CN110716189A - A transmitter and distance measurement system - Google Patents
A transmitter and distance measurement system Download PDFInfo
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- CN110716189A CN110716189A CN201910927183.4A CN201910927183A CN110716189A CN 110716189 A CN110716189 A CN 110716189A CN 201910927183 A CN201910927183 A CN 201910927183A CN 110716189 A CN110716189 A CN 110716189A
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- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
- G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
- G01S7/481—Constructional features, e.g. arrangements of optical elements
- G01S7/4814—Constructional features, e.g. arrangements of optical elements of transmitters alone
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
- G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
- G01S17/06—Systems determining position data of a target
- G01S17/08—Systems determining position data of a target for measuring distance only
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Abstract
Description
技术领域technical field
本发明涉及计算机技术领域,尤其涉及一种发射器及距离测量系统。The present invention relates to the field of computer technology, in particular to a transmitter and a distance measurement system.
背景技术Background technique
利用飞行时间原理(Time of Flight)、结构光原理可以对目标进行距离测量以获取包含目标深度值的深度图像,进一步基于该深度图像可以实现三维重建、人脸识别、人机交互等功能,相关的距离测量系统已被广泛应用于消费电子、无人架驶、AR/VR等领域。Using the principle of time of flight (Time of Flight) and the principle of structured light, the distance of the target can be measured to obtain a depth image containing the depth value of the target, and further functions such as three-dimensional reconstruction, face recognition, and human-computer interaction can be realized based on the depth image. The distance measurement system has been widely used in consumer electronics, unmanned aerial vehicles, AR/VR and other fields.
基于飞行时间原理以及结构光原理的距离测量系统一般都包含有一个光束发射器以及采集器。发射器中的光源向目标空间发射光束以提供照明,采集器接收由目标反射回的光束。其中,飞行时间距离测量系统通过计算光束由发射到反射接收所需要的时间来计算目标物体的距离;而结构光距离测量系统则通过对反射回的光束图案进行处理并利用三角法计算目标物体的距离。Distance measurement systems based on time-of-flight principles and structured light principles generally include a beam transmitter and a collector. The light source in the emitter emits a beam of light into the target space to provide illumination, and the collector receives the beam reflected back by the target. Among them, the time-of-flight distance measurement system calculates the distance of the target object by calculating the time required for the beam to be received from the emission to the reflection; while the structured light distance measurement system calculates the distance of the target object by processing the reflected beam pattern and using trigonometry. distance.
无论是哪一种原理方案的距离测量系统,目前均面临着一些难题亟需解决,最核心的是测量分辨率的难题、功耗的难题以及体积的难题。Regardless of the principle scheme of the distance measurement system, there are currently some problems that need to be solved urgently. The core is the problem of measurement resolution, power consumption, and volume.
其中,测量分辨率往往受到发射器所发射的光束的影响,所发射光束越密集,分辨率往往越高,但密集光束对光源排列密度要求以及相关光学器件的设计要求均较高,同时密集光束也意味着更高的功耗。而功耗的难题也受到发射器的影响,发射器发射光束功率越高、光束密度越大则功耗越高,进一步限制了测量系统更广泛地应用于更多领域。其次,体积的难题往往由于发射器或者采集器中复杂的器件所导致的,比如发射器通常会包含光源以及一些折射、衍射等光学元件,这就导致体积较大不易集成。所以,发射器是一个关键问题,提供好的发射器对解决上述问题事关重要。Among them, the measurement resolution is often affected by the beam emitted by the transmitter. The denser the emitted beam, the higher the resolution is, but the dense beam has higher requirements on the arrangement density of the light source and the design requirements of related optical devices. Also means higher power consumption. The problem of power consumption is also affected by the transmitter. The higher the beam power and the greater the beam density of the transmitter, the higher the power consumption, which further limits the wider application of the measurement system in more fields. Secondly, the volume problem is often caused by the complex devices in the transmitter or collector. For example, the transmitter usually contains a light source and some optical components such as refraction and diffraction, which leads to a large volume and is difficult to integrate. Therefore, the transmitter is a key issue, and it is important to provide a good transmitter to solve the above problems.
以上背景技术内容的公开仅用于辅助理解本发明的发明构思及技术方案,其并不必然属于本专利申请的现有技术,在没有明确的证据表明上述内容在本专利申请的申请日已经公开的情况下,上述背景技术不应当用于评价本申请的新颖性和创造性。The disclosure of the above background technology content is only used to assist the understanding of the inventive concept and technical solution of the present invention, and it does not necessarily belong to the prior art of this patent application. If there is no clear evidence that the above content has been disclosed on the filing date of this patent application The above background art should not be used to evaluate the novelty and inventive step of the present application.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于提供一种发射器及距离测量系统,以解决上述背景技术问题中的至少一种。The purpose of the present invention is to provide a transmitter and a distance measurement system to solve at least one of the above-mentioned background technical problems.
为达到上述目的,本发明实施例的技术方案是这样实现的:In order to achieve the above-mentioned purpose, the technical scheme of the embodiment of the present invention is realized as follows:
一种发射器,包括:光源单元,用于发射第一光束;分束单元,用于接收所述第一光束并对第一光束进行分束后形成光束数量更多的第二光束;扫描单元,用于接收所述第二光束并偏转第二光束一定角度后向外发射第三光束;经过多次所述偏转之后形成多个所述第三光束,由所述多个第三光束所形成的综合投影图案光束比所述第二光束拥有更高的密度和/或更大的视场角。A transmitter, comprising: a light source unit for emitting a first beam; a beam splitting unit for receiving the first beam and splitting the first beam to form a second beam with more beams; a scanning unit , used to receive the second light beam and deflect the second light beam by a certain angle and then emit the third light beam outward; after several times of the deflection, a plurality of the third light beams are formed, which are formed by the plurality of third light beams The integrated projected pattern beam has a higher density and/or a larger field of view than the second beam.
在一些实施例中,所述光源单元还包括透镜,所述透镜用于对光源发出的光束进行折射以产生聚焦、准直或发散效果。In some embodiments, the light source unit further includes a lens for refracting the light beam emitted by the light source to generate focusing, collimating or diverging effects.
在一些实施例中,所述光源单元包括基底以及设置在所述基底上的至少一个子光源,所述子光源以一定的图案形式排列在所述基底上。In some embodiments, the light source unit includes a base and at least one sub-light source disposed on the base, and the sub-light sources are arranged on the base in a certain pattern.
在一些实施例中,所述图案包括二维图案,所述二维图案包括规则图案和/或不规则图案。In some embodiments, the pattern comprises a two-dimensional pattern including a regular pattern and/or an irregular pattern.
在一些实施例中,所述光源单元包括多个子光源,所述多个子光源可以被分组独立控制。In some embodiments, the light source unit includes a plurality of sub-light sources, and the plurality of sub-light sources can be controlled independently in groups.
在一些实施例中,所述分束单元包括衍射光学元件和/或超表面光学元件。In some embodiments, the beam splitting unit includes diffractive optical elements and/or metasurface optical elements.
