CN110701803B

CN110701803B - Colored solar energy absorbing coating and preparation method thereof

Info

Publication number: CN110701803B
Application number: CN201910964386.0A
Authority: CN
Inventors: 高祥虎; 刘刚
Original assignee: Lanzhou Institute of Chemical Physics LICP of CAS
Current assignee: Lanzhou Institute of Chemical Physics LICP of CAS
Priority date: 2019-10-11
Filing date: 2019-10-11
Publication date: 2021-03-23
Anticipated expiration: 2039-10-11
Also published as: CN110701803A

Abstract

The invention relates to a color solar energy absorption coating, which is composed of an endothermic base composed of polished stainless steel sheet, an infrared reflection layer composed of metal Al, a main absorption layer composed of MoNbHfZrTiN, a secondary absorption layer composed of MoNbHfZrTiNO and SiO ₂ composition of the anti-reflection layer. The main absorption layer refers to the nitride of MoNbHfZrTi high-entropy alloy prepared by the smelting method using the metals Mo, Nb, Hf, Zr and Ti in equal molar ratios; the secondary absorption layer refers to the metallic Mo, Nb, Hf, Zr and Ti are oxynitrides of MoNbHfZrTi high-entropy alloy prepared by smelting method. The invention also discloses a preparation method of the coating. The preparation process of the invention is simple and the cost is low. Under the condition of the air quality factor AM1.5, the prepared color coating has an absorptivity of ≥0.91 and an emissivity of ≤0.12, and has rich colors at the same time. The field has a wide range of practical value and application prospects.

Description

Colored solar energy absorbing coating and preparation method thereof

Technical Field

The invention relates to the technical field of solar energy absorbing coatings, in particular to a colored solar energy absorbing coating and a preparation method thereof.

Background

Solar photo-thermal utilization is the most direct and effective way for human to utilize solar energy. The solar spectrum selective absorption coating is a core material for realizing photothermal conversion, and generally requires high absorptivity and low emissivity. In recent years, transition metal nitride and oxynitride systems have been extensively studied in the construction of solar energy absorbing coating film systems, such as: WSiAlN_x/WSiAlO_yN_x/SiAlO_x，WAlN/WAlON/Al₂O₃，ZrSiN/ZrSiON/SiO₂，NbMoN/NbMoON/SiO₂，Cr/CrN_x/CrN_xO_y/SiO₂，TiAlSiN/TiAlSiON/SiO₂And CrN/AlCrNO/AlCrO. Along with solar energy buildingThe development of building integration, colored solar energy absorption coating has gained wide attention. However, the current research on the construction of solar energy absorbing coatings using transition metal nitride and oxynitride systems focuses more on the high temperature performance and little research on the color thereof.

The high-entropy alloy is one of the important discoveries in the field of metal materials in recent years. Compared with the traditional metal material, which mainly uses one element (such as titanium alloy and steel), the high-entropy alloy generally comprises at least four alloy elements with similar proportions, and the unique alloy design concept can embody the collective effect of various elements, often has a novel structure and excellent comprehensive performance, and has been widely concerned in key fields of aerospace, ships, nuclear energy, automobiles, electronics and the like. As a brand new alloy, high-entropy alloy has been widely paid attention to due to its excellent properties such as high strength, high wear resistance, high corrosion resistance and high temperature softening resistance. However, no report is found on the research of applying the high-entropy alloy to the colored solar energy absorption coating.

Disclosure of Invention

The invention aims to provide a colored solar energy absorbing coating.

The invention also provides a preparation method of the colored solar energy absorption coating.

In order to solve the above problems, the present invention provides a color solar energy absorbing coating, which is characterized in that: the coating comprises a heat absorber substrate made of polished stainless steel sheets, an infrared reflecting layer made of metal Al, a main absorbing layer made of MoNbHfZrTiN, a secondary absorbing layer made of MoNbHfZrTiNO and SiO₂The formed antireflection layer; the main absorption layer is a nitride of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method; the secondary absorption layer is a nitrogen oxide of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method.

