[go: up one dir, main page]

CN110382139A - Three-dimensional lamination arthroplasty devices and lamination shaping method - Google Patents

Three-dimensional lamination arthroplasty devices and lamination shaping method Download PDF

Info

Publication number
CN110382139A
CN110382139A CN201780087837.6A CN201780087837A CN110382139A CN 110382139 A CN110382139 A CN 110382139A CN 201780087837 A CN201780087837 A CN 201780087837A CN 110382139 A CN110382139 A CN 110382139A
Authority
CN
China
Prior art keywords
light beam
irradiation
data
irradiation position
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201780087837.6A
Other languages
Chinese (zh)
Inventor
山田章夫
菅谷慎二
相马实
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of CN110382139A publication Critical patent/CN110382139A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/141Processes of additive manufacturing using only solid materials
    • B29C64/153Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/20Direct sintering or melting
    • B22F10/28Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/80Data acquisition or data processing
    • B22F10/85Data acquisition or data processing for controlling or regulating additive manufacturing processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F12/00Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
    • B22F12/40Radiation means
    • B22F12/44Radiation means characterised by the configuration of the radiation means
    • B22F12/45Two or more
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/205Means for applying layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/20Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B29C64/264Arrangements for irradiation
    • B29C64/268Arrangements for irradiation using laser beams; using electron beams [EB]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/30Auxiliary operations or equipment
    • B29C64/386Data acquisition or data processing for additive manufacturing
    • B29C64/393Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F12/00Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
    • B22F12/40Radiation means
    • B22F12/41Radiation means characterised by the type, e.g. laser or electron beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F12/00Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
    • B22F12/40Radiation means
    • B22F12/49Scanners
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00Processes of additive manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00Apparatus for additive manufacturing; Details thereof or accessories therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y40/00Auxiliary operations or equipment, e.g. for material handling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y50/00Data acquisition or data processing for additive manufacturing
    • B33Y50/02Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • General Health & Medical Sciences (AREA)
  • Powder Metallurgy (AREA)

Abstract

It will include that the cross-sectional layers of curve carry out the three-dimensional lamination arthroplasty devices of lamination and appearance three-dimensional structure that the present invention, which provides a kind of,.The present invention provides a kind of three-dimensional lamination arthroplasty devices 100, it has: determination section 116, the profiling data of the cross sectional shape about three-dimensional structure 66 is received, and determines the data of the 1st light beam and the irradiation position of the 2nd light beam along full curve, beam shape and irradiation time;Storage unit 118, the data that storage determination section 116 is determined;And it is biased to control unit 150, the timing generated based on radiation time data is exported irradiation position data to deflector 50;And deformation element control unit 130, beam shape data is exported to deformation element 30.Three-dimensional lamination arthroplasty devices 100 are by making powder bed melting and solidification when irradiating the 1st light beam and 2 light beam along full curve as a result, and the cross-sectional layers including curve are carried out lamination and carry out appearance three-dimensional structure.

