CN110461608A - Droplet ejection apparatus - Google Patents
Droplet ejection apparatus Download PDFInfo
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- CN110461608A CN110461608A CN201880021185.0A CN201880021185A CN110461608A CN 110461608 A CN110461608 A CN 110461608A CN 201880021185 A CN201880021185 A CN 201880021185A CN 110461608 A CN110461608 A CN 110461608A
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- China
- Prior art keywords
- piezoelectric element
- diaphragm
- droplet ejection
- ejection apparatus
- voltage
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
- F04B43/04—Pumps having electric drive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
- B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
- B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
- B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Reciprocating Pumps (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Ink Jet (AREA)
- Coating Apparatus (AREA)
Abstract
The present invention provides droplet ejection apparatus, can increase shift amount while maintaining the responsiveness of piezoelectric element.Droplet ejection apparatus (10) includes liquid storage part (11), with liquid spraying outlet (11b)；Diaphragm (12) changes the volume of liquid storage part (11)；Bearing part (13) is fixed on diaphragm (12)；And piezoelectric element (14), pressurization and vibration is applied to bearing part (13).Piezoelectric element (14) is not fixed or fastening relative to bearing part (13).
Description
Technical field
The present invention relates to droplet ejection apparatus.
Background technique
Using piezoelectric effect carry out from energy from electric energy to mechanical energy conversion piezoelectric element due to responsiveness it is excellent,
The drop on the surface that be used to for liquid being ejected into object in the extensive field such as semiconductor, printing, chemicals sprays
Device.
Here, it in order to increase the shift amount of piezoelectric element, proposes and has been set using the displacement of hinged structures and expands mechanism
Method (referring to patent document 1 with patent document 2).
Existing technical literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2005-349387 bulletin
Patent document 2: Japanese Unexamined Patent Publication 2008-54492 bulletin
Summary of the invention
Subject to be solved by the invention
But in the method for patent document 1,2, need to increase by articulated structure the displacement of piezoelectric element, therefore
The responsiveness of piezoelectric element will receive damage.
The object of the present invention is to provide the drops that can increase shift amount while maintaining the responsiveness of piezoelectric element
Ejection device.
Means for solving the problems
The droplet ejection apparatus of one embodiment of the present invention includes liquid storage part, with liquid spraying outlet；Diaphragm,
It changes the volume of liquid storage part；Bearing part is fixed on diaphragm；And piezoelectric element, bearing part is applied
Pressurization and vibration.Piezoelectric element is not fixed or fastening relative to bearing part.
Invention effect
According to one method of the present invention, displacement can be increased while maintaining the responsiveness of piezoelectric element by being capable of providing
The droplet ejection apparatus of amount.
Detailed description of the invention
Fig. 1 is the schematic diagram for showing the structure of droplet ejection apparatus of first embodiment.
Fig. 2 is the curve graph for showing the displacement waveform of diaphragm and piezoelectric element of first embodiment.
Fig. 3 is the schematic diagram being illustrated for the state of diaphragm and piezoelectric element to first embodiment.
Fig. 4 is the schematic diagram being illustrated for the state of diaphragm and piezoelectric element to first embodiment.
Fig. 5 is the schematic diagram being illustrated for the state of diaphragm and piezoelectric element to first embodiment.
Fig. 6 is the schematic diagram for showing the structure of droplet ejection apparatus of second embodiment.
Fig. 7 is the curve graph for showing the displacement waveform of diaphragm and piezoelectric element of second embodiment.
Fig. 8 is the curve graph for showing the displacement waveform of diaphragm and piezoelectric element of second embodiment.
Fig. 9 is the curve graph for showing the displacement waveform of diaphragm and piezoelectric element of second embodiment.
Specific embodiment
Hereinafter, being illustrated referring to appearance inspection device of the attached drawing to an embodiment of the invention.But it is of the invention
Range be not limited to following implementation, can arbitrarily change within the scope of the technical idea of the present invention.Also, following
Attached drawing in, for easy understanding each structure, make sometimes scale bar and quantity in each construction etc. in actual configuration
Scale bar and quantity etc. are different.
In addition, in the present specification, " vertical " is that the vertical situation not only comprising physically stricti jurise also includes reality
The concept of vertical situation in matter." substantially perpendicular " refers to the situation tilted in 15 ° of ranges below.
1. first embodiment
(structure of droplet ejection apparatus 10)
Fig. 1 is the schematic diagram for showing the structure of droplet ejection apparatus 10 of first embodiment.
Droplet ejection apparatus 10 has liquid storage part 11, diaphragm 12, bearing part 13, piezoelectric element 14, abutment
15 and control unit 16.