The roughness value of the heat absorber substrate is 0.5-3 nm.

The thickness of the infrared reflecting layer is 20-50 nm.

The thickness of the main absorption layer is 30-60 nm.

The thickness of the secondary absorption layer is 30-70 nm.

The thickness of the antireflection layer is 60-100 nm.

The MoNbHfZrTi high-entropy alloy is prepared by putting Mo, Nb, Hf, Zr and Ti with equal molar ratio into a graphite crucible, then putting the graphite crucible into a vacuum smelting furnace, and vacuumizing to 5 x 10^-6~8×10^-6And (3) Torr, melting at 2650-3000 ℃, pouring and forming, cutting and polishing to obtain the material.

The preparation method of the colored solar energy absorption coating comprises the following steps:

processing a heat absorbing body substrate;

preparing an infrared reflecting layer on the heat absorber substrate after treatment: al with the purity of 99.99 percent is used as a magnetron sputtering target material and is prepared by adopting a direct current magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: pre-vacuum pumping the vacuum chamber to 3.0 x 10^-6~7.0×10^-6Torr; the sputtering power density of the Al target material is 3-7W/m^-2The air inflow of argon is 20-50 sccm during sputtering deposition, and the thickness of deposited Al is 20-50 nm;

preparing a main absorption layer on the infrared reflection layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by a radio frequency reaction magnetron sputtering method in the atmosphere of argon and nitrogen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target is 2-6W/cm^-2The air inflow of argon is 20-50 sccm during sputtering deposition, the air inflow of nitrogen is 0.5-5 sccm, and the thickness of the deposited MoNbHfZrTiN is 30-60 nm;

preparing a secondary absorption layer on the primary absorption layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by adopting a radio frequency reaction magnetron sputtering method in the atmosphere of argon, nitrogen and oxygen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target is 2-6W/cm^-2The air inflow of argon is 20-50 sccm during sputter deposition, the air inflow of nitrogen is 5-12 sccm, the air inflow of oxygen is 2-6 sccm, and the thickness of the deposited MoNbHfZrTiNO is 30-70 nm;

preparing an antireflection layer on the secondary absorption layer: with SiO of 99.99% purity₂The target material is prepared by adopting a radio frequency magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: SiO 2₂The sputtering power density of the target material is 5-10W/cm^-2The air inflow of the argon during sputtering deposition is 20-50 sccm, and the deposition thickness is 60-100 nm.

The heat absorber substrate treatment in the step refers to that after impurities attached to the surface of a polished stainless steel sheet of the substrate are removed, the polished stainless steel sheet is ultrasonically cleaned in acetone and absolute ethyl alcohol for 10-20 minutes respectively, and nitrogen is dried and stored.

Compared with the prior art, the invention has the following advantages:

1. according to the invention, nitrides and nitrogen oxides of high-entropy alloy (MoNbHfZrTi) prepared from metals Mo, Nb, Hf, Zr and Ti with equal molar ratios are selected as basic materials, and a color solar energy absorbing coating is prepared by utilizing the collective effect of various metal elements, so that the application field of the high-entropy alloy is greatly expanded, and the film system structure of the solar energy absorbing coating is enriched and developed.

2. The absorptivity of the prepared color coating is more than or equal to 0.91 and the emissivity is less than or equal to 0.12 under the condition of an atmospheric quality factor AM 1.5.

3. The preparation method is simple in preparation process and low in cost, and the prepared coating has high absorptivity and low emissivity, has rich colors, and has wide practical value and application prospect in the field of solar heat utilization and building integration.

Drawings

The following describes embodiments of the present invention in further detail with reference to the accompanying drawings.

FIG. 1 is a block diagram of the present invention.

Fig. 2 is a digital photograph of a bluish solar absorbing coating of the invention.

Fig. 3 is a digital photograph of an orange solar absorptive coating of the invention.

