CN110546311B - 提高镀铬基底的耐腐蚀性的方法 - Google Patents
提高镀铬基底的耐腐蚀性的方法 Download PDFInfo
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- CN110546311B CN110546311B CN201880022120.8A CN201880022120A CN110546311B CN 110546311 B CN110546311 B CN 110546311B CN 201880022120 A CN201880022120 A CN 201880022120A CN 110546311 B CN110546311 B CN 110546311B
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- chromium
- electrolyte
- chrome
- plated
- trivalent chromium
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- 238000005260 corrosion Methods 0.000 title claims abstract description 47
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 97
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- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 23
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- 229910052751 metal Inorganic materials 0.000 claims description 8
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- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
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- 239000011668 ascorbic acid Chemical class 0.000 claims description 2
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- 239000010439 graphite Substances 0.000 claims description 2
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- -1 metabisulfites Chemical class 0.000 claims description 2
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- 150000002823 nitrates Chemical class 0.000 claims description 2
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- 239000010935 stainless steel Substances 0.000 claims description 2
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- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims 1
- 150000003841 chloride salts Chemical class 0.000 claims 1
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- 150000002443 hydroxylamines Chemical class 0.000 claims 1
- 238000011282 treatment Methods 0.000 description 37
- 235000002639 sodium chloride Nutrition 0.000 description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 15
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 11
- 229910052759 nickel Inorganic materials 0.000 description 11
- 238000004458 analytical method Methods 0.000 description 9
- 239000010949 copper Substances 0.000 description 8
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- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 6
- 238000004611 spectroscopical analysis Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 5
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
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- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 3
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 3
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 235000015217 chromium(III) sulphate Nutrition 0.000 description 3
- 239000011696 chromium(III) sulphate Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 239000002211 L-ascorbic acid Substances 0.000 description 2
- 235000000069 L-ascorbic acid Nutrition 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
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- 239000001099 ammonium carbonate Substances 0.000 description 2
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- DSHWASKZZBZKOE-UHFFFAOYSA-K chromium(3+);hydroxide;sulfate Chemical compound [OH-].[Cr+3].[O-]S([O-])(=O)=O DSHWASKZZBZKOE-UHFFFAOYSA-K 0.000 description 2
- 229910000356 chromium(III) sulfate Inorganic materials 0.000 description 2
- XOHQAXXZXMHLPT-UHFFFAOYSA-N ethyl(phosphonooxy)phosphinic acid Chemical compound CCP(O)(=O)OP(O)(O)=O XOHQAXXZXMHLPT-UHFFFAOYSA-N 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
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- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
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- 229910021653 sulphate ion Inorganic materials 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
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- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
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- KSPIHGBHKVISFI-UHFFFAOYSA-N Diphenylcarbazide Chemical compound C=1C=CC=CC=1NNC(=O)NNC1=CC=CC=C1 KSPIHGBHKVISFI-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000004260 Potassium ascorbate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
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- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
