CN110429148B - Selenide nanorod, preparation method thereof and photoelectric detector prepared from selenide nanorod - Google Patents
Selenide nanorod, preparation method thereof and photoelectric detector prepared from selenide nanorod Download PDFInfo
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- 239000002073 nanorod Substances 0.000 title claims abstract description 67
- 150000003346 selenoethers Chemical class 0.000 title claims abstract description 34
- 238000002360 preparation method Methods 0.000 title claims abstract description 18
- 239000004065 semiconductor Substances 0.000 claims abstract description 24
- 238000003756 stirring Methods 0.000 claims abstract description 23
- 239000000203 mixture Substances 0.000 claims abstract description 14
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims abstract description 12
- -1 hydroxide ions Chemical class 0.000 claims abstract description 8
- 239000000843 powder Substances 0.000 claims abstract description 8
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 239000002904 solvent Substances 0.000 claims abstract description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 36
- 239000000047 product Substances 0.000 claims description 29
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000008367 deionised water Substances 0.000 claims description 15
- 229910021641 deionized water Inorganic materials 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 239000012265 solid product Substances 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 10
- 239000012459 cleaning agent Substances 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 8
- 239000003960 organic solvent Substances 0.000 claims description 7
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 7
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 5
- 238000001291 vacuum drying Methods 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 239000000376 reactant Substances 0.000 claims description 4
- 150000001336 alkenes Chemical class 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 150000001924 cycloalkanes Chemical class 0.000 claims description 2
- 235000021281 monounsaturated fatty acids Nutrition 0.000 claims description 2
- 229910052754 neon Inorganic materials 0.000 claims description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 2
- 238000005119 centrifugation Methods 0.000 claims 3
- 101710134784 Agnoprotein Proteins 0.000 claims 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 150000001335 aliphatic alkanes Chemical class 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 16
- 239000013078 crystal Substances 0.000 abstract description 15
- 239000003513 alkali Substances 0.000 abstract description 11
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(I) nitrate Inorganic materials [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 abstract description 11
- 238000001179 sorption measurement Methods 0.000 abstract description 6
- 229910018162 SeO2 Inorganic materials 0.000 abstract description 5
- 229910052984 zinc sulfide Inorganic materials 0.000 abstract description 5
- 230000003595 spectral effect Effects 0.000 abstract description 4
- 230000002860 competitive effect Effects 0.000 abstract description 3
- 239000011541 reaction mixture Substances 0.000 abstract description 3
- 238000010790 dilution Methods 0.000 abstract description 2
- 239000012895 dilution Substances 0.000 abstract description 2
- 230000001939 inductive effect Effects 0.000 abstract description 2
- 238000000926 separation method Methods 0.000 abstract 1
- 239000002086 nanomaterial Substances 0.000 description 18
- 238000005286 illumination Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 15
- 230000004044 response Effects 0.000 description 11
- 239000010408 film Substances 0.000 description 10
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 239000002120 nanofilm Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- AKUCEXGLFUSJCD-UHFFFAOYSA-N indium(3+);selenium(2-) Chemical compound [Se-2].[Se-2].[Se-2].[In+3].[In+3] AKUCEXGLFUSJCD-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000010907 mechanical stirring Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 238000005411 Van der Waals force Methods 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052976 metal sulfide Inorganic materials 0.000 description 2
- 239000002127 nanobelt Substances 0.000 description 2
- 230000005622 photoelectricity Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- NMHFBDQVKIZULJ-UHFFFAOYSA-N selanylideneindium Chemical compound [In]=[Se] NMHFBDQVKIZULJ-UHFFFAOYSA-N 0.000 description 1
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/143—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies comprising quantum structures
- H10F77/1437—Quantum wires or nanorods
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- B82Y40/00—Manufacture or treatment of nanostructures
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- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
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- H10F77/10—Semiconductor bodies
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- H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Y02E10/541—CuInSe2 material PV cells
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Abstract
The invention discloses a selenide nanorod, a preparation method thereof and a photoelectric detector prepared by the selenide nanorod, and belongs to the field of preparation of nano semiconductors. The method comprises the following steps: KOH and SeO2Powder, AgNO3And In (NO)3)3Dissolving the mixture in a non-coordinating solvent and a small amount of ethylenediamine, stirring vigorously at 200-240 ℃ under the protection of inert gas, and keeping the temperature for 12-24 hours to prepare the selenide nano-rods. Separation of hydroxide ions of alkali in molten state intoAndthen, under the dilution of a non-coordinating solvent, the viscosity is reduced to improve the fluidity, In is In the alkaline environment of molten alkali2Se3Forming crystal nucleus with wurtzite structure, and finally inducing growth direction to promote In by competitive adsorption of ethylenediamine molecule to crystal face In reaction mixture2Se3Continuous adsorption of crystal nucleusAnd a small amount ofAnd anisotropic growth. The problem of in the actual use, intrinsic conductivity is too low, leads to the spectral responsivity of detector and external quantum efficiency lower is solved.