(1) liquid storage part 11
Liquid storage part 11 has main part 11a, liquid chamber 11b and liquid spraying outlet 11c.
Main part 11a is formed as hollow form.In the present embodiment, main part 11a is formed as cup-shaped, but not limited to this.
Main part 11a can be made of such as alloy material, ceramic material and synthetic resin material etc..
Liquid chamber 11b is formed in the inside of main part 11a.Liquid is stored in liquid chamber 11b.As liquid, can enumerate
Solder, ink, is used to form functional film (alignment film, resist, colour filter, organic electroluminescent etc.) at heat-curing resin
Coating liquid etc..
Liquid spraying outlet 11c is formed completely through main part 11a.In the present embodiment, liquid spraying outlet 11c be formed in
The opposed position of diaphragm 12, but not limited to this.Liquid in liquid chamber 11b becomes drop from liquid spraying outlet 11c and sprays to outside
Out.In addition, though it is not shown in Fig. 1, but liquid storage part 11 has for providing the liquid supply of liquid to liquid chamber 11b
Mouthful.
(2) diaphragm 12
Diaphragm 12 configures on liquid storage part 11.Diaphragm 12 seals the liquid chamber 11b of liquid storage part 11.When from aftermentioned
Piezoelectric element 14 to bearing part 13 apply pressurization and vibration when, diaphragm 12 flexibly vibrates together with bearing part 13.As a result,
Diaphragm 12 changes the volume of liquid chamber 11b.
Diaphragm 12 has fixed part 12a and flexible portion 12b.Fixed part 12a is fixed on the main part of liquid storage part 11
11a.Fixed part 12a is the outer rim of diaphragm 12.Flexible portion 12b is the part for being fixed portion 12a encirclement.Flexible portion 12b is not fixed
In the main part 11a of liquid storage part 11, can deform.
When the convex bending in the inside of flexible portion 12b towards liquid chamber 11b, the volume of liquid chamber 11b becomes smaller.Liquid as a result,
Become drop from liquid spraying outlet 11c and is sprayed to outside.Later, when flexible portion 12b is restored to Fig. 1 by the elasticity of itself
State when, the volume of liquid chamber 11b restores.At this point, supplementing liquid from liquid supply port to liquid chamber 11b.
The material for constituting diaphragm 12 is not particularly limited, and is able to use such as alloy material, ceramic material and synthesis tree
Rouge material etc..
(3) bearing part 13
Bearing part 13 is fixed on the outer surface 12S of the flexible portion 12b in diaphragm 12.Bearing part 13 can pass through bonding
Agent is tightened up by welding and flexible portion 12b.
Pressurization and vibration is applied to bearing part 13 from aftermentioned piezoelectric element 14.When being applied pressurization and vibration, receiving portion
Part 13 as diaphragm 12 counterweight and function, to diaphragm 12 apply inertia force.As a result, with bearing part 13 is not provided with
The case where compare, diaphragm 12 can be shifted significantly.About the displacement of diaphragm 12, it is described in detail later.
The material for constituting bearing part 13 is not particularly limited, but in order to inhibit due to being connect with aftermentioned abutment 15
Touching and damaged or abrasion, it is preferable to use impact resistance and excellent in wear resistance material.As such material, oxygen can be enumerated
Change the ceramic materials such as zirconium and silicon nitride (silicon nitride).Alternatively, it is also possible in bearing part 13 and abutment
The part of 15 contacts uses the higher material of density ratio using impact resistance and the material of excellent in wear resistance, in other parts
(stainless steel alloy and brass etc.) is to ensure the weight as counterweight.
The size of bearing part 13 is not particularly limited, but due to the area for being fixed with bearing part 13 in flexible portion 12b
Domain is not pliable, thus preferably in a manner of it can ensure the deflection of flexible portion 12b appropriate adjustment bearing part 13 size.
Specifically, being held on the direction (hereinafter referred to as " first direction ") parallel with the outer surface 12S of flexible portion 12b
Width W1 by component 13 is preferably the 60% of the width W2 of flexible portion 12b hereinafter, more preferably 50% hereinafter, especially preferably
30% or less.For example, in the case where flexible portion 12b is the disk-shaped situation of Φ 10mm, preferably columned hold Φ 6mm is below
The center of outer surface 12S is configured at by component 13.Thereby, it is possible to leave endless flexible region in flexible portion 12b, therefore can
Ensure the deflection of diaphragm 12.