Description

Three-dimensional lamination arthroplasty devices and lamination shaping method
Technical field
The present invention relates to a kind of three-dimensional lamination arthroplasty devices and lamination shaping methods.
Background technique
It has a kind of three-dimensional lamination arthroplasty devices, is shone the particular range on the surface of the powder bed comprising metal material etc. Radio beamlet makes a part of melting and solidification of powder bed and Formation cross-section layer, which is stacked, and thus appearance three-dimensional constructs Object.Such as a kind of three-dimensional lamination arthroplasty devices and the lamination shaping method using it are recorded in patent document 1,2.
[background technology document]
[patent document]
[patent document 1] U.S. Patent No. 7,454,262
[patent document 2] Japanese Patent Laid-Open 2015-193866 bulletin
Summary of the invention
[problems to be solved by the invention]
In previous three-dimensional lamination arthroplasty devices documented by patent document 1, the surface of powder bed is divided into small Zoning and to each small zoning irradiating electron beam.In addition, in three-dimensional lamination arthroplasty devices documented by patent document 2, Linearly scanning beam and the irradiating electron beam of the surface of powder bed.By melting the surface of powder bed locally Solidification, and the part of its melting and solidification is connected, and form whole cross section layer.
But in previous three-dimensional lamination arthroplasty devices, it is difficult to which precisely appearance has making for smooth surface Shape object.
[technical means to solve problem]
In the 1st embodiment of the invention, a kind of three-dimensional lamination arthroplasty devices are provided, by powder bed through melting and solidification Made of cross-sectional layers carry out lamination and carry out appearance three-dimensional structure, and include electron beam column, export the 1st light beam and with the described 1st The 2nd light beam that light beam irradiates side by side;Appearance portion, for accommodating the raw material powder irradiated by the 1st light beam;And control unit, control Make the electron beam column;The control unit has: determination section, along the path of the electron beam that indicates to irradiate the cross-sectional layers A plurality of ringed line, sets multiple irradiation positions of the 1st light beam and the 2nd light beam, and determines at each irradiation position Irradiation time;Storage unit stores the data of the irradiation position that the determination section is determined and irradiation time;And timing generating unit, According to the irradiation time generate from the storage unit read the irradiation position data and export to the electron beam column when Sequence.
It is in the three-dimensional lamination in addition, providing a kind of lamination shaping method in the 2nd embodiment of the invention It is carried out in arthroplasty devices, and there are following steps: in the control unit, along the electron beam for indicating to irradiate the cross-sectional layers Path a plurality of ringed line, set multiple irradiation positions of the 1st light beam and the 2nd light beam, and determine each irradiation Irradiation time at position;By the control unit by the data of irradiation position under the timing generated based on the irradiation time Output irradiating electron beam to the electron beam column;And terminating every time along the irradiation of the electron beam of a ringed line When, so that the irradiation position of electron beam is back to the specific position on the surface of powder bed.
The three-dimensional lamination arthroplasty devices and lamination for providing a kind of section of three-dimensional structure of the formation including curve as a result, are made Shape method.
In addition, the summary of the invention does not enumerate the required all features of the present invention.The sub-combinations of these syndromes Invention may also be become.
Detailed description of the invention
Fig. 1 shows the configuration examples of three-dimensional lamination arthroplasty devices 100.
Fig. 2 (a) indicates the example for the three-dimensional structure 66 that three-dimensional lamination arthroplasty devices 100 should be formed.Fig. 2 (b) indicates cutting The example of the cross sectional shape of three-dimensional structure 66 in the β of face.
Fig. 3 indicates the example of profiling data corresponding with the three-dimensional cross sectional shape of structure 66.
Fig. 4 indicates to constitute the example of the full curve e of profiling data.
Fig. 5 indicates the decision example of the irradiation position along full curve e.
Fig. 6 indicates the example that the 1st light beam and the 2nd light beam are irradiated along surface 63 of the full curve e to powder bed 62.
Fig. 7 indicates determination section 116 for the 1st light beam that is determined of full curve e and the 2nd light beam for constituting profiling data The example of the data of irradiation position, beam shape and irradiation time.
Fig. 8 shows the configuration examples for being biased to control unit 150.
Fig. 9 is the geometric optics figure of the electron beam exported from the electron source 20 with the anisotropy electronics surface of emission.
Figure 10 indicates the example for the beam shapes irradiated to the surface 63 of powder bed 62.
The configuration example of Figure 11 expression deformation element control unit 130.
Figure 12 indicates to show the example of the motion flow of the lamination appearance movement of three-dimensional lamination arthroplasty devices 100.
Specific embodiment
Hereinafter, illustrating the present invention by the embodiment of invention, but following implementation and non-limiting claims Invention.In addition, the combination of the feature illustrated in embodiment may not be all necessary for the solution of invention.
Fig. 1 shows the configuration examples of the three-dimensional lamination arthroplasty devices 100 of present embodiment.Three-dimensional lamination arthroplasty devices 100 have Standby electron beam column 200, appearance portion 300 and control unit 400.
Electron beam is exported from the electron beam column 200 of three-dimensional lamination arthroplasty devices 100.Electron beam passes through the control of control unit 400 The control of signal processed is irradiated.It is provided with appearance container in appearance portion 300, such as by the powder of the powder comprising metal material Layer 62 is accommodated in appearance container.To 62 irradiating electron beam of powder bed, make a part of melting and solidification of powder bed 62, thus shape At cross-sectional layers 65.By the way that 65 lamination of cross-sectional layers is formed three-dimensional structure 66.
Electron beam column 200 has multiple electron sources 20 of output electron beam.The effect that electron source 20 passes through heat or electric field Generate electronics.Generated electronics (is as an example 60KV) to -Z direction with pre-determined acceleration voltage in electron source 20 Accelerate, and is exported in the form of electron beam.It in example shown in Fig. 1, is illustrated in electron beam column 200 and 2 electron sources 20 is set, and divide Not Shu Chu the 1st light beam and the 2nd light beam example.
For making 62 melting and solidification of powder bed, the 2nd light beam is used to carry out auxiliary irradiation to powder bed 62 1st light beam.It is so-called Auxiliary irradiation refers to when carrying out the melting and solidification of powder bed 62, in order to be heated to the powder bed 62 on periphery less than its fusing point Temperature and the irradiation carried out.In addition, in the present embodiment, the quantity of electron source 20 is not limited to 2, it can also be 3 or more.
Hereinafter, for ease of description, being illustrated in case where the quantity of electron source 20 and electron beam is 2.
Interval in the face XY of 1st light beam and the 2nd light beam between the light beam in direction is, for example, 60mm hereinafter, as an example, being About 30mm.The acceleration voltage applied to 2 electron sources 20 is such as 60KV.It, can because being equal acceleration voltage Keep 2 electron sources 20 close with the interval of about 30mm and configures.
Each electron source 20 for example has the thermionic emission type yin from the front end emission electronics for the electrode for being heated to high temperature Pole portion.
Export the cathode electrode of the electron source 20 of the 1st light beam and the 2nd light beam front end can have longitudinal direction and with The anisotropy electronics surface of emission of different size of its orthogonal short side direction.The electronics emitted from the anisotropy electronics surface of emission Beam has the anisotropy cross sectional shape in reflection electron emission face.
This can also be replaced, the negative pole part of any one of 2 electron sources 20 is with for example round or square etc. respectively to same The electrode in the electron emission face of property shape.It is cut from the electron beam of the electron emission surface launching of isotropism shape with isotropism Face shape.
In the present embodiment, there is anisotropy from the transmitting of the anisotropy electronics surface of emission using 2 electron sources 20 The example of the electron beam of cross sectional shape is illustrated.
Negative pole part with the anisotropy electronics surface of emission for example can be by lanthanum hexaboride (LaB6) crystallization be configured to cylinder Shape, and as material, the end of cylinder is processed into wedge-shaped and is made.
In the present embodiment, the short side direction for taking the anisotropy electronics surface of emission is X-direction, and taking longitudinal direction is Y Axis direction, and taking the exit direction of electron beam is Z-direction.In addition, the length of the short side direction in electron emission face is, for example, 300 μm hereinafter, the length of longitudinal direction is, for example, 500 μm or more.
Deformation element 30 makes the cross sectional shape deformation of the electron beam exported from electron source 20.In example shown in Fig. 1, from tool The deformation that the 1st light beam and the 2nd light beam for having the electron source 20 of the anisotropy electronics surface of emission to export are passed through by each light beam Element 30, and respectively deform the cross sectional shape of light beam.
Deformation element 30 is, for example, to be configured with multistage multipole along the direction of travel of the electron beam passed through in the Z-axis direction Element.Multipole be formed by electric field (or magnetic field) the symmetrical centre in the face XY be located at electron beam pass through path in Near the heart.
Multipole is, for example, electrostatic quadrapole.Electrostatic quadrapole has in the X-axis direction across the Z axis that electron beam is passed through 2 electrodes of 2 electrodes of opposite generation electric field and generation electric field opposite in the Y-axis direction.
Multipole can also replace as electromagnetism quadrapole.As long as the Z axis tool that electromagnetism quadrapole is passed through across electron beam 2 electromagnetic coils in standby opposite generation magnetic field on the direction (X+Y) and opposite 2 for generating magnetic field on the direction (X-Y) Electromagnetic coil.
Electromagnetic lens 40 assembles the 1st light beam and the 2nd light beam on the surface of powder bed 62 63.Electromagnetic lens 40 includes around saturating Mirror axis coiled coil and around coil and have on lens axis be axisymmetric gap magnet (magnetic yoke).By from electricity The gap of the magnet of magnetic lenses 40 emits magnetic flux, and in the inside of electromagnetic lens 40, it generates on lens axis towards lens axis side To local magnetic field.
The lens magnetic field of 40 excitations of electromagnetic lens makes the electron beam meeting passed through along the path substantially uniform with lens axis It is poly-.The electromagnetic lens 40 that 1st light beam and the 2nd light beam are passed through by each light beam along lens axis is assembled respectively.
Deflector 50 is by being biased to the 1st light beam and the 2nd light beam, and in the table for the powder bed 62 for being set to appearance portion 300 Face 63 adjusts the irradiation position of the 1st light beam and the 2nd light beam.Deflector 50 can be the common deviation for making multiple electron beams while being biased to Device.2nd light beam carries out auxiliary irradiation because not to irradiation status requirement precision, as long as using with common inclined of the 1st light beam To device.
Make multiple electron beams while the common deflector 50 being biased to is more satisfactory for electromagnetism deflector 50.In order to make multiple electronics Beam is biased to simultaneously, and deflector 50 is preferably along the Z-direction across path as each electron beam, with roughly the same intensity Generate the deviation field in direction in the face XY of roughly the same direction.Electromagnetism deflector 50 is by will be skewed towards coil to surround multiple electricity The mode across path entirety of beamlet is wound, and can easily generate this magnetic field.
In addition, electromagnetism deflector 50 can be biased in the way of range is 150mm or more by the 1st light beam and the 2nd light beam It sets the number of windings of deflection coil and flows through the current value of deflection coil.So-called range of being biased to refers to that electron beam is not biased When and the powder bed 62 in each situation when being farthest biased to surface 63 electron beam irradiation position between away from From.
The range of being biased to of 1st light beam and the 2nd light beam (is in this case 150mm) compared with the 1st light beam and the light of the 2nd light beam The interval of interfascicular is (wider for 30mm) in this case.1st light beam and the 2nd light beam (can be overlapped the common part for being biased to range Part) the respective electron beam of irradiation.
Electron beam column 200 shown in Fig. 1 can have secondary deflector 55 in turn.Secondary deflector 55 be make the 1st light beam and/or The electrostatic deflection device that the direction of travel of 2nd light beam is biased to from the light beam axis direction parallel with Z axis.
