CN110437573B - Blended self-assembly of brush-like block polymers and their applications - Google Patents
Blended self-assembly of brush-like block polymers and their applications Download PDFInfo
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- CN110437573B CN110437573B CN201810416482.7A CN201810416482A CN110437573B CN 110437573 B CN110437573 B CN 110437573B CN 201810416482 A CN201810416482 A CN 201810416482A CN 110437573 B CN110437573 B CN 110437573B
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Abstract
The invention discloses a blending self-assembly material of a brush block polymer and application thereof, wherein the brush block polymer has a general formula of PNBPM-b-PNDM, and when m is 400 ═ 300-; when m is 400-; the blended self-assembly exhibits a blue shift in reflected wavelength from the center to the edge. The blended self-assembly is a circular film, and the main reflection wavelengths at different points on the radial line of the circular film and the distance from the points to the center of the photonic crystal film are in a linear relationship.
Description
Technical Field
The invention relates to the technical field of self-assembly of block copolymers, in particular to a blending self-assembly of a brush-shaped block polymer and application thereof.
Background
The photonic crystal can regulate and control the propagation of light waves due to the existence of an internal photon forbidden band structure, so that the photonic crystal has great application value, such as special pigment, waveguide, reflective coating and the like. Responsive photonic crystals are a class of materials whose reflected wavelength can change with changes in external physical or chemical conditions. Such materials must have a responsive group present in addition to the periodic structure necessary for conventional photonic crystals. Two methods are common for introducing responsive groups: (1) the photonic crystal structure is directly constructed by using a responsive material as a matrix, for example, a one-dimensional photonic crystal is prepared by using block polymer self-assembly, and a chain segment swells in a solvent atmosphere so as to show the change of reflection wavelength. (2) Firstly, a photonic crystal structure is prepared, and then a responsive material is doped into a matrix to form a stable photonic crystal composite material. According to the requirements, the photonic crystal materials with different responsivities such as Ph, temperature, chemical solvents, electric fields, magnetic fields and the like can be designed and prepared by the two methods.
Two brush-shaped block copolymers with large space and large volume steric hindrance have been synthesized in the prior art, and a one-dimensional photonic crystal material with adjustable reflection wavelength from ultraviolet visible near-infrared band is prepared by self-assembly. Although the method can prepare the photonic crystal with controllable reflection wavelength, a plurality of brush-shaped block polymers with different molecular weights are required to be respectively self-assembled, and the method is complicated. Therefore, it is important to invent a simple and feasible way to prepare photonic crystal materials.
Disclosure of Invention
The invention aims to provide a blending self-assembly of brush-shaped block polymers and application thereof, aiming at the technical defects in the prior art.
The technical scheme adopted for realizing the purpose of the invention is as follows:
the invention relates to a blending self-assembly of a brush block polymer, wherein the brush block polymer has a general formula of PNBPM-b-PNDM and has the following structural formula:
when m is 300-;
when m is 400-;
the blended self-assembly is prepared according to the following method:
and (2) blending equal-mass P1 and P2, uniformly dispersing the blended brush-shaped block copolymer in tetrahydrofuran to obtain a mixed solution, coating the mixed solution on a slide glass, and volatilizing the solvent at the room temperature of 20-25 ℃ to obtain the blended self-assembly.
In the technical scheme, m is 300, n is 300 in P1; in P2, m is 400 and n is 400.
In the technical scheme, m is 400, n is 400 in P1; in P2, m is 500 and n is 500.
In the above technical scheme, the P1 and P2 are prepared according to the following method:
dissolving norbornene monomer NAM with an alkyl chain into an organic solvent, adding a G-3 catalyst, stirring at 20-40 ℃ for reaction to homopolymerize the monomer NAM, then adding the well-dissolved norbornene monomer NBzM with a benzyl benzene structure into the reaction solution for continuous reaction to realize the copolymerization of the NAM and the NBzM, adding a terminator after the reaction is finished for quenching reaction, and finally obtaining a target dendritic block copolymer (PNAM-b-PNBzM), wherein the preferable molar ratio of G-3, NAM and NBzM is as follows: 1 (100- > 1000);
wherein: the structural formula of NAM is:
the structural formula of NBzM is:
(PNAM-b-PNBzM) has the structural formula:
a is n-decyl and Bz is benzyl.