Fig. 4 is a digital photograph of a yellowish solar energy absorbing coating of the present invention.

Fig. 5 is a digital photograph of a deep blue solar absorbing coating of the present invention.

Detailed Description

Example 1 as shown in fig. 1, a colored solar absorptive coating is composed of a heat absorber substrate made of polished stainless steel sheet with a roughness value of 1 nm, an infrared reflecting layer made of metallic Al and having a thickness of 46 nm, a main absorbing layer made of MoNbHfZrTiN and having a thickness of 45 nm, a sub absorbing layer made of MoNbHfZrTiNO and having a thickness of 36nm, and SiO₂And an antireflection layer with a thickness of 89 nm. The main absorption layer is a nitride of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method; the secondary absorption layer is a nitrogen oxide of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method.

Wherein: the MoNbHfZrTi high-entropy alloy is prepared by putting Mo, Nb, Hf, Zr and Ti with equal molar ratio into a graphite crucible, putting the graphite crucible into a vacuum smelting furnace, and vacuumizing to 5 x 10^-6~8×10^-6And (3) Torr, melting at 2650-3000 ℃, pouring and forming, cutting and polishing to obtain the material.

A preparation method of a colored solar energy absorption coating comprises the following steps:

the method comprises the following steps of treating a heat absorbing body substrate: removing impurities attached to the surface of the polished stainless steel sheet of the substrate, respectively ultrasonically cleaning the polished stainless steel sheet in acetone and absolute ethyl alcohol for 15 minutes, and blow-drying and storing the polished stainless steel sheet by nitrogen.

Preparing an infrared reflecting layer on the treated heat absorber substrate: al with the purity of 99.99 percent is used as a magnetron sputtering target material and is prepared by adopting a direct current magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: pre-vacuum pumping the vacuum chamber to 5.0 x 10^-6Torr; the sputtering power density of the Al target material is 5.48W/m^-2The air inflow of argon during sputtering deposition is 40sccm, and the thickness of deposited Al is 46 nm.

Preparing a main absorption layer on the infrared reflection layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by a radio frequency reaction magnetron sputtering method in the atmosphere of argon and nitrogen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 3.96W/cm^-2The air inflow of argon during sputtering deposition is 40sccm, the air inflow of nitrogen is 1 sccm, and the thickness of the deposited MoNbHfZrTiN is 45 nm.

Preparing a secondary absorption layer on the primary absorption layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by adopting a radio frequency reaction magnetron sputtering method in the atmosphere of argon, nitrogen and oxygen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 3.96W/cm^-2The air inflow of argon during sputtering deposition is 40sccm, the air inflow of nitrogen is 8sccm, the air inflow of oxygen is 4sccm, and the thickness of the deposited MoNbHfZrTiNO is 36 nm.

Preparing an antireflection layer on the secondary absorption layer: with SiO of 99.99% purity₂The target material is prepared by adopting a radio frequency magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: SiO 2₂The sputtering power density of the target material is 6W/cm^-2The air inflow of the argon gas during the sputtering deposition is 40sccm, and the deposition thickness is 89 nm.

The color of the coating is light blue, and a digital photo is shown in figure 2; under the condition of an atmospheric quality factor AM1.5, the absorptivity of the coating is 0.94, and the emissivity is 0.09.

EXAMPLE 2A colored solar absorptive coating comprising a heat absorber substrate of polished stainless steel sheet with a roughness value of 0.5 nm, an infrared reflecting layer of 20 nm thickness made of metallic Al, a main absorbing layer of 30nm thickness made of MoNbHfZrTiN, a sub absorbing layer of 30nm thickness made of MoNbHfZrTiNO, and SiO₂And an antireflection layer with a thickness of 60 nm. The main absorption layer is a nitride of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method; the secondary absorption layer is a nitrogen oxide of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method.