Interval of the secondary deflector 55 to the relative exposure position of the 1st light beam and the 2nd light beam at the surface 63 of powder bed 62 It is adjusted.That is, the irradiation position of the 2nd light beam is for example adjusted to the irradiation with the 1st light beam by secondary deflector 55 The state that the roughly the same position in position is irradiated is biased to to the beam spacing i.e. 30mm for leaving the 1st light beam and the 2nd light beam The state that the position of left and right is irradiated.
That is, electron beam column 200 has: common to the 1st light beam and the 2nd light beam and make two light beams in 150mm or more The deflector 50 that can be biased in range of exposures and independently separated to the 1st light beam and the 2nd light beam and in the range of 30mm or so Adjust the secondary deflector 55 at the interval of the irradiation position of two light beams.
With the 1st light beam and the 2nd light beam be separately arranged with 150mm or more can range of exposures deflector Situation is compared, and electron beam column 200 can make the 1st light beam and the 2nd light beam approach and configure.The electricity of multiple electron beams will be exported as a result, Beamlet column 200 minimizes.
The powdered sample 68 supplied from powder supply unit 64 is maintained at appearance Fig. 1 shows the appearance portions 300 of configuration example In container.Appearance container has bottom surface sections 72 and sidewall portion 74.The powdered sample 68 supplied from powder supply unit 64 passes through powder The erasing move of supply unit 64 and be flattened in the inside of sidewall portion 74, formed substantially parallel with the upper surfaces of bottom surface sections 72 Powder bed 62.By the upper surface of powder bed 62 and face that electron beam is irradiated is known as surface 63.
The height of bottom surface sections 72 is movable in the Z-axis direction by driving portion 82 and driving rod 84.The Z axis of bottom surface sections 72 The height in direction be with when covering the surface 63 of powder bed 62 of three-dimensional structure 66 and being irradiated by electron beam with the powder bed 62 Surface 63 become roughly same height mode set.
A part of Formation cross-section layer 65 of the powder bed 62 of solidification is melted by the irradiation of electron beam, and lamination is three Tie up structure 66.Powder bed 62 other than the cross-sectional layers 65 of institute's lamination is around three-dimensional structure 66 directly with powdered sample 68 State storage.
The inner space for the electron beam column 200 that electron beam is passed through and the surface of the powder bed 62 irradiated by electron beam Aperture vents near 63 are specific vacuum degree.Its reason is that electron beam can lose with gas molecule collision in an atmosphere Energy.Three-dimensional lamination arthroplasty devices 100 are exhausted for the path that passes through to electron beam and have exhaust unit (not shown).
The entire three-dimensional lamination arthroplasty devices of the control of CPU110 contained in the control unit 400 of three-dimensional lamination arthroplasty devices 100 100 movement.CPU110 can be computer or the work input with the input terminal of operation instruction from the user It stands.
CPU110 is connect via bus 112 with determination section 116 and storage unit 118.Deformation element control unit 130 and deviation Control unit 150 receives the control signal from CPU110 via storage unit 118.
In addition, CPU110 is controlled via bus 112 and electron source control unit 120, lens control unit 140, secondary deviation Unit 155 and height control unit 160 connect.
Each control unit contained in control unit 400 according to from received control signal of CPU110 etc. to electron beam column 200 and each section in appearance portion 300 be respectively controlled.In addition, each control unit is stored via bus 112 and profiling data Portion 114 connects, and receives and dispatches profiling data stored in profiling data storage unit 114.
Profiling data be the height for the three-dimensional structure 66 that should be formed according to three-dimensional lamination arthroplasty devices 100 and with height The related data of cross sectional shape obtained when the orthogonal plane in direction cuts structure 66.Herein, three-dimensional structure 66 Short transverse is corresponding with the Z-direction of Fig. 1.In addition, with the orthogonal plane of short transverse with and Fig. 1 the parallel plane of X/Y plane It is corresponding.
Determination section 116 receives profiling data stored in profiling data storage unit 114, determines the control of control electron beam column Data processed.The data of irradiation position the surface of powder bed 62 63 at of the control data bag containing the 1st light beam and the 2nd light beam and The beam shape of the 1st light beam and the 2nd light beam for each irradiation position and the data of irradiation time.
Storage unit 118 stores irradiation position, beam shape and the photograph of the 1st light beam and the 2nd light beam that determination section 116 is determined The data of time are penetrated, and exports to deformation element control unit 130 and is biased to control unit 150.Determination section 116 and storage unit 118 composition and the embodiment of movement will be hereinafter described.
Electron source control unit 120 receives the instruction of CPU110, and to multiple electronics of the 1st light beam of output and the 2nd light beam Source 20 is respectively controlled.Electron source control unit 120 applies the acceleration voltage of electron beam to electron source 20.Electron source control is single 120 pairs of electron sources 20 of member export the heated current for example for generating thermionic heater.120 pairs of electricity of electron source control unit The control voltage of the output electron beam of component 20.
Deformation element control unit 130 is to the multiple deformation elements 30 for deforming the cross sectional shape of the 1st light beam and the 2nd light beam It is respectively controlled.Deformation element control unit 130 receives the beam shape data that is stored of storage unit 118, to the 1st light beam and The respective deformation element 30 of 2nd light beam is controlled.
Deformation element control unit 130 is for example to opposite in the X-axis direction 2 of the electrostatic quadrapole of deformation element 30 Electrode and 2 opposite in the Y-axis direction electrode output voltages, generate the cross sectional shape for being used to set the 1st light beam and the 2nd light beam Electric field.
Lens control unit 140 receives the instruction of CPU110, and to the multiple electromagnetism for assembling the 1st light beam and the 2nd light beam Lens 40 are respectively controlled.Lens control unit 140 exports the electric current for flowing through the coil part of electromagnetic lens 40.Lens control is single Member 140 passes through the size of the output electric current in setting flowing through coil portion, to set the lens strength of electromagnetic lens.
It is biased to control unit 150 and controls deflector 50, the interval between the light beam compared with the 1st light beam and the 2nd light beam is wider array of It can be biased to adjust the irradiation position of the 1st light beam and the 2nd light beam in range.
Control unit 150 is biased to for example to 2 groups relevant to the deviation of the X-direction of electromagnetism deflector 50 and Y direction Deflection coil exports electric current, generates the deviation magnetic field of the irradiation position of the electron beam at the surface 63 for being used to adjust powder bed 62. It is biased to control unit 150 and receives the irradiation position data that storage unit 118 is stored, control deflector 50.
Pair is biased to the instruction that control unit 155 receives CPU110, and controls secondary deflector 55.Pair is biased to control unit 155 Voltage is applied to the electrostatic deflection device for constituting secondary deflector 55, and sets the 1st light beam and the 2nd light at the surface 63 of powder bed 62 The interval of the relative exposure position of beam.
Height control unit 160 receives the instruction of CPU110, and controls driving portion 82.The control of height control unit 160 is driven It moves portion 82 and sets the length of the Z-direction of driving rod 84 and the height of bottom surface sections 72.
Height control unit 160 is melted solidification after Formation cross-section layer 65 in powder bed 62, is supplying new powder every time The height of bottom surface sections 72 is set when last layer 62.Bottom surface sections 72 are only reduced the thickness of new powder bed 62 by height control unit 160 The height that the surface 63 for covering the new powder bed 62 of three-dimensional structure 66 is light beam shadow surface is maintained approximately fixed height by amount Degree.Reason is height increase in each lamination cross-sectional layers 65 of the Z-direction of three-dimensional structure 66.
It reaches according to from profiling data storage unit 114 via determination section 116 and storage unit 118 and is biased to control unit 150 And the flowing of the control data of deformation element control unit 130, the implementation to related each section of three-dimensional lamination arthroplasty devices 100 The example of mode is illustrated.
It controls data and controls the 1st light beam, carry out the electron beam irradiation for making a part of melting and solidification of powder bed 62.Control Data processed control the 2nd light beam, carry out auxiliary irradiation to the surface 63 of powder bed 62.
Fig. 2 (a) indicates the example for the three-dimensional structure 66 that three-dimensional lamination arthroplasty devices 100 should be formed.It is parallel with X/Y plane Plane β be the plane orthogonal with the short transverse of three-dimensional structure 66, indicate to cut three-dimensional structure 66 in arbitrary height Cut surface.
Fig. 2 (b) indicates the cross sectional shape of the three-dimensional structure 66 at cut surface β.The section of three-dimensional structure generally comprises With the comparable one or more regions of the range for the powder bed 62 for answering melting and solidification.In the example shown in Fig. 2 (b), structure 66 section is formed by the region that contour line is surrounded.Cross sectional shape is characterized in that: including picture as shown in figure Such curve shown in the example of contour line.
Fig. 3 indicates the example of profiling data corresponding with the shape in the section of three-dimensional structure 66 shown in Fig. 2 (b).Root Shape according to section includes curve, and in order to make 62 melting and solidification of powder bed, and profiling data includes on the surface 63 of powder bed 62 Expression answer irradiating electron beam path a plurality of continuous cyclic annular curve (including broken line).
In the example of the profiling data of Fig. 3, showing each cyclic annular curve is the consistent closed line of Origin And Destination Situation.But profiling data is not limited to such case.Profiling data can also be the inconsistent feelings of the Origin And Destination of curve Condition, that is to say, that can also be for example spiral-like curve, as long as in order to make 62 melting and solidification of powder bed and including being expressed as follows path Ringed line, which be irradiated without missing to the section of structure 66 using electron beam.
In the example in fig. 3, profiling data includes to be equivalent to the full curve e1 of the periphery in section and be configured at curve e1's It is internal and in a plurality of full curve e2, e3 approximately equidistantly located with curve e1 ... e10.Profiling data is to be based on and three-dimensional The relevant design data of the shape of structure 66 is made in advance for each cut surface for cutting three-dimensional structure 66 in certain height At.Profiling data is stored in profiling data storage unit 114.
The example of Fig. 4 expression full curve e.The curve e1, e2 for the profiling data that full curve e and composition Fig. 3 are illustrated, E3 ... any curve of e10 is corresponding.
If full curve e is divided into length appropriate, including a plurality of local curve.In the present embodiment, by each office Portion's curve is approached with the both ends by local curve and the circular arc (can also be for line segment) with specific curvature (radius of curvature). In example shown in Fig. 4, full curve made of full curve e is connected as 4 local curves that will be approached with circular arc.
For example, the 1st article of local curve of curve e is with by the point A of position coordinates (Xa, Ya) and position coordinates (Xb, Yb) Point B connection, and approached with the circular arc of radius of curvature R ab.In addition, the 2nd article of local curve is with by position coordinates The point B of (Xb, Yb) and the point C of position coordinates (Xc, Yc) link, and the circular arc with radius of curvature R bc is approached.
3rd article of local curve be the point D of the point C of position coordinates (Xc, Yc) and position coordinates (Xd, Yd) to be linked, and Circular arc with radius of curvature R cd is approached.4th article of local curve is to sit the point D of position coordinates (Xd, Yd) and position The point A connection of (Xa, Ya) is marked, and the circular arc with radius of curvature R da is approached.
In profiling data, the circular arc for the direction+Y direction protrusion that the 1st article of local curve is approached, with to the 3rd As long as the direction that local curve is approached-Y direction protrusion circular arc is distinguished by the symbol of radius of curvature. Similarly, profiling data can be convex by the direction+X-direction approached the 2nd article of local curve by the symbol of radius of curvature Circular arc out is distinguished with the circular arc of the direction-X-direction protrusion approached the 3rd article of local curve.In addition, though Not comprising in the example in fig. 4, but profiling data can be showed as radius of curvature by specified especially value and link 2 points of line Section.
The endpoint C and the 3rd of the terminal B of the terminal B of 1st article of local curve and the 2nd article of local curve, the 2nd article of local curve The endpoint C of article local curve, the 3rd article of local curve endpoint D and the 4th article of local curve endpoint D and the 4th article of local curve Terminal A and the terminal A of the 1st article of local curve respectively become common point, profiling data illustrated by Fig. 4 is shown as a result, The full curve e of unitary closed.
