CN110609451A - Exposure machine - Google Patents
Exposure machine Download PDFInfo
- Publication number
- CN110609451A CN110609451A CN201910762211.1A CN201910762211A CN110609451A CN 110609451 A CN110609451 A CN 110609451A CN 201910762211 A CN201910762211 A CN 201910762211A CN 110609451 A CN110609451 A CN 110609451A
- Authority
- CN
- China
- Prior art keywords
- frame
- detector
- exposure machine
- mask plate
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims abstract description 12
- 230000000903 blocking effect Effects 0.000 claims description 2
- 238000012856 packing Methods 0.000 abstract description 10
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Library & Information Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The application provides an exposure machine, this exposure machine includes frame, detector and protection piece, and the frame is used for packing into the mask plate, and the detector is installed in the frame and is used for detecting whether the mask plate packs into the frame, and the protection piece is used for keeping off the detector in the direction of packing into of mask plate to prevent that the detector from being collided in the packing into process of mask plate, and then lead to the damaged risk of detector.
Description
Technical Field
The application relates to the technical field of display, in particular to an exposure machine.
Background
In recent years, medium and small-sized liquid crystal displays are developed rapidly, a precise optical instrument exposure machine is required to be used in the preparation process, and a mask plate is required to be used in the process of the exposure machine.
At present, a mask plate is loaded into an exposure machine through a carrying trolley and is detected through a sensor installed on the exposure machine, and in the loading process of the mask plate, the problem that the carrying trolley collides with the sensor to cause the sensor to be damaged can occur.
Disclosure of Invention
The application mainly provides an exposure machine, can prevent that the detector from being collided at the in-process of packing into of mask slice, and then impaired problem.
In order to solve the technical problem, the application adopts a technical scheme that: there is provided an exposure machine including a frame for housing a mask, a detector mounted on the frame for detecting whether the mask is housed in the frame, and a shield for blocking the detector in a direction in which the mask is housed to prevent the detector from being collided during housing of the mask.
Wherein the guard includes a peripheral sidewall that surrounds the detector.
Wherein, the protection piece still includes the roof, the roof is equipped with logical unthreaded hole and with week lateral wall is connected, so that the protection piece lid is located the detector.
The detector comprises an emitter and a receiver, wherein the emitter and the receiver are arranged at intervals in the vertical direction and are positioned between the emitter and the receiver after the mask plate is installed in the rack.
The exposure machine further comprises a support, the support is connected with the rack, and the detector is mounted on the support.
The mask plate loading machine comprises a rack and a rack door, wherein the rack comprises a rack body and a rack door, the rack body is used for loading mask plates, and the rack door is movably connected with the rack so as to open or close the rack body.
The exposure machine further comprises an alarm, and the alarm is mounted on the rack and used for giving an alarm.
The frame is provided with a first positioning part, the mask plate is provided with a second positioning part, and the first positioning part and the second positioning part are arranged in a matched mode after the mask plate is installed in the frame.
The first positioning part is a positioning groove, and the second positioning part is a positioning bulge matched with the positioning groove.
The frame is provided with a prompt mark, and the setting height of the prompt mark is the same as the installation height of the detector.
The beneficial effect of this application is: being different from the situation in the prior art, the exposure machine that this application provided includes frame, detector and protection piece, and the frame is used for packing into the mask plate, and the detector is installed in the frame and is used for detecting whether the mask plate packs into the frame, and the protection piece is used for keeping off the detector in the direction of packing into of mask plate to prevent that the detector from being collided in the process of packing into of mask plate, and then lead to the damaged risk of detector.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, it is obvious that the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without inventive efforts, wherein:
fig. 1 is a schematic structural diagram of an embodiment of an exposure machine provided in the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Referring to fig. 1, fig. 1 is a schematic structural diagram of an embodiment of an exposure machine 10 provided in the present application, in which the exposure machine 10 includes a frame 11, a detector 12, and a shielding element 13.
Wherein the frame 11 is used for loading the mask plate 110.
Alternatively, the frame 11 includes a frame body 111 and a frame door 112, the frame body 111 is used for loading the mask blank 110, the frame door 112 is movably connected to the frame body 111 to open or close the frame body 111, that is, when the frame door 112 is opened, the mask blank 110 can be loaded into the frame body 111, and when the mask blank 110 is loaded into the frame body 111, the frame door 112 is closed, and the exposure machine 10 can start the mask work.