(4) piezoelectric element 14
Piezoelectric element 14 is configured to opposed with bearing part 13.In the present embodiment, piezoelectric element 14 is in second direction
Upper separate bearing part 13, fixes or is fastened without respect to bearing part 13.The base end part 14p of piezoelectric element 14 is fixed on
Determine component 19, is fixing end.It is fixed with aftermentioned abutment 15 in the front end 14q of piezoelectric element 14, is free end.
Piezoelectric element 14 has multiple piezoelectrics 14a, multiple internal electrode 14b and a pair of of side electrode 14c, 14c.Respectively
Piezoelectrics 14a and each internal electrode 14b are alternately laminated.Each piezoelectrics 14a is for example by piezoelectric ceramics structures such as lead zirconate titanates (PZT)
At.Each internal electrode 14b is electrically connected with the either side in a pair of of side electrode 14c, 14c.That is, the side electrode with a side
The internal electrode 14c of 14c electrical connection is electrically insulated with the side electrode 14c of another party.This structure is commonly known as partial electrode
Construction.
But as long as piezoelectric element 14 at least has a piezoelectrics and a pair of electrodes, piezoelectric element 14 can make
With the piezoelectric element of well known various constructions.
Piezoelectric element 14 is according to the application of voltage and in the direction (hereinafter referred to as " second direction ") vertical with first direction
On stretch.Specifically, piezoelectric element 14 is not in the case where a pair of of side electrode 14c, 14c are applied voltage for certainly
The state of right length.The voltage that a pair of of side electrode 14c, 14c are applied is bigger, and piezoelectric element 14 is stretched to 13 side of bearing part
It obtains more.Moreover, piezoelectric element 14 becomes when a pair of side electrode 14c, 14c are applied driving voltage (that is, maximum potential)
Longest state is stretched to obtain to 13 side of bearing part.
Along with the stretching of such piezoelectric element 14, pressurization vibration is applied to the bearing part 13 of unconstrained state
It is dynamic.Unconstrained state refers to that bearing part 13 is not fixed relative to piezoelectric element 14 or fastens that bearing part 13 can be only
It stands on piezoelectric element 14 and carries out mobile state.
In addition, when the voltage applied to a pair of of side electrode 14c, 14c becomes smaller from driving voltage, 14 direction of piezoelectric element
The opposite side of bearing part 13 is shunk, and the state of natural length is reverted to.
(5) abutment 15
Abutment 15 is inserted between bearing part 13 and piezoelectric element 14.Abutment 15 is fixed on piezoelectric element 14
Front end 14q.Abutment 15 can be tightened up by bonding agent or by welding and piezoelectric element 14.Abutment
15 move along with the flexible of piezoelectric element 14 with piezoelectric element 14 in a second direction together.
Abutment 15 is not fixed or fastening relative to bearing part 13.Abutment 15 is to approach, leave freely
State abutted with bearing part 13.
Abutment 15 has curved surface 15S and plane 15T.Curved surface 15S is opposed with the outer surface 13S of bearing part 13.It is flat
Face 15T is connect with the end face 14S of piezoelectric element 14.Therefore, abutment 15 and 13 point contact of bearing part, and it is first with piezoelectricity
14 face contact of part.Therefore, it is equably passed to from the power that bearing part 13 applies abutment 15 via abutment 15
Piezoelectric element 14.As a result, being able to suppress compression stress leads to its breakage in the inner integrated of piezoelectric element 14.
In addition, in the present embodiment, abutment 15 be shaped generally as it is hemispherical, but not limited to this.Abutment 15
As long as being capable of shape with 13 point contact of bearing part and with 14 face contact of piezoelectric element.
The material for constituting abutment 15 is not particularly limited, but in order to inhibit to break due to colliding with bearing part 13
Damage or abrasion, it is preferable to use the material of impact resistance and excellent in wear resistance in the same manner as bearing part 13.Alternatively, it is also possible to
The part contacted with bearing part 13 in abutment 15 uses the material of impact resistance and excellent in wear resistance, at other
Part uses the higher material of density ratio.
(6) control unit 16
Control unit 16 is by CPU (Central Processing Unit: central processing unit) or DSP (Digital
Siganal Processor: digital signal processor) etc. microprocessors or ASIC (Application Specific
Integrated Circuit: specific integrated circuit) etc. arithmetic units and realize.
Control unit 16 is generated for making piezoelectric element 14 carry out flexible driving pulse, right according to the driving pulse of generation
A pair of of side electrode 14c, 14c of piezoelectric element 14 apply voltage.In control unit 16, driving pulse can be suitably set most
High potential (that is, driving voltage) and waveform.