Fig. 3 and Fig. 4 is shown comprising making with the corresponding relatively simple curve of the shape in section of three-dimensional structure 66 The example of graphic data, but present embodiment is not limited to this.The profiling data of actual three-dimensional structure 66 can also be according to section Shape and include more complicated curve.About profiling data, as long as including table to form the section of three-dimensional structure 66 Show the curve of the exposure pathways of the electron beam on the surface 63 of powder bed 62.
Even in this case, as long as the full curve for constituting profiling data to be divided into the local curve of appropriate intervals, Local curve can also be approached with circular arc (also may include straight line).That is, the cross sectional shape with three-dimensional structure 66 Relevant profiling data includes that the multiple local curves approached with circular arc are connected resulting full curve.
Premised on this profiling data is stored in profiling data storage unit 114, to institute in the control unit 400 of Fig. 1 The embodiment of the determination section 116 and storage unit 118 and deviation control unit 150 that contain and deformation element control unit 130 Example is illustrated.
Determination section 116 receives the input of the profiling data relevant to the three-dimensional cross sectional shape of structure 66, and determines Along the data of the irradiation position of the 1st light beam and the 2nd light beam of the full curve on the surface 63 of powder bed 62 and for the photograph Penetrate the data of the 1st light beam of position and the beam shape of the 2nd light beam and irradiation time.
More specifically, determination section 116 receives the input of the local curve approached with circular arc, and determines along the office The data of the irradiation position of 1st light beam of portion's curve and the 2nd light beam, beam shape and irradiation time.In turn, 116 needle of determination section To the profiling data comprising one or more local curve, determine the irradiation position of the 1st light beam and the 2nd light beam, beam shape and The data of irradiation time.
For the 1st article of local curve shown in Fig. 4, the irradiation position along local curve is determined to determination section 116 The movements of data be illustrated.1st article of local curve indicate with by the point A of position coordinates (Xa, Ya) and position coordinates (Xb, Yb point B) is connected, and the local curve that the circular arc with radius of curvature R ab is approached.
(1) firstly, determination section 116 is determined the length Lab of the circular arc of point A and point B connection.That is, based on following Formula 1 is found out with radius of curvature R ab and from point A (Xa, Ya) to the length Lab of the circular arc until point B (Xb, Yb).
(formula 1) Lab=2Rab × arcsin ((((Xa-Xb) 2+ (Ya-Yb) 2) 1/2)/2Rab)
(2) next, determination section 116 determines the irradiation frequency n along circular arc.It finds out between the irradiation position along circular arc Equally spaced frequency n every being no more than the interval δ being provided previously and as close interval δ.Herein, as an example, it can be based on down It states formula 2 and finds out n.
(formula 2) n=[Lab/ δ]+1
Herein, [Lab/ δ] is to provide the Gauss symbol of the maximum integer no more than Lab/ δ.In addition, interval δ can be according to edge The electron beam of local curve irradiation beam sizes or beam shape or beam intensity and predetermine.
(3) then, determination section 116 determines the interval δ ab of the practical irradiation position along circular arc.For example, can be based on following Formula 3 finds out the interval δ ab of irradiation position.
(formula 3) δ ab=Lab/n
(4) determination section 116 determines and the n with δ ab at equal intervals along the circular arc approached the 1st article of local curve A irradiation position A (=PA1), PA2 ... the corresponding irradiation position data of PAn (coordinate data of irradiation position).Adjacent irradiation Mutual of position is divided into δ ab.
Determination section 116 also to the 2nd article of local curve determine to have at equal intervals the irradiation position B (=PB1) of δ bc, PB2 ... The irradiation position data of PBm.In turn, it also determines for the 3rd article of local curve and the 4th article of local curve, determination section 116 along office The irradiation position data of the circular arc of portion's curve.
Fig. 5 indicates the irradiation position P along a plurality of local curve for constituting full curve e so determined.Determination section 116 Irradiation position P and corresponding irradiation position data so are determined to a plurality of local curve for constituting full curve e.In turn, All full curves of 116 pairs of determination section composition profiling datas determine irradiation position P and corresponding irradiation position data.
1st article of local curve, the 2nd article of local curve, the 3rd article of local curve and the 4th article of local curve irradiation position Interval δ ab, δ bc, δ cd and δ da are to be no more than provided interval δ and determine in a manner of the value that becomes close to interval δ.? That is interval δ ab, δ bc, δ cd and δ da are set in a manner of meeting the following Expression 4.In this way, determination section 116 is along continuous Curve e determines the irradiation position P configured with roughly equal interval.
(formula 4) δ ab~δ bc~δ cd~δ da≤δ
Irradiation position P is configured with roughly equal interval along full curve e as a result,.By same light beam shape or light When 1st light beam of beam intensity exposes to these irradiation positions P together with the 2nd light beam, temperature caused by powder bed 62 rises, nothing It is roughly the same degree by which irradiation position P.That is, electron beam makes the temperature of powder bed 62 along full curve e Degree substantially evenly rises, to make the melting and solidification of powder bed 62 substantially evenly carry out along full curve e.
Determination section 116 can determine the interval δ of irradiation position according to the beam shape of electron beam or beam intensity.Reason exists In: the interval of irradiation position as equably increase along full curve the temperature of powder bed 62 is according to electron beam Beam shape or beam intensity determine.
The irradiation position data that determination section 116 is determined are stored in storage unit 118.It is stored in storage unit 118 Irradiation position data are common to the 1st light beam and the 2nd light beam inclined via being biased to control unit 150 in specific timing and being output to To device 50.
Determination section 116 sets the output timing based on irradiation time.Irradiation time is for each irradiation position P The irradiation time of 1 light beam and the 2nd light beam is determined by determination section 116.Determination section 116 based on can along constitute profiling data company Condition that continuous curve melts powder bed 62 equably determines irradiation time.
For the electron beam for melting powder bed 62 equably irradiation time not only according to electron beam beam intensity or The material of metal powder, also according to the configuration density of the irradiation position at the surface 63 of powder bed 62.
For the photograph configured at equal intervals on the local curve approached with the circular arc of radius of curvature having the same Position is penetrated, determination section 116 can determine roughly equal radiation time data.Reason is: with radius of curvature having the same The local curve that is approached of circular arc on the irradiation position that configures at equal intervals on the surface of powder bed 62 63 with roughly equal Configuration density distribution.
In addition, for the irradiation position along the local curve configuration approached with the circular arc with different radius of curvature P is set, determination section 116 can determine different irradiation times.Reason is: even if along with the circular arc with different radius of curvature Approached local curve configuration irradiation position P along local curve to configure at equal intervals, at the surface 63 of powder bed 62 The configuration density of irradiation position P can also be different.
For example, determining τ ab as to each of the 1st article of local curve approached along the circular arc with radius of curvature R ab The radiation time data that a irradiation position P is irradiated.Determination section 116 determines τ bc as to along with the circle of radius of curvature R bc The radiation time data that each irradiation position for the 2nd article of local curve that arc is approached is irradiated.
In addition, determining τ cd as to each of the 3rd article of local curve approached along the circular arc with radius of curvature R cd The radiation time data that a irradiation position P is irradiated.Determination section 116 determines τ da as to along with the circle of radius of curvature R da The radiation time data that each irradiation position P for the 4th article of local curve that arc is approached is irradiated.
In turn, determination section 116 determines the beam shape of the 1st light beam and the 2nd light beam.Fig. 6 indicates that there is determination section 116 to determine The 1st light beam and the 2nd light beam of fixed beam shape are irradiated along surface 63 of the full curve shown in Fig. 4 to powder bed 62 Example.
Determination section 116 for example determines that the width of light beam of longitudinal (Y direction) and lateral (X-direction) is roughly equal and is formed Beam shape of the beam shape data Bs of cross sectional shape through constriction as the 1st light beam.Form the cross sectional shape through constriction The beam shape data Bs of electron beam is the beam shape data of the 1st light beam.
The 1st light beam with the cross sectional shape through constriction is along the block curve e with terminal A, B, C, D to powder bed 62 Surface 63 be irradiated.The 1st light beam with the cross sectional shape through constriction makes along block curve e in the temperature of powder bed 62 The temperature of fusing point or more is risen to, and makes 62 melting and solidification of powder bed.
The irradiation of the 1st light beam with the cross sectional shape through constriction the powder bed 62 along curve e part with remove this Temperature difference sharply is generated between part in addition.The irradiation of light beam with the cross sectional shape through constriction passes through the temperature sharply Degree official post is locally melted along the powder bed 62 of curve e.
In addition, the 1st light beam with the cross sectional shape through constriction can be for each of the local curve for constituting full curve e Adjust irradiation time.Reason is that determination section 116 can set different radiation time data τ ab, τ for each local curve Bc, τ cd and τ da.1st light beam can be approached with different irradiation times with the circular arc with different radius of curvature Local curve be irradiated.
Determination section 116 for example determines that the more lateral width of light beam of longitudinal width of light beam is longer and forms the section through elongating Beam shape of the beam shape data Bt of shape as the 2nd light beam.Form the light beam of the electron beam of the cross sectional shape through elongating Shape data Bt is the beam shape data of the 2nd light beam.
The 2nd light beam with the cross sectional shape through elongating along with terminal A ', the dashed curve e' of B', C', D' is to powder The surface 63 of last layer 62 is irradiated.The 2nd light beam with the cross sectional shape through elongating along dashed curve e' by being shone It penetrates, and to carrying out auxiliary irradiation near 62 part of powder bed melted by the 1st light beam.
1st light beam and the 2nd light beam pass through common deflector 50, and to be in substantially phase on curve e and curve e' The mode that equidistant 2 positions are irradiated simultaneously is biased to.The 2nd light beam with the cross sectional shape through elongating, which utilizes, to be had more The position that the irradiation position of the electron beam pair of wide range of exposures and the 1st light beam is separated by fixed range is irradiated.
That is, the 2nd light beam nearby carries out auxiliary irradiation to the irradiation position of the 1st light beam, make the irradiation position of the 1st light beam The temperature of powder bed 62 near setting rises.By keeping the Temperature Distribution of powder bed 62 equal near the irradiation position of the 1st light beam One changes, and the part of the powder bed 62 through melting and solidification is not easily susceptible to the positional shift as caused by the Temperature Distribution in powder bed 62 Influence.
At this point, secondary deflector 55 (referring to Fig.1) adjusts the mutual interval of irradiation position of the 1st light beam and the 2nd light beam It is whole.The interval that secondary deflector 55 may be set between the light beam to the 1st light beam and the 2nd light beam is adjusted, so that in the 1st light beam The Temperature Distribution of powder bed 62 becomes more evenly near irradiation position.
Determine fixed beam shape as the 1st light in addition, Fig. 6 shows any place of the determination section 116 on curve e The example of the beam shape of beam and the 2nd light beam.It can also replace as by determination section 116 according to the irradiation road for indicating electron beam The profiling data of diameter, every local curve for composition full curve or each irradiation position along local curve configuration, Different beam shapes is determined respectively to the 1st light beam and the 2nd light beam.
According to the above, have the three-dimensional lamination arthroplasty devices 100 of determination section 116 along constituting one of profiling data Or a plurality of full curve (referring to Fig. 3) determines irradiation position, beam shape and the irradiation time of the 1st light beam and the 2nd light beam.Tool The three-dimensional lamination arthroplasty devices 100 of standby determination section 116 are to form three-dimensional structure based on the profiling data comprising a plurality of full curve The cross sectional shape of the divine force that created the universe 66.
