CN110391165A - Transfer and Die Carriers - Google Patents
Transfer and Die Carriers Download PDFInfo
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- CN110391165A CN110391165A CN201810348132.1A CN201810348132A CN110391165A CN 110391165 A CN110391165 A CN 110391165A CN 201810348132 A CN201810348132 A CN 201810348132A CN 110391165 A CN110391165 A CN 110391165A
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- 239000000969 carrier Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract description 149
- 239000013078 crystal Substances 0.000 claims abstract 9
- 239000000463 material Substances 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 8
- 229910002601 GaN Inorganic materials 0.000 claims description 7
- 229910052594 sapphire Inorganic materials 0.000 claims description 7
- 239000010980 sapphire Substances 0.000 claims description 7
- 239000000853 adhesive Substances 0.000 description 31
- 230000001070 adhesive effect Effects 0.000 description 31
- 238000000034 method Methods 0.000 description 21
- 239000012790 adhesive layer Substances 0.000 description 19
- 238000010586 diagram Methods 0.000 description 14
- 239000010410 layer Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- Engineering & Computer Science (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Abstract
Description
技术领域technical field
本发明关于一种转移载板与晶粒载板,特别是一种具有表面微结构的转移载板与晶粒载板。The invention relates to a transfer carrier and a grain carrier, in particular to a transfer carrier and a grain carrier with surface microstructures.
背景技术Background technique
发光二极管(light emitting diode,LED)作为高效率的发光元件,被广泛的使用在各种领域。目前现有的发光元件制造方法是通过磊晶的方式,在磊晶基板上依序形成N型半导体层、发光层、P型半导体层与电极,借此得到发光元件。Light emitting diodes (light emitting diodes, LEDs), as high-efficiency light emitting elements, are widely used in various fields. Currently, the existing manufacturing method of light-emitting devices is to sequentially form an N-type semiconductor layer, a light-emitting layer, a P-type semiconductor layer and electrodes on an epitaxial substrate by means of epitaxy, thereby obtaining a light-emitting device.
当发光元件尺寸缩小至微米(micrometer,μm)等级而形成微型发光元件,并被应用于显示装置时,众多微型发光元件构成的微型发光元件阵列排列在显示面板上以作为显示装置的光源。而通常显示装置制造方法是先在磊晶基板上形成微型发光元件。然后通过转移载板将微型发光元件自磊晶基板上取下,再将取下的微型发光元件设置在显示面板上。借此达到巨量转移微型发光元件、提高工艺效率。更进一步来说,为配合微型发光元件所制作的微型电子元件也需要利用巨量转移技术来提高工艺效率。When the size of the light-emitting element is reduced to the micrometer (micrometer, μm) level to form a micro-light-emitting element and applied to a display device, a micro-light-emitting element array composed of many micro-light-emitting elements is arranged on the display panel as a light source for the display device. However, the usual method of manufacturing a display device is to first form micro light-emitting elements on an epitaxial substrate. Then the micro light emitting element is removed from the epitaxial substrate by transferring the carrier plate, and then the removed micro light emitting element is arranged on the display panel. In this way, a mass transfer of micro-light-emitting elements can be achieved, and process efficiency can be improved. Furthermore, the miniature electronic components manufactured for coordinating with the miniature light-emitting devices also need to use mass transfer technology to improve process efficiency.
一般来说,在此转移过程当中,转移载板在某些程序中会被加热,以使微型发光元件能够暂时地固着于转移载板,或是使转移载板能够与微型发光元件分离以让微型发光元件设置于显示面板上。但是当转移载板被加热时,转移载板的结构有可能因热而膨胀,致使转移载板上的结构无法与磊晶基板上的各微型发光元件精准对位,或是让暂时固着于转移载板的各微型发光元件无法与显示面板上的驱动电路对位,造成工艺上的困扰,甚至降低了整体合格率。Generally speaking, during the transfer process, the transfer carrier will be heated in some procedures, so that the micro light-emitting devices can be temporarily fixed on the transfer carrier, or the transfer carrier can be separated from the micro light-emitting devices to allow The micro light-emitting element is arranged on the display panel. However, when the transfer carrier is heated, the structure of the transfer carrier may expand due to heat, so that the structure on the transfer carrier cannot be precisely aligned with the micro light-emitting elements on the epitaxial substrate, or temporarily fixed on the transfer substrate. The miniature light-emitting elements on the carrier board cannot be aligned with the driving circuit on the display panel, which causes troubles in the process and even reduces the overall pass rate.
发明内容Contents of the invention
本发明在于提供一种转移载板与晶粒载板以改善转移载板因热膨胀现象而无法精准对位的问题。The present invention provides a transfer carrier and a die carrier to solve the problem that the transfer carrier cannot be precisely aligned due to thermal expansion.
