CN110718630B - Method for improving performance of ferroelectric film capacitor - Google Patents
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Abstract
本发明涉及一种改善铁电薄膜电容器性能的方法,在采用正探针尖端或负探针尖端向铁电薄膜电容器中的薄膜施加电压以读写铁电薄膜电容器的过程中,将尖端输入的脉冲长度缩至2ms以下,且/或在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持一段时间,以改善铁电薄膜电容器性能。本发明的一种改善铁电薄膜电容器性能的方法,简单易操作且成本较低,解决了现有技术中采用正探针尖端输入电压时铁电薄膜电容器耐疲劳性能较差和读写速度较慢的问题,同时解决了采用负探针尖端输入电压时铁电薄膜电容器读写速度有待进一步提高的问题,极具推广价值。
The invention relates to a method for improving the performance of a ferroelectric film capacitor. During the process of applying a voltage to the film in the ferroelectric film capacitor by using a positive probe tip or a negative probe tip to read and write the ferroelectric film capacitor, the length of the pulse input by the tip is reduced to less than 2ms, and/or after the ferroelectric film capacitor is polarized by voltage, the voltage input by the tip is adjusted to 0V and maintained for a period of time, so as to improve the performance of the ferroelectric film capacitor. A method for improving the performance of a ferroelectric film capacitor according to the present invention is simple, easy to operate and low in cost, and solves the problems in the prior art that the ferroelectric film capacitor has poor fatigue resistance and slow reading and writing speed when a positive probe tip input voltage is used, and at the same time solves the problem that the reading and writing speed of a ferroelectric film capacitor needs to be further improved when using a negative probe tip input voltage, which is of great promotion value.
Description
技术领域technical field
本发明属于电子器件技术领域,涉及一种改善铁电薄膜电容器性能的方法。The invention belongs to the technical field of electronic devices and relates to a method for improving the performance of ferroelectric film capacitors.
背景技术Background technique
电容器是电子设备中广泛使用的电子元件之一,在集成电路中有着不可替代的作用。铁电薄膜电容器作为一种特殊的电容器也被大量使用。随着电子信息技术的迅速发展,对于电容器器件的性能提出了更高的要求,其中,读写速度是衡量电容器器件性能好坏的重要标准。当用正探针尖端向铁电薄膜电容器输入电压时,器件点电极或者线电极下面的铁电薄膜区域扩散,造成极化面积增加,这些正探针尖端电荷所致的区域极化效应造成电容器“寄生层”产生,导致铁电薄膜电容器的读写时间增加,读写速度较慢,而且由于“寄生层”的出现,使本来就很薄的铁电薄膜的有效厚度减小,从而使剩余极化下降,同时形成的缺陷在以后的极化反转时会影响耐疲劳性能,这些显然不利于铁电薄膜电容器的应用,需要找到合适的方法避免这些问题的出现,以达到改善铁电薄膜电容器性能的目的。Capacitors are one of the widely used electronic components in electronic equipment and play an irreplaceable role in integrated circuits. Ferroelectric film capacitors are also widely used as a special capacitor. With the rapid development of electronic information technology, higher requirements are put forward for the performance of capacitor devices. Among them, the reading and writing speed is an important standard to measure the performance of capacitor devices. When a positive probe tip is used to input a voltage to a ferroelectric film capacitor, the ferroelectric film area under the point electrode or line electrode of the device diffuses, resulting in an increase in the polarization area. The regional polarization effect caused by the charge on the tip of the positive probe causes the "parasitic layer" of the capacitor to be generated, resulting in an increase in the reading and writing time of the ferroelectric film capacitor, and a slow reading and writing speed. Moreover, due to the appearance of the "parasitic layer", the effective thickness of the ferroelectric film that is already very thin is reduced, thereby reducing the remanent polarization. For the application of electric film capacitors, it is necessary to find suitable methods to avoid these problems, so as to achieve the purpose of improving the performance of ferroelectric film capacitors.
博士论文“聚(偏氟乙烯-三氟乙烯)铁电纳米薄膜性能及电活性界面层作用机理研究”通过在铁电薄膜和电极层之间引入界面层(如电子导体PEDOT/PSSH和离子导体PVPA)以提高铁电薄膜的性能以及读写速度,起到了一定效果,但是因为需要在铁电薄膜与电极层之间引入界面层,相对来说比较复杂,也增加了操作工序和成本;“聚(偏氟乙烯-三氟乙烯)纳米薄膜极化反转与疲劳特性”(物理学报,2015,64(16).)通过退火处理与成膜过程中对湿度的控制来实现铁电性能的提高,效果也比较有限。The doctoral dissertation "Study on the performance of poly(vinylidene fluoride-trifluoroethylene) ferroelectric nano-film and the mechanism of electroactive interface layer" introduced an interface layer (such as electronic conductor PEDOT/PSSH and ion conductor PVPA) between the ferroelectric film and the electrode layer to improve the performance of the ferroelectric film and the reading and writing speed, which had a certain effect, but because the interface layer needs to be introduced between the ferroelectric film and the electrode layer, it is relatively complicated and increases the operation process and cost; "Polarization reversal and fatigue characteristics of poly(vinylidene fluoride-trifluoroethylene) nano-film" ( Acta Physica Sinica, 2015, 64(16).) The improvement of ferroelectric properties can be achieved by controlling the humidity during annealing treatment and film formation, but the effect is relatively limited.