Fig. 7 indicates that determination section 116 is directed to full curve e1, e2, the e3 ... for being equivalent to and constituting profiling data illustrated by Fig. 3 The example of the data of the irradiation position of the 1st light beam and the 2nd light beam that every curve e of e10 is determined, beam shape and irradiation time Son.
Determination section 116 receives the profiling data for indicating full curve e, and determines the irradiation position with the 1st article of local curve PA1, PA2, PA3 ... the corresponding irradiation position data (Xa, Ya) of PAn, (Xa2, Ya2), (Xa3, Ya3) ... (Xan, Yan), shape data Bt and radiation time data the τ ab of the shape data Bs of the 1st light beam and the 2nd light beam.
In addition, determination section 116 receives the profiling data for indicating full curve e, and determine the irradiation with the 2nd article of local curve Position PB1, PB2, PB3 ... the corresponding irradiation position data (Xb, Yb) of PBm, (Xb2, Yb2), (Xb3, Yb3) ... Shape data Bt and radiation time data the τ bc of (Xbm, Ybm), the shape data Bs of the 1st light beam and the 2nd light beam.
In turn, determination section 116 receives the profiling data for indicating full curve e, and determines the irradiation with the 3rd article of local curve Position PC1, PC2, PC3 ... corresponding irradiation position data (Xc, Yc), (Xc2, Yc2), (Xc3, Yc3) ..., the 1st light The shape data Bs of beam and shape data Bt and radiation time data the τ cd of the 2nd light beam.
Determination section 116 receives the profiling data for indicating full curve e, and determines the irradiation position with the 4th article of local curve PD1, PD2, PD3 ... corresponding irradiation position data (Xd, Yd), (Xd2, Yd2), (Xd3, Yd3) ..., the 1st light beam Shape data Bt and radiation time data the τ da of shape data Bs and the 2nd light beam.
Fig. 7 is to be directed to all local curves for constituting full curve e and all irradiation positions for the 1st light beam and the 2nd light beam It is determined as the example of fixed shape data Bs and Bt.It is bent for every part for constituting full curve for can also replacing 1st light beam and the 2nd light beam are determined as different shape datas by line or each irradiation position for being configured at local curve.
Storage unit 118 stores the irradiation position, beam shape of these the 1st light beams and the 2nd light beam that determination section 116 is determined And the data of irradiation time.Storage unit 118 can store determination section along the sequence that full curve e is arranged according to irradiation position The data of the irradiation positions of 116 the 1st light beams and the 2nd light beam determined, beam shape and irradiation time.
Storage unit 118 for example according to the sequential storage with along the 1st article of local curve irradiation position PA1, PA2, PA3 ... the corresponding data of PAn, then according to the sequential storage with along the 2nd article of local curve irradiation position PB1, PB2, PB3 ... the corresponding data of PBm.
Storage unit 118 then according to the sequential storage with along the 3rd article of local curve irradiation position PC1, PC2, PC3 ... corresponding data, then according to the sequential storage with along the 4th article of local curve irradiation position PD1, PD2, PD3 ... corresponding data.
By being so stored in advance, as long as storage unit 118 is according to irradiation position, the light with the 1st light beam of storage and the 2nd light beam The same order of the data of harness shape and irradiation time is exported, so that it may with the irradiation position of electron beam along even When the mode that continuous curve e is moved counterclockwise exports the irradiation position, beam shape and irradiation of the 1st light beam and the 2nd light beam Between data.
In addition, as long as storage unit 118 is according to irradiation position, beam shape and the irradiation with the 1st light beam of storage and the 2nd light beam The sequence that the sequence of the data of time is opposite is read, so that it may with the irradiation position of electron beam along full curve e to suitable The mobile mode of clockwise exports the data of the irradiation position of the 1st light beam and the 2nd light beam, beam shape and irradiation time.
Storage unit 118 is by control to the number of the irradiation position of the 1st light beam and the 2nd light beam, beam shape and irradiation time According to the sequence stored and the sequence exported, and by the direction that melting and solidification is advanced in powder bed 62 be set as along Full curve is advanced to fixed-direction.The systematicness of the transmitting of the generation and heat of the heat at powder bed 62 is improved as a result, and Three-dimensional lamination arthroplasty devices 100 are easier to control the traveling of the melting and solidification inside powder bed 62.
In addition, storage unit 118 can by with constitute Fig. 3 profiling data a plurality of full curve e1, e2 ... e9, e10 are corresponding The 1st light beam and the irradiation position of the 2nd light beam, beam shape and irradiation time data according to the sequence, namely according to each The size order for the area that a curve is surrounded is stored.
Storage unit 118 can be according to the curve e1, in the inner part for the most peripheral for surrounding maximum area on the surface of powder bed 62 63 A curve e2, a curve e3 ... more in the inner part sequence, storage is for the 1st light beam of each curve and the photograph of the 2nd light beam Penetrate the data of position, beam shape and irradiation time.
Storage unit 118 can by according to exported with the same order that is stored in storage unit 118 the 1st light beam and The data of the irradiation position of 2nd light beam, beam shape and irradiation time, and one side is from the company of the opposite exterior lateral sides in powder bed 62 Continuous curve changes the irradiation position of electron beam to the full curve in relative inner, makes 62 melting and solidification of powder bed on one side.
Storage unit 118 can replace for by according to the sequence opposite with the sequence stored in storage unit 118 come defeated The data of the irradiation position of 1st light beam and the 2nd light beam, beam shape and irradiation time out, and one side is from powder bed 62 The full curve of relative inner changes the irradiation position of electron beam to the full curve in opposite exterior lateral sides, makes powder bed 62 on one side Melting and solidification.
That is, irradiation position, beam shape and irradiation of the storage unit 118 by control to the 1st light beam and the 2nd light beam The sequence that the data of time are stored and the sequence exported, and the direction that melting and solidification is advanced in powder bed 62 is set It is set to from direction of the peripheral portion towards central part of cross-sectional layers 65 or the central part from cross-sectional layers 65 towards the direction of peripheral portion. The systematicness of the transmitting of the generation and heat of the heat of the inside of powder bed 62 is improved as a result, and three-dimensional lamination arthroplasty devices 100 are more It is easy to control the traveling of the melting and solidification of the inside of powder bed 62.
Fig. 8 shows the configuration examples for being biased to control unit 150.The reception of data conversion unit 152 is biased to be determined by determination section 116 And stored by storage unit 118 irradiation position data (Xa, Ya), (Xa2, Ya2), (Xa3, Ya3) ... etc., carry out deflector The coordinate of 50 deviation efficiency is converted.That is, using deviation efficiency conversion coefficient Gx, Gy of deflector 50, Rx, Ry, Hx, Hy, Ox, Oy convert irradiation position data (X, Y) by following formula 5.
(formula 5)
X'=GxX+RxY+HxXY+Ox
Y'=GyY+RyX+HyXY+Oy
Herein, conversion coefficient determines as follows: when specifying irradiation position data (X, Y), keeping light beam actually inclined To the irradiation position (X, Y) to the surface of powder bed 62 63.It is biased to the deviation number for the result that data conversion unit 152 converts coordinate According to (X', Y') output to deviation driving portion 156.
It is biased to driving portion 156 and digital-to-analog conversion is carried out to the deviation data (X', Y') that coordinate is converted, it will be with deviation number It exports according to the proportional electric current of the X-component of (X', Y') and the value of Y-component to the common electromagnetism of the 1st light beam and the 2nd light beam and is biased to The deflection coil of the x-direction and y-direction of device 50.Position illumination beam represented by 50 pairs of irradiation position datas of deflector as a result,.
Timing generating unit 154 receives the photograph for being determined by determination section 116 and being stored by storage unit 118 from storage unit 118 Penetrate time data τ ab ... τ bc ....Timing generating unit 154 will be converted into according to irradiation time generation and be biased to data (X', Y') Irradiation position data export to the timing for being biased to driving portion 156 and deflector 50.
Timing generating unit 154 for example generates the timing of output irradiation position data as follows: to irradiation positional number After only irradiating the time represented by radiation time data τ ab according to position represented by (Xa, Ya), irradiation position is switched into irradiation Position represented by position data (Xa2, Ya2).
Next timing generating unit 154 generates the timing of output irradiation position data as follows: to irradiation position After the time represented by radiation time data τ ab is only irradiated in position represented by data (Xa2, Ya2), irradiation position is switched to Position represented by irradiation position data (Xa3, Ya3).
The above operation is repeated, timing generating unit 154 is only to irradiate what storage unit 118 was stored to each irradiation position The mode of time specified by radiation time data is controlled.Electron beam one irradiates institute in face of specified irradiation position one by one Specified irradiation time, on one side along the full curve e of composition profiling data in the counterclockwise direction or clockwise to irradiation Position is irradiated.
Next, to the light beam for making the 1st light beam and the 2nd light beam based on the beam shape data stored in storage unit 118 The deformation element 30 and the configuration example of deformation element control unit 130 and the example of movement of change in shape are illustrated.
In the following description, to deformation element 30 include have generation electric field opposite in the X-axis direction 2 electrodes and The case where electrostatic quadrapole of 2 electrodes of opposite generation electric field, is illustrated in the Y-axis direction.
Fig. 9 is the geometric optics figure of the electron beam exported from the electron source 20 with the anisotropy electronics surface of emission.It is shown in The figure of the Z axis vertically extended documented by approximate centre than figure more on the right side is indicated by the row as electron beam The electricity in plane (face XZ) that Z-direction into direction and the X-axis of the short side direction as the anisotropy electronics surface of emission are formed The geometric optics figure of beamlet.Be shown in more leaned on than Z axis left side figure indicate by the direction of travel as electron beam Z-direction, with The Y-axis of longitudinal direction as the anisotropy electronics surface of emission is formed by the geometric optics of the electron beam in plane (face YZ) Figure.
Make the electron beam passed through along the path substantially uniform with Z axis relative to the axisymmetric electromagnetic lens 40 of Z-direction It assembles.The dotted line of Fig. 9 indicates the imaging relations of the electron beam formed when not driving deformation element 30 by electromagnetic lens 40.Electromagnetism Lens 40 by the image in the electron emission face with the different Anisotropic shapes of the length in X-direction and Y direction, with The multiplying power being equal in the face Nei JiYZ of the face XZ images in the surface 63 of powder bed 62.
That is, in the dotted line of Fig. 9, in the shooting angle θ for the electron beam being emitted from point O into the face the XZ face Nei JiYZ 1 it is equal when, the convergence angle θ 2 of the electron beam at point P is equal in the face Nei JiYZ of the face XZ.
Next, being illustrated to the case where driving deformation element 30.The expression of deformation element 30 is configured with along Z-direction The example of 2 grades of electrostatic quadrapoles 31 and 32.Electrostatic quadrapole 31 and 32 has generation electric field opposite in the X-axis direction respectively 2 electrodes of 2 electrodes and generation electric field opposite in the Y-axis direction.Electrostatic quadrapole 31,32 is configured to this 2 groups extremely sons and exists It is aligned in the longitudinal direction in the electron emission face of electron source 20 and the identical direction of short side direction.
Electron beam passes through the center of 4 electrodes along Z-direction.Documented positive (+) and negative (-) symbol expression pair on electrode The polarity for the voltage that each electrode applies.Electrostatic quadrapole 31 and 32 is by applying that X-direction electrode and Y direction electrode This different polar voltage, and dissipate the angular aperture of electron beam in the X-axis direction and assemble in the Y-axis direction, or in X-axis It assembles on direction and dissipates in the Y-axis direction.
In polar situation shown in Fig. 9, it is emitted in the face XZ of short side direction for including electron emission face from point O Electron beam is when passing through electrostatic quadrapole 31, from 2-polar electric pole of X-direction by repulsive force, and what aperture was angularly assembled Direction change, when passing through electrostatic quadrapole 32, from 2+polar electric pole of X-direction by attraction, and aperture is angularly sent out Scattered direction change.
On the other hand, the electron beam being emitted in the face YZ of longitudinal direction for including electron emission face from point O is across quiet When electric quadrupole 31, from 2+polar electric pole of Y direction by attraction, and the direction change that aperture angularly dissipates, it is wearing When crossing electrostatic quadrapole 32, from 2-polar electric pole of Y direction by repulsive force, and the direction change that aperture is angularly assembled.