本发明公开了一种转移载板。此转移载板用以转移一第一基板上的多个微型元件至一第二基板。此转移载板包括一基板与多个转移件。此基板具有一上表面。这些转移件设置于所述的基板的上表面。每一转移件具有相对的一第一表面与一第二表面。这些转移件分别以这些第一表面接触此基板。其中,所述的基板的热膨胀系数与转移件的热膨胀系数不相同。转移件的热膨胀系数与这些微型元件的热膨胀系数的差值小于此基板的热膨胀系数与转移件的热膨胀系数的差值。The invention discloses a transfer carrier plate. The transfer carrier is used for transferring a plurality of micro components on a first substrate to a second substrate. The transfer carrier includes a substrate and a plurality of transfer parts. The substrate has an upper surface. These transfer elements are disposed on the upper surface of the substrate. Each transfer member has a first surface and a second surface opposite to each other. The transfer elements respectively contact the substrate with the first surfaces. Wherein, the coefficient of thermal expansion of the substrate is different from that of the transfer member. The difference between the thermal expansion coefficient of the transfer member and the thermal expansion coefficient of the micro components is smaller than the difference between the thermal expansion coefficient of the substrate and the transfer member.
本发明所公开的转移载板,其中每一转移件的热导系数大于此基板的热导系数的两倍、小于此基板的热导系数的五倍。In the transfer carrier disclosed in the present invention, the thermal conductivity of each transfer member is greater than twice the thermal conductivity of the substrate and less than five times the thermal conductivity of the substrate.
本发明所公开的转移载板,其中此基板为蓝宝石基板,转移件的材料包括氮化镓。In the transfer carrier plate disclosed in the present invention, the substrate is a sapphire substrate, and the material of the transfer element includes gallium nitride.
本发明所公开的转移载板,其中每一转移件的热膨胀系数与此基板的热膨胀系数的差值不大于此基板的热膨胀系数的百分之五十且不大于此基板的热膨胀系数的百分之十。In the transfer carrier disclosed in the present invention, the difference between the coefficient of thermal expansion of each transfer member and the coefficient of thermal expansion of the substrate is not more than fifty percent of the coefficient of thermal expansion of the substrate and not more than a percentage of the coefficient of thermal expansion of the substrate Ten.
本发明所公开的转移载板,还包括多个分隔设置的粘着块,每一粘着块分别位于这些转移件的其中之一的第二表面。The transfer carrier plate disclosed by the present invention further includes a plurality of adhesive blocks arranged separately, and each adhesive block is respectively located on the second surface of one of the transfer parts.
本发明所公开的转移载板,其中每一粘着块位于对应的第二表面的周缘之内。In the transfer carrier disclosed in the present invention, each adhesive block is located within the periphery of the corresponding second surface.
本发明所公开的转移载板,其中每一转移件的第二表面形成一凹槽,这些粘着块分别位于这些转移件的这些凹槽中。In the transfer carrier plate disclosed in the present invention, a groove is formed on the second surface of each transfer member, and the adhesive blocks are respectively located in the grooves of the transfer members.
本发明所公开的转移载板,还包括一粘着层,粘着层覆盖这些转移件与这基板的上表面。The transfer carrier plate disclosed in the present invention further includes an adhesive layer covering the upper surfaces of the transfer elements and the substrate.
本发明所公开的转移载板,其中此粘着层于第一表面上的厚度大于粘着层于每一转移件的第二表面上的厚度。According to the transfer carrier disclosed in the present invention, the thickness of the adhesive layer on the first surface is greater than the thickness of the adhesive layer on the second surface of each transfer member.
本发明还公开了一种晶粒载板。此晶粒载板包括一基板、多个转移件、一粘着层与多个微型元件。此基板具有一上表面。这些转移件设置于此基板的上表面。每一转移件具有相对的一第一表面与一第二表面。这些转移件分别以这些第一表面接触此基板。所述的粘着层设置于这些转移件的第二表面上。每一微型元件通过此粘着层固着于这些转移件的其中之一的第二表面上。其中,此基板的热膨胀系数与转移件的热膨胀系数不相同。转移件的热膨胀系数与这些微型元件其中任一的热膨胀系数的差值小于一预设门坎值。The invention also discloses a grain carrier plate. The die carrier includes a substrate, a plurality of transfer components, an adhesive layer and a plurality of micro components. The substrate has an upper surface. The transfer elements are disposed on the upper surface of the substrate. Each transfer member has a first surface and a second surface opposite to each other. The transfer elements respectively contact the substrate with the first surfaces. The adhesive layer is disposed on the second surface of the transfer parts. Each micro component is fixed on the second surface of one of the transfer parts through the adhesive layer. Wherein, the coefficient of thermal expansion of the substrate is different from that of the transfer member. The difference between the thermal expansion coefficient of the transfer member and any one of the micro components is smaller than a predetermined threshold.
本发明所公开的晶粒载板,其中这些转移件的热导系数大于此基板的热导系数的两倍,小于此基板的热导系数的五倍。In the die carrier disclosed in the present invention, the thermal conductivity of the transfer elements is greater than twice the thermal conductivity of the substrate and less than five times the thermal conductivity of the substrate.
本发明所公开的晶粒载板,其中此基板为蓝宝石基板,这些转移件的材料包括氮化镓,这些微型元件为微型发光二极管且这些微型元件的材料包括氮化镓。In the chip carrier disclosed in the present invention, the substrate is a sapphire substrate, the materials of the transfer elements include gallium nitride, the micro components are micro light emitting diodes, and the materials of these micro components include gallium nitride.
本发明所公开的晶粒载板,其中这些转移件的热膨胀系数与此基板的热膨胀系数的差值不大于此基板的热膨胀系数的百分之五十且不大于此基板的热膨胀系数的百分之十。The die carrier disclosed in the present invention, wherein the difference between the coefficient of thermal expansion of the transfer members and the coefficient of thermal expansion of the substrate is not more than fifty percent of the coefficient of thermal expansion of the substrate and not more than one percent of the coefficient of thermal expansion of the substrate Ten.