Description
Technical Field
The invention belongs to the field of preparation of nano semiconductors, and particularly relates to a selenide nanorod, a preparation method thereof and a photoelectric detector prepared by the selenide nanorod.
Background
As the basis of nano-science and technology, the preparation and application of new nano-materials have become an important research direction in nano-science and technology. Semiconductor nano materials are gradually becoming hot research materials of the present society due to the specific physicochemical properties of the semiconductor nano materials. Researchers successfully develop a series of devices with representative functions, such as a light-emitting diode, a large solar cell, a photoelectric detector and the like, by applying the nano semiconductor to a photoelectric device, and play an indispensable role in actual industrial production and social life. Taking a photodetector as an example, the photoconductive characteristic of a semiconductor material is a key index for determining the performance of the photodetector. Therefore, how to realize the controllable preparation of the nano material and give full play to the application value of the nano material in the photoelectric field is also an important problem to be considered by researchers.
Among many nano semiconductor materials, a metal sulfide semiconductor is a research focus of the present, materials such as ZnO, ZnS, CdS, etc. have been widely used in the field of photoelectricity, and research on selenides is relatively delayed. Wherein, indium selenide In2Se3As a new type of nano-material, due to its unique crystal structure, a plurality of one-dimensional nanobelts are generally stacked in one direction by van der waals force to form a one-dimensional nanorod. The nano indium selenide material can be used as a single device and can also be used as a connecting unit in a nano device, so that the research on the nano indium selenide material is of great significance. However, in practical use, the intrinsic conductivity is too low, which results in low thermoelectric power factor, and thus the spectral responsivity and external quantum efficiency of the detector prepared thereby are low.
Disclosure of Invention
The purpose of the invention is as follows: a method for manufacturing a nanorod film photodetector is provided to solve the problems involved in the background art.
The technical scheme is as follows: a nanorod thin film photodetector, comprising:
substrate of SiO2A rectangular base plate prepared from Si;
the electrode, carve two interdigital Au electrodes that deflect the predetermined distance on the said base, its length-width ratio is 10:1, the finger interval is the same as said interdigital Au electrode width;
the semiconductor medium is filled with selenide nano-rods between the electrodes to form a film;
The preparation method of the selenide nanorod comprises the following steps:
s1, mixing KOH and SeO2Powder, AgNO3And In (NO)3)3Placing into a reaction vessel, and adopting mechanical shaking/stirring to fully mix reactants;
s2, adding an organic solvent and a small amount of ethylenediamine into the reaction container, heating to 80-100 ℃ under the protection of inert gas, and stirring by ultrasonic waves until the solid is completely dissolved;
s3, continuously heating to 200-240 ℃ under the protection of inert gas, violently stirring, and keeping the temperature for 12-24 hours;
and S4, after the nano-rod is cooled to room temperature, collecting, centrifuging, washing and drying the nano-rod product.