专利CN98814030.6公开了一种铁电电容器与半导体器件,该电容器由上电极、铁电薄膜和下电极构成,所述铁电薄膜是含有某种金属元素的钙钛矿型氧化物,而所述上电极和下电极包含由所说的金属元素和贵重金属组成的金属间氧化物,该专利通过改变电极结构和使用无机铁电薄膜材料来避免电压输入时在铁电薄膜和界面层中的“寄生层”,从而使铁电电容器铁电薄膜极化性能提高,反转速度加快,读写速度也得到提升,但是需要使用特定的电极材料,在材料选用、装置制备方面都比较苛刻;专利CN201710362281.9公开了一种高读出电流的非挥发铁电存储器及其操作方法,该专利通过增加导电畴壁周长以提高非挥发性铁电存储器导电畴壁的读出电流,也是通过将电极结构进行改进,增加分支电极来进行操作,实验条件相对复杂;专利CN201610557208.2针对铁电薄膜作为阻变存储器的介质层材料存在开关比较小的问题,提供一种可以调控开关比的铁电阻变存储器,通过在铁电薄膜材料制备过程中控制其厚度,调节铁电材料与底电极材料界面的铁电畴钉扎层与薄膜内铁电畴可翻转层的比例,从而实现铁电阻变器件开关比的增大,从而增加读写速度,但是制备过程中需要对铁电薄膜的厚度进行调节,操作起来有一定难度;专利CN201610098138.9公开了一种非易失性铁电存储器及其制备方法和读/写操作方法,该铁电存储器包括铁电薄膜层及其表面刻蚀铁电存储单元以及设置在铁电存储单元两边的左右读写电极层,可以实现以大电流方式对所存储的电畴逻辑信息进行非破坏性快速读出,但是装置比较复杂,操作起来也有一定难度;专利CN201480015331.0公开了一种具有改善的疲劳和击穿性能的铁电电容器。Patent CN98814030.6 discloses a ferroelectric capacitor and a semiconductor device. The capacitor is composed of an upper electrode, a ferroelectric film and a lower electrode. The ferroelectric film is a perovskite oxide containing a certain metal element, while the upper electrode and the lower electrode contain an intermetallic oxide composed of the metal element and a precious metal. This patent avoids the "parasitic layer" in the ferroelectric film and interface layer during voltage input by changing the electrode structure and using inorganic ferroelectric film materials, thereby improving the polarization performance of the ferroelectric film of the ferroelectric capacitor. The reverse speed is accelerated, and the reading and writing speed is also improved, but specific electrode materials are required, and the material selection and device preparation are relatively harsh; patent CN201710362281.9 discloses a non-volatile ferroelectric memory with high readout current and its operation method. The patent improves the readout current of the conductive domain wall of the non-volatile ferroelectric memory by increasing the perimeter of the conductive domain wall. It also improves the electrode structure and adds branch electrodes to operate. The experimental conditions are relatively complicated; patent CN20161055720 8.2 Aiming at the problem that ferroelectric thin film is used as the dielectric layer material of resistive variable memory, there is a relatively small switching ratio, and a ferroelectric resistive variable memory that can control the switching ratio is provided. By controlling the thickness of the ferroelectric thin film material during the preparation process, the ferroelectric domain pinning layer at the interface between the ferroelectric material and the bottom electrode material is adjusted. 38.9 discloses a non-volatile ferroelectric memory and its preparation method and read/write operation method. The ferroelectric memory includes a ferroelectric thin film layer and its surface etched ferroelectric memory unit and left and right read and write electrode layers arranged on both sides of the ferroelectric memory unit. It can realize non-destructive and fast readout of the stored electric domain logic information in a large current mode, but the device is relatively complicated and it is difficult to operate; patent CN201480015331.0 discloses a ferroelectric capacitor with improved fatigue and breakdown performance.
另外,采用负探针尖端输入电压时读写速度虽然相对已经很快,但是仍然有必要进一步提高。In addition, although the reading and writing speed is relatively fast when the input voltage of the negative probe tip is used, it still needs to be further improved.
因此,研究一种简单高效、成本低廉的方法来改善铁电薄膜电容器性能,尤其是改善耐疲劳性能和提高读写速度,具有十分重要的意义。Therefore, it is of great significance to study a simple, efficient and low-cost method to improve the performance of ferroelectric film capacitors, especially to improve fatigue resistance and increase read and write speed.