Alternatively, the rack door 112 and the rack body 111 may be rotatably or slidably connected.
In the practical application process, after the mask plate 110 is transported to a predetermined height by the transporting carriage, the mask plate 110 is loaded into the frame 11.
Optionally, the frame 11 is provided with a first positioning portion (not shown), and the mask plate 110 is provided with a second positioning portion (not shown), so that after the mask plate 110 is installed in the frame 11, the first positioning portion and the second positioning portion are arranged in a matching manner to position the mask plate 110.
Optionally, in this embodiment, the first positioning portion is disposed on the frame body 111, the first positioning portion is a positioning groove, and the second positioning portion is a positioning protrusion engaged with the positioning groove.
Optionally, the frame 11 is provided with a reminder label 11 a.
The detector 12 is mounted on the frame 11 and serves to detect whether or not the mask plate 110 is loaded into the frame 11, that is, the detector 12 serves to detect whether or not the mask plate 110 is loaded into the frame body 111 in the present embodiment.
Specifically, the detector 12 includes an emitter 121 and a receiver 122, wherein the emitter 121 is used for emitting light, and the receiver 122 is used for receiving the light emitted from the emitter 121.
The emitter 121 and the receiver 122 are vertically spaced apart from each other, so that the reticle 110 is positioned between the emitter 121 and the receiver 122 after being loaded into the rack 11, that is, when the reticle 110 is not loaded into the rack 11, the receiver 122 can receive the light emitted by the emitter 121, and when the reticle 110 is loaded into the rack 11, the light emitted by the emitter 121 is blocked by the reticle 110, and the receiver 122 cannot receive the light emitted by the emitter 121.
Alternatively, in the present embodiment, the installation position of the transmitter 121 is located above the receiver 122 in the vertical direction.
Further, the mounting height of the detector 12 is the same as the set height of the cue marker 11a to cue the mounting position of the detector 12, preventing the detector 12 from being collided during the loading of the mask plate 110, thereby causing a risk of damage to the detector 12.
In an actual application scenario, the setting height of the prompt sign 11a is the same as the mounting height of the transmitter 121 with the higher mounting height, because the mounting height of the transmitter 121 is higher, the sight of a worker may be blocked, and therefore the mounting position of the transmitter 121 cannot be seen, and further in the process of loading the mask plate 110 through the carrying trolley, the condition that the transmitter 121 is damaged by the trolley arm can occur, therefore, the setting of the prompt sign 11a can remind the mounting position of the transmitter 121 of the worker, and further the collision with the transmitter 121 is prevented in the process of loading the mask plate 110 through the carrying trolley.
Optionally, in the practical application scenario, in order to prevent the mask plate 110 from colliding with the emitter 121 during loading, the maximum carrying height of the carrying cart may be set to be smaller than the mounting height of the emitter 121, so that the carrying cart cannot rise any more after reaching the maximum carrying height, and thus collision with the emitter 121 is prevented.
The shielding member 13 is used for shielding the detector 12 in the loading direction of the mask plate 110, so as to prevent the detector 12 from being collided during the loading process of the mask plate 110, and further prevent the risk of damaging the detector 12, and in a practical application scenario, when the mask plate 110 is loaded by the carrying trolley, if the carrying trolley has the risk of colliding with the detector 12, the carrying trolley will collide with the shielding member 13, and will not collide with the detector 12.
Specifically, the protection member 13 includes a peripheral sidewall 131, and the peripheral sidewall 131 surrounds the detector 12, so that the detector 12 is located inside the protection member 13 and is blocked.
Optionally, the shielding member 13 further includes a top wall 132, the top wall 132 being connected to the peripheral sidewall 131 to enable the shielding member 13 to detect the detector 12.
The top wall 132 has a light passing hole 1321, and the detector 12 detects through the light passing hole 1321, for example, when the shielding element 13 covers the emitter 121, the emitter 121 emits light through the light passing hole 1321, and when the shielding element 13 covers the receiver 122, the receiver 122 receives light through the light passing hole 1321.
Optionally, the exposure machine 10 in this embodiment further includes a support 14, the support 13 is connected to the frame 11, the detector 12 is mounted on the support 14, during the specific installation process, the detector 12 may be mounted on the support 14 first, and then the support 14 is mounted on the frame 11, in this embodiment, the number of the supports 14 is two, and the emitter 121 and the receiver 122 are respectively mounted on the two supports 14.