In further implementation, KOH and SeO in the step S12Powder, AgNO3And In (NO)3)3The molar ratio of the components is 100-1000: 5: 3 x: feeding at 5-3x, wherein x = 0-0.05.
In a further embodiment, the reaction vessel is made of polytetrafluoroethylene or coated with a polytetrafluoroethylene coating on the inside thereof.
In a further embodiment, the organic solvent is a non-coordinating solvent, and is at least one of a medium-long chain monounsaturated fatty acid, a medium-long chain alkylamine, a medium-long chain monounsaturated olefin, or a medium-long chain cycloalkane.
In the further implementation process, the adding amount of the ethylenediamine is 1-5% of the volume of the added organic solvent.
In a further embodiment, the inert gas is at least one of nitrogen, argon, neon.
In a further implementation process, the step S4 specifically includes:
s41, dissolving the product with deionized water, cleaning, adjusting with dilute hydrochloric acid to remove potassium hydroxide on the surface of the product, and then continuously cleaning with deionized water;
s42, adding the cleaned product into an acetone cleaning agent, fully stirring by using ultrasonic waves, and then centrifuging;
s43, taking out the centrifuged lower-layer solid product, adding the centrifuged lower-layer solid product into an isopropanol cleaning agent, fully stirring the mixture by using ultrasonic waves, and centrifuging the mixture;
s44, taking out the centrifuged lower-layer solid product, and repeating the steps S42-S42 for 2-3 times;
s45, and drying the final centrifugal product in a vacuum drying oven at 50-80 ℃ to obtain the nanorod.
Semiconductor medium used in nano-rod film photoelectric detectorThe nano-rod is the product obtained by the preparation method.
Has the advantages that: the invention relates to a method for preparing a nano-rod film photoelectric detector, which separates hydroxide ions of alkali in a molten state intoAndthen, under the dilution of an organic solvent, reducing the viscosity as much as possible to improve the fluidity thereof, providing a reaction environment In which In is In such an alkaline environment of a molten alkali2Se3Forming crystal nucleus with wurtzite structure, and finally inducing growth direction to promote In by competitive adsorption of ethylenediamine molecule to crystal face In reaction mixture2Se3Continuous adsorption of crystal nucleusAnd a small amount ofAnd anisotropic growth. The problem of in the actual use, intrinsic conductivity is too low, leads to the spectral responsivity of detector and external quantum efficiency lower is solved.
Drawings
Fig. 1 is a schematic view of the structure of a photodetector according to the present invention.
FIG. 2 is a Scanning Electron Microscope (SEM) image of the product prepared in example 1 of the present invention.
FIG. 3 is a Scanning Electron Microscope (SEM) image of the product prepared in example 2 of the present invention.
The reference signs are: a substrate 1, an electrode 2 and a semiconductor medium 3.
Detailed Description
In the following description, numerous specific details are set forth in order to provide a more thorough understanding of the present invention. It will be apparent, however, to one skilled in the art, that the present invention may be practiced without one or more of these specific details. In other instances, well-known features have not been described in order to avoid obscuring the invention.
As shown in fig. 1, a nanorod film photodetector includes: a substrate 1, an electrode 2 and a semiconductor medium 3. Wherein, the substrate 1 is made of SiO2A rectangular base plate prepared from Si; the electrodes 2 are two interdigital Au electrodes which are carved on the substrate 1 and are offset by a preset distance, the length-width ratio of the electrodes is 10:1, and the finger spacing is the same as the width of the interdigital Au electrodes; the semiconductor medium 3 is a selenide nano-rod filled between the electrodes 2 to form a film.