(movement of droplet ejection apparatus 10)
Next, being illustrated referring to attached drawing to the movement of droplet ejection apparatus 10.
Fig. 2 is the curve graph for showing the passage of the shift amount E of shift amount D and piezoelectric element 14 of diaphragm 12.Fig. 3~Fig. 5
It is the schematic diagram for being illustrated to diaphragm 12 and piezoelectric element 14 in the state of moment T1~T3.In addition, the shifting of diaphragm 12
The passage of position amount D refers to the displacement waveform of diaphragm 12.The driving that the passage of the shift amount E of piezoelectric element 14 and control unit 16 generate
The waveform of pulse is identical.
In moment T0, control unit 16 does not apply voltage to piezoelectric element 14.Therefore, in moment T0, piezoelectric element 14 is not stretched
Exhibition does not apply pressurization and vibration (referring to Fig.1) to bearing part 13.It is maximum in the volume of moment T0, liquid storage part 11.
In moment T0~T1, control unit 16 is gradually increasing the voltage applied to piezoelectric element 14, applies most in moment T1
High potential (driving voltage).Therefore, in moment T0~T1, piezoelectric element 14 extends to maximum shift amount Emax from shift amount 0, every
Film 12 is exerted a force by piezoelectric element 14, is displaced to the first shift amount Da together with piezoelectric element 14 (referring to Fig. 3).The first of diaphragm 12
Shift amount Da is identical as the maximum shift amount Emax of piezoelectric element 14.
In moment T1~T2, control unit 16 is gradually reduced the voltage applied to piezoelectric element 14, reverts in moment T2
Alive state is not applied.Therefore, in moment T1~T2, piezoelectric element 14 shrink up to displacement from maximum shift amount Emax
Amount 0 (referring to Fig. 4).On the other hand, in the used of moment T1~T2, diaphragm 12 bearing part 13 functioned as counterweight
Property power force, thus from the displacement of the first shift amount Da further progress until the second shift amount Db (> Da) (reference Fig. 4).
In moment T2~T3, control unit 16 does not apply voltage to piezoelectric element 14.Therefore, piezoelectric element 14 is maintained displacement
Amount 0 (referring to Fig. 5).On the other hand, in the used of moment T2~T3, diaphragm 12 bearing part 13 functioned as counterweight
Property power further exert a force, from the displacement of the second shift amount Db further progress until maximum shift amount Dmax (> Db) (reference Fig. 5).
The maximum shift amount Dmax of diaphragm 12 is greater than the maximum shift amount Emax of piezoelectric element 14.In moment T3, liquid storage part 11
Volume is minimum.
Moment T3 and after, control unit 16 not to piezoelectric element 14 apply voltage, but as shown in Fig. 2, diaphragm 12 when
It carves T4 and reverts to non-deflecting state (hereinafter referred to as " original state "), then with intrinsic vibration frequency corresponding with the elasticity of itself
Rate carries out decaying vibration, while shift amount moves closer to 0.Therefore, it in the displacement waveform of diaphragm 12, after first wave, produces
Raw lasting or transition the second wave~n-th wave (hereinafter referred to as " oscillation (ringing) ")
(feature)
(1) in droplet ejection apparatus 10, the bearing part 13 functioned as counterweight is provided on diaphragm 12.
Therefore, it after piezoelectric element 14 is displaced to maximum shift amount Emax, exerts a force by the inertia force of bearing part 13 to diaphragm 12,
Thus it enables that the diaphragm 12 is displaced to maximum shift amount Dmax.It therefore, can be to the liquid being stored in liquid storage part 11
Apply biggish power.As a result, even if liquid be it is highly viscous, also can swimmingly spray liquid without be arranged heater
Structure (referring to Japanese Unexamined Patent Publication 2003-103207 bulletin, Japanese Unexamined Patent Publication 2000-317371 bulletin) etc..Moreover, because can incite somebody to action
The pressurization and vibration for carrying out piezoelectric element 14 is directly applied to diaphragm 12, thus be provided with the displacement enlarger using hinged structures
The case where structure (referring to Japanese Unexamined Patent Publication 2005-349387 bulletin, Japanese Unexamined Patent Publication 2008-54492 bulletin), is compared, and can be improved
Responsiveness.In this way, droplet ejection apparatus 10 according to first embodiment, can maintain the same of the responsiveness of piezoelectric element 14
The shift amount of Shi Zeng great diaphragm 12.
(2) in droplet ejection apparatus 10, there is abutment 15, abutment 15 is fixed on piezoelectric element 14, and
It is abutted with the state for approaching, leaving freely with bearing part 13.Therefore the case where and piezoelectric element 14 is abutted with bearing part 13
It compares, is able to suppress piezoelectric element 14 itself breakage or abrasion.Also, since abutment 15 is without respect to bearing part 13
Fixed, therefore it is able to maintain that the unconstrained state of bearing part 13.