本发明所公开的晶粒载板,其中粘着层具有多个分隔设置的粘着块,每一粘着块位于这些转移件的其中之一的第二表面。In the die carrier disclosed in the present invention, the adhesive layer has a plurality of adhesive blocks arranged separately, and each adhesive block is located on the second surface of one of the transfer members.
本发明所公开的晶粒载板,其中每一转移件的第二表面形成一凹槽,每一粘着块位于这些转移件的其中之一的凹槽中。In the die carrier disclosed in the present invention, a groove is formed on the second surface of each transfer member, and each adhesive block is located in the groove of one of the transfer members.
本发明所公开的晶粒载板,其中粘着层覆盖此基板的上表面与这些转移件。In the die carrier disclosed in the present invention, the adhesive layer covers the upper surface of the substrate and the transfer components.
本发明所公开的晶粒载板,其中粘着层于第一表面上的厚度大于粘着层于每一转移件的第二表面上的厚度。In the die carrier disclosed in the present invention, the thickness of the adhesive layer on the first surface is greater than the thickness of the adhesive layer on the second surface of each transfer member.
以上关于本发明内容的说明及以下的实施方式的说明用以示范与解释本发明的精神与原理,并且提供本发明的权利要求书更进一步的解释。The above descriptions about the content of the present invention and the following descriptions of the embodiments are used to demonstrate and explain the spirit and principle of the present invention, and provide further explanations of the claims of the present invention.
附图说明Description of drawings
图1为根据本发明一实施例所绘示的转移载板的结构示意图。FIG. 1 is a schematic structural diagram of a transfer carrier according to an embodiment of the present invention.
图2A为根据本发明另一实施例所绘示的转移载板的结构示意图。FIG. 2A is a schematic structural diagram of a transfer carrier according to another embodiment of the present invention.
图2B为根据本发明另一实施例所绘示的转移载板的结构示意图。FIG. 2B is a schematic structural diagram of a transfer carrier according to another embodiment of the present invention.
图3A为根据本发明一实施例所绘示的转移载板与第一基板于微型元件转移过程示意图。FIG. 3A is a schematic diagram illustrating a micro-device transfer process between a transfer carrier plate and a first substrate according to an embodiment of the present invention.
图3B为根据本发明一实施例所绘示的转移载板与第一基板于微型元件转移过程示意图。FIG. 3B is a schematic diagram illustrating a micro-device transfer process between the transfer carrier and the first substrate according to an embodiment of the present invention.
图3C为根据本发明一实施例所绘示的转移载板与第二基板于微型元件转移过程示意图。FIG. 3C is a schematic diagram illustrating a micro-device transfer process between a transfer carrier plate and a second substrate according to an embodiment of the present invention.
图4为根据本发明又一实施例所绘示的转移载板的结构示意图。FIG. 4 is a schematic structural diagram of a transfer carrier according to yet another embodiment of the present invention.
图5为根据本发明再一实施例所绘示的转移载板的结构示意图。FIG. 5 is a schematic structural diagram of a transfer carrier according to yet another embodiment of the present invention.
其中,附图标记:Among them, reference signs:
1、2、2b、3、4 转移载板1, 2, 2b, 3, 4 transfer carrier
10、20、30、40 基板10, 20, 30, 40 substrates
50 第一基板50 first substrate
60 第二基板60 Second substrate
12、22、32、42 转移件12, 22, 32, 42 Transfers
242、442 粘着块242, 442 sticky blocks
52、52a、52b、52c 微型元件52, 52a, 52b, 52c Micro Components
62 驱动电路62 drive circuit
24、34 粘着层24, 34 Adhesive layer
2’ 晶粒载板2’ Die Carrier
B 凸块B bump
d1 第一距离d1 first distance
d2 第二距离d2 second distance
g 凹槽g groove
S1 第一表面S1 first surface
S2 第二表面S2 second surface
Su 上表面Su upper surface
SW 侧壁SW side wall
Ta、Tb、Tp 厚度Ta, Tb, Tp Thickness
W 宽度W width
具体实施方式Detailed ways
以下在实施方式中详细叙述本发明的详细特征以及优点,其内容足以使本领域的技术人员了解本发明的技术内容并据以实施,且根据本说明书所公开的内容、权利要求书及附图,本领域的技术人员可轻易地理解本发明相关的目的及优点。以下的实施例是进一步详细说明本发明的观点,但非以任何观点限制本发明的范畴。The detailed features and advantages of the present invention are described in detail below in the embodiments, which are sufficient to enable those skilled in the art to understand the technical content of the present invention and implement it accordingly, and according to the contents disclosed in this specification, claims and accompanying drawings , those skilled in the art can easily understand the related objects and advantages of the present invention. The following examples are to further describe the viewpoints of the present invention in detail, but not to limit the scope of the present invention in any way.
