetic quartz glass |
WO2006092938A1 (en) * | 2005-03-01 | 2006-09-08 | Nikon Corporation | Synthetic quartz glass molded product, molding method therefor and method for inspecting synthetic quartz glass molded product |
US8993984B2 (en) * | 2012-04-12 | 2015-03-31 | The United States Of America As Represented By The Secretary Of The Air Force | All fiber coupled ultraviolet planar laser induced fluorescence detection system |
CN102680447A (en) * | 2012-05-31 | 2012-09-19 | 中国科学院上海光学精密机械研究所 | Device for detecting defects and laser induced damages of optical material |
CN204855406U (en) * | 2015-08-20 | 2015-12-09 | 中国工程物理研究院激光聚变研究中心 | Fused quartz sublayer microdefect detecting device |
CN106066318A (en) * | 2016-06-14 | 2016-11-02 | 中国科学院长春光学精密机械与物理研究所 | A kind of method and device of on-line testing optical element laser damage |
CN106596491A (en) * | 2016-12-23 | 2017-04-26 | 中国科学院光电技术研究所 | Device and method for measuring hydroxyl content in ultraviolet-level fused quartz material |
CN106770128B (en) * | 2017-01-11 | 2023-06-27 | 中国工程物理研究院激光聚变研究中心 | Detection device and detection method for rapidly detecting subsurface defects of optical element in three dimensions |
CN109060816B (en) * | 2018-06-13 | 2021-09-07 | 中国科学院上海光学精密机械研究所 | Device and method for rapid detection of in-body defects in large-diameter components |
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CN117705827A (en) * | 2024-02-06 | 2024-03-15 | 上海强华实业股份有限公司 | Method for optimizing quartz glass defect detection based on multivariable fine burning energy consumption |
CN117705827B (en) * | 2024-02-06 | 2024-04-12 | 上海强华实业股份有限公司 | Method for optimizing quartz glass defect detection based on multivariable fine burning energy consumption |
CN119086516A (en) * | 2024-09-02 | 2024-12-06 | 北京子牛亦东科技有限公司 | A device for detecting defects in quartz glass |
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