在一些实施例中,所述第二光束比所述第一光束拥有更高的排列密度,和/或,所述第二光束比所述第一光束拥有更大的视场角。In some embodiments, the second beam has a higher packing density than the first beam, and/or the second beam has a larger field of view than the first beam.
在一些实施例中,当所述扫描单元偏转的角度小于所述第二光束中相邻两个子光束的夹角时,所述综合投影图案光束比所述第二光束拥有更高的密度。In some embodiments, when the angle deflected by the scanning unit is smaller than the included angle between two adjacent sub-beams in the second beam, the integrated projection pattern beam has a higher density than the second beam.
在一些实施例中,当所述扫描单元偏转的角度不小于所述第二光束的视场角时,所述综合投影图案光束比所述第二光束拥有更大的视场角。In some embodiments, when the angle of deflection of the scanning unit is not less than the field angle of the second light beam, the integrated projection pattern light beam has a larger field angle than the second light beam.
本发明的另一技术方案为:Another technical scheme of the present invention is:
一种距离测量系统,包括以上任一方案中所述的发射器,以用于向目标物体发射光束;采集器,用于采集被所述目标物体反射回的至少部分所述发射光束并形成光信号;处理电路,与所述发射器以及所述采集器连接,并根据所述光信号计算所述目标物体的距离。A distance measurement system, comprising the transmitter described in any one of the above solutions, for emitting a light beam to a target object; a collector for collecting at least part of the emitted light beam reflected back by the target object and forming a light beam a signal; a processing circuit, connected to the transmitter and the collector, and calculating the distance of the target object according to the light signal.
本发明技术方案的有益效果是:The beneficial effects of the technical solution of the present invention are:
本发明通过对分束单元以及扫描单元的合理配置实现了更高密度或者更大视场角的光束投影,最终可以实现测量分辨率以及视场角的提升,解决了现有技术中测量分辨率低的问题。The present invention realizes beam projection with higher density or larger field of view through the reasonable configuration of the beam splitting unit and the scanning unit, finally realizes the improvement of the measurement resolution and the field of view, and solves the problem of the measurement resolution in the prior art. low problem.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention, and for those of ordinary skill in the art, other drawings can also be obtained from these drawings without any creative effort.
图1是根据本发明一个实施例的飞行时间距离测量系统示意图。FIG. 1 is a schematic diagram of a time-of-flight distance measurement system according to an embodiment of the present invention.
图2是根据本发明第一实施例的发射器示意图。FIG. 2 is a schematic diagram of a transmitter according to the first embodiment of the present invention.
图3是根据本发明第一实施例的投影图案示意图。FIG. 3 is a schematic diagram of a projection pattern according to the first embodiment of the present invention.
图4是根据本发明第二实施例的发射器示意图。FIG. 4 is a schematic diagram of a transmitter according to a second embodiment of the present invention.
图5是根据本发明第三实施例的发射器示意图。FIG. 5 is a schematic diagram of a transmitter according to a third embodiment of the present invention.
图6是根据本发明第二实施例的投影图案示意图。FIG. 6 is a schematic diagram of a projection pattern according to a second embodiment of the present invention.
图7是根据本发明一个实施例的集成分束扫描单元示意图。FIG. 7 is a schematic diagram of an integrated beam splitting scanning unit according to an embodiment of the present invention.
图8是根据本发明一个实施例的阵列光源及其稀疏投影图案示意图。FIG. 8 is a schematic diagram of an array light source and a sparse projection pattern thereof according to an embodiment of the present invention.
图9是根据本发明一个实施例的阵列光源及其密集投影图案示意图。FIG. 9 is a schematic diagram of an array light source and a dense projection pattern thereof according to an embodiment of the present invention.
具体实施方式Detailed ways
为了使本发明实施例所要解决的技术问题、技术方案及有益效果更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。In order to make the technical problems, technical solutions and beneficial effects to be solved by the embodiments of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.
需要说明的是,当元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者间接在该另一个元件上。当一个元件被称为是“连接于”另一个元件,它可以是直接连接到另一个元件或间接连接至该另一个元件上。另外,连接即可以是用于固定作用也可以是用于电路连通作用。It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element. In addition, the connection can be used for either a fixing function or a circuit connecting function.
需要理解的是,术语“长度”、“宽度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明实施例和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。It is to be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top" , "bottom", "inside", "outside", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, which are only for the convenience of describing the embodiments of the present invention and simplifying the description, rather than indicating or implying that The device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the present invention.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多该特征。在本发明实施例的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature defined as "first", "second" may expressly or implicitly include one or more of that feature. In the description of the embodiments of the present invention, "plurality" means two or more, unless otherwise expressly and specifically defined.
本发明提供了一种飞行时间距离测量系统,其具有更高的分辨率和/或更大的视场角。The present invention provides a time-of-flight distance measurement system with higher resolution and/or larger field of view.
图1所示是根据本发明一个实施例的飞行时间距离测量系统示意图。所述距离测量系统10包括发射器11、采集器12以及处理电路13;发射器11提供发射光束30至目标空间中以照明空间中的物体20,其中至少部分发射光束30经物体20反射后形成反射光束40,反射光束40的至少部分光信号(光子)被采集器12采集。处理电路13分别与发射器11以及采集器12连接,同步发射器11以及采集器12的触发信号以计算光束由发射器11发出并被采集器12接收所需要的时间,即发射光束30与反射光束40之间的飞行时间t,进一步的,物体上对应点的距离D可由下式计算出:FIG. 1 is a schematic diagram of a time-of-flight distance measurement system according to an embodiment of the present invention. The distance measurement system 10 includes a
D=c·t/2 (1)D=c·t/2 (1)
其中,c为光速。where c is the speed of light.
发射器11包括光源111、光学元件112。光源111可以是发光二极管(LED)、边发射激光器(EEL)、垂直腔面发射激光器(VCSEL)等光源,也可以是多个光源组成的阵列光源。优选地,阵列光源111是在单块半导体基底上生成多个VCSEL光源以形成的VCSEL阵列光源芯片。光源111所发射的光束可以是可见光、红外光、紫外光等。光源111在处理电路13的控制下向外发射光束,比如在一个实施例中,光源111在处理电路13的控制下以一定的频率(脉冲周期)发射脉冲光束,可以用于直接飞行时间法(Direct TOF)测量中,频率根据测量距离进行设定,比如可以设置成1MHz-100MHz,测量距离在几米至几百米。可以理解的是,可以是处理电路13中的一部分或者独立于处理电路13存在的子电路来控制光源111发射相关的光束,比如脉冲信号发生器。The
光学元件112接收来自光源111的脉冲光束,并将脉冲光束进行光学调制,比如衍射、折射、反射等调制,随后向空间中发射被调制后的光束,比如聚焦光束、泛光光束、结构光光束等。光学元件112可以是透镜、衍射光学元件、超表面(Metasurface)光学元件、掩膜板、反射镜、MEMS振镜等形式中的一种或多种组合。The optical element 112 receives the pulsed beam from the light source 111, performs optical modulation on the pulsed beam, such as diffraction, refraction, reflection, etc., and then emits the modulated beam into space, such as a focused beam, a flood beam, and a structured light beam Wait. The optical element 112 may be one or more combinations of lenses, diffractive optical elements, metasurface optical elements, masks, mirrors, MEMS galvanometers, and the like.