根据本发明实施例所绘示的转移载板可用以转移一第一基板上的多个微型元件至一第二基板。其中,第一基板例如为磊晶基板,用以形成微型元件例如微型发光二极管(micro LED)的相关结构于其上,而第二基板例如为显示面板。第一基板、第二基板与微型元件的相关细节请容后续详述。The transfer carrier illustrated according to the embodiments of the present invention can be used to transfer a plurality of micro devices on a first substrate to a second substrate. Wherein, the first substrate is, for example, an epitaxial substrate, on which micro components such as micro LEDs (micro LEDs) are formed, and the second substrate is, for example, a display panel. Details about the first substrate, the second substrate and the micro-components will be described later.
请参照图1,为根据本发明一实施例所绘示的转移载板1的结构示意图,转移载板1包括基板10与多个转移件12。基板10具有上表面Su。各转移件12间隔设置于基板10的上表面Su,较佳地,是以等距阵列设置,例如于x方向以距离d2的间隔排列。各转移件12中的每一个具有相对的第一表面S1与第二表面S2。各转移件12分别以各自的第一表面S1接触基板10,在本实施例中,各转移件12通过第一表面S1固定于基板10的上表面Su上。Please refer to FIG. 1 , which is a schematic structural diagram of a transfer carrier 1 according to an embodiment of the present invention. The transfer carrier 1 includes a substrate 10 and a plurality of transfer members 12 . The substrate 10 has an upper surface Su. The transfer elements 12 are arranged at intervals on the upper surface Su of the substrate 10 , preferably in an equidistant array, for example arranged at intervals of a distance d2 in the x direction. Each of the transfer elements 12 has a first surface S1 and a second surface S2 opposite to each other. Each transfer member 12 contacts the substrate 10 with its first surface S1 . In this embodiment, each transfer member 12 is fixed on the upper surface Su of the substrate 10 through the first surface S1 .
另一方面,每一转移件12的热膨胀系数与待转移的微型元件的热膨胀系数的差值小于基板10的热膨胀系数与转移件12的热膨胀系数的差值。较佳地,在一实施例中,转移件12的热膨胀系数与基板10的热膨胀系数的差值不大于基板10的热膨胀系数的百分之五十、不小于基板10的热膨胀系数的百分之十。更佳地,也就是说基板10与转移件12分别由不同的材料所形成时,而转移件12与待转移的微型元件则由相近的材料构成。一般来说转移载板1在转移过程中会因为工艺形成的应力导致基板10产生翘曲,甚至转移载板1使用中因为加热或加压可能使转移件12与基板10间的应力加剧而导致基板翘曲程度增加、或转移件的损坏、位移,进而降低转移合格率。由于微型元件的转移过程中通常牵涉到加热工艺与加压工艺,当转移载板1翘曲时会相当不利于转移工艺。On the other hand, the difference between the thermal expansion coefficient of each transfer member 12 and the thermal expansion coefficient of the micro component to be transferred is smaller than the difference between the thermal expansion coefficient of the substrate 10 and the transfer member 12 . Preferably, in one embodiment, the difference between the thermal expansion coefficient of the transfer member 12 and the thermal expansion coefficient of the substrate 10 is no more than 50 percent of the thermal expansion coefficient of the substrate 10 and no less than 50 percent of the thermal expansion coefficient of the substrate 10 ten. More preferably, that is to say, when the substrate 10 and the transfer member 12 are formed of different materials, the transfer member 12 and the micro components to be transferred are made of similar materials. Generally speaking, the substrate 10 will be warped due to the stress caused by the process during the transfer process, and even the stress between the transfer member 12 and the substrate 10 may be aggravated by heating or pressing the transfer carrier 1 during use. Increased warpage of the substrate, or damage or displacement of the transfer part, thereby reducing the transfer pass rate. Since the transfer process of micro components usually involves heating and pressing processes, warping of the transfer carrier 1 will be quite unfavorable to the transfer process.
更进一步来说,转移件12的热导系数大于基板10的热导系数的两倍。通过选择具有合适的热导系数的材料,当对转移载板1加热时,热能可以集中于转移件12,以使转移过程更加顺畅便利。较佳地,转移件12的热导系数为基板10的热导系数的两倍至五倍之间,借此以避免花费太多时间来对转移载板1加热。于一种实施态样当中,各转移件12的材料为无机材料,举例来说,例如为氮化镓(Gallium nitride,GaN)为主的磊晶结构,基板的材料为蓝宝石(Sapphire),而待转移的微型元件则是微型发光二极管结构。Furthermore, the thermal conductivity of the transfer member 12 is greater than twice the thermal conductivity of the substrate 10 . By selecting a material with an appropriate thermal conductivity, when the transfer carrier 1 is heated, heat energy can be concentrated on the transfer member 12, so that the transfer process is smoother and more convenient. Preferably, the thermal conductivity of the transfer member 12 is two to five times that of the substrate 10 , so as to avoid spending too much time heating the transfer carrier 1 . In one embodiment, the material of each transfer member 12 is an inorganic material, for example, an epitaxial structure mainly composed of gallium nitride (GaN), the material of the substrate is sapphire, and The micro components to be transferred are micro LED structures.