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- 150000001805 chlorine compounds Chemical class 0.000 description 1
- OIDPCXKPHYRNKH-UHFFFAOYSA-J chrome alum Chemical compound [K]OS(=O)(=O)O[Cr]1OS(=O)(=O)O1 OIDPCXKPHYRNKH-UHFFFAOYSA-J 0.000 description 1
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- 238000010586 diagram Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
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- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- WFIZEGIEIOHZCP-UHFFFAOYSA-M potassium formate Chemical compound [K+].[O-]C=O WFIZEGIEIOHZCP-UHFFFAOYSA-M 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
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- 239000004323 potassium nitrate Substances 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- CONVKSGEGAVTMB-RXSVEWSESA-M potassium-L-ascorbate Chemical compound [K+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] CONVKSGEGAVTMB-RXSVEWSESA-M 0.000 description 1
- WOTCTOFEBNHWND-UHFFFAOYSA-M potassium;oxaldehydate Chemical compound [K+].[O-]C(=O)C=O WOTCTOFEBNHWND-UHFFFAOYSA-M 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 1
- 235000010378 sodium ascorbate Nutrition 0.000 description 1
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- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000019254 sodium formate Nutrition 0.000 description 1
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- SOEVVANXSDKPIY-UHFFFAOYSA-M sodium glyoxylate Chemical compound [Na+].[O-]C(=O)C=O SOEVVANXSDKPIY-UHFFFAOYSA-M 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 1
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- 231100000331 toxic Toxicity 0.000 description 1
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- 231100000419 toxicity Toxicity 0.000 description 1
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- 229910052905 tridymite Inorganic materials 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
- C25D9/06—Electrolytic coating other than with metals with inorganic materials by anodic processes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/38—Chromatising
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
- C25D9/04—Electrolytic coating other than with metals with inorganic materials
- C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP17164327.3 | 2017-03-31 | ||
EP17164327.3A EP3382062A1 (fr) | 2017-03-31 | 2017-03-31 | Procédé pour augmenter la résistance à la corrosion d'un substrat plaqué au chrome |
PCT/EP2018/058429 WO2018178390A1 (fr) | 2017-03-31 | 2018-04-03 | Procédé d'accroissement de la résistance à la corrosion d'un substrat chromé |
Publications (2)
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CN110546311A CN110546311A (zh) | 2019-12-06 |
CN110546311B true CN110546311B (zh) | 2022-02-25 |
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CN201880022120.8A Active CN110546311B (zh) | 2017-03-31 | 2018-04-03 | 提高镀铬基底的耐腐蚀性的方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11268206B2 (fr) |
EP (2) | EP3382062A1 (fr) |
CN (1) | CN110546311B (fr) |
CA (1) | CA3056982C (fr) |
ES (1) | ES2929908T3 (fr) |
PT (1) | PT3526374T (fr) |
WO (1) | WO2018178390A1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN110760900A (zh) * | 2019-11-29 | 2020-02-07 | 扬州大学 | 一种六价铬废水还原作电镀铬源的方法及其电镀方法 |
CN110923768B (zh) * | 2019-12-19 | 2022-01-25 | 漳州市福美鑫新材料科技有限公司 | 一种用于三价铬电镀工件后处理工艺的设备 |
CN111500962B (zh) * | 2020-04-28 | 2022-04-29 | 中国石油大学(华东) | 调控热浸镀锌铝合金镀层表面三价铬化学转化膜性能的成膜方法 |
FR3110606A1 (fr) * | 2020-05-20 | 2021-11-26 | Institut De Recherche Technologique Matériaux, Métallurgie, Procédés | Procédé de chromage dur à partir de chrome trivalent |
CN113151873A (zh) * | 2021-04-27 | 2021-07-23 | 深圳市通之泰科技有限公司 | 一种用于提高电镀抗腐蚀的工艺方法 |
EP4239100A1 (fr) | 2022-03-03 | 2023-09-06 | Advanced Capital Management Schweiz AG | Procédé de revêtement d'un substrat et accessoire d'appareil électroménager pour application dans le domaine gastronomique |
DE102022105844A1 (de) | 2022-03-14 | 2023-09-14 | Carl Freudenberg Kg | Passivierungsschicht für metallhaltige Substrate |
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US4167460A (en) * | 1978-04-03 | 1979-09-11 | Oxy Metal Industries Corporation | Trivalent chromium plating bath composition and process |
CN86102555A (zh) * | 1985-03-15 | 1986-12-17 | 川崎制铁株式会社 | 用于制作焊接罐的镀铬钢带及其生产工艺 |