The electron beam being emitted from electron emission face with identical shooting angle θ 1 by applying voltage to electrostatic quadrapole, and Converge at the point P on the surface 63 of powder bed 62 with different convergence angle θ 3 and θ 4 respectively in the face Nei JiYZ of the face XZ.Namely It says, the image in electron emission face images in the surface 63 of powder bed 62 in the face Nei JiYZ of the face XZ with different multiplying powers.
The polarity and size for the voltage that electrostatic quadrapole 31 and 32 applies electrode by change, and can be in electron emission face Short side direction and electron emission face longitudinal direction on change image in powder bed 62 surface 63 electron beam long side side To the ratio of width and short side direction width.If can hardly change the current value of electron beam using the function and change pair The shape for the electron beam that the surface 63 of powder bed 62 is irradiated.
Deformation element 30 changes beam shape by the electrode setting voltage to electrostatic quadrapole 31 and 32.Deformation member For part 30 can more for example change the case where operation condition of electron source 20, more stable and reproducibility changes electron beam well Beam shape.
Figure 10 indicates the example of the shape of the electron beam irradiated to the surface 63 of powder bed 62.It is shown in the electricity of the left end of Figure 10 Beamlet B is expressed as follows example: voltage corresponding with beam shape data B being applied to the electrode of electrostatic quadrapole 31 and 32, and is set The electron beam of the width of light beam S of fixed length edge direction.
The electron beam Bs for being shown in the center of Figure 10 is expressed as follows example: voltage corresponding with beam shape data Bs is applied to The electrode of electrostatic quadrapole 31 and 32, and the electron beam Bs being narrowed down is set, electron beam Bs has the light beam of longitudinal direction wide The reduced width roughly the same on portraitlandscape of degree.The electron beam Bt for being shown in the right end of Figure 10 is expressed as follows example: will be with The corresponding voltage of beam shape data Bt is applied to the electrode of electrostatic quadrapole 31 and 32, and sets the width of light beam of longitudinal direction The electron beam Bt being elongated in the long side direction being amplified.
Figure 11 indicates the configuration example of the deformation element control unit 130 of control deformation element 30.Shape data converter section 132 The beam shape data B for being determined by determination section 116 and being stored by storage unit 118 is received, operation is quiet to deformation element 30 The voltage data D1 and D2 that electric quadrupole 31 and 32 exports.
Shape data converter section 132 receives the beam shape data Bs that storage unit 118 is stored, and output is formed through constriction The voltage data D1s and D2s that the electrostatic quadrapole 31 and 32 to deformation element 30 of electron beam Bs exports, electron beam Bs have The reduced width roughly the same on portraitlandscape of the width of light beam of longitudinal direction.
Shape data converter section 132 receives the beam shape data Bt that storage unit 118 is stored, and output is formed in long side side The voltage data D1t and D2t that the electrostatic quadrapole 31 and 32 to deformation element 30 for the electron beam Bt being elongated upwards exports, should The width of light beam of the longitudinal direction of electron beam Bt is amplified.
Voltage data D1 and D2 that element driving portion 136 exports shape data converter section 132 etc. carries out digital-to-analog Conversion, by the electrostatic quadrapole 31 and 32 of the voltage output proportional to voltage data to deformation element 30.1st light beam as a result, And the 2nd the deformation element 30 of light beam the beam shape of the 1st light beam and the 2nd light beam is set to represented by each beam shape data Beam shape.
Timing generating unit 134 receives radiation time data τ ab ... τ bc ... corresponding with irradiation position from storage unit 118.When Sequence generating unit 134 is generated according to the irradiation time will be converted into the light beam of voltage data D1 and D2 by shape data converter section 132 Shape data exports the timing to element driving portion 136 and deformation element 30.Timing generating unit 134 carries out and is biased to control list The identical movement of timing generating unit 154 (referring to Fig. 8) of member 150.
Timing generating unit 134 generates timing and output beam shape data when each irradiation position switches.That is, Even if determining that different beam shapes, storage unit 118 are deposited for each irradiation position for each irradiation position in determination section 116 In the case where storing up different beam shape datas, deformation element control unit 130 also can be directed to each irradiation according to the situation Position exports different beam shapes.
For the three-dimensional lamination arthroplasty devices 100 with the above configuration example, Figure 12 is indicated to three-dimensional lamination arthroplasty devices 100 The example of motion flow that is indicated of lamination appearance movement.
When starting lamination appearance movement, three-dimensional lamination arthroplasty devices 100 are supplied from the sample supply unit 64 in appearance portion 300 Powdered sample 68, and supply the powder bed 62 planarized substantially in parallel with the bottom surface sections 72 surrounded by sidewall portion 74 (S510)。
The determination section 116 of three-dimensional lamination arthroplasty devices 100 is based on appearance number stored in profiling data storage unit 114 According to when determining irradiation position corresponding with the 1st light beam and the 2nd light beam that export from electron beam column 200, beam shape and irradiation Between data.The data of the irradiation position determined, beam shape and irradiation time are stored in storage unit 118 (S520).
Before being irradiated using surface 63 of the electron beam to powder bed 62, three-dimensional lamination arthroplasty devices 100 are from storage Portion 118 reads the data of the 1st light beam and the irradiation position of the 2nd light beam along full curve, beam shape and irradiation time (S530).So-called full curve refer in the example in fig. 3 curve e1, e2, e3 ... any one of e10.
The storage unit 118 of three-dimensional lamination arthroplasty devices 100 is single in being biased to control by read-out irradiation position data setting The deviation data conversion unit 152 of member 150.Read-out beam shape data is set in deformation element control list by storage unit 118 The shape data converter section 132 of member 130.Read-out radiation time data is set in and is biased to control unit 150 by storage unit 118 Timing generating unit 154 and deformation element control unit 130 timing generating unit 134.
The timing generating unit 154 and 134 of three-dimensional lamination arthroplasty devices 100 generates clock signal for each irradiation time. Control unit 150 is biased to export the irradiation position data converted through coordinate to deflector 50 based on clock signal.Deformation element The beam shape data for the voltage data that control unit 130 will convert into deformation element 30 based on clock signal is exported to deformation member Part 30.The irradiation (S540) of the 1st light beam and the 2nd light beam is carried out along the full curve on the surface 63 of powder bed 62 as a result,.
At the end of the irradiation along the 1st light beam of full curve and the 2nd light beam, three-dimensional lamination arthroplasty devices 100 make the 1st The irradiation position of light beam is back to the immediate vicinity (S550) of the cross-sectional layers 65 of three-dimensional structure 66.Reason is the 1st light beam not Make that 62 melting and solidification of powder bed other than the part of cross-sectional layers 65 should be become.
Step S550, which can be used in three-dimensional lamination arthroplasty devices 100, not to be had electron beam to the photograph on the surface of powder bed 62 63 In the case where the shielding function (light beam break function) for penetrating masking.With shielding function, step S550 can also lead to Masking is crossed to cover irradiation of the 1st light beam to powder bed 62.
Next, three-dimensional lamination arthroplasty devices 100 judge along with just in the powder bed of irradiating electron beam 62 in same layer Whether the irradiation of the electron beam of interior all full curves terminates, curve e1 in the example of all full curves i.e. Fig. 3, E2, e3 ... all curves (S560) of e10.(the S560 in the unclosed situation of irradiation of electron beam;It is no), three-dimensional lamination is made Shape dress sets 100 irradiation position, the light beam shapes that the 1st light beam and the 2nd light beam along next article of full curve are read from storage unit 118 The data (S530) of shape and irradiation time continue the irradiation for the powder bed 62.
(the S560 in the case where the irradiation of electron beam terminates;It is), three-dimensional lamination arthroplasty devices 100 judge three-dimensional structure Whether the melting and solidification of 66 all powder layer 62 terminates (S570).In the unclosed situation of the melting and solidification of all powder layer 62 Under (S570;It is no), three-dimensional lamination arthroplasty devices 100 carry out the feed motion of driving rod 74 and the surface 63 that changes powder bed 62 Highly (S580).Then, the powdered sample 68 (S510) of next powder bed 62 is supplied from the sample supply unit 64 in appearance portion 300, Continue the lamination appearance movement (S520~S560) for next powder bed 62.
(the S570 in the case where the melting and solidification of all powder layer 62 terminates;It is), three-dimensional lamination arthroplasty devices 100 terminate For the lamination appearance movement of three-dimensional structure 66.
In lamination appearance movement, three-dimensional lamination arthroplasty devices 100 by the 1st light beam and the 2nd light beam come and meanwhile it is real Apply the melting irradiation and auxiliary irradiation for powder bed 62.For the case where relatively individually implementing melting irradiation and auxiliary irradiation, three Dimension lamination arthroplasty devices 100 can shorten the time of entire lamination appearance movement.
In addition, three-dimensional lamination arthroplasty devices 100 the 1st light beam and the 2nd light beam are set as beam shape Bs and Bt etc. and The midway being irradiated along full curve, the significantly change of the state without electron beams such as beam current value or beam sizes More.Three-dimensional lamination arthroplasty devices 100 can avoid the unstability generated in the case where significantly changing the state of electron beam, In addition, the static determinacy waiting time generated in the case where significantly changing the state of electron beam can be saved.
In addition, the 1st light beam is set as beam shape by three-dimensional lamination arthroplasty devices 100 in lamination appearance movement Bs, and the movement for a part of melting and solidification for making powder bed 62 is carried out, it is parallel with and the 2nd light beam is set as the electricity being elongated Beamlet Bt, and auxiliary irradiation is carried out to powder bed 62.
It can also replace as the 2nd light beam is set as beam shape Bs by three-dimensional lamination arthroplasty devices 100, and is made The movement of a part of melting and solidification of powder bed 62, is parallel with the 1st light beam being set as the electron beam Bt being elongated, and right Powder bed 62 carries out auxiliary irradiation.
In turn, three-dimensional lamination arthroplasty devices 100 can also be in the 1st light beam of processing procedure midway conversion for making 62 melting and solidification of powder bed And the 2nd light beam effect.That is, can also be in a plurality of full curve irradiating electron beam on the surface 63 along powder bed 62 When, melting irradiation and auxiliary irradiation are carried out respectively by the 1st light beam and the 2nd light beam in a part of full curve, in another part Carry out melting irradiation and auxiliary irradiation in full curve respectively by the 2nd light beam and the 1st light beam.
More than, using embodiment, the present invention is described, but technical scope of the invention is not limited to the reality Apply range documented by mode.Practitioner, which understands, to implement numerous variations or improvement to the embodiment.Based on claim Book understands that the mode for implementing this change or improvement can also reside in claims of the present invention.
About the movement, suitable in claims, specification and device shown in the drawings, system, program and method What sequence, step, stage etc. were respectively handled executes sequence, it is noted that as long as do not explicitly indicate that especially " compared with ... before ", " ... it Before " etc., be not in addition the output of the processing in processing below before use, can random order realize.About power Motion flow in sharp claim, specification and attached drawing, even if the progress such as uses " firstly, ", " next, " for convenience Illustrate, also not meaning that must sequentially be implemented according to this.
[explanation of appended drawing reference]
20 electron sources
30 deformation elements
31,32 electrostatic quadrapole
40 electromagnetic lenses
50 deflectors
55 secondary deflectors
62 powder beds
63 surfaces
64 powder supply units
65 cross-sectional layers
66 three-dimensional tectosomes
68 powdered samples
72 bottom surface sections
74 sidewall portions
82 driving portions
84 driving rods
100 three-dimensional lamination arthroplasty devices
110 CPU
112 buses
114 profiling data storage units
116 determination sections
118 storage units
120 electron source control units
130 deformation element control units
132 shape data converter sections
134 timing generating units
136 element driving portions
140 lens control units
150 are biased to control unit
152 are biased to data conversion unit
154 timing generating units
156 are biased to driving portion
160 height control units
200 electron beam columns
300 appearance portions
400 control units

