[go: up one dir, main page]

CN110628350A - Protective film for protecting workpieces in a processing state and use thereof - Google Patents

Protective film for protecting workpieces in a processing state and use thereof Download PDF

Info

Publication number
CN110628350A
CN110628350A CN201810659122.XA CN201810659122A CN110628350A CN 110628350 A CN110628350 A CN 110628350A CN 201810659122 A CN201810659122 A CN 201810659122A CN 110628350 A CN110628350 A CN 110628350A
Authority
CN
China
Prior art keywords
layer
protective film
adhesive layer
workpiece
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
CN201810659122.XA
Other languages
Chinese (zh)
Inventor
周亮吉
范珩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai HIUV New Materials Co Ltd
Original Assignee
Shanghai HIUV New Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai HIUV New Materials Co Ltd filed Critical Shanghai HIUV New Materials Co Ltd
Priority to CN201810659122.XA priority Critical patent/CN110628350A/en
Publication of CN110628350A publication Critical patent/CN110628350A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/123Treatment by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/08Macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2323/00Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
    • C08J2323/02Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
    • C08J2323/04Homopolymers or copolymers of ethene
    • C08J2323/06Polyethene
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/10Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
    • C09J2301/12Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
    • C09J2301/122Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present only on one side of the carrier, e.g. single-sided adhesive tape
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/408Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2423/00Presence of polyolefin
    • C09J2423/04Presence of homo or copolymers of ethene
    • C09J2423/046Presence of homo or copolymers of ethene in the substrate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2423/00Presence of polyolefin
    • C09J2423/10Presence of homo or copolymers of propene
    • C09J2423/106Presence of homo or copolymers of propene in the substrate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2467/00Presence of polyester
    • C09J2467/005Presence of polyester in the release coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesive Tapes (AREA)

Abstract

The invention relates to a protective film for protecting a workpiece in a processing state, which is adhered to the surface of the workpiece, and sequentially comprises the following components: the substrate layer comprises a polypropylene layer and a polyethylene layer; an adhesive layer, the polyethylene layer of the substrate layer disposed adjacent to the adhesive layer, the adhesive comprising a vinyl siloxane and an acrylate; and a release layer comprising a release surface disposed adjacent to the adhesive layer; after the protective film is formed, the vinyl siloxane and the acrylate in the adhesive layer are subjected to crosslinking reaction through electron beam irradiation treatment. The high-temperature resistant protective film can be used for the process protection of high-precision workpieces such as the grinding of semiconductor wafers, the cutting of glass screens or organic glass screen products, the cutting and processing of steel plates and the like.

