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CN110732330A - Preparation method of WO3/Ag/AgCl photocatalytic thin film material - Google Patents

Preparation method of WO3/Ag/AgCl photocatalytic thin film material Download PDF

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CN110732330A
CN110732330A CN201810803851.8A CN201810803851A CN110732330A CN 110732330 A CN110732330 A CN 110732330A CN 201810803851 A CN201810803851 A CN 201810803851A CN 110732330 A CN110732330 A CN 110732330A
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姜炜
方宏标
郝嘎子
胡玉冰
吕翔
耿雪其
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Abstract

本发明公开了一种WO3/Ag/AgCl光催化薄膜材料的制备方法。所述方法采用钨酸为前驱体,双氧水为溶剂,聚乙烯醇为粘合剂,将三者互溶成浆,通过旋涂与高温处理技术,在玻璃基底表面制备WO3薄膜,再将WO3薄膜材料依次反复浸泡等浓度的NaCl和AgNO3溶液,经干燥后得到WO3/AgCl薄膜,最后将薄膜经光照得到WO3/Ag/AgCl光催化薄膜材料。本发明方法制备的WO3/Ag/AgCl薄膜材料可以克服传统粉末材料难以分离回收的缺点,重复性好,且制备工艺简单,成本低廉,具有较稳定的光催化性能,有望应用在杀菌、气体传感器等领域。

Figure 201810803851

The invention discloses a preparation method of a WO 3 /Ag/AgCl photocatalytic film material. The method uses tungstic acid as a precursor, hydrogen peroxide as a solvent, and polyvinyl alcohol as a binder to dissolve the three into a slurry, prepare a WO 3 film on the surface of a glass substrate by spin coating and high temperature treatment technology, and then mix WO 3 The film material was repeatedly soaked in equal concentrations of NaCl and AgNO 3 solutions, and dried to obtain a WO 3 /AgCl film. Finally, the film was exposed to light to obtain a WO 3 /Ag/AgCl photocatalytic film material. The WO 3 /Ag/AgCl thin film material prepared by the method of the invention can overcome the disadvantage that traditional powder materials are difficult to separate and recycle, has good repeatability, simple preparation process, low cost, relatively stable photocatalytic performance, and is expected to be applied in sterilization, gas sensors, etc.

Figure 201810803851

Description

WO3/Ag/AgCl光催化薄膜材料的制备方法Preparation method of WO3/Ag/AgCl photocatalytic thin film material

技术领域technical field

本发明属于光催化薄膜复合材料合成领域,具体涉及一种WO3/Ag/AgCl光催化薄膜材料的制备方法。The invention belongs to the field of photocatalytic thin film composite material synthesis, in particular to a preparation method of a WO 3 /Ag/AgCl photocatalytic thin film material.

背景技术Background technique

水中污染物主要来源于造纸业和纺织业中的废弃染料排放,光催化技术是降解水中有机污染物的一个比较有前途且有效的方法。诸如TiO2、ZnO、SnO2、WO3、Bi2O3等半导体都被广泛用于光催化降解水中的染料。Pollutants in water mainly come from waste dyes discharged from paper and textile industries. Photocatalytic technology is a promising and effective method to degrade organic pollutants in water. Semiconductors such as TiO 2 , ZnO, SnO 2 , WO 3 , Bi 2 O 3 are widely used for photocatalytic degradation of dyes in water.

WO3的带隙宽度比较低,是2.4-2.8eV,且有比较高的价带(+3.1-3.2eV),使其氧化电势较高,能够吸收太阳光中的蓝光。由于其优异的光电性能以及良好的化学稳定性与热稳定性等,在光催化剂、气体传感器、光致变色以及电催化等领域都有广泛的应用。然而,由于WO3的导带位置较低,所以其有较差的光生空穴与电子分离的能力。因此,需要通过改性的方法来提高的WO3的光催化性能。The band gap width of WO 3 is relatively low, 2.4-2.8 eV, and has a relatively high valence band (+3.1-3.2 eV), which makes its oxidation potential high and can absorb blue light in sunlight. Due to its excellent optoelectronic properties and good chemical stability and thermal stability, it has a wide range of applications in the fields of photocatalysts, gas sensors, photochromic and electrocatalysis. However, WO 3 has a poor ability to separate photogenerated holes from electrons due to its lower conduction band position. Therefore, it is necessary to improve the photocatalytic performance of WO 3 by means of modification.