Claims (10)

1. a kind of three-dimensional lamination arthroplasty devices, it is characterised in that: it is to carry out powder bed through cross-sectional layers made of melting and solidification Lamination carrys out appearance three-dimensional structure, and includes
Electron beam column, the 2nd light beam for exporting the 1st light beam and being irradiated side by side with the 1st light beam;
Appearance portion, for accommodating the raw material powder irradiated by the 1st light beam;And
Control unit controls the electron beam column;And
The control unit has:
Determination section sets the 1st light beam along a plurality of ringed line in the path for the electron beam for indicating to irradiate the cross-sectional layers And the 2nd light beam multiple irradiation positions, and determine the irradiation time at each irradiation position;
Storage unit stores the data of the irradiation position that the determination section is determined and irradiation time;And
Timing generating unit generates according to the irradiation time and reads the irradiation position data from the storage unit and export to institute State the timing of electron beam column.
2. three-dimensional lamination arthroplasty devices according to claim 1, it is characterised in that: the ringed line is by circular arc and line segment It is formed by full curve expression, the determination section sets the irradiation position along the full curve.
3. three-dimensional lamination arthroplasty devices according to claim 2, it is characterised in that: the determination section is set with fixed intervals The irradiation position.
4. three-dimensional lamination arthroplasty devices according to claim 2, it is characterised in that: the determination section is according to the 1st light The beam shape or beam intensity of beam or the 2nd light beam determine the interval of the irradiation position along the full curve.
5. three-dimensional lamination arthroplasty devices according to claim 2, it is characterised in that: the determination section is to along same curvature The circular arc of radius and the irradiation position set is set to the same illumination time.
6. three-dimensional lamination arthroplasty devices according to claim 1, it is characterised in that: the storage unit is according to the electron beam Irradiation sequence store the data of the irradiation position and irradiation time.
7. three-dimensional lamination arthroplasty devices according to claim 6, it is characterised in that: the determination section is according to the ringed line The sequence of the area surrounded from big to small sets the irradiation position and irradiation time and is stored in the storage unit.
8. three-dimensional lamination arthroplasty devices according to claim 1, it is characterised in that: the electron beam column has and makes the 1st light Multiple deformation elements of the cross sectional shape of beam and the 2nd light beam deformation, the determination section determine the 1st light beam and the 2nd light beam The cross sectional shape of irradiation position and irradiation time and the 1st light beam and the 2nd light beam.
9. three-dimensional lamination arthroplasty devices according to claim 1, it is characterised in that: the electron beam column has to described the The powder bed of 1 light beam and the 2nd light beam adjusts the secondary deflector at the mutual interval of irradiation position at surface.
10. a kind of lamination shaping method, it is characterised in that: it is carried out in three-dimensional lamination arthroplasty devices, which makes Shape dress, which is set, includes electron beam column, exports the 1st light beam and with the 1st light beam side by side to the wider array of model of the 1st light beam Enclose the 2nd light beam being irradiated;Appearance portion, for accommodating the raw material powder irradiated by the 1st light beam;And control unit, control institute State electron beam column;And by by the powder bed irradiating electron beam to the raw material powder be allowed to cross-sectional layers made of melting and solidification into Row lamination carrys out appearance three-dimensional lamination construction;
The lamination shaping method has following steps:
In the control unit, along a plurality of ringed line in the path for the electron beam for indicating to irradiate the cross-sectional layers, institute is set Multiple irradiation positions of the 1st light beam and the 2nd light beam are stated, and determine the irradiation time at each irradiation position;
The timing that the control unit is generated based on the irradiation time, the data of irradiation position are exported to the electron beam column And irradiating electron beam;And
At the end of every time along the irradiation of the electron beam of a ringed line, the irradiation position of electron beam is made to be back to powder The specific position on the surface of layer.
CN201780087837.6A 2017-04-11 2017-04-11 Three-dimensional lamination arthroplasty devices and lamination shaping method Pending CN110382139A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2017/014807 WO2018189804A1 (en) 2017-04-11 2017-04-11 3d additive manufacturing device and additive manufacturing method