(3) abutment 15 and 13 point contact of bearing part, and with 14 face contact of piezoelectric element.It therefore can will be from holding
Piezoelectric element 14 is equably passed to by the power that component 13 applies abutment 15, therefore, compression stress is able to suppress and is pressing
Electric device 14 inner integrated and lead to its breakage.
2. second embodiment
The structure of the droplet ejection apparatus 20 of second embodiment is illustrated.
In the droplet ejection apparatus 10 of first embodiment, in the displacement waveform of diaphragm 12, produced after first wave
Raw oscillation, and in the droplet ejection apparatus of second embodiment 20, execute the control for inhibiting diaphragm 12 to vibrate (hereinafter referred to as
" oscillation inhibits control ").Hereinafter, being mainly illustrated to the difference with first embodiment.
(structure of droplet ejection apparatus 20)
Fig. 6 is the schematic diagram for showing the structure of droplet ejection apparatus 20.Droplet ejection apparatus 20 is sprayed in addition to above-mentioned drop
Out except the structure of device 10, also there is strain gauge 17 and amplifier installation 18.
Strain gauge 17 is set to the outer surface 12S of the flexible portion 12b in diaphragm 12.Strain gauge 17 is according to flexible portion 12b's
Resistance value increases and decreases to detect the dependent variable of flexible portion 12b.Strain gauge 17 be for detect the displacement waveform of diaphragm 12 (displacement
Through when elapse) " displacement meter " an example.The dependent variable that strain gauge 17 will test is exported to amplifier installation 18.Amplifier dress
It sets the dependent variable that 18 amplifications are inputted from strain gauge 17 and exports to control unit 16.
Control unit 16 obtains the displacement waveform of diaphragm 12 according to the dependent variable of input.Control unit 16 pressurizes according to the last time
The displacement waveform of diaphragm 12 in vibration and execute the oscillation in pressurization and vibration next time inhibit control.
(oscillation inhibits control)
Hereinafter, inhibiting an example of control to be illustrated the oscillation of control unit 16 referring to attached drawing.Inhibit control as oscillation
Specific method, it is contemplated that various methods, but oscillation described below inhibit control in, using according to last time pressurization vibration
The displacement waveform of diaphragm 12 in dynamic inhibits the method for the oscillation of the diaphragm 12 in pressurization and vibration next time.According to such vibration
Swing inhibition control, can with every time repeatedly the pressurization and vibration of diaphragm 12 and gradually inhibit to vibrate.
Fig. 7~Fig. 9 is the curve graph for showing the passage of the shift amount E of shift amount D and piezoelectric element 14 of diaphragm 12.Diaphragm
The passage of 12 shift amount D refers to the displacement waveform of diaphragm 12.The passage of the shift amount E of piezoelectric element 14 and control unit 16 generate
Driving pulse waveform it is identical.
In fig. 7 to fig. 9, it has been assumed that the case where diaphragm 12 is carried out continuously 3 pressurization and vibrations with predetermined time interval.In
In first time pressurization and vibration M1 shown in Fig. 7, does not execute oscillation and inhibit to control, in second of pressurization and vibration M2 shown in Fig. 8,
It performs oscillation according to the displacement waveform of Fig. 7 to inhibit to control, in third time pressurization and vibration M3 shown in Fig. 9, according to Fig. 8's
It shifts waveform and performs oscillation and inhibit control.Hereinafter, being described in detail.
It include first wave X1~the n-th in the displacement waveform of diaphragm 12 in first time pressurization and vibration M1 shown in Fig. 7
Wave Xn, wherein the second wave of wave X2~n-th Xn is oscillation.
It include first wave Y1~the n-th in the displacement waveform of diaphragm 12 in second of pressurization and vibration M2 shown in Fig. 8
Wave Yn, wherein the second wave of wave Y2~n-th Yn is oscillation.
It include first wave Z1~the n-th in the displacement waveform of diaphragm 12 in third time pressurization and vibration M3 shown in Fig. 9
Wave Zn, wherein the second wave of wave Z2~n-th Zn is oscillation.
(first time pressurization and vibration M1)
First time pressurization and vibration M1 is identical as the pressurization and vibration referring to illustrated by Fig. 2 in the above-described first embodiment.Control
Portion 16 processed is and the driving pulse of the voltage last transition of voltage first transition and moment T1~T2 with moment T0~T1
Piezoelectric element 14 is controlled.