Ag/AgCl由于其能够吸收可见光,其优异的的性能使得Ag/AgCl是一种很好的能与其他半导体相结合作用从而提高光催化剂的稳定性、光催化活性和可重复性等性能。Due to its ability to absorb visible light, Ag/AgCl has excellent properties that make Ag/AgCl a good combination with other semiconductors to improve the stability, photocatalytic activity and repeatability of photocatalysts.

Bowen Ma等(Applied Catalysis B Environmental,2012,123-124(30):193-199.)在煅烧条件下通过两步法制备了花状结构的Ag-AgCl/WO3空心球。由于其独特的空心球结构,提高了入射光的利用率,使其光催化性能得到大大的提高,其光催化效果在半小时内能将对氯苯酚降解完全。Qingyong Li等(Journal of Energy Chemistry(2017).)使用水热法在超声辅助的方式下以地热水为氯元素来源制备出了Ag/AgCl/WO3纳米片光催化剂,得到的催化剂具有良好的可见光催化性能,在可见光照射下能对对氨基苯甲酸有效降解。Bowen Ma et al. (Applied Catalysis B Environmental, 2012, 123-124(30): 193-199.) prepared Ag-AgCl/WO 3 hollow spheres with flower-like structure by a two-step method under calcination conditions. Due to its unique hollow sphere structure, the utilization rate of incident light is improved, and its photocatalytic performance is greatly improved, and its photocatalytic effect can completely degrade p-chlorophenol within half an hour. Qingyong Li et al. (Journal of Energy Chemistry (2017).) prepared Ag /AgCl/WO nanosheet photocatalysts by using the hydrothermal method under the ultrasonic-assisted method with geothermal water as the source of chlorine element, and the obtained catalyst had good It can effectively degrade p-aminobenzoic acid under visible light irradiation.

然而,上述的催化剂都是粉末状的,降解后需要耗费大量的时间和能源将其从催化相中分离出来,同时也不利于其重复使用,使得成本升高。However, the above catalysts are all in powder form, and it takes a lot of time and energy to separate them from the catalytic phase after being degraded, and at the same time, it is not conducive to their repeated use, which increases the cost.

发明内容SUMMARY OF THE INVENTION

本发明的目的在于提供一种WO3/Ag/AgCl光催化薄膜材料的制备方法。The purpose of the present invention is to provide a preparation method of WO 3 /Ag/AgCl photocatalytic thin film material.

实现本发明目的的技术解决方案如下:The technical solution that realizes the object of the present invention is as follows:

WO3/Ag/AgCl光催化薄膜材料的制备方法,采用钨酸为前驱体,双氧水为溶剂,聚乙烯醇为粘合剂,通过旋涂工艺和高温煅烧的方法在玻璃基底上制备一层WO3膜,然后通过依次反复浸泡在NaCl和AgNO3溶液中,得到WO3/AgCl膜,最后光照,得到具有光催化性能的WO3/Ag/AgCl薄膜,具体步骤如下:A preparation method of WO 3 /Ag/AgCl photocatalytic film material, using tungstic acid as a precursor, hydrogen peroxide as a solvent, and polyvinyl alcohol as a binder, a layer of WO is prepared on a glass substrate by a spin coating process and a high-temperature calcination method 3 films, and then repeatedly immersed in NaCl and AgNO 3 solutions to obtain a WO 3 /AgCl film, and finally illuminated to obtain a WO 3 /Ag/AgCl film with photocatalytic properties. The specific steps are as follows:

步骤1),将聚乙烯醇和钨酸溶于双氧水中,得到的混合溶液涂覆在洁净的玻璃基底表面,以500~800rpm的转速旋涂,干燥,再于550℃~600℃下煅烧4~6h,自然冷却涂覆有WO3的玻璃基底;Step 1), dissolving polyvinyl alcohol and tungstic acid in hydrogen peroxide, the obtained mixed solution is coated on the surface of a clean glass substrate, spin-coated at a speed of 500-800 rpm, dried, and then calcined at 550-600 ° C for 4- 6h, naturally cooling the glass substrate coated with WO 3 ;

步骤2),将涂覆有WO3的玻璃基底依次浸泡在浓度相同的、浓度为0.02M~0.05M的NaCl和AgNO3溶液中30~60min,浸泡完全,光照,得到WO3/Ag/AgCl光催化薄膜材料。Step 2), soak the glass substrate coated with WO 3 in NaCl and AgNO 3 solutions with the same concentration and a concentration of 0.02M-0.05M in turn for 30-60min, soak completely, and illuminate to obtain WO 3 /Ag/AgCl Photocatalytic thin film materials.