In the above technical solution, the ratio of the mass part of P1 to the volume part of tetrahydrofuran is (5-15): (1-2), wherein the unit of parts by mass is mg, and the unit of parts by volume is mL.
In the technical scheme, the slide glass is a glass sheet.
Another aspect of the invention includes the use of the blended self-assembly in photonic crystal materials.
In the technical scheme, the blended self-assembly is applied to optical sensors, light valves, pigments and dyes.
In the above technical solution, the blended self-assembly exhibits blue shift of reflection wavelength from the center to the edge.
In the above technical scheme, the blended self-assembly is a circular film, and the main reflection wavelengths at different points on the radial line of the circular film and the distance from the point to the center of the photonic crystal film are in a linear relationship.
Compared with the prior art, the invention has the beneficial effects that:
the invention provides a simpler and more flexible method for preparing the photonic crystal material, and the reflection spectrum test shows that the blue shift change of the reflection wavelength is shown from the center to the edge of the photonic crystal film. In addition, a linear relation graph between the main reflection wavelength and the distance of the self-assembled film is obtained, and the relation between the material structure and the performance is well combined. The invention can be used in light sensor, light valve, pigment and dye, with high application value.
Drawings
FIG. 1 is a photograph of a blended self-assembled article (photonic crystal film) prepared in example 1.
FIG. 2 is a photograph of a blended self-assembled article (photonic crystal film) prepared in example 2.
FIG. 3 is a reflection spectrum of the blended self-assembled article (photonic crystal film) prepared in example 1.
FIG. 4 is a reflection spectrum of the blended self-assembled article (photonic crystal film) prepared in example 2.
FIG. 5 is a plot of the wavelength of maximum reflection versus distance for the blended self-assembled article (photonic crystal film) prepared in example 1.
FIG. 6 is a plot of the wavelength of maximum reflection versus distance for the blended self-assembled article (photonic crystal film) prepared in example 2.
Detailed Description
The invention is described in further detail below with reference to the figures and specific examples. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In the examples below, the brush block polymer (PNBPM-b-PNDM) has the formula:
wherein:
when m is 300, PNBPM-b-PNDM is marked as DBCP1, and the copolymerization degree is 600;
when m is 400, PNBPM-b-PNDM is marked as DBCP2, and the copolymerization degree is 800;
when m is 500, PNBPM-b-PNDM is marked as DBCP3, and the copolymerization degree is 1000;
example 1
Blending self-assembly method of DBCP1 and DBCP 2:
(1) synthesis of DBCP 1:
a10 mL polymerization flask was charged with norbornene monomer NBPM (57.6mg, 91.2. mu. mol), 1mL of dry methylene chloride, and G-3(0.27mg, 0.31X 10)-3mmol) of a dichloromethane solution, and the reaction is stirred at ordinary temperature for 30 minutes, and then 1.1mL of a dichloromethane solution containing norbornene monomer NDM (72.2mg, 91.2. mu. mol) is added to the above reaction solution to continue the reaction for 1 hour, the whole addition and reaction process being carried out in a glove box. After the reaction was complete, 1mL of ethyl vinyl ether was added to quench the reaction. The mixture was removed from the glove box, precipitated in anhydrous methanol, centrifuged, and vacuum-dried to obtain a brush-like block polymer DBCP1 having a backbone polymerization degree of 600, wherein the polymerization degree of NBPM is 300 and the polymerization degree of NDM is 300.
Wherein: the structural formula of NBPM is:
the structural formula of NDM is:
the structures of NBPM and NDM in the following examples are also the same as described above.