Therefore, the voltage applied to piezoelectric element 14 rises to driving voltage (most from 0 (reference potential) in moment T0~T1
High potential), then 0 is dropped to from driving voltage in moment T1~T2.
As shown in fig. 7, in the voltage last transition of moment T1~T2, indicating piezoelectricity in first time pressurization and vibration M1
The LE1 of the displacement of element 14 and the line segment LD1 for the displacement for indicating diaphragm 12 do not intersect.Therefore, diaphragm 12 is reverted in moment T4
It is not contacted with abutment 15 before original state, therefore oscillation is kept intact.
(second of pressurization and vibration M2)
Then, control unit 16 obtains the displacement waveform of Fig. 7 from strain gauge 17.Then, control unit 16 is to reduce the displacement of Fig. 7
The mode for the oscillation that waveform is included determine reduce voltage opportunity and voltage reduction speed (slope), adjusted based on this
The waveform of driving pulse.
Specifically, as shown in figure 8, control unit 16 by voltage first transition with moment T5~T6, moment T6~
Between the voltage sustaining region of T7 and the driving pulse of the voltage last transition of moment T7~T8 and piezoelectric element 14 is controlled.
Therefore, the voltage applied to piezoelectric element 14 rises to driving voltage (most from 0 (reference potential) in moment T5~T6
High potential), it is maintained driving voltage in moment T6~T7, then drops to 0 from driving voltage in moment T7~T8.Moment T6~
Time width between the voltage sustaining region of T7 is TW1.
As shown in figure 8, in the voltage last transition of moment T7~T8, indicating piezoelectricity in second of pressurization and vibration M2
The LE2 of the displacement of element 14 and the line segment LD2 for the displacement for indicating diaphragm 12 intersect.This indicates diaphragm 12 in moment T7~T8 to original
The midway that state is restored is contacted with the abutment 15 in contraction.
Therefore, the contraction of the vibration abutting portion part 15 of diaphragm 12 absorbs, thus the oscillating phase ratio with Fig. 7, the oscillation of Fig. 8
Reduce.
(third time pressurization and vibration M3)
Then, control unit 16 obtains the displacement waveform of Fig. 8 from strain gauge 17.Then, control unit 16 is to further decrease Fig. 8
The mode of the displacement waveform oscillation that is included determine the reduction speed (slope) on the opportunity for reducing voltage and voltage, and base
Drive pulse waveform is further adjusted in this.
Specifically, as shown in figure 9, control unit 16 passes through voltage first transition, moment T10 with moment T9~T10
Between the voltage sustaining region of~T11 and the driving pulse of moment T11~T12 voltage last transition and to piezoelectric element 14 carry out
Control.Therefore, the voltage applied to piezoelectric element 14 rises to driving voltage (highest from 0 (reference potential) in moment T9~T10
Current potential), it is maintained driving voltage in moment T10~T11, then drops to 0 from driving voltage in moment T11~T12.Moment
The voltage sustaining region of T6~T7 at the time of than second pressurization and vibration M2 of time width TW2 between the voltage sustaining region of T10~T11
Between time width TW1 long.
As shown in figure 9, in the voltage last transition of moment T10~T11, indicating pressure in third time pressurization and vibration M3
The LE3 of the displacement of electric device 14 and the line segment LD3 for the displacement for indicating diaphragm 12 intersect.Therefore, diaphragm 12 is in moment T11~T12
The midway restored to original state is contacted with the abutment 15 in contraction.
Moreover, because the time width TW2 between voltage sustaining region is set longer than time width TW1, therefore diaphragm 12
The opportunity contacted with abutment 15 slightly lags.Therefore, it is absorbed by the contraction of the vibration abutting portion part 15 of diaphragm 12,
To the oscillating phase ratio with Fig. 8, the oscillation of Fig. 9 is further decreased.
(the 4th time and later pressurization and vibration)
More than, third time and pressurization and vibration before are illustrated, but the 4th time and can continue to execute later
Identical oscillation inhibits control.Alternatively, continuing to use driving of the oscillation maximum shift less than defined value when after being also possible to
Pulse, the maximum shift of oscillation become defined value it is above when, restart oscillation inhibit control.
(feature)
(1) in droplet ejection apparatus 20, control unit 16 applies in second of pressurization and vibration M2 to piezoelectric element 14
After driving voltage, oscillation is executed in moment T7~T8 and inhibits control, to reduce oscillation.Therefore, it can limit and be sprayed from liquid
Outlet 11c becomes drop to the amount of liquid that outside sprays, therefore can spray drop in high-precision.