进一步的,步骤1)中,所述的双氧水与钨酸的摩尔比为5~8:1,钨酸与聚乙烯醇的质量比为2~3:1。Further, in step 1), the molar ratio of the hydrogen peroxide to the tungstic acid is 5-8:1, and the mass ratio of the tungstic acid to the polyvinyl alcohol is 2-3:1.

进一步的,步骤1)中,所述的旋涂时间为8~15s。Further, in step 1), the spin coating time is 8-15s.

进一步的,步骤1)中,所述的干燥温度为60~80℃,干燥时间为1~2h。Further, in step 1), the drying temperature is 60-80° C., and the drying time is 1-2 h.

进一步的,步骤1)中,所述的煅烧时升温速度为3~5℃/min。Further, in step 1), the heating rate during the calcination is 3-5°C/min.

进一步的,步骤2)中,所述的光照时间为5~10min。Further, in step 2), the illumination time is 5-10 min.

本发明相对于现有技术相比,具有以下优点:Compared with the prior art, the present invention has the following advantages:

(1)本发明制备的WO3/Ag/AgCl薄膜均匀,透明性好稳定性高,且易于催化相分离,便于回收重复使用;(1) The WO 3 /Ag/AgCl thin film prepared by the present invention is uniform, has good transparency and high stability, is easy to catalyze phase separation, and is convenient for recycling and reuse;

(2)本发明制备的WO3/Ag/AgCl薄膜在可见光照射下对有机染料具有良好的降解性能:制备的WO3/Ag/AgCl薄膜的最高降解效果为3小时可以降解98%,浓度为5mol/L的甲基橙(MO)和2.5小时可以降解95%浓度为5mol/L的罗丹明B(RhB)。(2) The WO 3 /Ag/AgCl film prepared by the present invention has good degradation performance to organic dyes under visible light irradiation: the highest degradation effect of the prepared WO 3 /Ag/AgCl film is 98% in 3 hours, and the concentration is 5mol/L methyl orange (MO) and 2.5 hours can degrade 95% of 5mol/L Rhodamine B (RhB).

附图说明Description of drawings

图1是WO3薄膜以及不同浓度下的WO3/Ag/AgCl薄膜材料的光学图。Figure 1 is the optical image of WO 3 thin film and WO 3 /Ag/AgCl thin film material at different concentrations.

图2是WO3薄膜(a和b)以及1-WO3/Ag/AgCl薄膜(c和d)、2-WO3/Ag/AgCl薄膜(e和f)、3-WO3/Ag/AgCl薄膜(g和h)的SEM图(其中:1-WO3/Ag/AgCl、2-WO3/Ag/AgCl和3-WO3/Ag/AgCl前面的数字由小到大分别代表实验用的AgNO3和NaCl溶液浓度从低到高,下同)。Figure 2 shows WO 3 films (a and b) and 1-WO 3 /Ag/AgCl films (c and d), 2-WO 3 /Ag/AgCl films (e and f), 3-WO 3 /Ag/AgCl films SEM images of thin films (g and h) (wherein: 1-WO 3 /Ag/AgCl, 2-WO 3 /Ag/AgCl and 3-WO 3 /Ag/AgCl, the numbers in front of them from small to large represent the experimental ones, respectively AgNO3 and NaCl solution concentration from low to high, the same below).

图3是WO3薄膜、1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜的XRD图谱。3 is the XRD patterns of the WO 3 thin film, the 1-WO 3 /Ag/AgCl thin film, the 2-WO 3 /Ag/AgCl thin film, and the 3-WO 3 /Ag/AgCl thin film.

图4是WO3薄膜以及三种WO3/Ag/AgCl薄膜的紫外-可见吸收光谱图。FIG. 4 is the UV-Vis absorption spectra of WO 3 thin film and three WO 3 /Ag/AgCl thin films.

图5是不同催化剂在可见光照射下催化降解甲基橙(a)及罗丹明B(b)的降解图。Figure 5 is the degradation diagram of different catalysts for the catalytic degradation of methyl orange (a) and rhodamine B (b) under visible light irradiation.