(2) Synthesis of DBCP 2:
NBPM (57.6mg, 91.2. mu. mol), 1mL dry methylene chloride, and G-3(0.21mg, 0.23X 10) were added to a 10mL polymerization flask-3mmol) of dichloromethane solution, stirring the reaction solution at room temperature for 30 minutes, adding 1.1mL of dichloromethane solution containing NDM (72.2mg, 91.2. mu. mol) into the reaction solution, and continuing the reaction for 1 hour, wherein the whole addition and reaction process are carried out in a glove box. After the reaction was complete, 1mL of ethyl vinyl ether was added to quench the reaction. The mixture was removed from the glove box, precipitated in anhydrous methanol, centrifuged, and vacuum-dried to obtain a brush-like block polymer DBCP2 having a backbone polymerization degree of 800, wherein the polymerization degree of NBPM is 400 and the polymerization degree of NDM is 400.
(3) Blending self-assembly of DBCP1 and DBCP 2:
respectively weighing 10mg of DBCP1 and 10mg of DBCP2, performing equal-mass blending, uniformly dispersing the blended brush-shaped block copolymer in 1.5mL of Tetrahydrofuran (THF), coating the mixed solution on a glass sheet, volatilizing the solvent at room temperature to obtain a photonic crystal film, wherein a macroscopic picture of the photonic crystal film is shown in figure 1, five points A1, A2, A3, A4 and A5 on the same radius are taken, a reflection spectrum diagram is shown in figure 3, and the blue shift change of the reflection wavelength is shown from the center to the edge of the film.
The blended self-assembly (photonic crystal film) prepared in example 1 has a circular structure, and a reflection spectrum test is performed on the blended self-assembly, so that the main reflection wavelength at different points (A1, A2, A3, A4 and A5) on the same radius of the photonic crystal film is in a linear relation with the distance from the points to the center of the photonic crystal film, and a graph showing the relation between the maximum reflection wavelength and the distance is shown in FIG. 5.
Example 2
Blending self-assembly method of DBCP2 and DBCP 3:
(1) synthesis of DBCP 2:
the specific procedure was the same as the synthesis procedure of DBCP2 in example 1.
(2) Synthesis of DBCP 3:
NBPM (57.6mg, 91.2. mu. mol), 1mL dry methylene chloride, and G-3(0.16mg, 0.18X 10) were added to a 10mL polymerization flask-3mmol) of methylene chloride solution 0.1mL, and stirring at room temperature30 minutes, then 1.1mL of a solution containing NDM (72.2mg, 91.2. mu. mol) in methylene chloride was added to the reaction solution and the reaction was continued for 1 hour, the entire addition and reaction was carried out in a glove box. After the reaction was complete, 1mL of ethyl vinyl ether was added to quench the reaction. The mixture was removed from the glove box, precipitated in anhydrous methanol, centrifuged, and vacuum-dried to obtain a brush-like block polymer DBCP3 having a backbone polymerization degree of 1000, wherein the polymerization degree of NBPM is 500 and the polymerization degree of NDM is 500.
(3) Blending self-assembly method of DBCP2 and DBCP 3:
respectively weighing 10mg of DBCP2 and 10mg of DBCP3, performing equal-mass blending, uniformly dispersing the blended brush-shaped block copolymer in 1.5mL of Tetrahydrofuran (THF), coating the mixed solution on a glass sheet, volatilizing the solvent at room temperature to obtain a photonic crystal film, wherein a macroscopic photograph of the photonic crystal film is shown in figure 2, five points B1, B2, B3, B4 and B5 on the same radius are taken, a reflection spectrum diagram of the photonic crystal film is shown in figure 4, and the blue shift change of the reflection wavelength is shown from the center to the edge of the photonic crystal film.