请接着参照图2A,图2A为根据本发明另一实施例所绘示的转移载板的结构示意图。在图2A所示的实施例中,转移载板2的结构大致上相仿于前述的转移载板1,包括基板20与多个设置于基板20上的转移件22,相关细节不予重复赘述。不同之处在于,转移载板2还具有粘着层24。粘着层24具有多个粘着块242。各粘着块242彼此分隔设置。各粘着块242分别位于其中之一转移件22的第二表面S2。在一实施例中,各粘着块242例如先涂布整层粘着材料后以图案化工艺定义而成。在另一实施例中,各粘着块242例如为前述的转移载板1经沾取相关材料而成。又一实施例中,各粘着块242例如为点胶的方式个别形成于转移件的第二表面。各粘着块242的材料例如为黑色光阻、不透光胶材、多层铬膜或是树脂。Please refer to FIG. 2A , which is a schematic structural diagram of a transfer carrier according to another embodiment of the present invention. In the embodiment shown in FIG. 2A , the structure of the transfer carrier 2 is substantially similar to the aforementioned transfer carrier 1 , including a substrate 20 and a plurality of transfer elements 22 disposed on the substrate 20 , and relevant details are not repeated here. The difference is that the transfer carrier 2 also has an adhesive layer 24 . The adhesive layer 24 has a plurality of adhesive blocks 242 . The adhesive blocks 242 are spaced apart from each other. Each adhesive block 242 is respectively located on the second surface S2 of one of the transfer elements 22 . In one embodiment, each adhesive block 242 is defined by a patterning process after coating an entire layer of adhesive material first. In another embodiment, each adhesive block 242 is formed by dipping related materials from the aforementioned transfer carrier 1 , for example. In yet another embodiment, each adhesive block 242 is individually formed on the second surface of the transfer member by, for example, dispensing glue. The material of each adhesive block 242 is, for example, black photoresist, opaque adhesive material, multi-layer chromium film or resin.
延续前述,各粘着块242分别位于相对应的转移件22的第二表面S2的周缘之内。所谓的第二表面S2的周缘为第二表面S2的边缘,或是指第二表面S2与转移件22的侧壁SW的交界处。从另一个角度来说,各粘着块242覆盖各转移件22的第二表面S2的部分,而各转移件22的侧壁SW不被各粘着块242所覆盖。Continuing from the above, each adhesive block 242 is respectively located within the periphery of the second surface S2 of the corresponding transfer member 22 . The so-called peripheral edge of the second surface S2 refers to the edge of the second surface S2 , or refers to the junction of the second surface S2 and the sidewall SW of the transfer member 22 . From another perspective, each adhesive block 242 covers part of the second surface S2 of each transfer member 22 , and the sidewall SW of each transfer member 22 is not covered by each adhesive block 242 .
除了图2A所举之例之外,在另一类似的实施例中,各粘着块242的边缘切齐相对应的第二表面S2的周缘。借此,以善用各转移件22的第二表面S2,且增加转移载板2可以用来粘着微型元件的表面积。In addition to the example shown in FIG. 2A , in another similar embodiment, the edges of each adhesive block 242 are cut to align with the peripheral edge of the corresponding second surface S2 . Thereby, the second surface S2 of each transfer member 22 can be well utilized, and the surface area of the transfer carrier 2 that can be used for adhering micro components is increased.
而在又另一类似的实施例中,如图2B所示(图2B为根据本发明另一实施例所绘示的转移载板的结构示意图),粘着块242除了覆盖相对应的第二表面S2之外,粘着块242还延伸覆盖了相对应的转移件22的侧壁SW的至少一部分。从另一个角度来说,粘着块242覆盖完整的转移件22的第二表面S2,且粘着块242超出第二表面S2的周缘而沿y轴方向往基板20延伸并接触到转移件22至少部分的侧壁SW。借此,除了可以善用转移件22的第二表面S2而增加转移载板2b可以用来粘着微型元件的表面积之外,还可以使各粘着块242更稳固地附着于相应的转移件22。In yet another similar embodiment, as shown in FIG. 2B (FIG. 2B is a schematic structural diagram of a transfer carrier according to another embodiment of the present invention), the adhesive block 242 covers the corresponding second surface In addition to S2 , the adhesive block 242 also extends to cover at least a part of the sidewall SW of the corresponding transfer member 22 . From another perspective, the adhesive block 242 covers the complete second surface S2 of the transfer member 22, and the adhesive block 242 extends beyond the periphery of the second surface S2 to the substrate 20 along the y-axis direction and contacts the transfer member 22 at least partially. sidewall SW. In this way, in addition to making good use of the second surface S2 of the transfer member 22 to increase the surface area of the transfer carrier 2b for adhering micro components, each adhesive block 242 can be more firmly attached to the corresponding transfer member 22 .
请接着参照图3A至图3C以说明转移载板如何被使用,以更明了相关元件的设计考虑,图3A与图3B为根据本发明一实施例所绘示的转移载板与第一基板于微型元件转移过程中的相应各阶段的相对示意图,图3C为根据本发明一实施例所绘示的转移载板与第二基板于微型元件转移过程中的第三阶段的相对示意图。在图3A至图3C中是以图2A中的转移载板2为例说明的。此外,于图3A至图3B中还绘示有第一基板50与其上的微型元件52a、52b、52c,而于图3C中还绘示有第二基板60与其上的驱动电路62。Please refer to FIG. 3A to FIG. 3C to illustrate how the transfer carrier is used, so as to better understand the design considerations of related components. FIG. 3A and FIG. 3B are the transfer carrier and the first substrate according to an embodiment of the present invention. 3C is a relative schematic diagram of the transfer carrier and the second substrate in the third stage of the micro-component transfer process according to an embodiment of the present invention. In FIGS. 3A to 3C , the transfer carrier 2 in FIG. 2A is taken as an example for illustration. In addition, the first substrate 50 and the micro components 52a, 52b, 52c thereon are also shown in FIGS. 3A to 3B , and the second substrate 60 and the driving circuit 62 thereon are also shown in FIG. 3C .