图6是可见光下照射下3-WO3/Ag/AgCl薄膜催化甲基橙(a)和罗丹明B(b)的重复性实验结果图;五次重复实验前3-WO3/Ag/AgCl薄膜的SEM图(c)和五次重复实验后3-WO3/Ag/AgCl薄膜的SEM图(d)。Fig. 6 is a graph showing the results of the repeatability experiment of 3-WO 3 /Ag/AgCl thin film catalyzing methyl orange (a) and rhodamine B (b) under visible light irradiation; 3-WO 3 /Ag/AgCl before five repeated experiments SEM image (c) of the film and SEM image (d) of the 3-WO 3 /Ag/AgCl film after five repeated experiments.

具体实施方式Detailed ways

下面的实施例和附图对本发明作进一步详述。The following examples and figures further illustrate the present invention.

实施例1Example 1

称量10.0g钨酸和5.0g聚乙烯醇加入到不断搅拌的20mL的双氧水中,持续搅拌大约24h直至钨酸和聚乙烯醇完全溶解。将所制备的溶液涂覆在洁净的硅酸盐玻璃表面,用匀胶机以800rmp的转速旋涂8s,然后在80℃下干燥1h,然后置于马弗炉中在550℃下煅烧4h后自然冷却。10.0 g of tungstic acid and 5.0 g of polyvinyl alcohol were weighed and added to 20 mL of hydrogen peroxide under constant stirring, and the stirring was continued for about 24 hours until the tungstic acid and polyvinyl alcohol were completely dissolved. The prepared solution was coated on the surface of clean silicate glass, spin-coated at 800rmp for 8s with a spin coater, then dried at 80°C for 1h, and then placed in a muffle furnace and calcined at 550°C for 4h. Cool naturally.

制备的WO3薄膜的光学实物图如图1a所示,可以看出玻璃表面附着有一层近乎透明的薄膜;所制备的WO3薄膜不同放大倍数的SEM图如图2(a和b),可以看出有一层WO3晶体颗粒均匀的附着在玻璃的表面。The optical physical image of the prepared WO 3 film is shown in Figure 1a, and it can be seen that a nearly transparent film is attached to the glass surface ; It can be seen that there is a layer of WO 3 crystal particles uniformly attached to the surface of the glass.

实施例2Example 2

称量15.0g钨酸和5.0g聚乙烯醇加入到不断搅拌的20mL的30%双氧水中,持续搅拌大约24h直至钨酸和聚乙烯醇完全溶解。将所制备的溶液涂覆在洁净的硅酸盐玻璃表面,用匀胶机以700rpm的转速旋涂10s,然后在80℃下干燥1h,然后置于马弗炉中在550℃下煅烧6h后自然冷却。将所制备的WO3薄膜依次浸泡在浓度分别为0.005M、0.01M、0.02M的NaCl和AgNO3溶液中30min,分别重复该步骤3次,然后将其在300W氙灯下光照10min,即可得到1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜样品。15.0 g of tungstic acid and 5.0 g of polyvinyl alcohol were weighed and added to 20 mL of 30% hydrogen peroxide with constant stirring, and the stirring was continued for about 24 hours until the tungstic acid and polyvinyl alcohol were completely dissolved. The prepared solution was coated on the surface of clean silicate glass, spin-coated at 700 rpm for 10 s with a glue spinner, then dried at 80 °C for 1 h, and then placed in a muffle furnace and calcined at 550 °C for 6 h. Cool naturally. The prepared WO 3 films were immersed in NaCl and AgNO 3 solutions with concentrations of 0.005M, 0.01M, and 0.02M in turn for 30 min, and the steps were repeated 3 times respectively, and then irradiated under a 300W xenon lamp for 10 min to obtain 1-WO 3 /Ag/AgCl thin film, 2-WO 3 /Ag/AgCl thin film, 3-WO 3 /Ag/AgCl thin film samples.