发明内容Contents of the invention
本发明的目的之一是解决现有技术中采用正探针尖端输入电压时铁电薄膜电容器耐疲劳性能较差和读写速度较慢的问题,目的之二是解决采用负探针尖端输入电压时铁电薄膜电容器读写速度有待进一步提高的问题,提供一种改善铁电薄膜电容器性能的方法。One of the purposes of the present invention is to solve the problems in the prior art that the ferroelectric film capacitor has poor fatigue resistance and slow reading and writing speed when using a positive probe tip input voltage. The second purpose is to solve the problem that the reading and writing speed of the ferroelectric film capacitor needs to be further improved when using a negative probe tip input voltage, and provide a method for improving the performance of the ferroelectric film capacitor.
为达到上述目的,本发明采用的方案如下:In order to achieve the above object, the scheme adopted by the present invention is as follows:
一种改善铁电薄膜电容器性能的方法,在采用正探针尖端或负探针尖端向铁电薄膜电容器中的薄膜施加电压以读写铁电薄膜电容器的过程中,将尖端输入的脉冲长度缩至2ms以下(现有技术中尖端输入的脉冲长度一般为10~20ms),且/或在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持一段时间(现有技术一般不调至0V,没有对施加的电压进行调整,而是通过调节薄膜厚度或者改变电极的材料和结构等手段进行改善),以改善铁电薄膜电容器性能。A method for improving the performance of a ferroelectric film capacitor. During the process of applying a voltage to the film in the ferroelectric film capacitor by using a positive probe tip or a negative probe tip to read and write the ferroelectric film capacitor, the pulse length input by the tip is reduced to less than 2ms (in the prior art, the pulse length input by the tip is generally 10-20ms), and/or after the ferroelectric film capacitor is polarized by voltage, the voltage input by the tip is adjusted to 0V and then maintained for a period of time (in the prior art, it is generally not adjusted to 0V, and the applied voltage is not adjusted, but by adjusting the thickness of the film or changing the electrode. Improvement of materials and structures) to improve the performance of ferroelectric film capacitors.
在正尖端电压输入后,正尖端电荷所致的区域极化效应造成电容器“寄生层”产生,导致铁电薄膜电容器的读写时间增加,“寄生层”产生还会使本来就很薄的铁电薄膜的有效厚度减小,从而使剩余极化下降,同时形成的缺陷在以后的极化反转时会影响耐疲劳性能;现有技术大多通过对铁电薄膜电容器的结构或铁电薄膜的材料进行改变来改善电容器的性能,存在工序复杂、操作不易、成本高昂、改善效果不佳等诸多问题。After the positive tip voltage is input, the regional polarization effect caused by the positive tip charge causes the formation of a “parasitic layer” of the capacitor, which increases the reading and writing time of the ferroelectric film capacitor. The generation of the “parasitic layer” also reduces the effective thickness of the ferroelectric film, which is already very thin, thereby reducing the remanent polarization. At the same time, the defects formed will affect the fatigue resistance when the polarization is reversed in the future. Most of the existing technologies improve the performance of the capacitor by changing the structure of the ferroelectric film capacitor or the material of the ferroelectric film. problem.
本发明无需对铁电薄膜的材料或电容器的结构做任何改变,仅仅改变了电压操作工艺条件,一种方案是将尖端输入的脉冲长度缩至2ms以下,由于在外场强度固定的情况下,陷阱电荷的运动速度是一定的,陷阱电荷运动的距离与时间呈正比关系,在极化反转完全的情况下,所加的外场的时间越短,则在一次极化反转过程中陷阱电荷运动的距离就越短,而脉冲长度与所加的外场的时间呈正比关系,因此脉冲长度缩短有利于减小陷阱电荷运动的距离;同时由于脉冲长度变化会改变由界面层高电场注入的电子的数量,进而影响产生的陷阱电荷的数量,脉冲长度与陷阱电荷的数量呈正比关系,因此脉冲长度缩短有利于减少陷阱电荷的数量;综上可知,脉冲长度的缩短同时减小了陷阱电荷运动的距离和陷阱电荷的数量,陷阱电荷运动的距离和陷阱电荷的数量的减小会使得陷阱电荷在电场作用下移动到界面处的数量减少,对表面极化的钉扎程度减小,进而改善了电容器的耐疲劳性能,电容器的耐疲劳性能改善会提高电容器的读写速度;The present invention does not need to make any changes to the material of the ferroelectric film or the structure of the capacitor, but only changes the voltage operation process conditions. One solution is to reduce the pulse length input by the tip to less than 2ms. Since the moving speed of the trapped charges is constant under the condition of a fixed external field strength, the moving distance of the trapped charges is proportional to the time. Therefore, the shortening of the pulse length is beneficial to reduce the moving distance of the trap charges; at the same time, the change of the pulse length will change the number of electrons injected by the high electric field of the interface layer, thereby affecting the amount of the generated trap charges. The degree of pinching is reduced, thereby improving the fatigue resistance of the capacitor, and the improvement of the fatigue resistance of the capacitor will increase the reading and writing speed of the capacitor;