处理电路13可以是独立的专用电路,比如专用SOC芯片、FPGA芯片、ASIC芯片等等,也可以包含通用处理电路,比如当该深度相机被集成到如手机、电视、电脑等智能终端中去,终端中的处理电路可以作为该处理电路13的至少一部分。The processing circuit 13 can be an independent dedicated circuit, such as a dedicated SOC chip, an FPGA chip, an ASIC chip, etc., or it can include a general-purpose processing circuit, for example, when the depth camera is integrated into a smart terminal such as a mobile phone, a TV, a computer, etc., The processing circuit in the terminal can be used as at least a part of the processing circuit 13 .
采集器12包括像素单元121、成像透镜单元122。其中,成像透镜单元122接收并将由物体反射回的至少部分调制光束引导到像素单元121上。在一个实施例中,像素单元121由单光子雪崩光电二极管(SPAD)组成,也可以由多个SPAD像素组成的阵列像素单元,阵列像素单元的阵列大小代表着该深度相机的分辨率,比如320×240等。SPAD可以对入射的单个光子进行响应从而实现对单光子的检测,由于其具备灵敏度高、响应速度快等优点,可以实现远距离、高精度地测量。与CCD/CMOS等组成的以光积分为原理的图像传感器相比,SPAD可以通过对单光子进行计数,比如利用时间相关单光子计数法(TCSPC)实现对微弱光信号的采集以及飞行时间的计算。一般地,与像素单元121连接的还包括由信号放大器、时数转换器(TDC)、模数转换器(ADC)等器件中的一种或多种组成的读出电路(图中未示出)。这些电路即可以与像素整合在一起,这也可以是处理电路13中的一部分,为了便于描述,将统一视作处理电路13。The collector 12 includes a pixel unit 121 and an imaging lens unit 122 . Therein, the imaging lens unit 122 receives and guides at least part of the modulated light beam reflected back by the object to the pixel unit 121 . In one embodiment, the pixel unit 121 is composed of a single photon avalanche photodiode (SPAD), or an array pixel unit composed of a plurality of SPAD pixels, and the array size of the array pixel unit represents the resolution of the depth camera, such as 320 ×240, etc. SPAD can respond to the incident single photon to realize the detection of single photon. Due to its advantages of high sensitivity and fast response speed, it can realize long-distance and high-precision measurement. Compared with image sensors based on the principle of light integration composed of CCD/CMOS, SPAD can count single photons, such as the use of time-correlated single-photon counting (TCSPC) to realize the collection of weak light signals and the calculation of flight time. . Generally, connected to the pixel unit 121 also includes a readout circuit (not shown in the figure) composed of one or more of a signal amplifier, a time-to-digital converter (TDC), an analog-to-digital converter (ADC) and other devices. ). These circuits may be integrated with the pixels, or may be a part of the processing circuit 13 , and will be regarded as the processing circuit 13 for ease of description.
在一些实施例中,距离测量系统10还可以包括有彩色相机、红外相机、IMU等器件,与这些器件的组合可以实现更加丰富的功能,比如3D纹理建模、红外人脸识别、SLAM等功能。In some embodiments, the distance measurement system 10 may further include devices such as a color camera, an infrared camera, and an IMU, and the combination with these devices can realize more abundant functions, such as 3D texture modeling, infrared face recognition, SLAM and other functions .
在一些实施例中,发射器11与采集器12也可以被设置成共轴形式,即二者之间通过具备反射及透射功能的光学器件来实现,比如半透半反镜等。In some embodiments, the
传统的距离测量系统中,发射器11被设置成向外发射具有一定视场角的泛光光束,其优点是对被测目标进行了全范围的照明覆盖,采集器12中的每个像素在同一时刻均可以接收到反射回的光束,测量系统输出的深度图像的分辨率受到采集器12的像素单元分辨率影响,缺点则是发射器11的功耗将高,另外也可能会导致采集器11相邻像素同步测量时相互之间有干扰的情形。因此在本发明中,发射器11被设置成向外发射结构光光束,即在空间上仅部分区域被照亮,采用结构光光束的优点是照明更加集中从而提升信噪比,缺点则是分辨率较低,另外在一些情形下也会呈现视场角不够的缺点。In the traditional distance measurement system, the
图2是根据本发明第一实施例的发射器示意图。其中,发射器包括光源单元、分束单元204以及扫描单元205,光源单元用于发射第一光束,分束单元204用于接收并对第一光束进行分束后形成光束数量更多的第二光束,扫描单元205用于接收并偏转第二光束一定角度后向外发射第三光束,经过多次偏转之后将会形成多个第三光束,该多个第三光束所形成的综合投影图案光束比第二光束拥有更高的密度和/或更大的视场角。FIG. 2 is a schematic diagram of a transmitter according to the first embodiment of the present invention. The transmitter includes a light source unit, a
光源单元包括基底201以及设置在单片基底201(或多片基底)上的一个或多个子光源202,子光源202以一定的图案形式排列在基底上。基底201可以是半导体基底、金属基底等,子光源202可以是发光二极管、边发射激光发射器、垂直腔面激光发射器(VCSEL)等,优选地,光源单元包括半导体基底以及设置在半导体基底上的多个VCSEL子光源所组成的阵列VCSEL芯片。子光源用于发射任意需要波长的光束,比如可见光、红外光、紫外光等。光源单元在驱动电路(可以是处理电路13的一部分)的调制驱动下进行发光,比如幅度调制、相位调制、频率调制、脉冲调制等。子光源202也可以在驱动电路的控制下分组发光或者整体发光,比如子光源202包含第一子光源阵列201、第二子光源阵列202等,第一子光源阵列201在第一驱动电路的控制下发光、第二子光源阵列202在第二驱动电路的控制下发光。子光源202的排列图案可以是一维排列图案、也可以是二维排列图案,可以是规则排列图案、也可以是不规则排列图案,或者是规则图案和不规则图案的组合。为了便于分析,图2中仅示意性地给出一种示例,该示例中子光源包括3×3的规则阵列子光源。The light source unit includes a
在一个实施例中,光源单元还包括透镜(或透镜组)、微透镜阵列等光学元件中的一种或多种,比如在子光源202与分束单元204之间设置了透镜(或透镜组或透镜组与微透镜阵列的组合)203,透镜203用于对子光源发出的光束进行折射以产生聚焦、准直或发散效果(形成聚焦、准直或发散的第一光束),以满足后续光学元件的调制需求。In one embodiment, the light source unit further includes one or more optical elements such as a lens (or a lens group), a microlens array, etc. For example, a lens (or a lens group is provided between the