(2) in droplet ejection apparatus 20, control unit 16 improves oscillation in moment T11~T12 and inhibits control, so that the
The oscillation in than second pressurization and vibration M2 of oscillation Z2~Zn in pressurization and vibration M3 further decreases three times.Therefore, Neng Goujin
The limitation of one step becomes drop to the amount of liquid that outside sprays from liquid spraying outlet 11c, therefore can spray liquid more in high-precision
Drop.
(other embodiments)
Describe the present invention by above embodiment, but should not be construed constitute the disclosure a part discussion and
Attached drawing is limitation of the invention.Those skilled in the art clearly various according to the disclosure can replace embodiment, implement
Example and application technology.
In first and second above-mentioned embodiment, inserted with abutment 15 between diaphragm 12 and piezoelectric element 14,
However, you can also not be inserted into abutment 15.In this case, bearing part 13 is directly contacted with piezoelectric element 14.In bearing part
In the case of 13 directly contact with piezoelectric element 14, bearing part 13 preferably with 14 point contact of piezoelectric element.
In first and second above-mentioned embodiment, abutment 15 has the curved surface 15S with 13 point contact of bearing part,
But not limited to this.As long as abutment 15 can with 13 point contact of bearing part, such as bearing part 13 have song
In the case where face, abutment 15 is also possible to plane.
In first and second above-mentioned embodiment, abutment 15 is shaped generally as hemispherical, and entirety, which is inserted in, holds
By between component 13 and piezoelectric element 14, but not limited to this.Abutment 15 only can also be inserted in receiving portion by part of it
Between part 13 and piezoelectric element 14.For example, abutment 15 is also possible to store the collector of the box-like of piezoelectric element 14.At this
In the case of, the bottom plate for being clipped in the collector between bearing part 13 and piezoelectric element 14 is functioned as abutment.
It is not specifically mentioned in first and second above-mentioned embodiment, but piezoelectric element 14 carries out flexible second direction
It can be vertical direction, be also possible to the direction intersected with vertical direction.That is, the telescopic direction of piezoelectric element 14 can be with vertical
Direction is independently set freely.Therefore, diaphragm 12 can also be configured at the side of liquid storage part 11, can also be configured at liquid
The bottom surface of body reservoir 11.
In the above-described 2nd embodiment, control unit 16 reduces complete in second and third time pressurization and vibration M2, M3
The mode of the oscillation in portion executes oscillation and inhibits control, and but not limited to this.Control unit 16 can also with so that oscillation a part not
Reduced mode inhibits control to execute oscillation.In this way, for example specially retained and not reducing the second wave or third wave, thus
It is capable of increasing the volume of drop.
In the above-described 2nd embodiment, droplet ejection apparatus 20 inhibits to determine diaphragm 12 every time in control in oscillation
Voltage reduces opportunity and voltage reduces speed, and but not limited to this.For example, it can be continue to use later according to for the first time
Displacement waveform and the voltage that determines reduces opportunity and voltage reduces speed.In this case, as long as the displacement of diaphragm 12 is become
As voltage reduction opportunity at the time of for below defined value.
In the above-described 2nd embodiment, droplet ejection apparatus 20 has strain gauge 17 and amplifier installation 18 to execute vibration
Inhibition control is swung, but even if not having strain gauge 17 and amplifier installation 18, droplet ejection apparatus 20 is also able to carry out oscillation
Inhibit control.As long as example, the displacement waveform of the diaphragm 12 when obtaining in advance using desired liquid and pre-determined energy
Enough driving pulses for inhibiting oscillation, control unit 16 do not need strain gauge 17 and amplifier dress just without adjusting driving pulse
Set 18.
In the above-described 2nd embodiment, control unit 16 adjusted in third time pressurization and vibration M3 between voltage sustaining region when
Between width, i.e. adjustment make voltage reduce opportunity, but not limited to this.Control unit 16 also can be by adjusting the reduction speed of voltage
(reduction current potential per unit time) is spent to adjust the reduction amount of oscillation." adjustment voltage reduces speed " specifically instigates figure
The slope that is temporally variable and changing decline of T11~T12 of 8 T7~T8 or Fig. 9.In addition, control unit 16 can also pass through tune
Both reduction speed of the whole opportunity for reducing voltage and voltage adjusts the reduction amount of oscillation.
In the above-described 2nd embodiment, control unit 16 is according to the diaphragm for the first time and in second pressurization and vibration M1, M2
12 shift amount inhibits control to execute oscillation, and but not limited to this.Control unit 16 is able to use oscillation and inhibits the pre- of control
The defined driving pulse first set inhibits control to execute oscillation.In this case, droplet ejection apparatus 20 can not also have
Standby strain gauge 17 and amplifier installation 18.