如图3A所示,第一基板50上设置有多个微型元件52,在此举微型元件52a、52b、52c为例进行说明,然微型元件52a、52b、52c的数量、排列并不以此为限。所述的各微型元件52a、52b、52c例如为微型发光二极管(micro lightemitting diode,micro LED),包括了P型掺杂层、N型掺杂层、发光层与电极层。上述仅为举例示范,微型发光二极管的实际实施态样并不以此为限。在其他实施例中,微型元件也可以是需要大量转移的电子元件,例如微型芯片、微型感测器等等。As shown in FIG. 3A, a plurality of micro-elements 52 are arranged on the first substrate 50. Here, the micro-elements 52a, 52b, and 52c are taken as examples for illustration, but the number and arrangement of the micro-elements 52a, 52b, and 52c are not necessarily the same. limit. The micro components 52 a , 52 b , 52 c are, for example, micro light emitting diodes (micro LEDs), which include a P-type doped layer, an N-type doped layer, a light-emitting layer and an electrode layer. The above is just an example, and the actual implementation of the micro light emitting diode is not limited thereto. In other embodiments, the microcomponents may also be electronic components that require a large amount of transfer, such as microchips, microsensors, and the like.
各微型元件52a、52b、52c于图面所示的x轴方向上在第一基板50上以第一距离d1间隔排列。相对于此,转移载板2的转移件22于x轴方向上在基板20上以第二距离d2间隔排列。第二距离d2不同于第一距离d1。在此实施例中,第二距离d2大于第一距离d1与微型元件52的宽度W的和,来实现选择性拾取(selective pick-up)以调整微型元件52被转移至第二基板60上的间距。实务上,利用转移载板2将同色的微型发光二极管(微型元件52)转移至显示面板的基板上,而同色的各微型发光二极管分属不同的像素单元,因此一般来说,第二距离d2的大小又关联于显示面板上的像素相对距离。Each micro-element 52a, 52b, 52c is arranged on the first substrate 50 at intervals of a first distance d1 along the x-axis direction shown in the figure. In contrast, the transfer elements 22 of the transfer carrier 2 are arranged at intervals of the second distance d2 on the substrate 20 along the x-axis direction. The second distance d2 is different from the first distance d1. In this embodiment, the second distance d2 is greater than the sum of the first distance d1 and the width W of the micro-component 52 to achieve selective pick-up (selective pick-up) to adjust the micro-component 52 is transferred to the second substrate 60. spacing. In practice, the micro-LEDs (micro-elements 52 ) of the same color are transferred to the substrate of the display panel by using the transfer carrier 2, and the micro-LEDs of the same color belong to different pixel units, so generally speaking, the second distance d2 The size of is related to the relative distance of pixels on the display panel.
如图3A与图3B所示的阶段,首先,转移载板2上的各粘着块242与第一基板50上相应的微型元件52a相接触。接着,转移载板2与第一基板50被加热且其他必要的工艺程序也被执行,使得微型元件52a通过各粘着块242粘附以从第一基板50分离,且被粘附的微型元件52a暂时地固着于转移载板2(如图3B所示)而形成一晶粒载板2’。As shown in FIG. 3A and FIG. 3B , firstly, each adhesive block 242 on the transfer carrier 2 is in contact with the corresponding micro-component 52 a on the first substrate 50 . Next, the transfer carrier 2 and the first substrate 50 are heated and other necessary processes are performed, so that the micro components 52a are adhered to be separated from the first substrate 50 by each adhesive block 242, and the adhered micro components 52a Temporarily fixed on the transfer carrier 2 (as shown in FIG. 3B ) to form a die carrier 2 ′.
然后,如图3C所示,晶粒载板2’与一第二基板60对接以使微型元件52a与第二基板60上相应的驱动电路62接合。于实务的设备操作上,可以移动晶粒载板2’与第二基板60接合、也可以是第一基板50与第二基板60被移动使得第二基板60放置于与晶粒载板2’对接的位置。接着,基板20与第二基板60被加热且其他必要的工艺程序也被执行,以使微型元件52a与转移载板2分离且通过凸块(bump)B固着于第二基板60的预定位置上,各微型元件52a还通过相应的各凸块B电性至第二基板60的驱动电路62。在此实施例的图式中,是以驱动电路62为个别线路的态样绘示,然于实务上,驱动电路62也可以是一经过整合的电路,并以不同的接点电性联接各微型元件。Then, as shown in FIG. 3C , the die carrier 2' is docked with a second substrate 60 so that the micro-component 52a is bonded to the corresponding driving circuit 62 on the second substrate 60. In practical equipment operation, the die carrier 2' can be moved to bond with the second substrate 60, or the first substrate 50 and the second substrate 60 can be moved so that the second substrate 60 is placed on the die carrier 2' docking position. Then, the substrate 20 and the second substrate 60 are heated and other necessary processes are also performed, so that the micro-component 52a is separated from the transfer carrier 2 and fixed on the predetermined position of the second substrate 60 through bumps (bump) B Each micro-element 52 a is also electrically connected to the driving circuit 62 of the second substrate 60 through each corresponding bump B. In the drawings of this embodiment, the driving circuit 62 is shown as an individual circuit, but in practice, the driving circuit 62 can also be an integrated circuit, and different contacts are electrically connected to each micro element.