Among many nano semiconductor materials, a metal sulfide semiconductor is a research focus of the present, materials such as ZnO, ZnS, CdS, etc. have been widely used in the field of photoelectricity, and research on selenides is relatively delayed. Wherein, In2Se3Indium selenide, as a novel nano material, is generally stacked by van der waals force along one direction from a plurality of one-dimensional nanobelts due to its unique crystal structure to form a one-dimensional nanorod. It can be made intoThe nano indium selenide material can be used as a single device and can also be used as a connecting unit in a nano device, so that the research on the nano indium selenide material is of great significance. However, in practical use, the intrinsic conductivity is too low, which results in low thermoelectric power factor, and thus the spectral responsivity and external quantum efficiency of the detector are low. Thus, the selenide nanorods are,x=0~0.05。
Multiple comparison experiments prove that the invention adopts a novel nano material synthesis method-composite alkali medium method to prepareAnd meanwhile, partial method is improved. Like pure water will ionize to form H+And OH-Similarly, the hydroxide ion of alkali in molten state can be further separated intoAndat this time, the viscosity of the molten alkali solution is large, and the fluidity is poor, which is not favorable for the formation and growth of crystal nuclei. In the prior art, a small amount of deionized water is usually added, so that not only can the alkalinity of the molten alkali be improved, but also the viscosity of the molten alkali can be reduced and the fluidity can be improved. However, it is considered that the deionized water is a coordination solvent and has certain influence on the growth orientation during the crystal nucleus growth process, so that the method is suitable for the synthesis of most of nano materials which do not have excessive requirements on the growth orientation. Due to the inventionThe material is mainly applied to a photoelectric detector, and the crystal growth orientation, the integrity of a one-dimensional structure and the photosensitive performance of the material have great influence. Therefore, there is a need for improvements to the above-described methods to improveThe integrity of the one-dimensional structure of the nanomaterial, in the invention, the coordinating solvent is replaced by a non-coordinating solvent, so that the adhesion of molten alkali is reduced and the fluidity is improved. Although the alkalinity of molten alkali cannot be improved like deionized water, the synthesis yield and the synthesis rate of the nano material are reduced, but the integrity of the crystal structure can be ensured. Finally, a small amount of ethylenediamine is added, and the growth direction is induced by competitive adsorption of ethylenediamine molecules on crystal faces In the reaction mixture to promote In2Se3Continuous adsorption of crystal nucleusAnd a small amount ofAnd anisotropic growth, improving the integrity of the one-dimensional structure of the crystal.
Further will beThe nano material is used as a semiconductor medium to be prepared into a nanorod film photoelectric detector for application, and the photoconductive characteristic of the nano material is tested (the conductivity of the material changes under illumination).
The invention will now be further described with reference to the following examples, which are intended to be illustrative of the invention and are not to be construed as limiting the invention. The examples, where specific techniques and reaction conditions are not indicated, can be carried out according to the techniques or conditions or product specifications described in the literature in the field. Reagents, instruments or equipment of any manufacturer not indicated are commercially available.
Example 1
Preparing a selenide nanorod: 20g of KOH, 5mmol of SeO2Powder, 0.1mmol of AgNO3And 4.9mmol of dried In (NO)3)3▪4H2Adding O into a stainless steel reaction kettle lined with polytetrafluoroethylene, adopting mechanical stirring, fully mixing and reactingAdding 10ml of 1-octadecene and 0.2ml of ethylenediamine into a reaction container, heating to 80-100 ℃ under the protection of argon, and stirring by adopting ultrasonic waves until all solids are dissolved; then, under the protection of argon, continuously heating to 200-240 ℃, violently stirring by adopting a magnetic stirrer, and keeping the temperature for 12 hours; and after the mixture is cooled to room temperature, collecting the nanorod product.
Removing impurities of the selenide nanorods: dissolving the product with deionized water, cleaning, adjusting with dilute hydrochloric acid to remove potassium hydroxide on the surface of the product, and continuously cleaning with deionized water; then adding the cleaned product into an acetone cleaning agent, fully stirring by using ultrasonic waves, and then centrifuging; taking out the centrifuged lower-layer solid product, adding the centrifuged lower-layer solid product into an isopropanol cleaning agent, fully stirring the mixture by using ultrasonic waves, and centrifuging the mixture; taking out the centrifuged lower solid product, and repeating the above steps for 2 times; and drying the final centrifugal product in a vacuum drying oven at 60 ℃ to obtain the nanorod.