Description

Protective film for protecting workpieces in a processing state and use thereof
Technical Field
The invention relates to the technical field of protective films, in particular to a protective film for protecting a workpiece in a processing state and application thereof.
Background
In the manufacturing process of metal or nonmetal precision workpieces, the workpieces are often scratched or polluted by substances such as grinding fluid and cutting scraps during the processes of grinding, thinning, CNC cutting and the like, so that the problems of poor appearance quality, warping, poor surface precision and the like are caused.
Therefore, a protective film is needed which has high cleanliness and extremely low content of ionic impurities, has excellent dimensional stability, moderate adhesiveness and thermal stability, can be well adhered to a workpiece in grinding and thinning processing, and can prevent a glue layer from being separated at high temperature generated by grinding. Meanwhile, the protective film also has the function of protecting the surface of the workpiece from being polluted by other impurities; after processing, the adhesiveness of the adhesive layer is not changed, the protective film is easy to peel off from the workpiece, the protective film does not shrink, and the workpiece is prevented from warping and deforming along with the protective film.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a protective film for protecting a workpiece in a processing state, wherein the adhesive layer can form a net structure, improve the heat resistance and aging resistance, and enhance the chemical stability and solvent resistance.
In order to achieve the above object, the protective film for protecting a workpiece in a processed state of the present invention and its applications are as follows:
the invention provides a protective film for protecting a workpiece in a processing state, which is removably adhered to the surface of the workpiece, and is characterized in that the protective film sequentially comprises:
the substrate layer comprises a polypropylene layer and a polyethylene layer;
an adhesive layer, the polyethylene layer of the substrate layer disposed adjacent to the adhesive layer, the adhesive comprising a vinyl siloxane and an acrylate; and
a release layer comprising a release surface disposed adjacent to the adhesive layer;
after the protective film is formed, the vinyl siloxane and the acrylate in the adhesive layer are subjected to crosslinking reaction through electron beam irradiation treatment.
Preferably, the adhesive layer comprises the following raw materials in parts by mass: 1-100 parts of acrylic resin, 1-100 parts of ethyl acetate, 1-50 parts of acrylic acid, 0.01-50 parts of curing agent, 0.01-30 parts of curing accelerator, 1-100 parts of vinyl siloxane and 1-20 parts of tackifying resin
More preferably, the acrylic resin is homopolymerized acrylic ester or copolymerized C1~C20One or more alkyl esters, said homopolymeric acrylates comprising methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, or methyl substituents thereof, said copolymeric C1~C20The alkyl ester comprises alkyl acrylate or alkyl methacrylate and a copolymerizable monomer;
the tackifying resin is one or more of hydrocarbon resin, coumarone-indene resin, rosin resin and terpene resin.
Preferably, the release layer comprises a polyethylene terephthalate layer and a silicon release agent layer, and the silicon release agent layer is the release surface.
Preferably, the adhesive layer is coated on the release surface of the release layer, and is compounded with the substrate layer after the solvent in the adhesive is completely volatilized, and the compounding surface of the substrate layer is the polyethylene layer.
More preferably, the composite surface of the substrate layer is subjected to surface treatment before the adhesive layer is compounded, and the surface treatment comprises corona treatment and/or chemical treatment.
Preferably, the electron beam irradiation dose is 1-300 kGy.
Preferably, the thickness of the adhesive layer is 10-50 μm, the thickness of the polypropylene layer is 1-100 μm, the thickness of the polyethylene layer is 1-100 μm, the total thickness of the substrate layer is 1-200 μm, and the thickness of the release layer is 1-80 μm.
The invention also provides application of the protective film for protecting the workpiece in a processing state in grinding of semiconductor wafers, cutting of glass screen products and cutting of steel plates.
The protective film for protecting the workpiece in a processing state is adopted, the base material layer is a transparent or white matte plastic film, the adhesive layer is coated on the polyethylene layer by a transfer coating method, and the adhesive layer is subjected to irradiation crosslinking technology, high-energy electron beams emitted by an electron accelerator are utilized to ionize and excite high molecular chains, so that vinyl siloxane and acrylate are subjected to crosslinking reaction to form a net structure, the heat resistance and the aging resistance are improved, various performances such as chemical resistance, solvent resistance and the like are enhanced, the molecular weight is improved, and the residual gum amount is reduced; meanwhile, after the adhesive layer is subjected to high temperature generated in processing of the adherend, the generated shrinkage deformation does not influence the size of the substrate, and the adherend is prevented from generating dimensional change along with the shrinkage of the substrate film.
The protective film has higher cleanliness, extremely low ionic impurity content, excellent dimensional stability, moderate adhesiveness and thermal stability, can be well adhered to a workpiece in grinding and thinning processing, and can avoid the phenomenon of glue line separation at high temperature generated by grinding; meanwhile, the surface of the workpiece is protected from being polluted by other impurities; the protective film has better thermal stability of the adhesive layer, the size of the base material is not influenced by the shrinkage generated after high temperature, the adhered workpiece is prevented from warping and deforming along with the protective film, the adhesiveness of the adhesive layer is not changed after processing, and the protective film is easy to peel off from the workpiece.
The high-temperature-resistant protective film can be used for the process protection of high-precision workpieces such as grinding of semiconductor wafers, cutting of glass screens or organic glass screen products, cutting and processing of steel plates and the like, is temporarily protected in the manufacturing process of workpieces (such as mobile phone screens, semiconductor wafers, steel plates and the like), and can be torn off after the processing is finished.
Drawings
Fig. 1 is a schematic structural view of a protective film for protecting a workpiece in a processing state according to the present invention.
Reference numerals
1 Release layer
2 adhesive layer
3 polyethylene layer
4 Polypropylene layer
Detailed Description
In order to more clearly describe the technical contents of the present invention, the following further description is given in conjunction with specific embodiments.
As shown in fig. 1, there is shown an embodiment of the present invention of a protective film for protecting a workpiece in a processing state, the protective film being removably adhered to a surface of the workpiece, the protective film comprising in sequence:
the substrate layer comprises a polypropylene layer 4 and a polyethylene layer 3;
an adhesive layer 2, a polyethylene layer in the substrate layer being disposed adjacent to the adhesive layer, the adhesive comprising a vinyl siloxane and an acrylate; and
a release layer 1 comprising a release surface disposed adjacent to said adhesive layer;
after the protective film is formed, the vinyl siloxane and the acrylate in the adhesive layer are subjected to crosslinking reaction through electron beam irradiation treatment;
the protective film is subjected to electron beam irradiation treatment after film formation.
In a preferred embodiment, the polyethylene layer is a low density polyethylene layer.
In a preferred embodiment, the adhesive layer comprises the following raw materials in parts by mass: 1-100 parts of acrylic resin, 1-100 parts of ethyl acetate, 1-50 parts of acrylic acid, 0.01-50 parts of curing agent, 0.01-30 parts of curing accelerator, 1-100 parts of vinyl siloxane and 1-20 parts of tackifying resin
In a preferred embodiment, the acrylic resin is a homopolymeric acrylate or a copolymeric C1~C20One or more alkyl esters, said homopolymeric acrylates comprising methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, or methyl substituents thereof, said copolymeric C1~C20The alkyl ester comprises alkyl acrylate or alkyl methacrylate and a copolymerizable monomer;
the tackifying resin is one or more of hydrocarbon resin, coumarone-indene resin, rosin resin and terpene resin.
In a preferred embodiment, the release layer comprises a polyethylene terephthalate layer and a silicon release agent layer, and the silicon release agent layer is the release surface.
In a preferred embodiment, the adhesive layer is coated on the release surface of the release layer, and is then combined with the substrate layer after the solvent in the adhesive is completely volatilized, and the combination surface of the substrate layer is the polyethylene layer.
In a preferred embodiment, the laminating surface of the substrate layer is subjected to surface treatment before the laminating of the adhesive layer, and the surface treatment comprises corona treatment and/or chemical treatment.
In a preferred embodiment, the electron beam irradiation dose is 1 to 300 kGy.
In a preferred embodiment, the thickness of the adhesive layer is 10 to 50 μm, the thickness of the polypropylene layer is 1 to 100 μm, the thickness of the polyethylene layer is 1 to 100 μm, the total thickness of the substrate layer is 1 to 200 μm, and the thickness of the release layer is 1 to 80 μm.
Example 1
The raw materials are calculated according to the parts by weight.
Adding 50 parts of acrylic resin, 2 parts of acrylic acid and 90 parts of ethyl acetate into a stirring kettle, fully stirring uniformly, then adding 40 parts of vinyl siloxane and 3 parts of tackifying resin, fully stirring, then adding 0.5 part of curing agent, 0.01 part of curing accelerator and 10 parts of ethyl acetate, and fully stirring uniformly.
And (3) coating the stirred glue on the release surface of the release film by using a scraper type coating machine, and entering a hot drying tunnel until the solvent is completely volatilized. Meanwhile, the polyethylene surface of the polypropylene/polyethylene composite film is well corona, compounded with a release film coated with an adhesive layer, and rolled.
And then the wound film passes through electron beam irradiation equipment, and the irradiation dose is 50 kGy. And (3) rolling, placing in a drying room at 60 ℃, taking out after 24 hours, cutting to the required width, and dividing into rolls to obtain the high-temperature-resistant multilayer adhesive protective film.
Example 2
The raw materials are calculated according to the parts by weight.
Adding 30 parts of acrylic resin, 1 part of acrylic acid and 90 parts of ethyl acetate into a stirring kettle, fully stirring uniformly, then adding 30 parts of vinyl siloxane and 3 parts of tackifying resin, fully stirring, then adding 0.3 part of curing agent, 0.01 part of curing accelerator and 10 parts of ethyl acetate, and fully stirring uniformly.
And (3) coating the stirred glue on the release surface of the release film by using a scraper type coating machine, and entering a hot drying tunnel until the solvent is completely volatilized. Meanwhile, the polyethylene surface of the polypropylene/polyethylene composite film is well corona, compounded with a release film coated with an adhesive layer, and rolled.
And then the wound film passes through electron beam irradiation equipment, and the irradiation dose is 40 kGy. And (3) rolling, placing in a drying room at 60 ℃, taking out after 24 hours, cutting to the required width, and dividing into rolls to obtain the high-temperature-resistant multilayer adhesive protective film.
The protective film for protecting the workpiece in a processing state is adopted, the base material layer is a transparent or white matte plastic film, the adhesive layer is coated on the polyethylene layer by a transfer coating method, and the adhesive layer is subjected to irradiation crosslinking technology, high-energy electron beams emitted by an electron accelerator are utilized to ionize and excite high molecular chains, so that vinyl siloxane and acrylate are subjected to crosslinking reaction to form a net structure, the heat resistance and the aging resistance are improved, various performances such as chemical resistance, solvent resistance and the like are enhanced, the molecular weight is improved, and the residual gum amount is reduced; meanwhile, after the adhesive layer is subjected to high temperature generated in processing of the adherend, the generated shrinkage deformation does not influence the size of the substrate, and the adherend is prevented from generating dimensional change along with the shrinkage of the substrate film.
The protective film has higher cleanliness, extremely low ionic impurity content, excellent dimensional stability, moderate adhesiveness and thermal stability, can be well adhered to a workpiece in grinding and thinning processing, and can avoid the phenomenon of glue line separation at high temperature generated by grinding; meanwhile, the surface of the workpiece is protected from being polluted by other impurities; the protective film has better thermal stability of the adhesive layer, the size of the base material is not influenced by the shrinkage generated after high temperature, the adhered workpiece is prevented from warping and deforming along with the protective film, the adhesiveness of the adhesive layer is not changed after processing, and the protective film is easy to peel off from the workpiece.
The high-temperature-resistant protective film can be used for the process protection of high-precision workpieces such as grinding of semiconductor wafers, cutting of glass screens or organic glass screen products, cutting and processing of steel plates and the like, is temporarily protected in the manufacturing process of workpieces (such as mobile phone screens, semiconductor wafers, steel plates and the like), and can be torn off after the processing is finished.
In this specification, the invention has been described with reference to specific embodiments thereof. It will, however, be evident that various modifications and changes may be made thereto without departing from the broader spirit and scope of the invention. The specification and drawings are, accordingly, to be regarded in an illustrative rather than a restrictive sense.