Wherein: the same applies to the high entropy MoNbHfZrTi alloy as in example 1.

the method comprises the following steps of treating a heat absorbing body substrate: removing impurities attached to the surface of the polished stainless steel sheet of the substrate, respectively ultrasonically cleaning the polished stainless steel sheet in acetone and absolute ethyl alcohol for 10 minutes, and blow-drying and storing the polished stainless steel sheet by nitrogen.

Preparing an infrared reflecting layer on the treated heat absorber substrate: al with the purity of 99.99 percent is used as a magnetron sputtering target material and is prepared by adopting a direct current magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: pre-vacuum pumping the vacuum chamber to 3.0 x 10^-6Torr; the sputtering power density of the Al target material is 3W/m^-2The air inflow of argon during sputtering deposition is 20sccm, and the thickness of deposited Al is 20 nm.

Preparing a main absorption layer on the infrared reflection layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by a radio frequency reaction magnetron sputtering method in the atmosphere of argon and nitrogen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 2W/cm^-2The air inflow of argon during sputtering deposition is 20sccm, the air inflow of nitrogen is 0.5 sccm, and the thickness of the deposited MoNbHfZrTiN is 30 nm.

Preparing a secondary absorption layer on the primary absorption layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by adopting a radio frequency reaction magnetron sputtering method in the atmosphere of argon, nitrogen and oxygen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 2W/cm^-2The air inflow of argon during sputtering deposition is 20sccm, the air inflow of nitrogen is 5sccm, the air inflow of oxygen is 2sccm, and the thickness of the deposited MoNbHfZrTiNO is 30 nm.

Preparing an antireflection layer on the secondary absorption layer: with SiO of 99.99% purity₂The target material is prepared by adopting a radio frequency magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: SiO 2₂The sputtering power density of the target material is 5W/cm^-2The air inflow of the argon gas during the sputtering deposition is 20sccm, and the deposition thickness is 60 nm.

The color of the coating is orange red, and a digital photo is shown in figure 3; the absorption rate and the emissivity of the material are respectively 0.92 and 0.12 under the condition of an atmospheric quality factor AM 1.5.

EXAMPLE 3A colored solar absorbing coating comprising a heat absorber substrate of polished stainless steel sheet having a roughness value of 3 nm, a thickness of metallic AlAn infrared reflecting layer with a thickness of 50 nm, a main absorbing layer with a thickness of 60 nm and composed of MoNbHfZrTiN, a sub-absorbing layer with a thickness of 70nm and composed of MoNbHfZrTiNO, and SiO₂And an antireflection layer with a thickness of 100 nm. The main absorption layer is a nitride of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method; the secondary absorption layer is a nitrogen oxide of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method.

Wherein: the same applies to the high entropy MoNbHfZrTi alloy as in example 1.

the method comprises the following steps of treating a heat absorbing body substrate: removing impurities attached to the surface of the polished stainless steel sheet of the substrate, respectively ultrasonically cleaning in acetone and absolute ethyl alcohol for 20 minutes, and blow-drying and storing by nitrogen.

Preparing an infrared reflecting layer on the treated heat absorber substrate: al with the purity of 99.99 percent is used as a magnetron sputtering target material and is prepared by adopting a direct current magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: pre-vacuum pumping the vacuum chamber to 7.0 x 10^-6Torr; the sputtering power density of the Al target material is 7W/m^-2The air inflow of argon during sputtering deposition is 50sccm, and the thickness of deposited Al is 50 nm.

Preparing a main absorption layer on the infrared reflection layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by a radio frequency reaction magnetron sputtering method in the atmosphere of argon and nitrogen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 6W/cm^-2The air inflow of argon during sputtering deposition is 50sccm, the air inflow of nitrogen is 5sccm, and the thickness of the deposited MoNbHfZrTiN is 60 nm.

Preparing a secondary absorption layer on the primary absorption layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by adopting a radio frequency reaction magnetron sputtering method in the atmosphere of argon, nitrogen and oxygen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 6W/cm^-2The air inflow of argon is 50sccm during sputtering deposition, and the air inflow of nitrogen is 12sccmThe air inflow of the oxygen is 6sccm, and the thickness of the deposited MoNbHfZrTiNO is 70 nm.