In the above-described 2nd embodiment, corresponding as an example based on the displacement of the displacement waveform by detecting diaphragm 12
Become meter 17 to be illustrated, but not limited to this.It is counted as displacement, the shape for being able to use the directly size of measurement diaphragm 12 is surveyed
Determine instrument etc..
Label declaration
10: droplet ejection apparatus；11: liquid storage part；12: diaphragm；13: bearing part；14: piezoelectric element；15: abutting
Component；16: control unit；17: strain gauge.
Claims (7)
1. a kind of droplet ejection apparatus, includes
Liquid storage part, with liquid spraying outlet；
Diaphragm changes the volume of the liquid storage part；
Bearing part is fixed on the diaphragm；And
Piezoelectric element applies pressurization and vibration to the bearing part,
The piezoelectric element is not fixed relative to the bearing part.
2. droplet ejection apparatus according to claim 1, wherein
The droplet ejection apparatus has the abutment abutted with the bearing part,
The abutment is fixed on the piezoelectric element, and is not fixed relative to the bearing part.
3. droplet ejection apparatus according to claim 1, wherein
The abutment and the bearing part point contact, and with the piezoelectric element face contact.
4. according to claim 1 to droplet ejection apparatus described in any one in 3, wherein
The droplet ejection apparatus has control unit, and the control unit is and to piezoelectric element application voltage to the pressure
The span of electric device is controlled,
The control unit executes after being applied with voltage to the piezoelectric element and reduces voltage so that the oscillation of the diaphragm
The oscillation that at least part reduces inhibits control.
5. droplet ejection apparatus according to claim 4, wherein
A part of oscillation of the control unit to make the diaphragm inhibits to control in a manner of not reducing to execute the oscillation.
6. droplet ejection apparatus according to claim 4 or 5, wherein
The droplet ejection apparatus has the displacement meter for the displacement waveform for detecting the diaphragm,
The control unit determines to inhibit the opportunity for reducing voltage in control in the oscillation according to the displacement waveform of the diaphragm
With the reduction speed of voltage.
7. droplet ejection apparatus according to claim 6, wherein
The control unit is according to the displacement waveform vibrated according to the beginning opportunity and the reduction speed and after reducing, next
Secondary oscillation inhibits at least one party in control in the opportunity of change reduction voltage and the reduction speed of voltage.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-060866 | 2017-03-27 | ||
| JP2017060866 | 2017-03-27 | ||
| PCT/JP2018/005914 WO2018180006A1 (en) | 2017-03-27 | 2018-02-20 | Droplet discharge device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110461608A true CN110461608A (en) | 2019-11-15 |
Family
ID=63674666
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880021185.0A Pending CN110461608A (en) | 2017-03-27 | 2018-02-20 | Droplet ejection apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2018180006A1 (en) |
| KR (1) | KR20190113908A (en) |
| CN (1) | CN110461608A (en) |
| WO (1) | WO2018180006A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018202770A (en) * | 2017-06-06 | 2018-12-27 | セーレン株式会社 | Inkjet head and inkjet recording device |
| WO2019230816A1 (en) * | 2018-06-01 | 2019-12-05 | 日本電産株式会社 | Liquid agent applying device |
| WO2022181736A1 (en) * | 2021-02-24 | 2022-09-01 | 国立大学法人山形大学 | Inkjet head, method for producing same, method for producing semiconductor device using same, and printing device |
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- 2018-02-20 WO PCT/JP2018/005914 patent/WO2018180006A1/en active Application Filing
- 2018-02-20 KR KR1020197025858A patent/KR20190113908A/en not_active Ceased
- 2018-02-20 JP JP2019508763A patent/JPWO2018180006A1/en active Pending
- 2018-02-20 CN CN201880021185.0A patent/CN110461608A/en active Pending
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| US5471232A (en) * | 1992-03-03 | 1995-11-28 | Seiko Epson Corporation | Ink jet recording head |
| JPH06305134A (en) * | 1993-04-23 | 1994-11-01 | Seiko Epson Corp | Inkjet head and driving method thereof |
| JP2000033694A (en) * | 1998-07-17 | 2000-02-02 | Max Co Ltd | Ink jet head mechanism |
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Also Published As
| Publication number | Publication date |
|---|---|
| WO2018180006A1 (en) | 2018-10-04 |
| KR20190113908A (en) | 2019-10-08 |
| JPWO2018180006A1 (en) | 2020-02-06 |
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