分束单元204接收来自光源发出的第一光束,并对第一光束进行复制分束以形成光束数量更多的第二光束。在一个实施例中,分束单元204对第一光束进行复制分束以形成排列密度更高的第二光束(对于子光源为多个时的情形);在一个实施例中,分束单元204对第一光束进行复制分束以形成视场角更大的第二光束,例如图3所示实施例;在一个实施例中,分束单元204对第一光束进行复制分束以形成排列密度更高及视场角更大的第二光束。分束单元204可以是衍射光学元件、光栅、光学掩膜板、超表面(Metasurface)光学元件等任意可以实现分束的光学器件中的一种或多种的组合。为了便于分析,假定第二光束的视场角为α,第二光束中相邻两个子光束的角偏移为β,需要说明的是,若第二光束是空间光束,则α、β均包含两个方向的分量(αx,αy)、(βx,βy)。The
扫描单元205接收来自分束单元204的第二光束后,对第二光束进行偏转扫描后向外发射第三光束。扫描单元205可以对入射的第二光束中的各个子光束通过衍射、折射、反射等方式实现一维偏转或者二维偏转,比如沿至少一方向偏转一定的角度θ(θx,θy),从而形成第三光束。图2中示意性给出扫描单元205对第二光束沿一个方向依次偏转了两个角度的示意图,其中第一第三光束206可以认为是偏转了0度所形成;第二第三光束207是扫描单元205对第二光束偏转了一个较小的角度θ所形成,该角度小于第二光束中相邻两个子光束之间的夹角,即θ<β,由此通过至少两次扫描之后形成的至少两个第三光束所组成的综合投影图案光束相对于没有扫描单元205时的第二光束具有更高的密度,由此便可以提升测量系统的测量分辨率。具体描述参见图3。扫描单元205可以是液晶空间光调制器、声光调制器、MEMS振镜、旋转棱镜对、单个棱镜+电机、反射式二维OPA器件、液晶超表面器件(LC-Metasurface)等器件中的一种或多种的组合。比如当扫描单元205是液晶空间光调制器时,可以通过调控液晶分子的排列光栅周期来控制对入射光束的偏转角度。After receiving the second light beam from the
图3是根据本发明第一实施例的投影图案示意图。基于图2所示的发射器11,在一个实施例中,发射器11向目标发射的第三光束所形成的投影图案如图3所示。在本实施例中,分束单元204对第一光束进行复制分束以形成视场角更大的第二光束,复制的方式是3×3的形成,即将3×3规则排列的子光源发出的第一光束进行3×3倍的复制以形成由9个第一光束图案302形成的大视场角的第二光束图案301,第二光束图案301中包含了9×9=81个子光束303,图中用实线空心圆圈表示。假定扫描单元205对第二光束进行偏转,第一次偏转为0度,所形成的第一第三光束图案即图3中实线空心圆圈303所组成的阵列斑点图案;随后扫描单元205对第二光束进行再次偏转,比如沿图3中的竖直方向偏转,偏转角度小于第二光束中相邻两个子光束之间的夹角,由此可以产生图3中虚线空间圆圈304所组成的第二第三光束图案。由于偏转角度较小,本实施例中偏转角度正好是第二光束中相邻两个子光束的一半,即θ=β/2,虚线空心圆圈304将会落在两个实线空心圆圈303之间,多次扫描之后由多个第三光束所形成的综合扫描图案将拥有更高的密度。扫描的方向可以沿单个方向,也可以沿多个方向。FIG. 3 is a schematic diagram of a projection pattern according to the first embodiment of the present invention. Based on the
实际上,图2及图3所示的实施例中,扫描单元205通过偏转光束方向后,同样也增加了视场角,只不过所增加的视场角相对于分束单元204所形成的第二光束的视场角而言十分微小。可以理解的是,通过偏转角度的合理设置可以有效地调节投影图案的密度与视场角。在一个实施例中,偏转角度θ可以依次设置成通过n次扫描,扫描角度逐次增加从而将综合的投影图案密度增加n倍。在一个实施例中,偏转角度θ可以依次设置成 由此可以同时增加投影图案的密度与视场角,即视场角增加了Nβ,中间部分叠加区域的密度增加了n倍。在一个实施例中,偏转角度被设置成超过了第二光束的视场角为α,此时仅仅增加了投影图案的视场角,这一情形如图5所示。In fact, in the embodiments shown in FIG. 2 and FIG. 3 , after the
图5是根据本发明第三实施例的发射器示意图。发射器的主要组成部分与图2所示实施例相似,包含由基底501、子光源502以及透镜503所组成的光源单元,以及分束单元504和扫描单元505。与图2所示实施例不同的是,扫描单元505对入射的第二光束进行偏转的偏转角度相对比较大,即θ≥α,比如首次偏转0度形成的第一第三光束图案为506,第二次沿某一方向偏转α后形成第二第三光束图案507,第一与第二第三光束图案所形成的综合投影图案的视场角沿偏转方向得到了2倍的提升,投影图案的密度没有变化。FIG. 5 is a schematic diagram of a transmitter according to a third embodiment of the present invention. The main components of the transmitter are similar to the embodiment shown in FIG. 2 , including a light source unit composed of a
在一些实施例中,扫描单元505可以沿多个方向进行偏转以形成更大视场角的投影图案,比如图6所示的是根据本发明第二实施例的投影图案示意图。在本实施例中,光源单元包括3×3个子光源组成的规则阵列,分束单元对子光源的规则阵列进行3×3倍的复制分束以形成9×9排列的第二光束,扫描单元分别沿水平、竖直方向进行偏转3次,每次的偏转角度略大于α(避免邻界处的光束重叠),比如图6中的箭头所示的偏转顺序,最终可以形成多个第三光束602、603、604、605,多个第三光束共同组成投影图案601,通过多次偏转之后视场角沿两个方向均得到了2倍的提升。可以理解的是,根据实际需要,每个方向偏转的次数以及偏转的顺序可以进行相应的设定,在此不做限制。In some embodiments, the
图4是根据本发明第二实施例的发射器示意图。发射器包括光源单元、扫描单元404以及分束单元405,光源单元用于发射第一光束,扫描单元404用于接收并偏转第一光束后向外发射第二光束,分束单元405用于接收并对第二光束进行分束后形成光束数量更多的第三光束。由扫描单元404经过多次偏转之后将形成多个第二光束,相应地,多个第二光束经分束单元分束后也形成对应的多个第三光束,这些第三光束所形成的综合投影图案光束比第二光束拥有更高的密度和/或更大的视场角。FIG. 4 is a schematic diagram of a transmitter according to a second embodiment of the present invention. The transmitter includes a light source unit, a
光源单元包括基底401以及设置在单片基底401(或多片基底)上的一个或多个子光源402,子光源402以一定的图案形式排列在基底上。基底401可以是半导体基底、金属基底等,子光源402可以是发光二极管、边发射激光发射器、垂直腔面激光发射器(VCSEL)等,优选地,光源单元包括半导体基底以及设置在半导体基底上的多个VCSEL子光源所组成的阵列VCSEL芯片。子光源用于发射任意需要波长的光束,比如可见光、红外光、紫外光等。光源单元在驱动电路(可以是处理电路13的一部分)的调制驱动下进行发光,比如连续波调制、脉冲调制等。子光源402也可以在驱动电路的控制下分组发光或者整体发光,比如子光源402包含第一子光源阵列401、第二子光源阵列402等,第一子光源阵列401在第一驱动电路的控制下发光、第二子光源阵列402在第二驱动电路的控制下发光。子光源402的排列可以是一维排列、也可以是二维排列,可以是规则排列、也可以是不规则排列。The light source unit includes a
在一个实施例中,光源单元还包括透镜(或透镜组)、微透镜阵列等光学元件中的一种或多种,比如在子光源402与扫描单元404之间设置了透镜(或透镜组)403,透镜403用于对光源发出的光束进行折射以产生汇聚或聚焦效果,以满足后续光学元件的调制需求。In one embodiment, the light source unit further includes one or more of optical elements such as a lens (or a lens group) and a microlens array, for example, a lens (or a lens group) is provided between the
扫描单元404接收来自光源发出的第一光束,并对第一光束进行偏转扫描后形成第二光束。扫描单元404可以对入射的第二光束中的各个子光束通过衍射、折射、反射等方式实现一维偏转或者二维偏转,比如沿至少一方向偏转一定的角度,从而形成第二光束。The
分束单元405接收来自扫描单元404发出的第二光束,并对第二光束进行复制分束以形成光束数量更多的第三光束。在一个实施例中,分束单元405对第二光束进行复制分束以形成排列密度更高的第三光束;在一个实施例中,分束单元405对第二光束进行复制分束以形成视场角更大的第三光束;在一个实施例中,分束单元405对第二光束进行复制分束以形成排列密度更高及视场角更大的第三光束。分束单元405可以是衍射光学元件、光学掩膜板、超表面(Metasurface)光学元件等任意可以实现分束的光学器件。与图2所示实施例类似地,通过设置偏转角度θ与第三光束的视场角α、相邻子光束之间角偏移为β之间的关系,可以形成密度更高、视场角更大的综合投影图案。The
在图4所示实施例中,示意性给出扫描单元404对第一光束沿一个方向偏转了两个角度的示意图,其中第一第二光束可以认为是偏转了0度所形成(图中扫描单元404与分束单元405之间的实线);第二第二光束是扫描单元404对第一光束偏转了一个较小的角度θ所形成(图中扫描单元404与分束单元405之间的虚线)。该角度θ小于第三光束中相邻两个子光束之间的夹角θ<β,由此通过至少两次扫描之后形成的至少两个第三光束406及407所组成的综合投影图案相对于没有扫描单元404时的第三光束对应的投影图案具有更高的密度,由此便可以提升测量系统的测量分辨率。In the embodiment shown in FIG. 4 , a schematic diagram of the