另一种方案是在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持一段时间,这种操作的目的在于:保持一段时间,尖端会提供足够的补偿电荷去抵消正尖端输入或负尖端输入所带来的正电荷或负电荷,避免电极下面的铁电薄膜进一步极化,器件点电极或者线电极下面的铁电薄膜区域扩散面积减少,从而使得极化面积变小,有效避免了正探针/负探针尖端电荷所致的区域极化效应造成的电容器“寄生层”产生,从而降低了铁电薄膜电容器的读写时间,提高了铁电薄膜电容器的读写速度。此外,尖端提供的补偿电荷还会进入铁电畴附近,逐渐包围在绝缘体介质周围,使得由于频繁的极化反转产生的小铁电畴重新获得活力,进而继续参与反转进程,有效降低了去极化场,增加了剩余极化强度,提高了电容器的耐疲劳性能。Another solution is to adjust the tip input voltage to 0V after the ferroelectric film capacitor is polarized by voltage and keep it for a period of time. The purpose of this operation is: after a period of time, the tip will provide enough compensation charges to offset the positive or negative charges brought by the positive tip input or negative tip input, avoid further polarization of the ferroelectric film under the electrode, reduce the diffusion area of the ferroelectric film area under the device point electrode or line electrode, thereby making the polarized area smaller, effectively avoiding the "parasitic layer" of the capacitor caused by the regional polarization effect caused by the positive probe/negative probe tip charge. ", thereby reducing the read and write time of the ferroelectric film capacitor and improving the read and write speed of the ferroelectric film capacitor. In addition, the compensation charge provided by the tip will also enter the vicinity of the ferroelectric domain and gradually surround the insulator medium, so that the small ferroelectric domain generated due to frequent polarization reversals regains vitality, and then continues to participate in the reversal process, effectively reducing the depolarization field, increasing the residual polarization strength, and improving the fatigue resistance of the capacitor.
采用本发明的方法提高采用负探针尖端输入电压时铁电薄膜电容器读写速度的机理同采用正探针尖端输入电压时铁电薄膜电容器读写速度。采用本发明的方法,一方面可以在正尖端输入电压时改善铁电薄膜的耐疲劳性能和加快电容器读取速度,另一方面可以在负尖端输入电压时使原本就较快的读写速度进一步提高。The mechanism of improving the reading and writing speed of the ferroelectric film capacitor when the input voltage of the negative probe tip is adopted by the method of the invention is the same as that of the reading and writing speed of the ferroelectric film capacitor when the input voltage of the positive probe tip is adopted. By adopting the method of the invention, on the one hand, the fatigue resistance of the ferroelectric thin film can be improved and the reading speed of the capacitor can be accelerated when the voltage is input to the positive tip;
作为优选的方案:As a preferred solution:
如上所述的一种改善铁电薄膜电容器性能的方法,铁电薄膜电容器的读写速度小于1μs。According to the method for improving the performance of the ferroelectric film capacitor, the reading and writing speed of the ferroelectric film capacitor is less than 1 μs.
如上所述的一种改善铁电薄膜电容器性能的方法,正探针尖端或负探针尖端为压电力显微镜(PFM)的正探针尖端或负探针尖端。According to a method for improving the performance of a ferroelectric film capacitor, the positive probe tip or the negative probe tip is a positive probe tip or a negative probe tip of a piezoelectric force microscope (PFM).
如上所述的一种改善铁电薄膜电容器性能的方法,铁电薄膜电容器为有机铁电薄膜电容器或无机铁电薄膜电容器。According to the method for improving the performance of a ferroelectric film capacitor, the ferroelectric film capacitor is an organic ferroelectric film capacitor or an inorganic ferroelectric film capacitor.
如上所述的一种改善铁电薄膜电容器性能的方法,有机铁电薄膜电容器为P(VDF-TrFE)聚合物薄膜电容器、尼龙-11薄膜电容器、尼龙-7膜电容器或尼龙-5膜电容器。According to a method for improving the performance of ferroelectric film capacitors, the organic ferroelectric film capacitors are P(VDF-TrFE) polymer film capacitors, nylon-11 film capacitors, nylon-7 film capacitors or nylon-5 film capacitors.
如上所述的一种改善铁电薄膜电容器性能的方法,P(VDF-TrFE)聚合物薄膜电容器为由顶部电极、中间P(VDF-TrFE)聚合物薄膜和底部电极组成的“三明治”结构的电容器,P(VDF-TrFE)聚合物薄膜的厚度为60nm,底部电极为金属Ti。A method for improving the performance of a ferroelectric film capacitor as described above, the P (VDF-TrFE) polymer film capacitor is a capacitor of a "sandwich" structure consisting of a top electrode, an intermediate P (VDF-TrFE) polymer film and a bottom electrode, the thickness of the P (VDF-TrFE) polymer film is 60nm, and the bottom electrode is metal Ti.
如上所述的一种改善铁电薄膜电容器性能的方法,尖端输入的脉冲为单脉冲,尖端输入时将五次脉冲设定为一个周期。In the method for improving the performance of the ferroelectric film capacitor as described above, the pulse input by the tip is a single pulse, and five pulses are set as one cycle when the tip is input.