制备的1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜样品的光学实物图如图1(b,c,d),可以看出随着NaCl和AgNO3溶液浓度的增加,玻璃表面的膜的颜色越来越深,说明光照还原出来的单质银越来越多;所制备的1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜样品的SEM如图2(c、d、e、f、g、h)所示,可以看出WO3、Ag/AgCl都均匀的分布在玻璃的表面,且随着NaCl和AgNO3溶液浓度的增加,膜表面的Ag/AgCl的量也越来越多。The optical images of the prepared 1-WO 3 /Ag/AgCl thin film, 2-WO 3 /Ag/AgCl thin film, and 3-WO 3 /Ag/AgCl thin film samples are shown in Figure 1(b,c,d), it can be seen that With the increase of the concentration of NaCl and AgNO 3 solution, the color of the film on the glass surface became darker and darker, indicating that more and more elemental silver was reduced by light; the prepared 1-WO 3 /Ag/AgCl thin film, 2-WO The SEM of 3 /Ag/AgCl thin film and 3-WO 3 /Ag/AgCl thin film samples are shown in Figure 2 (c, d, e, f, g, h), it can be seen that WO 3 and Ag/AgCl are all uniform Distributed on the surface of the glass, and with the increase of the concentration of NaCl and AgNO 3 solutions, the amount of Ag/AgCl on the film surface also increased.

实施例3Example 3

称量10.0g钨酸和5.0g聚乙烯醇加入到不断搅拌的30mL的30%双氧水中,持续搅拌大约24h直至钨酸和聚乙烯醇完全溶解。将所制备的溶液涂覆在洁净的硅酸盐玻璃表面,用匀胶机以500rpm的转速旋涂15s,然后在80℃下干燥1h,然后置于马弗炉中在580℃下煅烧5h后自然冷却。将所制备的WO3薄膜依次浸泡在浓度分别为0.005M、0.01M、0.02M的NaCl和AgNO3溶液中30min,分别重复该步骤3次,然后将其在300W氙灯下光照10min,即可得到1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜样品。10.0 g of tungstic acid and 5.0 g of polyvinyl alcohol were weighed and added to 30 mL of 30% hydrogen peroxide with constant stirring, and the stirring was continued for about 24 hours until the tungstic acid and polyvinyl alcohol were completely dissolved. The prepared solution was coated on the surface of clean silicate glass, spin-coated at 500 rpm for 15 s with a glue spinner, then dried at 80 °C for 1 h, and then placed in a muffle furnace and calcined at 580 °C for 5 h. Cool naturally. The prepared WO 3 films were immersed in NaCl and AgNO 3 solutions with concentrations of 0.005M, 0.01M, and 0.02M in turn for 30 min, and the steps were repeated 3 times respectively, and then irradiated under a 300W xenon lamp for 10 min to obtain 1-WO 3 /Ag/AgCl thin film, 2-WO 3 /Ag/AgCl thin film, 3-WO 3 /Ag/AgCl thin film samples.

制备的WO3薄膜以及1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜的XRD图谱如图3,从图中可以清晰的看出WO3和AgCl所对应的峰,而Ag所对应的峰比较不明显,可能的原因是Ag的量比较少,且随着随着NaCl和AgNO3溶液浓度的增加,AgCl的峰越来越强,而WO3的峰越来越弱。The XRD patterns of the prepared WO 3 thin film, 1-WO 3 /Ag/AgCl thin film, 2-WO 3 /Ag/AgCl thin film, and 3-WO 3 /Ag/AgCl thin film are shown in Figure 3, which can be clearly seen from the figure The peaks corresponding to WO 3 and AgCl, while the peaks corresponding to Ag are relatively insignificant. The possible reason is that the amount of Ag is relatively small, and with the increase of the concentration of NaCl and AgNO 3 solutions, the peaks of AgCl become stronger and stronger. , while the peak of WO 3 is getting weaker and weaker.

实施例4Example 4

称量15.0g钨酸和5.0g聚乙烯醇加入到不断搅拌的30mL的30%双氧水中,持续搅拌大约24h直至钨酸和聚乙烯醇完全溶解。将所制备的溶液涂覆在洁净的硅酸盐玻璃表面,用匀胶机以700rpm的转速旋涂8s,然后在80℃下干燥1h,然后置于马弗炉中在600℃下煅烧4h后自然冷却。将所制备的WO3薄膜依次浸泡在浓度分别为0.005M、0.01M、0.02M的NaCl和AgNO3溶液中60min,分别重复该步骤3次,然后将其在300W氙灯下光照5min,即可得到1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜样品。15.0 g of tungstic acid and 5.0 g of polyvinyl alcohol were weighed and added to 30 mL of 30% hydrogen peroxide under constant stirring, and the stirring was continued for about 24 hours until the tungstic acid and polyvinyl alcohol were completely dissolved. The prepared solution was coated on the surface of clean silicate glass, spin-coated at 700 rpm for 8 s with a glue spinner, then dried at 80 °C for 1 h, and then placed in a muffle furnace and calcined at 600 °C for 4 h. Cool naturally. The prepared WO 3 film was immersed in NaCl and AgNO 3 solutions with concentrations of 0.005M, 0.01M, and 0.02M in turn for 60 min, and the steps were repeated 3 times, and then irradiated under a 300W xenon lamp for 5 min to obtain 1-WO 3 /Ag/AgCl thin film, 2-WO 3 /Ag/AgCl thin film, 3-WO 3 /Ag/AgCl thin film samples.