在一个实施例中,偏转角度θ可以依次设置成通过n次扫描,扫描角度逐次增加从而将综合的投影图案密度增加n倍。在一个实施例中,偏转角度θ可以依次设置成由此可以同时增加投影图案的密度与视场角,即视场角增加了Nβ,中间部分叠加区域的密度增加了n倍。在一个实施例中,偏转角度被设置成超过了第二光束的视场角为α,此时仅仅增加了投影图案的视场角,这一情形同样如图5所示,与前面分析类似,此时图5中504为扫描单元、505为分束单元,由此同样可以形成如图6所示的大视场投影图案。In one embodiment, the deflection angle θ may be sequentially set as Through n scans, the scan angle increases successively This increases the overall projected pattern density by a factor of n. In one embodiment, the deflection angle θ may be sequentially set as As a result, the density of the projection pattern and the viewing angle can be increased at the same time, that is, the viewing angle is increased by Nβ, and the density of the overlapping area in the middle part is increased by n times. In one embodiment, the deflection angle is set to exceed the field of view angle of the second light beam by α, and only the field of view angle of the projection pattern is increased at this time. This situation is also shown in FIG. 5 . Similar to the previous analysis, At this time, in FIG. 5 , 504 is a scanning unit, and 505 is a beam splitting unit, so that a large field of view projection pattern as shown in FIG. 6 can also be formed.
可以理解的是,在图2与图4所示的实施例中,分别给出了分束单元与扫描单元通过相反设置以实现类似的功能,在一些实施例中,也可以在扫描单元前后分别设置第一分束单元以及第二分束单元以实现更加复杂的功能,或者可以在分束单元的前后分别设置第一扫描单元以及第二扫描单元,类似地,可以根据实际需要合理地设置分束单元、扫描单元的数量以及相对位置排布关系。这些方案均落入本发明的保护范围之内。It can be understood that, in the embodiments shown in FIG. 2 and FIG. 4 , the beam splitting unit and the scanning unit are respectively set in opposite directions to achieve similar functions. Set the first beam splitting unit and the second beam splitting unit to achieve more complex functions, or you can set the first scanning unit and the second scanning unit before and after the beam splitting unit. Similarly, the splitting unit can be set reasonably according to actual needs. The number of beam units and scanning units and their relative positional arrangement. These solutions all fall within the protection scope of the present invention.
以上各实施例中,通过对分束单元与扫描单元在功能上进行合理的配置可以形成高密度和/或大视场的投影。然而由于需要将多种光学器件集成在单个发射器中,无疑给制造带来了较大的挑战。为了解决这一问题,本发明还提供一种集成的分束扫描单元。In the above embodiments, a projection with high density and/or a large field of view can be formed by reasonably functionally configuring the beam splitting unit and the scanning unit. However, the need to integrate multiple optical devices into a single emitter undoubtedly brings greater challenges to manufacturing. In order to solve this problem, the present invention also provides an integrated beam splitting scanning unit.
图7是根据本发明一个实施例的集成分束扫描单元示意图。集成分束扫描单元可以被用于图1-图6所示各实施例中的发射器中,也可以被用于其他任意需要的器件中。集成分束扫描单元用于接收第一光束,并将光束进行分束及扫描后形成第三光束。集成分束扫描单元包括第一透明基底701、第二透明基底702、液晶层703以及设置在第一透明基底和/或第二透明基底上的分束单元704。液晶层703用于对入射的光束进行偏转以实现扫描,分束单元704用于对入射的光束进行分束。第一透明基底701、第二透明基底702可以平行相对设置。液晶层703被安装在第一透明基底701以及第二透明基底702之间,基底可以起到保护液晶层的作用。另外根据需要在两个基底之间的液晶层之外还可以增加其他功能层,比如正负电极层,该正负电极层设置在液晶层两侧;在基底外表面或内表面也可以增加偏光层等。FIG. 7 is a schematic diagram of an integrated beam splitting scanning unit according to an embodiment of the present invention. The integrated beam splitting scanning unit can be used in the transmitters in the embodiments shown in FIGS. 1-6 , and can also be used in any other required devices. The integrated beam splitting scanning unit is used for receiving the first beam, splitting and scanning the beam to form a third beam. The integrated beam splitting scanning unit includes a first transparent substrate 701, a second transparent substrate 702, a liquid crystal layer 703, and a beam splitting unit 704 disposed on the first transparent substrate and/or the second transparent substrate. The liquid crystal layer 703 is used to deflect the incident light beam to realize scanning, and the beam splitting unit 704 is used to split the incident light beam. The first transparent substrate 701 and the second transparent substrate 702 may be arranged in parallel and opposite to each other. The liquid crystal layer 703 is installed between the first transparent substrate 701 and the second transparent substrate 702, and the substrate can play a role of protecting the liquid crystal layer. In addition, other functional layers can be added besides the liquid crystal layer between the two substrates as required, such as positive and negative electrode layers, which are arranged on both sides of the liquid crystal layer; polarized light can also be added on the outer or inner surface of the substrate layer etc.