Preparing an antireflection layer on the secondary absorption layer: with SiO of 99.99% purity₂The target material is prepared by adopting a radio frequency magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: SiO 2₂The sputtering power density of the target material is 10W/cm^-2The air inflow of the argon gas during the sputtering deposition is 50sccm, and the deposition thickness is 100 nm.

The color of the coating is light yellow, and a digital photo is shown in figure 4; the absorption rate and the emissivity of the material are respectively 0.92 and 0.10 under the condition of an atmospheric quality factor AM 1.5.

EXAMPLE 4A colored solar absorptive coating comprising a heat absorber substrate of polished stainless steel sheet having a roughness value of 2 nm, an infrared reflecting layer of 45 nm thickness of metallic Al, a primary absorber layer of 50 nm thickness of MoNbHfZrTiN, a secondary absorber layer of 55nm thickness of MoNbHfZrTiNO, and SiO₂And an antireflection layer with the thickness of 80 nm is formed. The main absorption layer is a nitride of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method; the secondary absorption layer is a nitrogen oxide of MoNbHfZrTi high-entropy alloy prepared by adopting metals Mo, Nb, Hf, Zr and Ti with equal molar ratio through a smelting method.

Wherein: the same applies to the high entropy MoNbHfZrTi alloy as in example 1.

the method comprises the following steps of treating a heat absorbing body substrate: removing impurities attached to the surface of the polished stainless steel sheet of the substrate, respectively ultrasonically cleaning the polished stainless steel sheet in acetone and absolute ethyl alcohol for 16 minutes, and blow-drying and storing the polished stainless steel sheet by nitrogen.

Preparing an infrared reflecting layer on the treated heat absorber substrate: al with the purity of 99.99 percent is used as a magnetron sputtering target material and is prepared by adopting a direct current magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: pre-vacuum pumping the vacuum chamber to 4.0X 10^-6Torr; the sputtering power density of the Al target material is 5.5W/m^-2The air inflow of argon during sputtering deposition is 35 sccm, and the thickness of deposited Al is 45 nm.

Preparing a main absorption layer on the infrared reflection layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by a radio frequency reaction magnetron sputtering method in the atmosphere of argon and nitrogen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 4.5W/cm^-2The air inflow of argon during sputtering deposition is 40sccm, the air inflow of nitrogen is 2.5sccm, and the thickness of the deposited MoNbHfZrTiN is 50 nm.

Preparing a secondary absorption layer on the primary absorption layer: the high-entropy alloy MoNbHfZrTi with the purity of 99.9 percent is used as a sputtering target material and is prepared by adopting a radio frequency reaction magnetron sputtering method in the atmosphere of argon, nitrogen and oxygen; wherein the working parameters are as follows: the sputtering power density of the MoNbHfZrTi target material is 4.6W/cm^-2The air inflow of argon during sputtering deposition is 40sccm, the air inflow of nitrogen is 8sccm, the air inflow of oxygen is 2.5sccm, and the thickness of the deposited MoNbHfZrTiNO is 55 nm.

Preparing an antireflection layer on the secondary absorption layer: with SiO of 99.99% purity₂The target material is prepared by adopting a radio frequency magnetron sputtering method in an argon atmosphere; wherein the working parameters are as follows: SiO 2₂The sputtering power density of the target material is 8W/cm^-2The air inflow of argon during sputtering deposition is 40sccm, and the deposition thickness is 80 nm.

The color of the coating is light blue, and a digital photo is shown in figure 5; the absorption rate and the emissivity of the material are respectively 0.91 and 0.10 under the condition of an atmospheric quality factor AM 1.5.