制备的WO3薄膜以及1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜的紫外光谱图如图4所示,从图中可以看出在WO3薄膜在负载Ag/AgCl其对光的吸收范围增大了,可以吸收可见光,且从图中可以得出WO3的禁带宽度为2.61eV。The UV spectra of the prepared WO 3 thin films and 1-WO 3 /Ag/AgCl thin films, 2-WO 3 /Ag/AgCl thin films, and 3-WO 3 /Ag/AgCl thin films are shown in Figure 4, and it can be seen from the figure The reason is that the absorption range of WO 3 film increases when Ag/AgCl is loaded, and it can absorb visible light, and it can be concluded from the figure that the forbidden band width of WO 3 is 2.61eV.

实施例5:Example 5:

称量10.0g钨酸和5.0g聚乙烯醇加入到不断搅拌的30mL的30%双氧水中,持续搅拌大约24h直至钨酸和聚乙烯醇完全溶解。将所制备的溶液涂覆在洁净的硅酸盐玻璃表面,用匀胶机以800rpm的转速旋涂10s,然后在80℃下干燥1h,然后置于马弗炉中在600℃下煅烧6h后自然冷却。将所制备的WO3薄膜依次浸泡在浓度分别为0.005M、0.02M、0.05M的NaCl和AgNO3溶液中30min,分别重复该步骤3次,然后将其在300W氙灯下光照5min,即可得到1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜样品。10.0 g of tungstic acid and 5.0 g of polyvinyl alcohol were weighed and added to 30 mL of 30% hydrogen peroxide with constant stirring, and the stirring was continued for about 24 hours until the tungstic acid and polyvinyl alcohol were completely dissolved. The prepared solution was coated on the surface of clean silicate glass, spin-coated at 800 rpm for 10 s with a glue spinner, then dried at 80 °C for 1 h, and then placed in a muffle furnace and calcined at 600 °C for 6 h. Cool naturally. The prepared WO 3 film was immersed in NaCl and AgNO 3 solutions with concentrations of 0.005M, 0.02M, and 0.05M in turn for 30 min, and the steps were repeated 3 times, and then irradiated under a 300W xenon lamp for 5 min to obtain 1-WO 3 /Ag/AgCl thin film, 2-WO 3 /Ag/AgCl thin film, 3-WO 3 /Ag/AgCl thin film samples.