通过重复上述步骤,第一基板50上剩余的微型元件52b、52c依序转移到第二基板60,并电性连接于第二基板60上的驱动电路62。在本实施例中,微型元件52a、52b、52c是微型发光二极管,即可依据第二基板60的驱动电路62所提供的驱动信号发光而制作出微型发光二极管显示面板。By repeating the above steps, the remaining micro components 52 b and 52 c on the first substrate 50 are sequentially transferred to the second substrate 60 and electrically connected to the driving circuit 62 on the second substrate 60 . In this embodiment, the micro components 52 a , 52 b , 52 c are micro light emitting diodes, which can emit light according to the driving signal provided by the driving circuit 62 of the second substrate 60 to form a micro light emitting diode display panel.
在转移过程中,通常在拾取与接合时都必须加热,而热能通常会集中于转移件22,而使得转移件22因热膨胀而产生的形变对转移件22的相对位置产生的影响会较基板20因热膨胀造成的影响来的大。在一实施例中,各微型元件的热膨胀系数与转移件22的热膨胀系数的差值小于一个预设门坎值,在本实施例中,基板20与第一基板50是相同材料(例如均为蓝宝石基板sapphire)构成,而转移件22与微型元件52是相同材料(GaN epitaxiallayer)构成。在一实施例中,微型元件的热膨胀系数与转移件22的热膨胀系数的差值不大于微型元件的热膨胀系数的百分之十。借此,使得转移件22因热膨胀而改变在基板20上的相对位置的偏移量会相仿于微型元件52因热膨胀而改变在第一基板50上的相对位置的偏移量。换句话说,通过依据适当地选择转移件22的热膨胀系数可以使各转移件22在基板20上的相对位置对应于微型元件52在第一基板50上的相对位置,从而提高转移微型元件52的合格率。During the transfer process, it is usually necessary to heat when picking up and bonding, and the heat energy is usually concentrated on the transfer member 22, so that the deformation of the transfer member 22 due to thermal expansion will have more influence on the relative position of the transfer member 22 than the substrate 20. The effect caused by thermal expansion is large. In one embodiment, the difference between the thermal expansion coefficients of each micro-element and the thermal expansion coefficient of the transfer member 22 is less than a preset threshold value. In this embodiment, the substrate 20 and the first substrate 50 are made of the same material (for example, both are sapphire Substrate sapphire), while the transfer member 22 and the micro-element 52 are made of the same material (GaN epitaxial layer). In one embodiment, the difference between the thermal expansion coefficient of the microcomponent and the thermal expansion coefficient of the transfer member 22 is no more than ten percent of the thermal expansion coefficient of the microcomponent. Thereby, the offset of the relative position of the transfer member 22 on the substrate 20 due to thermal expansion is similar to the offset of the relative position of the micro-device 52 on the first substrate 50 due to thermal expansion. In other words, by properly selecting the coefficient of thermal expansion of the transfer member 22, the relative position of each transfer member 22 on the substrate 20 can correspond to the relative position of the micro-component 52 on the first substrate 50, thereby improving the transfer of the micro-component 52. Pass rate.
参照图4,图4为根据本发明又一实施例所绘示的转移载板3的结构示意图。在图4所示的实施例中,转移载板3的结构相仿于前述的转移载板1的结构,包括基板30与多个设置于基板30上的转移件32,相关细节不予重复赘述。不同处在于,转移载板3还具有粘着层34。粘着层34设置转移件32与基板30的上表面Su。粘着层34可以是于半导体制层中通过涂布(或旋转涂布)的方式设置,或者也可以是由转移载板3贴附或沾附相关材料而形成。在此实施例中粘着层34是通过涂布的方式形成于基板30与转移件32上,粘着层34于上表面Su上的厚度Tb大于粘着层34于转移件32的第二表面S2上的厚度Ta。此外,厚度Ta小于各转移件32的厚度Tp。厚度Tp与厚度Ta的比值为1.5~15,转移件32厚度Tp太小在拾取时容易沾粘相邻的微型元件,若厚度Tp太大则在接合时加热效果会不佳、降低工艺效率。在一些实施例中厚度Tp与厚度Ta分别是4.5微米、2.5微米;或分别是10微米、2.5~5微米;或分别是30微米、2.5~5微米。Referring to FIG. 4 , FIG. 4 is a schematic structural diagram of a transfer carrier 3 according to another embodiment of the present invention. In the embodiment shown in FIG. 4 , the structure of the transfer carrier 3 is similar to that of the aforementioned transfer carrier 1 , including a substrate 30 and a plurality of transfer members 32 disposed on the substrate 30 , and relevant details are not repeated here. The difference is that the transfer carrier 3 also has an adhesive layer 34 . The adhesive layer 34 is disposed on the transfer member 32 and the upper surface Su of the substrate 30 . The adhesive layer 34 can be formed by coating (or spin coating) in the semiconductor layer, or can be formed by pasting or sticking related materials on the transfer carrier 3 . In this embodiment, the adhesive layer 34 is formed on the substrate 30 and the transfer member 32 by coating, and the thickness Tb of the adhesive layer 34 on the upper surface Su is greater than that of the adhesive layer 34 on the second surface S2 of the transfer member 32. Thickness Ta. In addition, the thickness Ta is smaller than the thickness Tp of each transfer member 32 . The ratio of the thickness Tp to the thickness Ta is 1.5-15. If the thickness Tp of the transfer member 32 is too small, it is easy to stick to the adjacent micro-components during pick-up. If the thickness Tp is too large, the heating effect will be poor during bonding and the process efficiency will be reduced. In some embodiments, the thickness Tp and the thickness Ta are respectively 4.5 microns and 2.5 microns; or respectively 10 microns and 2.5-5 microns; or respectively 30 microns and 2.5-5 microns.