The reflection spectrum test is performed on the blended self-assembled film (photonic crystal film) prepared in example 2, the main reflection wavelength at different points on the radial line of the photonic crystal film and the distance from the point to the center of the photonic crystal film are in a linear relationship, and a graph showing the relationship between the maximum reflection wavelength and the distance is shown in fig. 5.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (11)
1. A blended self-assembly of brush block polymers having the general formula PNBPM-b-PNDM, the structural formula:
when m is 300-;
when m is 400-;
the blended self-assembly is prepared according to the following method:
and (2) blending equal-mass P1 and P2, uniformly dispersing the blended brush-shaped block polymer in tetrahydrofuran to obtain a mixed solution, coating the mixed solution on a slide glass, and volatilizing the solvent at the room temperature of 20-25 ℃ to obtain the blended self-assembly.
2. The blended self-assembly of brush block polymers of claim 1, wherein P1 has m-300, n-300; in P2, m is 400 and n is 400.
3. The blended self-assembly of brush block polymers of claim 1, wherein P1 where m is 400 and n is 400; in P2, m is 500 and n is 500.
4. The blended self-assembly of brush block polymers of claim 1, wherein the P1 and P2 are prepared according to the following method:
dissolving norbornene monomer NDM with an alkyl chain into an organic solvent, adding a G-3 catalyst, stirring at 20-40 ℃ for reaction to homopolymerize the monomer NDM, then adding the dissolved norbornene monomer NBPM with a benzyl benzene structure into the reaction solution for continuous reaction to realize the copolymerization of the NDM and the NBPM, adding a terminator after the reaction is finished for quenching reaction, and finally obtaining the target brush-shaped block polymer PNBPM-b-PNDM;
wherein: the structural formula of NDM is:
the structural formula of NBPM is:
the structural formula of the PNBPM-b-PNDM is as follows:
a is n-decyl and Bz is benzyl.
5. The blended self-assembly of brush block polymers according to claim 4, wherein the ratio of the parts by mass of P1 to the parts by volume of tetrahydrofuran is (5-15): (1-2), wherein the unit of parts by mass is mg, and the unit of parts by volume is mL.
6. The blended self-assembly of brush block polymers of claim 4, wherein the carrier sheet is a glass sheet.
7. The blended self-assembly of brush block polymers of claim 4, wherein the molar ratio of G-3, NDM, NBPM is: 1:(100-1000):(100-1000).
8. Use of the blended self-assembly of claim 1 in a photonic crystal material.
9. Use according to claim 8, wherein the blended self-assembly is used in light sensors, light valves, pigments and dyes.
10. The use of claim 9, wherein the blended self-assembly exhibits a blue-shift in reflected wavelength from the center to the edge.
11. The use of claim 8, wherein the blended self-assembly is a circular film having a linear relationship between the wavelength of the primary reflection at different points on a radial line of the circular film and the distance from the point to the center of the photonic crystal film.
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| TW200617066A (en) * | 2004-11-17 | 2006-06-01 | Univ Nat Taiwan Science Tech | Water-soluble self-assembly nano-scale architectures and method for producing the same |
| CN103992484A (en) * | 2014-05-15 | 2014-08-20 | 长春理工大学 | Brush-like block copolymer with macromolecules at chain ends and preparation method thereof |
| CN107337783A (en) * | 2017-05-09 | 2017-11-10 | 长春理工大学 | A kind of preparation method with pearly-lustre photonic crystal |
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| TW200617066A (en) * | 2004-11-17 | 2006-06-01 | Univ Nat Taiwan Science Tech | Water-soluble self-assembly nano-scale architectures and method for producing the same |
| CN103992484A (en) * | 2014-05-15 | 2014-08-20 | 长春理工大学 | Brush-like block copolymer with macromolecules at chain ends and preparation method thereof |
| CN107337783A (en) * | 2017-05-09 | 2017-11-10 | 长春理工大学 | A kind of preparation method with pearly-lustre photonic crystal |
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| Aggregation-induced emission polymer nanoparticles with pH-responsive fluorescence;Zhao, YM等;《Polymer chemistry》;20161231;第7卷(第34期);第5386-5395页 * |
| 嵌段树状聚合物刷自组装制备紫外-可见-近红外一维光子晶体;任丽霞等;《中国化学会2017全国高分子学术论文报告会摘要集——主题J：高分子组装与超分子体系》;20171010;第520页 * |
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