在一个实施例中,集成分束扫描单元包括设置在第一透明基底701与第二透明基底702之间的支撑705,支撑705设置在液晶层周围以保护液晶层同时起到支撑第一透明基底701以及第二透明基底702的作用。支撑可以是任意材料制成,比如半导体材料、粘合剂等。In one embodiment, the integrated beam splitting scanning unit includes a support 705 disposed between the first transparent substrate 701 and the second transparent substrate 702, and the support 705 is disposed around the liquid crystal layer to protect the liquid crystal layer while supporting the first transparent substrate 701 and the role of the second transparent substrate 702 . The support can be made of any material, such as semiconductor materials, adhesives, and the like.
在一个实施例中,分束单元704包括衍射光栅、二元光栅等衍射光学元件、超表面(Metasurface)光学元件中的一种或组合,即在透明基底的表面通过光刻、蚀刻等方式生成衍射光学微结构、超表面结构,从而实现分束单元与扫描单元的高度集成。衍射光学微结构、超表面结构根据实际需要可以形成在第一透明基底701和/或第二透明基底的单个表面或者两个表面上。优选地,将衍射光学微结构形成在单个透明基底的内表面,可以有效地对衍射光学微结构进行保护。In one embodiment, the beam splitting unit 704 includes one or a combination of diffractive optical elements such as a diffraction grating, a binary grating, and a metasurface optical element, that is, generated on the surface of the transparent substrate by means of photolithography, etching, etc. Diffractive optical microstructure and metasurface structure to achieve high integration of beam splitting unit and scanning unit. The diffractive optical microstructure and metasurface structure can be formed on a single surface or both surfaces of the first transparent substrate 701 and/or the second transparent substrate according to actual needs. Preferably, the diffractive optical microstructure is formed on the inner surface of a single transparent substrate, which can effectively protect the diffractive optical microstructure.
本发明还提供了一种制造集成分束扫描单元的方法,包括以下步骤:The present invention also provides a method for manufacturing the integrated beam splitting scanning unit, comprising the following steps:
提供液晶层,用于对入射光束进行偏转以实现扫描;providing a liquid crystal layer for deflecting the incident light beam for scanning;
提供第一透明基底以及第二透明基底,并在第一透明基底和/或第二透明基底的单个表面或者两个表面生成分束单元;providing a first transparent substrate and a second transparent substrate, and generating a beam splitting unit on a single surface or both surfaces of the first transparent substrate and/or the second transparent substrate;
将液晶层安装在第一透明基底以及第二透明基底之间。The liquid crystal layer is mounted between the first transparent substrate and the second transparent substrate.
对于包含支撑的集成分束扫描单元而言,还包括将支撑安装在第一透明基底与第二透明基底之间以及在液晶层外围的步骤。For the integrated beam splitting scanning unit including the support, the step of installing the support between the first transparent substrate and the second transparent substrate and at the periphery of the liquid crystal layer is also included.
对于通过扫描单元对光束实施偏转以实现大视场投影的发射器而言(如图5所示,分束单元与扫描单元位置不做限定,即分束单元可以在扫描单元前面也可以在后面),本发明还提供一种基于分组阵列光源的发射器的动态距离测量系统。该系统中发射器的光源包括阵列光源,且阵列光源中的子光源被分成多个子光源阵列,且各个子光源阵列可以被独立分组控制,在空间排布上,多个子光源阵列可以分区设置即每个子光源阵列拥有独立的空间分区,多个子光源阵列也可以交叉设置,即不同的子光源阵列中子光源在空间排布上有交错。子光源阵列中应包括至少一个子光源。可以理解的是,当子光源阵列被独立打开时,将形成对应的投影图案,投影图案的密度与子光源阵列的密度、数量有关系,含有更密集排列的子光源阵列所对应的投影图案密度越大,另外开启更多数量的子光源阵列所对应的投影图案的密度也越大。基于该分组阵列光源的大视场投影方案(图5所示),测量系统中的处理电路可以实现如下的动态距离测量方法,具体包括如下步骤:For the transmitter that deflects the beam through the scanning unit to realize projection with a large field of view (as shown in Figure 5, the position of the beam splitting unit and the scanning unit is not limited, that is, the beam splitting unit can be in front of or behind the scanning unit. ), the present invention also provides a dynamic distance measurement system based on the transmitter of the grouped array light source. The light source of the transmitter in the system includes an array light source, and the sub-light sources in the array light source are divided into a plurality of sub-light source arrays, and each sub-light source array can be controlled in groups independently. Each sub-light source array has an independent spatial partition, and multiple sub-light source arrays can also be arranged in an intersecting manner, that is, the sub-light source arrays of different sub-light source arrays are staggered in the spatial arrangement. At least one sub-light source should be included in the sub-light source array. It can be understood that when the sub-light source arrays are independently turned on, corresponding projection patterns will be formed. The density of the projection patterns is related to the density and quantity of the sub-light source arrays. The density of the projection patterns corresponding to the more densely arranged sub-light source arrays The larger the density, the higher the density of the projection pattern corresponding to the more number of sub-light source arrays turned on. Based on the large field of view projection scheme of the grouped array light source (shown in Figure 5), the processing circuit in the measurement system can implement the following dynamic distance measurement method, which specifically includes the following steps:
S1、开启至少一个第一子光源阵列,利用扫描单元形成具有第一视场的稀疏投影图案;S1. Turn on at least one first sub-light source array, and use a scanning unit to form a sparse projection pattern with a first field of view;
如图8所示的是根据本发明一个实施例的阵列光源及其稀疏投影图案示意图。发射器中的光源包括光源阵列801,其包括多个子光源阵列,比如第一子光源阵列(图8中空心圆圈所示)以及第二子光源阵列(图8中实心圆圈所示)。首先开启第一子光源阵列,发射器中的分束单元以及扫描单元分别对第一子光源阵列所射出的光束进行分束和扫描(或者先扫描再分束)最终以图8中右侧所示的投影图案802出射,并入射到包含目标804的第一视场区域中。这里示意性地给出分束单元对入射光束进行了2×2倍的复制分束,扫描单元则依次对入射光束进行了3×3的扫描将视场沿横、纵向分别扩大了3倍。8 is a schematic diagram of an array light source and a sparse projection pattern thereof according to an embodiment of the present invention. The light source in the transmitter includes a
S2、获得第一分辨率的第一深度图像,并识别出目标所在区域;采集器采集由稀疏投影图案光束被目标反射回的光信号,并进一步由处理电路计算以获得与稀疏投影图案对应的第一分辨率的第一深度图像,理论上可以获取每个斑点803的深度值,所以斑点的深度值将组成第一深度图像。基于该深度图像可以对视场中的目标进行识别,比如通过阈值分割法、边缘检测法、特征识别等任意合适的方式识别出目标所在的像素区域。S2. Obtain a first depth image with a first resolution, and identify the area where the target is located; the collector collects the light signal reflected by the target from the sparse projection pattern beam, and further calculates it by the processing circuit to obtain a corresponding sparse projection pattern. For the first depth image of the first resolution, the depth value of each