如上所述的一种改善铁电薄膜电容器性能的方法,尖端输入的脉冲长度为30μs~2ms,尖端输入的电压绝对值为8~10V,尖端输入的电压过高会击穿,过低极化不明显。As mentioned above, a method for improving the performance of ferroelectric film capacitors, the pulse length of the tip input is 30μs-2ms, the absolute value of the tip input voltage is 8-10V, the voltage of the tip input is too high to cause breakdown, and the polarization is not obvious if it is too low.
如上所述的一种改善铁电薄膜电容器性能的方法,一段时间为30~100s,一段时间即恢复等待时间,通过该时间设定,根据电子迁移速率,有效满足电荷补偿。As mentioned above, a method for improving the performance of ferroelectric film capacitors, a period of time is 30 to 100s, and a period of time is the recovery waiting time. By setting this time, according to the electron migration rate, the charge compensation can be effectively satisfied.
如上所述的一种改善铁电薄膜电容器性能的方法,尖端输出的电压绝对值为3.2~9V,尖端输出的扫描速度为0.4Hz,尖端输出的共振频率为5kHz。As mentioned above, a method for improving the performance of ferroelectric film capacitors, the absolute value of the tip output voltage is 3.2-9V, the scan speed of the tip output is 0.4Hz, and the resonance frequency of the tip output is 5kHz.
有益效果:Beneficial effect:
(1)本发明的一种改善铁电薄膜电容器性能的方法,简单易操作且成本较低;(1) A method for improving the performance of ferroelectric film capacitors of the present invention is simple and easy to operate and has low cost;
(2)本发明的一种改善铁电薄膜电容器性能的方法,对读写速度可以针对性的提高;(2) A method for improving the performance of ferroelectric film capacitors of the present invention can improve the read and write speed in a targeted manner;
(3)本发明的一种改善铁电薄膜电容器性能的方法,能有效改善铁电薄膜的耐疲劳性能。(3) A method for improving the performance of a ferroelectric thin film capacitor according to the present invention can effectively improve the fatigue resistance of the ferroelectric thin film.
附图说明Description of drawings
图1为正负尖端输入电压的实验测量条件示意图(图中“﹢”点代表正探针尖端输入点,“﹣”点代表负探针尖端输入点);Figure 1 is a schematic diagram of the experimental measurement conditions of the positive and negative tip input voltages (the "+" point in the figure represents the input point of the positive probe tip, and the "-" point represents the input point of the negative probe tip);
图2为实施例1未施加电压时P(VDF-TrFE)聚合物薄膜的PFM的形貌图(放大倍数为15000倍);Fig. 2 is the topography figure (magnification is 15000 times) of the PFM of P (VDF-TrFE) polymer thin film when embodiment 1 does not apply voltage;
图3为实施例1未施加电压时P(VDF-TrFE)聚合物薄膜的PFM的形貌图(放大倍数为5000倍);Fig. 3 is the topography figure (magnification is 5000 times) of the PFM of P (VDF-TrFE) polymer thin film when embodiment 1 does not apply voltage;
图4为实施例1施加正电压结束后的P(VDF-TrFE)聚合物薄膜的PFM的形貌图(放大倍数为5000倍);Fig. 4 is the topography figure (magnification is 5000 times) of the PFM of the P(VDF-TrFE) polymer film after embodiment 1 applies positive voltage;
图5为对比例1施加正电压结束后的P(VDF-TrFE)聚合物薄膜的PFM的形貌图(放大倍数为5000倍);Fig. 5 is the topography figure (magnification is 5000 times) of the PFM of the P (VDF-TrFE) polymer thin film after comparative example 1 applies positive voltage;
图6为实施例2未施加电压时P(VDF-TrFE)聚合物薄膜的PFM的形貌图(放大倍数为15000倍);Fig. 6 is the topography figure (magnification is 15000 times) of the PFM of P (VDF-TrFE) polymer thin film when embodiment 2 does not apply voltage;
图7为实施例2施加负电压结束后的P(VDF-TrFE)聚合物薄膜的PFM的形貌图(放大倍数为5000倍);Fig. 7 is the topography figure (magnification is 5000 times) of the PFM of the P (VDF-TrFE) polymer thin film after embodiment 2 applies negative voltage;
其中,Data type Z range是扫描器在z轴方向上的最大扫描范围,x、y轴方向可以在500nm~125μm之间变化,z轴方向一般为几十纳米,friction是探针与薄膜接触时的力,height为探针高度。Among them, Data type Z range is the maximum scanning range of the scanner in the z-axis direction, the x-axis and y-axis directions can vary between 500nm and 125μm, the z-axis direction is generally tens of nanometers, friction is the force when the probe is in contact with the film, and height is the height of the probe.
具体实施方式Detailed ways
下面结合具体实施方式,进一步阐述本发明。应理解,这些实施例仅用于说明本发明而不用于限制本发明的范围。此外应理解,在阅读了本发明讲授的内容之后,本领域技术人员可以对本发明作各种改动或修改,这些等价形式同样落于本申请所附权利要求书所限定的范围。The present invention will be further described below in combination with specific embodiments. It should be understood that these examples are only used to illustrate the present invention and are not intended to limit the scope of the present invention. In addition, it should be understood that after reading the teachings of the present invention, those skilled in the art can make various changes or modifications to the present invention, and these equivalent forms also fall within the scope defined by the appended claims of the present application.