请再参照图5,图5为根据本发明再一实施例所绘示的转移载板4的结构示意图。转移载板4的结构相仿于前述的转移载板2的结构,包括基板40、多个设置于基板40上的转移件42与多个彼此分隔设置的粘着块442,各粘着块442分别位于各转移件42的第二表面S2,相关细节不予重复赘述。不同处在于,转移载板4的转移件42的第二表面S2形成有凹槽g。粘着块442分别设置于凹槽g中。借此,粘着块442得以更稳固与相应的转移件42相连接。Please refer to FIG. 5 again. FIG. 5 is a schematic structural diagram of a transfer carrier 4 according to yet another embodiment of the present invention. The structure of the transfer carrier 4 is similar to the structure of the aforementioned transfer carrier 2, including a substrate 40, a plurality of transfer pieces 42 arranged on the substrate 40, and a plurality of adhesive blocks 442 spaced apart from each other, and each adhesive block 442 is located on each Relevant details of the second surface S2 of the transfer member 42 will not be repeated. The difference is that the second surface S2 of the transfer member 42 of the transfer carrier 4 is formed with a groove g. The adhesive blocks 442 are respectively disposed in the grooves g. Thereby, the adhesive block 442 can be more firmly connected with the corresponding transfer member 42 .
参照如图3B与晶粒载板的相关叙述,本领域技术人员经详阅本说明书后当可理解图4与图5所述的实施方式也可应用于前述的晶粒载板,相关细节于此不再赘述。Referring to the related description of FIG. 3B and the die carrier, those skilled in the art can understand that the implementation described in FIG. 4 and FIG. 5 can also be applied to the aforementioned die carrier after reading this specification carefully. The relevant details are in This will not be repeated here.
综合以上所述,本发明提供了一种转移载板与晶粒载板。转移载板与晶粒载板具有相仿的结构。转移载板用以将第一基板上的微型元件(特别是应用于微型发光二极管)转移至第二基板。以转移载板来说,转移载板的基板的热膨胀系数与转移载板的多个转移件的热膨胀系数不相同,也就是说是以不同材料构成;而且,这些转移件的热膨胀系数与这些微型元件的热膨胀系数的差值小于一基板的热膨胀系数与转移件的热膨胀系数的差值。由于转移载板通常是与第一基板同时被加热,因此,当转移载板受热膨胀时,第一基板也同时受热膨胀。而通过本发明所提供的转移载板,转移载板上的微结构得以精准地与第一基板上的微型元件对位,从而使微型元件顺利且精准地自第一基板被取下。另一方面,晶粒载板可以说是暂时固着有微型元件的转移载板,通过上述的结构,晶粒载板上的微型元件得以精准地与第二基板对位,从而使各微型元件精准地设置于第二基板上的接合点,提升了整体的制造合格率。Based on the above, the present invention provides a transfer carrier and a die carrier. The transfer carrier has a similar structure to the die carrier. The transfer carrier is used to transfer the micro components (especially for micro light emitting diodes) on the first substrate to the second substrate. For the transfer carrier, the thermal expansion coefficient of the substrate of the transfer carrier is different from that of the transfer parts of the transfer carrier, that is to say, it is made of different materials; moreover, the thermal expansion coefficient of these transfer parts is different from that of the micro The difference between the coefficients of thermal expansion of the element is smaller than the difference between the coefficients of thermal expansion of a substrate and the coefficient of thermal expansion of the transfer member. Since the transfer carrier is usually heated simultaneously with the first substrate, when the transfer carrier is heated and expanded, the first substrate is also heated and expanded simultaneously. With the transfer carrier provided by the present invention, the microstructures on the transfer carrier can be accurately aligned with the micro components on the first substrate, so that the micro components can be removed from the first substrate smoothly and accurately. On the other hand, the die carrier can be said to be a transfer carrier on which micro components are temporarily fixed. Through the above-mentioned structure, the micro components on the die carrier can be accurately aligned with the second substrate, so that each micro component can be accurately aligned. The bonding point disposed on the second base plate can improve the overall manufacturing yield.
虽然本发明以前述的实施例公开如上,然其并非用以限定本发明。在不脱离本发明的精神和范围内,所为的更动与润饰,均属本发明的专利保护范围。关于本发明所界定的保护范围请参考所附的权利要求书。Although the present invention is disclosed above with the foregoing embodiments, they are not intended to limit the present invention. Without departing from the spirit and scope of the present invention, all changes and modifications made belong to the scope of patent protection of the present invention. For the scope of protection defined by the present invention, please refer to the appended claims.
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