Optionally, the exposure machine 10 in this embodiment further includes an alarm 15, and the alarm 15 is mounted on the frame 11 and used for giving an alarm.
In an actual application scenario, when the detector 12 detects that the mask plate 110 is loaded into the rack 11, the mask operation can be started, and at this time, if the rack door 112 is in an open state, the alarm 15 issues an alarm to remind the staff that the rack door 112 is not closed.
Be different from prior art, the exposure machine that this application provided includes frame, detector and protection piece, and the frame is used for packing into the mask plate, and the detector is installed in the frame and is used for detecting whether the mask plate packs into the frame, and the protection piece is used for keeping off the detector in the direction of packing into of mask plate to prevent that the detector from being collided in the process of packing into of mask plate, and then lead to the damaged risk of detector.
The above description is only an example of the present application and is not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by the contents of the specification and the drawings, or which are directly or indirectly applied to other related technical fields, are intended to be included within the scope of the present application.
Claims (10)
1. An exposure machine, comprising a frame for housing a mask, a detector mounted on the frame for detecting whether the mask is housed in the frame, and a shield for blocking the detector in a direction in which the mask is housed to prevent the detector from being collided during the process of housing the mask.
2. Exposure machine according to claim 1, characterised in that the shield comprises a circumferential side wall, which is provided around the detector.
3. Exposure machine according to claim 2, characterised in that the shielding element further comprises a top wall provided with a light aperture and connected to the circumferential side wall, so that the shielding element covers the detector.
4. The exposure machine of claim 1, wherein the detector includes an emitter and a receiver spaced apart vertically to be located between the emitter and the receiver after the reticle is loaded into the frame.
5. Exposure machine according to claim 1, characterised in that the exposure machine further comprises a support, which is connected to the frame, on which support the detector is mounted.
6. The exposure machine according to claim 1, wherein the frame includes a frame body for loading a mask plate and a frame door movably connected to the frame to open or close the frame body.
7. Exposure machine according to claim 6, further comprising an alarm mounted on the frame for issuing an alarm.
8. The exposure machine according to claim 1, wherein the frame is provided with a first positioning portion, and the mask plate is provided with a second positioning portion, so that the first positioning portion and the second positioning portion are arranged in cooperation after the mask plate is loaded into the frame.
9. The exposure machine according to claim 7, wherein the first positioning portion is a positioning groove, and the second positioning portion is a positioning projection that engages with the positioning groove.
10. The exposure machine according to claim 1, wherein a warning mark is provided on the frame, and the warning mark is provided at the same height as a mounting height of the detector.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910762211.1A CN110609451A (en) | 2019-08-19 | 2019-08-19 | Exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910762211.1A CN110609451A (en) | 2019-08-19 | 2019-08-19 | Exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110609451A true CN110609451A (en) | 2019-12-24 |
Family
ID=68890182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910762211.1A Pending CN110609451A (en) | 2019-08-19 | 2019-08-19 | Exposure machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110609451A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1130260A (en) * | 1994-08-25 | 1996-09-04 | 三星航空产业株式会社 | Loading and unloading device for reticle sheet |
| US20120099089A1 (en) * | 2010-10-21 | 2012-04-26 | Nikon Corporation | Apparatus and methods for measuring thermally induced reticle distortion |
| CN106444302A (en) * | 2016-11-23 | 2017-02-22 | 南京华东电子信息科技股份有限公司 | Movable mask carrying table |
| CN208833370U (en) * | 2018-10-16 | 2019-05-07 | 江苏捷阳科技股份有限公司 | An integrated window sensor protective shell |
-
2019
- 2019-08-19 CN CN201910762211.1A patent/CN110609451A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1130260A (en) * | 1994-08-25 | 1996-09-04 | 三星航空产业株式会社 | Loading and unloading device for reticle sheet |
| US20120099089A1 (en) * | 2010-10-21 | 2012-04-26 | Nikon Corporation | Apparatus and methods for measuring thermally induced reticle distortion |
| CN106444302A (en) * | 2016-11-23 | 2017-02-22 | 南京华东电子信息科技股份有限公司 | Movable mask carrying table |
| CN208833370U (en) * | 2018-10-16 | 2019-05-07 | 江苏捷阳科技股份有限公司 | An integrated window sensor protective shell |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20191224 |
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| RJ01 | Rejection of invention patent application after publication |