实施例1Example 1
一种改善铁电薄膜电容器性能的方法,如图1所示,在采用压电力显微镜的正探针尖端向宽度为1.2um、厚度为60nm的P(VDF-TrFE)聚合物薄膜电容器(P(VDF-TrFE)聚合物薄膜电容器为由顶部电极、中间P(VDF-TrFE)聚合物薄膜和底部电极组成的“三明治”结构的电容器,底部电极为金属Ti)中的薄膜施加+8V的电压(输入三个正点,相邻两点间的距离为400nm)以读写铁电薄膜电容器的过程中,将尖端输入的脉冲(单脉冲)长度缩至2ms,且在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持30s,以改善铁电薄膜电容器性能。A method for improving the performance of ferroelectric film capacitors. As shown in Figure 1, the positive probe tip of a piezoelectric force microscope is used to apply a voltage of +8V to the film in a P(VDF-TrFE) polymer film capacitor with a width of 1.2um and a thickness of 60nm. 400nm) to read and write ferroelectric film capacitors, shorten the length of the pulse (single pulse) input by the tip to 2ms, and after the ferroelectric film capacitor is polarized by voltage, adjust the voltage input by the tip to 0V and keep it for 30s to improve the performance of the ferroelectric film capacitor.
未施加电压时薄膜的PFM的形貌图如图2和图3所示,施加正电压结束后薄膜的PFM形貌图如图4所示,铁电薄膜电容器的读写速度为0.70μs。The PFM topography of the film when no voltage is applied is shown in Figure 2 and Figure 3, and the PFM topography of the film after the positive voltage is applied is shown in Figure 4. The read and write speed of the ferroelectric film capacitor is 0.70μs.
对比例1Comparative example 1
一种铁电薄膜电容器的读写方法,铁电薄膜电容器同实施例1,读写过程基本同实施例1,不同之处在于:尖端输入的脉冲(单脉冲)长度为3ms,且在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持0s。A method for reading and writing a ferroelectric film capacitor. The ferroelectric film capacitor is the same as in embodiment 1, and the reading and writing process is basically the same as in embodiment 1. The difference is that the length of the pulse (single pulse) input by the tip is 3ms, and after the ferroelectric film capacitor is polarized by voltage, the voltage input by the tip is adjusted to 0V and then kept for 0s.
施加正电压结束后薄膜的PFM形貌图如图5所示,铁电薄膜电容器的读写速度为4μs。The PFM topography of the film after the positive voltage is applied is shown in Figure 5, and the reading and writing speed of the ferroelectric film capacitor is 4 μs.
将实施例1与对比例1对比可以看出,实施例1的铁电薄膜电容器的读写速度远大于对比例1,将图4和图5对比可以看出,图5中铁电薄膜的极化面积较大(点/线较大),图4中铁电薄膜的极化面积较小,主要原因是当探针正尖端输入电压时,P(VDF-TrFE)铁电薄膜表面上点迹面积较大,当用正尖端极化时,电子会从薄膜表面移动到尖端周围的大面积区域,正尖端输入时所带来的正电荷迁移率很小,实施例1由于及时补偿了这些电荷,避免了电极下面的铁电薄膜进一步极化,而对比例1由于未能及时补偿这些电荷,因而电极下面的铁电薄膜会进一步极化,在电镜下显示铁电薄膜的极化面积增加,极化面积的增加导致读写速度降低。Comparing Example 1 with Comparative Example 1, it can be seen that the reading and writing speed of the ferroelectric film capacitor of Example 1 is far greater than that of Comparative Example 1. As can be seen from the comparison of Fig. 4 and Fig. 5, the polarization area of the ferroelectric film in Fig. 5 is larger (dot/line is larger), and the polarization area of the ferroelectric film in Fig. 4 is smaller. The positive charge mobility brought by the input of the tip is very small. Because the charges are compensated in time in Example 1, the further polarization of the ferroelectric film under the electrode is avoided. However, in Comparative Example 1, because these charges are not compensated in time, the ferroelectric film under the electrode will be further polarized. The polarization area of the ferroelectric film increases under the electron microscope, and the increase in the polarization area leads to a decrease in read and write speed.
本发明通过使用相对较短的极化脉冲,并在极化后将尖端保持在0V较长时间,从尖端获得了足够的补偿电荷,有效避免了“带电诱导极化”供应,解决了P(VDF-TrFE)聚合物薄膜电容器正尖端所致读写时间增加的问题。The present invention uses a relatively short polarization pulse and keeps the tip at 0V for a long time after polarization to obtain sufficient compensation charges from the tip, effectively avoiding the supply of "charge-induced polarization", and solving the problem of increased reading and writing time caused by the positive tip of the P(VDF-TrFE) polymer film capacitor.