Claims

1. a colored solar energy absorption coating is characterized in that: the main absorption layer that this coating is made up of the heat sink base that polished stainless steel sheet is made of, the infrared reflection layer that metal Al is made of, the main absorption layer that MoNbHfZrTiN is made of, the sub-absorbing layer that MoNbHfZrTiNO is made of and The anti-reflection layer composed of SiO ₂ is composed of; the main absorption layer refers to the nitride of MoNbHfZrTi high-entropy alloy prepared by the smelting method using the metals Mo, Nb, Hf, Zr and Ti in equal molar ratios; the secondary absorption layer is Refers to the oxynitride of MoNbHfZrTi high-entropy alloy prepared by smelting with equimolar ratio of Mo, Nb, Hf, Zr, Ti; the roughness value of the endothermic substrate is 0.5~3 nm; the infrared reflection The thickness of the layer is 20-50 nm; the thickness of the main absorption layer is 30-60 nm; the thickness of the secondary absorption layer is 30-70 nm; the thickness of the anti-reflection layer is 60-100 nm; MoNbHfZrTi high-entropy alloy refers to putting equimolar ratios of Mo, Nb, Hf, Zr, Ti into a graphite crucible, and then putting it into a vacuum melting furnace and vacuuming to 5×10 ^-6 ~8×10 ^-6 Torr, melted at 2650~3000℃, poured into shape, cut and polished.

2. the preparation method of a kind of colored solar energy absorption coating as claimed in claim 1, comprises the following steps:

(1) Treatment of the endothermic substrate;

(2) Prepare an infrared reflection layer on the treated heat sink substrate: use Al with a purity of 99.99% as a magnetron sputtering target, and use a DC magnetron sputtering method in an argon atmosphere; wherein the working parameters : The vacuum chamber pre-pumps the background vacuum to 3.0×10 ^-6 ~7.0×10 ^-6 Torr; the sputtering power density of the Al target is 3~7 W/m ^-2 , and the amount of argon gas in the sputter deposition is is 20~50 sccm, and the deposited Al thickness is 20~50 nm;

(3) The main absorption layer is prepared on the infrared reflection layer: the MoNbHfZrTi high-entropy alloy with the purity of 99.9% is used as the sputtering target, and the radio frequency reactive magnetron sputtering method is used in the atmosphere of argon and nitrogen to prepare; wherein the working parameters : The sputtering power density of the MoNbHfZrTi target is 2~6W/cm ^-2 , the inflow rate of argon gas is 20~50 sccm, the inflow rate of nitrogen gas is 0.5~5 sccm, and the thickness of the deposited MoNbHfZrTiN is 30~60 nm;

(4) Preparation of the secondary absorption layer on the main absorption layer: using a MoNbHfZrTi high-entropy alloy with a purity of 99.9% as a sputtering target, and using a radio frequency reactive magnetron sputtering method in an argon, nitrogen and oxygen atmosphere; wherein; Working parameters: The sputtering power density of MoNbHfZrTi target material is 2~6W/cm ^-2 , the intake air volume of argon is 20~50sccm, the intake volume of nitrogen gas is 5~12sccm, and the intake volume of oxygen gas is 20~50sccm during sputter deposition. is 2~6sccm, and the thickness of the deposited MoNbHfZrTiNO is 30~70nm;

(5) The anti-reflection layer is prepared on the secondary absorption layer: SiO ₂ with a purity of 99.99% is used as the magnetron sputtering target, and is prepared by the radio frequency magnetron sputtering method in an argon atmosphere; wherein the working parameters: SiO ₂ target The sputtering power density of the material is 5~10W/cm ^-2 , the amount of argon gas in the sputter deposition is 20~50 sccm, and the deposition thickness is 60~100 nm.

3. the preparation method of a kind of colored solar energy absorption coating as claimed in claim 2 is characterized in that: in the described step (1), the treatment of the heat sink base refers to after removing the impurities attached to the surface of the base polished stainless steel sheet, respectively Ultrasonic cleaning in acetone and absolute ethanol for 10 to 20 minutes, and nitrogen drying for storage.