制备的WO3薄膜以及1-WO3/Ag/AgCl薄膜、2-WO3/Ag/AgCl薄膜、3-WO3/Ag/AgCl薄膜对甲基橙(MO)和罗丹明B(RhB)在可见光下的降解效果如图5所示,从图中可以看出,改性后的光催化剂的催化性能得到了极大的改善,且3-WO3/Ag/AgCl薄膜样品的催化性能最好,其对MO和RhBd降解率分别能达到98%和95%,而1-WO3/Ag/AgCl薄膜样品的降解效率仅为79%和81%,说明0.005M的NaCl和AgNO3溶液条件下制备的光催化剂效果并不理想。且显示了反应过程中的电子移动过程,光照条件下,WO3的导带上的光生电子会和Ag纳米粒子上的空穴结合,同时Ag纳米粒子上的等离子体电子会进入AgCl的导带。图6(a和b)分别是3-WO3/Ag/AgCl薄膜样品重复5次降解甲基橙(MO)和罗丹明B(RhB)的降解效率图,从图中可以看出,第五次降解的效果和第一次降解的效果几乎差别不大,说明催化剂的可重复性很好。图6(c和d)分别是3-WO3/Ag/AgCl薄膜样品重复实验前后的SEM图,可以看出重复前后玻璃表面的膜几乎没什么变化,进一步体现了所制备的光催化剂的稳定性很好。The prepared WO 3 films, as well as 1-WO 3 /Ag/AgCl films, 2-WO 3 /Ag/AgCl films, and 3-WO 3 /Ag/AgCl films were highly sensitive to methyl orange (MO) and rhodamine B (RhB). The degradation effect under visible light is shown in Figure 5. It can be seen from the figure that the catalytic performance of the modified photocatalyst has been greatly improved, and the 3-WO 3 /Ag/AgCl thin film sample has the best catalytic performance , the degradation rate of MO and RhBd can reach 98% and 95%, respectively, while the degradation efficiency of 1-WO 3 /Ag/AgCl film sample is only 79% and 81%, indicating that under the condition of 0.005M NaCl and AgNO 3 solutions The effect of the prepared photocatalyst is not ideal. And it shows the electron movement process during the reaction process. Under illumination conditions, the photogenerated electrons on the conduction band of WO 3 will combine with the holes on the Ag nanoparticles, and the plasmonic electrons on the Ag nanoparticles will enter the conduction band of AgCl. . Figure 6(a and b) are the degradation efficiencies of methyl orange (MO) and rhodamine B (RhB) for the 3-WO 3 /Ag/AgCl thin film sample repeated five times, respectively. It can be seen from the figure that the fifth The effect of the second degradation is almost the same as that of the first degradation, indicating that the catalyst has good repeatability. Figure 6(c and d) are the SEM images of the 3-WO 3 /Ag/AgCl thin film sample before and after repeated experiments, respectively. It can be seen that there is almost no change in the film on the glass surface before and after the repeated experiments, which further reflects the stability of the prepared photocatalyst. very good.

Claims (6)

1.WO3The preparation method of the/Ag/AgCl photocatalytic film material is characterized by comprising the following specific steps:
step 1), dissolving polyvinyl alcohol and tungstic acid in hydrogen peroxide to obtain a mixed solution, coating the mixed solution on the surface of a clean glass substrate, spin-coating at the rotating speed of 500-800 rpm, drying, calcining at the temperature of 550-600 ℃ for 4-6 h, and naturally cooling and coating WO3The glass substrate of (1);
step 2) will be coated with WO3The glass substrate is sequentially soaked in NaCl and AgNO with the same concentration and the concentration of 0.02M to 0.05M3Soaking in the solution for 30-60 min, and illuminating to obtain WO3the/Ag/AgCl photocatalysis film material.
2. The preparation method according to claim 1, wherein in the step 1), the molar ratio of hydrogen peroxide to tungstic acid is 5-8: 1, the mass ratio of the tungstic acid to the polyvinyl alcohol is 2-3: 1.
3. the preparation method according to claim 1, wherein in the step 1), the spin coating time is 8-15 s.
4. The preparation method according to claim 1, wherein in the step 1), the drying temperature is 60-80 ℃ and the drying time is 1-2 h.
5. The preparation method according to claim 1, wherein in the step 1), the temperature rise rate during the calcination is 3 to 5 ℃/min.
6. The preparation method according to claim 1, wherein in the step 2), the illumination time is 5-10 min.
CN201810803851.8A 2018-07-20 2018-07-20 Preparation method of WO3/Ag/AgCl photocatalytic thin film material Pending CN110732330A (en)

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CN115469493A (en) * 2022-10-20 2022-12-13 九江学院 A high modulation ratio tungsten trioxide electrochromic thin film and its preparation method
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CN111450858A (en) * 2020-04-11 2020-07-28 天津工业大学 A kind of preparation method of composite photocatalyst Ag/AgCl@Co3O4 and composite photocatalyst prepared thereby
CN111514882A (en) * 2020-05-11 2020-08-11 福州大学 Ag-AgCl/tungsten trioxide/graphite-like phase carbon nitride ternary composite photocatalyst and preparation method and application thereof
CN111514882B (en) * 2020-05-11 2023-02-21 福州大学 Ag-AgCl/tungsten trioxide/graphite-like phase carbon nitride ternary composite photocatalyst and preparation method and application thereof
CN115469493A (en) * 2022-10-20 2022-12-13 九江学院 A high modulation ratio tungsten trioxide electrochromic thin film and its preparation method
CN118079910A (en) * 2024-04-09 2024-05-28 临沂大学 KNbO ₃/Ag@WO ₃ composite photocatalyst and preparation method and application thereof

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