实施例2Example 2
一种改善铁电薄膜电容器性能的方法,如图1所示,在采用压电力显微镜的负探针尖端向宽度为1.2um、厚度为60nm的P(VDF-TrFE)聚合物薄膜电容器(P(VDF-TrFE)聚合物薄膜电容器为由顶部电极、中间P(VDF-TrFE)聚合物薄膜和底部电极组成的“三明治”结构的电容器,底部电极为金属Ti)中的薄膜施加-8V的电压(输入三个负点,相邻两点间的距离为400nm)以读写铁电薄膜电容器的过程中,将尖端输入的脉冲(单脉冲)长度缩至2ms,且在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持30s,以改善铁电薄膜电容器性能。A method for improving the performance of ferroelectric film capacitors. As shown in Figure 1, a voltage of -8V is applied to the film in a P(VDF-TrFE) polymer film capacitor with a width of 1.2um and a thickness of 60nm (P(VDF-TrFE) polymer film capacitor is a capacitor with a "sandwich" structure composed of a top electrode, a middle P(VDF-TrFE) polymer film and a bottom electrode, and the bottom electrode is metal Ti) with a negative probe tip of a piezoelectric force microscope (input three negative points, and the distance between two adjacent points is 400nm) to read and write ferroelectric film capacitors, shorten the length of the pulse (single pulse) input by the tip to 2ms, and after the ferroelectric film capacitor is polarized by voltage, adjust the voltage input by the tip to 0V and keep it for 30s to improve the performance of the ferroelectric film capacitor.
未施加电压时薄膜的PFM的形貌图如图6所示,施加负电压结束后薄膜的PFM形貌图如图7所示。当探针负尖端输入电压,P(VDF-TrFE)铁电薄膜表面上的点迹面积很小,当用负尖端极化时,电荷将沉积在薄膜表面即探针尖端周围,与正电荷相比,电子具有更高的迁移率,它们可以更快地消失,没有或更少的“电荷诱导开关”,得到更小的点/线,所以说负尖端的读写速度本身就较快,通过使用此方法会进一度加快读写速度,铁电薄膜电容器的读写速度为0.72μs。The PFM topography of the film when no voltage is applied is shown in Figure 6, and the PFM topography of the film after the negative voltage is applied is shown in Figure 7. When the negative tip of the probe is input with voltage, the spot area on the surface of the P(VDF-TrFE) ferroelectric film is very small. When the negative tip is used to polarize, the charge will be deposited on the surface of the film, that is, around the probe tip. Compared with the positive charge, the electrons have higher mobility and they can disappear faster. There is no or less "charge-induced switching" and smaller dots/lines are obtained. Therefore, the reading and writing speed of the negative tip itself is faster. By using this method, the reading and writing speed will be further accelerated. The reading and writing speed of the ferroelectric film capacitor is 0.72μs.
实施例3Example 3
一种改善铁电薄膜电容器性能的方法,在采用压电力显微镜的正探针尖端向尼龙-11薄膜电容器中的薄膜(其尺寸厚度与P(VDF-TrFE)聚合物薄膜相同)施加+10V的电压以读写铁电薄膜电容器的过程中,将尖端输入的脉冲(单脉冲)长度缩至1ms,且在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持0s,以改善铁电薄膜电容器性能。A method for improving the performance of ferroelectric film capacitors. In the process of applying +10V voltage to the film in the nylon-11 film capacitor (which has the same size and thickness as the P(VDF-TrFE) polymer film) to read and write ferroelectric film capacitors, the length of the pulse (single pulse) input by the tip is shortened to 1ms. After the ferroelectric film capacitor is polarized by voltage, the voltage input by the tip is adjusted to 0V and then held for 0s to improve the performance of the ferroelectric film capacitor.
铁电薄膜电容器的读写速度为0.96μs。The reading and writing speed of the ferroelectric film capacitor is 0.96μs.
实施例4Example 4
一种改善铁电薄膜电容器性能的方法,在采用压电力显微镜的正探针尖端向尼龙-7膜电容器中的薄膜(其尺寸厚度与P(VDF-TrFE)聚合物薄膜相同)施加+9V的电压以读写铁电薄膜电容器的过程中,将尖端输入的单脉冲长度缩至30μs,且在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持50s,以改善铁电薄膜电容器性能。A method to improve the performance of ferroelectric film capacitors. In the process of applying a voltage of +9V to the film in the nylon-7 film capacitor (which has the same size and thickness as the P(VDF-TrFE) polymer film) by using the tip of the positive probe of a piezoelectric force microscope to read and write the ferroelectric film capacitor, the length of the single pulse input by the tip is reduced to 30 μs.
铁电薄膜电容器的读写速度为0.83μs。The reading and writing speed of the ferroelectric film capacitor is 0.83μs.