Claims (10)

1. A protective film for protecting a workpiece in a processing state, said protective film being removably adhered to a surface of said workpiece, said protective film comprising in sequence:
the substrate layer comprises a polypropylene layer and a polyethylene layer;
an adhesive layer, the polyethylene layer of the substrate layer disposed adjacent to the adhesive layer, the adhesive comprising a vinyl siloxane and an acrylate; and
a release layer comprising a release surface disposed adjacent to the adhesive layer;
after the protective film is formed, the vinyl siloxane and the acrylate in the adhesive layer are subjected to crosslinking reaction through electron beam irradiation treatment.
2. The protective film for protecting a workpiece in a processing state as claimed in claim 1, wherein said polyethylene layer is a low density polyethylene layer.
3. A protective film for protecting a workpiece in a processed state as defined in claim 1, wherein said adhesive layer comprises the following raw materials in parts by mass: 1-100 parts of acrylic resin, 1-100 parts of ethyl acetate, 1-50 parts of acrylic acid, 0.01-50 parts of curing agent, 0.01-30 parts of curing accelerator, 1-100 parts of vinyl siloxane and 1-20 parts of tackifying resin
4. A protective film for protecting a workpiece in a processed state according to claim 3,
the acrylic resin is homopolymerized acrylic ester or copolymerized C1~C20One or more alkyl esters, said homopolymeric acrylates comprising methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, or methyl substituents thereof, said copolymeric C1~C20The alkyl ester comprises alkyl acrylate or alkyl methacrylate and a copolymerizable monomer;
the tackifying resin is one or more of hydrocarbon resin, coumarone-indene resin, rosin resin and terpene resin.
5. The protective film according to claim 1, wherein the release layer comprises a polyethylene terephthalate layer and a silicon release agent layer, and the silicon release agent layer is the release surface.
6. The protective film according to claim 1, wherein the adhesive layer is coated on the release surface of the release layer, and the adhesive layer is combined with the substrate layer after the solvent in the adhesive is completely volatilized, and the combination surface of the substrate layer is the polyethylene layer.
7. The protective film according to claim 6, wherein the lamination surface of the base material layer is subjected to a surface treatment before being laminated with the adhesive layer, and the surface treatment comprises a corona treatment and/or a chemical treatment.
8. The protective film for protecting a workpiece in a processing state according to claim 1, wherein the irradiation dose of electron beam is 1 to 300 kGy.
9. The protective film according to claim 1, wherein the adhesive layer has a thickness of 10 to 50 μm, the polypropylene layer has a thickness of 1 to 100 μm, the polyethylene layer has a thickness of 1 to 100 μm, the substrate layer has a total thickness of 1 to 200 μm, and the release layer has a thickness of 1 to 80 μm.
10. Use of the protective film according to any one of claims 1 to 9 for protecting a workpiece in a processed state in grinding of semiconductor wafers, cutting of glass screen products, cutting processing of steel plates.
CN201810659122.XA 2018-06-25 2018-06-25 Protective film for protecting workpieces in a processing state and use thereof Withdrawn CN110628350A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810659122.XA CN110628350A (en) 2018-06-25 2018-06-25 Protective film for protecting workpieces in a processing state and use thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810659122.XA CN110628350A (en) 2018-06-25 2018-06-25 Protective film for protecting workpieces in a processing state and use thereof