WO1998040542A1 (fr) * | 1997-03-13 | 1998-09-17 | Ea Technology Limited | Procede de chromage des metaux presentant une surface revetue d'oxyde |
US6004448A (en) * | 1995-06-06 | 1999-12-21 | Atotech Usa, Inc. | Deposition of chromium oxides from a trivalent chromium solution containing a complexing agent for a buffer |
US20010054557A1 (en) * | 1997-06-09 | 2001-12-27 | E. Jennings Taylor | Electroplating of metals using pulsed reverse current for control of hydrogen evolution |
CN101855388A (zh) * | 2007-08-30 | 2010-10-06 | 日产自动车株式会社 | 镀铬部件及其制造方法 |
US20140127532A1 (en) * | 2010-12-23 | 2014-05-08 | Coventya S.P.A. | Substrate with a corrosion resistant coating and method of production thereof |
US20150064494A1 (en) * | 2012-03-30 | 2015-03-05 | Tata Steel Ijmuiden Bv | Coated substrate for packaging applications and a method for producing said coated substrate |
US20150101934A1 (en) * | 2013-10-12 | 2015-04-16 | Hamilton Sundstrand Corporation | Controlled trivalent chromium pretreatment |
CN106103809A (zh) * | 2014-03-07 | 2016-11-09 | 麦克德米德尖端有限公司 | 由三价电解质沉积的微不连续铬的钝化 |
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JP5379426B2 (ja) | 2007-08-30 | 2013-12-25 | 日産自動車株式会社 | クロムめっき部品およびその製造方法 |
JP5299887B2 (ja) | 2008-03-26 | 2013-09-25 | 奥野製薬工業株式会社 | 3価クロムめっき皮膜用電解処理液 |
EP2186928A1 (fr) | 2008-11-14 | 2010-05-19 | Enthone, Inc. | Procédé pour le post-traitement des couches métalliques |
EP2826890A1 (fr) | 2013-07-19 | 2015-01-21 | ATOTECH Deutschland GmbH | Procédé pour la protection cathodique contre la corrosion de surfaces chromées |
EP2899299A1 (fr) | 2014-01-24 | 2015-07-29 | COVENTYA S.p.A. | Électrolyte au chrome trivalent et méthode de déposition du chrome métallique |
ES2743802T3 (es) * | 2014-05-21 | 2020-02-20 | Tata Steel Ijmuiden Bv | Método para enchapar una tira de metal en movimiento |
EP3228729A1 (fr) | 2016-04-04 | 2017-10-11 | COVENTYA S.p.A. | Procédé de métallisation d'un article ayant une surface en plastique évitant la métallisation de la crémaillère qui fixe l'article dans le bain de placage |
-
2017
- 2017-03-31 EP EP17164327.3A patent/EP3382062A1/fr not_active Withdrawn
-
2018
- 2018-04-03 ES ES18713706T patent/ES2929908T3/es active Active
- 2018-04-03 CN CN201880022120.8A patent/CN110546311B/zh active Active
- 2018-04-03 CA CA3056982A patent/CA3056982C/fr active Active
- 2018-04-03 EP EP18713706.2A patent/EP3526374B1/fr active Active
- 2018-04-03 US US16/499,130 patent/US11268206B2/en active Active
- 2018-04-03 WO PCT/EP2018/058429 patent/WO2018178390A1/fr unknown
- 2018-04-03 PT PT187137062T patent/PT3526374T/pt unknown
Patent Citations (10)
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US4167460A (en) * | 1978-04-03 | 1979-09-11 | Oxy Metal Industries Corporation | Trivalent chromium plating bath composition and process |
CN86102555A (zh) * | 1985-03-15 | 1986-12-17 | 川崎制铁株式会社 | 用于制作焊接罐的镀铬钢带及其生产工艺 |
US6004448A (en) * | 1995-06-06 | 1999-12-21 | Atotech Usa, Inc. | Deposition of chromium oxides from a trivalent chromium solution containing a complexing agent for a buffer |
WO1998040542A1 (fr) * | 1997-03-13 | 1998-09-17 | Ea Technology Limited | Procede de chromage des metaux presentant une surface revetue d'oxyde |
US20010054557A1 (en) * | 1997-06-09 | 2001-12-27 | E. Jennings Taylor | Electroplating of metals using pulsed reverse current for control of hydrogen evolution |
CN101855388A (zh) * | 2007-08-30 | 2010-10-06 | 日产自动车株式会社 | 镀铬部件及其制造方法 |
US20140127532A1 (en) * | 2010-12-23 | 2014-05-08 | Coventya S.P.A. | Substrate with a corrosion resistant coating and method of production thereof |
US20150064494A1 (en) * | 2012-03-30 | 2015-03-05 | Tata Steel Ijmuiden Bv | Coated substrate for packaging applications and a method for producing said coated substrate |
US20150101934A1 (en) * | 2013-10-12 | 2015-04-16 | Hamilton Sundstrand Corporation | Controlled trivalent chromium pretreatment |
CN106103809A (zh) * | 2014-03-07 | 2016-11-09 | 麦克德米德尖端有限公司 | 由三价电解质沉积的微不连续铬的钝化 |
Also Published As
Publication number | Publication date |
---|---|
WO2018178390A1 (fr) | 2018-10-04 |
US11268206B2 (en) | 2022-03-08 |
CA3056982A1 (fr) | 2018-10-04 |
US20210108326A1 (en) | 2021-04-15 |
EP3526374B1 (fr) | 2022-09-07 |
EP3382062A1 (fr) | 2018-10-03 |
EP3526374A1 (fr) | 2019-08-21 |
PT3526374T (pt) | 2022-11-21 |
ES2929908T3 (es) | 2022-12-02 |
CN110546311A (zh) | 2019-12-06 |
CA3056982C (fr) | 2023-11-28 |
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