实施例5Example 5
一种改善铁电薄膜电容器性能的方法,在采用压电力显微镜的负探针尖端向尼龙-5膜电容器中的薄膜(其尺寸厚度与P(VDF-TrFE)聚合物薄膜相同)施加-9V的电压以读写铁电薄膜电容器的过程中,控制尖端输入的单脉冲长度为10ms,在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持100s,以改善铁电薄膜电容器性能。A method for improving the performance of ferroelectric film capacitors. In the process of applying a voltage of -9V to the film in the nylon-5 film capacitor (which has the same size and thickness as the P(VDF-TrFE) polymer film) by using the negative probe tip of a piezoelectric force microscope to read and write the ferroelectric film capacitor, the length of the single pulse input by the tip is controlled to be 10ms.
铁电薄膜电容器的读写速度为0.82μs。The reading and writing speed of the ferroelectric film capacitor is 0.82μs.
实施例6Example 6
一种改善铁电薄膜电容器性能的方法,在采用压电力显微镜的负探针尖端向无机铁电薄膜电容器中的薄膜(其尺寸厚度与P(VDF-TrFE)聚合物薄膜相同)施加-10V的电压以读写铁电薄膜电容器的过程中,将尖端输入的脉冲(单脉冲)长度缩至200μs,且在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持80s,以改善铁电薄膜电容器性能。A method to improve the performance of ferroelectric film capacitors. During the process of applying a voltage of -10V to the film in the inorganic ferroelectric film capacitor (which has the same size and thickness as the P(VDF-TrFE) polymer film) to read and write ferroelectric film capacitors, the length of the pulse (single pulse) input by the tip is reduced to 200 μs. After the ferroelectric film capacitor is polarized by voltage, the voltage input by the tip is adjusted to 0V and held for 80s to improve the performance of the ferroelectric film capacitor.
铁电薄膜电容器的读写速度为0.75μs。The reading and writing speed of the ferroelectric film capacitor is 0.75μs.
实施例7Example 7
一种改善铁电薄膜电容器性能的方法,在采用压电力显微镜的正探针尖端向宽度为1.2um、厚度为60nm的P(VDF-TrFE)聚合物薄膜电容器(P(VDF-TrFE)聚合物薄膜电容器为由顶部电极、中间P(VDF-TrFE)聚合物薄膜和底部电极组成的“三明治”结构的电容器,底部电极为金属Ti)中的薄膜施加+10V的电压以读写铁电薄膜电容器的过程中,将尖端输入的单脉冲长度缩至1.2ms,且在铁电薄膜电容器被电压极化后,将尖端输入的电压调至0V后保持75s,以改善铁电薄膜电容器性能。A method to improve the performance of ferroelectric film capacitors, in the process of applying +10V voltage to the film in a P(VDF-TrFE) polymer film capacitor with a width of 1.2um and a thickness of 60nm (P(VDF-TrFE) polymer film capacitor is a capacitor with a "sandwich" structure consisting of a top electrode, a middle P(VDF-TrFE) polymer film and a bottom electrode, the bottom electrode is metal Ti) using a positive probe tip of a piezoelectric force microscope to read and write a ferroelectric film capacitor. The length was shortened to 1.2ms, and after the ferroelectric film capacitor was polarized by voltage, the voltage input at the tip was adjusted to 0V and held for 75s to improve the performance of the ferroelectric film capacitor.
铁电薄膜电容器的读写速度为0.84μs。The reading and writing speed of the ferroelectric film capacitor is 0.84μs.
Claims (10)
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| JP2000214065A (en) * | 1999-01-25 | 2000-08-04 | Sony Corp | Characteristic analysis method of ferroelectric thin film |
| JP2005069976A (en) * | 2003-08-27 | 2005-03-17 | Fujitsu Ltd | Ferroelectric film evaluation apparatus and evaluation method therefor |
| CN1818689A (en) * | 2006-03-15 | 2006-08-16 | 中国科学院上海硅酸盐研究所 | IV characteristic measuring method and device for ferroelectric thin-film materials |
| CN103165173A (en) * | 2013-04-03 | 2013-06-19 | 南京大学 | A High-Density Ferroelectric Data Storage Method Realized by Piezoelectric Force Microscopy Probe |
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| US20070041233A1 (en) * | 2005-08-19 | 2007-02-22 | Seagate Technology Llc | Wake-up of ferroelectric thin films for probe storage |
| US20170233597A1 (en) * | 2016-02-16 | 2017-08-17 | Indian Institute Of Technology, Kanpur | Method of fabricating high-performance poly (vinylidenedifluoride-trifluoroethylene), p(vdf-trfe) films |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2000214065A (en) * | 1999-01-25 | 2000-08-04 | Sony Corp | Characteristic analysis method of ferroelectric thin film |
| JP2005069976A (en) * | 2003-08-27 | 2005-03-17 | Fujitsu Ltd | Ferroelectric film evaluation apparatus and evaluation method therefor |
| CN1818689A (en) * | 2006-03-15 | 2006-08-16 | 中国科学院上海硅酸盐研究所 | IV characteristic measuring method and device for ferroelectric thin-film materials |
| CN103165173A (en) * | 2013-04-03 | 2013-06-19 | 南京大学 | A High-Density Ferroelectric Data Storage Method Realized by Piezoelectric Force Microscopy Probe |
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