Publications (1)

Publication Number Publication Date
CN110382139A true CN110382139A (en) 2019-10-25

Family

ID=63793267

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780087837.6A Pending CN110382139A (en) 2017-04-11 2017-04-11 Three-dimensional lamination arthroplasty devices and lamination shaping method

Country Status (4)

Country Link
US (1) US20200061908A1 (en)
CN (1) CN110382139A (en)
DE (1) DE112017007421T5 (en)
WO (1) WO2018189804A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10919115B2 (en) * 2018-06-13 2021-02-16 General Electric Company Systems and methods for finishing additive manufacturing faces with different orientations
CN116100808B (en) * 2023-01-05 2024-04-19 南京航空航天大学 A spatial surface printing path planning method based on dynamic contour bias discretization

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1648802A (en) * 2004-12-03 2005-08-03 清华大学 An electron beam selective area synchronous sintering process and three-dimensional layered manufacturing equipment
JP2012502178A (en) * 2008-09-05 2012-01-26 エクスメット アクティエ ボラーグ Method for producing an object containing nanometals or composite metals
CN104010749A (en) * 2011-12-23 2014-08-27 米其林集团总公司 Method and device for producing three-dimensional objects
JP2015193883A (en) * 2014-03-31 2015-11-05 日本電子株式会社 Three-dimensional laminate molding apparatus and three-dimensional laminate molding method
CN105339114A (en) * 2013-06-28 2016-02-17 阿卡姆股份有限公司 Method and apparatus for additive manufacturing
CN106457686A (en) * 2014-03-07 2017-02-22 阿卡姆股份公司 Method, apparatus and computer readable medium for additive manufacturing of three-dimensional articles

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE524439C2 (en) 2002-12-19 2004-08-10 Arcam Ab Apparatus and method for making a three-dimensional product
US9011136B1 (en) * 2014-02-19 2015-04-21 Massivit 3D Printing Technologies Ltd Additive manufacturing device
JP2015193866A (en) * 2014-03-31 2015-11-05 日本電子株式会社 Three-dimensional lamination molding device, three-dimensional lamination molding system and three-dimensional lamination molding method
JP6030597B2 (en) * 2014-04-04 2016-11-24 株式会社松浦機械製作所 Three-dimensional modeling apparatus and manufacturing method of three-dimensional shaped object
JP6483551B2 (en) * 2015-07-03 2019-03-13 株式会社アスペクト Powder bed fusion unit
JP5826430B1 (en) * 2015-08-03 2015-12-02 株式会社松浦機械製作所 Three-dimensional modeling apparatus and manufacturing method of three-dimensional shaped object

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1648802A (en) * 2004-12-03 2005-08-03 清华大学 An electron beam selective area synchronous sintering process and three-dimensional layered manufacturing equipment
JP2012502178A (en) * 2008-09-05 2012-01-26 エクスメット アクティエ ボラーグ Method for producing an object containing nanometals or composite metals
CN104010749A (en) * 2011-12-23 2014-08-27 米其林集团总公司 Method and device for producing three-dimensional objects
CN105339114A (en) * 2013-06-28 2016-02-17 阿卡姆股份有限公司 Method and apparatus for additive manufacturing
CN106457686A (en) * 2014-03-07 2017-02-22 阿卡姆股份公司 Method, apparatus and computer readable medium for additive manufacturing of three-dimensional articles
JP2015193883A (en) * 2014-03-31 2015-11-05 日本電子株式会社 Three-dimensional laminate molding apparatus and three-dimensional laminate molding method

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
安永成等: "《中外大屏幕彩色电视机原理与维修》", 30 June 1993, 中国邮电出版社 *
彭国贤: "《显示技术与显示器件》", 30 June 1981, 人民邮电出版社 *

Also Published As

Publication number Publication date
WO2018189804A1 (en) 2018-10-18
DE112017007421T5 (en) 2020-01-09
US20200061908A1 (en) 2020-02-27

Similar Documents

Publication Publication Date Title
US6933507B2 (en) Controlling the characteristics of implanter ion-beams
KR100913445B1 (en) Ion implanter apparatus and method for adjusting and controlling uniformity of charged particles in continuous ion beam
US7675050B2 (en) Apparatus and method for ion beam implantation using ribbon and spot beams
JP5211328B2 (en) Ion implantation method and ion implantation apparatus
CN107408481B (en) X-ray tube with the magnetic quadrupole for focusing and the magnetic dipole for steering
TWI629572B (en) Exposure apparatus
CN109716480B (en) Electron beam column for three-dimensional layered modeling apparatus, and three-dimensional layered modeling method
CN110461506B (en) Charged particle beam control during additive layer fabrication
CN110382139A (en) Three-dimensional lamination arthroplasty devices and lamination shaping method
US9728371B2 (en) Ion beam scanner for an ion implanter
JP4601923B2 (en) Electron gun and electron beam irradiation device using the same
JP5272242B2 (en) System and method for focusing an ion beam
US8993979B2 (en) Beam control assembly for ribbon beam of ions for ion implantation
JP6770062B2 (en) Methods and equipment for manipulating ion beams and ion implanters
JP2021019747A (en) Scanning electromagnet and particle-beam treatment system
KR102350429B1 (en) Multicolumn charged particle beam exposure apparatus
WO2016149278A1 (en) X-ray tube having planar emitter and magnetic focusing and steering components

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20191025