S3、开启至少一个第二子光源阵列,利用扫描单元形成具有第二视场的密集投影图案,并计算第二分辨率的第二深度图像;由于通过上一步骤中对目标进行了识别并定位出目标所在的像素区域,一般而言目标的运动不会太大,同时相邻两次测量的间隔非常短,可以认为相邻两次测量的时间内目标位置不变,因此在本次测量时,则可以由扫描单元仅形成包含目标区域的小于第一视场的第二视场的投影图案,同时可以开启比S1步骤中更多的子光源阵列,以形成相对光束排列密度更大的密集投影图案,基于该密集投影图案,采集器可以获取包含目标的更多斑点的有效数据从而计算出分辨率更高的深度图像,以实现仅对目标区域的高分辨率测量。可以理解的是,这里所说的分辨率泛指的是有效深度值像素的数量,有效深度值像素数量多则分辨率越高,因此第二分辨率要高于第一分辨率。比如图9所示的是根据本发明一个实施例的阵列光源及其密集投影图案示意图。在本实施例中,第一阵列光源与第二阵列光源被同时打开,即同步打开第一子光源阵列与第二子光源阵列,扫描单元仅形成包含目标的由902、903、904、905四个子视场所组成的2×2视场的投影图案,与图8所示实施例相比,视场减小,但投影图案密度增加,由此可以实现在较低功耗下实现更高分辨率的测量。可以理解的是,若光源单元中包含排列密度不同的多个子光源阵列时,比如第一子光源阵列的排列密度小于第二子光源阵列的排列密度,在本步骤中也可以仅开启第二子光源阵列,也可以实现投射密集投影图案的效果。S3, turn on at least one second sub-light source array, use the scanning unit to form a dense projection pattern with a second field of view, and calculate a second depth image with a second resolution; since the target has been identified and positioned in the previous step Generally speaking, the movement of the target will not be too large, and the interval between two adjacent measurements is very short. It can be considered that the target position remains unchanged during the two adjacent measurements. Therefore, during this measurement , the scanning unit can only form the projection pattern of the second field of view that includes the target area, which is smaller than the first field of view, and at the same time, more sub-light source arrays can be turned on than in step S1 to form a denser with a higher relative beam arrangement density. Projection pattern, based on this dense projection pattern, the collector can obtain effective data containing more spots of the target to calculate a higher resolution depth image, so as to achieve high-resolution measurement of only the target area. It can be understood that the resolution mentioned here generally refers to the number of pixels with valid depth values, and the larger the number of pixels with valid depth values, the higher the resolution, so the second resolution is higher than the first resolution. For example, FIG. 9 is a schematic diagram of an array light source and a dense projection pattern thereof according to an embodiment of the present invention. In this embodiment, the first array light source and the second array light source are turned on at the same time, that is, the first sub-light source array and the second sub-light source array are turned on synchronously, and the scanning unit only forms four parts consisting of 902, 903, 904, 905 including the target. Compared with the embodiment shown in FIG. 8, the projection pattern of the 2×2 field of view composed of the sub-fields of view has a reduced field of view, but the density of the projection pattern is increased, so that higher resolution can be achieved at lower power consumption. Measurement. It can be understood that, if the light source unit includes multiple sub-light source arrays with different arrangement densities, for example, the arrangement density of the first sub-light source array is smaller than that of the second sub-light source array, in this step, only the second sub-light source array can be turned on. The light source array can also achieve the effect of projecting dense projection patterns.
可以理解的是,以上各实施例中是以飞行时间距离测量系统为例进行说明了,但相关的发射器、动态距离测量方案同样可以应用在其他测量系统如结构光三维测量系统中。It can be understood that the above embodiments are described by taking the time-of-flight distance measurement system as an example, but the related transmitter and dynamic distance measurement scheme can also be applied to other measurement systems such as structured light three-dimensional measurement systems.
可以理解的是,当将本发明的距离测距系统嵌入装置或硬件中时会作出相应的结构或部件变化以适应需求,其本质仍然采用本发明的距离测距系统,所以应当视为本发明的保护范围。以上内容是结合具体/优选的实施方式对本发明所作的进一步详细说明,不能认定本发明的具体实施只局限于这些说明。对于本发明所属技术领域的普通技术人员来说,在不脱离本发明构思的前提下,其还可以对这些已描述的实施方式做出若干替代或变型,而这些替代或变型方式都应当视为属于本发明的保护范围。在本说明书的描述中,参考术语“一种实施例”、“一些实施例”、“优选实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。It can be understood that when the distance and distance measuring system of the present invention is embedded in a device or hardware, corresponding structural or component changes will be made to meet the needs, and the essence of the present invention is still to use the distance and distance measuring system of the present invention. Therefore, it should be regarded as the present invention. scope of protection. The above content is a further detailed description of the present invention in conjunction with specific/preferred embodiments, and it cannot be considered that the specific implementation of the present invention is limited to these descriptions. For those skilled in the art to which the present invention pertains, without departing from the concept of the present invention, they can also make several substitutions or modifications to the described embodiments, and these substitutions or modifications should be regarded as It belongs to the protection scope of the present invention. In the description of this specification, reference to the terms "one embodiment," "some embodiments," "preferred embodiment," "example," "specific example," or "some examples" or the like is meant to be used in conjunction with the description. A particular feature, structure, material, or characteristic described by an example or example is included in at least one embodiment or example of the present invention.
在本说明书中,对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外,在不相互矛盾的情况下,本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。尽管已经详细描述了本发明的实施例及其优点,但应当理解,在不脱离由所附权利要求限定的范围的情况下,可以在本文中进行各种改变、替换和变更。In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, those skilled in the art may combine and combine the different embodiments or examples described in this specification, as well as the features of the different embodiments or examples, without conflicting each other. Although the embodiments of the present invention and their advantages have been described in detail, it should be understood that various changes, substitutions and alterations can be made herein without departing from the scope as defined by the appended claims.