Publications (1)

Publication Number Publication Date
CN110628350A true CN110628350A (en) 2019-12-31

Family

ID=68967677

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810659122.XA Withdrawn CN110628350A (en) 2018-06-25 2018-06-25 Protective film for protecting workpieces in a processing state and use thereof

Country Status (1)

Country Link
CN (1) CN110628350A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112029429A (en) * 2020-08-07 2020-12-04 湖南尚鑫新材料科技有限公司 Shock-absorbing protective film and preparation method thereof
CN115353821A (en) * 2021-10-28 2022-11-18 广东东立新材料科技股份有限公司 High-temperature-resistant PE protective film easy to cut and preparation method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110220295A1 (en) * 2006-08-18 2011-09-15 Tesa Se Pressure-sensitive adhesive strip for moisture-insensitive peelable adhesive bonds
CN103261356A (en) * 2010-12-29 2013-08-21 3M创新有限公司 Low adhesion backsize for silicone adhesive articles and methods
CN104263266A (en) * 2010-12-06 2015-01-07 第一毛织株式会社 Adhesive Film For Semiconductor Device
WO2015145807A1 (en) * 2014-03-24 2015-10-01 リンテック株式会社 Protective film forming film, protective film forming sheet and work product manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110220295A1 (en) * 2006-08-18 2011-09-15 Tesa Se Pressure-sensitive adhesive strip for moisture-insensitive peelable adhesive bonds
CN104263266A (en) * 2010-12-06 2015-01-07 第一毛织株式会社 Adhesive Film For Semiconductor Device
CN103261356A (en) * 2010-12-29 2013-08-21 3M创新有限公司 Low adhesion backsize for silicone adhesive articles and methods
WO2015145807A1 (en) * 2014-03-24 2015-10-01 リンテック株式会社 Protective film forming film, protective film forming sheet and work product manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112029429A (en) * 2020-08-07 2020-12-04 湖南尚鑫新材料科技有限公司 Shock-absorbing protective film and preparation method thereof
CN115353821A (en) * 2021-10-28 2022-11-18 广东东立新材料科技股份有限公司 High-temperature-resistant PE protective film easy to cut and preparation method thereof

Similar Documents

Publication Publication Date Title
KR101549475B1 (en) Surface-protective adhesive film for transparent conductive film, and transparent conductive film using the same
CN102171122B (en) Film-peeling method, process for production of optical film, film-peeling mechanism, and apparatus for production of optical film
TWI667322B (en) Adhesive sheet
CN100523107C (en) Adhesive sheet for laser dicing and its manufacturing method
JP2970963B2 (en) Peelable pressure-sensitive adhesive and adhesive member thereof
JP7304143B2 (en) Adhesive sheet and adhesive sheet laminate
TWI668287B (en) Adhesive sheet
JP6098289B2 (en) Thermally conductive sheet
TW201607762A (en) Method for recycling optical device constituent members and method for evaluating reworkability of optical device constituent laminate
JPH06184504A (en) Thermally peelable adhesive and self-adhesive member
JP2007119646A (en) Adhesive composition and adhesive film
TW201715005A (en) Adhesive sheet, laminate, and method of manufacturing the same
JP2007277050A (en) Ceramic green sheet composition and ceramic green sheet
CN110628350A (en) Protective film for protecting workpieces in a processing state and use thereof
US11420255B2 (en) Film-shaped firing material and film-shaped firing material with a support sheet
KR20090086430A (en) Antistatic protective hot melt adhesives
CN109161367A (en) A kind of wafer UV protective film and preparation method thereof of the photosensitive adhesive of UV and the application adhesive
CN110628351A (en) Protective film for protecting a workpiece in a processing state and use thereof
TW202016247A (en) Adhesive sheet, layered product and method for producing layered product
CN104669734A (en) A kind of protective film with multi-layer use layer and preparation method thereof
CN110591583A (en) Process film production method for high-temperature viscosity reduction process after UV (ultraviolet) tackifying and product thereof
CN112126006B (en) Hydrofluoric acid-resistant acrylic resin, preparation method thereof, and pressure-sensitive adhesive tape containing acrylic resin
KR20190093601A (en) Adhesive sheet and its manufacturing method
JP2018150521A (en) Surface protective tape
JP2001181583A (en) Adhesive sheet

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WW01 Invention patent application withdrawn after publication

Application publication date: 20191231

WW01 Invention patent application withdrawn after publication