Preparing a photoelectric detector: photoetching interdigital Au electrodes with the width of 25um, the length of 250um and the finger spacing of 25um on a silicon substrate with the length multiplied by the width multiplied by the height of 300 multiplied by 20 um; then ultrasonically dispersing the synthesized nano rod in chloroform according to the concentration of 5mol/L, then dripping the nano rod on an interdigital Au electrode, and drying the interdigital Au electrode in a vacuum oven at the temperature of 40 ℃ for half an hour to obtain the nano rod film semiconductor.
Detection of photoconductive characteristics at a fixed light intensity of 12.05mWcm-2Under the bias of 20V, the time response of the thin-film photoelectric detector is 0.9s and the current on the nano-film is reduced from 280nA to 3nA in the processes of illumination from 'on' (illumination condition) and 'off' (dark field condition); during the illumination from "off" (dark field condition) and "on" (illumination condition), the time response of the thin film photodetector is 0.5s and the current on the nano-film is reduced from 3nA to 280 nA.
Example 2
Preparing a selenide nanorod: putting 20g of KOH, 5mmol of SeO2 powder, 0.1mmol of AgNO3 and 4.9mmol of dried In (NO3)3 into a stainless steel reaction kettle lined with polytetrafluoroethylene, fully mixing reactants by mechanical stirring, adding 5ml of deionized water and 0.1ml of ethylenediamine into the reaction kettle, heating to 80-100 ℃ under the protection of argon, and stirring by ultrasonic waves until all solids are dissolved; then, under the protection of argon, continuously heating to 200-240 ℃, violently stirring by adopting a magnetic stirrer, and keeping the temperature for 12 hours; and after the mixture is cooled to room temperature, collecting the nanorod product.
Removing impurities of the selenide nanorods: dissolving the product with deionized water, cleaning, adjusting with dilute hydrochloric acid to remove potassium hydroxide on the surface of the product, and continuously cleaning with deionized water; then adding the cleaned product into an acetone cleaning agent, fully stirring by using ultrasonic waves, and then centrifuging; taking out the centrifuged lower-layer solid product, adding the centrifuged lower-layer solid product into an isopropanol cleaning agent, fully stirring the mixture by using ultrasonic waves, and centrifuging the mixture; taking out the centrifuged lower solid product, and repeating the above steps for 2 times; and drying the final centrifugal product in a vacuum drying oven at 60 ℃ to obtain the nanorod.
Preparing a photoelectric detector: photoetching interdigital Au electrodes with the width of 25um, the length of 250um and the finger spacing of 25um on a silicon substrate with the length multiplied by the width multiplied by the height of 300 multiplied by 20 um; then ultrasonically dispersing the synthesized nano rod in chloroform according to the concentration of 5mol/L, then dripping the nano rod on an interdigital Au electrode, and drying the interdigital Au electrode in a vacuum oven at the temperature of 40 ℃ for half an hour to obtain the nano rod film semiconductor.
Detection of photoconductive characteristics at a fixed light intensity of 12.05mWcm-2Under the bias of 20V, the time response of the thin-film photoelectric detector is 1.7s in the process of illumination from 'on' (illumination condition) and 'off' (dark field condition), and the current on the nano-film is reduced from 260nA to 3 nA; during the illumination from "off" (dark field condition) and "on" (illumination condition), the time response of the thin film photodetector is 0.9s and the current on the nano-film is reduced from 3nA to 260 nA.
Example 3
Preparing a selenide nanorod: 20g of KOH, 5mmol of SeO2Powder and 5mmol of dried In (NO)3)3▪4H2Putting O into a stainless steel reaction kettle lined with polytetrafluoroethylene,fully mixing reactants by adopting mechanical stirring, then adding 10ml of 1-octadecene and 0.2ml of ethylenediamine into a reaction container, heating to 80-100 ℃ under the protection of argon, and stirring by adopting ultrasonic waves until all solids are dissolved; then, under the protection of argon, continuously heating to 200-240 ℃, violently stirring by adopting a magnetic stirrer, and keeping the temperature for 12 hours; and after the mixture is cooled to room temperature, collecting the nanorod product.