此外,本发明的范围不旨在限于说明书中所述的过程、机器、制造、物质组成、手段、方法和步骤的特定实施例。本领域普通技术人员将容易理解,可以利用执行与本文所述相应实施例基本相同功能或获得与本文所述实施例基本相同结果的目前存在的或稍后要开发的上述披露、过程、机器、制造、物质组成、手段、方法或步骤。因此,所附权利要求旨在将这些过程、机器、制造、物质组成、手段、方法或步骤包含在其范围内。Furthermore, the scope of the present invention is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification. Those of ordinary skill in the art will readily appreciate that the above disclosures, processes, machines, now existing or later developed, that perform substantially the same functions or achieve substantially the same results as the corresponding embodiments described herein can be utilized. Manufacture, composition of matter, means, method or step. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps.
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---|---|---|---|---|
CN111505836A (en) * | 2020-06-30 | 2020-08-07 | 常州纵慧芯光半导体科技有限公司 | Electronic equipment of three-dimensional formation of image |
CN111555116A (en) * | 2020-06-19 | 2020-08-18 | 宁波舜宇奥来技术有限公司 | Inverted vcsel light source and TOF module |
WO2021056666A1 (en) * | 2019-09-27 | 2021-04-01 | 深圳奥锐达科技有限公司 | Transmitter and distance measuring system |
WO2021196976A1 (en) * | 2020-03-31 | 2021-10-07 | 华为技术有限公司 | Light emitting apparatus and electronic device |
CN117368886A (en) * | 2022-06-30 | 2024-01-09 | 深圳市速腾聚创科技有限公司 | Laser emission module and laser radar |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101308211A (en) * | 2008-06-24 | 2008-11-19 | 中国电子科技集团公司第十一研究所 | Laser differential scanning detection method and system |
US20150268346A1 (en) * | 2014-03-19 | 2015-09-24 | Kabushiki Kaisha Toshiba | Optical axis directing apparatus |
US20180120559A1 (en) * | 2016-10-28 | 2018-05-03 | Magic Leap, Inc. | Method and system for large field of view display with scanning reflector |
CN108226899A (en) * | 2018-01-17 | 2018-06-29 | 上海禾赛光电科技有限公司 | Laser radar and its method of work |
WO2018205355A1 (en) * | 2017-05-09 | 2018-11-15 | 深圳奥比中光科技有限公司 | Array laser projection device and depth camera |
CN208351151U (en) * | 2018-06-13 | 2019-01-08 | 深圳奥比中光科技有限公司 | Projective module group, depth camera and electronic equipment |
CN109343032A (en) * | 2018-09-19 | 2019-02-15 | 中国电子科技集团公司第三十八研究所 | A kind of laser thunder emission system based on diffraction beam splitting element |
US20190094346A1 (en) * | 2017-09-25 | 2019-03-28 | Hexagon Technology Center Gmbh | Multi-beam laser scanner |
US10324170B1 (en) * | 2018-04-05 | 2019-06-18 | Luminar Technologies, Inc. | Multi-beam lidar system with polygon mirror |
CN110275177A (en) * | 2019-06-10 | 2019-09-24 | 深圳市速腾聚创科技有限公司 | Solid-state laser radar, structure and its control method |
CN110716190A (en) * | 2019-09-27 | 2020-01-21 | 深圳奥锐达科技有限公司 | A transmitter and distance measurement system |
CN110824490A (en) * | 2019-09-27 | 2020-02-21 | 深圳奥锐达科技有限公司 | Dynamic distance measuring system and method |
CN211148903U (en) * | 2019-09-27 | 2020-07-31 | 深圳奥锐达科技有限公司 | Transmitter and distance measurement system |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110658529B (en) * | 2019-09-27 | 2025-04-29 | 深圳奥锐达科技有限公司 | Integrated beam splitting scanning unit and manufacturing method thereof |
-
2019
- 2019-09-27 CN CN201910927183.4A patent/CN110716189A/en active Pending
- 2019-10-28 WO PCT/CN2019/113705 patent/WO2021056667A1/en active Application Filing
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101308211A (en) * | 2008-06-24 | 2008-11-19 | 中国电子科技集团公司第十一研究所 | Laser differential scanning detection method and system |
US20150268346A1 (en) * | 2014-03-19 | 2015-09-24 | Kabushiki Kaisha Toshiba | Optical axis directing apparatus |
US20180120559A1 (en) * | 2016-10-28 | 2018-05-03 | Magic Leap, Inc. | Method and system for large field of view display with scanning reflector |
WO2018205355A1 (en) * | 2017-05-09 | 2018-11-15 | 深圳奥比中光科技有限公司 | Array laser projection device and depth camera |
US20190094346A1 (en) * | 2017-09-25 | 2019-03-28 | Hexagon Technology Center Gmbh | Multi-beam laser scanner |
CN108226899A (en) * | 2018-01-17 | 2018-06-29 | 上海禾赛光电科技有限公司 | Laser radar and its method of work |
US10324170B1 (en) * | 2018-04-05 | 2019-06-18 | Luminar Technologies, Inc. | Multi-beam lidar system with polygon mirror |
CN208351151U (en) * | 2018-06-13 | 2019-01-08 | 深圳奥比中光科技有限公司 | Projective module group, depth camera and electronic equipment |
CN109343032A (en) * | 2018-09-19 | 2019-02-15 | 中国电子科技集团公司第三十八研究所 | A kind of laser thunder emission system based on diffraction beam splitting element |
CN110275177A (en) * | 2019-06-10 | 2019-09-24 | 深圳市速腾聚创科技有限公司 | Solid-state laser radar, structure and its control method |
CN110716190A (en) * | 2019-09-27 | 2020-01-21 | 深圳奥锐达科技有限公司 | A transmitter and distance measurement system |
CN110824490A (en) * | 2019-09-27 | 2020-02-21 | 深圳奥锐达科技有限公司 | Dynamic distance measuring system and method |
CN211148903U (en) * | 2019-09-27 | 2020-07-31 | 深圳奥锐达科技有限公司 | Transmitter and distance measurement system |
Non-Patent Citations (1)
Title |
---|
吕跃广: "《现代激光技术及应用丛书 激光对抗原理与应用》", 31 December 2015, 国防工业出版社, pages: 261 - 267 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021056666A1 (en) * | 2019-09-27 | 2021-04-01 | 深圳奥锐达科技有限公司 | Transmitter and distance measuring system |
WO2021196976A1 (en) * | 2020-03-31 | 2021-10-07 | 华为技术有限公司 | Light emitting apparatus and electronic device |
CN111555116A (en) * | 2020-06-19 | 2020-08-18 | 宁波舜宇奥来技术有限公司 | Inverted vcsel light source and TOF module |
CN111505836A (en) * | 2020-06-30 | 2020-08-07 | 常州纵慧芯光半导体科技有限公司 | Electronic equipment of three-dimensional formation of image |
CN111505836B (en) * | 2020-06-30 | 2020-09-22 | 常州纵慧芯光半导体科技有限公司 | Electronic equipment of three-dimensional formation of image |
CN117368886A (en) * | 2022-06-30 | 2024-01-09 | 深圳市速腾聚创科技有限公司 | Laser emission module and laser radar |
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