Removing impurities of the selenide nanorods: dissolving the product with deionized water, cleaning, adjusting with dilute hydrochloric acid to remove potassium hydroxide on the surface of the product, and continuously cleaning with deionized water; then adding the cleaned product into an acetone cleaning agent, fully stirring by using ultrasonic waves, and then centrifuging; taking out the centrifuged lower-layer solid product, adding the centrifuged lower-layer solid product into an isopropanol cleaning agent, fully stirring the mixture by using ultrasonic waves, and centrifuging the mixture; taking out the centrifuged lower solid product, and repeating the above steps for 2 times; and drying the final centrifugal product in a vacuum drying oven at 60 ℃ to obtain the nanorod.
Preparing a photoelectric detector: photoetching interdigital Au electrodes with the width of 25um, the length of 250um and the finger spacing of 25um on a silicon substrate with the length multiplied by the width multiplied by the height of 300 multiplied by 20 um; then ultrasonically dispersing the synthesized nano rod in chloroform according to the concentration of 5mol/L, then dripping the nano rod on an interdigital Au electrode, and drying the interdigital Au electrode in a vacuum oven at the temperature of 40 ℃ for half an hour to obtain the nano rod film semiconductor.
Detection of photoconductive characteristics at a fixed light intensity of 12.05mWcm-2Under the bias of 20V, the time response of the thin-film photoelectric detector is 1.0s and the current on the nanometer thin film is reduced from 60nA to 9nA in the processes of illumination from 'on' (illumination condition) and 'off' (dark field condition); during the illumination from "off" (dark field condition) and "on" (illumination condition), the time response of the thin film photodetector is 0.5s and the current on the nano-film is reduced from 9nA to 60 nA.
Comparative example 1
Preparing a photoelectric detector: photoetching interdigital Au electrodes with the width of 25um, the length of 250um and the finger spacing of 25um on a silicon substrate with the length multiplied by the width multiplied by the height of 300 multiplied by 20 um; then, the commercial ZnS nano-rod is ultrasonically dispersed in chloroform according to the concentration of 5mol/L, and then is dripped on an interdigital Au electrode, and is dried in a vacuum oven at the temperature of 40 ℃ for half an hour to obtain the nano-rod thin film semiconductor.
Detection of photoconductive characteristics at a fixed light intensity of 12.05mWcm-2Under the bias of 20V, the time response of the thin-film photoelectric detector is 1.1s and the current on the nanometer thin film is reduced from 150nA to 2nA in the processes of illumination from 'on' (illumination condition) and 'off' (dark field condition); during the illumination from "off" (dark field condition) and "on" (illumination condition), the time response of the thin film photodetector is 0.6s and the current on the nano-film is reduced from 2nA to 150 nA.
Comparing examples 1-3 with comparative example 1, the response time of the nanorod semiconductor material prepared in the invention is 0.5s and 0.9s, the intrinsic conductivity change rate of the nanomaterial at the time of on-off is up to 90 times, and the nanorod semiconductor material is comparable to or even more excellent than commercially available semiconductor nanorods (the response time is 0.6s and 1.1s, and the intrinsic conductivity change rate of the nanomaterial at the time of on-off is 75 times). Wherein, comparing FIGS. 2-3, it can be seen that example 2 (using deionized water to reduce the viscosity of the molten base)The one-dimensional integrity of the nanomaterial is not high enough, which in turn results in low photosensitive performance (response times of 0.9s and 1.7 s). Example 3 (undoped silver ion)The intrinsic conductivity of the nanomaterial is large, resulting in a small rate of change of the intrinsic conductivity of the nanomaterial at the time of on-off.
It should be noted that the various features described in the above embodiments may be combined in any suitable manner without departing from the scope of the invention. The invention is not described in detail in order to avoid unnecessary repetition.
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